KR101587260B1 - Apparatus for pellicle membrane and methods fabricating pellicle using the same - Google Patents

Abstract

The present invention relates to an apparatus for manufacturing a membrane membrane of a pellicle for a large-sized mask, and more particularly to a pellicle membrane manufacturing apparatus for producing a pellicle membrane by rotational driving, comprising a substrate support having a stage for receiving a pellicle membrane raw material, .

According to the present invention, there is provided a manufacturing apparatus for producing a pellicle membrane membrane, comprising a stage for containing a pellicle membrane raw material and a gas flow blocking film for suppressing air flow around the stage, It is possible to control the outline portion of the membrane membrane, thereby maximizing the effective area of the pellicle membrane that can be practically used.

The pellicle membrane, the substrate support,

Description

TECHNICAL FIELD The present invention relates to a pellicle membrane producing apparatus and a pellicle membrane manufacturing method using the same.

The present invention relates to an apparatus and a method for producing a membrane membrane of a pellicle for a large mask.

Conventionally, in the production of a semiconductor device such as LSI, super LSI, or liquid crystal display device, a semiconductor wafer or a liquid crystal original plate is irradiated with light and patterned. In this case, if dust is attached to the used original plate, The dust absorbs light or reflects light, resulting in a problem of deteriorating the performance of a semiconductor device or a liquid crystal display device or the product ratio to a raw material for production. For this reason, although these operations are usually performed in a clean room, it is difficult to maintain the exposure plate always at a normal state even in this clean room. Therefore, a pellicle for passing the light for exposure, A method of attaching a metal plate is carried out. In this case, since the dust adheres to the pellicle film without directly adhering to the surface of the exposure disk, if the focus is set on the pattern of the exposure plate at the time of lithography, the dust on the pellicle becomes irrelevant to the transfer. Therefore, it is generally preferable to form the pellicle so as to have the maximum transmittance with respect to the normal incident light, and therefore, it is the most important problem to secure a uniform transmittance.

Particularly, a fluorine polymer or a modified cellulose is generally used as a membrane membrane agent used in a large diameter pellicle for a large liquid crystal display device (LCD, etc.). These membrane materials have advantages such as high light transmittance, tensile strength and light resistance. In order to be applied to a large-diameter pellicle, it is necessary to have a uniform optical characteristic (transmittance) at the whole surface. To this end, the thickness of the membrane membrane used in the pellicle must be uniformly controlled.

Conventional methods for large-area coatings have mainly developed slit coatings and spin coatings in connection with the coating of photoresist for LCDs, and there are a number of conventional techniques related thereto. Among the existing technologies, the slit coating has an advantage that the amount of the coating solution can be reduced, but it is difficult to uniformly control the thickness, and it is difficult to remove the foreign matters when the foreign matters are generated. Thus, the manufacture of the pellicle membrane It is difficult to apply. However, it is relatively easy to control the thickness uniformly, and even if foreign matter is generated, it is pushed by the centrifugal force due to the centrifugal force in the coating process, so that it is suitable for producing a membrane film for a pellicle relatively Do.

Referring to FIG. 1A, a method of manufacturing a pellicle film using a conventional spin coating apparatus will be described.

Generally, spin coating is performed by spraying a coating liquid (R) on a substrate (10) as shown in FIG. 10 (a) and rotating the coating liquid at an appropriate angular velocity to form a coating as shown in FIG. When the solvent is volatilized through drying, a uniform thin film can be obtained on the whole surface, and the thin film can be taken out and used as a film for pellicle.

However, as the substrate is enlarged in the spin coating process, the difference in linear velocity between the central portion C1 and the outer portion C2 becomes larger. When the size of the substrate is larger than a predetermined size, the liquid in the outer portion is dried Quot; P "portion shown in the drawing (c).

