KR100991723B1 - Roll-to-Roll Apparatus for fixing solid powder on flexible substrates - Google Patents

Roll-to-Roll Apparatus for fixing solid powder on flexible substrates Download PDF

Info

Publication number
KR100991723B1
KR100991723B1 KR1020080090115A KR20080090115A KR100991723B1 KR 100991723 B1 KR100991723 B1 KR 100991723B1 KR 1020080090115 A KR1020080090115 A KR 1020080090115A KR 20080090115 A KR20080090115 A KR 20080090115A KR 100991723 B1 KR100991723 B1 KR 100991723B1
Authority
KR
South Korea
Prior art keywords
roll
adsorption
flexible substrate
solid
roller
Prior art date
Application number
KR1020080090115A
Other languages
Korean (ko)
Other versions
KR20100031163A (en
Inventor
김옥률
김옥민
Original Assignee
주식회사 펨빅스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 펨빅스 filed Critical 주식회사 펨빅스
Priority to KR1020080090115A priority Critical patent/KR100991723B1/en
Priority to PCT/KR2009/004041 priority patent/WO2010011076A2/en
Priority to US12/999,058 priority patent/US9139912B2/en
Publication of KR20100031163A publication Critical patent/KR20100031163A/en
Application granted granted Critical
Publication of KR100991723B1 publication Critical patent/KR100991723B1/en

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00Coating starting from inorganic powder
    • C23C24/02Coating starting from inorganic powder by application of pressure only
    • C23C24/04Impact or kinetic deposition of particles
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C10/00Solid state diffusion of only metal elements or silicon into metallic material surfaces
    • C23C10/28Solid state diffusion of only metal elements or silicon into metallic material surfaces using solids, e.g. powders, pastes
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/60Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using solids, e.g. powders, pastes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

본 발명은 고상파우더를 폴리머 필름 등의 연성기재에 연속적으로 증착시키기 위한 롤투롤(roll-to-roll) 장치에 관한 것으로서, 고상파우더의 분사압에 의한 연성기재의 진동을 제어하여, 균등하고 정밀한 고상파우더 증착을 실현하기 위한 것이다.

본 발명은 롤러의 회전운동에 의해 풀림롤러에 감겨 있는 연성기재가 풀어져 감김롤러에 감기도록 구비된 롤투롤(roll-to-roll) 장치로서, 상기 풀림롤러와 감김롤러 사이에서 상기 연성기재를 떠받치며 흡착력에 의해 연성기재와 밀착되는 흡착부재; 상기 흡착부재의 흡착력을 조절하는 흡착펌프; 및 상기 흡착부재와 흡착펌프를 연결하는 흡착관; 이 구비된 것을 특징으로 하는 고상파우더 연속 증착 롤투롤 장치를 제공한다.

Figure R1020080090115

고상파우더, 연속증착, 롤투롤, 진공척, 흡착실린더, 흡착펌프

The present invention relates to a roll-to-roll apparatus for continuously depositing a solid powder on a flexible substrate such as a polymer film, and controls the vibration of the flexible substrate due to the injection pressure of the solid powder, thereby providing an even and accurate This is for realizing solid powder deposition.

The present invention is a roll-to-roll device provided to unwind the flexible substrate wound on the unwinding roller by the rotational movement of the roller, and to hold the flexible substrate between the unwinding roller and the unwinding roller. An adsorption member that is in close contact with the flexible substrate by the adsorption force; Adsorption pump for adjusting the adsorption force of the adsorption member; And an adsorption tube connecting the adsorption member and the adsorption pump. It provides a solid-phase powder continuous deposition roll-to-roll apparatus characterized in that provided.

Figure R1020080090115

Solid phase powder, continuous deposition, roll-to-roll, vacuum chuck, adsorption cylinder, adsorption pump

Description

고상파우더 연속 증착 롤투롤 장치{Roll-to-Roll Apparatus for fixing solid powder on flexible substrates}Solid-Powder Continuous Deposition Roll-to-Roll Device {Roll-to-Roll Apparatus for fixing solid powder on flexible substrates}

본 발명은 고상파우더를 폴리머 필름 등의 연성기재에 연속적으로 증착시키기 위한 롤투롤(roll-to-roll) 장치에 관한 것으로서, 고상파우더의 분사압에 의한 연성기재의 진동을 제어하여, 균등하고 정밀한 고상파우더 증착을 실현하기 위한 것이다.The present invention relates to a roll-to-roll apparatus for continuously depositing a solid powder on a flexible substrate such as a polymer film, and controls the vibration of the flexible substrate due to the injection pressure of the solid powder, thereby providing an even and accurate This is for realizing solid powder deposition.

