KR101010082B1 - Liquid crystal display device and method of fabricating thereof - Google Patents

Liquid crystal display device and method of fabricating thereof Download PDF

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KR101010082B1
KR101010082B1 KR1020020080852A KR20020080852A KR101010082B1 KR 101010082 B1 KR101010082 B1 KR 101010082B1 KR 1020020080852 A KR1020020080852 A KR 1020020080852A KR 20020080852 A KR20020080852 A KR 20020080852A KR 101010082 B1 KR101010082 B1 KR 101010082B1
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substrate
liquid crystal
sealing material
crystal display
display device
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KR20040053658A (en
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임영남
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엘지디스플레이 주식회사
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
    • G02F1/133311—Environmental protection, e.g. against dust or humidity
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136222—Colour filters incorporated in the active matrix substrate

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Liquid Crystal (AREA)

Abstract

본 발명의 액정표시소자는 새로운 실링재에 의해 기판을 합착하기 위한 것으로, 액상세라믹과 같은 무기물질로 이루어진 실링재로 박막트랜지스터가 형성된 제1기판과 컬러필터가 형성된 제2기판을 합착한다. 액상세라믹은 열안정성이 강하고 경화되었을 때 경도가 높기 때문에, 고온처리시 실링재의 침투에 의한 액정의 오염을 방지할 수 있으며 글라스파이버 없이 자체의 경도에 의해 셀갭을 유지할 수 있게 된다.The liquid crystal display device of the present invention is for bonding a substrate by a new sealing material, and bonding a first substrate on which a thin film transistor and a second substrate on which a color filter are formed with a sealing material made of an inorganic material such as liquid ceramic. Since liquid ceramic has high thermal stability and high hardness when cured, liquid ceramics can prevent contamination of liquid crystal due to penetration of sealing material during high temperature treatment, and maintain cell gap by its hardness without glass fiber.

실링재, 액상세라믹, 무기물질, 열안정성, 경도, 경화Sealing materials, liquid ceramics, inorganic materials, thermal stability, hardness, hardening

Description

액정표시소자 및 그 제조방법{LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF FABRICATING THEREOF}Liquid crystal display device and manufacturing method therefor {LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF FABRICATING THEREOF}

도 1은 종래 액정표시소자의 구조를 나타내는 평면도.1 is a plan view showing the structure of a conventional liquid crystal display device.

도 2는 본 발명에 따른 액정표시소자의 구조를 나타내는 단면도.2 is a cross-sectional view showing the structure of a liquid crystal display device according to the present invention;

도 3은 본 발명에 따른 액정표시소자의 제조방법을 나타내는 흐름도.3 is a flowchart illustrating a method of manufacturing a liquid crystal display device according to the present invention.

도 4(a) 및 도 4(b)는 실링재 인쇄방법을 나타내는 도면.4 (a) and 4 (b) are views showing a sealing material printing method.

* 도면의 주요부분에 대한 부호의 설명 *Explanation of symbols on the main parts of the drawings

103,105 : 기판 107 : 실링재103,105 substrate 107 sealing material

117 : 액정층 131 : 게이트전극117: liquid crystal layer 131: gate electrode

132 : 게이트절연층 134 : 반도체층132: gate insulating layer 134: semiconductor layer

136 : 소스/드레인전극 142 : 컬러필터층136: source / drain electrodes 142: color filter layer

150 : 스페이서 151 : 스크린마스크150: spacer 151: screen mask

154 : 스퀴지 161 : 디스펜서154: squeegee 161: dispenser

본 발명은 액정표시소자에 관한 것으로, 특히 제1기판과 제2기판을 액상세라 믹과 같은 무기물질로 이루어진 실링재를 이용하여 합착함으로써 불량이 발생하는 것을 방지하고 제조시간을 단축할 수 있는 액정표시소자 및 그 제조방법에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and in particular, by bonding a first substrate and a second substrate together using a sealing material made of an inorganic material such as liquid ceramic to prevent defects from occurring and shorten the manufacturing time. An element and a method of manufacturing the same.

액정표시소자(Liquid Crystal Display device)는 투과형 평판표시장치로서, 핸드폰(mobile phone), PDA(Personal Data Assistants), 노트북컴퓨터와 같은 각종 전자기기에 널리 적용되고 있다. 이러한 LCD는 경박단소화가 가능하고 고화질을 구현할 수 있다는 점에서 다른 평판표시장치에 비해 현재 많은 실용화가 이루어지고 있는 실정이다. 더욱이, 디지털TV나 고화질TV, 벽걸이용 TV에 대한 요구가 증가함에 따라 TV에 적용할 수 있는 대면적 LCD에 대한 연구가 더욱 활발히 이루어지고 있다.Liquid crystal display devices (LCDs) are transmissive flat panel displays and are widely applied to various electronic devices such as mobile phones, personal data assistants (PDAs), and notebook computers. Such LCDs are currently being practically used in comparison with other flat panel displays in that they can be made light and small and have high image quality. Moreover, as the demand for digital TVs, high-definition TVs, and wall-mounted TVs increases, studies on large-area LCDs applicable to TVs are being actively conducted.

