KR101426885B1 - Flexible Fabric Substrate and manufacturing method thereof - Google Patents

Abstract

The present invention relates to a fabric substrate to block flexible gas, comprising a fabric base material; an adhesive layer coated on the fabric base material; a film laminated on the adhesive layer; and a flattened film laminated on the film and a manufacturing method thereof. According to the present invention, the fabric substrate can form a barrier film having high gas-barrier properties by ensuring excellent smoothness and dimensional stability. The service life of a flexible display element and a flexible lighting element using the fabric substrate can be ensured.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a flexible fabric substrate,

The present invention relates to a flexible fabric substrate and a manufacturing method thereof. To a flexible fabric substrate having improved smoothness, thermal stability and dimensional stability of a fabric substrate so as to enable gas barrier processing, and a method of manufacturing the same.

Flexible Display is a display that can bend, bend or speak without damage through thin, flexible substrates like paper. Such a flexible display mainly uses a plastic film or the like as a substrate, which is advantageous in that it is light, thin, and does not break even when it is impacted. As a result, the display is being adopted as a display for a mobile device. In addition, since it can change the display shape such as bending, it is an industrial field where explosive demand is expected when it spreads to household goods and automobile field.

Most display devices have a device formed on a substrate. Therefore, the substrate must have a high gas barrier property in order to ensure durability of the device.

The glass substrate used as a conventional display substrate is very excellent in gas barrier property against penetration of moisture or oxygen, but it has a problem that flexibility can not be realized.

As a result, stainless steel substrates or plastic films have been applied. However, the stainless steel substrate and the plastic material film are not free from bending or bending, and there is a disadvantage in that the characteristics of the liner and the spindle are insufficient. A lecture or spiral is a characteristic related to the flexibility of a textile fabric. When a flexible display substrate is provided with the same liner or spindle as a textile fabric, a high level of flexibility can be realized.

Further, the plastic film has a gas barrier property, a thermal stability and a dimensional stability remarkably lower than that of a glass substrate. To overcome this problem, a method of forming a gas barrier film by alternately laminating organic-inorganic hybrid layers is widely used. Korean Patent Laid-Open No. 10-2011-0026318 discloses a constitution in which water and gas are blocked by forming a hydrophobic pattern layer on a film substrate.

Even if the gas barrier property through the gas barrier film is compensated, the plastic film substrate has a disadvantage that it is warped only in one direction, and the film substrate of the plastic material having low bending recovery property has no drape characteristic.

In order to compensate for thermal stability and dimensional stability, Korean Patent Laid-Open No. 11-2010-0118220, Japanese Patent Application Laid-Open No. 2004-51960 and the like disclose a method for producing a laminated sheet by impregnating or immersing glass fiber or glass cloth in a polymer resin And a technique for using it. According to this, although the dimensional stability and thermal stability can be improved, the drape characteristic inherent in the fiber disappears and it seems to be limited to be realized in the same place as a three-dimensional curved surface due to the flexibility of one side like a film substrate.

Therefore, studies have been made to apply the flexibility characteristics of fibers to substrates for flexible displays. However, fabric substrates of textile materials are unable to form gas barrier films with high gas barrier properties due to low thermal stability, low dimensional stability (CTE) and low smoothness of the fibers themselves. Therefore, despite its excellent flexibility, it is difficult to utilize it as a substrate.

Korean Patent Publication No. 10-2011-0026318 Korean Patent Publication No. 11-2010-0118220 Japanese Patent Laid-Open No. 2004-51960

Accordingly, it is an object of the present invention to provide a fabrication method and fabric substrate for a flexible gas barrier fabric substrate which can form a gas barrier film for ensuring durability as a flexible display substrate.

It is another object of the present invention to provide a fabrication method of a flexible substrate for fabricating a flexible gas and a fabric substrate which can maintain smoothness inherent to the fabric while improving flatness, thermal stability and dimensional stability of the fabric substrate.