Thereafter, the coating liquid in the center portion is pushed back and the form as shown in FIG. 5 (d) is repeated. Through this repetition, as shown in FIG. 5E, the coating liquid is repeatedly dried at the outer frame portion after coating, and then dried repeatedly after the layer coating, resulting in thickening of the coating film finally. That is, the film portion P having a thicker thickness is formed at the outer portion, and the film portion Q having a thin thickness is formed at the central portion, resulting in an uneven film thickness.

These problems are inevitable in large spin coating, but the problem of thickness deviation is not very important, or coating of opaque material is not so serious. On the other hand, coatings that are transparent and thick in thickness, such as pellicles, become a serious problem.

In order to solve this problem, in order to solve this problem, in order to solve this problem, a very large substrate having a necessary size or more is used. In order to solve this problem, (Q) except for a substantial part of the membrane layer for the pellicle.

That is, in spin coating, the thickness of the coating liquid is inevitably thickened at the corners where gas, liquid, and solid meet, resulting in unevenness (FIG. Further, as the size of the pellicle membrane increases, additional unevenness is generated. A large difference in linear velocity between the central portion and the outer peripheral portion during large-scale spin coating causes a concentric circular pattern to be generated in the radial direction (FIG. Particularly, this problem becomes a serious problem because a rectangular substrate is used as a substrate for coating a membrane film for a pellicle. The circular substrate is easy to coat, but the pellicle film is difficult to manufacture and is not used. The rectangular substrate has a different radius in the direction of the long side and the short side, and thus the thickness at the corner part is different and the speed at the corner part is first dried. As a result, the coating solution is re- There arises a problem that the thickness of the corner portion becomes thick. In the case of a rectangular plate, there is a problem that the thickness variation during coating causes a pressure difference between the upper part and the lower part of the plate, thereby further accelerating the volatilization of the upper part by the Bernoulli effect, thereby widening the uneven part (FIG.

SUMMARY OF THE INVENTION The present invention has been conceived to solve the above problems, and it is an object of the present invention to provide a pellicle membrane membrane producing apparatus, which comprises a stage for containing a pellicle membrane raw material and a gas flow blocking membrane for suppressing air flow around the stage , A manufacturing apparatus and a manufacturing method of a film which can eliminate a variation in thickness in a film structure that is to be enlarged and control the outer peripheral portion unevenness of the film.

In order to solve the above-described problems, the present invention provides a substrate processing apparatus comprising: a substrate support having a stage for manufacturing a pellicle film by rotational driving, the stage for containing a raw material of a pellicle film; And a gas flow blocking film formed on the substrate support.

Particularly, the stage formed on the substrate support is characterized by being formed in a protruding shape or an impingement shape.

Further, the gas flow blocking film in the present invention is formed as a protruding structure spaced apart from the stage and formed on the substrate support surface at least one or more. In this case, the gas flow blocking film may be formed as a structure integrally connected with the structure surrounding the outer periphery of the stage, or may be formed such that the separable partition walls are sequentially spaced apart from each other by surrounding the periphery of the stage.

In particular, when the gas flow blocking film is arranged in a separated structure, the gas flow blocking film may be arranged to form a certain angle with the outer side of the stage, and the angle is preferably formed corresponding to the rotating direction of the stage.

It is possible to manufacture a pellicle film having uniform thickness by supplying the raw material of the pellicle film to a protruding or embedding type stage provided on a substrate support which is rotatably driven by using the above-described manufacturing apparatus, and driving the stage to rotate.

In this case, when the substrate support is rotationally driven, a gas flow blocking film for blocking the flow of air is preferably disposed on the upper surface of the substrate support spaced apart from the stage to suppress air flow above the stage.

According to the present invention, there is provided a manufacturing apparatus for producing a pellicle membrane membrane, comprising a stage for containing a pellicle membrane raw material and a gas flow blocking film for suppressing air flow around the stage, It is possible to control the outline portion of the membrane membrane, thereby maximizing the effective area of the pellicle membrane that can be practically used.

Particularly, the gas flow shielding film of the stage that rotates and drives the flow of air at the upper part of the stage is blocked to prevent the coating liquid from drying rapidly at the edge of the film, thereby efficiently removing the stain at the corner portion.

