KR101001756B1 - Fabrication Method of Microlens Arrays Using UV-Curable Optical Adhesive - Google Patents

Fabrication Method of Microlens Arrays Using UV-Curable Optical Adhesive Download PDF

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Publication number
KR101001756B1
KR101001756B1 KR1020070026861A KR20070026861A KR101001756B1 KR 101001756 B1 KR101001756 B1 KR 101001756B1 KR 1020070026861 A KR1020070026861 A KR 1020070026861A KR 20070026861 A KR20070026861 A KR 20070026861A KR 101001756 B1 KR101001756 B1 KR 101001756B1
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KR
South Korea
Prior art keywords
adhesive
substrate
mask
pattern
solvent
Prior art date
Application number
KR1020070026861A
Other languages
Korean (ko)
Other versions
KR20080085402A (en
Inventor
박시현
손수광
Original Assignee
전남대학교산학협력단
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Priority to KR1020070026861A priority Critical patent/KR101001756B1/en
Priority to PCT/KR2007/001363 priority patent/WO2008114893A1/en
Publication of KR20080085402A publication Critical patent/KR20080085402A/en
Application granted granted Critical
Publication of KR101001756B1 publication Critical patent/KR101001756B1/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00009—Production of simple or compound lenses
    • B29D11/00038—Production of contact lenses
    • B29D11/00125—Auxiliary operations, e.g. removing oxygen from the mould, conveying moulds from a storage to the production line in an inert atmosphere
    • B29D11/00134—Curing of the contact lens material
    • B29D11/00153—Differential curing, e.g. by differential radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00009—Production of simple or compound lenses
    • B29D11/00365—Production of microlenses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00009—Production of simple or compound lenses
    • B29D11/00432—Auxiliary operations, e.g. machines for filling the moulds
    • B29D11/00442—Curing the lens material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Abstract

Regardless of the type of substrate, the present invention has excellent adhesion to the substrate, has a high optical transmittance, has a strong resistance to chemicals, and does not use a solvent so that volatilization does not occur during the manufacturing process of the microlens. The present invention provides a method of fabricating a polymer refractive microlens fabricated using a faster and simpler low temperature process without using soft baking or hard baking.

The microlens array manufacturing method according to the present invention comprises a coating step of applying an adhesive which is an ultraviolet curable resin on a substrate; An exposure step of irradiating ultraviolet rays to the adhesive applied on the substrate after fixing the mask having a predetermined pattern to the substrate on which the coating step is completed; A developing step of removing the adhesive, which has not been irradiated with ultraviolet rays by the pattern of the mask, after the exposure step by using a solvent; And a heat treatment step of heat-treating the adhesive not removed by the development process on the substrate after the development process.

Microlens, UV-curable optical adhesive, adhesive, acrylate

Description

Fabrication Method of Microlens Arrays Using UV-Curable Optical Adhesive

1 is a manufacturing process chart of the manufacturing method of the micro lens array of the present invention,

2 is a perspective view of an exposure process of a method of manufacturing a microlens array of the present invention;

3A is an optical picture of a micro lens array manufactured according to an embodiment of the present invention.

3b is an optical photograph of another micro lens array manufactured according to an embodiment of the present invention,

3C is a scanning electron micrograph of a micro lens manufactured according to an embodiment of the present invention.

3D is a result of measuring a one-dimensional profiler meter of a micro lens manufactured according to an embodiment of the present invention.

A light emitting device, a display device, or a light receiving device such as a CCD (Charge-Coupled Device) or a CIS (CMOS Image Sensor) requires a process of controlling light, and for this purpose, a small lens having a diameter of 1 μm to several mm Micro lenses and micro lens arrays are used.

Such microlenses and microlens arrays are used in optical communication, such as the combination of a semiconductor laser and a fiber as a light source, branching that divides light paths, and branching that divides light of different wavelengths, or in imaging of copiers, faxes, and endoscopes. Is used.

