KR101437692B1 - Maskless exposure apparatus using a plurality of spatial light modultor and method for forming pattern using the same - Google Patents

Abstract

The present invention relates to a maskless exposure apparatus using a plurality of spatial light modulators and a pattern forming method using the same.

The maskless exposure apparatus according to the present invention includes at least one light source, a position information provider for outputting an input signal having a predetermined period as the substrate mounted on the stage moves, A driving pulse generator for generating a plurality of driving pulse signals having different phase differences within a period of the driving pulse signal; And at least two spatial light modulators for sequentially transmitting the spatial light modulator to the substrate.

Maskless exposure apparatus, spatial light modulator, SLM, DMD

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a maskless exposure apparatus using a plurality of spatial light modulators and a pattern formation method using the maskless exposure apparatus. 2. Description of the Related Art Maskless exposure apparatuses using a plurality of spatial light modulators,

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a maskless exposure apparatus, and more particularly, to a maskless exposure apparatus capable of projecting a pattern using a plurality of spatial light modulators and a pattern forming method using the same.

In general, a maskless exposure apparatus is a device that forms a pattern directly on a substrate such as a film, a wafer, or a glass by using light without using a mask. Since the maskless exposure apparatus can form a pattern on a substrate without using a photomask, it is not necessary to produce a mask having a high resolution and a large area, and it is not necessary to replace the mask due to foreign matter or damage.

1 is a configuration diagram of a conventional maskless exposure apparatus.

1, a conventional maskless exposure apparatus 100 includes a spatial light modulator (SLM) 101 for projecting a pattern, a light source 102, a light source unit 103, a pattern information providing unit 104 ), A light projection section 105, and a stage 106.

The spatial light modulator 101 adjusts the angle of the micromirror and selectively reflects light incident from the light source 102 according to a pattern to be formed. The light source 102 provides collimated light to the spatial light modulator 101 and the very small light incident from the light source 102 is converted into a size that can be projected onto the substrate while passing through the light source section 103. The pattern information providing unit 104 receives a drawing of a pattern to be formed by a user, converts the input drawing into information on a pattern, and transmits the converted information to a spatial light modulator 101. The light projection unit 105 includes a light expander, a micro lens array, and a projection lens, and improves the quality of light reflected from the spatial light modulator 101 and projects the light onto the substrate. The stage 106 is where the substrate to be patterned is placed, and the exposure process proceeds while the stage 106 moves in the scanning direction.

Hereinafter, a pattern forming method using the maskless exposure apparatus will be described.

When the user inputs the pattern to be formed on the substrate into the pattern information providing section 104 in the form of a CAD file, the pattern information providing section 104 can receive the input drawing from the spatial light modulator 101 (S110). Then, when the substrate to be patterned is brought into the maskless exposure apparatus and mounted on the stage 106, the stage 106 moves so that the substrate can be aligned at the position where the pattern is projected in the light projection unit 105 (S111). In response to the movement of the stage 106, a position feedback sensor (not shown) using a laser or the like generates a synchronization signal corresponding to the position of the substrate and transmits it to the pattern information providing unit 104 (S112). The pattern information providing unit 104 transmits the generated pattern information to the spatial light modulator 101 (S113). The light source 102 causes the parallel light to enter the spatial light modulator 101 (S114), and the incident light is transmitted toward the substrate according to the angle reflected by each micromirror of the spatial light modulator 101 (S115) . The light reflected by the spatial light modulator 101 passes through the light projection unit 105 and is projected onto the substrate by adjusting the magnification or the pixel size (S116).

The recent FPD (Flat Panel Display) market situation and the printed circuit board (PCB) market situation are largely classified into two types: large size and fixed size. However, when using an exposure apparatus using a single spatial light modulator as in the prior art, it is necessary to move the substrate at a high speed in order to expose a large size substrate. Also, in order to implement a fixed pattern, many pixel data must be transmitted several times. For the above reasons, a spatial light modulator having a very fast driving speed is required if it is desired to realize a high-resolution and high-speed device at the same time.

For example, in order to expose a 2 μm line and space on an LCD substrate (2200 × 2500) using a maskless exposure apparatus, a spatial light modulator having a resolution of 1024 × 768 pixels based on a spatial light modulator of about 96000 frames / A driving speed is required. In addition, the data transmission speed of the apparatus is required to be 24 pixels x 768 pixels x 1 bit x 96000 frames / sec = 76 Gb / sec. That is, considering the fact that the efficiency of effective data is 60% compared to a general data transmission rate, a communication method having a data transmission rate of about 130 Gb / sec is required.

