KR101600766B1 - Substrate cleaning apparatus and brush assembly used therein - Google Patents

Abstract

The present invention relates to a brush cleansing apparatus and a cleansing brush assembly used therein. As a brush assembly for the brush cleansing apparatus for contacting and cleansing a surface of a substrate, the brush cleansing apparatus includes: a rotation axis; a cleansing brush which is fixed to an outer circumference side of the rotation axis and rotates together with the rotation axis, and is formed with a material keeping water; and an elastic support body having a number of elastic protrusions which support an inner circumference of the cleansing brush while protruding in an outer direction of a radius toward the inner circumference of the cleansing brush. When the cleansing brush contacts the surface of the substrate according as the inner circumference of the cleansing brush is supported by the elastic protrusion of the elastic support body, the brush cleansing apparatus can cleanse the surface of the substrate with higher friction force by elastic deformation of the elastic protrusion and thus can remove foreign substances stained on the surface of the substrate cleanly n a shorter time with the improved cleansing friction force. In addition, the cleansing brush assembly used therein is provided.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a brush cleaning apparatus and a cleaning brush assembly used therefor,

The present invention relates to a brush cleaning apparatus and a cleaning brush assembly used therein, and more particularly, to a brush cleaning apparatus and a cleaning brush assembly therefor, which solve the problem that a part of a substrate is not properly cleaned by deflection of a cleaning brush during a contact cleaning process, To a brush cleaning apparatus for cleaning a surface of a substrate by a contact force and a cleaning brush assembly used therefor.

After a substrate used for a display device or a wafer used for fabricating a semiconductor device (hereinafter, referred to as a " substrate ") is treated, a cleaning process for removing foreign matters on the surface is performed during the process.

Fig. 1 and Fig. 2 show a conventional brush cleaner 9. The conventional brush cleaning apparatus 9 is configured such that the substrate W is placed on the substrate mounting portion 50a which rotates at a predetermined height H so that the substrate W rotates The surface of the substrate W is cleaned while contacting the upper and lower surfaces of the substrate W while the substrate 10 is rotated.

At this time, the cleaning brush 10 is mounted on the rotary shaft 30 moving in the vertical direction 10d along the support stand 90, and is provided with a rotating shaft 30 And the surface of the substrate W is cleaned by contact. As shown in FIG. 2, during the substrate cleaning, a cleaning liquid (cleaning chemical 80a) and desalted water are supplied to the substrate W through nozzles.

At this time, the substrate W is rotatably supported by the rotating substrate supporting portion 50.

However, in the conventional brush cleaning apparatus 9 configured as described above, the cleaning brush 10 for cleaning the substrate W is formed of a material which fills the liquid, so that the cleaning brush 10 is in contact with the substrate W There is a problem that the contact friction force for cleaning the substrate W changes every time even if the position of the rotary shaft 30 is constantly positioned. As a result, the contact cleaning force for cleaning the substrate W is not constant, and when the cleaning brush 10 contains a large amount of water, the contact friction at the time of contact with the substrate W is lowered, There was a problem.

1 to 3, a plurality of protrusions 10a are regularly arranged on the surface of the cleaning brush 10 in order to increase the cleaning efficiency. A plurality of protrusions 10a are provided on the surface of the rotation shaft 30 The area between the protrusions 10a continues to pass through only the predetermined area of the substrate W because the substrate W rotates in place and the substrate W also rotates in place. 4, a part of the area 66 of the substrate W past the projection 10a is cleanly cleaned, but the other area 88 of the substrate W, to which the projection 10a does not pass, The foreign matter remains on the substrate W.

Accordingly, it is possible to increase the friction detergency against the substrate while cleaning the substrate W using the brush cleaning device 9, and to prevent foreign matter from remaining on the surface of the substrate W by the arrangement of the projections 10a There is an urgent need for

Disclosure of the Invention The present invention provides a brush cleaning device and a brush assembly for use therein, which can clean uniformly even if the cleaning state of the cleaning brush is changed during a contact cleaning process of rotating the cleaning brush while rotating the cleaning brush .

It is another object of the present invention to improve the cleaning efficiency by cleaning the substrate with a high frictional force when the cleaning brush cleans the substrate.

Further, the present invention aims to uniformly clean the entire surface of the substrate so that foreign matter does not remain.