Etching method using laser pulse, reflow method using photo-resist, equiangular etching process of silicon, glass surface processing method, laser deposition of polymer and ion beam A wide variety of methods are used, including processing and gray scale masking.

Among them, a photosensitive material reflow method is most commonly used as a method of manufacturing a refractive micro lens. Of photosensitive material through the above; (glass transition temperature T g) heat-treating the photosensitive material reflow method typical photolithography (Photo-Lithography) processes and can easily produce a micro-lens and an array of only heat treatment of low temperature, the glass transition temperature Hemispherical lens shape can be obtained by using thermal reflow due to surface tension.

The photolithography process used in the photosensitive material reflow method uses a principle of changing the properties of a material by causing a chemical reaction when light is received like a photosensitive material, and using a mask of a desired pattern. It is a step of transferring the pattern of the mask on the substrate by selectively irradiating the photosensitive material.

More specifically, the photolithography process consists of application of a photosensitizer, soft baking, exposure, development and hard baking. In order to apply the photoresist, the liquid photoresist is sprayed and rotated at a high rotational speed to apply the entire substrate in the form of a uniform thin film, followed by soft baking at a predetermined temperature to remove the solvent from the photoresist. Stabilize the applied photoresist. After soft baking, photo exposure is performed. The exposure is a process of transferring a pattern of a microcircuit formed on the photo mask to the photosensitive agent by irradiating light of the ultraviolet region to the photosensitive agent on the substrate through a photo mask. Say. The development refers to a process of melting a photosensitive agent in a portion where the bonding is weakened by using a solvent using an exposure process, and the shape of the photosensitive agent formed through such a process is called a photosensitive agent pattern. In the case of positive PR, the polymer chain portion released by the photosensitive action is melted, and in the case of the negative PR, the weak bond (unexposed part) is melted compared to the portion in which the bond is strengthened by the photosensitive action. Disappear. Developers are largely basic aqueous solutions and solvents. Most of them use base aqueous solution such as KOH aqueous solution, but use acetone or specific solvent depending on the nature of the photosensitizer. The developed photoresist removes the remaining solvent to dry the photoresist, increases the adhesion of the photoresist to the substrate, and performs hard baking to harden the polymer tissue released during the development process.

Using the photolithography process, if the photoresist formed in a certain pattern (an array of squares, squares, etc.) on the substrate is heat-treated at a temperature above the glass transition temperature (Tg), the viscosity of the photoresist is lowered and the shape of the photoresist is minimized to minimize surface energy. The hemispherical shape can be changed to produce a hemispherical lens array in which the size, position, and density of each lens are adjustable on the substrate.

Such polymer microlenses have great advantages in light weight, high processability, mass production, and impact resistance, but the above-described photoresist reflow method has low adhesion between the photosensitive agent and the substrate, poor optical transmittance, and microlenses are used. The resistance to chemicals used in the process of devices is poor, which causes a problem in integration. In addition, the solvent or solvent harmful to the environment is released during the manufacture of the microlens using the photosensitive agent reflow method, shrinkage of the photosensitive agent occurs when the drying is completed, and the manufacturing process has a complex disadvantage.

In order to solve the problems of the prior art described above, the present invention has excellent adhesion to a substrate regardless of the type of substrate, has a high optical transmittance, has a strong resistance to chemicals, and does not use a solvent. The present invention provides a method of manufacturing a polymer refractive microlens produced by using a faster and simpler low temperature process without volatilization and no soft baking or hard baking. There is a purpose.

Microlens manufacturing method of the present invention for achieving the above object of the present invention comprises a coating step of applying an adhesive which is an ultraviolet curable resin on a substrate; An exposure step of irradiating ultraviolet rays to the adhesive applied on the substrate after fixing the mask having a predetermined pattern to the substrate on which the coating step is completed; A developing step of removing the adhesive, which has not been irradiated with ultraviolet rays by the pattern of the mask, after the exposure step by using a solvent; And a heat treatment step of heat-treating a photosensitive agent that is not removed by the developing step on the substrate after the developing step.

