KR101175492B1 - Cooling unit of electric furnace for chemical vapour deposition apparatus - Google Patents

Cooling unit of electric furnace for chemical vapour deposition apparatus Download PDF

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KR101175492B1
KR101175492B1 KR1020110021340A KR20110021340A KR101175492B1 KR 101175492 B1 KR101175492 B1 KR 101175492B1 KR 1020110021340 A KR1020110021340 A KR 1020110021340A KR 20110021340 A KR20110021340 A KR 20110021340A KR 101175492 B1 KR101175492 B1 KR 101175492B1
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electric furnace
tube
upper die
heater
die
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KR1020110021340A
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Korean (ko)
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호상백
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호상백
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/452—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/02—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture in electric furnaces, e.g. by dielectric heating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4586—Elements in the interior of the support, e.g. electrodes, heating or cooling devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
    • H01L21/205—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy using reduction or decomposition of a gaseous compound yielding a solid condensate, i.e. chemical deposition

Abstract

PURPOSE: A cooling device of an electric furnace for a CVD(Chemical Vapor Deposition) apparatus is provided to improve the smoothness of a thin film by opening a pair of electric furnaces and then blowing air using a cooling fan to rapidly cool a tube. CONSTITUTION: A cooling device of an electric furnace for a CVD apparatus comprises upper and lower dies(30,40) which are arranged under an electric furnace, sliders(50,70) which are respectively installed under the electric furnace and the upper die, a longitudinal guide rail(60) which is installed on the upper die and coupled with the sliders to support the electric furnace being moved longitudinally, a transverse guide rail(80) which is installed on the lower die and coupled with the sliders to support the upper die transversely, and a cooling fan which is installed in the upper die to cool a tube.

Description

화학기상증착기용 전기로의 냉각장치{COOLING UNIT OF ELECTRIC FURNACE FOR CHEMICAL VAPOUR DEPOSITION APPARATUS}COOLING UNIT OF ELECTRIC FURNACE FOR CHEMICAL VAPOUR DEPOSITION APPARATUS}

본 발명은 화학기상증착(CVD, chemical vapor deposition)용으로 사용되는 전기로의 냉각장치에 관한 것으로, 더 상세하게는 튜브의 내부에 증착되는 물질 특성상 가열 후 급냉이 요구되는 경우 튜브를 급속하게 냉각시킬 수 있도록 하고, 또한 이를 통해 튜브안에 증착된 박막의 평활도를 높일 수 있도록 한 화학기상증착기용 전기로의 냉각장치에 관한 것이다.The present invention relates to an apparatus for cooling an electric furnace used for chemical vapor deposition (CVD), and more particularly, to rapidly cool a tube when rapid cooling is required after heating due to a material property deposited inside the tube. The present invention also relates to an apparatus for cooling an electric furnace for chemical vapor deposition, through which it is possible to increase the smoothness of a thin film deposited in a tube.

일반적으로 화학기상증착(CVD, chemical vapor deposition)은 반도체 제조 공정중의 한 단계로 화학 물질을 플라스마(plasma) 및 열을 이용하여 박막을 형성, 메탈라인 아이솔레이션(isolation) 혹은 그 외 다른 목적의 아이솔레이션(isolation)을 목적으로 하는 공정을 말하는 것으로, 이러한 화학기상증착에는 내부에 증착하고자 하는 물질이 주입된 각종 세라믹,석영,메탈,서스,흑연 등 진공상태의 튜브를 가열하는 화학기상증착기용 전기로가 사용된다.In general, chemical vapor deposition (CVD) is a step in the semiconductor manufacturing process that uses a plasma and heat to form a thin film, isolating metal lines or other purposes. It refers to a process for the purpose of (isolation), and the chemical vapor deposition is an electric furnace for chemical vapor deposition that heats tubes in a vacuum state such as various ceramics, quartz, metal, sus, graphite, etc. Used.

이와 같이 화학기상증착기용 전기로는 내부에 증착하고자 하는 물질이 주입된 진공상태의 튜브를 가열하는 것으로, 이러한 화학기상증착기용 전기로는 튜브의 내부에 증착되는 물질 특성상 가열 후 급냉이 요구되는 경우 튜브를 급속하게 냉각시켜야 박막의 평활도를 높일 수 있다.As such, the chemical vapor deposition electric furnace heats a vacuum tube in which a substance to be deposited is injected. The chemical vapor deposition electric furnace heats a tube when quenching is required after heating due to the material deposited in the tube. Cooling rapidly can increase the smoothness of the thin film.

