KR101598755B1 - Profiles for precursors to polymeric materials - Google Patents

Profiles for precursors to polymeric materials Download PDF

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Publication number
KR101598755B1
KR101598755B1 KR1020150039888A KR20150039888A KR101598755B1 KR 101598755 B1 KR101598755 B1 KR 101598755B1 KR 1020150039888 A KR1020150039888 A KR 1020150039888A KR 20150039888 A KR20150039888 A KR 20150039888A KR 101598755 B1 KR101598755 B1 KR 101598755B1
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Prior art keywords
precursor material
profile
precursor
tag
data
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KR1020150039888A
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Korean (ko)
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제임스 뎀프스터
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에이치제트오 인코포레이티드
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Priority claimed from US14/621,216 external-priority patent/US9333675B2/en
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated

Abstract

Disclosed are methods to obtain a profile regarding a batch or a lot of a precursor material, and to use the profile while processing the precursor material and forming a polymer. In such a method, a process profile corresponding to the characteristics of a particular precursor material, for example, the arrangement mentioned above or the like, can be generated. Subsequently, while a material processing system provides polymers with standard quality and, optionally, films, processing the precursor material by means of accounting for a difference between a precursor material and a standard precursor material can be induced by using the process profile. In addition, disclosed are a device and a system constituted to obtain a profile data regarding a batch of precursor material, to generate or modify a process profile based on the profile data, and to form polymers using the process profile.

Description

[0001] PROFILES FOR PRECURSORS TO POLYMERIC MATERIALS [0002]

<Cross reference of related application>

This application is a continuation-in-part of U.S. Patent Application No. 13 / 737,737, filed January 9, 2013, entitled &quot; Substance Processing System " Filed on January 10, 2012 of U.S. Provisional Patent Application Serial No. 61 / 585,150 entitled " 150 Provisional Application &quot;, entitled " Substance Processing System and Related Methods &quot; Priority claim is 35 USC § 119 (e). The entire disclosure of '737 Application and' 150 Provisional Application is hereby incorporated herein by reference.

The present disclosure generally relates to methods, systems and devices for obtaining a profile for a batch or lot of precursor materials and for using the profile during processing of the precursor material to form the polymer. More particularly, the present disclosure relates to a method, system, and method for generating a vaporization profile tailored to each specific batch of precursor material and achieving consistency in the polymer from a batch-to-batch using such a customized vaporization profile &Lt; / RTI &gt;

Based on the assumption that all precursor materials will have the same quality, the deposition equipment is typically adjusted to perform the same process repeatedly, and the results of such a process (e.g., polymer quality, film quality, etc.) Expect. Unfortunately, the nature and / or quality of the precursor material (e.g., its purity, the presence of additional constituents, the degree to which the additional constituents are present, etc.) may vary in one batch of precursor material or another batch of precursor material have. Without limitation, the amount of residual solvent (e.g., toluene, xylene, etc.) in one batch of precursor material may vary from the same amount of residual solvent in different batches of precursor material. As another example, the purity, quality, and / or other characteristics of a precursor material from one source may differ from the respective purity, quality, and / or other characteristics of the same type of precursor material from another source.

Variations in the purity, quality and / or other characteristics of the precursor material, when processing the precursor material using standard processes, i.e., forming a polymer from the precursor material and, optionally, depositing a film comprising the polymer, And may affect the quality or other characteristics of any film, including polymers and polymers that have been (e.g., deposited). More specifically, where the quality of the precursor material is different from the quality of the precursor material on which the standard process is based (i.e., the standard quality of the precursor material), the difference in quality affects the process performed by the deposition equipment , Which often affects the quality and / or quality of the polymer and / or film formed by such a process.

In particular, the presence of a solvent or other impurities in a precursor (e.g., [2.2] paracyclophane, etc.) to a poly (p-xylylene) polymer can cause premature pressure spikes, which during pyrolysis and / Lt; / RTI &gt; In addition, increased pressure during pyrolysis and / or deposition can have a negative impact on the quality of the polymer and film formed as a result of the process. As an example, applying a defective film to all batches of 2,000 electronic substrates with a value of $ 250 on a piece may result in a loss of $ 500,000, The equipment manufacturer, the party coating the substrate, etc.).

The present disclosure relates, in various aspects, to a profile for a precursor to a polymeric material. The profile for such a precursor is contemplated during processing of the precursor to provide a standard quality polymer and optionally a film, despite variations in quality between the standard precursor and the precursor being actually processed. As used herein, the term "quality" encompasses any of a variety of different characteristics, including, but not limited to, the purity of the precursor material, the presence of additional constituents in the precursor material, . The term "component" as used herein includes any residual solvent in the precursor material, other impurities or contaminants in the precursor material, additives to the precursor material, and the like.