본 발명의 발명자들은 고상파우더의 입자 크기, 형태, 비중에 상관없이 수송기체와 고상파우더가 혼합된 에어로졸을 균등하게 분산시켜, 기재의 재질 및 크기에 관계없이 균일하게 연속적으로 증착시켜 균일한 박막을 형성할 수 있는 장치 및 방법에 대하여 특허출원한 바 있다.(대한민국 특허출원 제2008-0072119호 "고상파우더 연속 증착장치 및 고상파우더 연속 증착방법")The inventors of the present invention uniformly disperse the aerosol mixed with the transport gas and the solid powder regardless of the particle size, shape, specific gravity of the solid powder, uniformly and continuously deposited regardless of the material and size of the substrate to produce a uniform thin film It has been applied for a device and a method which can be formed. (Korean Patent Application No. 2008-0072119 "Solid-Powder Continuous Deposition Apparatus and Solid-Powder Continuous Deposition Method")

상기 특허출원 제2008-0072119호 발명은 흡입된 공기를 필터링 및 건조처리 하여 정량공급되는 고상파우더와 혼합시킨 에어로졸을 밀도, 속도, 유량을 일정하게 통제한 상태로 수송하여, 전폭에 걸쳐 압력분포와 분사속도가 일정한 슬릿노즐을 통해 증착챔버 내부의 기재에 증착시키는 장치에 관한 것으로서, 상기 「기재」로는 강성기재와 연성기재를 모두 적용할 수 있도록 개발된 것이었다.The patent application No. 2008-0072119 discloses aerosol mixed with a solid powder supplied by filtration and drying treatment of inhaled air under constant control of density, speed, and flow rate, thereby providing pressure distribution and The present invention relates to an apparatus for depositing a substrate in a deposition chamber through a slit nozzle having a constant spray rate, and the "substrate" was developed to apply both a rigid substrate and a flexible substrate.

상기 특허출원 제2008-0072119호의 「발명의 상세한 설명」에서도 "유리, 금속 등과 같이 휘어지지 않는 소재의 기재에 대량으로 고상파우더를 증착시키는 공정을 위해서는 이송장치를 배치타입(소정의 면적을 가지는 기재가 이송장치에 의해 이동하며 증착되는 공정을 실행하기 위한 구조)장치로 구성할 수 있고, 폴리머 필름, 호일(foil) 등과 같이 플렉시블한 소재의 기재가 사용되는 경우에는 이송장치를 롤투롤(roll-to-roll) 형태의 인라인 장치로 대체할 수 있다."고 기재되어 있다.In the "Description of the Invention" of Patent Application No. 2008-0072119, "In the process of depositing a large amount of solid phase powder on a substrate of a material that is not bent, such as glass, metal, etc., the transfer device is a batch type (a substrate having a predetermined area). Structure for carrying out the deposition process which is carried out by the conveying device. When a substrate of a flexible material such as a polymer film or a foil is used, the conveying device is roll-to-roll. to-roll) inline devices. "

다만, 연성기재에 고상파우더 에어로졸을 증착시키고자 하는 경우 도 1에 도시된 바와 같은 일반적인 롤투롤(roll-to-roll) 장치를 이용하면 에어로졸의 분사압에 의해 연성기재가 상하로 진동하게 되므로 균일한 증착막을 얻어내기가 매우 어렵다.However, when a solid powder aerosol is deposited on a flexible substrate, the general roll-to-roll apparatus as shown in FIG. 1 causes the flexible substrate to vibrate up and down by the injection pressure of the aerosol. It is very difficult to obtain a deposited film.

이러한 문제점 해결을 위해서는 우선 도 2에 도시된 바와 같이 연성기재에 고상파우더가 증착되는 면의 배면(즉, 에어로졸 분사압을 받는 면의 반대면)에 받 침부재를 설치하는 방법을 생각해볼 수 있다. 그러나 이 방법에서도 연성기재가 받침부재에서 들뜨는 경우에는 상기한 문제점을 그대로 갖게 되며, 특히 탄소나노튜브와 같은 극미한 고상파우더 증착 공정에서는 연성기재가 받침부재에서 크게 들뜨지 않더라도 연성기재와 받침부재간의 미세간격에 의해 균일하고 정교한 증착막 형성이 어렵게 된다. In order to solve this problem, as shown in FIG. 2, a method of installing a supporting member on the rear surface (that is, the opposite surface of the surface subjected to aerosol injection pressure) on the surface where the solid powder is deposited on the flexible substrate can be considered. . However, even in this method, when the flexible substrate is lifted from the support member, the above problem remains as it is. The spacing makes it difficult to form a uniform and precise deposition film.