In order to achieve the above-mentioned object, the present invention relates to a fabric substrate, A pressure-sensitive adhesive layer coated on the fabric substrate; A film laminated on the pressure-sensitive adhesive layer; And a planarizing film laminated on the film.

According to one embodiment of the invention, the film is preferably of the same material as the fabric substrate.

According to another embodiment of the present invention, the fabric substrate is selected from the group consisting of a polyethylene terephthalate, a polyethylene naphthalate, a polyethylene, a nylon, and an acryl The fabric can be made of the above material.

According to another embodiment of the present invention, the pressure sensitive adhesive may comprise at least one component selected from the group consisting of an acrylic pressure sensitive adhesive, a urethane pressure sensitive adhesive and a silicone pressure sensitive adhesive.

According to another embodiment of the present invention, the film may be one kind selected from the group consisting of polyethylene terephthalate, polyethylene naphthalate, polyethylene, nylon and acrylic. May be composed of the above components.

According to another embodiment of the present invention, the planarization layer may be formed of a material selected from the group consisting of silane, polyurethane, polycarbonate, acrylate-based polymer, epoxy-based polymer, and amine ) Oligomers and vinyl-based polymers. The term " oligomer "

According to another embodiment of the present invention, the silane is selected from the group consisting of monosilane (SiH ₄ ), disilane (Si ₂ H ₆ ), trisilane (Si ₃ H ₈ ) and tetrasilane ₄ H < ₁₀ >).

According to another embodiment of the present invention, the silane is selected from the group consisting of an epoxy, an alkoxy, a vinyl, a phenyl, a methacryloxy, an amino, Chlorosilane, chloropropyl, chloropropyl, mercapto and the like. The term " functional group "

According to another embodiment of the present invention, the planarization layer further comprises a component having a metal oxide, a non-metal oxide, a nitride or a nitrate structure including at least one element selected from the group consisting of silicon, aluminum, titanium and zirconium .

According to another embodiment of the present invention, it is preferable that the fabric substrate has a laminating degree of 30 to 80 mm and a degree of warp of 100 to 140 °.

In order to achieve the above-mentioned object, the present invention also relates to a method for manufacturing a flexible printed circuit board, comprising: coating a pressure- Laminating a film on a pressure sensitive adhesive coated fabric substrate; Calendering a fabric substrate on which a film is laminated; And coating a flattening film on the film. The present invention also provides a method for fabricating a flexible substrate for a gas barrier.

According to one embodiment of the invention, the film is preferably of the same material as the fabric substrate.

According to another embodiment of the present invention, the fabric substrate is selected from the group consisting of a polyethylene terephthalate, a polyethylene naphthalate, a polyethylene, a nylon, and an acryl The fabric can be made of the above material.

According to another embodiment of the present invention, the pressure sensitive adhesive may comprise at least one component selected from the group consisting of an acrylic pressure sensitive adhesive, a urethane pressure sensitive adhesive and a silicone pressure sensitive adhesive.

According to another embodiment of the present invention, the film is made of one kind selected from the group consisting of polyethylene terephthalate, polyethylene naphthalate, polyethylene, nylon and acryl, May be composed of the above components.

According to another embodiment of the present invention, the planarization layer may be formed of a material selected from the group consisting of silane, polyurethane, polycarbonate, acrylate-based polymer, epoxy-based polymer, and amine ) Oligomers and vinyl-based polymers. The term " oligomer "

According to another embodiment of the present invention, the step of laminating the film is preferably carried out under the conditions of 50 to 150 ° C and 2.0 to 5.0 kg / cm ² .

According to another embodiment of the present invention, calendering is preferably performed at a temperature of 40 to 180 DEG C and 1.5 to 3.5 kg / cm < ² >.

According to another embodiment of the present invention, after the calendering step, the coefficient of thermal expansion (CTE) of the fabric substrate on which the film is laminated on the fabric substrate is preferably 5 to 50 ppm / 占 폚.