일반적으로 LCD는 액정분자를 동작시키는 방법에 따라 몇 가지 방식으로 나누어질 수 있지만, 현재에는 반응속도가 빠르고 잔상이 적다는 점에서 주로 박막트랜지스터(Thin Film Transistor) LCD가 주로 사용되고 있다.In general, LCDs can be divided into several methods depending on how the liquid crystal molecules are operated, but nowadays, thin film transistor LCDs are mainly used in view of fast reaction speed and low afterimage.

도 1은 이러한 TFT LCD의 구조를 나타내는 평면도이다. 도면에 도시된 바와 같이, TFT LCD(1)는 제1기판(3)과 제2기판(5) 및 그 사이에 형성되는 액정층(17)으로 구성되어 있으며, 상기 제1기판(3)에는 종횡으로 배열되어 복수의 화소를 정의하는 게이트라인(11)과 데이터라인(13)이 배치되어 있으며, 각각의 게이트라인(11)과 데이터라인(13)은 제1기판(3)의 비표시영역에 형성된 패드(12,14)를 통해 외부의 구동소자(도면표시하지 않음)와 전기적으로 접속된다. 또한, 각각의 화소내에는 TFT(15)가 형성되어 있다. 게이트라인(11)을 통해 주사신호가 인가됨에 따라 상기 TFT(15)가 스위칭되어 데이터라인(13)을 통해 입력되는 화상신호가 액정층(17)에 인가된다.1 is a plan view showing the structure of such a TFT LCD. As shown in the figure, the TFT LCD 1 is composed of a first substrate 3 and a second substrate 5 and a liquid crystal layer 17 formed therebetween, wherein the first substrate 3 The gate line 11 and the data line 13 are arranged vertically and horizontally to define a plurality of pixels, and each of the gate lines 11 and the data line 13 is a non-display area of the first substrate 3. The pads 12 and 14 formed therein are electrically connected to an external driving element (not shown). In addition, a TFT 15 is formed in each pixel. As the scan signal is applied through the gate line 11, the TFT 15 is switched and an image signal input through the data line 13 is applied to the liquid crystal layer 17.

상기 제1기판(3)과 제2기판(5) 외곽부의 실링영역에는 실링재(sealant;7)가 도포되어 상기 제1기판(3)과 제2기판(5)을 합착한다. 또한, 제1기판(3) 및 제2기판(5)의 외곽부에는 액정주입구(20)가 형성되어 있다. 상기 액정주입구(20)는 실링재에 의해 합착된 제1기판(3) 및 제2기판(5) 사이로 액정을 주입하기 위한 것으로, 봉지제(22)에 의해 봉지되어 액정이 외부로 누출되는 것을 방지한다.A sealant 7 is applied to the sealing area of the outer side of the first substrate 3 and the second substrate 5 to bond the first substrate 3 and the second substrate 5 to each other. In addition, a liquid crystal injection hole 20 is formed at outer portions of the first substrate 3 and the second substrate 5. The liquid crystal injection hole 20 is for injecting liquid crystal between the first substrate 3 and the second substrate 5 bonded by the sealing material, and is sealed by the encapsulant 22 to prevent the liquid crystal from leaking to the outside. do.

실링영역에 도포되는 실링재(7)는 제1기판(3) 및 제2기판(5)을 합착시키는 접착제 역할을 할 뿐만 아니라 합착된 제1기판(3) 및 제2기판(5) 사이의 액정이 외부로 누출되는 것을 방지한다. 이러한 실링재(7)로는 통상적으로 에폭시수지(epoxy resin)나 페놀수지(phenol resin)와 같은 열경화성 수지를 사용한다. 그런데, 상기 에폭시 수지나 페놀수지는 유기물로서, 고온처리시 액정층내로 이물질이 확산되어 액정을 오염시키게 되는데, 이러한 액정의 오염에 의해 실링영역 주위(즉, 기판의 외곽영역)에 얼룩이 발생하게 되어 액정표시소자에 불량이 발생하는 주요한 원인이 된다.The sealing material 7 applied to the sealing region not only serves as an adhesive for bonding the first substrate 3 and the second substrate 5, but also the liquid crystal between the bonded first substrate 3 and the second substrate 5. This prevents leakage to the outside. As the sealant 7, a thermosetting resin such as epoxy resin or phenol resin is generally used. However, the epoxy resin or the phenol resin is an organic material, and foreign matter diffuses into the liquid crystal layer during high temperature treatment to contaminate the liquid crystal. Such contamination of the liquid crystal causes staining around the sealing region (ie, the outer region of the substrate). This is a major cause of defects in the liquid crystal display device.

또한, 상기 실링재(7)를 경화하기 위해서는 약 100∼180℃의 온도로 약 2시간 가열해야만 하기 때문에 공정시간이 길어지게 되며, 그 결과 생산성이 감소된다는 문제도 있었다.In addition, in order to cure the sealing material 7, the process time is long because it has to be heated at a temperature of about 100 to 180 ° C. for about 2 hours, and as a result, there is a problem that productivity is reduced.