However, the driving speed of the DMD (Digital Micro - mirror Device) used as a spatial light modulator is up to 16300 frames / sec. Therefore, it is required to develop S / W or H / W (PC or Embed Controller) to generate a data transfer rate of 130 Gb / sec. However, it is currently difficult to develop a system capable of driving a high-speed spatial light modulator and computing large amounts of data at high speed.

An object of the present invention to overcome the above problems is to provide a spatial light modulator capable of rapidly forming a pattern by projecting a pattern to an allocated area of a substrate sequentially within a period using a plurality of spatial light modulators And a method of forming a pattern using the maskless exposure apparatus.

According to an aspect of the present invention, there is provided a maskless exposure apparatus including at least one light source, a position information providing unit for outputting an input signal having a predetermined period as the substrate placed on the stage moves, A drive pulse generator for generating a plurality of drive pulse signals having different phase differences within the predetermined period by using the input signal; And at least two spatial light modulators for sequentially transmitting light incident from the light source to the substrate according to information on the pattern.

Accordingly, in using a plurality of spatial light modulators, the drive pulse generator generates a drive pulse signal for controlling the operation timing of the spatial light modulator, each spatial light modulator projects a pattern in synchronization with the drive pulse signal, Each of the spatial light modulators having received the driving pulse signals having different phase differences sequentially operates to increase the driving speed of the spatial light modulator.

It is preferable that the drive pulse generation unit generates the same number of drive pulse signals as the number of the spatial light modulators and transmits one drive pulse signal to each spatial light modulator.

Accordingly, the drive pulse generator generates the same number of drive pulse signals as the number of the plurality of spatial light modulators, and controls the drive pulse signal to generate the plurality of drive pulse signals so that one drive pulse signal can control the operation timing of one spatial light modulator. And transmits only one drive pulse signal to each spatial light modulator, thereby allowing each spatial light modulator to operate at a different point in time, thereby increasing the driving speed of the spatial light modulator.

It is preferable that the plurality of drive pulse signals generated by the drive pulse generator have the same period and the phase difference is an integral multiple of a value obtained by dividing one period by the number of spatial light modulators.

Accordingly, it is possible to set the plurality of drive pulse signals for controlling the operation timing of the spatial light modulator to have the same period so that the entire spatial light modulator can operate within one period, and the same one period is divided by the number of spatial light modulators So that a plurality of spatial light modulators can be sequentially operated at different times even within one period, thereby increasing the driving speed of the entire spatial light modulating unit.

Preferably, each of the spatial light modulators sequentially transmits light incident from the light source to different regions of the substrate according to an input order of the driving pulse signals.

Accordingly, the stage is moved as the plurality of spatial light modulators are mounted in a fixed state and the exposure process proceeds, and each of the spatial light modulators sequentially forms a pattern in an allocated part of the substrate moving together with the stage There is an advantage that the driving speed of the entire spatial light modulating section can be increased.

In addition, it is preferable that at least two of the plurality of spatial light modulators are arranged to face each other.

This makes it possible to compensate for the fact that the amount of light that is incident on the substrate to be projected differs in accordance with the angle at which the light incident from the light source is reflected by the spatial light modulator, There is an advantage.

According to another aspect of the present invention, there is provided a pattern forming method including: a first step of a position information providing unit outputting an input signal indicating a position of a substrate as a substrate placed on a stage moves; A second step of generating a plurality of drive pulse signals having different phase differences within one period using the input signal; A third step of distributing the plurality of drive pulse signals and transmitting different drive pulse signals to a plurality of different spatial light modulators; And a fourth step of causing each spatial light modulator to sequentially project a pattern onto an assigned area of the substrate in synchronization with the drive pulse signal.

Thus, in the case of using a maskless exposure apparatus comprising a plurality of spatial light modulators, the operation timing of each spatial light modulator is controlled by a drive pulse signal, and a plurality of spatial light modulators There is an advantage that the pattern can be formed quickly by causing the pattern to be sequentially projected on the assigned area on the substrate to which the substrate is moved.

In the pattern forming method according to an embodiment of the present invention for realizing the above object, the plurality of drive pulse signals generated by the drive pulse generator have the same period, and the phase difference is an integer of a value obtained by dividing one period by the number of spatial light modulators It is preferable to double.