즉, 플렉시블한 터치판넬에 그래핑을 입히는 경우와 같이 물질 특성상 가열 후 급냉을 시키는 이유는, 1000℃ 이상의 고온으로 튜브를 가열하면 튜브내의 주입된 물질이 반응하여 증착하게 되는데, 증착 후 튜브를 급냉시키지 않으면 내부에서 물질이 반응하여 증착이 계속적으로 진행되어 평활도가 떨어지기 때문에 튜브를 급속하게 냉각시켜야 평활도를 높일 수 있다.That is, the reason for quenching after heating due to the characteristics of the material, as in the case of coating the flexible touch panel, is that when the tube is heated to a high temperature of 1000 ° C. or higher, the injected material in the tube reacts and deposits. If you do not do this, the material reacts inside and the deposition continues and the smoothness drops, so the tube needs to be cooled rapidly to increase the smoothness.

그러나 종래의 화학기상증착기용 전기로는 구조적으로 튜브의 내부에 증착되는 물질 특성상 가열 후 급냉이 요구되는 경우 튜브를 급속하게 냉각시킬 수 없는 문제점이 있었으며, 또한 이로 인해 튜브안에 증착된 박막의 평활도가 떨어지게 되는 문제점이 있었다.However, the conventional electric furnace for chemical vapor deposition has a problem in that it is not possible to rapidly cool the tube when the quenching is required after heating due to the material property of the structure deposited inside the tube. There was a problem.

본 발명의 목적은 상기에서와 같은 종래의 결점을 해소하기 위해 발명한 것으로, 튜브의 내부에 증착되는 물질 특성상 가열 후 급냉이 요구되는 경우 튜브를 급속하게 냉각시킬 수 있도록 하고, 또한 이를 통해 튜브안에 증착된 박막의 평활도를 높일 수 있도록 한 화학기상증착기용 전기로의 냉각장치를 제공하는데 있다.An object of the present invention is to invent the above-mentioned conventional drawbacks, and to rapidly cool the tube when quenching is required after heating due to the material properties deposited inside the tube. It is to provide a cooling apparatus for an electric furnace for chemical vapor deposition to increase the smoothness of the deposited thin film.

상기 목적을 달성하기 위해 본 발명은 잠금부재를 통해 분리가능하게 결합되는 케이스, 케이스에 각각 내장되어 튜브가열홈과 튜브지지홈을 구비하는 세라믹 화이버 보드로 이루어진 단열재, 단열재에 설치되어 튜브를 가열하는 히터로 이루어진 한쌍의 분리형 전기로에 있어서, 상기 전기로의 하부에 상,하부다이를 각각 배치하고, 상기 전기로의 하부에 슬라이더를 각각 설치하며, 상기 상부다이의 상부에 슬라이더와 결합되어 전기로를 전후로 이동가능하게 지지하는 전후안내레일을 설치하고, 상기 상부다이의 하부에 슬라이더를 설치하며, 상기 하부다이의 상부에 슬라이더와 결합되어 상부다이를 좌우로 이동가능하게 지지하는 좌우안내레일을 설치하고, 상기 상부다이에 튜브를 냉각시키는 냉각팬을 설치한 것이다.In order to achieve the above object, the present invention is installed in a heat insulating material, a heat insulating material made of a ceramic fiber board having a tube heating groove and a tube support groove, each of which is detachably coupled to the case through a lock member, and is provided with a tube heating groove and a tube support groove. In a pair of separate electric furnace consisting of a heater, the upper and lower dies are respectively disposed at the lower part of the electric furnace, the sliders are respectively installed at the lower part of the electric furnace, and the upper and lower dies are combined with the slider to move the electric furnace back and forth. Install the front and rear guide rails to support the upper and lower, the slider is installed in the lower portion of the upper die, the left and right guide rails coupled to the upper portion of the lower die to support the upper die to move left and right, the upper The die is equipped with a cooling fan to cool the tubes.

본 발명의 화학기상증착용 전기로의 냉각장치에 따르면, 튜브의 내부에 증착되는 물질 특성상 가열 후 급냉이 요구되는 경우, 한쌍의 전기로를 개방시킨 상태에서 옆으로 밀고 밑에서 냉각팬으로 바람을 발생시켜 튜브를 급속하게 냉각시킬 수 있으며, 또한 이를 통해 튜브안에 증착된 박막의 평활도를 높일 수 있는 효과가 있다.According to the cooling apparatus of the chemical vapor deposition electric furnace of the present invention, if quenching is required after heating due to the material properties deposited inside the tube, a pair of electric furnaces are pushed to the side in an open state and the wind is generated by a cooling fan from the bottom of the tube. It can rapidly cool, and also through this has the effect of increasing the smoothness of the thin film deposited in the tube.

