KR100964285B1 - Optical lithography device and manufacturing method for optical head thereof - Google Patents

Optical lithography device and manufacturing method for optical head thereof Download PDF

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Publication number
KR100964285B1
KR100964285B1 KR20080015649A KR20080015649A KR100964285B1 KR 100964285 B1 KR100964285 B1 KR 100964285B1 KR 20080015649 A KR20080015649 A KR 20080015649A KR 20080015649 A KR20080015649 A KR 20080015649A KR 100964285 B1 KR100964285 B1 KR 100964285B1
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KR
South Korea
Prior art keywords
light
optical head
substrate
microlens array
light modulator
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KR20080015649A
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Korean (ko)
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KR20080078565A (en
Inventor
강신일
임지석
Original Assignee
연세대학교 산학협력단
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Abstract

The present invention provides a parallel light providing unit for providing parallel light, an optical head for partitioning the parallel light into a plurality of regions, controlling the light passing through each region to pass and block, and condensing the light passing through each region; And a substrate driver for driving the substrate to pattern the substrate by the light emitted from the optical head, which can be miniaturized, can reduce manufacturing costs, and can minimize optical axis alignment errors of the microlens array. A lithographic system and method for manufacturing the same are provided.

Description

Optical head manufacturing method for optical lithography apparatus and optical lithography apparatus {OPTICAL LITHOGRAPHY DEVICE AND MANUFACTURING METHOD FOR OPTICAL HEAD THEREOF}

The present invention relates to an optical lithographic apparatus capable of miniaturization and to reducing manufacturing costs, and to an optical head manufacturing method for use in an optical lithographic apparatus.

In general, an optical lithography apparatus is used in fields such as flat panel displays, circuit boards, and integrated circuits, and is an apparatus for forming a pattern by scanning light onto a resist film applied to a substrate.

Currently, the display industry is diversified and the use of flat panel displays capable of realizing multi-screen is growing rapidly. Accordingly, in the conventional optical lithography process, it is essential to manufacture various kinds of large area masks that can cope with this.

However, when the mask is manufactured in various types and areas, a problem arises in that the manufacturing cost increases and the manufacturing period becomes long.

In order to solve this problem, a maskless lithography apparatus has been proposed using an optical intermodulator and a micro lens array.

Such a maskless lithographic apparatus is disclosed in Korean Laid-Open Patent No. 10-2004-0101066.

Lithographic apparatus disclosed in Republic of Korea Patent Publication No. 10-2004-0101066 described with reference to Figure 1, the beam of radiation generated from the light source LA is converted into parallel light while passing through the beam expander (Ex) and collimator (IL) This parallel light passes through the microlens array 11 and is separated into parallel light probes that are mapped 1: 1 to each area of the spatial light modulator 12, and is then focused through the projection optical system 13. Subsequently, a substrate W for patterning and a substrate table WT for driving the substrate W are disposed at a focal position of the projection optical system 13 and patterned onto the substrate by a beam focused through the projection optical system 13. This is carried out.

Such a maskless lithography apparatus has an advantage of not requiring a mask, thereby reducing costs associated with making a mask and responding to a change in shape of a pattern quickly. In addition, a plurality of optical probes may be applied to increase process efficiency compared to a single optical probe, and a large area patterning process may be easily performed by applying a step and refit or a step and scanning method.

 However, the lithographic apparatus according to the prior art as described above has a problem in that its structure is very complicated and difficult to manufacture, thereby increasing the manufacturing cost.

In addition, there is a problem that the light efficiency is lowered and the beam spot characteristic on the focal point of the projection optical system is deteriorated due to the long optical path and the lens array structure composed of a plurality of layers.

In addition, optical systems composed of collimators, spatial light modulators, microlens arrays, and projection optics have a problem of increasing optical axis alignment errors, and difficulty in miniaturizing the system due to a complicated optical system composed of multiple layers of optical elements. There is.

An object of the present invention is to provide an optical lithography apparatus and an optical head manufacturing method for use in an optical lithography apparatus which can be miniaturized by reducing the structure of an optical system and reduce manufacturing costs.

