KR101287922B1 - Method of forming a pattern on a light stand and a light stand manufactured by the method - Google Patents

Abstract

The present invention relates to a method for forming a nanopattern on an illumination stand, and to a lighting stand manufactured according to the same, (a) fabricating a mold in which a nanopattern is formed using an aluminum anodization method (AAO) at a low temperature / high voltage state. Doing; (b) forming a nanopattern on the lighting stand by nanoimprinting or nanoinjection molding using the mold on which the nanopattern is formed. .

Description

METHOOD OF FORMING A PATTERN ON A LIGHT STAND AND A LIGHT STAND MANUFACTURED BY THE METHOD}

The present invention relates to a method for forming a nanopattern on an illumination stand, and to an illumination stand manufactured according to the present invention. More particularly, the present invention relates to an illumination stand using a mold manufactured by an aluminum anodic oxidation method (AAO) at low temperature and high voltage. The present invention relates to a technique for forming a nanopattern.

The stand lighting used indoors has been used for a long time for study, work, reading, etc., but the conventional stand lighting has a difference depending on the type of light source, but the glare is basically severe and may cause fatigue to the user's eyes.

In addition, the conventional stand lighting is difficult to reduce the straightness of the light emitted from the light source from the surface such that the light is delivered to the user as it is, it is difficult to provide the illumination to make the user feel emotional stability.

Therefore, there is a demand for the development of an emotional stand light which can prevent glare of the user and reduce the linearity of the light emitted from the light source so that the user can feel emotional stability.

The present invention has been invented to meet the technical requirements described above, and solve the above problems by forming a nano-pattern on the surface of the stand, as well as solve the problems conventionally in the technical field related to the nano-pattern. It was invented by adding the structure further.

Specifically, a problem in which the manufacturing process is complicated and has to go through a number of stages, which is a conventional problem in the field of nanopattern forming technology, and the reaction time for forming a nanopattern through an aluminum anodic oxidation process Tens of hours) is very long, a configuration that can solve the problem of the manufacturing process is complicated to require a stirring device for stirring the electrolyte in the aluminum anodic oxidation process was added.

The method for forming a nanopattern on the lighting stand according to the present invention and the lighting stand manufactured according to the present invention, to produce a mold in which the nanopattern is formed by the aluminum oxidation method (AAO) at a low temperature and high voltage state, using the lighting stand The problem is to form nanopatterns.

In addition, the method for forming a nano-pattern on the lighting stand according to the present invention and the lighting stand manufactured according to the manufacturing method, by using the aluminum oxidation method in a low temperature and high voltage state to form a mold in which the nano-pattern is rapidly formed, using the lighting stand The problem is to form nanopatterns.

In addition, the method for forming a nano-pattern on the lighting stand according to the present invention and the lighting stand produced according to the present invention, by using a nano-pattern formed mold without using a stirring device for stirring the electrolyte, the nano-pattern on the lighting stand Forming the problem is a problem.

In addition, the method for forming a nano-pattern on the lighting stand according to the present invention and the lighting stand manufactured according to the present invention, by forming a nano-pattern on the lighting stand using a template in which the nano-pattern was formed in a short time, thereby The challenge is to help prevent glare.

In addition, a method for forming a nano-pattern on the lighting stand according to the present invention and the lighting stand manufactured according to the present invention, to reduce the reflectance of the light stand light and to increase the transmittance to increase the efficiency.

In addition, a method of forming a nano-pattern on the lighting stand according to the present invention and the lighting stand manufactured according to the present invention is to provide an illumination that can give the emotional stability to the user by reducing the straightness of the lighting stand light as a problem. .

In order to solve the above problems, the method for forming a nanopattern on the lighting stand according to an embodiment of the present invention, (a) forming a nanopattern using an aluminum anodization method (AAO) at a low temperature / high voltage state Manufacturing a mold; (b) forming a nanopattern on the lighting stand by a nano imprinting method using a form in which the nanopattern is formed; Including (a), the aluminum anodic oxidation method (AAO) in the step (a), (a1) depositing aluminum on a silicon base to form a reaction material; (a2) forming an aluminum oxide layer on an aluminum surface of the reaction material, and etching the planarized aluminum oxide layer to planarize the aluminum oxide layer; (a3) allowing a first anodization process of aluminum of the reactant material passed through step (a2) to proceed; (a4) removing alumina from the reaction material after the first anodization; And (a5) after the step (a4), performing a second anodization process on the aluminum of the reactant; wherein the low temperature is -4 ° C to -6 ° C and the high voltage is 100V to 140V. The reaction material is maintained at −4 ° C. to −6 ° C., and the nano imprinting may include: (b1) applying a polymer resin to the mold; And (b2) placing the mold on which the polymer resin is applied to the lighting stand, and curing and adhering the polymer resin to form a nanopattern on the lighting stand.