DETAILED DESCRIPTION Hereinafter, features of the present invention will be described in detail with reference to the accompanying drawings, and like reference numerals designate like elements throughout the specification for clarity of description.

In addition, unless there is another definition in the technical terms and scientific terms used, it has the meaning that is commonly understood by those of ordinary skill in the art.

In the manufacturing process of the micro-lens array according to the present invention, as shown in Figure 1 by applying a spin coating (spin coating) on the substrate 110 by applying an adhesive 120, an ultraviolet curable resin, the micro to be produced The mask 130, which determines the size and arrangement of the lens, is aligned with the substrate 110 to which the adhesive 120 is applied, and then fixed. The mask 130 is irradiated with ultraviolet (UV) rays to form a pattern on the mask 130. The adhesive 120 applied by the ultraviolet light passing through the determined portion 131 is cured in the shape and position of the portion 131. The portion of the adhesive 120 corresponding to the portion 132 through which ultraviolet rays cannot pass remains uncured. By the exposure process, the patterns 131 and 132 on the mask 130 are transferred in the form of curing of the adhesive 120. In this case, the substrate 110 to which the adhesive 120 is applied may be a semiconductor, a metal, a transparent conductive material, a polymer, or a ceramic.

After the exposure process, only the hardened adhesive 121 is removed by removing the uncured adhesive 122 from the adhesive 120 including the adhesive 121 and the uncured adhesive 122 cured by the mask 130 pattern. The development process is performed to remove the uncured adhesive 122 because it is not irradiated with ultraviolet rays to obtain the (110).

The solvent used in the developing process is determined according to the material of the adhesive 120 which is the ultraviolet curable resin used. The adhesive 120, which is an ultraviolet curable resin, is preferably an acrylate polymer or copolymer. The solvent is preferably alcohols, ketones or chlorinated hydrocarbons, or a mixed solvent thereof, and the alcohol solvent is methanol, ethanol, isopropanol or butanol, or a mixture thereof. Preferably, the ketone solvent is acetone, methyl ethyl ketone, cyclohexanone or diisopropyl ketone, or a mixture thereof is preferable, the chlorine-substituted hydrocarbons are dichloromethane, methane chloride or tetrachloromethane, or a mixture thereof This is preferred.

After the development process using the above preferred solvent is performed, the substrate 110 remains only in the adhesive 121 cured by ultraviolet rays. The cured adhesive 121 may be heat-treated to form a hemispherical lens with curvature, wherein the heat treatment temperature is a glass transition temperature (Tg) and decomposition temperature (Tg), which are material properties of the adhesive 120. Td; degradation temperature). Preferably, the heat treatment is performed at a temperature below the glass transition temperature (Tg) or more and below the decomposition temperature (Td). The cured adhesive 121 ′, which has a lower viscosity due to the heat treatment process, has a hemispherical shape due to mass transfer to minimize surface energy, and is between the substrate 110 and the cured adhesive 121 ′, and the substrate 110. It has a wetting angle determined by three interfacial energies between the vapor and the vapor and between the adhesive 121 'and the vapor.

At this time, if the heat treatment temperature is lower than the glass transition temperature (Tg), the viscosity of the cured adhesive 121 'during the heat treatment is so large that material movement cannot occur due to surface tension, and thus hemispherical lens shape cannot be obtained. If higher than Td), the molecular chemical structure of the adhesive is changed so that the effect of the desired refractive microlens cannot be obtained.

In addition, the heat treatment atmosphere may be adjusted to adjust the wet angle of the hardened adhesive 121 during the heat treatment. The heat treatment atmosphere affects the interfacial energies between the substrate 110 and the vapor and between the cured adhesive 121 and the vapor phase, so that the angle of the wetting angle is changed to control the shape of the microlens.