한편, 제1기판(3)과 제2기판(5) 사이에는 스페이서(spacer)가 산포되어 제1기판(3)과 제2기판(5) 사이의 간격(즉, 셀갭(cell gap))을 일정하게 유지한다. 그 러나, 상기 스페이서는 액정층(17) 내부에만 산포되어 있기 때문에, 제1기판(3)과 제2기판(5) 전체의 간격을 유지하기란 불가능하였다. 따라서, 현재 실링재(7)에 글라스파이버(glass fiber)를 혼합하여 사용함으로써 셀갭을 일정하게 유지하고 있는 실정이다. 그러나, 상기 글라스파이버는 고가의 제품이기 때문에, 상기 글라스파이버를 실링재(7)에 혼합함에 따라 액정표시소자의 제조비용이 증가한다는 문제가 있었다.Meanwhile, a spacer is dispersed between the first substrate 3 and the second substrate 5 to space the gap (that is, the cell gap) between the first substrate 3 and the second substrate 5. Keep constant However, since the spacers are scattered only inside the liquid crystal layer 17, it is impossible to maintain the gap between the first substrate 3 and the entire second substrate 5. Therefore, the present invention maintains a constant cell gap by mixing and using glass fiber in the sealing material 7. However, since the glass fiber is an expensive product, there is a problem that the manufacturing cost of the liquid crystal display device increases as the glass fiber is mixed with the sealing material 7.

본 발명은 상기한 문제를 해결하기 위한 것으로, 무기물질로 이루어진 실링재에 의해 제1기판 및 제2기판을 합착함으로써 불량이 발생하는 것을 방지하며 제조비용을 절감할 수 있는 액정표시소자 및 그 제조방법을 제공하는 것을 목적으로 한다.The present invention is to solve the above problems, a liquid crystal display device and a method for manufacturing the same, which prevents defects by reducing the manufacturing cost by bonding the first substrate and the second substrate by a sealing material made of an inorganic material The purpose is to provide.

상기한 목적을 달성하기 위해, 본 발명에 따른 액정표시소자는 화소영역 및 실링영역을 포함하는 제1기판 및 제2기판과, 상기 제1기판 및 제2기판 사이에 형성된 액정층과, 상기 제1기판의 화소영역에 형성된 박막트랜지스터와, 상기 제2기판의 화소영역에 형성된 컬러필터층과, 상기 제1기판과 제2기판의 실링영역에 형성되어 상기 제1기판과 제2기판을 합착하는 액상세라믹으로 구성된다.In order to achieve the above object, the liquid crystal display device according to the present invention comprises a first substrate and a second substrate including a pixel region and a sealing region, a liquid crystal layer formed between the first substrate and the second substrate, A liquid crystal which is formed in the thin film transistor formed in the pixel region of the first substrate, the color filter layer formed in the pixel region of the second substrate, and the sealing region of the first substrate and the second substrate, and joins the first substrate and the second substrate. It is composed of ceramic.

상기 액상세라믹은 열안정성이 높으며 경화되었을 때 경도가 높은 무기물질로서, Si02, 물 및 알콜로 이루어진다. 한편, 상기 실링영역에는 반도체 또는 금속으로 이루어져, 화소내의 패턴에 의해 발생하는 단차를 보상하기 위한 단차보상용 패턴이 형성되어 있다.The liquid ceramic is an inorganic material having high thermal stability and high hardness when cured, and is composed of Si0 2 , water, and alcohol. On the other hand, the sealing region is formed of a semiconductor or a metal, and a step compensation pattern is formed to compensate for the step generated by the pattern in the pixel.

또한, 본 발명에 따른 액정표시소자 제조방법은 박막트랜지스터가 형성된 제1기판을 준비하는 단계와, 컬러필터가 형성된 제2기판을 준비하는 단계와, 상기 제1기판 및 제2기판 중 어느 한 기판에 무기물질로 이루어진 실링재를 인쇄하는 단계와, 상기 인쇄된 실링재를 경화시키는 단계와, 액정주입구를 통해 액정을 주입한 후 상기 액정주입구를 봉지하는 단계로 구성된다.In addition, the manufacturing method of the liquid crystal display according to the present invention comprises the steps of preparing a first substrate having a thin film transistor, preparing a second substrate having a color filter, any one of the first substrate and the second substrate Printing a sealing material made of an inorganic material, curing the printed sealing material, and injecting liquid crystal through a liquid crystal inlet, and sealing the liquid crystal inlet.

상기 무기물질의 실링재는 액상세라믹으로서 Si02, 물 및 알콜로 이루어지며, 스크린인쇄법 또는 디스펜싱법에 의해 제1기판 또는 제2기판의 외곽 둘레에 인쇄된다.The sealing material of the inorganic material is composed of Si0 2 , water and alcohol as a liquid ceramic, and is printed around the outer periphery of the first substrate or the second substrate by screen printing or dispensing.

