KR101279472B1 - Method of manufacturing glass decorative panel comprising enhanced depth pattern - Google Patents

Abstract

The present invention relates to a glass decorative material including a glass substrate having an uneven pattern, and including a glass substrate having a pattern, the depth of the pattern having an improved pattern having a depth greater than 1/10 of the width and a method of manufacturing the same. . As a result, it is possible to manufacture a glass decorative material that can implement a fine pattern and a three-dimensional sense of depth at the same time. In addition, since no post-process is required, stable production is possible by reducing the manufacturing cost and reducing the defective rate.

Description

METHOD OF MANUFACTURING GLASS DECORATIVE PANEL COMPRISING ENHANCED DEPTH PATTERN}

The present invention relates to a glass decorative material and a method of manufacturing the same, and more particularly, to realize a fine pattern and a three-dimensional sense of depth at the same time, and a glass decorative material having an improved pattern that can reduce the manufacturing cost and reduce the defective rate and its It relates to a manufacturing method.

The exterior material is used to decorate the living space beautifully and should have an aesthetic effect. Thus, in order to beautifully decorate the exterior or interior of furniture, home appliances, electronics and the like, synthetic resin exterior materials and glass that are easy to process have been widely used. In order to express an aesthetic in such an exterior material, two factors, namely, the fineness of the pattern and the depth of the pattern must be satisfied. However, in the prior art, it was not possible to manufacture an exterior material having these two elements.

For example, there are two methods of forming a pattern on a glass substrate. The first is a sand etching method, which is a method of expressing an image by blowing high-pressure fine sand breeze used in general and exterior materials. This sand etching method can deepen the depth of patterning. However, it is impossible to form a fine pattern. In addition, the processing costs are high and mass inline production is not possible. In addition, processing takes a long time, there is a disadvantage that the patterning of the intaglio or embossing is simple.

In addition, the second is a photoetching method, which can implement a fine pattern, but it is difficult to realize a three-dimensional feeling of depth. In the case of the photo-etched exterior glass substrate to which the conventional photosensitive material is applied, it is difficult to control the etching depth (pattern depth) because there is a limit of the adhesion force of the photosensitive material to the glass substrate. This unstable phenomenon appears.

1 is a cross-sectional view of a pattern formed on a glass decorative material produced by conventional photo etching. Referring to FIG. 1, since the etching depth 15 of the pattern 10 is shallow, the angle at which light is reflected is large, and the diffuse reflection effect is weak when viewed from the front. In addition, since the diffuse reflection effect is weak, in order to realize a three-dimensional effect, such as deposition printing, a post-process which can increase the brightness is required. For example, it is necessary to go through a post-process (deposition, ink containing a mirror component) to increase the brightness and reflectance of the glass substrate on the etching surface or the back surface.

Therefore, the conventional method cannot increase the depth of the pattern while maintaining the fine pattern, and in order to implement a three-dimensional effect with depth, it is very disadvantageous in terms of cost, time, and defective rate because it requires a separate post-processing process.

The present invention has been made to solve the above-described problem, an object of the present invention, a glass decorative material having a pattern with an improved depth that can increase the depth of the pattern while maintaining a fine pattern without a separate post-process and its manufacturing method To provide.

The structure of the glass decorative material having a pattern with an improved depth according to the present invention for solving the above-mentioned problems includes a glass substrate on which a pattern is formed, and the depth of the pattern is configured to be greater than 1/10 of the width.

In particular, the ratio of depth to width of the pattern may range from 1: 5 to 1: 1.

Here, the pattern may be a plurality, in this case, the space between the pattern is preferably 600㎛ or less (excluding 0).

In addition, the pitch between the patterns is preferably 700 µm or less (excluding 0).

The cross-sectional shape of the pattern may be one or more of a circle, an ellipse, and a polygon.

In particular, the planar shape of the pattern may be a stripe line or a closed shape including a circle, oval, and polygon.

On the other hand, the method of manufacturing a glass decorative material having a pattern with improved depth according to the present invention, (a) forming a metal substrate on the glass substrate; (b) etching the metal substrate to expose a portion of the glass substrate: (c) etching the exposed glass substrate to form a pattern; And (d) removing the metal substrate.

Here, the step (b) may include: (b1) forming a photoresist layer on the metal substrate; (b2) exposing and developing the photoresist layer to expose a portion of the metal substrate; (b3) etching the exposed metal substrate to expose a portion of the glass substrate.

In particular, step (c) may include etching the glass substrate after removing the photoresist layer.

In addition, step (d) may be a step of removing the photoresist layer and the metal substrate.

According to the present invention, it is possible to manufacture a glass decorative material that can implement a fine pattern and a three-dimensional sense of depth at the same time. In addition, since no post-process is required, stable production is possible by reducing the manufacturing cost and reducing the defective rate.