According to an aspect of the present invention, there is provided a brush assembly for a brush cleaning apparatus, comprising: a rotary shaft; A cleaning brush which is fixed to the outer circumference side of the rotation shaft and rotates together with the rotation axis and is made of a material for misting up the liquid; An elastic support body having a plurality of elastic protrusions extending in a radially outward direction toward an inner peripheral surface of the cleaning brush and supporting an inner peripheral surface of the cleaning brush; And a brush assembly for a brush cleaning apparatus,

This is because the resilient supporter provided with the elastic projection between the rotation axis and the inner circumferential surface of the cleaning brush reduces the thickness of the cleaning brush compared with the prior art and prevents the phenomenon that the amount of pressurization varies depending on the amount of liquid such as the cleaning liquid, So that the surface of the substrate can be washed away with higher frictional force due to the elastic deformation of the elastic projection when the cleaning brush contacts the surface of the substrate as the inner circumferential surface of the cleaning brush is supported by the elastic support .

Accordingly, it is an object of the present invention to solve the conventional problem that the cleaning force is sensitively changed according to the wetting state of the cleaning brush and to secure a constant cleaning quality, and at the same time, the thickness of the cleaning brush is supported by the elastic protrusions, The shearing force for wiping the surface of the substrate is increased due to the bending deformation of the elastic protrusion when the cleaning brush comes into contact with the substrate and the cleaning friction force is improved so that the foreign substances on the surface of the substrate can be removed in a shorter time Can be obtained.

At this time, it is preferable that the elastic protrusions are made of an elastic material, and warp deformation in the circumferential direction is allowed during cleaning of the substrate.

The elastic protrusions are preferably aligned with the cleaning protrusions formed on the cleaning brush. As a result, the cleaning protrusions protruding from the cleaning brush are supported by the elastic protrusions when wiping the surface of the substrate, and can be cleaned by the cleaning protrusions of the cleaning brush with higher frictional force.

In this case, the elastic projection may be formed in a shape that the length W in the axial direction of the brush is 10 times longer than the width w in the circumferential direction. As described above, when the elastic protrusions are elongated and have a large cross section, they have greater flexural rigidity and are therefore suitable for cleaning with a high pressing force on the surface of the substrate.

Meanwhile, the elastic protrusions may be formed in a shape having a cross section of at least one of polygonal, circular, and elliptical in cross section. As described above, when the cross section of the elastic projection is formed in the shape of a circle, an ellipse, a square, or the like and has a smaller flexural rigidity, it is suitable for cleaning the surface of the substrate with a low pressing force.

On the other hand, a cleaning protrusion is formed on the outer circumferential surface of the cleaning brush, and the cleaning protrusions may be formed in different patterns around the central portion of the cleaning brush. Thus, even if cleaning is performed using a cleaning brush having a cleaning protrusion formed on the surface of a rotating substrate, the position of the substrate contacting the cleaning protrusion formed on one side of the center portion and the cleaning protrusion formed on the other side of the center portion So that uniform and clean cleaning can be performed over the entire surface of the substrate.

For example, the cleaning protrusions may be arranged asymmetrically with respect to the central portion of the cleaning brush. At the same time, or separately, the cleaning protrusions may be arranged at different sizes around the central portion of the cleaning brush.

According to another aspect of the present invention, there is provided a brush assembly for a brush cleaning apparatus for cleaning a surface of a substrate by contact, comprising: a rotating shaft; A cleaning brush fixed to the outer circumferential side of the rotary shaft and rotating together with the rotary shaft, the both sides of the cleaning brush being different from each other with respect to the center; The brush assembly for a brush cleaning apparatus according to claim 1,

At this time, the cleaning protrusions may be arranged asymmetrically with respect to the central portion of the cleaning brush. The cleaning protrusions may be arranged at different sizes around the central portion of the cleaning brush. That is, the cleaning protrusions may be arranged in different patterns around the central portion of the cleaning brush.

Alternatively or additionally, the cleaning protrusions may be formed to have different stiffnesses about the central portion of the cleaning brush. This makes it possible to uniformly clean the entire surface of the substrate by canceling the deviation of the contact cleaning force with the substrate in accordance with the rotation direction of the substrate, which is the object to be cleaned.