According to another embodiment of the present invention, it is preferable that the planarizing film is coated on the film and then cured at 80 to 160 ° C.

The fabric substrate according to the present invention has excellent smoothness and dimensional stability, and can form a gas barrier film having a high gas barrier property. Therefore, the life span of the flexible display device and the flexible lighting device using the fabric substrate according to the present invention can be secured.

In addition, the fabric substrate according to the present invention has high dimensional stability and thermal stability, and it is possible to replace the substrate without changing the conventional display manufacturing process.

Further, the fabric substrate according to the present invention increases the degree of design freedom compared to the conventional flexible substrate, and can be applied to various fields.

Further, the fabric substrate according to the present invention can be applied as a substrate for flexible light such as organic electroluminescence, quantum dot electroluminescence, liquid crystal, flexible display such as electrophoresis layer, organic electroluminescence, quantum dot electroluminescence, and LED.

Further, the fabric substrate according to the present invention has excellent lubrication and spindle characteristics and is excellent in flexibility, stretchability and skin contact feeling, and is applicable to a wearable display.

1 is a view illustrating a structure of a fabric substrate according to an embodiment of the present invention.
FIG. 2 is a view illustrating a fabrication process of a flexible gas barrier fabric substrate according to an embodiment of the present invention. Referring to FIG.
FIG. 3 is a graph showing a change in a coefficient of thermal expansion (CTE) of a fabric substrate after calendering according to an embodiment of the present invention measured by a TMA (Thermomechanical Analyzer).
4 is a SEM (Scanning Electron Microscope) sectional view of a fabric substrate on which a planarizing film is formed according to an embodiment of the present invention.
5 is a graph showing the results of measurement of oxygen permeability of a fabric substrate on which a gas barrier film is formed according to an embodiment of the present invention.
6 is a photograph of a fabric substrate on which a gas barrier film is formed according to an embodiment of the present invention.

The present inventors have investigated the structure of a fabric substrate and its manufacturing method that can improve the low thermal stability, low dimensional stability (CTE) and low smoothness of the fabric while maximizing flexibility, which is the greatest merit of the fabric The present invention has been completed. This makes it possible to easily form a gas barrier film having excellent gas barrier properties on the fabric substrate.

The fabric substrate of the present invention can be advantageously applied to fabrication of flexible displays, flexible lights, and flexible solar modules due to its excellent flexibility and gas barrier properties.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to the drawings and one embodiment. In describing the present invention, a detailed description of known functions and configurations incorporated herein will be omitted so as to avoid obscuring the subject matter of the present invention.

FIG. 1 shows a flexible gas barrier fabric substrate according to an embodiment of the present invention. According to this, the fabric substrate comprises a fabric substrate 100; A pressure-sensitive adhesive layer (200) coated on the fabric substrate (100); Film 300; And a flattening film 400 are stacked.

The fabric substrate 100 is made of a textile material and is made of a material selected from the group consisting of polyethylene terephthalate, polyethylene naphthalate, polyethylene, nylon, and acryl It is a fabric made of the above material.

Fabrics may be woven or nonwoven, but woven forms are preferred. The thickness of the fabric does not affect the performance of the substrate, but 50 to 230 占 퐉 is suitable as the coating support material and considering the thickness of the final substrate, preferably 50 to 150 占 퐉, more preferably 50 to 100 占 퐉 Mu m. The flatness (Ra) of such a fabric base is 1 to 10 占 퐉, and even if a gas barrier film is not formed or is formed, a large amount of pinholes are generated, so that the performance as a substrate can not be secured. However, according to the substrate structure and the manufacturing method of the present invention described later, the smoothness of the fabric substrate can be improved, and the lattice or spindle of the fabric substrate can be retained. Therefore, it is possible to provide an excellent flexible gas barrier fabric substrate.

