KR101538939B1 - Agent for cleaning conductive member for fabricating organic light emitting diode display device and cleaning method using the same - Google Patents

Abstract

The present invention discloses a conductive member cleaning liquid used in an organic electroluminescent display device manufacturing process and a cleaning method using the conductive member cleaning liquid. The cleaning solution of the present invention comprises an alkali salt, a water-soluble organic acid salt, an inhibitor, an organic additive and an emulsifier, wherein the organic additive comprises triethylene glycol monobutyl ether (BTG), the emulsifier is triethanolamine (TEA) The organic and inorganic materials attached to the conductive member used in the manufacturing process of the organic light emitting display device can be removed.
The conductive member cleaning liquid used in the manufacturing process of the organic electroluminescence display device according to the present invention can be treated as a single process by using one solution for cleaning the organic material and the inorganic material attached to the conductive member used in the manufacturing process , It is possible to improve the productivity, reduce the cost, and clean it more efficiently.

Description

TECHNICAL FIELD [0001] The present invention relates to a conductive member cleaning liquid used in an organic electroluminescent display device manufacturing process, and a cleaning method using the conductive member cleaning liquid.

The present invention relates to a conductive member cleaning liquid used in an organic electroluminescence display device manufacturing process and a cleaning method using the conductive member cleaning liquid. More particularly, the present invention relates to an organic electroluminescent display device capable of effectively cleaning organic plating materials and cleaning inorganic deposition materials with one solution To a conductive member cleaning liquid used in a manufacturing process of a light emitting display and a cleaning method using the same.

In recent years, as the information age has come to a full-fledged information age, a display field for visually representing electrical information signals has been rapidly developed. In response to this, various flat panel display devices having excellent performance of thinning, lightweighting, Flat Display Device) has been developed to replace CRT (Cathode Ray Tube).

Among such flat panel display devices, an organic light emitting diode (OLED) display device is a self-luminous device and can be lightweight and thin because a separate light source used in a liquid crystal display device, which is a non-light emitting device, is not required. In addition, it has superior viewing angle and contrast ratio compared with liquid crystal display devices, is advantageous in terms of power consumption, can be driven by DC low voltage, has a quick response speed, is resistant to external impacts due to its solid internal components, It has advantages.

Generally, the step of forming such an organic light emitting display device includes a deposition and patterning process of various materials on a substrate, and a conductive member such as a metal mask is used for the deposition and patterning process. The metal mask used in the deposition and patterning process may be contaminated with an organic material or the like and may cause defects in the organic light emitting display device. Therefore, a cleaning process of the metal mask is further required.

In addition, organic masking and an inorganic mask are separately used as an organic electroluminescent display device mask is improved. However, a method of depositing an organic layer and an inorganic layer using the same mask has been developed. However, even when the organic layer and the inorganic layer are deposited using the same mask, there is a problem in that the organic cleaning and inorganic cleaning must be separately performed when the conventional mask cleaning liquid is used for cleaning the mask.

The present invention provides a conductive member cleaning liquid for use in a manufacturing process of an organic electroluminescence display device capable of performing a single process treatment by using one solution for cleaning organic deposition materials and inorganic deposition materials of a conductive member used in a manufacturing process, There is a purpose.

The present invention also provides a conductive member cleaning liquid for use in an organic electroluminescent display device manufacturing process capable of improving productivity and decreasing cost by cleaning an organic material and an inorganic material attached to a conductive member by a single process There is another purpose.

Another object of the present invention is to provide a conductive member cleaning liquid used in an organic electroluminescent display device manufacturing process which can be more efficiently cleaned.

In order to solve the problems of the prior art, the cleaning liquid of the present invention comprises an alkali salt, a water-soluble organic acid salt, an inhibitor, an organic additive and an emulsifier, and the organic additive includes triethylene glycol monobutyl ether (BTG) Wherein the emulsifier includes triethanolamine (TEA), and is capable of removing organic and inorganic materials attached to a conductive member used in an organic light emitting display device manufacturing process.

The conductive member cleaning liquid used in the manufacturing process of the organic electroluminescence display device according to the present invention is characterized in that the cleaning of the organic deposition material and the inorganic deposition material of the conductive member used in the manufacturing process is performed by using a single solution, It is effective.

In addition, the conductive member cleaning liquid used in the manufacturing process of the organic electroluminescence display device according to the present invention can be manufactured by cleaning the organic material and the inorganic material attached to the conductive member by a single process, thereby improving the productivity and decreasing the cost There are two effects.