In one aspect, this disclosure is directed to a technique or method for obtaining a profile for a batch or lot of precursor materials. This technique involves analyzing one or more characteristics of the precursor material. Various embodiments of this feature include, but are not limited to, the purity of the arrangement of precursor materials, the identification of one or more impurities in the arrangement of precursor materials, the amount (e.g., percent, percentage, etc.) of one or more impurities in the arrangement of precursor materials .

Once one or more characteristics of the arrangement of precursor materials have been determined, a profile for the placement of the precursor materials can be generated. The data corresponding to this profile may include a simple number, such as a level of purity, the identity of at least one impurity, the amount of at least one impurity, and the like. Optionally, the profile can be more complex and can provide a number of specific details on the placement of the precursor material, impurities, other components and their relative amounts. In some embodiments, the profile may include a vaporization profile, which may include one or more characteristics of the arrangement of the precursor material, as well as various components of the arrangement of the precursor material, while heating the arrangement of precursor material to the vaporization temperature The temperature gradient, pressure, etc.). A profile or a representative profile for the placement of the precursor material may be stored on the tag, which may be configured to communicate the profile to the corresponding reader of the material processing apparatus.

Once a profile has been created for the placement of the precursor material, a batch of precursor material can be packaged. In some embodiments, the packaging of the precursor material may include the introduction of precursor material into the reservoir of the container for the precursor material, referred to herein as a "thermal evaporation boat" or more simply as a "boat". In addition, the tag can be connected to the precursor material being packaged (e.g., placed in a reservoir of a boat, fixed in a boat, etc.).

In yet another aspect, a system for manufacturing an arrangement of precursor materials for packaging is disclosed. Such a system may include a profiling element, a programming element, and a packaging element. In some embodiments, a system for making a batch of precursor material for packaging may also include an output element for providing a physical form of the profile of the batch of precursor material.

A profiling element of a system for making a batch of precursor material for packaging may be configured to obtain information or data that may be useful in creating a profile for the placement of the precursor material. In some embodiments, the profiling element may comprise a chemical analyzer of a known type. In another embodiment, the profiling element may include a correction device, which may include a small version of a material processing device that allows and reproduces the investigation of the vaporization conditions present in the commercial material processing device.

The programming element may be configured or programmed to store data corresponding to a profile of the arrangement of precursor materials. More specifically, the programming element may store data on the tag. In some embodiments, the programming element may be configured to electronically store data on the tag. In another embodiment, the programming element may produce an optically scanable element containing the data. In embodiments where the system includes an output element, the output element may convert the optically scanable element holding the data corresponding to the profile to a physical form.

A packaging element of a system for making a batch of precursor material for packaging can be configured to package a quantity of precursor material and to couple the tag with a packaged amount of precursor material. Without limitation, the packaging element may introduce a quantity of precursor material into the reservoir of the boat and connect the tag with a quantity of precursor material in the boat or boat.

According to another aspect, a method of processing a precursor material is disclosed. Such methods include inserting a packaged amount of a precursor material (e.g., a boat having a quantity of precursor material, etc.) and a corresponding tag into a vessel of a material processing apparatus, e.g., a vessel connected to a vaporization chamber of a material deposition apparatus do. Using a material processing device or a tag that is proximate to at least its reader, a profile that is specifically corresponding to the packaged precursor material to which the data-tag from the tag corresponds can be communicated to the material processing device or its reader. The reader may then generate a signal that carries the data to a data processing element of the material processing apparatus, and the data processing element may cause the material deposition apparatus or a component thereof (e.g., a vaporizing component of the material deposition apparatus, etc.) (E.g., to vaporize, etc.) the precursor material.

In embodiments where the material processing apparatus comprises a material deposition apparatus configured to vaporize the precursor material, the data may include a vaporization profile adapted to the arrangement of the precursor material, or more specifically the precursor material from which the precursor material was obtained. The vaporization profile can then be communicated to the data processing element of the material deposition apparatus, which can then vaporize the precursor material according to the vaporization profile. In other embodiments, the data may include information about the arrangement of the precursor material with which the tag is corresponding, or more precisely, the precursor material from which the corresponding precursor material was obtained. Once the information is communicated to the data processing element of the material processing apparatus, the programming of the data processing element allows the data processing element to use the information to determine the process profile, which may also be referred to as a " (E.g., a vaporization profile, etc.), and then the data processing element may cause the material deposition apparatus to process (e.g., vaporize, etc.) the precursor material according to the process profile.

A material processing apparatus is also disclosed. As indicated previously herein, in various embodiments, the material processing apparatus may comprise a material deposition apparatus. The material processing apparatus according to the present disclosure may include a container (e.g., a boat, etc.) for a quantity of packaged precursor material, a reader, a data processing element and a material processing component. The reader coupled to the container for the packaged precursor material can be configured to obtain data retained by the tag associated with the packaged precursor material. The data held by the tag corresponds to the arrangement of the precursor material, or more precisely the precursor material from which the precursor material was obtained.