한편, 도 3에 도시된 바와 같이 연성기재를 고정부재로 눌러줌으로써 연성기재의 들뜸을 제어하는 구성도 고려해 볼 수 있으나, 이 역시 연성기재와 받침부재간의 미세간격의 발생을 완전히 배제할 수는 없다. On the other hand, as shown in Figure 3 may be considered a configuration to control the lifting of the flexible substrate by pressing the flexible substrate to the fixing member, but this also can not completely exclude the occurrence of the micro-gap between the flexible substrate and the supporting member. .

다른 한편, 위와 같은 연성기재와 고정부재간의 들뜸이나 미세한 간격의 발생을 제어하기 위해서는 도 4에 도시된 바와 같이 상기 받침부재를 원통형으로 구성하여, 연성기재가 원통형 받침부재에 밀착되도록 잡아 당겨진 상태에서 원통형 받침부재를 타고 넘도록 구성할 수 있다. 이러한 구조의 롤투롤 장치를 적용하면 연성기재와 고정부재간의 들뜸이나 미세한 간격의 발생을 제어하고자 하는 목적은 어느 정도 달성할 수 있게 된다. 그러나 이러한 구성은 받침부재가 원통형이라는 점에서 또 다른 문제가 발생한다. 즉, 연성기재가 원통형 받침부재에 밀착되어 감겨 넘어가는 이상 고상파우더의 증착면 역시 곡면이 될 수 밖에 없으므로 연성기재 전면에 걸쳐 고상파우더가 고르게 분산된다는 점을 보장하기 어렵게 된다. 원통형 받침부재의 직경을 크게 하여 증착면의 곡률을 낮추면 위의 우려는 어느 정도 해소 할 수 있게 되나 이렇게 되면 장비의 사이즈가 커져 장비의 단가가 높아지고 장비의 점유공간이 커진다는 문제가 또다시 발생한다. On the other hand, in order to control the occurrence of the lifting or minute spacing between the flexible base and the fixing member as shown in Figure 4 by configuring the supporting member in a cylindrical shape, the flexible base is pulled in close contact with the cylindrical supporting member It can be configured to ride over the cylindrical support member. By applying the roll-to-roll apparatus of such a structure, the purpose of controlling the lifting or the generation of minute spacing between the flexible substrate and the fixing member can be achieved to some extent. However, this configuration causes another problem in that the supporting member is cylindrical. In other words, since the deposition surface of the solid powder is also a curved surface as the flexible substrate is in close contact with the cylindrical support member, it is difficult to guarantee that the solid powder is evenly distributed over the entire surface of the flexible substrate. If the diameter of the cylindrical support member is increased to reduce the curvature of the deposition surface, the above concerns can be solved to some extent, but this causes the problem that the size of the equipment increases, the cost of the equipment increases, and the space of the equipment increases. .

본 발명은 연성기재에 고상파우더를 균일하고 연속적으로 증착시킬 수 있는 롤투롤(roll-to-roll) 장치를 제공함을 그 목적으로 하며, 구체적으로는 슬릿노즐에서 분사되는 고상파우더 에어로졸의 분사압에 관계없이 기재의 연성에 의한 진동이 발생하지 않도록 하면서, 장치 점유공간을 최소화함을 그 해결 과제로 한다. The present invention is to provide a roll-to-roll device capable of depositing a solid powder uniformly and continuously on a flexible substrate, and specifically, to the injection pressure of the solid powder aerosol injected from the slit nozzle The problem is to minimize the apparatus occupied space while preventing vibration caused by the ductility of the substrate regardless.

본 발명은 롤러의 회전운동에 의해 풀림롤러에 감겨 있는 연성기재가 풀어져 감김롤러에 감기도록 구비된 롤투롤(roll-to-roll) 장치로서, 상기 풀림롤러와 감김롤러 사이에서 상기 연성기재를 떠받치며 흡착력에 의해 연성기재와 밀착되는 흡착부재; 상기 흡착부재의 흡착력을 조절하는 흡착펌프; 및 상기 흡착부재와 흡착펌프를 연결하는 흡착관; 이 구비된 것을 특징으로 하는 고상파우더 연속 증착 롤투롤 장치를 제공한다.The present invention is a roll-to-roll device provided to unwind the flexible substrate wound on the unwinding roller by the rotational movement of the roller, and to hold the flexible substrate between the unwinding roller and the unwinding roller. An adsorption member that is in close contact with the flexible substrate by the adsorption force; Adsorption pump for adjusting the adsorption force of the adsorption member; And an adsorption tube connecting the adsorption member and the adsorption pump. It provides a solid-phase powder continuous deposition roll-to-roll apparatus characterized in that provided.