Another object of the present invention is to provide an optical lithography apparatus and an optical head manufacturing method for use in an optical lithography apparatus which can minimize an optical axis alignment error of a microlens array composed of a plurality of layers.

An optical lithographic apparatus according to the present invention comprises a parallel light providing unit for providing parallel light, partitioning the parallel light into a plurality of areas, controlling the light in each area to pass and block, and condensing the light passing through each area. And a substrate driver for driving the substrate to perform a patterning operation on the substrate by light emitted from the optical head.

In the optical head according to the first embodiment of the present invention, the optical head is divided into a plurality of regions and each region is controlled to pass and block light, and the optical head is disposed above the spatial light modulator, and the parallel light And a first microlens array arranged to be separated from the regions and refracting the light path, and a second microlens array disposed under the spatial light modulator to focus light passing through the respective regions. .

In the optical head according to the second embodiment of the present invention, the optical head is divided into a plurality of regions, and each region is controlled to allow light to pass through and blocked, and is disposed on the upper side of the spatial light modulator. A first microlens array that separates and maps a path of light to be mapped to a region, a second microlens array disposed below the spatial light modulator to focus light passing through each region, and the spatial light modulator And an antireflective coating film provided between at least one of the first microlens array and the spatial light modulator and the second microlens array.

The optical head according to the third embodiment of the present invention is partitioned into a plurality of regions, each region is controlled to pass and block light, and the spatial light modulator disposed on top of the spatial light modulator 1 A first microlens array for separating to be mapped to a: 1 and refracting a path of light, a second microlens array disposed under the spatial light modulator to convert light passing through each area into parallel light, and a second And a third microlens array disposed under the microlens array and condensing the parallel light.

The optical head manufacturing method for an optical lithography apparatus of the present invention includes applying a first polymer to a surface of an upper glass substrate of a spatial light modulator, pressing the first mold member having a lens pattern onto the first polymer, and curing the first mold member. Manufacturing a 1 microlens array, applying a second polymer to the surface of the lower glass substrate of the spatial light modulator, and pressing and curing the second mold member on which the lens pattern is formed on the second polymer and then hardening the second microlens. Manufacturing a lens array, and separating the first mold member and the second mold member from the spatial light modulator.

According to the above configuration, the optical lithographic apparatus of the present invention has the advantage of being capable of miniaturization by reducing the structure and reducing the manufacturing cost.

In addition, there is an advantage that can minimize the optical axis alignment error of the microlens array consisting of a plurality of layers.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

2 is a block diagram of an optical lithographic apparatus according to one embodiment of the invention.

An optical lithographic apparatus according to an embodiment of the present invention includes a parallel light providing unit 100, an optical head 200 for condensing parallel light provided from the parallel light providing unit 100, and a substrate driving the substrate 310. The driving unit 300 is included.

The parallel light providing unit 100 includes a light source 110 for generating light of a single wavelength and a collimator 120 for converting light generated from the light source 110 into parallel light. Herein, the light source 110 may be a laser light source, and any light source capable of generating a single wavelength such as a radiation beam may be used in addition to the laser light source.

The optical head 200 includes a spatial light modulator 210 disposed below the parallel light providing unit 100 at a predetermined distance from the parallel light providing unit 100 and an upper surface of the spatial light modulator 210. And a second microlens array 220 and a second microlens array 230 disposed on the bottom surface of the spatial light modulator 210.

The spatial light modulator 210 is partitioned into a plurality of regions mapped 1: 1 with a plurality of beam bundles generated by the first microlens array 220. In addition, the spatial light modulator 210 has a function of controlling each region to pass or block light independently.

The spatial light modulator 210 includes a liquid crystal part 240 having a plurality of partitioned areas through which light passes, and an opening and closing function for passing or blocking light in each area, and the liquid crystal part 240. It is disposed on the upper and lower surfaces of the upper and lower substrates 250 and 260 to protect the liquid crystal unit 240 is configured.