Accordingly, it is possible to set the plurality of drive pulse signals for controlling the operation timing of the spatial light modulator to have the same period so that the entire spatial light modulator can operate within one period, and the same one period is divided by the number of spatial light modulators So that a plurality of spatial light modulators can be sequentially operated at different points in time even within one period, thereby forming a pattern quickly.

According to another aspect of the present invention, there is provided a method of forming a pattern, the spatial light modulator including a plurality of spatial light modulators, As shown in FIG.

Accordingly, the stage is moved as the plurality of spatial light modulators are mounted in a fixed state and the exposure process proceeds, and each of the spatial light modulators is sequentially moved to an allocated partial area of the substrate moving together with the moving stage There is an advantage that a pattern can be formed quickly by projecting a pattern.

According to the maskless exposure apparatus using the plurality of spatial light modulators according to the present invention and the pattern formation method using the maskless exposure apparatus having the structure described above, it is possible to obtain a plurality of There is an advantage that the spatial light modulator of the spatial light modulator projects the pattern sequentially to the allocated area on the substrate moving at different points of time, so that the pattern can be quickly projected.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a detailed description of preferred embodiments of the present invention will be given with reference to the accompanying drawings. It is to be noted that, in the drawings, reference numerals and like components are denoted by the same reference numerals and signs as possible even if they are shown in different drawings. In the following description of the present invention, a detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear.

2 is a configuration diagram of a maskless exposure apparatus according to an embodiment of the present invention.

2, a maskless exposure apparatus 200 according to an embodiment of the present invention includes a pattern information providing unit 210, a light source unit 220, a spatial light modulating unit 230, a stage 240, A driving pulse generator 260, and a light projector 270. The driving pulse generating unit 260 includes a driving unit 250, a driving pulse generating unit 260,

The pattern information providing unit 210 receives information on a pattern to be formed on the substrate 241 from a user as a CAD file and provides information on the pattern to the spatial light modulators 231 and 232. The user inputs to the position information providing unit 250 information about how to generate an input signal related to the movement of the substrate 241 at a certain interval in advance, and the pattern information providing unit 210 supplies the information Information on a pattern to be transmitted to the spatial light modulator 230 is prepared.

The pattern information providing unit 210 transmits information on the prepared pattern in synchronization with the input signal when an input signal indicating the position of the substrate 241 placed on the stage 240 is transmitted from the position information providing unit 250, To the spatial light modulators 231 and 232, respectively.

For example, in the present invention, one pattern is formed on the substrate 241 by using two spatial light modulators 231 and 232. The information about the entire pattern to be formed includes first sub-pattern information and second sub-pattern information, and the first sub-pattern information corresponding to 1/2 of the total pattern information is transmitted to the first spatial light modulator 231, And provides the second sub-pattern information corresponding to the remaining half of the pattern to be formed to the second spatial light modulator 232.

The light source unit 220 includes a first light source 221 and a second light source 222 for providing light and a fly-eye lens for collimating light incident from the first and second light sources 221 and 222. [ Lens 223 and a condenser lens 224. The condenser lens 224 is a condenser lens. The fly-eye lens 223 generates a secondary light source image on the spatial light modulators 231 and 232 using the light incident from the light source, and the condenser lens 224 generates a light loss in the process of generating the secondary light source image. Thereby making the brightness of the light transmitted to the spatial light modulators 231 and 232 uniform. By using the fly-eye lens 223 and the condenser lens 224, it is possible to convert very small light incident from the light sources 221 and 222 into light having a size that can be projected onto the spatial light modulators 231 and 232. 2, when two light sources 221 and 222 and two spatial light modulators 231 and 232 are used, the first light source 221 causes the collimated light to be incident on the first spatial light modulator 231, The two light sources 222 cause the collimated light to be incident on the second spatial light modulator 232.

The spatial light modulator 230 may include a spatial light modulator 230 for selectively transmitting light incident from the light sources 221 and 222 to the substrate 241 according to information on a pattern provided from the pattern information provider 210, Modulator 231 and a second spatial light modulator 232. The spatial light modulators 231 and 232 may be formed using a DMD (Digital Micro - mirror Device) or an LCD (Liquid Crystal Display). In the DMD, a plurality of micromirrors are maintained at an angle of 0 degree, and when the pressure is applied, the light is inclined at a certain angle, and the incident light is transmitted to a desired angle, and the other light is transmitted at a different angle, do. The LCD selectively transmits only the required light using a plurality of unit liquid crystals.