In addition, the conductive member cleaning liquid used in the manufacturing process of the organic electroluminescence display device according to the present invention has a third effect that can be more efficiently cleaned.

1 is a view for explaining a cleaning method using a cleaning liquid according to an embodiment.

Hereinafter, the present invention will be described in more detail with reference to Examples. These examples are for further illustrating the present invention, and the scope of the present invention is not limited by these examples.

The process of forming an organic electroluminescent display includes a process of depositing and patterning various materials on a substrate. In particular, in order to form the organic light emitting display device, an organic light emitting pattern for generating light such as red, green, and blue light must be formed on the substrate. In addition, a metal electrode pattern such as a cathode of the organic light emitting diode must be formed on the substrate. At this time, a metal mask is disposed on the substrate, and the organic light emitting element pattern, the electrode pattern, or the like is formed using the metal mask.

The metal mask is a conductor and is made of inbar or stainless steel. The metal mask has a plurality of hole patterns corresponding to the organic light emitting element patterns. The metal mask may be used many times to form an organic light emitting pattern, and may be used in many cases to form an electrode pattern.

At this time, an organic material such as a material used as the organic light emitting pattern may adhere to the metal mask, or an inorganic material such as a material used as the electrode pattern may adhere to the metal mask, thereby causing defects in the fabrication of the organic light emitting display. That is, an organic material or an inorganic material may be adhered to form an organic luminescent pattern different from a pattern to be formed on the substrate, and an organic layer and an inorganic layer may be laminated when the electrode pattern is formed.

Examples of the organic material may include an organic light emitting material, a residue of a photoresist used to manufacture the metal mask, a residue of a tape used to package the metal mask, a residue that may be attached during movement or cleaning, and the like . In addition, examples of the inorganic material may be a material formed in an electrode pattern or the like. In addition, various organic or inorganic materials may be attached to the metal mask.

The conductive member cleaning liquid used in the manufacturing process of the organic electroluminescence display device according to the present invention is an aqueous solution containing an alkali salt, a water-soluble organic acid salt, an inhibitor, an organic additive, and an emulsifier and water. The conductive member used in the manufacturing process of the organic light emitting display may be a metal mask used to form an organic light emitting pattern or an electrode pattern. In addition, the conductive member may be made of invar or stainless steel.

The alkali salt includes at least one of a hydroxide, a carbonate, a silicate or a phosphate. Where the salt may refer to an alkaline metal such as sodium, potassium or the like or an alkaline-based metal such as calcium and barium. The salt may also refer to ammonium and the like.

The alkali salt enables the conductive member cleaning liquid used in the manufacturing process of the organic electroluminescence display device according to the present invention to treat organic and inorganic materials. For example, even when the inorganic substance is a metal or an oxidized metal in the air, the cleaning liquid can be all treated.

The cleaning liquid may contain an alkali salt of 50 g / L or more. For example, the cleaning liquid may contain an alkali salt of 50 g / L to 200 g / L. Preferably, the cleaning liquid may comprise from 70 g / L to 200 g / L of an alkali salt. More preferably, the cleaning liquid may contain an alkali salt of 90 g / L to 200 g / L.

The water-soluble organic acid salt may include any one selected from the group consisting of citrate, succinate, acetate, glycolate, and gluconate. For example, the water-soluble organic acid salt may include sodium gluconate.

The water-soluble organic acid salt performs a buffer function to prevent the pH of the cleaning liquid from changing abruptly. In addition, the water-soluble organic acid salt additionally removes the organic material and the inorganic material. In addition, the water-soluble organic acid salt can prevent hydroxide precipitation of metal ions, and can perform the function of continuing the cleaning effect of the cleaning liquid.

The cleaning liquid may contain at least 15 g / L of a water-soluble organic acid salt. For example, the cleaning liquid may include a water-soluble organic acid salt of 15 g / L to 50 g / L. More preferably, the cleaning liquid may contain a water-soluble organic acid salt of 30 g / L to 50 g / L.

The phosphor screen prevents the surface of the conductive member from being damaged by corrosion or over-reaction by the cleaning liquid. The phosphorus atom may include a thiourea, a 123-benzotriazole, a pyridine-based compound or an organic cyclic compound. At this time, the pyridine-based compound may be a nitrogen or sulfur compound having a non-covalent electron pair.