도 1,2,3은 본 발명의 구조와 작동상태를 보인 사시도.
도 4는 본 발명에 따른 히터의 구조를 보인 단면도.1,2,3 are perspective views showing the structure and operation of the present invention.
Figure 4 is a cross-sectional view showing the structure of a heater according to the present invention.

이하 첨부된 도면에 따라서 본 발명의 기술적 구성을 상세히 설명하면 다음과 같다.Hereinafter, the technical configuration of the present invention according to the accompanying drawings in detail.

본 발명의 화학기상증착기용 전기로 냉각장치는 도 1 내지 도 4에 도시되는 바와 같이, 잠금부재(11a)를 통해 분리가능하게 결합되는 케이스(11), 케이스(11)에 각각 내장되어 튜브가열홈(12a)과 튜브지지홈(12b)을 구비하는 세라믹 화이버 보드로 이루어진 단열재(12), 단열재(12)에 설치되어 튜브(20)를 가열하는 히터(13)로 이루어진 한쌍의 분리형 전기로(10)에 작동연결된 냉각장치에 있어서, 상기 전기로(10)의 하부에 배치되는 상,하부다이(30)(40); 상기 전기로(10)의 하부에 각각 구비되는 슬라이더(50); 상기 상부다이(30)의 상부에 슬라이더(50)와 결합되도록 설치되어 전기로(10)를 전후로 이동가능하게 지지하는 전후안내레일(60); 상기 상부다이(30)의 하부에 구비되는 슬라이더(70); 상기 하부다이(40)의 상부에 슬라이더(70)와 결합되도록 설치되어 상부다이(30)를 좌우로 이동가능하게 지지하는 좌우안내레일(80); 상기 상부다이(30)에 설치되어 튜브(20)를 냉각시키는 냉각팬(90)을 포함하여 구성된 것을 그 기술적 구성상의 특징으로 한다.As shown in FIGS. 1 to 4, the electric furnace cooling apparatus of the chemical vapor deposition machine of the present invention is built in the case 11 and the case 11 which are detachably coupled through the locking member 11a, respectively, and the tube is heated. A pair of separate electric furnaces comprising a heat insulator 12 made of a ceramic fiber board having a groove 12a and a tube support groove 12b, and a heater 13 installed in the heat insulator 12 to heat the tube 20 ( 10. A cooling device operatively connected to 10, comprising: upper and lower dies 30 and 40 disposed at a lower portion of the electric furnace 10; Sliders 50 provided at lower portions of the electric furnace 10; Front and rear guide rail 60 is installed to be coupled to the slider 50 on the upper die 30 to support the electric furnace 10 to move forward and backward; A slider 70 provided below the upper die 30; Left and right guide rails 80 which are installed to be coupled to the slider 70 on the lower die 40 to support the upper die 30 to move left and right; It is characterized in that the technical configuration is configured to include a cooling fan 90 installed in the upper die 30 to cool the tube (20).

여기서, 상기 전기로(10)는 내부에 증착하고자 하는 물질이 주입된 튜브(20)를 감싸서 가열하는 것으로, 이러한 전기로(10)는 2개로 등분된 한쌍의 분리형으로 이루어진다.Here, the electric furnace 10 is to wrap and heat the tube 20 is injected into the material to be deposited therein, the electric furnace 10 is composed of a pair of two divided into two.

이와 같은 한쌍의 전기로(10)는 케이스(11)와 단열재(12) 및 히터(13)로 이루어진다.Such a pair of electric furnace 10 is composed of a case 11, the heat insulating material 12 and the heater (13).

상기 케이스(11)는 2개가 한쌍으로 이루어져 전기로(10)의 본체를 구성하는 것으로, 이러한 케이스(11)는 잠금부재(11a)를 통해 서로 분리가능하게 결합된다. 이때, 상기 케이스(11)는 원형,사각,육각,팔각 등의 다양한 형상으로 형성된다.The case 11 is composed of two pairs to constitute the main body of the electric furnace 10, the case 11 is detachably coupled to each other through the locking member (11a). At this time, the case 11 is formed in various shapes such as circular, square, hexagonal, octagonal and the like.