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In addition, the method for forming a nanopattern on the lighting stand according to an embodiment of the present invention, the nanopattern is characterized in that the nanopattern having a size of 150nm to 250nm.

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In addition, the method of forming a nano-pattern on the lighting stand according to an embodiment of the present invention, the method of curing the polymer resin in the step (b2) is characterized in that the thermal curing method or ultraviolet curing method.

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The method for forming a nanopattern on the lighting stand according to the present invention and the lighting stand manufactured according to the present invention, to produce a mold in which the nanopattern is formed by the aluminum oxidation method (AAO) at a low temperature and high voltage state, using the lighting stand Nanopatterns can be formed in the

In addition, the method for forming a nano-pattern on the lighting stand according to the present invention and the lighting stand manufactured according to the manufacturing method, by using the aluminum oxidation method in a low temperature and high voltage state to form a mold in which the nano-pattern is rapidly formed, using the lighting stand Nanopatterns can be formed in the

In addition, the method for forming a nano-pattern on the lighting stand according to the present invention and the lighting stand produced according to the present invention, by using a nano-pattern formed mold without using a stirring device for stirring the electrolyte, the nano-pattern on the lighting stand Can be formed.

In addition, the method for forming a nano-pattern on the lighting stand according to the present invention and the lighting stand manufactured according to the present invention, by forming a nano-pattern on the lighting stand using a template in which the nano-pattern was formed in a short time, through the lighting stand Can prevent glare

In addition, the method for forming a nano-pattern on the lighting stand according to the present invention and the lighting stand manufactured according to the present invention can increase the efficiency by reducing the reflectance of the lighting stand light and increase the transmittance.

In addition, the method for forming a nanopattern on the lighting stand according to the present invention and the lighting stand manufactured according to the present invention can reduce the linearity of the light of the lighting stand, thereby providing emotional stability to the user.

1 is a flowchart illustrating a process of fabricating a template on which a nanopattern is formed, which may be included in one embodiment of the present invention.
2 is a block diagram showing the configuration of an aluminum anodizing apparatus that an embodiment of the present invention can include.
3 is a graph showing the reaction rate of the aluminum anodization process, which an embodiment of the present invention may include.
4 and 5 are photographs taken by SEM of the form with the nano-pattern formed in accordance with an embodiment of the present invention.
6 is a view showing a flow of a method of forming a nanopattern by nanoimprinting on the lighting stand according to an embodiment of the present invention.
7 is a view showing an injection molding machine that can be used when forming a nano-pattern by nano-injection molding on an illumination stand according to an embodiment of the present invention.
8 is a graph showing the reflectance of the lighting stand according to an embodiment of the present invention.
9 is a graph showing the transmittance of the lighting stand according to an embodiment of the present invention.
10 is a photograph showing an illumination stand according to an embodiment of the present invention.

Hereinafter, with reference to the accompanying drawings will be described a method for forming a nano-pattern on the lighting stand according to an embodiment of the present invention and the lighting stand manufactured accordingly. The embodiments are provided so that those skilled in the art can easily understand the technical spirit of the present invention, and thus the present invention is not limited thereto. In addition, matters represented in the accompanying drawings may be different from the form actually embodied in the schematic drawings in order to easily explain the embodiments of the present invention.

Hereinafter, referring to FIGS. 1 to 10, a method of forming a nanopattern on an illumination stand according to an embodiment of the present invention and an illumination stand manufactured according to the present invention will be described in detail.

Macro look at the method of forming a nano-pattern on the lighting stand according to an embodiment of the present invention, largely 1) forming the mold 100 is formed with a nano-pattern and 2) lighting using the mold 100 It can be divided into two steps, forming a nano pattern on the stand. Therefore, hereinafter, the steps 1) will be described in detail, and then the description will be made in order of the steps 2).

First, referring to step 1) of manufacturing the mold 100 having the nanopattern formed thereon, the method of forming the nanopattern on the lighting stand according to the embodiment of the present invention is preferably an aluminum anodizing method in a low temperature and high voltage state By using the nano-pattern formed mold 100 can be produced.