상기 실링재는 약 135℃∼165℃의 온도, 바람직하게는 약 145℃∼155℃의 온도, 더욱 바람직하게는 약 150℃의 온도에서 15∼25분간 경화된다.The sealing material is cured for 15 to 25 minutes at a temperature of about 135 ° C to 165 ° C, preferably at a temperature of about 145 ° C to 155 ° C, more preferably at a temperature of about 150 ° C.

본 발명에서는 무기물질로 이루어진 실링재를 이용하여 기판을 합착한다. 특히, 본 발명에서는 무기물질인 액상세라믹(liquid ceramic)을 실링재로 사용하여 기판을 합착한다. 물질의 표면성질의 개조와 부식방지제로서 널리 사용되고 있는 액상세라믹은 접착성 및 열안정성이 우수하므로 기판의 합착제로서 사용될 때 액정의 오염을 방지할 수 있게 된다. 또한, 상기 액상세라믹은 높은 경도를 갖기 때문에, 내부에 글라스파이버를 혼합하지 않아도 액정표시소자의 셀갭을 일정하게 유지할 수 있게 된다. In the present invention, the substrate is bonded using a sealing material made of an inorganic material. In particular, in the present invention, the substrate is bonded by using a liquid ceramic, which is an inorganic material, as a sealing material. Liquid ceramics, which are widely used as remodeling and corrosion inhibitors of materials, have excellent adhesion and thermal stability, thereby preventing contamination of liquid crystals when used as a bonding agent for substrates. In addition, since the liquid ceramic has a high hardness, it is possible to maintain a constant cell gap of the liquid crystal display without mixing glass fibers therein.                     

상기와 같은 액상세라믹은 패턴형성이 가능한 점도를 갖고 있으므로, 스크린인쇄법이나 디스펜싱(dispensing)방법에 의해 기판상에 적절한 패턴으로 형성될 수 있게 된다.Since the liquid ceramic has a viscosity capable of forming a pattern, it can be formed in a suitable pattern on a substrate by a screen printing method or a dispensing method.

이하, 첨부한 도면을 참조하여 본 발명에 따른 액정표시소자 및 그 제조방법에 대해 상세히 설명한다.Hereinafter, a liquid crystal display device and a method of manufacturing the same according to the present invention will be described in detail with reference to the accompanying drawings.

도 2는 본 발명에 따른 액정표시소자의 구조를 나타내는 단면도이다. 이때, 설명의 편의를 위해, 도면에서는 상기 액정표시소자를 화소영역과 실링영역으로 구분하여 설명하였다.2 is a cross-sectional view showing the structure of a liquid crystal display device according to the present invention. In this case, for convenience of description, the liquid crystal display is divided into a pixel area and a sealing area.

도면에 도시된 바와 같이, 화소영역의 제1기판(103)에는 게이트전극(131)이 형성되어 있으며, 그 위에 제1기판(103) 전체에 걸쳐 게이트절연층(132)이 적층되어 있다. 상기 게이트절연층(32) 위에는 반도체층(134)이 형성되어 상기 게이트전극(131)에 주사신호가 인가됨에 따라 활성화되어 채널층(channel layer)을 형성하며, 그 위에 소스/드레인전극(136)이 형성되어 있다. 또한, 상기 소스/드레인전극(136)이 형성된 제1기판(103) 전체에 걸쳐 보호층(139)이 적층되어 있다. 상기 보호층(139) 위의 화소영역에는 화소전극(138)이 형성되어 있다. 도면에 도시된 바와 같이, 상기 보호층(139)에는 컨택홀(contact hole)이 형성되어 있다. 상기 화소전극(138)은 컨택홀을 통해 소스/드레인전극(136)과 전기적으로 접속되어, 상기 반도체층(134)이 활성화됨에 따라 소스/드레인전극(136)을 통해 입력되는 신호가 상기 화소전극(138)에 인가된다.As shown in the drawing, a gate electrode 131 is formed on the first substrate 103 of the pixel region, and the gate insulating layer 132 is stacked over the entire first substrate 103. A semiconductor layer 134 is formed on the gate insulating layer 32 and is activated as a scan signal is applied to the gate electrode 131 to form a channel layer, and the source / drain electrode 136 is formed thereon. Is formed. In addition, a protective layer 139 is stacked over the entire first substrate 103 on which the source / drain electrodes 136 are formed. The pixel electrode 138 is formed in the pixel area on the passivation layer 139. As shown in the figure, a contact hole is formed in the passivation layer 139. The pixel electrode 138 is electrically connected to the source / drain electrode 136 through a contact hole, and a signal input through the source / drain electrode 136 is activated as the semiconductor layer 134 is activated. Is applied to (138).

또한, 도면에는 도시하지 않았지만, 상기 화소전극(138) 위에는 액정층(117) 의 액정분자를 배향하기 위한 배향막이 도포되어 있다.Although not shown in the figure, an alignment film for orienting liquid crystal molecules of the liquid crystal layer 117 is coated on the pixel electrode 138.