1 is a cross-sectional view of a pattern formed on a glass decorative material produced by conventional photo etching.
2A is a block diagram of a manufacturing process of a glass decorative material having a pattern with an improved depth according to one embodiment of the present invention.
It is sectional drawing of the manufacturing process of the glass decorative material corresponding to each process of FIG. 2A.
3 is a cross-sectional view of a glass decorative material having an improved pattern of depth made according to one embodiment of the present invention.
4 is a detailed cross-sectional view of the glass decorative material pattern having a pattern with improved depth according to one embodiment of the present invention.
5 is a top view showing an optical image of a glass decorative material having a pattern with improved depth according to one embodiment of the present invention in comparison with the glass decorative material according to the prior art.

Hereinafter, with reference to the accompanying drawings will be described in detail with respect to the glass decorative material having a pattern with improved depth according to one embodiment and a manufacturing method thereof. In the following description, well-known functions or constructions are not described in detail to avoid unnecessarily obscuring the subject matter of the present invention.

In addition, the size of each component in the drawings may be exaggerated for the sake of explanation and does not mean a size actually applied.

FIG. 2A is a block diagram of a manufacturing process of a glass decorative material having a pattern with an improved depth according to one embodiment of the present invention, and FIG. 2B is a cross-sectional view of a manufacturing process of a glass decorative material corresponding to each process of FIG. 2A. Referring to FIG. 2, in the process of manufacturing a glass decorative material having an improved pattern according to an embodiment of the present invention, first, a metal substrate 120 is formed by coating a metal on the glass substrate 110 (S1). In this case, as the material of the metal substrate 120, all metals coatable on the glass substrate 110 such as Cr, Ti, Cu, STS, Ni, Cu, Fe, and the like may be selected. Then, the photoresist is coated on the metal substrate 120 to form the photoresist layer 130 (S2). Thereafter, exposure is performed using the photomask 140 (S3). In the photo mask 140, a light transmitting part 40 and an impermeable part 20 are formed in a portion corresponding to the etching part to be formed on the glass substrate 110 so that light is transmitted (or impermeable). As a result, the light irradiated from the light source 30 passes through the light transmitting part 40 to irradiate a portion of the photoresist layer 130 existing on the portion to be etched of the glass substrate 110. Thereafter, a portion of the photoresist layer 130 to which light is irradiated is developed (S4). The developed portion of the photoresist layer 130 is removed, and the portion of the metal substrate 120 underneath is exposed. Subsequently, the metal substrate of the exposed portion was exposed using a metal etching solution such as CERIC AMMONIUM NITRATE and nitric acid (NITRIC ACID) using a chromium etching solution SL-300E (product name of Shilla Entec Co., Ltd.) 120 is removed (S5) As a result, a portion of the glass substrate 110 under the etched portion is exposed. The exposed portion of the organic substrate 110 was used GT-3000 (product name of Jeonyoung Co., Ltd.) containing a glass etching solution, for example, hydrofluoric acid, dipropylene glycol monomethyl ethyr, Noionic surfactant, and pure water. By etching, the pattern 10 is formed (S6). In this case, the glass substrate 110 may be etched after removing the photoresist layer 130, or the glass substrate 110 may be etched without removing the photoresist layer 130. In particular, in this step, since the etching mask is made of metal (Cr, Ti, Cu, STS, Ni, etc.), adhesion to the organic substrate 110 is superior to that of the etching mask with the photosensitive material as in the prior art, and hydrofluoric acid is used. Due to the strong resistance to the etchant of the series, it is possible to easily control the etching depth and realize the shape of a deep and smooth etching line having a three-dimensional effect. In this case, since the depth of the deeper etching irregularities pattern can be realized while maintaining the same pitch of the same irregularities pattern, the reflection angle of the light is narrowed, so the diffuse reflection effect is superior to the conventional products.

Finally, the photoresist layer 130 is removed (omitted when the photoresist layer 130 is removed in step S6) (S7), and the metal substrate 120 is removed to complete the glass decoration. The characteristics of the glass decorative material thus produced will be described in FIG. 3.

3 is a cross-sectional view of a glass decorative material having an improved pattern of depth manufactured according to one embodiment of the present invention. Referring to FIG. 3, a cross-section of a glass decorative material having a pattern having an improved depth manufactured according to an embodiment of the present invention is diffusely reflected by deepening the etching depth 15 of the pattern 10 in the pattern formed on the organic substrate. Increase the effect. Specifically, since the etched depth 15 is deep, the angle at which light is reflected may vary, so that the diffuse reflection effect may be improved when viewed from all angles. In addition, since the light is refracted and reflected in the pattern of the organic substrate 110 itself, and the diffuse reflection effect is strong at the front and the side, a special post process which has been previously performed due to the shallowness of the pattern depth is no longer needed. The detailed structure of this pattern is demonstrated in FIG.