Referring to FIG. 1, a method of fabricating a mold 100 in which a nanopattern is formed using the aluminum anodization method in a low temperature and high voltage state may be performed by first depositing aluminum 450 on a silicon 430 base. It may include the step of forming the ash (S11).

The deposition process of the aluminum 450 may be made in various forms such as PVD (Physical Vapor Deposition), CVD (Chemical Vapor Deposition), and after the aluminum layer is formed by deposition, an aluminum oxide layer on the surface of the aluminum layer by electrolytic polishing It is preferable to form and form the aluminum oxide layer by etching only to make it flat. As a result, irregular surfaces formed by deposition may be even, and the nanopattern may be formed at a constant height during subsequent anodic oxidation.

When the reactants (430, 450) are provided by the step S11, the first anodic oxidation process for the aluminum 450 of the reactant proceeds at a low temperature and high voltage (S12). The nanopattern 450 is formed.

Referring to a specific embodiment with reference to FIG. 2, the anodic oxidation process may be performed by the anodic oxidation apparatus 400 as shown in FIG. 2. The anodic oxidation apparatus 400 may include an electrolyte solution (oxalic acid, sulfuric acid, or pulling up). Etc.) is filled with a reaction tank 440, a reaction material (430, 450) inherent in the reaction tank, the power supply unit 420 consisting of an anode connected to the aluminum 450 of the reaction material and a cathode connected to the electrolyte solution, It may include a low temperature applying unit 410 in contact with the reactant to maintain a low temperature.

Here, the temperature of the reactant is maintained at a low temperature (0 ° C. to −6 ° C.) by the low temperature applying unit 410, and the first voltage is applied in a state in which a high voltage (100 V to 140 V) is applied by the power supply unit 420. The secondary anodic oxidation reaction proceeds. In this way, the anodic oxidation reaction of the aluminum 450 proceeds in a state of low temperature and high voltage so that a nanopattern is formed on the aluminum 450 in a short time. Specifically, as shown in FIG. 3 (a graph showing the average current change according to the change of the high voltage at each temperature), the anodic oxidation proceeds at a fast time of 1 minute or less, and the current decreases. As the oxidation proceeds, the efficiency can be maximized, and the anodic oxidation process can be performed without the electrolyte agitator which was required in the conventional slow anodic oxidation process.

On the other hand, the nano-pattern produced by the anodic oxidation reaction of the aluminum 450 may be formed in a pattern including a porous micropores, preferably set the temperature to -4 ℃ to -6 ℃ By setting the voltage to 100V to 140V, it may be formed in a round pattern having a size of 120nm to 150nm as shown in FIGS.

When the first anodization process is completed by the step S12, the aluminum oxide is removed from the reactant that has undergone the first anodization process (S13), after which the second anode is again the aluminum of the reactant. Oxidation proceeds (S14).

The reason why the aluminum oxide is removed and the secondary anodic oxidation process is performed by the S13 and S14 steps is that the nanopattern in a better state can be formed by the anodic oxidation process in two steps, wherein the oxidation The aluminum removal step (S13) is preferably configured to be etched at 60 ° C. to 70 ° C. for 50 to 70 minutes in an etching electrolytic solution containing 1 to 2 parts by weight of chromic acid and 5 to 10 parts by weight of phosphoric acid. In addition, in the second anodic oxidation process (S14), as in the first anodic oxidation process, the temperature is set at -4 ° C to -6 ° C and the voltage is set at 100V to 140V as shown in FIGS. 4 and 5. It is preferable to form a round nanopattern having a size of 120nm to 150nm.

After the step S14, the anodized aluminum oxide layer is removed by etching and finished, thereby providing an aluminum master with a nanopattern formed thereon.

The nanopattern formed on the aluminum master may be formed in a round shape having a size of 120 nm to 150 nm as shown in FIGS. 4 and 5 by an anodizing process made at a temperature of −4 ° C. to −6 ° C. and a voltage of 100 V to 140 V. FIG. An aluminum master having such a nanopattern formed thereon may be used as a template 100 for forming a nanopattern on an illumination stand.

