KR101025069B1 - In plane switching mode liquid crystal display device preventing light leakage - Google Patents

Abstract

The transverse electric field mode liquid crystal display device of the present invention is for preventing image quality degradation due to light leakage in a pixel by changing the width of the color filter layer disposed in the pixel, and is composed of a plurality of domains defined by gate lines and data lines. A pixel, a switching element formed in the pixel, a common electrode and a pixel electrode disposed substantially parallel in the pixel to form a transverse electric field, and a color filter layer formed in the pixel to implement color, wherein the color filter layer The width is formed differently according to the position in the pixel, characterized in that to prevent light leakage in the pixel.

Transverse electric field mode, light leakage area, color filter layer, width, domain

Description

Transverse electric field mode liquid crystal display device preventing light leakage {IN PLANE SWITCHING MODE LIQUID CRYSTAL DISPLAY DEVICE PREVENTING LIGHT LEAKAGE}

1 (a) and 1 (b) are diagrams showing the basic concept of a transverse electric field mode liquid crystal display device.

2 is a plan view showing the structure of a conventional transverse electric field mode liquid crystal display device.

(A) is sectional drawing along the II 'line | wire of FIG.

(B) is sectional drawing along the II-II 'line | wire of FIG.

4 (a) and 4 (b) are cross-sectional views showing the structure of a transverse electric field mode liquid crystal display device according to the present invention.

5 is a plan view illustrating a transverse electric field mode liquid crystal display device in which a color filter layer is misaligned.

6 is a plan view showing a transverse electric field mode liquid crystal display device according to an embodiment of the present invention.

FIG. 7 is a view showing a color filter layer of the transverse electric field mode liquid crystal display shown in FIG.

*** Explanation of symbols for main parts of drawing ***

102,202 gate line 103,203 data line

105,205: common electrode 107,207: pixel electrode                 

115,215: thin film transistor 134,234: color filter layer

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transverse electric field mode liquid crystal display device. Particularly, a transverse electric field mode liquid crystal capable of preventing light leakage due to misalignment of a color filter layer by forming a width of a color filter layer arranged in a pixel differently according to a position in a pixel. It relates to a display element.

Recently, with the development of various portable electronic devices such as mobile phones, PDAs, and notebook computers, there is a growing demand for flat panel display devices for light and thin applications. Such flat panel displays are being actively researched, such as LCD (Liquid Crystal Display), PDP (Plasma Display Panel), FED (Field Emission Display), VFD (Vacuum Fluorescent Display), but mass production technology, ease of driving means, Liquid crystal display devices (LCDs) are in the spotlight for reasons of implementation.

Such liquid crystal display devices have various display modes according to the arrangement of liquid crystal molecules. However, TN mode liquid crystal display devices are mainly used because of the advantages of easy monochrome display, fast response speed, and low driving voltage. In such a TN mode liquid crystal display device, liquid crystal molecules aligned horizontally with the substrate are almost perpendicular to the substrate when a voltage is applied. Therefore, there is a problem that the viewing angle is narrowed upon application of voltage due to the refractive anisotropy of the liquid crystal molecules.                         

In order to solve this viewing angle problem, liquid crystal display devices of various modes having wide viewing angle characteristics have recently been proposed, but among them, the liquid crystal display device of the lateral field mode (In Plane Switching Mode) is applied to actual production. It is produced. The IPS mode liquid crystal display device improves the viewing angle characteristic by forming a planar transverse electric field when a voltage is applied and aligning the liquid crystal molecules in a planar manner. The basic concept of FIGS. 1 (a) and 1 (b) is improved. Is shown.

As shown in FIG. 1A, in the IPS mode liquid crystal display device, the common electrode 5 and the pixel electrode 7 are arranged substantially in parallel on the liquid crystal panel 1 and formed on the panel 1. The rubbing direction of the alignment layer is formed at a predetermined angle with the common electrode 5 and the pixel electrode 7. Therefore, when no voltage is applied to the pixel electrode 7, the liquid crystal molecules 42 are arranged along the rubbing direction and are oriented at a constant angle with the common electrode 5 and the pixel electrode 7.

When a voltage is applied to the common electrode 5 and the pixel electrode 7, a transverse electric field substantially parallel to the surface of the panel 1 is generated between the common electrode 5 and the pixel electrode 7, and FIG. 1. As shown in (b), the liquid crystal molecules 42 are oriented perpendicular to the common electrode 5 and the pixel electrode 7.

In other words, when a voltage is applied, the liquid crystal molecules 42 rotate on the same plane along the transverse electric field, and as a result, gray level inversion due to refractive anisotropy of the liquid crystal molecules 42 can be prevented.