Hereinafter, the configuration and operation according to the present invention will be described in detail with reference to the accompanying drawings.

2A and 2B are a schematic exploded perspective view and a cross-sectional view (A-A ') of a pellicle membrane production apparatus as a preferred embodiment according to the present invention.

Referring to FIGS. 2A and 2B, the present invention includes a substrate support 110 having a stage 120 for receiving a pellicle film raw material, and a gas flow blocking film 130 formed on the substrate support. The apparatus may further include a driving unit M for rotating the substrate support, and may further include a raw material supply unit (not shown) for supplying a raw material of the pellicle film to the stage.

The substrate support 110 is basically a component that rotates the entire surface of the substrate support and forms a film by coating the source material of the supplied pellicle film uniformly over the entire surface of the substrate support. It is apparent that the shape of the substrate support can be formed in a circular or rectangular shape, and the shape thereof can be variously implemented.

In the present invention, a stage 120 protruding or impinging on the upper surface of the substrate support 110 is provided, and the raw material of the pellicle film is introduced into the stage. Accordingly, the raw material of the pellicle film flowing into the stage according to the rotation of the substrate supporting stage 120 is uniformly distributed on the stage surface.

In addition, on the top surface of the substrate support 110 of the present invention, a gas flow shielding film 130 as an air flow shielding film is provided in order to improve the above-mentioned stains due to the rotation speed difference of the edge portion of the stage by fast rotation of the substrate support do. The gas flow blocking layer 130 may be spaced apart from the outer periphery of the stage at a predetermined interval or may be formed at the distal end of the stage. The gas flow blocking layer 130 suppresses the flow of air at the upper portion of the stage to suppress rapid drying of the coating liquid at the edge portion of the stage, thereby realizing the effect of reducing stains due to the problems of the prior art. Although the gas flow blocking layer 130 is formed of a single structure that surrounds the stage as an integral structure, the gas flow blocking layer 130 may include a plurality of gas flow blocking layers themselves and may be sequentially disposed on the outer periphery of the stage. The height of the gas flow blocking film may be different.

In particular, in the present invention, the stage can be formed in a protruding shape or a dipping shape, and in particular, when the coating liquid is formed in a dipping shape, the coating liquid is naturally pushed out to the outer portion X of the stage, The effect becomes excellent.

When the stage is formed in an impregnation type and the gas flow blocking film 130 is provided on the outer periphery of the stage, the gas flow blocking film 130 may be formed so as to surround the stage integrally with the barrier rib structure as shown in FIG. 2A .

3A to 3C, a manufacturing apparatus according to another embodiment of the present invention will be described. FIG. 3A is a perspective view of another embodiment according to the present invention, FIG. 3B is a plan view for explaining a case where the gas flow blocking film of FIG. Fig.

This basically shows that the stage 120 is formed on the substrate support 110 and at least one gas flow blocking film 130 is formed on the outer side of the stage 120 in a detachable manner.

When the gas flow blocking film 130 is disposed in a detachable manner, the separating unit 131 may be provided between the respective structures, and the separating unit 131 may be formed such that one end portion of the structure is shifted by a certain distance . This means that when the two gas flow blocking films 130a and 130b are taken into consideration, the corner portions facing each other are formed to have a structure in which one of the corresponding portions protrudes. This is advantageous in that the coating liquid passing through the separating part 131 along the protruding corner part can serve as a guiding line for allowing the coating liquid to flow out naturally.

In this case, as shown in FIG. 3B, the gas flow blocking film 130 may be disposed at a certain angle to the direction in which the substrate support 110 rotates, and this is because the coating liquid pushed out of the stage 120 is separated from the gas flow blocking film 130 to be smoothly pushed out through the separator 131. That is, the gas flow blocking layer 130 may be formed at an oblique angle such that the gas flow blocking layer 130 is disposed perpendicular to the substrate support surface, but may be arranged at a predetermined angle with the outer edge of the stage. This angle can be arranged as shown so as to correspond to the rotation direction of the substrate support, that is, to widen toward the rotation direction. This inclined arrangement can realize a more efficient structure in which the gas can flow naturally through the gas flow blocking film and be discharged through the separating unit according to the rotation.