The cleaning liquid may contain 1 g / L or more inhibitor. For example, the cleaning liquid may contain the inhibitor of 1 g / L to 40 g / L. More preferably, the cleaning liquid may contain an inhibitor of 5 g / L to 40 g / L.

The organic additive may be a solvent for dissolving organic matter. The organic additive may be selected from the group consisting of N-methyl pyrrolidone (NMP), dimethyl sulfoxide (DMSO), tetrahydrofurfuryl alcohol (THFA), dimethylacetamide ), Dimethylformamide (DMF), Alkanol having 1 to 20 carbon atoms, Alkanol amine having 1 to 20 carbon atoms, and glycol ether. .

The glycol ether may be selected from the group consisting of ethylene glycol monomethyl ether (MG), diethylene glycol monomethyl ether (MDG), triethylene glycol monomethyl ether Ether, Methyl Tri Glycol (MTG), Polyethylene Glycol Monomethyl Ether (MPG), Ethylene Glycol Monoisopropyl Ether (iso-Propyl Glycol, iPG), Ethylene Glycol Monoethyl Ether Butylene glycol monoethyl ether, ethylene glycol monobutyl ether (BG), diethylene glycol monobutyl ether (BDG), triethylene glycol monobutyl ether (BTG), BTG ), Ethylene glycol monoisopropyl ether (iso-butyl glycol, iBG), diethylene glycol moh Diethylene glycol monoisobutyl ether (iso-butyl di glycol, iBDG), ethylene glycol monohexyl ether (Hexyl Glycol, HeG), diethylene glycol monohexyl ether (Hexyl Di Glycol , HeDG), ethylene glycol mono-2-ethylhexyl ether (EHG), diethylene glycol mono-2-ethylhexyl ether (EIG) 2-Ethyl Hexyl Di Glycol, EHDG), ethylene glycol monoallyl ether (Allyl Glycol), ethylene glycol monophenyl ether (Phenyl Glycol, PhG), diethylene glycol monophenyl ether Propylene glycol monomethyl ether (MFG), dipropylene glycol monomethyl ether (Methyl Propylene Di Glycol) (MFDG), diethyleneglycol monophenyl ether (PEDG) , Tripropylene Glycol Monomethyl Ether (MFTG), Propylene Glycol Monobutyl Ether (BFG), Dipropylene Glycol Monobutyl Ether ; Butyl Propylene Di Glycol, BFDG), propylene glycol monomethyl ether acetate tate, Methyl Propylene Glycol Acetate, MFG-AC), and mixtures thereof. Preferably, the glycol ether may be triethylene glycol monobutyl ether.

Preferably, the organic additive may comprise a glycol ether. At this time, the glycol ether may be triethylene glycol monobutyl ether. More preferably, the organic additive may include N-methyl pyrrolidone and glycol ether. At this time, the glycol ether may be triethylene glycol monobutyl ether. At this time, the organic additive may include N-methylpyrrolidone in an amount of 1 wt% to 99 wt%, and glycol ether in an amount of 99 wt% or less and 1 wt% or more with respect to the total organic additive. The organic additive enables the conductive member cleaning liquid used in the organic electroluminescent display device manufacturing process according to the present invention to treat the organic material.

The cleaning liquid may contain at least 100 g / L of an organic additive. For example, the cleaning liquid may comprise from 100 g / L to 500 g / L of an organic additive. Preferably, the cleaning liquid may comprise from 250 g / L to 500 g / L of organic additives. More preferably, the cleaning liquid may comprise from 350 g / L to 500 g / L of an organic additive.

The emulsifying agent may include triethanolamine (TEA) or aminoethylethanolamine (AEEA). Preferably, the emulsifier may comprise triethanolamine. The emulsifier serves as a mediator for mixing the organic additive and the alkali salt. The alkali salt and the organic additive are required to clean the inorganic material and the organic material, respectively, but are not easily mixed. Therefore, by adding the emulsifier, it is possible to mix the organic additive and the alkali salt.

The cleaning liquid may contain at least 50 g / L of emulsifier. For example, the cleaning liquid may contain from 50 g / L to 300 g / L of emulsifier. More preferably, the cleaning liquid may comprise from 70 g / L to 300 g / L of an emulsifier.

The cleaning liquid may further include a surfactant that has excellent emulsifying effect and prevents re-adhesion of the organic and inorganic materials.

The temperature of the cleaning liquid may be 25 占 폚 or higher. For example, the temperature of the cleaning liquid may be 25 ° C to 90 ° C. Preferably, the temperature of the cleaning liquid may be 40 ° C to 90 ° C. More preferably, the temperature of the cleaning liquid may be 50 ° C to 90 ° C.