Another factor affecting the shape of the microlenses is the thickness of the adhesive 120 applied. The shape of the microlens may be controlled by adjusting the thickness of the adhesive applied on the substrate by the speed at which the substrate is rotated during the coating process, the acceleration applied to the substrate, or a combination thereof.

1 illustrates a method of manufacturing the microlens array of the present invention in detail. At this time, it is the pattern of the mask that determines the position or size of the microlens. Such a mask pattern may have a feature that the same pattern is repeated, and two or more patterns having different shapes, different sizes, or different shapes and sizes may be repeated.

2 is an example in which a mask pattern consisting of repetition of two patterns of large and small squares is used as an example of an exposure process of a method of manufacturing a microlens according to the present invention. The ultraviolet light passes through the pattern of the small square 211 on the mask 210 and the large square 212 at the center of the adhesive 120 applied on the substrate 110 of FIG. 2. The micro lens manufactured by the example of FIG. 2 is made of a large and small hemispherical adhesive.

The following embodiments are provided as examples to ensure that the spirit of the invention to those skilled in the art will fully convey. Accordingly, the present invention is not limited to the embodiments described below and may be embodied in other forms.

(Example 1)

Using a spin coater, apply UV curable adhesive (Dymax, OP-4-20663) with a viscosity (ASTM D-1084) of 1900 cP at 4000 rpm on a glass substrate, and then repeat 10 x 10 patterns with a diameter of 10um. The mask to be aligned with the substrate to which the adhesive was applied was fixed and irradiated with ultraviolet rays. After irradiating with ultraviolet light, the acetone was used to remove the uncured adhesive and the glass transition temperature (Tg, ASTM E-831) of the used adhesive was 104 ° C. The array was produced.

In Example 1, the heat treatment was performed at 130 ° C., but the decomposition temperature (Td) of the ultraviolet curable adhesive (Dymax, OP-4-20663) was 180 ° C., so the temperature was selected in a temperature range corresponding to 104 ° C. or more and less than 180 ° C. The micro lens array may be manufactured by heat treatment with.

3B is an optical photograph of a micro lens array fabricated using the same method as described above using a mask having a mask pattern having a diameter of 20 μm.

As can be seen in Figures 3a and 3b it can be seen that the mask pattern was effectively transferred to the adhesive, evenly sized to 10 ㎛ (Fig. 3a) and 20 ㎛ (Fig. 3b) in diameter and uniform shape in a round spherical shape.

3C is a scanning electron microscope (SEM) photograph of the microlenses constituting the microlens array of FIG. 3A, and it can be seen that the microlenses have a smooth surface and are manufactured in a symmetrical spherical shape without irregular changes in shape.

FIG. 3D is a one-dimensional profiler result of the microlens of FIG. 3C. It can be seen that the height from the substrate of the manufactured micro lens to the center of the lens is 4 μm, the radius of curvature of the lens center is 4.7 μm, and the diameter is 10 μm.

The microlenses manufactured according to Example 1 are characterized by having a high transmittance of 99% or more for light having a wavelength of 350 nm to 1300 nm, and a refractive index of 1.56 in the same wavelength band.

Since the manufacturing method of the microlens of the present invention as described above is manufactured using an adhesive which is an ultraviolet curable resin, it has excellent adhesion with the substrate regardless of the substrate type, has a high optical transmittance, and has a strong resistance to chemicals. It is characterized by the fact that volatilization does not occur during the manufacturing process of the microlenses because no solvent is used. In addition, no soft baking or hard baking step is required, and the curing of the adhesive occurs in a very fast and low temperature state using ultraviolet light, and the microlens array can be manufactured by a low temperature process.

The manufacturing method of the microlens of the present invention is very excellent in adhesion to the substrate, regardless of the substrate type, has a high optical transmittance, has a strong resistance to chemicals, and volatilization does not occur during the manufacturing process of the microlens. Does not have the features. In addition, no soft baking or hard baking step is required, and the microlens array can be manufactured through a quick and simple low temperature process.