In FIG. 2, the spatial light modulators 231 and 232 are implemented using a DMD. The spatial light modulators 231 and 232 receive information on the pattern from the pattern information providing unit 210 and operate a micromirror according to the information on the input pattern so as to convert the light incident from the light sources 221 and 222 (241).

For example, according to the present invention, the entire pattern information corresponding to the entire pattern to be formed on the substrate 241 is composed of the first sub pattern information and the second sub pattern information, The sub pattern information is distinguished in that it is information for forming patterns on different regions on the substrate. The entire region of the substrate 241 is composed of a first region and a second region, and the first region and the second region represent different regions on the substrate 241. The first spatial light modulator 231 modulates the first sub-pattern corresponding to the first sub-pattern information among the entire pattern information corresponding to the entire pattern to be formed on the substrate 241, The second spatial light modulator 232 projects a second sub-pattern corresponding to the second sub-pattern information in the entire pattern information to the first sub-pattern corresponding to the entirety of the substrate 242 And the second area corresponding to the remaining half.

In addition, the substrate 241 is seated on the stage 240. The substrate 241 includes all objects for which a predetermined pattern such as a panel or a wafer is to be formed. The stage 240 may further include a stage 242 for scanning the substrate 241 from one side of the substrate 241 to the other side so that light provided from the spatial light modulators 231 and 232 may be scanned along the surface of the substrate 241 from one side of the substrate 241 to the other side thereof. And can be moved in a direction parallel to the upper surface.

The position information providing unit 250 monitors the moving process of the stage 240 and outputs an input signal indicating the position of the substrate 241 as the substrate 241 moves together with the stage 240. [ . The position information providing unit 250 may be formed using a linear encoder or a laser interferometer. In addition, the input signal may be formed of a pulse signal and a sinusoidal signal, and may be generated at regular intervals as the substrate 241 moves. The input signal is transmitted to the drive pulse generating unit 260. The drive pulse generating unit 260 receiving the input signal generates a drive pulse signal for controlling the operation timing of the plurality of spatial light modulators 231 and 232. The input signal is transmitted to the pattern information providing unit 210. The pattern information providing unit 210 receiving the input signal synchronizes information on the pattern with a plurality of spatial light modulators 231 and 232, Lt; / RTI >

The drive pulse generating unit 260 receives a single input signal from the position information providing unit 250 and generates a plurality of drive pulse signals equal to the number of the spatial light modulators 231 and 232, And transmits one drive pulse signal to one spatial light modulator 231, The plurality of drive pulse signals have the same period, but each phase difference is formed to have a different value. The phase difference is set so as to correspond to an integral multiple of a value obtained by dividing one period of the input signal generated by the position information providing unit 250 by the number of the spatial light modulators 231 and 232. The phase difference is adjustable by the user, and the driving pulse signals having the above-described period and phase difference are transmitted to the respective spatial light modulators 231 and 232 to control the operation timing of the respective spatial light modulators 231 and 232.

The light projection unit 270 is disposed at a position adjacent to the upper surface of the substrate 241 to condense the light selectively transmitted by the spatial light modulator 230 and project the light onto the substrate 241. The light projection unit 270 may include a total internal reflection (TIR) 271, a light expander 272, an MLA (Micro Lens Array) 273, and a projection lens 274. The light transmitted from the spatial light modulator 230 is transmitted through the total internal reflection of the TIR 271 to reduce the loss and is expanded to the size of the substrate 241 on which the pattern is to be formed in the light expander 272, (273). When the MLA 273 is adjacent to the upper surface of the substrate, the transmittance of the light may be lowered due to fumes or the like coming from the pattern material, so that the projection lens 274 may be disposed between the MLA 273 and the substrate 241 Respectively.

3 is a configuration diagram of a light source according to an embodiment of the present invention.

3 (a) is a configuration diagram of a light source using a plurality of light sources, and Fig. 3 (b) is a configuration diagram of a light source using one light source.

3 (a), a plurality of light sources (light sources # 1 to #n) and the same number of spatial light modulators (SLM # 1 to SML) as the light sources #n) can be used. When a plurality of light sources (light sources # 1 to #n) are used in this manner, one light source (for example, light source # 1) is directed toward one spatial light modulator (for example, SLM # .