The first microlens array 220 is installed on the upper glass substrate 250 and performs a function of separating the parallel light to be mapped 1: 1 with each of the partitioned regions of the spatial light modulator 210, and the first microlens All of the light incident on the array 220 is refracted so that the light path may pass through each region of the liquid crystal unit 240.

The second microlens array 230 is installed on the lower glass substrate 260 to collect light passing through each area of the spatial light modulator 210 to enable fine patterning. The second microlens array 230 enables a beam spot size of 1 micrometer or less in diameter through a high numerical aperture aspherical optical design.

The substrate 310 may be a silicon wafer coated with a photosensitive material such as a photoresist, a glass wafer, or a substrate coated with a photosensitive material.

The substrate driver 300 supports the substrate 310 horizontally and moves the substrate along the X, Y, and Z axes. The substrate driver 300 can finely drive PZTs corresponding to ultra-fine beam spot sizes of 1 micrometer or less in diameter. Plumbum Zirconate Titanate) actuators are preferably used.

Distance measuring sensor for measuring the distance between the optical head 200 and the substrate 310 for patterning on one side of the optical head 200 so that the substrate 310 is always located at the focal length of the optical head 200 400 is disposed. Since the distance between the optical head 200 and the substrate 310 can be kept constant by the distance sensor 400, a large area patterning process can be effectively performed.

The operation of the optical lithographic apparatus according to the first embodiment configured as described above will be described below.

Light generated by the light source 110 is converted into parallel light while passing through the collimator 120. The parallel light passes through the first microlens array 220 and is separated into a plurality of beam bundles, and a path of light is refracted. Then, it passes through a plurality of regions formed in the spatial light modulator 210. At this time, each area of the spatial light modulator 210 is controlled to pass or block light independently.

Light passing through each region of the spatial light modulator 200 is focused to allow fine patterning while passing through the second microlens array 230. Patterning is performed on the substrate 310 by the collected light. Then, the substrate driving unit 300 is driven to move the substrate in the X-Y-Z direction to determine the shape of the pattern.

3A through 3E are process flowcharts illustrating a manufacturing process of an optical head according to an embodiment of the present invention.

First, as shown in FIG. 3A, the first polymer 410 is coated on the surface of the upper glass substrate 250 of the spatial light modulator 210. Herein, the first polymer 410 may be a photocurable polymer or a thermosetting polymer. The first mold member 420 having the lens pattern 430 is positioned on the upper glass substrate 250.

Here, the lens pattern 430 of the first molding member 420 is formed in the same shape as the shape of the first micro lens array.

3B, when the first mold member 420 is pressed onto the upper glass substrate 250 of the spatial light modulator 210, the same as the lens pattern 430 formed on the first mold member 420. The lens pattern is transferred to the surface of the first polymer 410. In addition, when the first polymer 410 is cured by heating the first polymer 410 or irradiating ultraviolet rays, the first micro lens array 220 is manufactured.

The first micro lens array 220 manufacturing process may be performed using an existing aligner. That is, the first mold member 420 is fixed at the position where the mask is fixed on the aligner, and the spatial light modulator 210 having the first polymer 410 applied is fixed at the position at which the lower substrate of the aligner is fixed. The first mold member 420 and the spatial light modulator 210 are aligned with respect to the alignment marks formed on the upper glass substrate 250 of the spatial light modulator 210 and then spaced with the first mold member 420. Couple the light modulator 210.

3C, after the lower glass substrate 260 of the spatial light modulator 210 is positioned upward, the second polymer 440 is coated on the surface of the lower glass substrate 260. The second mold member 450 having the lens pattern 460 is positioned on the lower glass substrate 260.

At this time, the first mold member 420 maintains the state coupled to the spatial light modulator 210. This is because it plays an important role in maintaining the shape of the first microlens array 220 which is already cured in a subsequent process and maintaining the flatness with the lower glass substrate 260.

Here, the lens pattern 460 of the second molding member 460 is formed in the same shape as the second micro lens array 230.