한편, 실링영역의 게이트절연층(132) 위에는 화소내에 형성된 각종 패턴들, 예를 들면 박막트랜지스터나 화소전극(138)과 같은 패턴들의 존재에 의해 발생할 수 있는 단차를 보상하기 위한 단차보상용 패턴(124)이 형성되어 있다. 상기 단차보상용 패턴(124)은 통상적으로 반도체 물질로 이루어지는데, TFT의 반도체층(134) 형성시 동일한 공정에 의해 형성된다. 또한, 상기 단차보상용 패턴(124)은 금속층으로 이루어질 수도 있다. 이 경우, 상기 단차보상용 패턴(124)은 박막트랜지스터의 게이트전극이나 소스/드레인전극과 동일한 공정에 의해 형성될 것이다.On the other hand, on the gate insulating layer 132 of the sealing region, a step compensation pattern for compensating for the step difference caused by the presence of various patterns formed in the pixel, for example, the thin film transistor or the pixel electrode 138 ( 124 is formed. The step compensation pattern 124 is typically made of a semiconductor material, and is formed by the same process when forming the semiconductor layer 134 of the TFT. In addition, the step compensation pattern 124 may be formed of a metal layer. In this case, the step compensation pattern 124 may be formed by the same process as the gate electrode or the source / drain electrode of the thin film transistor.

제2기판(105)에는 광차단수단인 블랙매트릭스(109)와 컬러를 구현하는 컬러필터층(142)이 형성되어 있다. 도면에 도시된 바와 같이, 블랙매트릭스(109)는 Cr, CrOx, Cr/CrOx 혹은 블랙수지(black resin) 등으로 이루어지며, 화소영역의 TFT영역, 게이트라인 근처, 데이터라인 근처 및 액정주입구 영역과 같은 화상 비표시영역에 형성되어 상기 영역으로 광이 투과되는 것을 방지한다. 또한, 상기 블랙매트릭스(109)와 컬러필터층(142) 위에는 공통전극(144)이 형성되어 TFT를 통해 신호가 입력됨에 따라 액정층(117)의 액정분자를 작동시키며, 도면 표시하지 않은 배향막이 형성되어 액정분자를 배향한다.The second substrate 105 is formed with a black matrix 109 that is a light blocking means and a color filter layer 142 that implements color. As shown in the figure, the black matrix 109 is made of Cr, CrOx, Cr / CrOx or black resin, and the like, and includes a TFT region of a pixel region, near a gate line, near a data line, and a liquid crystal injection region. It is formed in the same image non-display area to prevent light from being transmitted to the area. In addition, a common electrode 144 is formed on the black matrix 109 and the color filter layer 142 to operate the liquid crystal molecules of the liquid crystal layer 117 as a signal is input through the TFT, and an alignment layer not shown in the drawing is formed. To align the liquid crystal molecules.

상기 제1기판(103)과 제2기판(105) 사이의 실링영역에는 액상세라믹과 같은 무기물질로 이루어져 상기 제1기판(103)과 제2기판(105)을 합착하는 실링재가 충진되어 있다. 상기 액상세라믹은 SiO2와 물 및 알콜(alcohol)로 이루어진 투명한 무기 물질로서, 다음과 같은 특성을 갖는다.The sealing region between the first substrate 103 and the second substrate 105 is filled with a sealing material made of an inorganic material such as liquid ceramic to bond the first substrate 103 and the second substrate 105 together. The liquid ceramic is a transparent inorganic material composed of SiO 2 , water, and alcohol, and has the following characteristics.

첫째, 상기 액상세라믹은 높은 접착력을 갖을 뿐만 아니라 적절한 유동성을 갖는 동시에 패터닝(patterning)이 가능한 점도를 갖는다. 따라서, 기판(103,105)을 합착하는 실링재로서 유용하게 사용될 수 있다.First, the liquid ceramic not only has a high adhesion but also has an appropriate fluidity and at the same time has a viscosity capable of patterning. Therefore, it can be usefully used as a sealing material for bonding the substrates 103 and 105 together.

둘째, 상기 액상세라믹은 열안정성이 높다. 따라서, 고온처리시 액정층(117)으로 불순물이 확산되지 않으므로 액정이 오염되지 않게 된다.Second, the liquid ceramic has high thermal stability. Therefore, since impurities do not diffuse into the liquid crystal layer 117 during the high temperature treatment, the liquid crystal is not contaminated.

셋째, 상기 액상세라믹은 경화되었을 때 높은 경도를 갖는다. 따라서, 경화되었을 때 그 자체의 경도에 의해 액정표시소자의 셀갭을 일정하게 유지할 수 있게 된다.Third, the liquid ceramic has a high hardness when cured. Therefore, when hardened, the cell gap of the liquid crystal display device can be kept constant by its hardness.

넷째, 상기 액상세라믹은 에폭시수지나 페놀수지에 비해 짧은 시간에 경화된다.Fourth, the liquid ceramic is cured in a short time compared to the epoxy resin or phenol resin.