즉, 고상파우더가 증착되는 연성기재 부위를 흡착부재로 안정화시켜 균일하고 연속적인 증착막을 얻도록 하는 것이다.In other words, the flexible substrate portion on which the solid phase powder is deposited is stabilized by the adsorption member to obtain a uniform and continuous deposition film.

본 발명에 따르면, 고상파우더를 연성기재에 균일하고 연속적으로 증착시킬 수 있어 고상파우더 증착제품의 생산성과 품질이 향상되고, 롤투롤 방식에 의한 대량생산으로 공정원가를 획기적으로 절감시킬 수 있다.According to the present invention, the solid powder can be deposited uniformly and continuously on a flexible substrate, so that the productivity and quality of the solid powder deposited product can be improved, and the process cost can be drastically reduced by mass production by a roll-to-roll method.

도 5와 도 6은 각각 본 발명에 따른 고상파우더 연속 증착 롤투롤 장치의 제1, 2실시예를 도시한 것이고, 도 7은 진공척의 사시도, 도 8은 회전 흡착실린더의 사시도이다. 이하에서는 첨부된 도면과 함께 본 발명을 상세히 설명하기로 한다.5 and 6 respectively show the first and second embodiments of the solid-phase powder continuous deposition roll-to-roll apparatus according to the present invention, Figure 7 is a perspective view of a vacuum chuck, Figure 8 is a perspective view of a rotary adsorption cylinder. Hereinafter, the present invention will be described in detail with the accompanying drawings.

1. 발명 실시의 전제1. Premise of implementing the invention

본 발명은 대한민국 특허출원 제2008-0072119호 "고상파우더 연속 증착장치 및 고상파우더 연속 증착방법"을 연성기재에 적용하기 위한 롤투롤 장치에 관한 것이다. 상기 특허출원 제2008-0072119호 발명은 고상 파우더 입자의 크기, 형태 및 비중에 관계없이 기재의 일 단면 전체에 걸쳐 균등하게 연속적으로 고상파우더를 증착하기 위한 것이므로, 슬릿노즐(25)에서 분사되는 고상파우더 에어로졸의 분사압에 의하더라도 연성기재(51)에 진동이 발생하지 않도록 하는 기술요소가 필요케 되는 것이다. 다만, 본 발명은 일반적인 롤투롤 공정에도 다양하게 적용 가능하며, 정밀한 작업이 요구되는 회로기판 인쇄작업 등에도 유용하게 활용될 수 있다. The present invention relates to a roll-to-roll apparatus for applying the Republic of Korea Patent Application No. 2008-0072119 "solid powder continuous deposition apparatus and solid powder continuous deposition method" to a flexible substrate. Since the patent application No. 2008-0072119 is for depositing the solid powder continuously and uniformly over the entire cross section of the substrate regardless of the size, shape and specific gravity of the solid powder particles, the solid phase injected from the slit nozzle 25 Even if the injection pressure of the powder aerosol is a technical element that does not cause the vibration in the flexible substrate 51 is required. However, the present invention may be variously applied to a general roll-to-roll process, and may be usefully used for a circuit board printing operation requiring precise work.

2. 롤투롤(roll-to-roll) 장치2. Roll-to-roll device

본 발명은 롤러의 회전운동에 의해 풀림롤러(50)에 감겨 있는 연성기재(51) 가 풀어져 감김롤러(52)에 감기도록 구비된 롤투롤(roll-to-roll) 장치에 관한 것이다. 본 발명의 롤투롤 장치는 폴리머 필름, 호일 등의 연성기재를 상기 풀림롤러(50)에 권취한 상태에서, 연성기재의 단부를 끌어당겨 상기 감김롤러(52)에 정착시킨 후 롤러를 회동시킴으로써 감김롤러(52)에 권취되도록 하는 것이다. 본 발명에서는 연성기재(51)가 풀림롤러(50)에서 감김롤러(52)로 이동하는 중간에 고상파우더가 증착되도록 구성되며, 이러한 롤투롤 장치가 설치되는 증착챔버의 내부구조, 점유 공간 사이즈, 연성기재에 미치는 장력의 방향 등을 고려하여 요소마다 보조롤러(54)를 구비토록 할 수 있다.(도 5 및 도 6 참조) The present invention relates to a roll-to-roll apparatus which is provided so that the flexible substrate 51 wound around the unwinding roller 50 is wound around the unwinding roller 52 by the rotational movement of the roller. In the roll-to-roll apparatus of the present invention, a flexible substrate such as a polymer film or foil is wound on the unwinding roller 50, and the end of the flexible substrate is pulled and fixed to the winding roller 52, and then wound by rotating the roller. It is to be wound by the roller 52. In the present invention, the solid substrate 51 is configured to deposit a solid powder in the middle of moving from the unwinding roller 50 to the winding roller 52, the internal structure of the deposition chamber in which such a roll-to-roll apparatus is installed, occupied space size, The auxiliary roller 54 may be provided for each element in consideration of the direction of tension applied to the flexible substrate, etc. (see FIGS. 5 and 6).