Preferably, the cleaning liquid is selected from the group consisting of 50g / L to 200g / L potassium hydroxide, 50g / L to 300g / L triethanolamine (TEA), 15g / L to 50g / L sodium gluconate, 1g / L to 40g / L Of triethyleneglycol monobutyl ether, 100 g / L to 500 g / L of triethylene glycol monobutyl ether. More preferably, the organic additive comprises the triethylene glycol monobutyl ether and N-methylpyrrolidone, and the organo-glycol monobutyl ether includes N-methylpyrrolidone in an amount of 50 wt% May be an additive.

The cleaning liquid may be alkaline, and the organic and inorganic materials may be chemically removed by a cleaning liquid.

Hereinafter, a cleaning method using the cleaning liquid will be described with reference to FIG. A description overlapping with the above-described cleaning liquid may be omitted. 1 is a view for explaining a cleaning method using a cleaning liquid according to an embodiment.

Referring to FIG. 1, the cleaning method according to the embodiment may use the cleaning liquid 20. In addition, the cleaning method can clean the conductive member 10 used in the organic electroluminescence display device manufacturing process by using the cleaning liquid 20 and the cleaning device. The cleaning method can be cleaned by electrolysis. The cleaning apparatus includes an electrolytic bath 100, a power supply 200, a terminal 300, and an electrode 400. The cleaning method will be described in more detail as follows.

First, a conductive member 10 used in an organic light emitting display device manufacturing process is provided. For example, the step of providing the conductive member 10 may be performed by disposing the conductive member 10 on a substrate for forming an organic light emitting display device, and using the conductive member 10, A pattern made of the organic material and a pattern made of the inorganic material are sequentially formed. Thereafter, the conductive member 10 is separated from the substrate.

That is, the conductive member 10 used in the manufacturing process of the organic light emitting display device may be a metal mask used for forming an organic light emitting pattern or an electrode pattern. Accordingly, the conductive member 10 may have an organic or inorganic substance attached thereto. In addition, the conductive member 10 may be made of invar or stainless steel.

The washing liquid 20 is filled in the electrolytic bath 100. The cleaning liquid 20 is an aqueous solution containing an alkali salt, a water-soluble organic acid salt, an inhibitor, an organic additive, and an emulsifier and water. At this time, the alkali salt can form conductive ions by electrolysis.

The conductive member 10 may be connected to the terminal 300. The terminal 300 is electrically connected to the power supply device 200 and is connected to the conductive member 10. At this time, the terminal 300 may have a tongue shape. Then, the conductive member (10) is immersed in the cleaning liquid (20).

Further, the electrode 400 is immersed in the cleaning liquid 20. The electrode 400 is electrically connected to the power supply device 200 and can receive a voltage from the power supply device 200. The electrode 400 may be formed of any one selected from the group consisting of iridium oxide, titanium, platinum, and nickel.

The power supply 200 may apply a voltage to the conductive member 10 to be cleaned through the terminal 300. The power supply 200 may apply a voltage to the electrode 400. For example, the power supply 200 applies a negative voltage to the conductive member 10 and applies a positive voltage to the electrode 400. Alternatively, the power supply 200 may apply a positive voltage to the conductive member 10 and apply a negative voltage to the electrode 400.

The power supply 200 may apply a voltage to the conductive member 10 and the electrode 400 to allow current to flow through the conductive member 10 and the electrode 400. At this time, a current having a current density of about 1 to 12 A / dm ² can flow through the conductive member 10 and the electrode 400.

A voltage is applied to the conductive member 10 and the electrode 400 contained in the cleaning liquid 20 and bubbles are generated on the surface of the conductive member 10 when current flows. Organic and inorganic materials attached to the conductive member 10 can be electrolytically cleaned by the bubbles.

More specifically, when negative voltage is applied to the conductive member 10 and a positive voltage is applied to the electrode 400, hydrogen bubbles are generated on the surface of the conductive member 10 as shown in the following Formula 1 do.

[Chemical Formula 1]

2H ⁺ + 2e -> H ₂

Also, oxygen bubbles are generated on the surface of the electrode 400 as shown in the following formula (2).

(2)

_{^{4OH - → 4e + O 2 +}} H 2 O

The organic and inorganic materials attached to the conductive member 10 may be physically removed by the hydrogen bubbles. The organic and inorganic materials attached to the conductive member 10 may be chemically removed by the cleaning liquid 20.