The reader may also be configured to communicate data from the tag to a data processing element of the material processing apparatus. In some embodiments, the reader may generate a signal that holds the data.

Upon receipt of a signal from the reader, the data processing element may process the data under the control of one or more programs. Processing of the data may include obtaining a process profile (e.g., a vaporization profile, etc.) for the precursor material from the signal. Alternatively, the data processing element may process the data from the signal and use the data to generate a process profile for the precursor material. In some embodiments, the process profile is based on a standard process profile for a standard precursor material (i.e., precursor material of standard purity, precursor material having one or more impurities in a standard amount, precursor material having a standard amount of one or more solvents, etc.) . &Lt; / RTI &gt; In another embodiment, the data processing element may generate a process profile by entering data into the algorithm.

Using a packaged precursor material, or more specifically a process profile corresponding to the batch from which the precursor material was obtained, the data processing element can control one or more aspects of the material processing component of the material deposition apparatus using the process profile . The data processing element may include, but is not limited to, a temperature (e.g., temperature gradient, process temperature (e.g., vaporization temperature, etc.)) and / or pressure at which the precursor material is processed Can be controlled.

Other aspects, as well as various features and advantages of the disclosed subject matter will become apparent to those of ordinary skill in the art upon examination of the following disclosure, appended claims and accompanying drawings.

In the drawings,
Figure 1 illustrates one embodiment of a vaporization profile that may be used to form a polymer and optionally a film formed from the polymer during processing of the precursor material;
Figure 2 shows one embodiment of an analyzer for determining a quantity of a sample of an arrangement of precursor materials;
3 schematically depicts a packaged precursor material, wherein the precursor material is held by a reservoir of a boat and the boat also holds a tag that holds data corresponding to one or more characteristics of the precursor material in the boat;
FIG. 4 is a block diagram of a material processing apparatus configured to receive precursor materials packaged in the manner shown by FIG. 2 and to process the precursor materials in a manner that meets one or more characteristics while providing a standard quality polymer and / As well as providing a representative representation of the &lt; RTI ID = 0.0 &gt;

Figure 1 is a pressure profile curve for one embodiment of the arrangement of precursor materials. More specifically, the pressure profile curves of FIG. 1 show that the monomer or reactive species formed as a poly (p-xylylene) precursor, such as an unsubstituted or substituted [2.2] paracyclophane, Pyrolysis, etc.) pressure profile. More specifically, Figure 1 shows the corresponding two pressure profile curves: (1) the contribution of the monomer to the total pressure within at least a portion of the mass deposition apparatus (e.g., its deposition chamber, etc.) when processing the precursor material A standard pressure curve (10) based on; And (2) a batch-specific pressure curve 10 'corresponding to the total pressure within at least one corresponding portion of the mass deposition apparatus when a particular batch of precursor material of the same type as the standard precursor material is processed .

The standard pressure curve 10 corresponds to the pressure that would result from processing the precursor material without any constituents to vaporize at a temperature below the temperature at which the precursor material itself vaporizes. Such precursor materials may be referred to herein as "standard precursor materials. &Quot; In embodiments where the precursor material comprises a precursor to poly (p-xylylene), the standard precursor material may include any volatile components such as additives and solvents (e.g., toluene and / or xylene) May be substantially absent. As used herein, the phrase "substantially free" indicates that the precursor material may be free of volatile substances or other impurities in an amount that may affect the pressure profile for the precursor material itself.

The batch-specific pressure curve 10 'corresponds to the pressure produced from the processing of batches of standard precursor materials and other precursor materials. In the embodiment shown by FIG. 1, the batch-specific vaporization curve 10 'represents the placement of a precursor material comprising toluene and xylene in an amount sufficient to affect the pressure profile for the precursor material itself.

Particularly, the portions on the left and right sides of the standard vaporization curve 10 coincide with the placement-specific vaporization curve 10 '. The standard vaporization curve 10 and the cracked portion of the batch-specific vaporization curve 10 'are caused by the difference between the arrangement of the standard precursor material and the precursor material. In embodiments where the precursor material comprises another precursor to a [2.2] paracyclophane or poly (p-xylylene), the placement of the precursor material may be a solvent and may include residues that may also be considered impurities in the precursor material Toluene and xylene. Since both toluene and xylene are volatile materials with boiling points (i.e., 110 ° C and 138 ° C respectively) lower than the vaporization temperature of the [2.2] paracyclophane (ie, about 170 ° C), the presence of each of these materials in the precursor material May increase the pressure by raising the temperature of the vaporization component of the material deposition apparatus or another embodiment of the material processing apparatus to a temperature to vaporize the precursor material. The increase in pressure caused by toluene and xylene is indicated along the batch-specific pressure curve 10 '. Particularly, the batch-specific pressure curve 10 'is obtained from the toluene vaporization peak 12' corresponding to the position 12 on the standard pressure curve 10 without a peak, as well as on the standard pressure curve 10 without a peak And a xylene vaporization peak 14 'corresponding to position 14.