3. 흡착부재 및 흡착펌프3. Adsorption member and adsorption pump

본 발명에서는 상기 풀림롤러(50)와 감김롤러(52) 사이의 연성기재(51) 증착부위에 상기 연성기재(51)를 떠받치는 흡착부재(60)가 구비된다. 상기 흡착부재(60)가 연성기재(51)를 뒷받침한다는 점에서는 도 2 내지 도 5에 도시된 받침부재와 유사하나, 흡착펌프(57)의 흡착력에 의해 연성기재(51)와 밀착된다는 점에서 본 발명 고유의 특징을 갖는다. 상기 흡착부재(60)와 흡착펌프(57)는 도 5 및 도 6에 도시된 바와 같이 흡착관(55)에 의해 상호 연결된다. 상기 흡착부재(60)의 흡착력은 흡착펌프(57)에 의해서 조절되도록 구성되나, 상기 흡착관(55)에 흡착조절밸브(56)를 더 설치하여 흡착부재(60)의 흡착력을 보다 정밀하게 조절토록 할 수 있다.In the present invention, the adsorption member 60 supporting the flexible substrate 51 is provided at the deposition position of the flexible substrate 51 between the unwinding roller 50 and the winding roller 52. The adsorption member 60 is similar to the support member shown in Figs. 2 to 5 in that it supports the flexible substrate 51, but in close contact with the flexible substrate 51 by the adsorption force of the adsorption pump 57. It has the characteristics unique to the present invention. The adsorption member 60 and the adsorption pump 57 are interconnected by adsorption tubes 55 as shown in FIGS. 5 and 6. The adsorption force of the adsorption member 60 is configured to be controlled by the adsorption pump 57, but the adsorption force of the adsorption member 60 is adjusted more precisely by further installing an adsorption control valve 56 on the adsorption tube 55. You can do it.

상기 흡착부재(60)는 박스형 몸체부(61) 상면이 미세구멍(71)이 다수 형성된 안착부(72)로 커버된 진공척(vacuum chuck)을 적용할 수 있다.(도 5 및 도 7 참조) 상기 안착부(72)는 미세구멍(71)을 통한 공기 흡입력에 의해 연성기재(51)와 밀착되므로 고상파우더 에어로졸의 증착 충격이 있더라도 균일한 증착막 형성에 어떠한 지장도 받지 않게 된다. 이 경우 상기 진공척의 흡착력은 연성기재(51)의 밀착 효과와 연성기재(51)의 권취 이동 속도를 고려하여 적절히 조절해야 한다. 이는 상기 흡착펌프(57)의 흡착력 조절과 상기 흡착조절밸브(56)의 개폐조절로 실현할 수 있다. The suction member 60 may apply a vacuum chuck in which the upper surface of the box-shaped body portion 61 is covered with a seating portion 72 in which a plurality of micropores 71 are formed. (See FIGS. 5 and 7. Since the seating portion 72 is in close contact with the flexible substrate 51 by the air suction force through the micropores 71, even if there is a deposition impact of the solid-phase powder aerosol, there is no obstacle to the uniform deposition film formation. In this case, the suction force of the vacuum chuck should be appropriately adjusted in consideration of the adhesion effect of the flexible base 51 and the winding movement speed of the flexible base 51. This can be achieved by adjusting the suction force of the suction pump 57 and opening / closing control of the suction control valve 56.

한편, 상기 흡착부재(60)로는 트랙형 회전궤도(70)에 미세구멍(72)이 다수 형성된 안착부(72)가 둘러감긴 회전 흡착실린더를 적용할 수도 있다.(도 6 및 도 8 참조) 이러한 회전 흡착실린더를 적용하면, 연성기재(51)가 안착부(72)에 밀착된 상태로 회전궤도(70)를 따라 수평방향으로 움직이다가 상기 안착부(72)가 트랙형 회전궤도(70)의 곡선구간을 지나는 경우에는 연성기재(51)에 작용하는 흡착력이 자연스럽게 제거되므로 위의 진공척을 적용하는 경우보다는 부드럽게 연성기재(51)를 이동시킬 수 있게 된다. 이는 흡착펌프(57)에 의한 흡착력이 상하방향으로만 작용하기 때문이다.On the other hand, the adsorption member 60 may be applied to the rotary adsorption cylinder in which the seating portion 72 in which a plurality of micropores 72 are formed in the track-type rotational track 70 is enclosed (see FIGS. 6 and 8). When the rotary adsorption cylinder is applied, the flexible substrate 51 moves horizontally along the rotational track 70 in a state in which the flexible substrate 51 is in close contact with the seating unit 72, and then the seating unit 72 has a track-type rotational track 70. In the case of passing through the curve section of), since the adsorption force acting on the flexible substrate 51 is naturally removed, the flexible substrate 51 can be moved smoothly than when the above vacuum chuck is applied. This is because the adsorption force by the adsorption pump 57 acts only in the vertical direction.