The present invention provides a substrate processing apparatus comprising: a substrate support table for mounting a substrate; A brush assembly for a brush cleaner having the above-described configuration; The brush cleaning apparatus according to claim 1,

The substrate support can support the substrate while rotating.

Wherein the cleaning protrusions are formed to have different stiffnesses about the central portion of the cleaning brush, and the rigidity of the cleaning protrusions located on the side opposite to the rotation direction of the substrate and the cleaning brush rotation direction is determined by the rotation And the rotation direction of the cleaning brush are arranged to be smaller than the rigidity of the cleaning projection located on the same side so that the deviation of the contact cleaning force with the substrate in accordance with the rotation direction of the substrate being the object to be cleaned is set to the rigidity of the cleaning projection So that uniform cleaning can be performed over the entire surface of the substrate.

As described above, according to the present invention, there is provided an elastic support having elastic protrusions between the rotary shaft and the inner circumferential surface of the cleaning brush, and by reducing the thickness of the cleaning brush compared to the conventional one, It is possible to obtain an advantageous effect that a constant cleaning efficiency can be realized by preventing the phenomenon that the amount of pressing is varied.

Further, according to the present invention, even if the thickness of the cleaning brush becomes thinner than the conventional one, the cleaning brush is elastically supported in the radial direction by the elastic protrusion, so that the cleaning brush of the thinner cleaning brush In addition, since a substantially constant cleaning friction force is secured irrespective of the amount of the liquid contained, consistent cleaning quality can be reliably obtained.

In addition, the cleaning brush can rub the surface of the substrate with a higher high frictional force owing to the bending deformation of the elastic supporter, thereby achieving an advantageous effect that cleaning of the cleaner substrate can be performed in a shorter time.

In addition, in the present invention, even if the cleaning brush is cleaned by using a cleaning brush having a cleaning protrusion formed on the surface of a rotating substrate, the cleaning brush has a pattern or rigidity different from that of the cleaning protrusions on both sides with respect to the center, And the cleaning protrusions formed on the other side of the center portion are different from each other. Therefore, the cleaning protrusions disposed on one side and the other side can uniformly and cleanly remove foreign matter from the entire surface of the substrate There is an effect that one can be cleaned.

1 is a front view showing a configuration of a conventional brush cleaning apparatus except for a substrate support,
Fig. 2 is a view showing a cleaning state using the brush cleaning apparatus of Fig. 1,
Fig. 3 is a plan view of Fig. 1,
Fig. 4 is a view showing a state in which the substrate is cleaned by the brush cleaning apparatus of Fig. 1,
FIG. 5 is a perspective view showing a configuration of a brush cleaning apparatus according to an embodiment of the present invention,
6 is a cross-sectional view taken along the section line VI-VI in Fig. 5,
7A is a perspective view of the elastic support of FIG. 5,
FIG. 7B is a perspective view showing a part of the configuration of the elastic supporter according to another embodiment of the present invention,
Fig. 8 is a view showing a state in which the substrate is cleaned by the brush cleaning apparatus of Fig. 5,
9 is a plan view of a brush cleaning apparatus according to another embodiment of the present invention.

Hereinafter, a brush cleaning apparatus 1 according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings. In describing the present invention, well-known functions or constructions will be omitted for the sake of clarity of the present invention, and the same or similar function or configuration will be given the same or similar reference numerals.

As shown in the drawings, a brush cleaning apparatus 1 according to an embodiment of the present invention includes a brush cleaning apparatus 1 for holding a substrate W in contact with an edge of a substrate W to rotate the substrate W at a predetermined height (H in FIG. 2) The upper and lower brush assemblies 100 and 100 have a support base 50 and a cleaning brush 110 that rotates in contact with the surface of the substrate W to clean the surface of the substrate. And a mobile unit 90 for vertically moving them in opposite directions at the same time.

The substrate support 50 supports the edges of the circular substrate W as shown in FIG. Each of the substrate supports 50 is formed with a contact recessed trench 50a such that the substrate W is positioned at a predetermined height H and a part of the plurality of substrate supports 50 is rotated 50d, (W).

The cleaning brush assembly 100 includes a rotary shaft 130 that is driven to rotate by a driving motor 20 and a plurality of elastic protrusions 121 that are elastically deformable around the rotary shaft 130, A supporting body 120 and a cleaning brush 110 formed of a material which is supported by the elastic protrusions 121 of the elastic supporting body 120 to mop up the liquid.