At position 16 'to the right of the xylene vaporization peak 14', the batch-specific pressure curve 10 'indicates the reactive species formed from the arrangement of the precursor material at the same location 16 in the process, But still at a pressure higher than the pressure at which the reactive species from the material is to be treated. The difference in this pressure is the residual effect of the xylene pressure peak 14 'and can have a significant impact on the film comprising the polymer and / or polymer formed.

The manner in which the precursor material can be processed and the quality of the placement of the precursor material relative to the quality of the polymer and film formed by processing the precursor material (e.g., various solvents during the placement of the precursor material, other impurities in the arrangement of the precursor material, In view of the potential impact of other components, additives to the precursor material, etc., understanding the quality of the placement of the precursor material prior to processing may require that the precursor material from the batch be processed for processing as well as formed from precursor materials May be useful in predicting how it will affect the quality of the polymer. Thus, the quality of the sample from the placement of the precursor material can be analyzed, and the information obtained from the analysis can be used to create a process tailored to the placement of the precursor material.

Figure 2 illustrates one embodiment of an analyzer 30 for determining the quality of a sample from an arrangement of precursor materials. In various embodiments, analyzer 30 may be configured to obtain and provide information about the quality of the sample. The analyzer 30 may include a chemical analyzer configured to determine various components of the sample, including the precursor material itself, any residual solvent in the precursor material, other impurities in the precursor material, additives to the precursor material, For example, a mass spectrometer, etc.). Additionally, this analyzer 30 can be configured to determine the relative amounts of the precursor material and one or more other components of the sample.

In another embodiment, the analyzer 30 can be used to determine the quality of the sample from the placement of the precursor material by processing the sample in a manner that is parallel to that performed by the commercial material processing apparatus (e.g., in the same manner as its reproduction processing conditions) Or a small-sized material processing apparatus configured to determine a small-sized material processing apparatus. As an example, in embodiments where the precursor material comprises a poly (p-xylylene) precursor, such as an unsubstituted or substituted [2.2] paracyclophane, the miniaturized material processing apparatus or analyzer 30 may include a vaporizing element 32 ), A pyrolysis tube 34, and a deposition chamber 36.

In any case, the miniaturized material processing apparatus is configured to process a sample from an arrangement of precursor materials and to enable analysis in a manner that is responsive to process parameters (e.g., standardization process, batch-specific or custom process, etc.) Lt; / RTI &gt; The results of such processing may provide a profile for the placement of the precursor material, which may include information about one or more specific characteristics of the placement of the precursor material. Various embodiments of the specific features of the batch that can be determined include the presence of one or more impurities (e.g., in the arrangement of the precursor material, certain components such as water, solvents (e.g., xylene, toluene, etc.) The presence of impurities (e.g., other types of precursor materials such as parylene N or parylene D in parylene C precursors), additives, etc., the relative amount of constituents in the arrangement of precursor materials, etc.) Process information on the batch (e.g., a pressure rise caused by the placement of the precursor material); And the density of the placement of the precursor material (e.g., pellet to powder, etc.). This information includes, but is not limited to, the manufacturer of the precursor material, the type of precursor material (e.g., parylene C, parylene N, parylene D, parylene AF, etc.) And / or other information about the placement of the precursor material, including the vendor's batch number for the placement of the precursor material. This information can also be used to determine other information (e.g., the amount of precursor material, the nature of the manner in which the precursor material is packaged (e.g., the shape and size of the boat, the thermal capacity and / or thermal conductivity of the boat, For example, the dimensions and / or thermal characteristics of hexagonal shaped cells, etc.) can be used to create a process profile specific to the placement of the precursor material, The material can be tailored to process in a manner that will provide a standard quality polymer and / or film. Thus, a miniaturized material processing apparatus can be referred to as a "calibrating device &quot;.

Since the precursor material can be pre-analyzed by a "correction device" in the same manner as processing the precursor material from the same batch by a commercial-scale material processing device, the use of the correction device is advantageous for the trapped solvent, (E. G., In powder or pellet form) of the precursor material, the degree of packing of the precursor material (e. G., Loosely, Dense, etc.) can be explained. In some embodiments, the correction device also determines the effect of packing the precursor material on the manner in which the precursor material is vaporized or sublimed (e.g., the shape and thermal characteristics of the boat and any vaporization assist device therein) . This information can also be determined for various amounts of precursor materials. Thus, a correction device can be used to determine the actual performance of the placement of the precursor material prior to depositing the precursor material from the batch in bulk (e.g., on a plurality of electronic assemblies, etc.).