도 3은 상기 액상세라믹과 같은 무기물질을 실링재로 이용한 액정표시소자 제조방법을 간략하게 나타내는 흐름도이다.3 is a flowchart briefly illustrating a method of manufacturing a liquid crystal display device using an inorganic material such as liquid ceramic as a sealing material.

도면에 도시된 바와 같이, 우선 컬러필터(C/F)공정을 통해 블랙매트릭스(142)와 컬러필터층(144)이 형성된 제2기판(105)의 실링영역에 액상세라믹과 같은 무기물로 이루어진 실링재를 인쇄한다(S101,S102). 이때, 상기 실링재는 박막트랜지스터가 형성된 제1기판(103)의 실링영역에 인쇄될 수도 있다. 다시 말해서, 상기 실링재는 제1기판(103)과 제2기판(105) 중 어느 기판에도 인쇄될 수 있는 것이다.As shown in the drawing, first, a sealing material made of an inorganic material such as liquid ceramic is applied to the sealing region of the second substrate 105 on which the black matrix 142 and the color filter layer 144 are formed through a color filter (C / F) process. Print (S101, S102). In this case, the sealing material may be printed on the sealing area of the first substrate 103 on which the thin film transistor is formed. In other words, the sealing material may be printed on any one of the first substrate 103 and the second substrate 105.

한편, 상기 실링재의 인쇄는 스크린인쇄법이나 디스펜싱법(dispensing method)에 의해 이루어진다. 도 4(a) 및 도 4(b)는 각각 상기 스크린인쇄법과 디스펜싱법을 나타내는 도면이다. 도 4(a)에 도시된 바와 같이, 스크린인쇄법에서는 기판(105) 위에 소정의 패턴이 형성된 스크린마스크(151)를 위치시킨 후 스퀴지(squeege;154)를 진행시키면, 스크린마스크(151)위의 액상세라믹(107)이 스크린마스크(151)의 패턴을 통해 기판(105)의 실링영역에 인쇄된다.On the other hand, the sealing material is printed by a screen printing method or a dispensing method (dispensing method). 4 (a) and 4 (b) are diagrams illustrating the screen printing method and the dispensing method, respectively. As shown in FIG. 4 (a), in the screen printing method, the screen mask 151 having a predetermined pattern is positioned on the substrate 105, and then a squeegee 154 is moved to form the screen mask 151. The liquid ceramic 107 is printed on the sealing area of the substrate 105 through the pattern of the screen mask 151.

도 4(b)에 도시된 바와 같이, 디스펜싱법에서는 액상세라믹(107)이 충진된 디스펜서(161)로 기판(105)의 실링영역에 직접 액상세라믹(107)을 적하(dropping)함으로써 실링재를 인쇄한다. 이때, 상기 디스펜서(161)는 고정되어 있고, 기판(105)이 적재되는 테이블(164)이 이동하여 기판(105) 외곽 둘레의 실링영역에 액상세라믹(107)을 인쇄하게 된다.As shown in FIG. 4B, in the dispensing method, the dispenser 161 filled with the liquid ceramic 107 is used to drop the liquid ceramic 107 directly into the sealing region of the substrate 105. Print At this time, the dispenser 161 is fixed and the table 164 on which the substrate 105 is loaded moves to print the liquid ceramic 107 in the sealing area around the periphery of the substrate 105.

한편, 제1기판(103)에는 TFT공정에 의해 박막트랜지스터가 형성된 후(S103), 액정표시소자의 셀갭을 일정하게 유지하기 위한 스페이서(예를 들면, 볼스페이서)가 산포된다(S104).On the other hand, after the thin film transistor is formed by the TFT process (S103), a spacer (for example, a ball spacer) for maintaining a constant cell gap of the liquid crystal display device is scattered on the first substrate 103 (S104).

상기와 같이, 실링재(107)가 인쇄된 제2기판(105)과 제1기판(103)을 정렬한 후 압력을 가하면, 상기 제1기판(103)과 제2기판(105)이 합착된다(S105). 상기와 같이, 제1기판(103) 및 제2기판(105)을 합착할 때, 실링재(107)를 약 135℃∼165℃의 온도, 바람직하게는 약 145℃∼155℃의 온도, 더욱 바람직하게는 약 150℃의 온도에서, 약 15∼25분간 큐어링(curing)하여 상기 실링재(107)를 경화시킨다(S105).As described above, when the second substrate 105 and the first substrate 103 on which the sealing material 107 is printed are aligned, and then pressure is applied, the first substrate 103 and the second substrate 105 are bonded to each other ( S105). As described above, when the first substrate 103 and the second substrate 105 are bonded, the sealing material 107 is at a temperature of about 135 ° C to 165 ° C, preferably about 145 ° C to 155 ° C, more preferably. Preferably, at a temperature of about 150 ℃, curing (curing) for about 15 to 25 minutes to cure the sealing material 107 (S105).