상기 단열재(12)는 2개가 한쌍으로 이루어져 케이스(11)에 각각 내장되는 것으로, 이러한 단열재(12)에는 서로 대응하는 튜브가열홈(12a)과 튜브지지홈(12b)이 각각 형성되고, 튜브가열홈(12a)에는 히터(13)를 수용하는 다수의 히터설치홈(12c)이 길이방향으로 형성된다. 이때, 상기 단열재(12)는 세라믹 화이버 보드 재질로 이루어진다.The heat insulating material 12 is a pair of two is built in the case 11, each of the tube heating grooves (12a) and tube support grooves (12b) corresponding to each other is formed in the heat insulating material (12), tube heating In the groove 12a, a plurality of heater installation grooves 12c for accommodating the heater 13 are formed in the longitudinal direction. At this time, the heat insulator 12 is made of a ceramic fiber board material.

상기 히터(13)는 단열재(12)에 설치되어 튜브(20)를 가열하는 것으로, 이러한 히터(13)는 도 4에서와 같이 세라믹(13a)에 열선(13b)이 매몰된 세라믹히터로 이루어진다.The heater 13 is installed in the heat insulator 12 to heat the tube 20. The heater 13 is made of a ceramic heater in which the heating wire 13b is embedded in the ceramic 13a as shown in FIG.

상기 튜브(20)는 주지된 바와 같이 내부에 증착하고자 하는 물질이 주입되는 것으로, 이러한 튜브(20)는 양측 지지대(21)에 지지된다. 이때, 상기 튜브(20)는 세라믹,석영,메탈,서스,흑연 등으로 이루어진다.As is well known, the tube 20 is injected with a substance to be deposited therein, and the tube 20 is supported by both support members 21. At this time, the tube 20 is made of ceramic, quartz, metal, sus, graphite.

상기 상부다이(30)는 전기로(10)의 하부에 배치되는 것으로, 이러한 상부다이(30)의 상부에는 전기로(10)의 전후이동을 안내하는 전후안내레일(60)이 폭방향으로 설치되고, 상부다이(30)의 하부에는 전기로(10)의 좌우 이동을 안내하는 슬라이더(70)가 설치된다.The upper die 30 is disposed in the lower portion of the electric furnace 10, the front and rear guide rail 60 for guiding the forward and backward movement of the electric furnace 10 is installed in the upper direction of the upper die 30 in the width direction In the lower portion of the upper die 30, a slider 70 for guiding the left and right movement of the electric furnace 10 is installed.

상기 하부다이(40)는 상부다이(30)의 하부에 배치되는 것으로, 이러한 하부다이(40)의 상부에는 상부다이(30)의 좌우이동을 안내하는 좌우안내레일(80)이 길이방향으로 설치된다.The lower die 40 is disposed below the upper die 30, and the left and right guide rails 80 for guiding the left and right movements of the upper die 30 are installed in the upper direction of the lower die 40 in the longitudinal direction. do.

상기 슬라이더(50)는 전기로(10)의 양측 하부에 각각 설치되는 것으로, 이러한 슬라이더(50)는 전후안내레일(60)과 각각 결합되어 전기로(10)를 전후로 각각 이동시키는 역할을 수행한다.The slider 50 is installed at both lower sides of the electric furnace 10, respectively, the slider 50 is coupled to each of the front and rear guide rails 60 to serve to move the electric furnace 10 forward and backward, respectively. .

상기 전후안내레일(60)은 상부다이(30)의 상부에 슬라이더(50)와 결합되도록 설치되는 것으로, 이러한 전후안내레일(60)은 전기로(10)를 전후로 이동가능하게 지지하는 역할을 수행한다.The front and rear guide rails 60 are installed to be coupled to the slider 50 at the upper portion of the upper die 30, and the front and rear guide rails 60 serve to support the electric furnace 10 to be moved back and forth. do.

상기 슬라이더(70)는 상부다이(30)의 양측 하부에 각각 설치되는 것으로, 이러한 슬라이더(70)는 좌우안내레일(80)과 각각 결합되어 상부다이(30)를 좌우로 이동시키는 역할을 수행한다.The slider 70 is installed on both lower sides of the upper die 30, respectively, the slider 70 is coupled to the left and right guide rails 80 to move the upper die 30 to the left and right. .