Next, the pressure-sensitive adhesive layer 200 may include at least one component selected from the group consisting of an acrylic pressure-sensitive adhesive, a urethane pressure-sensitive adhesive, and a silicone pressure-sensitive adhesive. It is preferable that the pressure-sensitive adhesive layer has a thickness of 1 to 5 占 퐉 in view of the adhesive strength and the overall thickness of the substrate.

The film 300 may include at least one material selected from the group consisting of polyethylene terephthalate, polyethylene naphthalate, polyethylene, nylon, and acryl.

The film 300 has a thickness of 5 to 125 탆, preferably 10 to 100 탆, more preferably 23 to 75 탆, and a surface smoothness Ra of 5 to 500 nm, preferably 5 to 400 nm, Preferably 5 to 300 nm. In the above range, the substrate can be fabricated without changing the physical properties of the fabric base, that is, the degree of polishing and the degree of spindle.

The film 300 is preferably the same material as the fabric substrate 100. The film is for flattening the fabric substrate 100 to impart smoothness to the fabric substrate. Therefore, when the films of the same material are laminated, it is preferable that the lamination structure of the laminated structure can be prevented because the thermal properties are the same and the deformation value by the external heat is the same.

The planarization layer 400 may be formed of a material selected from the group consisting of silane, polyurethane, polycarbonate, acrylate-based polymer, epoxy-based polymer, amine an oligomer of an amine series, and a vinyl-based polymer.

The silane is selected from the group consisting of monosilane (SiH ₄ ), disilane (Si ₂ H ₆ ), trisilane (Si ₃ H ₈ ) and tetrasilane (Si ₄ H ₁₀ ) It can be more than species.

The silane can also be selected from the group consisting of an epoxy, an alkoxy, a vinyl, a phenyl, a methacryloxy, an amino, a chlorosilanyl, a chloropropyl, ) And a mercapto group. The term " functional group "

The planarizing film 400 may further include a light absorbing agent. Specifically, it may include one or more selected from the group consisting of benzophenone, oxalanilide, benzotriazole, and triazine.

The planarization film 400 may further include inorganic particles.

The inorganic particles may be inorganic compounds containing at least one element selected from the group consisting of silicon, aluminum, titanium and zirconium, and the inorganic compound may be in the form of a metal oxide, a nonmetal oxide, a nitride or a nitrate.

The inorganic particles having a size of 5 to 100 nm are preferable because they do not inhibit the smoothness of the surface of the planarizing film.

The thickness of the flattening film is preferably 0.01 to 5 탆, and the surface smoothness (Ra) is preferably 5 to 300 nm. When the above range is satisfied, the phenomenon that the gas barrier film is not formed due to the step difference of the substrate can be prevented, which is preferable.

The planarization film 400 has a thickness of 0.01 to 5 占 퐉, preferably 0.1 to 5 占 퐉, more preferably 1 to 5 占 퐉. The surface smoothness Ra of the planarization film 400 is 5 to 300 nm, preferably 10 to 200 nm, and more preferably 10 to 100 nm. When the above range is satisfied, the phenomenon that the gas barrier film is not formed due to the step difference of the substrate can be prevented, which is preferable.

The fabric substrate for flexible gas barrier has characteristics of 30 ~ 80mm in lap sheeting and 100 ~ 140 degrees in spindle. If the lecture degree and the degree of spindle have a value in the above range, it can be seen that the characteristics of the fabric base are maintained. In addition, the present invention is applicable to various curved shapes compared to a film, so that design flexibility can be imparted to the use of the flexible substrate.

Next, a manufacturing method of the flexible gas barrier fabric substrate of the present invention will be described. The description on the flexible gas barrier fabric substrate is included in the manufacturing method of the flexible gas barrier fabric substrate.

A method of fabricating a flexible gas barrier fabric substrate according to the present invention includes the steps of: coating an adhesive on a fabric substrate; Laminating a film on a pressure sensitive adhesive coated fabric substrate; Calendering a fabric substrate laminated with a film; And coating a planarizing film on the film. Fig. 2 is a simplified view of the manufacturing process flow of the flexible gas barrier fabric substrate of the present invention. Fig.