However, in the IPS mode liquid crystal display device as described above, there is a problem that the color changes according to the viewing angle direction. Although not shown, the common electrode 5 and the pixel electrode 7 are formed on the first substrate (the TFT substrate on which the thin film transistor is formed) of the liquid crystal display device. The liquid crystal molecules 42a are oriented perpendicular to the common electrode 5 and the pixel electrode 7 by the transverse electric field, while the liquid crystal molecules 42b near the second substrate (the color filter substrate on which the color filter is formed) are common. The electrodes 5 and the pixel electrodes 7 are oriented at a predetermined angle. That is, the liquid crystal molecules 42a and 42b are twisted from the first substrate to the second substrate. At this time, since the liquid crystal molecules 42 are twisted in a specific direction, color conversion occurs in the viewing angle directions of X and Y, as shown in FIG.

In order to solve the above problems, an IPS mode liquid crystal display device having a structure as shown in FIG. 2 has been proposed. As shown in Fig. 2, in the IPS mode liquid crystal display device of this structure, the data lines 3 are arranged not at right angles to the gate line 2 but at a predetermined angle. In addition, the common electrode 5 and the pixel electrode 7 arranged in the pixel defined by the gate line 2 and the data line 3 to form a transverse electric field also have a constant angle with the gate line 2, that is, It is arranged parallel to the data line (3). In the pixel, the common line 8 to which the common electrode 5 is connected and the pixel electrode line 9 to which the pixel electrode 7 is connected are overlapped to form storage capacitance.

The pixel is divided into two domains around the extension direction of the gate line 2 formed in the pixel. That is, the common electrode 5 and the pixel electrode 7 are symmetrically arranged around the extension direction of the gate line 2 with respect to the center of the pixel. Therefore, since the transverse electric fields in the upper and lower domains are symmetrically applied to each other, the viewing angle in one pixel can be compensated to improve the viewing angle characteristic.                         

The thin film transistor 15 including the gate electrode 16, the semiconductor layer 17, the source electrode 18, and the drain electrode 19 is formed in an area where the gate line 2 and the data line 3 intersect in the pixel. In this case, a signal input from the outside is applied to the pixel electrode 7, and a transverse electric field is generated in the liquid crystal layer as the signal is applied.

In this case, reference numeral 34 denotes a color filter layer that implements actual colors. The color filter layer 34 is formed in an image display area of a pixel, and overlaps a part of the common electrode 5 that is outermost to the pixel (that is, disposed near the data line 3).

In the IPS mode liquid crystal display device having the above-described structure, the liquid crystal molecules rotate on the same plane along the transverse electric field, thereby preventing gray level inversion due to refractive anisotropy of the liquid crystal molecules. In addition, the viewing angle characteristic can be improved by configuring the pixel in two domains with different viewing angles.

The conventional IPS mode liquid crystal display device having the above structure will be described in more detail with reference to FIGS. 3 (a) and 3 (b) as follows. 3 (a) is a cross-sectional view taken along the line II ′ of FIG. 2 and shows the structure of the thin film transistor, and FIG. 3 (b) is a cross-sectional view taken along the line II-II ′ of FIG.

As shown in FIG. 3A, the gate electrode 16 is formed on the first substrate 20, and the gate insulating layer 22 is stacked over the entire first substrate 20. The semiconductor layer 17 is formed on the gate insulating layer 22, and the source electrode 18 and the drain electrode 19 are formed thereon. In addition, a passivation layer 24 is formed on the entire first substrate 20.

The black matrix 32 and the color filter layer 34 are formed on the second substrate 30. The black matrix 32 is used to prevent light leakage into an area where liquid crystal molecules do not operate. The black matrix 32 is mainly formed between the thin film transistor 10 and between the pixel and the pixel (ie, the gate line and the data line area). . The color filter layer 34 is composed of R (Red), G (Green), and B (Blue) to realize actual colors. Each of the R, G, and B color filter layers 34 is formed in one pixel to form R, G, and B pixels, and each of the dots for displaying an image by the color implemented by the R, G, and B pixels ( dot) is displayed. Although not shown in the drawing, the color filter layer 34 is formed with an overcoat layer for planarization.

The liquid crystal layer 40 is formed between the first substrate 20 and the second substrate 30 to complete the liquid crystal panel 1.

As shown in FIG. 3B, a plurality of common electrodes 5 are formed on the first substrate 20, and a pixel electrode 7 and a data line 3 are formed on the gate insulating layer 22. Thus, a transverse electric field is generated between the common electrode 5 and the pixel electrode 7.