That is, although the organic material and the inorganic material can be removed by immersing the conductive member 10 having the organic material and the inorganic material attached thereto in the cleaning liquid 20, if the electrolytic is used together, have.

For example, when electrolysis is used, it is possible to remove residues of magnesium (Mg) and silver (Ag) which are not easily removed only by immersing them in the cleaning liquid 20. Further, the removal time of the organic material and the inorganic material can be shortened.

Referring to the above formulas (1) and (2), it can be seen that the hydrogen bubbles are generated twice as much as the oxygen bubbles. Therefore, when a negative voltage is applied to the conductive member 10, the organic material and the inorganic material can be removed more efficiently. Since the hydrogen ions are removed from the surface of the conductive member 10, the electrolyte solution adjacent to the surface of the conductive member 10 may have stronger alkalinity than other portions.

Further, ultrasonic waves can be used to shorten the cleaning time during electrolytic cleaning.

Therefore, cleaning of the organic material and inorganic material attached to the conductive member 10 used in the manufacturing process through the cleaning liquid 20 and the cleaning method using the cleaning liquid 20 according to the present invention can be performed by a single process using one solution have. This also improves productivity, reduces costs, and cleans more efficiently.

The embodiments of the present invention may be modified in various forms, and the scope of the present invention should not be construed to be limited by the embodiments described below. The following Experimental Examples 1 to 8 proceeded by immersion washing, and Experimental Examples 9 and 10 were conducted by electrolytic washing.

[Experimental Example 1]

In Experimental Example 1, experiments were conducted under the following conditions according to the above-described embodiment.

First, the cleaning liquid is prepared by dissolving potassium hydroxide (KOH), 200 g / L of aminoethylethanolamine (AEEA) or triethanolamine (TEA), 30 g / L sodium gluconate, 5 g / L inhibitor inhibitor, an organic additive comprising 400 g / L triethylene glycol monobutyl ether (BTG) and N-methyl pyrrolidone (NMP). Here, the concentration of potassium hydroxide was changed as shown in Table 1, and the removal rate of the inorganic material was changed according to the amount of potassium hydroxide added.

Further, the temperature of the cleaning liquid proceeded at 50 占 폚.

A metal mask made of Invar was used as the metal mask, and an aluminum residue was attached to the metal mask.

The results according to Experimental Example 1 in Table 1 were visually observed through SEM equipment. The results are expressed as follows.

○ (Excellent): Aluminum residue removal time is less than 5 minutes

△ (Normal): Aluminum residue removal time exceeds 5 minutes and takes less than 10 minutes

× (poor): It takes more than 10 minutes to remove aluminum residues

sample One 2 3 4 5 6 7 8 9 10 KOH
(g / L) 10 15 20 30 50 70 90 110 130 150 result × × × × △ ○ ○ ○ ○ ○

[Experimental Example 2]

In Experimental Example 2, experiments were conducted under the following conditions in accordance with the above-described embodiment.

First, the cleaning liquid is prepared by dissolving 100 g / L potassium hydroxide (KOH), aminoethylethanolamine (AEEA) or triethanolamine (TEA), 30 g / L sodium gluconate, 5 g / L inhibitor inhibitor, an organic additive comprising 400 g / L triethylene glycol monobutyl ether (BTG) and N-methyl pyrrolidone (NMP). Here, the concentration of aminoethylethanolamine (AEEA) or triethanolamine (TEA) was changed as shown in Table 2, and the change in the removal rate of inorganic substances according to the amount of aminoethylethanolamine (AEEA) or triethanolamine Respectively.

Further, the temperature of the cleaning liquid proceeded at 50 占 폚.

A metal mask made of Invar was used as the metal mask, and an aluminum residue was attached to the metal mask.

The results of Experimental Example 2 in Table 2 were visually observed through SEM equipment. The results are expressed as follows.

○ (Excellent): Aluminum residue removal time is less than 5 minutes

△ (Normal): Aluminum residue removal time exceeds 5 minutes and takes less than 10 minutes

× (poor): It takes more than 10 minutes to remove aluminum residues

sample One 2 3 4 5 6 7 8 9 10 AEEA
(g / L) 10 30 50 70 90 110 150 200 250 300 TEA
(g / L) 10 30 50 70 90 110 150 200 250 300 result × × △ ○ ○ ○ ○ ○ ○ ○

[Experimental Example 3]

In Experimental Example 3, experiments were conducted under the following conditions according to the above-described embodiments.