As shown in FIG. 3D, when the second mold member 450 and the spatial light modulator 210 are coupled to each other, the same lens pattern as that of the lens pattern 460 formed on the second mold member 450 is obtained by the second polymer ( 450) is transferred to the surface. In addition, when the second polymer 450 is cured by heating the second polymer 450 or irradiating ultraviolet rays, the second micro lens array 230 is manufactured.

As shown in FIG. 3E, when the first mold member 420 and the second mold member 450 are separated from the spatial light modulator 210, the manufacturing of the optical head 200 is completed.

4 is a schematic diagram of an optical lithographic apparatus according to a second embodiment of the present invention.

The optical lithographic apparatus according to the second embodiment includes a parallel light providing unit 100, an optical head 500 for condensing parallel light provided by the parallel light studying unit 100, and a substrate driving unit driving the substrate 310 ( 300).

Since the parallel light providing unit 100 and the substrate driving unit 300 have the same construction and operation as the parallel light providing unit 100 and the substrate driving unit 300 described in the embodiment, description thereof will be omitted.

The optical head 500 according to the second embodiment is disposed below the parallel light providing unit 100 at a distance from the parallel light providing unit 100, and has a spatial light modulator 210 and a spatial light modulator 210. A first microlens array 220 disposed on an upper surface of the second microlens array 220 and a second microlens array 230 disposed on a lower surface of the spatial light modulator 210, and the spatial light modulator 210 and the first microlens array Anti-reflective coating films 510 and 520 are provided between at least one of 220 and between the spatial light modulator 210 and the second microlens array 230.

The spatial light modulator 210, the first microlens array 220, and the second microlens array 230 are the spatial light modulator 210, the first microlens array 220, and the second microlens described in the first embodiment. Since the configuration and operation of the lens array 230 are identical to those of the lens array 230, description thereof is omitted.

The antireflective coating layers 510 and 520 improve light efficiency by minimizing the amount of light that is reflected when light is transmitted to allow most of the light to pass therethrough. The antireflective coating layers 510 and 520 are coated to a thickness that can obtain an optimal antireflective effect at a corresponding wavelength of the light source.

5 is a configuration diagram of an optical lithographic apparatus according to a third embodiment of the present invention.

In the optical lithography apparatus according to the third embodiment, the parallel light providing unit 100 and the substrate driving unit 300 are the same as the parallel light providing unit 100 and the substrate driving unit 300 described in the first embodiment, and the optical head ( 600 has a different structure.

The optical head 600 according to the third embodiment includes a spatial light modulator 210 and a spatial light modulator 210 disposed below the parallel light providing unit 100 at a predetermined distance from the parallel light providing unit 100. The first microlens array 610 and the spatial light modulator 210 are installed on the upper surface of the glass substrate 250 so as to separate parallel light into the partitioned area of the spatial light modulator 210 in a 1: 1 manner. The second microlens array 620 and a lower portion of the second microlens array 620 are installed on the lower surface of the glass substrate 260 to convert light passing through the spatial light modulator 210 back into parallel light. And a third microlens array 630 disposed to be disposed to focus parallel light passing through the second microlens array 620 to enable fine patterning. Here, the third micro array 630 is formed convex toward the downward direction because the focal length is short due to the size characteristics of the micro lens array.

Since the spatial light modulator 210 has the same configuration and operation as the spatial light modulator 210 described in the embodiment, a description thereof will be omitted.

Referring to the operation of the optical head according to the third embodiment, the parallel light provided from the parallel light providing unit 100 is partitioned into a plurality of beam bundles by the first microlens array 610 and all of the liquid crystal unit 240 The path of light is refracted to pass through each area, and is passed and blocked by a plurality of areas formed in the spatial light modulator 210. The light passing through the spatial light modulator 210 is converted back into parallel light by the second microlens array 620, and the parallel light is collected in the third microlens array 630 and irradiated to the substrate.

As described above, the optical head according to the third embodiment may improve light condensing performance of the optical head by repeating a process in which light is condensed into the collimated light and a plurality of regions.

Although described above with reference to preferred embodiments of the present invention, those skilled in the art or those skilled in the art without departing from the spirit and scope of the invention described in the claims to be described later Various modifications and variations can be made in the present invention without departing from the scope thereof.