At this time, the common electrode 5 is arranged near the data line 3, that is, at the outermost part of the pixel, for the reason of shielding an electric field generated between the data line 3 and the pixel electrode 7. This is to prevent the transverse electric field applied to the liquid crystal layer 40 from being distorted.

Meanwhile, the black matrix 32 and the color filter layer 34 are formed on the second substrate 30. In this case, the black matrix 32 is disposed on the data line 3 and the outermost common electrode 5 of the pixel.

The IPS mode liquid crystal display device having the above configuration is formed by bonding the first substrate 20 and the second substrate 30 through separate processes (that is, a thin film transistor process and a color filter process) and then bonding them by a bonding process. do. Joining of the first substrate 20 and the second substrate 30 is performed by applying a sealant to the outer region of the first substrate 20 or the second substrate 30 and by mechanical pressure. Therefore, not only misalignment may occur during bonding, but also the first substrate 20 and the second substrate 30 may slide due to external force during bonding. This misalignment or slippage of the first substrate 20 and the second substrate 30 is a major factor in lowering the luminance and decreasing the aperture ratio of the IPS mode liquid crystal display device after the bonding of the first substrate 20 and the second substrate 30. Cause.

SUMMARY OF THE INVENTION The present invention has been made in view of the above, and an object thereof is to provide a transverse electric field mode liquid crystal display device capable of minimizing alignment error and simplifying a manufacturing process by forming a color filter layer on a thin film transistor.

Another object of the present invention is to provide a transverse electric field mode liquid crystal display device capable of removing light leakage regions in a pixel by setting different widths in the color filter layer disposed in the pixel.

In order to achieve the above object, the transverse electric field mode liquid crystal display device according to the present invention comprises a plurality of pixels consisting of a plurality of domains defined by gate lines and data lines, a switching element formed in the pixel, and A common electrode and a pixel electrode disposed substantially parallel to form a transverse electric field, and a color filter layer disposed in the pixel to implement color and increasing in width toward an upper portion of the pixel.

The switching element includes a gate electrode formed on a first substrate, a gate insulating layer formed on the gate electrode, a semiconductor layer formed on the gate insulating layer, a source electrode and a drain electrode formed on the semiconductor layer, the source electrode and a drain. A protective layer formed on the electrode, the color filter layer is formed on the protective layer. In this case, the common electrode and the pixel electrode may be bent at least once to form a plurality of domain regions in the pixel.

In the present invention, the black matrix and the color filter layer are formed on the first substrate on which the thin film transistor is formed in order to prevent defects caused by the bonding error between the first substrate and the second substrate. This structure is called COT (Color filter On TFT). In this COT structure, the black matrix and the color filter layer are formed on the thin film transistor to prevent defects caused by the bonding error between the first substrate and the second substrate. In addition, since the color filter layer is formed on the first substrate in the COT structure, an overcoat layer for generating a step in the second substrate is not required, thereby simplifying the process and reducing the manufacturing cost.

4 (a) and 4 (b) are cross-sectional views showing the structure of the IPS mode liquid crystal display device having the COT structure, and FIG. 4 (a) shows the structure of the thin film transistor, and FIG. 4 (b) shows the pixel structure. It is a figure which shows.                     

As shown in FIG. 4A, a gate electrode 116 is formed on the first substrate 120, and a gate insulating layer 22 is stacked over the entire first substrate 120. The semiconductor layer 117 is formed on the gate insulating layer 122, and a source electrode 118 and a drain electrode 119 are formed thereon. In addition, a protective layer 124 is formed over the entire first substrate 20.

The black matrix 132 and the color filter layer 134 are formed on the passivation layer 124. The black matrix 132 is to prevent light leakage into a region in which the liquid crystal molecules do not operate. The black matrix 132 is mainly formed in the region of the thin film transistor 110 as shown in FIG. The color filter layer 34 is composed of R (Red), G (Green), and B (Blue) to realize actual colors. In addition, the liquid crystal layer 140 is formed between the first substrate 120 and the second substrate 130 to complete the liquid crystal panel.

As shown in FIG. 4B, a plurality of common electrodes 5 are formed on the first substrate 20, and a pixel electrode 7 and a data line 3 are formed on the gate insulating layer 22. Thus, a transverse electric field is generated between the common electrode 5 and the pixel electrode 7.