First, the rinse solution was prepared in the form of an aqueous solution by mixing 100 g / L potassium hydroxide (KOH), 200 g / L aminoethylethanolamine (AEEA) or triethanolamine (TEA), sodium gluconate, 5 g / L inhibitor inhibitor, an organic additive comprising 400 g / L triethylene glycol monobutyl ether (BTG) and N-methyl pyrrolidone (NMP). Here, the concentration of sodium gluconate was changed as shown in Table 3, and the change in the throughput of the inorganic substance with the addition amount of sodium gluconate was experimented.

In addition, the temperature of the cleaning liquid proceeded at 50 占 폚, and the time was maintained for 5 minutes.

A metal mask made of Invar was used as the metal mask, and an aluminum residue was attached to the metal mask.

The results according to Experimental Example 3 in Table 3 were visually observed through SEM equipment. The results are expressed as follows.

○ (Excellent): Removed more than 20g / L of aluminum residue

△ (Normal): Removed less than 10g / L and less than 20g / L of aluminum residue

× (poor): Aluminum residue is removed less than 10 g / L

sample One 2 3 4 5 6 7 8 9 10 SG
(g / L) 5 10 15 20 25 30 35 40 45 50 result × × △ △ △ ○ ○ ○ ○ ○

[Experimental Example 4]

In Experimental Example 4, experiments were conducted under the following conditions according to the above-described embodiments.

First, the cleaning liquid is prepared by dissolving 100 g / L potassium hydroxide (KOH), 200 g / L aminoethylethanolamine (AEEA) or triethanolamine (TEA), 30 g / L sodium gluconate, inhibitor, an organic additive comprising 400 g / L triethylene glycol monobutyl ether (BTG) and N-methyl pyrrolidone (NMP). Herein, the concentration of the inhibitor was changed as shown in Table 4, and the corrosion resistance of the metal mask according to the amount of inhibitor was experimented.

In addition, the temperature of the cleaning liquid proceeded at 50 占 폚, and the time was maintained for 5 minutes.

As the metal mask, a metal mask made of invar is used.

The results of Experimental Example 4 in Table 4 were visually observed through SEM equipment. The results are expressed as follows.

○ (Excellent): Less than 10% of metal mask area is discolored

△ (Normal): Greater than 10% of metal mask area Less than 50% discolored

× (poor): Over 50% of metal mask area is discolored

sample One 2 3 4 5 6 7 8 9 10 inhibitor
(g / L) One 3 5 10 15 20 25 30 35 40 result △ △ ○ ○ ○ ○ ○ ○ ○ ○

[Experimental Example 5]

In Experimental Example 5, experiments were conducted under the following conditions according to the above-described embodiments.

First, the cleaning liquid is prepared by dissolving potassium hydroxide (KOH), 200 g / L of aminoethylethanolamine (AEEA) or triethanolamine (TEA), 30 g / L sodium gluconate, 5 g / L inhibitor inhibitor, an organic additive comprising 400 g / L triethylene glycol monobutyl ether (BTG) and N-methyl pyrrolidone (NMP). Here, the concentration of potassium hydroxide was changed as shown in Table 5, and the change in the throughput of the organic material according to the amount of potassium hydroxide was experimented.

In addition, the temperature of the cleaning liquid proceeded at 50 占 폚, and the time was maintained for 5 minutes.

As the metal mask, a metal mask made of Invar was used. As the metal mask, Alq3 Respectively.

The results of Experimental Example 5 in Table 5 were visually observed through SEM equipment. The results are expressed as follows.

○ (excellent): Alq3 Over 5g / L removed

△ (Normal): Alq3 Less than 3g / L Less than 5g / L removed

× (poor): Alq3 Less than 3g / L removed

sample One 2 3 4 5 6 7 8 9 10 KOH
(g / L) 10 30 50 70 90 110 130 150 170 200 result × × △ △ ○ ○ ○ ○ ○ ○

[Experimental Example 6]

In Experimental Example 6, experiments were conducted under the following conditions according to the above-described embodiments.