이어서, 합착된 제1기판(103) 및 제2기판(105)의 액정주입구를 통해 액정을 주입하여 액정층(117)을 형성한 후 봉지제에 의해 액정주입구를 봉지함으로써 액정표시소자를 완성한다(S106).Subsequently, the liquid crystal is injected through the liquid crystal injection holes of the bonded first substrate 103 and the second substrate 105 to form the liquid crystal layer 117, and then the liquid crystal injection hole is sealed with an encapsulant to complete the liquid crystal display device. (S106).

상기한 바와 같이, 본 발명의 가장 큰 특징은 액상세라믹과 같은 무기물질을 실링재로 사용하여 제1기판과 제2기판을 합착하는 것이다. 이러한 본 발명은 무기물질을 실링재로 사용한다면, 어떤 모드나 어떤 구조의 액정표시소자에도 적용될 수 있을 것이다. 따라서, 본 발명의 권리의 범위는 상술한 상세한 설명에 의해 결정되는 것이 아니라, 첨부한 특허청구범위에 의해 결정되어야만 할 것이다.As described above, the biggest feature of the present invention is to bond the first substrate and the second substrate using an inorganic material such as liquid ceramic as a sealing material. If the present invention uses an inorganic material as a sealing material, it may be applied to any mode or liquid crystal display device of any structure. Accordingly, the scope of the present invention should not be determined by the above detailed description, but should be determined by the appended claims.

상술한 바와 같이, 본 발명에서는 액상세라믹과 같은 무기물질을 실링재로 사용하므로, 다음과 같은 효과를 얻을 수 있게 된다.As described above, in the present invention, since the inorganic material such as liquid ceramic is used as the sealing material, the following effects can be obtained.

첫째, 상기 액상세라믹은 높은 접착력을 갖을 뿐만 아니라 적절한 유동성을 갖는 동시에 패터닝(patterning)이 가능한 점도를 갖는다. 따라서, 기판을 합착하는 실링재로서 유용하게 사용될 수 있다.First, the liquid ceramic not only has a high adhesion but also has an appropriate fluidity and at the same time has a viscosity capable of patterning. Therefore, it can be usefully used as a sealing material for bonding a substrate.

둘째, 상기 액상세라믹은 열적 안정성이 높다. 따라서, 고온처리시 액정층으로 불순물이 확산되지 않으므로 액정이 오염되지 않게 된다. 그 결과, 액정의 오염에 의한 화면의 얼룩이 발생하지 않게 되어 액정표시소자의 불량을 방지할 수 있게 된다.Second, the liquid ceramic has high thermal stability. Therefore, since impurities are not diffused into the liquid crystal layer during the high temperature treatment, the liquid crystal is not contaminated. As a result, the unevenness of the screen due to the contamination of the liquid crystal is not generated, it is possible to prevent the defect of the liquid crystal display element.

셋째, 상기 액상세라믹은 경화되었을 때 높은 경도를 갖는다. 따라서, 에폭시 수지나 페놀수지를 사용하던 종래와는 달리 액정표시소자의 셀갭을 일정하게 유지하기 위해 고가의 글라스파이버를 혼합할 필요가 없게 된다. 따라서, 종래 액정 표시소자에 비해 제조비용을 절감할 수 있게 된다.Third, the liquid ceramic has a high hardness when cured. Therefore, unlike the conventional use of epoxy resins or phenol resins, it is not necessary to mix expensive glass fibers to maintain a constant cell gap of the liquid crystal display device. Therefore, the manufacturing cost can be reduced as compared with the conventional liquid crystal display device.

넷째, 상기 액상세라믹은 에폭시수지나 페놀수지에 비해 짧은 시간에 경화된다. 따라서, 제조시간을 단축할 수 있게 되며, 그 결과 생산량을 향상시킬 수 있게 된다.Fourth, the liquid ceramic is cured in a short time compared to the epoxy resin or phenol resin. Therefore, the manufacturing time can be shortened, and as a result, the yield can be improved.

Claims (16)