The black matrix 132 is formed on the outermost common electrode 105 disposed near the data line 103 and the data line 105, and the color filter layer 134 is formed on the innermost innermost pixel region. . The area in which the color filter layer 134 is formed is an area in which an actual image is displayed and should match the area in which the transverse electric field is applied by the common electrode 5 and the pixel electrode 7. Accordingly, the color filter layer 134 is formed over the entire region where the transverse electric field is applied by the common electrode 5 and the pixel electrode 7. In addition, a part of the color filter layer 134 should overlap with a part of the outermost common electrode 105 of the pixel. When a part of the color filter layer 134 does not overlap the outermost common electrode 105 and there is a gap between the color filter layer 134 and the outermost common electrode 105, the color filter layer 134 is disposed in a portion of the display area. Since no light is generated and a light leak occurs, the color filter layer 134 and the outermost common electrode 105 must overlap. That is, the color filter layer 134 and the black matrix must overlap.

The thin film transistor 110 and the color filter layer 134 are formed by a photolithography process including an exposure process. In general, the thin film transistor 110 and the color filter layer 134 have different resolutions and process precisions, and thus different equipments are used. In the thin film transistor process, a projection type exposure machine with good resolution is used, whereas in the color filter process, a relatively low resolution Proximate type exposure machine is used. This is because the projection type exposure machine is relatively expensive compared to the Proximate type exposure machine, and therefore, the cost of manufacturing the liquid crystal display device increases when the expensive projection type exposure machine is used for the color filter process that does not require high resolution.

On the other hand, as the different exposure machines are used in the thin film transistor process and the color filter process, the following problems may occur.

Since the Proximate type exposure machine used in the color filter process has low resolution, misalignment is more likely to occur when the color filter layer is formed than the thin film transistors (common electrode, pixel electrode, and data line) that use high-resolution projection type exposure machines. In this case, when the color filter layer 134 is formed on the protective layer 124, the outermost common electrode 105 of the pixel and the color filter layer 134 do not overlap due to misalignment of the color filter layer 134. In other words, a light leakage region in which no color is displayed is generated in the pixel region. This light leakage region is a major cause of deterioration of the image quality of the liquid crystal display device.

In the exposure machine, misalignment is mainly caused by distortion rather than misalignment in the left, right, up and down directions. Therefore, more light leakage occurs due to misalignment toward the edge region of the pixel than the pixel center region.

5 is a diagram illustrating a structure of a pixel in which an exposure machine is misaligned.

The IPS mode liquid crystal display device shown in FIG. 5 has the same structure as the IPS mode liquid crystal display device shown in FIG. 2, and there is a difference only in the arrangement of the color filter layer 134. Due to the misalignment of the exposure machine, a part of the color filter layer 134 does not overlap with the outermost common electrode 105 disposed in the pixel, so that a light leakage region in which the color filter layer 134 is not formed occurs in the image display area. In particular, since misalignment of the exposure machine is often caused by distortion, the light leakage region mainly occurs in the corner region A of the pixel. Such light leakage regions have been a major cause of deterioration of color purity and deterioration of image quality of liquid crystal display devices.

The light leakage region may be removed by increasing the width of the outermost common electrode 105 of the pixel. That is, light leakage may be prevented by increasing the width of the outermost common electrode 105 to block the light leakage region. In this case, however, as the width of the outermost common electrode 105 is increased, the aperture ratio of the IPS mode liquid crystal display device is lowered.                     

Accordingly, there is a need for an IPS mode liquid crystal display device capable of blocking the light leakage area and preventing the decrease in the aperture ratio. The reason why the aperture ratio decreases when the width of the outermost common electrode is increased is that the width of the outermost common electrode is increased overall. That is, the aperture ratio decreases in proportion to the increase in the width of the outermost common electrode. However, more light leakage regions due to misalignment of the exposure apparatus occur toward the outer edge regions of the pixels. Accordingly, in order to block the light leakage region, only the outermost common electrode of the region corresponding to the light leakage region needs to be increased without increasing the overall width of the outermost common electrode.

6 is a plan view illustrating a structure of an IPS mode liquid crystal display device according to an exemplary embodiment of the present invention. The IPS mode liquid crystal display shown in the drawing has the same structure as the IPS mode liquid crystal display shown in FIG. 5 except for the outermost common electrode, and the cross-sectional structure thereof is shown in FIGS. 4A and 4B. Same as the structure shown in. Therefore, description of the same structure is omitted and only the other structure will be described.

As shown in FIG. 6, the common electrode 205 and the pixel electrode 207 disposed in the pixel form a transverse electric field. In this case, the outermost common electrode 205 is disposed near the outermost region of the pixel, that is, the data line 203, to prevent distortion of the transverse electric field by the data line 203. In addition, a color filter layer 234 is formed in the pixel. The color filter layer 234 is for real color, and consists of R, G, and B colors.