In some embodiments, the data obtained using the analyzer 30 can be used to allow a larger scale material processing apparatus to process the precursor material from the same batch in a manner that provides a standard quality polymer and / or film It is possible to facilitate the accurate generation of the process profile. In another embodiment, the analyzer 30 comprises a small material processing apparatus, wherein one or more additional samples are processed by the analyzer 30 to enable adjustment of the manner in which the precursor material is processed from the batch , Thereby providing a customized process profile for this arrangement of precursor materials.

Once data has been obtained that allows the generation of a process profile for the batch of precursor material, or if the process profile itself has been generated, the data can be stored. In some embodiments, the data may be stored on the tag 48 (FIG. 3) to be packed with a quantity of precursor material 42 from the batch. Alternatively, the data may be stored on the server, and the tag 48 may store information serving as an index that allows data to be accessed from the server. In some embodiments, software can be used to capture data and optionally generate additional data for a profile (e.g., a quality profile, a purity profile, a process profile, etc.) for the placement of the precursor material. The tag 48 may be configured to remotely communicate data to the complementary reader 54 (FIG. 4) coupled to the material processing apparatus 50 (FIG. 4).

In a specific embodiment, the tag 48 (FIG. 3) may include a radio frequency identification (RFID) tag or another suitable near field communication element. The data may be stored on the near field communication element in a manner known in the relevant art.

In another embodiment, the tag 48 (FIG. 3) may comprise an optically scanable element. Non-limiting examples of optically scanable elements are barcodes, which include, but are not limited to, a one-dimensional barcode (which includes a series of parallel lines) or a two-dimensional barcode (which may be referred to as a "matrix barcode" Including barcodes of any suitable shape, including, The output element may produce a physical representation of the optically scanable element. In various embodiments, the output element may define an optically scanable element on the substrate. Without limitation, the output element may be configured to print an optically scanable element on a label, or to place an optically scanable element on a substrate (e.g., a detachable lid for a boat, boat, etc.) , Or the optically scanable element is etched into the substrate (e.g., by laser ablation or the like).

Returning now to Figure 3, one embodiment of packaged precursor material 40 includes a quantity of precursor material 42 and a tag 48. The tag 48 retains data for one or more features (e.g., quality, purity, specific features, process profile, etc.) of the batch in which the precursor material 42 was obtained. In some embodiments, the precursor material 42 may be held by a boat 44 or another carrier. More precisely, the precursor material 42 may be retained in the reservoir 46 of the boat 44 or other carrier. In embodiments where the precursor material 42 is retained by the boat 44 or another carrier, the tag 48 may also be attached to the boat 44 or other carrier (e.g., And the like). Alternatively, the tag 48, along with the precursor material 42, may be located within the reservoir 46 of the boat 44. [

As illustrated by FIG. 4, a packaged precursor material 40 as shown by FIG. 3 may be configured for introduction into the vessel 52 of the material deposition apparatus 50. In addition to the vessel 52, the material deposition apparatus 50 may include a reader 54, a data processing element 56, and a material processing component 60.

The reader 54 associated with the vessel 52 may be configured to obtain data retained by the tag 48 connected to the boat 44 (Figure 3) of the packaged precursor material 40 (Figure 3) . The data held by the tag 48 corresponds to the placement of the precursor material 42 (FIG. 3) of the packaged precursor material 40, or more specifically the precursor material from which the precursor material 42 was obtained. The reader 54 may also be configured to communicate data from the tag 48 to the data processing element 56 of the material processing apparatus 50. [ In some embodiments, the reader 54 may generate a signal to hold the data.

In an embodiment in which the tag 48 includes an RFID tag, the reader 54 may include an RFID reader of a known type, which is compatible with the RFID tag. In an embodiment in which the tag 48 includes a bar code, the reader 54 may include a bar code reader or bar code scanner of a known type, which is compatible with the bar code. Of course, as long as the reader 54 is configured to obtain data from the tag 48 of the packaged precursor material 40 to be used with the material processing device 50, other types of readers 54 may also be used, In the material processing apparatus 50 according to the first embodiment.

Upon receipt of a signal from the reader 54, the data processing element 56 may process the data under the control of one or more programs. Processing of the data may include obtaining a predetermined process profile (e.g., a vaporization profile or sublimation profile that was determined during calibration of the batch of precursor material) for the precursor material 42 (FIG. 3) from the signal. Alternatively, the data processing element 56 may process data corresponding to one or more features of the arrangement of precursor materials from the signal as obtained during calibration of the batch of precursor material, Can be used in conjunction with any optical information about the manner in which the precursor material 42 is deposited. In some embodiments, the process profile is based on a standard process profile for a standard precursor material (i.e., precursor material of standard purity, precursor material having one or more impurities in a standard amount, precursor material having a standard amount of one or more solvents, etc.) . &Lt; / RTI &gt; In another embodiment, data processing element 56 may generate a process profile by entering data into an algorithm.