Referring to FIG. 3C, this is an embodiment in which the gas flow blocking film 130 is formed in another arrangement. In this case, the respective gas flow blocking films 130 may be formed in a line and sequentially spaced apart from each other. However, as shown in the figure, the gas flow blocking effect may be formed through a geometrical arrangement. It can be further maximized. In this case, the point where the separating portion 131 is formed may form a corresponding structure uniformly as shown in FIG. 2B, but more preferably, the corresponding corner between the gas flow blocking films The portion Y can be used as a guide line so that the coating liquid pushed out of the stage can be efficiently discharged by arranging the portion Y as shown in Fig. 2A.

4A and 4B show an example in which the stage according to the present invention is formed in a protruding shape. FIG. 4A is an exploded perspective view of the present embodiment, and FIG. 4B is a sectional view of A-A '.

In this case, it is obvious that the modified embodiment of the gas flow blocking film described above in FIGS. 2A to 3C can be applied as it is, except that the stage 120 is formed in a protruding shape on the surface of the substrate support 110 something to do.

FIG. 5A illustrates another embodiment of the present invention in which the substrate support is formed in a disk shape. In this case, the arrangement of the gas flow blocking film can form the arrangement according to FIGS. 2A to 3B on the substrate support object , The stage may be formed in a protruding shape or an imprinting shape. As shown in FIG. 5B, it is also possible to form the device body flow blocking film as a barrier structure having a curved shape arranged along the circumference according to the shape of the disk.

3A and 3C, it is possible to arrange the partition structure in such a manner that the partition structure can be deformed and arranged in a manner similar to that of the portion Y in Fig. 3A It is also possible to arrange it.

It is preferable that the pellicle membrane production apparatus according to the present invention further comprises a structure having a lid of a closed structure for covering the entire device even in the shape of any of the embodiments. This makes it possible to maximize the function of the gas flow blocking film which minimizes the influence of the external environment and further prevents the air flow.

In the foregoing detailed description of the present invention, specific examples have been described. However, various modifications are possible within the scope of the present invention. The technical idea of the present invention should not be limited to the embodiments of the present invention but should be determined by the equivalents of the claims and the claims.

1A and 1B are conceptual diagrams for explaining problems of a manufacturing apparatus according to the prior art.

2A and 2B are a perspective view and a cross-sectional view showing a pellicle membrane production apparatus as one embodiment of the present invention.

3A to 3C are a perspective view and a cross-sectional view showing a pellicle membrane production apparatus as another embodiment of the present invention.

FIGS. 4A and 4B and FIGS. 5A and 5B are views showing a manufacturing apparatus as another embodiment of the present invention.

Claims (10)

A pellicle membrane is produced by rotational drive, A substrate support having a stage for receiving a source of pellicle membranes; And And a gas flow blocking layer formed on the substrate supporter as a plurality of barrier rib structures, Wherein the plurality of barrier structures have a rectangular shape, The rectangular partition walls are spaced apart from each other to form a separation portion that serves as a coating solution outflow path, The spacing of the diaphragm structures on each side, Another end of the adjacent barrier structure is positioned in the end of one barrier structure so that the separating portion is formed in the rotation direction of the stage, Another adjacent barrier structure end is located within the other barrier structure end, Wherein the rectangular barrier rib structures are staggered as a whole. The method according to claim 1, Wherein the stage is formed in a protruding shape or an impinging shape. The method according to claim 1, Wherein the plurality of barrier structures are arranged at an angle with the outer sides of the stage. 4. The method according to any one of claims 1 to 3, Wherein the pellicle membrane production apparatus further comprises a cover structure on the outside in an enclosed structure. delete delete delete delete delete delete

Images