The color filter layer 234 formed in the pixel is formed to have a different width. In other words, the width in the center region of the pixel is different from the width in the upper and lower regions. 6 is a diagram illustrating a color filter layer 234 formed in a pixel. As shown in the figure, in the center region of the pixel, that is, the common electrode 205 and the pixel electrode 207 are bent to form a boundary of a plurality of domains, the width thereof is the smallest, and the width thereof becomes closer to the upper region or the lower region. As a result, the width a of the center region becomes smaller than the width b of the upper region or the lower region (a < b).

As described above, the width of the color filter layer 234 is made the smallest in the center and the width thereof is increased as the upper and lower portions thereof are increased. Thus, even when misalignment occurs in the color filter layer 234 due to the warpage of the exposure machine, Since 234 overlaps with the common electrode 205, light leakage does not occur.

On the other hand, by changing the width of the color filter layer 234 as described above, the color filter layer 234 always overlaps with the black matrix. Since the black matrix is formed on the data line 103 and the common electrode 105, the width of the color filter layer 234 increases so that the color filter layer 234 and the common electrode 205 overlap with each other. It means that the matrix overlaps.

As described above, in the IPS mode liquid crystal display device of the present invention, the width of the color filter layer disposed in the pixel is set differently according to the position of the pixel to remove the light leakage region due to misalignment of the color filter layer, thereby preventing the image quality from being degraded.

6 and 7 illustrate only the characteristic structure of the IPS mode liquid crystal display device according to the present invention by showing only a plan view and a partial plan view, and the detailed structure thereof is shown in FIGS. 4 (a) and 4 (b). It is. On the other hand, the IPS mode liquid crystal display device of the present invention need not be limited to the structure shown in Figs. 4 (a) and 4 (b). 4 (a) and 4 (b), the common electrode and the pixel electrode are formed on the substrate and the gate insulating layer, respectively, but the common electrode and the pixel electrode need not be formed on a specific layer in the present invention. In addition, the number of the common electrode and the pixel electrode disposed in one pixel need not be limited. Moreover, the IPS mode liquid crystal display device of the present invention need not be limited to the zigzag pixel electrode and the common electrode having a bent region at the center. As described above, the zigzag formation of the pixel electrode and the common electrode is for forming a plurality of domain regions having symmetrical viewing directions in the pixel by forming at least one bent region in the pixel. However, an IPS mode liquid crystal display device in which a pixel consists of only one domain without a bent region in the common electrode and the pixel electrode may also be applied to the present invention.

In addition, the IPS mode liquid crystal display device of the present invention need not be limited only to the COT structure. That is, the present invention may also be applied to an IPS mode liquid crystal display device having the structure shown in FIGS. 3 (a) and 3 (b) in which a thin film transistor is formed on a first substrate and a color filter layer is formed on a second substrate. Of course, in this case, misalignment may occur due to the bonding of the first substrate and the second substrate, but defects due to misalignment of the color filter layer may be prevented.

As described above, in the IPS mode liquid crystal display device of the present invention, light leakage due to misalignment of the color filter layer can be prevented by changing the width of the color filter layer disposed in the pixel according to the position in the pixel.

Claims (8)

A plurality of pixels comprising a plurality of domains defined by gate lines and data lines; A switching element formed in said pixel; A common electrode and a pixel electrode disposed substantially parallel in the pixel to form a transverse electric field and bent at least once in the pixel to divide the pixel into a plurality of domain regions; And The color is disposed in the pixel to implement color, and the width increases along the extending direction of the data line from the center to the top and bottom of the pixel so that the overlapping area with the outermost common electrode of the pixel is at the top and bottom of the pixel. A transverse electric field mode liquid crystal display device composed of a color filter layer which increases toward the side. The method of claim 1, wherein the switching device, A gate electrode formed on the first substrate; A gate insulating layer formed on the gate electrode; A semiconductor layer formed on the gate insulating layer; A source electrode and a drain electrode formed on the semiconductor layer; And And a protective layer formed on the source electrode and the drain electrode. The transverse electric field mode liquid crystal display device of claim 2, wherein the color filter layer is formed on the passivation layer. The transverse electric field mode liquid crystal display device of claim 2, further comprising a black matrix formed on the protective layer. The method of claim 2, Second substrate; And Further comprising a black matrix formed on the second substrate, And the color filter layer is formed on a second substrate. delete delete delete

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