That is, the cleaning brush assembly 100 according to the present invention is configured such that the elastic support 120 is installed between the cleaning brush 110 and the rotation shaft 130, and thus the thickness 118 of the cleaning brush 110 Is formed to be thinner than the thickness 18 of the conventional cleaning brush 10.

The cleaning brush 110 is formed in a hollow cylindrical shape such as a sponge or polyvinyl alcohol (PVA), and has a plurality of cleaning projections 111 protruding from the outer circumferential surface thereof, Foreign matter remaining on the surface of the substrate W is removed by friction contact with the surface of the substrate W which is an object to be cleaned.

Here, the cleaning protrusions 111a and 111b protruding from the outer circumferential surface of the cleaning brush 110 are formed to have different patterns or different stiffness with respect to the center line C1.

That is, as shown in FIG. 5, the cleaning projections 111b disposed on the right side of the cleaning projections 111a disposed on the left side with respect to the center line C1 are formed asymmetrically with respect to each other. The surface of the substrate W rotating between the pair of cleaning brushes 100 is allowed to flow through the left area of the cleaning brush 110 while being rotated while passing through the left area of the center line C1, And is mainly cleaned by the cleaning protrusion 111b disposed in the right area of the cleaning brush 100 while rotating while passing through the right area of the center line C1. 4, since the positions of the cleaning projections 111a and the cleaning projections 111b on the right side region of the cleaning brush 110 are different from each other, It is possible to eliminate the region where the protrusion 111 does not pass and to eliminate the problem that the cleaning protrusion 111 does not pass after the cleaning so that the foreign matter remains on the substrate W. [

Further, as shown in FIG. 9, the rigidity of the cleaning projections 111a and 111b may be different from each other around the central portion. For example, the shape of the cleaning protrusion 111 may be the same as that of the cleaning protrusion 111 but may be formed of a different material from the central portion C1 of the cleaning brush 110. Alternatively, the cleaning protrusion 111a And 111b are formed to have different stiffnesses. In the area A1 in which the rotation direction r1 of the substrate W and the rotation direction 110r of the cleaning brush 110 are opposite to each other in consideration of the direction in which the substrate W rotates, The stiffness of the cleaning projections 111b is lower and the rigidity of the cleaning projections 111b is lower and the rigidity of the cleaning projections 111b is higher in the area A2 where the rotation direction r1 of the substrate W and the rotation direction 110r of the cleaning brush 110 are equal to each other. The difference in cleaning efficiency due to the relative speed difference between the contact surface of the cleaning brush 110 and the substrate W can be canceled by the rigidity of the cleaning projection 111 by disposing the brush 110. [

This makes it possible to compensate the deviation of the contact cleaning force of the substrate W with the substrate in accordance with the difference between the rotation direction r1 of the substrate W to be cleaned and the rotation direction 110r of the cleaning brush 110, It is possible to obtain an effect that uniform cleaning can be performed over the entire surface of the substrate.

Here, 'mainly' means to be cleaned in contact with the surface of the substrate W in the sidewall of the cleaning projections 111a and 111b. Since the cleaning protrusion 111 is protruded from the surface of the cleaning brush 110, the cleaning force of the substrate W by the cleaning protrusion 111 is much higher. Therefore, the cleaning protrusion 111 is formed on the basis of the center line C1. Are arranged asymmetrically and contact over the entire surface of the substrate W to complete cleaning.

The cleaning protrusion 111b disposed on the right side of the cleaning protrusion 111a disposed on the left side with respect to the center line C1 is formed larger or has a different sectional shape, The cleaning protrusion 111 may be configured to pass over the entire surface of the substrate W while rotating.

The center line C1 may be located in the center of the cleaning brush 110 in the longitudinal direction thereof but may be slightly offset from the center in consideration of the position of contact between the substrate W and the cleaning brush 110. [

The rotation shaft 130 is rotated by the driving motor 20 so that the cleaning brush 110 and the elastic supporter 120 rotate together.