4. 연성기재의 인장조절4. Tension control of flexible substrate

상기 흡착부재(60)는 흡착력에 의해 연성기재(51)와 밀착될 수 있으나, 연성 기재(51) 자체가 구겨진 상태로 이동되면 고상파우더의 균일한 증착은 기대할 수 없으므로 상기 흡착부재(60)는 그 존재의 의미를 상실하게 된다. 따라서, 본 발명은 상기 풀림롤러(50)와 감김롤러(52) 사이의 흡착부재(51) 전후에 인장력 조절 롤러(53)가 더 구비된 것을 특징으로 하는 고상파우더 연속 증착 롤투롤 장치를 함께 제공한다. 상기 인장력 조절 롤러(53)는 연성기재(51)를 팽팽하게 잡아당겨주는 역할을 하는 것이며, 연성기재의 종류별 특성에 따라 인장력을 조절할 수 있다.The adsorption member 60 may be in close contact with the flexible substrate 51 by the adsorption force, but when the flexible substrate 51 itself is moved in a crumpled state, uniform deposition of the solid phase powder cannot be expected. It loses its meaning. Therefore, the present invention provides a solid-phase powder continuous deposition roll-to-roll apparatus, characterized in that the tension control roller 53 is further provided before and after the adsorption member 51 between the unwinding roller 50 and the winding roller 52. do. The tensile force control roller 53 serves to pull the flexible base 51 tightly, and may adjust the tensile force according to the characteristics of the flexible base.

도 1은 종래의 롤투롤 장치를 이용하여 연성기재에 고상파우더를 증착시키는 과정의 모식도이다.1 is a schematic diagram of a process of depositing a solid powder on a flexible substrate using a conventional roll-to-roll apparatus.

도 2는 종래의 롤투롤 장치에 받침부재를 부가하여 연성기재에 고상파우더를 증착시키는 과정의 모식도이다.2 is a schematic diagram of a process of depositing a solid powder on a flexible substrate by adding a support member to a conventional roll-to-roll apparatus.

도 3은 종래의 롤투롤 장치에 받침부재와 고정부재를 부가하여 연성기재에 고상파우더를 증착시키는 과정의 모식도이다.3 is a schematic diagram of a process of depositing a solid powder on a flexible substrate by adding a supporting member and a fixing member to a conventional roll-to-roll apparatus.

도 4는 종래의 롤투롤 장치에 원통형 받침부재를 부가하여 연성기재에 고상파우더를 증착시키는 과정의 모식도이다.4 is a schematic diagram of a process of depositing a solid powder on a flexible substrate by adding a cylindrical support member to a conventional roll-to-roll apparatus.

도 5는 본 발명에 따른 고상파우더 연속 증착 롤투롤 장치의 제1실시예를 도시한 것이다.Figure 5 shows a first embodiment of a solid-phase powder continuous deposition roll-to-roll apparatus according to the present invention.

도 6은 본 발명에 따른 고상파우더 연속 증착 롤투롤 장치의 제2실시예를 도시한 것이다.Figure 6 shows a second embodiment of a solid-phase powder continuous deposition roll-to-roll apparatus according to the present invention.

도 7은 진공척의 사시도이다.7 is a perspective view of a vacuum chuck.

도 8은 회전 흡착실린더의 사시도이다. 8 is a perspective view of a rotary suction cylinder.