상기 좌우안내레일(80)은 하부다이(40)의 상부에 슬라이더(70)와 결합되도록 설치되는 것으로, 이러한 좌우안내레일(80)은 상부다이(30)를 좌우로 이동가능하게 지지하는 역할을 수행한다.The left and right guide rails 80 are installed to be coupled to the slider 70 on the upper portion of the lower die 40, and the left and right guide rails 80 serve to support the upper die 30 to be moved left and right. To perform.

상기 냉각팬(90)은 상부다이(30)에 설치되는 것으로, 이러한 냉각팬(90)은 튜브(20)의 내부에 증착되는 물질 특성상 가열 후 급냉이 요구되는 경우 튜브(20)를 냉각시키는 역할을 수행한다.The cooling fan 90 is installed in the upper die 30, the cooling fan 90 serves to cool the tube 20 when quenching is required after heating due to the material properties deposited inside the tube 20. Do this.

이와 같이 구성된 본 발명의 전체적인 작동관계를 상세히 설명하면 다음과 같다.The overall operation of the present invention will now be described in detail.

먼저, 전기로(10)로 튜브(20)를 가열할 경우에는, 도 1에서와 같이 한쌍의 단열재(12)의 튜브가열홈(12a)과 튜브지지홈(12b)이 튜브(20)에 끼워지도록 결합한 상태에서 양측 잠금부재(11a)를 각각 체결하여 잠그고, 이 상태에서 히터(13)를 작동시키면 단열재(12)의 튜브가열홈(12a)과 튜브지지홈(12b)에 끼워진 튜브(20)는 고온으로 빨리 가열된다.First, when the tube 20 is heated by the electric furnace 10, the tube heating grooves 12a and the tube support grooves 12b of the pair of heat insulating materials 12 are inserted into the tube 20, as shown in FIG. When both sides of the locking member (11a) is fastened and locked in the coupled state, and operating the heater 13 in this state, the tube 20 fitted in the tube heating groove 12a and tube support groove 12b of the heat insulating material 12. Is quickly heated to high temperatures.

튜브(20)의 가열이 완료된 다음 튜브(20)안에 증착되는 물질 특성상 가열 후 급냉이 요구되는 경우에는, 도 2에서와 같이 양측 잠금부재(11a)를 각각 해체하여 분리하고, 이 상태에서 전기로(10)를 전후로 각각 이동시켜 튜브(20)로부터 이격되도록 개방시킨 후, 냉각팬(90)을 작동시키면 가열된 튜브(20)는 냉각팬(90)에서 상부로 불어오는 바람에 의해 급속하게 냉각된다.If the heating of the tube 20 is completed and then quenching is required after heating due to the material property deposited in the tube 20, as shown in FIG. 2, the two locking members 11a are dismantled and separated, and in this state, an electric furnace is used. After moving (10) back and forth to open the tube 20 so as to be spaced apart from each other, when the cooling fan 90 is operated, the heated tube 20 is rapidly cooled by the wind blowing upward from the cooling fan 90. do.

한편, 본 발명에 따르면 도 3에서와 같이 상부다이(30)를 옆으로 밀어 전기로(10)를 옆으로 이동시킨 상태에서 사용할 수도 있다.Meanwhile, according to the present invention, the upper die 30 may be pushed to the side as shown in FIG. 3, and the electric furnace 10 may be moved to the side.

따라서 이러한 본 발명은 튜브(20)의 내부에 증착되는 물질 특성상 가열 후 급냉이 요구되는 경우, 상술한 바와 같이 한쌍의 전기로(10)를 전후로 각각 밀어 개방시킨 상태에서, 전기로(10)를 옆으로 밀고 밑에서 냉각팬(90)으로 바람을 발생시켜 튜브(20)를 급속하게 냉각시킬 수 있는 장점이 있다.Therefore, in the present invention, when quenching is required after heating due to the material properties deposited inside the tube 20, the electric furnace 10 is opened in a state in which the pair of electric furnaces 10 are pushed back and forth, respectively, as described above. There is an advantage that can rapidly cool the tube 20 by pushing to the side and generating wind to the cooling fan 90 from the bottom.

또한 본 발명은 상술한 바와 같이 튜브(20)의 내부에 증착되는 물질 특성상 가열 후 급냉이 요구되는 경우, 냉각팬(90)을 이용하여 튜브(20)를 급속하게 냉각시킬 수 있기 때문에, 이를 통해 튜브(20)안에 증착된 박막의 평활도를 높일 수 있는 장점이 있다.In addition, according to the present invention, if rapid cooling is required after heating due to the material property deposited in the inside of the tube 20, the tube 20 may be rapidly cooled using the cooling fan 90, and thus, There is an advantage that can increase the smoothness of the thin film deposited in the tube (20).