The material processing component 60 of the material processing apparatus 50 operates under the control of the data processing element 56 and thereby receives a quantity of the precursor material 42 (Figure 1) Modified, or generated according to a process profile. As an alternative to automatic operation of the material processing component 60 of the material processing apparatus 50, the data processing element 56 may then output the recommended values to the operator of the material processing apparatus 50. [

The material processing component 60 may be configured to process a precursor material 42 comprising a poly (p-xylylene) precursor, such as an unsubstituted or substituted [2.2] paracyclophane. This material processing component 60 may include a vaporizer 62, a pyrolyzer 64 and a deposition chamber 66, among other elements, as is known in the art. The operation of the vaporizer 62 and the pyrolysis device 64 can be controlled by the data processing element 56. [

4, and referring back to FIG. 1, a process profile is executed by the data processing element 56 of the material processing system 50 to identify the material processing component 60 of the material processing system 50, Is capable of controlling the manner in which precursor material 42 (Figure 3) is processed. The process profile is shown as temperature curve 20 in Fig.

When a quantity of precursor material 42 (FIG. 3) is first introduced into the vessel 52 (which container 52 communicates with the vaporizer 62 in this embodiment) of the material processing apparatus 50, (62) may be operated in a manner that initiates heating of the precursor material (42). The rate at which the vaporizer 62 raises the temperature of the precursor material 42 may be at least partially dependent on the temperature of the at least one of the precursor material 42 (e.g., any remaining solvent in the precursor material, The amount of additive to the precursor material, etc.) and the effect of each component on the pressure in the vaporizer 62, the pyrolysis unit 64, and the deposition chamber 66. The rate at which the vaporizer 62 increases the temperature of the precursor material 42 remains the same or substantially the same if the amount of the constituent of the precursor material 42 does not have a significant effect on pressure . 1, this is illustrated by a portion 22 of the temperature curve 20 corresponding to the toluene vaporization peak 12 'of the batch-specific pressure curve 10', indicating that the precursor material 42 Does not include toluene in a significant amount sufficient to have an undesirable effect on the pressure produced during vaporization. Thus, the rate at which the temperature rises can be kept unchanged relative to the corresponding temperature gradient of the standard temperature curve that can be used when processing standard precursor materials.

In the illustrated embodiment, the amount of another component (e.g., xylene, etc.) present in the process profile and the precursor material 42 (Figure 3) corresponding to the temperature curve 20, The pressure can be increased to such an extent as to have undesirable effects on the polymer and / or film that can be formed and / or deposited by the process. Thus, as the temperature of precursor material 42 (FIG. 3) approaches the initial temperature associated with the vaporization peak corresponding to its constituent (e.g., xylene vaporization peak 14 '- temperature of about 110 ° C., etc.) The rate at which the vaporizer 62 raises the temperature may be reduced or the temperature may remain substantially constant as represented by the horizontal segment 24 of the temperature curve 20. [ The duration that the vaporizer 62 keeps the temperature of the precursor material 42 substantially constant or otherwise increases the temperature of the precursor material 42 at a reduced rate is dependent on the amount of constituents in the precursor material 42 And may not be re-increased to a steady state until a sufficient amount of the constituent is removed from the precursor material 42 so that the precursor material 42 may be vaporized at an acceptable pressure.

The vaporizer 62 may increase the rate at which the temperature of the precursor material 42 rises, as represented by the segments 26 of the temperature curve 20, once the potentially problematic components have been sufficiently vaporized . Once all of the constituents that may undesirably increase pressure have been removed from the precursor material 42, the vaporizer 62 does not adversely affect the pressure in the pyrolysis unit 64 or the deposition chamber 66 The precursor material can be heated to its vaporization temperature.