4 is a detailed cross-sectional view of a glass decorative material pattern having a pattern with improved depth according to one embodiment of the present invention. Referring to FIG. 4, the cross section of the glass decorative material pattern having the improved pattern according to one embodiment of the present invention is composed of a depth 15, a width 50, a space 60, and a pitch 70. Here, the cross-sectional shape of the pattern 10 has no predetermined shape, and may be manufactured in circles, ellipses, squares, triangles, and the like. In particular, the depth 15 of the pattern 10 in the present invention can improve the etching depth 15 by using the metal substrate 120 as an etching mask in the manufacturing process. As a result, the ratio of the depth 15 to the width 50 of the pattern 10 can be improved from 1: 5 to 1: 1. Table 1 below is experimental data showing that the etching depth is increased compared to the prior art.

Etching Depth (μm) 10 20 30 40 50 60 70 80 90 Example Good Good Good Good Good Good Good Good Good Comparative example Good Fine defect Bad Bad Bad Bad Bad Bad Bad

In the present experiment, the pitch was maintained at 400 μm, the width was 100 μm, and the space was 300 μm. In the comparative example, the photosensitive material was used as an etching mask of the glass substrate according to the prior art. This is the case where a metal substrate is used as an etching mask of a glass substrate. In each case, the defect rate of the photosensitive material and the metal substrate, that is, the adhesion between the glass substrate and the resistance to the glass substrate etchant (for example, hydrofluoric acid etchant) was tested while increasing the etching depth. As a result of the experiment, the comparative example starts to show a defect when the etching depth is increased to 20 mu m. On the other hand, in the Example, even when it extended to 90 micrometers, defect did not appear. The improved decorative effect due to the improved depth of the pattern is described in FIG. 5.

FIG. 5 is a top view showing an optical image of a glass decorative material having a pattern with an improved depth according to an embodiment of the present invention in comparison with the glass decorative material according to the prior art. FIG. Referring to FIG. 5, the optical image shown in the upper surface of the glass decorative material according to the prior art may be observed to collapse the pattern shape when the depth of the pattern passes a certain level, as shown in part (a) of this figure. . On the other hand, the optical image shown on the upper surface of the glass decorative material according to the present invention, as shown in part (b) of this figure, shows that the pattern shape is clearly formed even if several times the depth of the organic substrate product according to the prior art. . On the other hand, the planar pattern shape of the glass decorative material of the present invention, shown in part (b) of Figure 5 is shown as a line shape of the stripe, but in addition, it is designed in a closed shape, such as circular, oval, polygonal, etc. as necessary May be

In the foregoing detailed description of the present invention, specific examples have been described. However, various modifications are possible within the scope of the present invention. The technical spirit of the present invention should not be limited to the above-described embodiments of the present invention, but should be determined by the claims and equivalents thereof.

110: glass substrate 120: metal substrate
130: photoresist layer 140: photo mask
10: pattern 15: pattern depth (etching depth)
20: impervious part 40: light transmitting part
50: width 60: space
70: pitch

Claims (11)

(a) forming a metal substrate on the glass substrate;
(b) etching the metal substrate to expose a portion of the glass substrate:
(c) forming a pattern by etching the exposed glass substrate using the etched metal substrate as an etching mask; And
(d) a method of manufacturing a glass decorative material having a pattern having an improved depth including removing the metal substrate.
The method of claim 1,
The step (b)
(b1) forming a photoresist layer on the metal substrate;
(b2) exposing and developing the photoresist layer to expose a portion of the metal substrate;
and (b3) etching the exposed metal substrate to expose a portion of the glass substrate.
The method of claim 2,
In the step (c), after removing the photoresist layer, the method of manufacturing a glass decorative material having a pattern having an improved depth which is a step of etching the glass substrate.
The method of claim 2,
Step (d) is a step of removing the photoresist layer and the metal substrate is a method of manufacturing a glass decorative material having a pattern having an improved depth.
The method of claim 1,
The step (c)
And forming a pattern such that the depth of the pattern is greater than 1/10 of the width.
6. The method of claim 5,
The step (c)
The method of manufacturing a glass decorative material having a pattern having an improved depth, the step of forming a pattern so that the ratio of the depth to width of the pattern is 1: 5 to 1: 1.
The method of claim 1,
The step (c)
A method of manufacturing a glass decorative material having a pattern having an improved depth, which is a step of forming a plurality of patterns.
8. The method of claim 7,
The step (c)
And forming a plurality of patterns such that a space between the patterns is 600 µm or less (excluding 0).
The method of claim 8,
The step (c)
A method of manufacturing a glass decorative material having a pattern having an improved depth that is a step of forming a plurality of patterns such that the pitch between the patterns is 700 μm or less (excluding 0).
10. The method according to any one of claims 7 to 9,
The step (c)
The method of manufacturing a glass decorative material having a pattern having an improved depth, the step of forming the pattern so that the cross-sectional shape of the pattern is at least one of circular, elliptical, polygon.
10. The method according to any one of claims 7 to 9,
The step (c)
And forming a pattern such that the planar shape of the pattern is a stripe line or a closed shape including a circle, an ellipse, and a polygon.

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