First, a step of coating a pressure-sensitive adhesive on a fabric base will be described.

The pressure-sensitive adhesive may be coated using a spin coating, a slot coating or a bar coating method, and it is preferable to apply the pressure-sensitive adhesive layer so that the thickness of the pressure-sensitive adhesive layer is 1 to 5 μm. When the flatness Ra of the fabric base material is 5 占 퐉 or more, the thickness of the pressure-sensitive adhesive is preferably 5 to 10 占 퐉.

Through the step of coating the adhesive on the fabric substrate, the woven geometry, which is characteristic of the fabric substrate, can be planarized and adhered to the film.

Next, a step of laminating a film on a fabric base coated with an adhesive will be described.

The lamination of the film is carried out at a temperature of 50 to 150 캜, preferably 70 to 150 캜, more preferably 80 to 150 캜, and a temperature of 2.0 to 5.0 kg / cm ² . The fabric substrate on which the film is laminated may be further provided at the aging step for 1 to 3 days at a temperature of 50 to 150 ° C, preferably 50 to 120 ° C, more preferably 50 to 100 ° C. As a result, peeling between the film and the fabric substrate can be minimized.

Next, a step of calendering a fabric substrate on which a film is laminated on a fabric substrate will be described.

A fabric substrate on which a film is laminated on a fabric substrate is provided to the calendering process. The calendering process is preferably carried out at a temperature of 40 to 180 DEG C, preferably 60 to 170 DEG C, more preferably 70 to 160 DEG C, and 1.5 to 3.5 kg / cm < ² > In the above range, the thermal stability of the fabric base material is improved and the adhesive strength to the laminated film is improved, which is preferable.

The calendered fabric substrate has a coefficient of thermal expansion (CTE) of 5 to 50 ppm / 占 폚, preferably 5 to 30 ppm / 占 폚, more preferably 5 to 25 ppm / 占 폚. The low coefficient of thermal expansion imparts improved thermal stability and dimensional stability to the fabric substrate.

Finally, the step of coating the planarizing film on the film of the calendered fabric substrate will be described.

The planarizing film is intended to optimize the smoothness of the fabric substrate. The planarization layer may be formed by spin coating, slot coating or bar coating. The planarizing film after coating is preferably cured at a low temperature. For example, 80 to 160 占 폚, preferably 80 to 140 占 폚, and more preferably 80 to 120 占 폚. It is preferable to form a planarizing film without thermal deformation of the fabric substrate and to optimize the smoothness of the substrate.

The flexible substrate for a gas barrier fabric of the present invention produced according to the present invention can maintain the characteristics of fiber inherent characteristics of 30 to 80 mm and the degree of spindle of 100 to 140 degrees.

In addition, the fabric substrate for a flexible gas barrier can prevent a phenomenon in which a shielding film is not formed due to a difference in steps and dimension of a substrate and pin holes when a gas shielding film is formed due to high smoothness, thermal stability and dimensional stability. Therefore, it is possible to form a gas barrier film having excellent gas barrier properties on the flexible gas barrier fabric substrate of the present invention.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the invention. Will be apparent to those of ordinary skill in the art.

<Examples>

An acrylic pressure-sensitive adhesive was coated to a thickness of less than 5 占 퐉 on a 75 占 퐉 -thick fabric base made of polyethylene naphthalate by a slot coating method. Then, a 23 탆 film made of polyethylene naphthalate was laminated at 90 캜, 2.0 kg / cm ² , and 60 m / min, and aged at 60 캜 for 3 days. Subsequently, the prepared fabric substrate was subjected to a calendering process under the conditions of 150 캜 and 3.0 kg / cm ² . After calendering, the coefficient of thermal expansion (CTE) of the fabric substrate was measured. The results are shown in Fig. The thermal expansion coefficient was less than 10 ppm / ° C, and the thermal stability and dimensional stability were excellent.