In addition, various types of nanosurface products may be produced using the aluminum master, and the nanosurface products may be used as the mold 100 for forming nanopatterns on the lighting stand. For example, a nano-patterned plastic substrate is formed through a hot embossing process on top of the aluminum master on which the nanopattern is formed, and a seed layer is formed on the top of the plastic substrate on which the nanopattern is formed. (electroforming) is carried out to produce a nickel master with a nano-pattern formed, it can also be used as a mold 100 for forming a nano-pattern on the lighting stand.

Next, referring to step 2) of forming the nanopattern on the lighting stand (the surface of the light emitting device) using the mold 100 on which the nanopattern is formed, the step 2) may be performed by two methods. The process may be performed by nano imprinting or nano injection molding.

Looking at the pattern formation by the nano-imprinting method with reference to Figure 6, the nano-imprinting method, first comprising the step of preparing a mold 100 formed with a nano-pattern in step 1) (A)

After preparing the mold 100 in which the nano-pattern is formed by the step A, the polymer resin 200 is applied to the mold 100 (B), and the polymer resin 200 has high transmittance and control. Use materials that are easy and stable after curing. Preferably, polymethylmethacrylate (PMMA), polydimethylsiloxane (PDMS), polycarbonate (PC), polypropylene (PP), polyethylene (PE, PE), polyester (polyester, PES), a cyclic olefin copolymer (cyclic olefin copolymer, COC), oligomers and resins including monomers (monomer) and photoinitiator may be used, such as selected from the group of elastomers It is also possible to proceed with the process using one or more.

On the other hand, the method for applying the polymer resin 200, any method conventionally used, such as spray method, screen printing method, inkjet printing method, doctor blade method, spin casting method can be used.

After applying the polymer resin 200 to the mold 100 by the step B, the mold 100 coated with the polymer resin 200 is placed on an illumination stand (the surface of the light emitting device) (C) The polymer resin 200 is cured (D) to form a nanopattern on the lighting stand (the surface of the light emitting device).

Herein, the curing of the polymer resin 200 may be performed by a thermal transfer method or an ultraviolet irradiation method. The polymer resin 200 cured by a thermal transfer method may include polymethylmethacrylate (PMMA), Polydimethylsiloxane (PDMS), polycarbonate (PC), polypropylene (PP), polyethylene (PE, PE), polyester (PES), and the like.

Next, the polymer resin 200 that is cured by ultraviolet irradiation includes an oligomer, a monomer, and a photoinitiator, wherein the oligomer is a prepolymer, mainly epoxy ( epoxy), polyester, urethane, and the like. In addition, the monomer is a multifunctional acrylate and a monofunctional acrylate as a simple substance required to dissolve the oligomer and impart insufficient properties, and the photoinitiator is a material that helps the oligomer and the monomer to be a desired resin by chemical bonding. .

After the step D, the mold 100 is removed, thereby forming a nanopattern on the illumination stand (surface of the light source) as shown in FIG. 10.

In the above, the method of forming the nanopattern by the nano-pattern formed mold 100 and the nano-imprinting method has been described, but as mentioned above, the nano-pattern formed mold 100 and the nano-injection molding method ( Nano patterning may also be formed on the illumination stand (the surface of the light source) through nano injection molding.

Specifically, the nano-pattern may be formed using the injection molding machine as shown in FIG. 7 and the mold 100 in which the nano-pattern is formed. In addition to this, various injection molding methods may be used.

On the other hand, the nano-pattern formed on the lighting stand after the rough to step 2), the form of the mold 100 formed by the anodic oxidation process of low temperature (-4 ℃ to -6 ℃) and high voltage (100V to 140V) state As a pattern corresponding to the nanopattern, it is formed as a rounded nanopattern having a size of 120nm to 150nm, through which the nanopattern prevents glare of the lighting stand and reduces the straightness of light.

In addition, the nanopattern can increase the efficiency of the lighting stand by increasing the transmittance and lower the reflectance of, can be confirmed numerically this effect with reference to Table 1 to Table 4 below.