The elastic supporter 120 is fixed to the outer circumferential surface of the rotary shaft 130, and a plurality of elastic protrusions 121 protrude radially outward. 5, the elastic protrusions 121 are positioned so as to be aligned with the bottom surface of the cleaning protrusion 111 of the cleaning brush 110 so that the frictional cleaning force of the substrate W by the cleaning protrusion 111 . Even if the elastic protrusions 121 are not aligned with the cleaning protrusions 111, since the elastic force is transmitted to the cleaning protrusions 111 by the cylindrical portion 120a of the cleaning brush, the elastic protrusions 121 and the cleaning protrusions 111, Are not necessarily aligned.

8, the elastic supporter 120 is disposed on the surface of the cleaning brush 110 by the bending deformation 120k of the elastic protrusion 121 while the cleaning brush 110 is in contact with the surface of the substrate W. [ The cleaning projection 111 is provided with an elastic pressing force 120F having a circumferential component to the surface of the substrate in the rotation direction 100r.

The thickness 118 of the cleaning brush 110 becomes thinner than the conventional one to reduce the maximum amount of liquid in the cleaning brush 110 so that the cleaning friction force of the cleaning brush 110 fluctuates The cleaning brush 110 can be reliably deformed by the resilient bending displacement of the elastic protrusion 121 of the elastic supporter 120. In addition, It is possible to obtain a favorable effect of removing foreign substances on the surface of the substrate W within a short time by further increasing the friction cleaning force of the substrate W in frictional contact with the substrate W. [

For this purpose, it is preferable that the elastic support body 120 is formed of a resin or plastic material having high impact resistance, which is capable of bending deformation of the elastic projection 121. When the cross section of the elastic projection 121 is small, May also be used as a material for this. Although not shown in the drawing, in order to press the cleaning brush 110 to a larger area when the end surface of the elastic projection 121 is formed small, the end surface of the elastic projection 121 is wider in cross section than the center section of the elastic projection May be formed.

When the material of the elastic supporter 120 is made of a material having a small flexural rigidity, the elastic protrusions 121 may be elongated along the longitudinal direction as shown in Fig. 7A. However, when the material of the elastic supporter 120 is a material having a greater flexural rigidity or the contact area of the cleaning brush 110 is larger, as shown in Fig. 7B, the length L of the elastic protrusion 121 ' ) Can be formed in a shorter number of times. As a result, the bending deformation 120k of the elastic protrusion 121 'can be more easily generated and the cleaning ability of the cleaning brush 110 can be further improved.

The length L of the elastic protrusions 121 and 121 'is longer than the width w of the elastic protrusions 121 and 121' , The elastic protrusions 121 and 121 'can be formed in a single point shape. At this time, the cross section of the elastic protrusions 121 and 121 'may be circular, or may be formed in various shapes such as a rectangle, a square, an ellipse, and a polygon. Thus, even when the cleaning brush 110 is in contact with the substrate W at a low pressing force, the cleaning performance can be improved by utilizing the flexural rigidity of the elastic projection.

The moving unit 90 moves the respective cleaning brush assemblies 100 in the vertical direction by a lead screw, a linear motor, or the like in the support frame. Thus, when the substrate W is supplied onto the substrate support 50, the cleaning brush assembly 100 is moved up and down so that the outer circumferential surface of the cleaning brush 110 is brought into contact with both surfaces of the substrate W .

The cleaning brush assembly 100 and the brush cleaning apparatus 1 having the cleaning brush assembly 100 according to an embodiment of the present invention have elastic protrusions 121 provided between the rotation shaft 130 and the cleaning brush 110 The thickness of the cleaning brush 110 is reduced so as to reduce the fluctuation amount of the amount of the cleaning liquid to be wiped so that the cleaning brush 100 can perform contact cleaning with a certain pressing force and friction cleaning force during cleaning with the substrate, As the elastic protrusion 121 elastically supports the cleaning brush 110 in the circumferential direction, an advantageous effect that the substrate can be cleanly cleaned in a short time by exhibiting an improved contact cleaning force can be obtained.

Since the cleaning protrusions 111 formed on the cleaning brush 110 are formed in different patterns with respect to the central portion C1, the cleaning protrusions 111 are formed on the entire surface of the rotating substrate W So that uniform and clean cleaning can be performed without leaving any foreign matter on the entire surface of the substrate.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, And can be appropriately changed within the scope of the claims.

That is, in the embodiment shown in the drawings, a configuration in which a plurality of pairs of cleaning brushes are vertically arranged while rotationally driving a circular substrate such as a wafer to clean the surface of the circular substrate is exemplified. However, And the cleaning of the contact brush while rotating only the cleaning brush is also within the scope of the claims.