10 : 전기로 11 : 케이스
11a : 잠금부재 12 : 단열재
12a : 튜브가열홈 12b : 튜브지지홈
12c : 히터설치홈 13 : 히터
13a : 세라믹 13b : 열선
20 : 튜브 30 : 상부다이
40 : 하부다이 50 : 슬라이더
60 : 전후안내레일 70 : 슬라이더
80 : 좌우안내레일 90 : 냉각팬10: electric furnace 11: case
11a: locking member 12: insulation
12a: tube heating groove 12b: tube support groove
12c: Heater installation groove 13: Heater
13a: ceramic 13b: heating wire
20 Tube 30 Upper Die
40: lower die 50: slider
60: front and rear guide rail 70: slider
80: left and right guide rail 90: cooling fan

Claims (2)

잠금부재(11a)를 통해 분리가능하게 결합되는 케이스(11), 케이스(11)에 각각 내장되어 튜브가열홈(12a)과 튜브지지홈(12b)을 구비하는 세라믹 화이버 보드로 이루어진 단열재(12), 단열재(12)에 설치되어 튜브(20)를 가열하는 히터(13)로 이루어진 한쌍의 분리형 전기로(10)에 작동연결된 냉각장치에 있어서, 전기로(10)의 하부에 배치되는 상,하부다이(30)(40); 상기 전기로(10)의 하부에 각각 구비되는 슬라이더(50); 상부다이(30)의 상부에 슬라이더(50)와 결합되도록 설치되어 전기로(10)를 전후로 이동가능하게 지지하는 전후안내레일(60); 상부다이(30)의 하부에 구비되는 슬라이더(70); 하부다이(40)의 상부에 슬라이더(70)와 결합되도록 설치되어 상부다이(30)를 좌우로 이동가능하게 지지하는 좌우안내레일(80); 상부다이(30)에 설치되어 튜브(20)를 냉각시키는 냉각팬(90)을 포함하는 화학기상증착기용 전기로의 냉각장치.Insulation material 12 made of a ceramic fiber board having a tube heating groove 12a and a tube support groove 12b respectively embedded in the case 11 and the case 11 detachably coupled through the locking member 11a. In the cooling device installed in a pair of separate electric furnace (10) consisting of a heater (13) installed in the heat insulating material (12) to heat the tube (20), the upper and lower parts disposed in the lower part of the electric furnace (10) Die 30 and 40; Sliders 50 provided at lower portions of the electric furnace 10; Front and rear guide rail 60 is installed to be coupled to the slider 50 on the upper die 30 to support the electric furnace 10 to move forward and backward; A slider 70 provided below the upper die 30; Left and right guide rails 80 which are installed to be coupled to the slider 70 on the lower die 40 to support the upper die 30 to move left and right; Cooling apparatus for an electric furnace for chemical vapor deposition comprising a cooling fan (90) installed in the upper die (30) to cool the tube (20). 제 1 항에 있어서, 상기 히터(13)는 세라믹(13a)에 열선(13b)이 매몰된 세라믹히터로 이루어지고, 상기 단열재(12)의 튜브가열홈(12a)에는 히터(13)를 수용하는 다수의 히터설치홈(12c)이 형성된 것을 특징으로 하는 화학기상증착기용 전기로의 냉각장치.The method of claim 1, wherein the heater 13 is made of a ceramic heater in which the heating wire 13b is embedded in the ceramic 13a, and the heater 13 is accommodated in the tube heating groove 12a of the heat insulating material 12. Cooling apparatus for an electric furnace for chemical vapor deposition, characterized in that a plurality of heater installation grooves (12c) is formed.
KR1020110021340A 2011-03-10 2011-03-10 Cooling unit of electric furnace for chemical vapour deposition apparatus KR101175492B1 (en)

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003026433A (en) 2001-05-10 2003-01-29 Tokuyama Toshiba Ceramics Co Ltd Method of joining quartz glass member and joining equipment used for this method
KR100727736B1 (en) 2005-12-22 2007-06-13 현대하이스코 주식회사 Simulator for batch annealing furnace and method of experiment thereof

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003026433A (en) 2001-05-10 2003-01-29 Tokuyama Toshiba Ceramics Co Ltd Method of joining quartz glass member and joining equipment used for this method
KR100727736B1 (en) 2005-12-22 2007-06-13 현대하이스코 주식회사 Simulator for batch annealing furnace and method of experiment thereof

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