Referring to FIG. 3 (b), in the present invention, one light source may also provide light to a plurality of spatial light modulators SLM # 1 to SLM #n. In this case, a branching module 310 for branching the light provided from one light source is provided. In this way, when one light is branched and used, when light is incident on the branching module 310 from the light source, the branching module 310 divides the incident light into various paths (optical # 1 to optical the plurality of spatial light modulators SLM # 1 to SLM #n are provided to the plurality of spatial light modulators SLM # 1 to SLM #n as in the case of using a plurality of light sources as shown in FIG. SLM #n).

4 is a view for explaining the phase difference of the drive pulse signal generated by the drive pulse generator according to the present invention.

4A is a view for explaining two drive pulse signals for using two spatial light modulators 231 and 232 in accordance with an embodiment of the present invention and FIG. 1 is a diagram illustrating one drive pulse signal for using one spatial light modulator.

4A, the two driving pulse signals 411 and 412 generated by the driving pulse generating unit 260 are inputted to the position information providing unit 250 and the input signal relating to the movement of the substrate 241, But the phase has a 180 degree difference. The phase difference of 180 degrees corresponds to a value obtained by dividing one period Ts by 2, which is the number of the spatial light modulators 231 and 232. The first drive pulse signal 411 is transmitted to the first spatial light modulator 231 and the second drive pulse signal 412 is transmitted to the second spatial light modulator 232, The first and second driving pulse signals 231 and 232 operate in synchronization with the input first and second driving pulse signals 411 and 412, respectively. Only the first spatial light modulator 231 is activated and the second spatial light modulator 232 is operated in the OFF state at the time point 411A when the first drive pulse signal is turned on by the phase difference . On the other hand, when the second drive pulse signal is turned on (412A), the second spatial light modulator 232 operates but the first drive pulse signal is in the OFF state, so that the first spatial light modulator 231 operates .

Referring to FIG. 4B, one drive pulse signal 421 has the same cycle as the input signal regarding the movement of the substrate 241 provided from the position information providing unit 250, and one spatial light modulator 233, .

Referring to FIGS. 4A and 4B, for example, when a total of six sub-patterns are projected to form an entire pattern to be formed on a substrate, two spatial light modulators 231 and 232 ) Is required, a time (T 1) of 3 × Ts is required, whereas a time (T 2) of 6 × Ts is required when one spatial light modulator is used. As described above, the time T1 required for projecting the pattern using the two spatial light modulators 231 and 232 is shorter than the time T2 required for projecting the same number of patterns using one spatial light modulator. . Therefore, it can be confirmed that the driving speed of the entire spatial light modulator is increased when a plurality of spatial light modulators are used.

FIG. 5 is a view for explaining a process of correcting an error of the position information providing unit 250.

In actual exposure processes, it is possible to operate out of the exact point in time when a plurality of spatial light modulators should operate due to a communication delay or spatial light modulator device problem. If such a malfunction of the spatial light modulator occurs, the pattern may not be projected at the correct position to be formed on the substrate 241.

Referring to FIG. 5, a spatial light modulator 510 operating in a normal state and a spatial light modulator 520, 530 generating a malfunction are shown. The spatial light modulators 520 and 530, which malfunction as described above, can not project the pattern onto the substrate 241 at the correct position to be formed on the substrate 241. As an example of such a malfunction, as a result of a communication delay or an error in the mechanical mounting position of the spatial light modulator, the spatial light modulator starts to project the pattern past the starting position of the pattern projection on the substrate 241 Case 520 may occur. In addition, a case 530 may occur where the spatial light modulator begins to project the pattern in advance before reaching the start position of the pattern projection on the substrate 241 due to an error in the mechanical mounting position of the spatial light modulator. An error between the start position of the pattern projection and the current position of the substrate 241 is input to the position information providing unit 250 so that the pattern can be projected on the precise position on the substrate 241 during the malfunction, The position information providing unit 250 corrects the application timing of the driving pulse signal applied to the spatial light modulator 231 and 232 by using the error correcting unit.

6 is a diagram showing an arrangement example of a plurality of spatial light modulators according to the present invention.

Referring to FIG. 6, the amount of energy reaching each point of the substrate 241 varies depending on the reflection angle of the light reflected by the spatial light modulators 231 and 232. Accordingly, in consideration of the entire point of the substrate 241, two spatial light modulators 231 and 232 may be arranged to face each other to compensate for the difference in light quantity. With the arrangement described above, a point where the first spatial light modulator 231 reflects a large amount of light and a point where the second spatial light modulator 232 reflects a large amount of light are symmetrical to each other to provide a uniform amount of light to the entire substrate . Even when two or more spatial light modulators are used, the plurality of spatial light modulators are symmetrically arranged to provide a uniform amount of light to the entire substrate.