Then, a silane-based resin having an epoxy group was coated on the laminated film side of the fabric substrate by a slot coating method at room temperature. Followed by curing and drying at 150 DEG C for 3 minutes. During the curing process, the flow of the planarization film was progressed simultaneously to fill the geometry of the substrate. After forming the planarization film, the smoothness (Ra) was measured and found to be 83 nm. The thin film thickness and SEM (Scanning Electron Microscope) cross-sectional image of the manufactured fabric substrate are shown in FIG.

A gas barrier film in which a SiN layer, an SiOy layer, and a silane-based polymer layer were sequentially laminated was formed on the manufactured fabric substrate.

The oxygen permeability of the gas barrier film formed on the fabric substrate was measured, and the measurement result is shown in Fig. According to Fig. 5, it can be seen that the oxygen permeability value is 5.2 x 10 ^-2 g / m ² · day.

&Lt; Comparative Example 1 &

A polyethylene terephthalate film substrate of 100 탆 produced according to a conventional manufacturing method was used as a flexible substrate without any additional treatment. The gas barrier film was formed in the same manner as in Example, and then the moisture permeability was evaluated.

&Lt; Comparative Example 2 &

A polyethylene terephthalate fabric woven in a woven form so as to have a structure of 50D36F210T was used as a flexible substrate without any additional treatment. The gas barrier film was formed in the same manner as in Example, and then the moisture permeability was evaluated.

&Lt; Evaluation example &

The substrates obtained in Examples and Comparative Examples 1-2 were evaluated, and the evaluation results are shown in Table 1 below.

The evaluation was carried out in the following manner.

(1) Coefficient of thermal expansion (CTE)

The dimensional stability of the fabric substrate prepared above, as measured by the coefficient of thermal expansion (CTE), is determined as follows.

The thermomechanical analyzer PE-TMA-7 (Perkin Elmer) is calibrated and checked according to known procedures for temperature, displacement, force, eigen deformation, reference and temperature adjustment. The fibers are inspected using a stretch analysis clamp. Very low modulus expansion specimens (quartz) are used to obtain the required criteria for elongation clamps and CTE precision and accuracy are assessed using standard materials, such as pure aluminum foils, whose CTE values are well known. The specimen selected from the known orientation axes in the original film sample is mounted on the system using a clamp separation of approximately 12 mm and an applied force of 75 mN for a 5 mm width is applied. To ensure consistent tension, the applied force is adjusted for changes in fiber thickness and the fibers are not bent along the analysis axis. The specimen length is normalized to the length measured at a temperature of 23 ° C. After stabilizing the specimen, it is heated at 30 캜 to 180 캜 at 5 캜 / minute. The CTE value (?) Is derived from the following equation:

α = L / (L × (T2-T1))

Where L is the change in specimen length measured over the temperature range (T2-T1), and L is the length of the specimen at 23 占 폚. The CTE value is considered to be reliable up to the Tg temperature so that the upper limit of the temperature range mentioned can be measured to just below the Tg of the test sample or to the temperature range where thermal stability is ensured. The data can be plotted as a function of the temperature normalized to 23 ° C and the change in sample length (%).

(2) Spindle

It refers to the degree of recovery of the wrinkles created when pressure is applied to the fabric, and the higher the value, the better the resilience.

For the measurement method, the spindle test method of KS K 0550 fabric was used. According to the test method, the specimen is to be 4 × 1.5 cm and the Monsanto tester is used as the test apparatus. Put the specimen between the metal plates, put on the plastic press, put 500g weight on the plastic press for 5 minutes, put the metal plate + test piece on the Monsanto tester, measure the angle of elongation (degree of spindle) after 5 minutes.

(3) Lecture

Evaluate the resistance to fabric movement (flexibility) as a measure of the stiffness and softness of the fabric.

(ISO 4064: 2011), and the cantilever method measures the length of the front end of the test piece with the test piece placed on an inclined surface of 41.5 degrees, which affects the feel and drape of the cloth. The smaller the value, the better the lubrication property.