<발명의 주요부분에 대한 부호의 설명><Description of Codes for Main Parts of the Invention>

10 : 에어펌프 11 : 공기저장탱크10: air pump 11: air storage tank

12 : 1차필터 13 : 1차건조기12: 1st filter 13: 1st dryer

14 : 수분필터 15 : 유분필터14: water filter 15: oil filter

16 : 먼지필터 17 : 2차건조기16: dust filter 17: secondary dryer

18 : 유량조절기 19 : 유동조절기18: flow regulator 19: flow regulator

20 : 연결부 21 : 고상파우더공급부20: connection portion 21: solid powder supply unit

22 : 수송관 23 : 압력측정기22: transport pipe 23: pressure gauge

24 : 길이조절장치 25 : 슬릿노즐24: length adjusting device 25: slit nozzle

26 : 증착챔버 29 : 진공연결관26: deposition chamber 29: vacuum connection tube

30 : 압력제어밸브 31 : 진공펌프30: pressure control valve 31: vacuum pump

32 : 배기펌프 33 : 배기관32: exhaust pump 33: exhaust pipe

34 : 유동제어밸브 34: flow control valve

50 : 풀림롤러50: unwinding roller

51 : 연성기재 52 : 감김롤러51: flexible substrate 52: winding roller

53 : 인장력 조절 롤러 54 : 보조롤러53: tension force adjusting roller 54: auxiliary roller

55 : 흡착관 56 : 흡착조절밸브55: adsorption tube 56: adsorption control valve

57 : 흡착펌프 60 : 흡착부재57: adsorption pump 60: adsorption member

61 : 몸체부 70 : 회전궤도61 body portion 70: trajectory

71 : 미세구멍 72 : 안착부71: micropores 72: seating portion

Claims (5)

롤러의 회전운동에 의해 풀림롤러(50)에 감겨 있는 연성기재(51)가 풀어져 감김롤러(52)에 감기도록 구비된 롤투롤(roll-to-roll) 장치로서,As a roll-to-roll apparatus is provided so that the flexible substrate 51 wound around the unwinding roller 50 is unwinded and wound around the unwinding roller 52 by the rotation of the roller. 상기 풀림롤러(50)와 감김롤러(52) 사이에서 상기 연성기재(51)를 떠받치며 흡착력에 의해 연성기재(51)와 밀착되는 흡착부재(60);An adsorption member 60 holding the flexible base 51 between the unwinding roller 50 and the winding roller 52 and being in close contact with the flexible base 51 by adsorption force; 상기 흡착부재(60)의 흡착력을 조절하는 흡착펌프(57); 및Adsorption pump (57) for adjusting the adsorption force of the adsorption member (60); And 상기 흡착부재(60)와 흡착펌프(57)를 연결하는 흡착관(55); 이 구비된 것을 특징으로 하는 고상파우더 연속 증착 롤투롤 장치.An adsorption tube 55 connecting the adsorption member 60 and the adsorption pump 57; Solid phase continuous deposition roll-to-roll apparatus characterized in that the provided. 제1항에서, In claim 1, 상기 흡착부재(60)는 박스형 몸체부(61)의 상면이 미세구멍(71)이 다수 형성된 안착부(72)로 커버된 진공척(vacuum chuck)인 것을 특징으로 하는 고상파우더 연속 증착 롤투롤 장치.The adsorption member 60 is a solid-phase powder continuous deposition roll-to-roll apparatus, characterized in that the upper surface of the box-shaped body portion 61 is a vacuum chuck (vacuum chuck) covered with a seating portion 72 in which a plurality of micro holes 71 are formed. . 제1항에서, In claim 1, 상기 흡착부재(60)는 트랙형 회전궤도(70)에 미세구멍(71)이 다수 형성된 안착부(72)가 둘러감긴 회전 흡착실린더인 것을 특징으로 하는 고상파우더 연속 증착 롤투롤 장치. The adsorption member (60) is a solid-phase powder continuous deposition roll-to-roll apparatus, characterized in that the rotary adsorption cylinder is wound around the seating portion 72 formed with a plurality of micro holes 71 in the track-type rotational track (70). 제1항 내지 제3항 중 어느 한 항에서,The method according to any one of claims 1 to 3, 상기 풀림롤러(50)와 감김롤러(52) 사이의 흡착부재(60) 전후에는 인장력 조절 롤러(53); 가 더 구비된 것을 특징으로 하는 고상파우더 연속 증착 롤투롤 장치.A tension force adjusting roller 53 before and after the adsorption member 60 between the unwinding roller 50 and the winding roller 52; Solid phase continuous deposition roll-to-roll apparatus characterized in that it is further provided. 제4항에서,In claim 4, 상기 흡착관(55)에는 흡착조절밸브(56); 가 더 구비된 것을 특징으로 하는 고상파우더 연속 증착 롤투롤 장치.The adsorption pipe 55 has an adsorption control valve 56; Solid phase continuous deposition roll-to-roll apparatus characterized in that it is further provided.
KR1020080090115A 2008-07-24 2008-09-12 Roll-to-Roll Apparatus for fixing solid powder on flexible substrates KR100991723B1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020080090115A KR100991723B1 (en) 2008-09-12 2008-09-12 Roll-to-Roll Apparatus for fixing solid powder on flexible substrates
PCT/KR2009/004041 WO2010011076A2 (en) 2008-07-24 2009-07-21 Continuous solid powder vapour-deposition device, and a continuous solid powder vapour deposition method
US12/999,058 US9139912B2 (en) 2008-07-24 2009-07-21 Apparatus and method for continuous powder coating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020080090115A KR100991723B1 (en) 2008-09-12 2008-09-12 Roll-to-Roll Apparatus for fixing solid powder on flexible substrates