7 is a view illustrating a process of forming a pattern on a substrate using a plurality of spatial light modulators according to an embodiment of the present invention.

7, first, the position information control unit 250 controls the position information of the substrate 241, which indicates the position of the substrate 241 at regular intervals, as the substrate 241, which is placed on the stage 240 together with the stage 240, And transmits it to the drive pulse generating unit 260 (S810). The drive pulse generating unit 260 generates a plurality of drive pulse signals having the same period and different phase differences within one period using the input signal (S820). The drive pulse generator 260 distributes the plurality of drive pulse signals and transmits the different drive pulse signals to the different spatial light modulators 231 and 232 (S830). The spatial light modulator having received the drive pulse signal sequentially projects a pattern onto a partial area of the substrate 241 according to the drive pulse signal (S840). That is, after the first spatial light modulator 231 projects the first sub-pattern in the first area of the substrate 241 in accordance with the drive pulse signal, the second spatial light modulator 232 is moved to the second The second sub-pattern is projected onto the region. Thereafter, when there is a point to which a pattern is to be projected on the substrate 241, each of the spatial light modulators 231 and 232 is sequentially transferred to the first and second allocated regions of the substrate 241, The pattern formation process is terminated when no more points are to be projected on the substrate 241 (S850).

As the substrate is irradiated with light as described above, selective exposure is performed to the pattern material coated on the substrate, resulting in a change in the characteristics of the pattern material applied to the substrate. Thereafter, the pattern material can be selectively removed to form a pattern.

While the present invention has been described in connection with what is presently considered to be the most practical and preferred embodiment, it is to be understood that the invention is not limited to the disclosed embodiments, but is capable of various modifications within the scope of the invention. Therefore, the scope of the present invention should not be construed as being limited to the embodiments described, but should be determined by the scope of equivalents to the appended claims, as well as the appended claims.

1 is a configuration diagram of a conventional maskless exposure apparatus.

2 is a configuration diagram of a maskless exposure apparatus according to an embodiment of the present invention.

FIGS. 3A and 3B are schematic diagrams of a light source according to an embodiment of the present invention; FIG.

4A and 4B illustrate examples of the phase difference of the drive pulse signal generated by the drive pulse generator of the present invention.

5 is a diagram for explaining a process of correcting an error of a position information providing unit;

6 is an arrangement view of a plurality of spatial light modulators according to an embodiment of the present invention.

7 is a view illustrating a pattern formation process of a substrate according to an embodiment of the present invention.

Claims (8)

At least one light source; A position information providing unit for outputting an input signal having a predetermined period as the substrate placed on the stage moves; A drive pulse generator for generating a plurality of drive pulse signals having different phase differences within the predetermined period using the input signal; And And at least two spatial light modulators sequentially delivering light incident from the light source to the substrate according to information on a predetermined pattern to be formed on the substrate in synchronization with any one of the drive pulse signals, Wherein the plurality of drive pulse signals comprise: And has a phase difference corresponding to an integral multiple of a value obtained by dividing one period by the number of the spatial light modulators. The driving method according to claim 1, And generates a drive pulse signal equal in number to the number of the spatial light modulators and transmits one drive pulse signal to each spatial light modulator. delete 2. The spatial light modulator of claim 1, And sequentially transmits the light incident from the light source to different areas of the substrate according to an input sequence of the drive pulse signal. 2. The spatial light modulator as claimed in claim 1, At least two of which are arranged to face each other. The position information providing unit outputs an input signal indicating the position of the substrate as the substrate placed on the stage moves; Generating a plurality of drive pulse signals having different phase differences within one period using the input signal; Dividing the plurality of drive pulse signals and transmitting different drive pulse signals to a plurality of different spatial light modulators; And Wherein each spatial light modulator sequentially projects a pattern in an assigned area of the substrate in synchronism with the drive pulse signal, The plurality of drive pulse signals And a phase difference corresponding to an integral multiple of a value obtained by dividing one period by the number of the spatial light modulators. delete 7. The apparatus of claim 6, wherein each spatial light modulator And sequentially transmits the light incident from the light source in different areas allocated to the substrate according to an input order of the drive pulse signals.

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