1 is a block diagram of an optical lithographic apparatus according to the prior art.

2 is a block diagram of an optical lithographic apparatus according to a first embodiment of the present invention.

3A to 3E are process flowcharts showing an optical head manufacturing process used in the optical lithographic apparatus according to the first embodiment of the present invention.

4 is a schematic diagram of an optical lithographic apparatus according to a second embodiment of the present invention.

5 is a schematic diagram of an optical lithographic apparatus according to a third embodiment of the present invention.

Claims (10)

A parallel light providing unit for providing parallel light; An optical head for dividing the parallel light into a plurality of regions, controlling the light of each region to pass and block, and condensing the light passing through each region; It includes a substrate driver for driving the substrate to perform a patterning operation on the substrate by the light irradiated from the optical head, The optical head A spatial light modulator divided into a plurality of regions, each region being controlled to pass and block light; A first microlens array formed integrally with the upper surface of the spatial light modulator, the first microlens array separating the parallel light so as to be mapped to the respective regions, and refracting the path of the light; And a second microlens array formed integrally with the bottom surface of the spatial light modulator and condensing light passing through the respective regions. The method of claim 1, And the parallel light providing unit comprises a light source for generating a single wavelength and a collimator for converting light generated from the light source into parallel light. delete The method of claim 1, And the optical head further comprises an antireflective coating film disposed between at least one of the spatial light modulator and the first microlens array and between the spatial light modulator and the second microlens array. delete The method of claim 1, And the optical head further comprises a distance measuring sensor for measuring a distance between the optical head and the substrate to maintain a constant distance between the optical head and the substrate. The method of claim 1, And said substrate driver uses a PZT actuator. A manufacturing method for manufacturing an optical head for an optical lithographic apparatus according to claim 1, Applying a first polymer to a surface of the upper glass substrate of the spatial light modulator; Manufacturing a first microlens array by pressing and curing the first mold member having the lens pattern on the first polymer; Applying a second polymer to a surface of a lower glass substrate of the spatial light modulator; Manufacturing a second microlens array by pressing and curing the second mold member having the lens pattern on the second polymer; And separating the first mold member and the second mold member from the spatial light modulator. delete The method of claim 8, Wherein the first polymer and the second polymer are one of a photocurable polymer and a thermosetting polymer.
KR20080015649A 2007-02-22 2008-02-21 Optical lithography device and manufacturing method for optical head thereof KR100964285B1 (en)

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KR1020070017734 2007-02-22

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KR101391665B1 (en) * 2011-11-15 2014-05-27 주식회사 나래나노텍 Line Light Source and Light Source Module for Exposure Apparatus, and Exposure Apparatus and System for Forming Patterns Having the Same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6436265B1 (en) * 1999-03-29 2002-08-20 Canon Kabushiki Kaisha Microstructure array, and apparatus and method for forming the microstructure array, and a mold for fabricating a microstructure array
KR20050001086A (en) * 2003-06-27 2005-01-06 한재원 Two-dimensional light-modulating nano/micro aperture array and high-speed nano pattern recording system utilized with the array
JP2005277153A (en) * 2004-03-25 2005-10-06 Fuji Photo Film Co Ltd Image exposure apparatus

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IL164483A0 (en) * 2002-04-10 2005-12-18 Fujinon Corp Exposure head, exposure apparatus, and applicationthereof
KR100796582B1 (en) * 2003-12-26 2008-01-21 후지필름 가부시키가이샤 Exposure method and exposure device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6436265B1 (en) * 1999-03-29 2002-08-20 Canon Kabushiki Kaisha Microstructure array, and apparatus and method for forming the microstructure array, and a mold for fabricating a microstructure array
KR20050001086A (en) * 2003-06-27 2005-01-06 한재원 Two-dimensional light-modulating nano/micro aperture array and high-speed nano pattern recording system utilized with the array
JP2005277153A (en) * 2004-03-25 2005-10-06 Fuji Photo Film Co Ltd Image exposure apparatus

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