1: Brush cleaning device 90: Moving device
100: Cleaning brush assembly 110: Cleaning brush
111: cleansing protrusion 120: elastic supporter
121, 121 ': Elastic projection 130:
W: Substrate 120k: Flexural deformation
120F: Elastic pressing force

Claims (14)

A brush assembly for a brush cleaning apparatus for cleaning a surface of a substrate by contact,
A rotary shaft;
A cleaning brush fixed to the outer circumferential side of the rotary shaft and rotating together with the rotary shaft;
An elastic support body having a plurality of elastic protrusions extending in a radially outward direction toward an inner peripheral surface of the cleaning brush and supporting an inner peripheral surface of the cleaning brush;
Wherein the elastic protrusions are formed of an elastic material to allow flexure deformation in the circumferential direction during cleaning of the substrate.
A brush assembly for a brush cleaning apparatus for cleaning a surface of a substrate by contact,
A rotary shaft;
A cleaning brush fixed to the outer circumferential side of the rotary shaft and rotating together with the rotary shaft;
An elastic support body having a plurality of elastic protrusions extending in a radially outward direction toward an inner peripheral surface of the cleaning brush and supporting an inner peripheral surface of the cleaning brush;
Wherein the elastic projection has a length (W) in the axial direction of the brush longer than a width (w) in the circumferential direction by at least 10 times.
A brush assembly for a brush cleaning apparatus for cleaning a surface of a substrate by contact,
A rotary shaft;
A cleaning brush fixed to the outer circumferential side of the rotary shaft and rotating together with the rotary shaft, the cleaning brush having protrusions protruding from the surface;
An elastic support body having a plurality of elastic protrusions extending in a radially outward direction toward an inner peripheral surface of the cleaning brush and supporting an inner peripheral surface of the cleaning brush;
Wherein the elastic protrusions are disposed in alignment with the cleansing protrusions.
The method of claim 3,
Wherein the cleaning protrusions are formed in different patterns with respect to a central portion of the cleaning brush.
The method of claim 3,
Wherein the cleaning projection has an asymmetrical arrangement position about a central portion of the cleaning brush.
The method of claim 3,
Wherein the cleaning protrusions are arranged at different sizes around a central portion of the cleaning brush.
The method of claim 3,
Wherein the cleaning protrusions are formed to have different stiffnesses about the central portion of the cleaning brush.
8. The method according to any one of claims 3 to 7,
Wherein the elastic protrusions are made of an elastic material and are allowed to flex in a circumferential direction during cleaning of the substrate.
A brush assembly for a brush cleaning apparatus for cleaning a surface of a substrate by contact,
A rotary shaft;
A cleaning brush fixed to the outer circumferential side of the rotary shaft and rotating together with the rotary shaft, the cleaning protrusions being protruded and arranged on the opposite sides of the central portion;
Wherein the cleaning protrusions are formed to have different stiffnesses about the central portion of the cleaning brush.
A brush assembly for a brush cleaning apparatus for cleaning a surface of a substrate by contact,
A rotary shaft;
A cleaning brush fixed to the outer circumferential side of the rotary shaft and rotating together with the rotary shaft, the cleaning protrusions being protruded and arranged on the opposite sides of the central portion;
Wherein the cleaning protrusions are arranged at different sizes around a central portion of the cleaning brush.
11. The method according to claim 9 or 10,
Wherein the cleaning projection has an asymmetrical arrangement position about a central portion of the cleaning brush.
A substrate support for supporting the substrate;
A brush assembly for a brush cleaning apparatus according to any one of claims 1 to 7 or 9 or 10, comprising:
The brush cleaning device comprising:
13. The method of claim 12,
Wherein the substrate support rotatably supports the substrate.
A substrate support for supporting the substrate while rotating;
A brush assembly for a brush cleaning apparatus according to any one of claims 3 to 7 or 9 or 10, comprising:
The rigidity of the cleaning projection located on the side opposite to the rotation direction of the substrate and the rotation direction of the cleaning brush is higher than the rigidity of the cleaning projection located on the same side of the rotation direction of the substrate and the rotation direction of the cleaning brush Wherein the brush cleaning device is smaller than the brush cleaning device.

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