First, the cleaning liquid is prepared by mixing 100 g / L potassium hydroxide (KOH), 200 g / L aminoethylethanolamine (AEEA) or triethanolamine (TEA), 30 g / L sodium gluconate, 5 g / L , Organic additives including triethylene glycol monobutyl ether (BTG) and N-methyl pyrrolidone (NMP). Here, the concentration of the organic additive including triethylene glycol monobutyl ether (BTG) and N-methyl pyrrolidone (NMP) was changed as shown in Table 6, and triethylene glycol monobutyl ether (BTG) and N- The change of the throughput of the organic materials according to the addition amount of the organic additive including NMP was experimented.

In addition, the temperature of the cleaning liquid proceeded at 50 占 폚, and the time was maintained for 5 minutes.

As the metal mask, a metal mask made of Invar was used. As the metal mask, Alq3 Respectively.

The results according to Experimental Example 6 in Table 6 were visually observed through SEM equipment. The results are expressed as follows.

○ (excellent): Alq3 Over 5g / L removed

△ (Normal): Alq3 Less than 3g / L Less than 5g / L removed

× (poor): Alq3 Less than 3g / L removed

sample One 2 3 4 5 6 7 8 9 10 Organic additive
(g / L) 50 100 150 200 250 300 350 400 450 500 result × × × × △ △ ○ ○ ○ ○

[Experimental Example 7]

In Experimental Example 7, experiments were conducted under the following conditions according to the above-described embodiments.

First, the cleaning liquid is prepared by mixing 100 g / L potassium hydroxide (KOH), 200 g / L aminoethylethanolamine (AEEA) or triethanolamine (TEA), 30 g / L sodium gluconate, 5 g / L Of an organic additive comprising 400 g / L triethylene glycol monobutyl ether (BTG) and N-methyl pyrrolidone (NMP). Here, the temperature of the cleaning liquid was changed as shown in Table 7, and the removal rate of the inorganic material was changed according to the temperature.

A metal mask made of Invar was used as the metal mask, and an aluminum residue was attached to the metal mask.

The results according to Experimental Example 7 in Table 7 were visually observed through SEM equipment. The results are expressed as follows.

○ (Excellent): Aluminum residue removal time is less than 5 minutes

△ (Normal): Aluminum residue removal time exceeds 5 minutes and takes less than 10 minutes

× (poor): It takes more than 10 minutes to remove aluminum residues

sample One 2 3 4 5 6 7 8 9 10 Temp.
(° C) 15 20 25 30 40 50 60 70 80 90 result × × △ △ △ ○ ○ ○ ○ ○

[Experimental Example 8]

Experimental Example 8 was conducted under the following conditions in accordance with the above-described embodiment.

First, the cleaning liquid is prepared by mixing 100 g / L potassium hydroxide (KOH), 200 g / L aminoethylethanolamine (AEEA) or triethanolamine (TEA), 30 g / L sodium gluconate, 5 g / L Of an organic additive comprising 400 g / L triethylene glycol monobutyl ether (BTG) and N-methyl pyrrolidone (NMP). Here, the temperature of the cleaning liquid was changed as shown in Table 8, and the removal rate of the organic material was experimentally changed according to the temperature.

As the metal mask, a metal mask made of Invar was used. As the metal mask, Alq3 Respectively.

The results according to Experimental Example 7 in Table 7 were visually observed through SEM equipment. The results are expressed as follows.

○ (excellent): Alq3 Removal takes less than 5 minutes

△ (Normal): Alq3 Removal time greater than 5 minutes and less than 10 minutes

× (poor): Alq3 Removal takes more than 10 minutes

sample One 2 3 4 5 6 7 8 9 10 Temp.
(° C) 15 20 25 30 40 50 60 70 80 90 result × × × × △ ○ ○ ○ ○ ○

[Experimental Example 9]

In Experimental Example 9, experiments were conducted under the following conditions according to the above-described embodiments.

First, the cleaning liquid is prepared by mixing 100 g / L potassium hydroxide (KOH), 200 g / L aminoethylethanolamine (AEEA) or triethanolamine (TEA), 30 g / L sodium gluconate, 5 g / L Of an organic additive comprising 400 g / L triethylene glycol monobutyl ether (BTG) and N-methyl pyrrolidone (NMP).

The washing liquid was filled into the electrolytic bath, and the temperature of the washing liquid was 50 DEG C.

As the metal mask, a metal mask made of Invar was used. In the metal mask, aluminum residue and Alq3 Respectively. The metal mask and the terminal were connected, the metal mask and the electrode were immersed in the cleaning liquid, and a voltage was applied. Negative voltage was applied to the metal mask and positive voltage was applied to the electrode.