화소영역 및 실링영역을 포함하는 제1기판 및 제2기판;A first substrate and a second substrate including a pixel region and a sealing region; 상기 제1기판 및 제2기판 사이에 형성된 액정층;A liquid crystal layer formed between the first substrate and the second substrate; 상기 제1기판의 화소영역에 형성된 박막트랜지스터;A thin film transistor formed in the pixel region of the first substrate; 상기 제2기판의 화소영역에 형성된 컬러필터층; 및A color filter layer formed in the pixel region of the second substrate; And 상기 제1기판과 제2기판의 실링영역에 형성되어 상기 제1기판과 제2기판을 합착하는 액상세라믹으로 구성된 액정표시소자.And liquid crystal ceramics formed in the sealing regions of the first and second substrates to bond the first and second substrates together. 제1항에 있어서, 상기 실링영역의 제1기판에는 제1기판의 단차를 보상하는 단차보상용 패턴을 추가로 포함하는 것을 특징으로 하는 액정표시소자.The liquid crystal display device of claim 1, wherein the first substrate of the sealing region further comprises a step compensating pattern for compensating a step of the first substrate. 제1항에 있어서, 상기 액상세라믹은 Si02, 물 및 알콜로 이루어진 것을 특징으로 하는 액정표시소자.The liquid crystal display device of claim 1, wherein the liquid ceramic comprises Si0 2 , water, and alcohol. 제2항에 있어서, 상기 박막트랜지스터는,The method of claim 2, wherein the thin film transistor, 제1기판에 형성된 게이트전극;A gate electrode formed on the first substrate; 상기 게이트전극이 형성된 제1기판 전체에 걸쳐 적층된 게이트절연층;A gate insulating layer stacked over the entire first substrate on which the gate electrode is formed; 상기 게이트절연층 위에 형성된 반도체층;A semiconductor layer formed on the gate insulating layer; 상기 반도체층 위에 형성된 소스/드레인전극;A source / drain electrode formed on the semiconductor layer; 상기 제1기판 전체에 걸쳐 형성된 보호층; 및A protective layer formed over the entire first substrate; And 상기 보호층 위에 적층되며, 보호층에 형성된 컨택홀을 통해 소스/드레인전극에 접속되는 화소전극으로 이루어진 것을 특징으로 하는 액정표시소자.And a pixel electrode stacked on the protective layer and connected to the source / drain electrode through a contact hole formed in the protective layer. 제4항에 있어서, 상기 단차보상용 패턴은 반도체층과 동일한 물질로 이루어진 것을 특징으로 하는 액정표시소자.The liquid crystal display device of claim 4, wherein the step compensation pattern is made of the same material as that of the semiconductor layer. 제4항에 있어서, 상기 단차보상용 패턴은 게이트전극 또는 소스/드레인전극과 동일한 금속으로 이루어진 것을 특징으로 하는 액정표시소자.5. The liquid crystal display device according to claim 4, wherein the step compensation pattern is made of the same metal as the gate electrode or the source / drain electrode. 박막트랜지스터가 형성된 제1기판;A first substrate on which a thin film transistor is formed; 컬러필터가 형성된 제2기판; 및A second substrate on which a color filter is formed; And Si02, 물 및 알코올로 이루어진 액상세라믹으로 이루어져 상기 제1기판 및 제2기판을 합착하는 실링재로 구성된 액정표시소자.A liquid crystal display device comprising a sealing material comprising Si0 2 , a liquid ceramic composed of water and an alcohol to bond the first substrate and the second substrate. 삭제delete 삭제delete 박막트랜지스터가 형성된 제1기판을 준비하는 단계;Preparing a first substrate on which a thin film transistor is formed; 컬러필터가 형성된 제2기판을 준비하는 단계;Preparing a second substrate on which a color filter is formed; 상기 제1기판 및 제2기판 중 어느 한 기판에 무기물질로 이루어진 액상세라믹을 인쇄하는 단계;Printing a liquid ceramic made of an inorganic material on any one of the first substrate and the second substrate; 상기 인쇄된 실링재를 경화시키는 단계; 및Curing the printed sealing material; And 액정주입구를 통해 액정을 주입한 후 상기 액정주입구를 봉지하는 단계로 구성된 액정표시소자 제조방법.Method of manufacturing a liquid crystal display device comprising the step of encapsulating the liquid crystal inlet after injecting the liquid crystal through the liquid crystal inlet. 삭제delete 제10항에 있어서,상기 액상세라믹은 Si02, 물 및 알콜로 이루어진 것을 특징으로 하는 액정표시소자 제조방법.The method of claim 10, wherein the liquid ceramic comprises Si0 2 , water, and alcohol. 제10항에 있어서, 상기 실링재는 스크린인쇄법 또는 디스펜싱법에 의해 인쇄되는 것을 특징으로 하는 액정표시소자 제조방법.The method of claim 10, wherein the sealing material is printed by a screen printing method or a dispensing method. 제10항에 있어서, 상기 실링재를 경화하는 단계는 실링재를 135℃∼165℃의 온도에서 15∼25분간 큐어링하는 단계를 포함하는 것을 특징으로 하는 액정표시소자 제조방법.The method of claim 10, wherein the curing of the sealing material comprises curing the sealing material at a temperature of 135 ° C. to 165 ° C. for 15 to 25 minutes. 제10항에 있어서, 상기 실링재를 경화하는 단계는 145℃∼155℃의 온도에서 15∼25분간 큐어링하는 단계를 포함하는 것을 특징으로 하는 액정표시소자 제조방법.The method of claim 10, wherein the curing of the sealing material comprises curing at a temperature of 145 ° C. to 155 ° C. for 15 to 25 minutes. 제10항에 있어서, 상기 실링재를 경화하는 단계는 150℃의 온도에서 15∼25분간 큐어링하는 단계를 포함하는 것을 특징으로 하는 액정표시소자 제조방법.The method of claim 10, wherein the curing of the sealing material comprises curing at a temperature of 150 ° C. for 15 to 25 minutes.
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US11016348B2 (en) 2017-09-25 2021-05-25 Samsung Display Co., Ltd. Display panel
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