Conversely, when treating the precursor material 42 with a standard process used for a standard precursor material that may include treating the precursor material 42 to a temperature that increases at a substantially constant rate until it reaches the vaporization temperature , Any pressure spikes (e.g., toluene vaporization peaks 14 ', etc.) caused by the volatile components may increase the pressure in the vaporizer 62 undesirably (e.g., to 75 mT) , Which could also undesirably increase the pressure in pyrolysis unit 64 and deposition chamber 66. This increase in pressure may have a lasting effect on the pressure within the material processing component 60. [ For example, even after the volatile components have been vaporized, the pressure in the pyrolysis unit 64 and / or the deposition chamber 66 may be undesirably high (e.g., the position of the batch-specific vaporization curve 10 ' (For example, 38 mT at 16 '), which can have undesirable effects on the polymer and / or film formed by the process (e.g., it can be polymerized to form poly (p-xylylene) Can produce a white film, as typically occurs when the pressure of the reactive species forming the &lt; RTI ID = 0.0 &gt; &lt; / RTI &gt;

In the case of using the disclosed technique, the precursor material 42 (FIG. 3), which is introduced into the material processing apparatus 50 by adjusting the process parameters, and the standard precursor material from which the standard process performed by the material processing apparatus 50 has been developed Can be compensated for. More specifically, the standard process can be adjusted to compensate for the profile of the precursor material 42 introduced into the vessel 52 of the material processing apparatus 50. The standard process can also be adjusted to adjust the type of precursor material 42 used (e.g., parylene N, parylene D, more exogenous materials such as parylene AF, Irrespective of whether or not the operator of the material processing apparatus 50 has any knowledge of the type of precursor material 42 that is introducing into the material processing apparatus 50 You can compensate. Thus, the time and effort required to adjust the material processing apparatus 50 during the switching of the precursor materials 42 and / or between the precursor materials 42 from different sources can be reduced or eliminated. In addition, the disclosed subject matter can reduce the amount of time required to install the material processing apparatus 50 and prepare the material processing apparatus 50 for use. In addition, the disclosed subject matter can reduce the likelihood of defective material processing, as well as losses associated with defective material processing (e.g., loss in time, materials, substrate, etc.).

While the foregoing disclosure provides many details, they should not be construed as limiting the scope of any subsequent claims. Other embodiments may be devised which do not depart from the scope of the claims. Features from other embodiments may be used in combination. Accordingly, the scope of each claim is only indicated and limited by the full scope of legal equivalents available for its obvious language and its elements.

Claims (30)