Claims (7)

An application step of applying an ultraviolet curable adhesive which is an acrylate polymer or copolymer on the substrate; An exposure step of irradiating ultraviolet rays to the adhesive applied on the substrate by fixing a mask having a predetermined pattern to the substrate on which the coating step is completed; A developing step of removing the adhesive, which has not been irradiated with ultraviolet rays by the pattern of the mask, after the exposure step by using a solvent; After the developing step, the adhesive is not removed by the developing step on the substrate heat treatment to a temperature of less than the glass transition temperature (Tg) or more than the decomposition temperature (Td) of the adhesive to form a lens-type UV curing adhesive having a curvature Obtaining a lens array; Method of manufacturing a micro lens array comprising a. delete The method of claim 1, The solvent is an alcohol, a ketone or chlorine-substituted hydrocarbon solvent, or a mixed solvent thereof. The method of claim 1, And the thickness of the adhesive applied on the substrate is controlled by the speed at which the substrate is rotated, the acceleration applied to the substrate, or a combination thereof during the coating process. The method of claim 1, The pattern of the mask is a method of manufacturing a micro lens array, characterized in that the same pattern is repeated. The method of claim 1, The pattern of the mask is a method of manufacturing a micro lens array, characterized in that two or more patterns having different shapes, different sizes or different shapes and sizes are repeated. delete
KR1020070026861A 2007-03-19 2007-03-19 Fabrication Method of Microlens Arrays Using UV-Curable Optical Adhesive KR101001756B1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020070026861A KR101001756B1 (en) 2007-03-19 2007-03-19 Fabrication Method of Microlens Arrays Using UV-Curable Optical Adhesive
PCT/KR2007/001363 WO2008114893A1 (en) 2007-03-19 2007-03-20 Fabrication method of microlens arrays using uv-curable optical adhesive

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020070026861A KR101001756B1 (en) 2007-03-19 2007-03-19 Fabrication Method of Microlens Arrays Using UV-Curable Optical Adhesive

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KR20080085402A KR20080085402A (en) 2008-09-24
KR101001756B1 true KR101001756B1 (en) 2010-12-15

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Publication number Priority date Publication date Assignee Title
DE102009019762B4 (en) * 2009-05-05 2020-03-12 3D Global Holding Gmbh Process for the production of objects with a defined structured surface
KR20110058031A (en) 2009-11-25 2011-06-01 삼성전자주식회사 Manufacturing method of nonvolatile memory device
JP6352600B2 (en) * 2012-09-27 2018-07-04 大日本塗料株式会社 COMPOSITE MATERIAL OF SUBSTRATE AND LENS-LIKE PARTICLE AND METHOD FOR PRODUCING THE SAME
CN110187417B (en) * 2019-06-27 2020-08-25 电子科技大学 Method for manufacturing PDMS film micro-lens array

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003222705A (en) 2002-01-30 2003-08-08 Toppan Printing Co Ltd Manufacturing method of microlens
JP2006019575A (en) 2004-07-02 2006-01-19 Sharp Corp Method and apparatus for developing photoresist

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Publication number Priority date Publication date Assignee Title
JPH03198003A (en) * 1989-12-27 1991-08-29 Ricoh Co Ltd Production of microlens array
JPH08313706A (en) * 1995-05-12 1996-11-29 Hoya Corp Microlens array integrated with light-shielding part and its production
JP2001096636A (en) * 1999-07-27 2001-04-10 Seiko Epson Corp Microlens array and method for manufacture thereof, and optical device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003222705A (en) 2002-01-30 2003-08-08 Toppan Printing Co Ltd Manufacturing method of microlens
JP2006019575A (en) 2004-07-02 2006-01-19 Sharp Corp Method and apparatus for developing photoresist

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WO2008114893A1 (en) 2008-09-25
KR20080085402A (en) 2008-09-24

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