The aluminum residue and Alq3 adhered to the metal mask started to be decolorized 10 seconds after the start of the cleaning, and 20 seconds later, all of the metal mask was completely removed from the metal mask and the cleaning was completed.

At this time, the aluminum residue and Alq3 were dissolved in the cleaning liquid after the desolvation. The aluminum residue was completely dissolved in the cleaning liquid after 30 seconds from the start of cleaning. Further, the Alq3 was completely dissolved in the cleaning liquid after 3 minutes from the start of the cleaning.

Results according to Experimental Example 9 were visually observed through SEM equipment.

[Experimental Example 10]

In Experimental Example 10, experiments were conducted under the following conditions according to the above-described embodiments.

First, the cleaning liquid is prepared by mixing 100 g / L potassium hydroxide (KOH), 200 g / L aminoethylethanolamine (AEEA) or triethanolamine (TEA), 30 g / L sodium gluconate, 5 g / L Of an organic additive comprising 400 g / L triethylene glycol monobutyl ether (BTG) and N-methyl pyrrolidone (NMP).

The washing liquid was filled into the electrolytic bath, and the temperature of the washing liquid was 50 DEG C.

As the metal mask, a metal mask made of invar is used, and a metal mask includes magnesium (Mg) / silver (Ag) residue and Alq3 Respectively. The metal mask and the terminal were connected, the metal mask and the electrode were immersed in the cleaning liquid, and a voltage was applied. Negative voltage was applied to the metal mask and positive voltage was applied to the electrode.

The removal of magnesium (Mg) / silver (Ag) residue and Alq3 attached to the metal mask started 10 seconds after the start of cleaning, and 3 minutes later, all the metal masks were completely removed and cleaned.

At this time, the magnesium (Mg) / silver (Ag) residue precipitated in the form of powder, and Alq3 was dissolved in the cleaning liquid after the desorption. The Alq3 was completely dissolved in the cleaning liquid after 3 minutes from the start of the cleaning.

The results according to Experimental Example 10 were visually observed through SEM equipment.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is evident that many alternatives, modifications and variations will be apparent to those skilled in the art. You will know that it is possible. For example, each component specifically shown in the embodiments can be modified and implemented. Further, it is to be understood that the scope of the present invention is defined by the appended claims. Therefore, the technical scope of the present invention should not be limited to the contents described in the detailed description of the specification, but should be defined by the claims.

Claims (10)

Potassium hydroxide; Water-soluble organic acid salts selected from the group consisting of citrates, succinates, acetates, glycolates and gluconates; Inhibitors; Organic additives; And an emulsifier,
Wherein the organic additive comprises triethylene glycol monobutyl ether (BTG)
The emulsifier comprises triethanolamine (TEA)
The content of the potassium hydroxide is 70 g / L to 200 g / L,
The content of the water-soluble organic acid salt is 30 g / L to 50 g / L,
Wherein a content of the emulsifier is in the range of 70 g / L to 300 g / L, and the organic substance and the inorganic substance adhered to the conductive member used in the manufacturing process of the organic electroluminescence display device can be removed.
The method according to claim 1,
Wherein the inhibitor comprises 1 g / L to 40 g / L.
delete delete The method according to claim 1,
Wherein the organic additive comprises 100 g / L to 500 g / L.
The method according to claim 1,
Wherein the temperature of the cleaning liquid is 25 占 폚 to 90 占 폚.
The method according to claim 1,
Wherein the organic additive further comprises N-methyl pyrrolidone (NMP).
delete Providing a conductive member having an organic material and an inorganic material attached thereto;
Immersing the conductive member and the electrode in a cleaning liquid; And
Applying a voltage to the conductive member and the electrode,
The cleaning liquid,
Potassium hydroxide; Water-soluble organic acid salts selected from the group consisting of citrates, succinates, acetates, glycolates and gluconates; Inhibitors; Organic additives; And an emulsifier,
Wherein the organic additive comprises triethylene glycol monobutyl ether (BTG)
Wherein the emulsifier comprises triethanolamine (TEA)
The content of the potassium hydroxide is 70 g / L to 200 g / L,
The content of the water-soluble organic acid salt is 30 g / L to 50 g / L,
The content of the emulsifier is preferably from 70 g / L to 300 g / L
A cleaning method capable of removing an organic material and an inorganic material adhered to a conductive member used in an organic electroluminescence display device manufacturing process.
10. The method of claim 9,
Wherein a negative voltage is applied to the conductive member and a positive voltage is applied to the electrode.

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