Publications (2)

Publication Number Publication Date
KR20100031163A KR20100031163A (en) 2010-03-22
KR100991723B1 true KR100991723B1 (en) 2010-11-03

Family

ID=42180884

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080090115A KR100991723B1 (en) 2008-07-24 2008-09-12 Roll-to-Roll Apparatus for fixing solid powder on flexible substrates

Country Status (1)

Country Link
KR (1) KR100991723B1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9079209B2 (en) 2010-10-08 2015-07-14 Ok Ryul Kim Apparatus for power coating
US10053765B2 (en) 2013-07-11 2018-08-21 Femvix Corp. Apparatus and method for coating with solid-state powder

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101595005B1 (en) * 2014-06-02 2016-02-17 주식회사 에스에프에이 Thermal evaporation apparatus in inle type
JP6396123B2 (en) 2014-08-29 2018-09-26 日東電工株式会社 Powder coating equipment
KR101879297B1 (en) * 2016-09-22 2018-07-17 주식회사 토바 The System for Non-contact Double ALD Vacuum Evaporation using Roll to Roll
KR20180059168A (en) * 2016-11-25 2018-06-04 제주대학교 산학협력단 Tension Maintenance Device for Roll-to-Roll ALD System
DE102019109195A1 (en) * 2019-04-08 2020-10-08 Norma Germany Gmbh Jet pump
CN112299038B (en) * 2020-11-18 2024-06-04 中冶赛迪工程技术股份有限公司 Charging device for metal surface corrosion prevention technology
CN115287620B (en) * 2022-07-21 2024-03-29 上海宝镀真空设备科技有限公司 Water-cooled structure of flattening roller

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001172759A (en) 1999-12-17 2001-06-26 Sony Corp Apparatus and method for substrate treatment

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001172759A (en) 1999-12-17 2001-06-26 Sony Corp Apparatus and method for substrate treatment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9079209B2 (en) 2010-10-08 2015-07-14 Ok Ryul Kim Apparatus for power coating
US10053765B2 (en) 2013-07-11 2018-08-21 Femvix Corp. Apparatus and method for coating with solid-state powder

Also Published As

Publication number Publication date
KR20100031163A (en) 2010-03-22

Similar Documents

Publication Publication Date Title
KR100991723B1 (en) Roll-to-Roll Apparatus for fixing solid powder on flexible substrates
JP5313684B2 (en) Apparatus and method for treating the surface of a substrate
JP5366965B2 (en) Fine fiber electrospinning apparatus, filtration media system and method
CN102150234B (en) Film-forming apparatus, film-forming method and semiconductor device
JP2009519590A (en) Apparatus, facility and method for treating substrate surface
US8297219B2 (en) Spray apparatus and coating system using same
KR101443437B1 (en) A spray apparatus for coating the surface of the cylindrical mold
CN102580886A (en) Intermittent coating apparatus
JP2015525302A (en) Atomic layer deposition apparatus and method
JP5730553B2 (en) Intermittent coating device
KR101309275B1 (en) Device and Method of Coating Both Sides of Film, and Coating Apparatus Having the Same
WO2015076466A1 (en) Large area substrate nanoparticle coating apparatus
JP2012061403A (en) Film forming apparatus, film forming method, and electronic device
JP2019130491A (en) Coating method and coating device
CN202166827U (en) Coating equipment
EP0238084B1 (en) Apparatus for depositing mono-molecular layer
JP2011068916A (en) Film deposition method and film deposition apparatus
US20150072075A1 (en) Film-forming apparatus and film-forming method
CN108325788A (en) Applying device and coating method
US20060147621A1 (en) Slit coater
JP2007294598A (en) Method for forming film of flexible printed board, and device therefor
WO2022024646A1 (en) Spray coating apparatus and spray coating method
KR102143428B1 (en) Double sided atomic layer deposition apparatus
JP2013166089A (en) Method for applying coating material and coating apparatus
JP5504573B2 (en) Application method of coating liquid

Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20131025

Year of fee payment: 4

FPAY Annual fee payment

Payment date: 20150723

Year of fee payment: 6

FPAY Annual fee payment

Payment date: 20161027

Year of fee payment: 7

FPAY Annual fee payment

Payment date: 20191007

Year of fee payment: 10