A method of packaging a precursor material for use in a material deposition process,
Analyzing one or more characteristics of a sample of the batch of precursor material;
Determine a profile of the arrangement of precursor materials based on the one or more characteristics;
Store the profile on the tag;
Packaging a portion of the batch of precursor material into a boat configured for introduction into a material processing apparatus;
Connecting a tag to a boat
&Lt; / RTI &gt; A method of packaging a precursor material for use in a material deposition process. The method of claim 1,
Determining the purity profile of the arrangement of precursor materials and / or;
And determining the vaporization profile of the batch of precursor material. 2. The method of claim 1, wherein analyzing the one or more characteristics comprises analyzing the amount of at least one solvent in the sample of the batch of precursor material. The method of claim 1, wherein analyzing the one or more characteristics comprises analyzing the amount of one or more impurities in the sample of the batch of precursor material. 3. The method of claim 1, wherein analyzing the one or more characteristics comprises analyzing the purity of the precursor material in a sample of the batch of precursor material. The method of claim 1, wherein determining the profile comprises elucidating one or more spikes at a pressure associated with the boiling point of at least one solvent in the arrangement of precursor materials. 2. The method of claim 1, wherein determining the profile of the arrangement of precursor materials comprises processing a sample of the arrangement of precursor materials in a calibration device configured to process the precursor material according to a standardization process. 8. The method of claim 7, wherein determining the profile of the arrangement of precursor materials comprises identifying variations from predicted results for processing the precursor material according to a standardization process. 9. The method of claim 8, wherein identifying a variation from a predicted result comprises identifying a variation between an actual pressure profile of a sample of the batch of precursor material and a standard pressure profile for the precursor material. 9. The method of claim 8, wherein identifying a variation from a predicted result includes identifying a variation between actual characteristics of the film deposited by the correction device and corresponding standard features of the deposited film using the precursor material / RTI &gt; 11. The method according to any one of claims 1 to 10, wherein storing the profile on the tag comprises storing the profile on a radio frequency identification (RFID) tag or optically scanable element. 11. The method according to any one of claims 1 to 10, wherein connecting the tag to the boat comprises securing the tag to the boat. A system for making a batch of precursor material for packaging,
A profiling element to obtain a profile for the placement of the precursor material;
A programming element for storing the data corresponding to the profile on a tag to be packed with a quantity of precursor material from the batch; And
Packing elements for packaging a quantity of precursor material and tags from a batch into a boat
&Lt; / RTI &gt; The system of claim &lt; RTI ID = 0.0 &gt; 1, &lt; / RTI &gt; 14. The system of claim 13, wherein the profiling element is configured to identify one or more impurities in the arrangement of precursor materials. 15. The system of claim 14, wherein the profiling element is further configured to identify an amount of one or more impurities in an arrangement of precursor materials. 16. The system according to any one of claims 13 to 15, wherein the programming element is configured to store data corresponding to the profile on a radio frequency identification (RFID) tag or optically scanable element. 16. Method according to any one of claims 13 to 15, characterized in that the programming element
The purity of a quantity of precursor material; And / or
Vaporization profile for a given amount of precursor material
And to store data corresponding to the data. A method of processing a precursor material to deposit a polymer film on a substrate,
Inserting a tag that holds data corresponding to a profile corresponding to the precursor material in the boat into the vessel connected to the vaporization chamber of the material vapor deposition apparatus;
Communicating data from the tag to the material deposition apparatus;
Vaporizing the precursor material in the boat using material deposition equipment according to the data stored by the tag
Wherein the precursor material is processed to deposit a polymer film on a substrate. 19. The method of claim 18, further comprising generating a profile based on data from the tag, wherein the profile is used to control the vaporization of the precursor material. 20. The method of claim 19, wherein generating a profile includes modifying a standard vaporization profile based on data from the tag. 21. The method of claim 20, wherein generating the profile comprises comparing an amount of one or more components of a quantity of the precursor material to a standard quantity of one or more components of the standard precursor material. 22. The method of claim 21 wherein comparing comprises comparing the amount of one or more impurities in a quantity of precursor material to a standard quantity of at least one impurity in the standard precursor material. 24. The method of claim 22, wherein the comparing comprises comparing the amount of one or more solvents in a quantity of precursor material to a standard quantity of at least one solvent in the standard precursor material. 24. The method according to any one of claims 19 to 23, wherein generating a profile is performed by a data processing element of a material vapor deposition apparatus or a material deposition apparatus. A container for a packaged precursor material comprising a quantity of precursor material and a tag holding data corresponding to a purity profile of the quantity of precursor material;
A reader configured to obtain data from a tag held by a boat and generate a signal to hold the data;
A data processing element configured to receive a signal from the reader and configured to generate a vaporization profile based on the data held by the signal and to control the vaporization of a quantity of the precursor material according to the vaporization profile; And
A material processing component coupled to the vessel and configured to operate under the control of a data processing element
And a deposition chamber. 26. The material deposition apparatus of claim 25, wherein the data comprises a vaporization profile. 26. The material deposition apparatus of claim 25, wherein the data comprises a purity profile for a quantity of precursor material. 28. The apparatus of claim 27, wherein the data processing element is programmed to generate a vaporization profile for a quantity of precursor material based on a purity profile. 28. The material deposition apparatus of claim 27, wherein the data processing element is programmed to modify a standard vaporization profile for a standard precursor material corresponding to a quantity of precursor material based on a purity profile. 30. A material depositing apparatus according to any one of claims 25 to 29, wherein the predetermined amount of precursor material comprises a predetermined amount of poly (p-xylylene) precursor.
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5151478A (en) * 1991-08-15 1992-09-29 Exxon Research And Engineering Company Highly conducting organic polymer thin film coatings
KR20050017988A (en) * 2003-08-12 2005-02-23 한국표준과학연구원 Carbon Impurities Formating Diagnose Method For Plasma Enhanced Organic Metal Chemical Vapor Deposition Process And A Diagnose Device Thereof
KR20050044797A (en) * 2005-02-04 2005-05-12 어플라이드 마이크로스트럭쳐스, 인코포레이티드 Apparatus and method for controlled application of reactive vapors to produce thin films and coatings
US20110297306A1 (en) * 2007-12-19 2011-12-08 Abbott Laboratories Method for molding an object containing a radio frequency identification tag

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5820678A (en) * 1997-05-30 1998-10-13 The Regents Of The University Of California Solid source MOCVD system
IL158402A0 (en) * 2001-06-06 2004-05-12 Basf Corp Method of making a polymer from a polymer precursor composition
WO2007147020A2 (en) * 2006-06-15 2007-12-21 Advanced Technology Materials, Inc. Cobalt precursors useful for forming cobalt-containing films on substrates
WO2013106450A1 (en) * 2012-01-10 2013-07-18 Hzo, Inc. Precursor supplies, material processing systems with which precursor supplies are configured to be used and associated methods

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5151478A (en) * 1991-08-15 1992-09-29 Exxon Research And Engineering Company Highly conducting organic polymer thin film coatings
KR20050017988A (en) * 2003-08-12 2005-02-23 한국표준과학연구원 Carbon Impurities Formating Diagnose Method For Plasma Enhanced Organic Metal Chemical Vapor Deposition Process And A Diagnose Device Thereof
KR20050044797A (en) * 2005-02-04 2005-05-12 어플라이드 마이크로스트럭쳐스, 인코포레이티드 Apparatus and method for controlled application of reactive vapors to produce thin films and coatings
US20110297306A1 (en) * 2007-12-19 2011-12-08 Abbott Laboratories Method for molding an object containing a radio frequency identification tag

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