According to Table 1 above, the fabric substrate according to the present invention has a low coefficient of thermal expansion and has excellent dimensional stability. Also, smoothness was found to be close to that of untreated film substrate, and that of spinning and laminating was close to that of untreated fabric substrate. The moisture permeability (WVTR) was significantly superior to untreated film or fabric. This is interpreted as confirming that the gas barrier film is well formed due to the high smoothness of the fabric substrate.

Claims (20)

A fabric substrate made of a fabric made of one or more materials selected from the group consisting of polyethylene terephthalate, polyethylene naphthalate, polyethylene, nylon and acryl;
A pressure-sensitive adhesive layer comprising at least one component selected from the group consisting of acrylic pressure-sensitive adhesives, urethane pressure-sensitive adhesives, and silicone pressure-sensitive adhesives coated on the fabric substrate;
A film made of at least one material selected from the group consisting of polyethylene terephthalate, polyethylene naphthalate, polyethylene, nylon and acryl laminated on the pressure-sensitive adhesive layer; And
The film is laminated on the film and is formed of a silane, a polyurethane, a polycarbonate, an acrylate polymer, an epoxy polymer and an amine oligomer ) And a vinyl-based polymer, wherein the planarizing film comprises a planarizing film,
The fabric substrate and the film are made of the same material,
Wherein the fabric substrate has a degree of laminating of 30 to 80 mm and a degree of warp of 100 to 140 °.
delete delete delete The method according to claim 1,
The silane is selected from the group consisting of monosilane (SiH ₄ ), disilane (Si ₂ H ₆ ), trisilane (Si ₃ H ₈ ) and tetrasilane (Si ₄ H ₁₀ ) And at least one kind of flexible gas barrier fabric substrate.
The method according to claim 1,
The silane may be selected from the group consisting of an epoxy, an alkoxy, a vinyl, a phenyl, a methacryloxy, an amino, a chlorosilanyl, a chloropropyl, ) And a mercapto group, wherein at least one functional group selected from the group consisting of a mercapto group and a mercapto group is contained in the fabric substrate.
The method according to claim 1,
Wherein the flattening film further comprises a component having a metal oxide, a non-metal oxide, a nitride, or a nitrate structure including at least one element selected from the group consisting of silicon, aluminum, titanium and zirconium. .
Coating a fabric substrate with a tackifier;
Laminating a film of the same material as the fabric substrate on the fabric substrate coated with the pressure-sensitive adhesive;
Calendering the fabric substrate on which the film is laminated under conditions of 40 to 180 DEG C and 1.5 to 3.5 kg / cm &lt; ² &gt;; And
Coating a flattening film on the film, and curing the coated film at 80 to 160 ° C.
9. The method of claim 8,
The fabric substrate and the film may be formed of at least one material selected from the group consisting of polyethylene terephthalate, polyethylene naphthalate, polyethylene, nylon, and acryl. Of the flexible substrate (1).
9. The method of claim 8,
Wherein the pressure-sensitive adhesive comprises at least one component selected from the group consisting of acrylic pressure-sensitive adhesives, urethane pressure-sensitive adhesives, and silicone pressure-sensitive adhesives.
9. The method of claim 8,
Wherein the step of laminating the film is performed at a temperature of 50 to 150 DEG C and 2.0 to 5.0 kg / cm &lt; ² &gt;.
9. The method of claim 8,
Wherein the fabric substrate having the film laminated on the fabric substrate after the calendering step has a coefficient of thermal expansion (CTE) of 5 to 50 ppm / 占 폚.
9. The method of claim 8,
The planarization layer may be formed of a material selected from the group consisting of silane, polyurethane, polycarbonate, acrylate polymer, epoxy polymer, amine oligomer, vinyl) based polymer. The method of manufacturing a flexible fabric substrate for a flexible gas barrier according to claim 1, delete delete delete delete delete delete delete

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