Specifically, Tables 1 and 2 below use the mold 100 and the nano-imprinting technology formed by the anodic oxidation process at low temperature (-4 ° C. to −6 ° C.) and high voltage (100 V to 140 V). The nano-pattern was formed on the lighting stand (surface of the light emitting device), and the average transmittance (Table 1) and reflectance (Table 2) were measured, and Tables 3 and 4 below show low temperatures (-4 ° C to -6 ° C). And nano-patterns on the lighting stand (surface of the light emitting device) by using the mold 100 formed by the anodic oxidation process at the high voltage (100V to 140V) state and the nano-injection molding technology, and the transmittance (Table 3) and the reflectance ( Table 4) is an average value measured, and the effect can be confirmed numerically with reference to Tables 1 to 4.

wave length

380nm
450 nm
550 nm
650nm
750 nm Illumination surface transmittance (%)
(Nano pattern O)
88.2
98.1
98.5
98.4
98.2 Illumination surface transmittance (%)
(Nano pattern X)
84.5
89.3
90.9
90.3
90.5

wave length

380nm
450 nm
550 nm
650nm
750 nm Illumination surface reflectance (%)
(Nano pattern O)
1.9
1.9
2.2
2.4
2.6 Illumination surface reflectance (%)
(Nano pattern X)
10.5
9.5
8.9
8.5
8.5

wave length

380nm
450 nm
550 nm
650nm
750 nm Illumination surface transmittance (%)
(Nano pattern O)
84.5
98.6
97.8
97.2
98.5 Illumination surface transmittance (%)
(Nano pattern X)
84.5
89.3
90.9
90.3
90.5

wave length

380nm
450 nm
550 nm
650nm
750 nm Illumination surface reflectance (%)
(Nano pattern O)
0.5
0.6
1.0
1.5
2.2 Illumination surface reflectance (%)
(Nano pattern X)
10.5
9.5
8.9
8.5
8.5

8 (reflectivity) and 9 (transmittance), the results of Tables 1 to 4 can be visually confirmed through a graph.

As described above, the method for forming a nanopattern on the lighting stand according to the present invention and the lighting stand manufactured according to the present invention produce a mold in which a nanopattern is formed by an aluminum oxidation method (AAO) at low temperature and high voltage state, and Nano pattern can be formed on the lighting stand.

In addition, the nano-pattern is formed quickly by the aluminum oxidation method at a low temperature and high voltage state, it can be used to form a nano-pattern on the lighting stand.

In addition, the nanopattern is formed without forming a stirring device for stirring the electrolyte solution, it is possible to form a nanopattern on the lighting stand.

In addition, the nano-pattern is formed on the lighting stand by using the template in which the nano-pattern is formed in a short time, thereby preventing glare on the lighting stand.

In addition, it is possible to increase the efficiency by reducing the reflectance of the lighting stand light and increasing the transmittance, and may provide emotional stability to the user by reducing the straightness of the lighting stand light.

It will be apparent to those skilled in the art that various modifications, additions and substitutions are possible, without departing from the spirit and scope of the invention, , Changes and additions should be considered to fall within the scope of the claims of this patent.

100: mold 110: nano pattern
200: polymer resin 210: nanopattern
300: surface of the light stand light emitting device 400: aluminum anodizing device
410: low temperature application unit 420: power supply unit
430 silicon 440 reaction tank
450: aluminum

Claims (11)

(a) fabricating a mold in which a nanopattern is formed using an aluminum anodic oxidation method (AAO) in a low temperature / high voltage state;
(b) forming a nanopattern on the lighting stand by a nano imprinting method using a form in which the nanopattern is formed;
Including but not limited to:
In the step (a), the aluminum anodic oxidation method (AAO),
(a1) depositing aluminum on a silicon base to form a reactant;
(a2) forming an aluminum oxide layer on an aluminum surface of the reaction material, and etching the planarized aluminum oxide layer to planarize the aluminum oxide layer;
(a3) allowing a first anodization process of aluminum of the reactant material passed through step (a2) to proceed;
(a4) removing alumina from the reaction material after the first anodization; And
(a5) after the step (a4), performing a second anodization process on aluminum of the reaction material;
Lt; / RTI >
The low temperature is -4 ° C to -6 ° C and the high voltage is 100V to 140V,
The reaction material is maintained at -4 ° C to -6 ° C,
In the step (b), the nano imprinting (Nano Imprinting),
(b1) applying a polymer resin to the mold; And
(b2) placing the mold coated with the polymer resin on the lighting stand, and curing and adhering the polymer resin to form a nanopattern on the lighting stand;
Characterized in that, comprising the nano-pattern on the lighting stand.
delete delete The method of claim 1,
The nanopattern is a nanopattern having a size of 150nm to 250nm, characterized in that the method for forming a nanopattern on the lighting stand.
delete delete The method of claim 1,
The method of curing the polymer resin in the step (b2) is characterized in that the thermosetting method or ultraviolet curing method, forming a nano-pattern on the lighting stand.


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