KR100954302B1 - Cryopanel and cryopump using the cryopanel - Google Patents

Abstract

[PROBLEMS] To provide a cryopanel having improved exhaust speed and solidification and adsorption efficiency and a cryopump using the same.

[Solution] The cryopanel 10 includes a disk-shaped panel 10A and eight plate-shaped panels 10B. The disk-shaped panel 10A is supported by the second stage freezing stage 8B of the refrigerator 3. Each plate-shaped panel 10B is attached to the outer peripheral part of 10 A of disk-shaped panels at equal angle intervals, and is extended to the upstream and downstream of 10 A of disk-shaped panels in the inflow direction of gas. In addition, it is mounted so as to extend outward from the outer periphery (the radial position of) of the disk-shaped panel 10A. Here, each plate-shaped panel 10B is spaced apart from each other in the center part in the radial direction of the disk-shaped panel 10A.

Cryopanel, cryopump, disc panel, plate panel, refrigeration stage

Description

Cryopanel and cryopump using the cryopanel}

The present invention relates to a cryopanel used for a cryopump and a cryopump using the same.

In a semiconductor manufacturing apparatus, a cryopump is used to realize high vacuum. The cryopump cools the cryopanel in the vacuum vessel and solidifies or adsorbs the molecules to realize high vacuum.

The conventional cryopanel is connected to a stage of a cooler and has a disk-shaped panel whose surface is installed in the gas inflow direction (horizontally), and downstream of the disk-shaped panel and downstream of the gas inflow direction. A plurality of elongate plate-shaped panels extending in the direction of the cross section are provided.

The gas in the processing chamber flows in from the upper opening of the vacuum chamber, and water molecules solidify in a louver installed above the cryopanel, and argon or nitrogen other than the water molecules is mainly a disc. Hydrogen, helium, and the like, which are solidified in the panel and do not freeze at cryogenic temperatures, are adsorbed by an adsorption layer formed on both sides of the elongated panel panel (see, for example, Patent Document 1).

In addition, in order to further improve the adsorption performance, a cryopump with black chromium plating on the inner surface of the shield for protecting the cryopanel from radiant heat and the lower surface of the louver mounted on the upper portion of the shield has been proposed (for example, , Patent Document 2).

[Patent Document 1] Japanese Patent Application Laid-Open No. 02-308985

[Patent Document 2] Japanese Patent Application Laid-Open No. 05-172054

However, in order to improve the hydrogen exhaust rate, which is the main performance of the cryopump, the probability of hydrogen molecules adsorbed to the adsorption layer must be improved.

However, in the conventional cryopanel as described in Patent Literature 1, the elongated plate-shaped panel in which the adsorption layer is formed is provided only on the back side of the disc-shaped panel (downstream side of the disc-shaped panel in the gas inflow direction). Moreover, in the case of planar view, since the area ratio which the disk-shaped panel occupies in a vacuum container is large, the exhaust velocity was limited by the structure. Moreover, the elongate plate-shaped panel had low coagulation | solidification and adsorption efficiency especially on the immediately back surface used as the shade of a disc shaped panel.

Moreover, also in the cryopump of patent document 2, the structure of a cryopanel itself is the same as that of patent document 1, and the elongate plate shape panel in which an adsorption layer is formed is the back surface side of a disk-shaped panel (in the gas inflow direction). Since it is provided only on the downstream side of the disk-shaped panel), the exhaust velocity is limited in structure, and on the immediately back side of the disk of the disk-shaped panel, there is a problem that the solidification and adsorption efficiency is lowered.

Then, an object of this invention is to provide the cryopanel which improved the exhaust speed, coagulation | suction and adsorption efficiency, and the cryopump using the same.

According to one aspect of the present invention, a cryopanel includes a vacuum container having a gas inlet, a stage installed in the vacuum container, and a refrigerator for cooling the stage, and is introduced into the vacuum container from the gas inlet. A cryopanel for use in a cryopump for solidifying or adsorbing molecules, the cryopanel being supported by the stage and cooled, and supported by the first panel and having one side facing the opening face of the gas inlet; And a second panel extending in an upstream direction of the first panel in a gas inflow direction and having an adsorbent layer provided on at least one side thereof.

The first panel is a disk-shaped panel, and the second panel is disposed radially at equal angle intervals in an outer circumferential direction of the first panel-shaped panel. The panel may be a plurality of thin plate-shaped panels having a surface.

The outer edge of the second panel may be outside the outer edge of the first panel in the radial direction of the disc-shaped first panel.

The second panels may be spaced apart from each other at the center portion in the radial direction of the disk-shaped first panel.

The second panel may also be stretched in the downstream direction of the first panel in the gas inflow direction.

In addition, the width of the second panel may be narrower as it moves away from the support portion supported by the first panel.

Moreover, the said 1st panel may have a hole part which penetrates this 1st panel in the thickness direction.

The cryopanel may be used for a cryopump for an ion implantation apparatus.

The cryopump according to one aspect of the present invention includes the cryopanel according to any one of the above, and an opening, the cryopanel is accommodated therein, and the opening is directed to the gas inlet of the vacuum container. And a louver attached to the opening of the shield, the shield being connected to the cryopanel to protect the cryopanel from the radiant heat of the vacuum vessel, and having a black treatment on the downstream side of the louver in the gas inflow direction. Is carried out.

ADVANTAGE OF THE INVENTION According to this invention, the peculiar effect that the cryopanel which improved the exhaust velocity, coagulation | suction and adsorption efficiency, and the cryopump using the same can be provided is obtained.

Hereinafter, an embodiment to which the cryopanel of the present invention and a cryopump using the same are applied will be described.

Fig. 1 is a diagram showing the structure of a cryopump in which the cryopanel of this embodiment is used. The cryopump 1 includes a vacuum vessel 2, a freezer 3, a shield 4, and a cryopanel 10.

The vacuum chamber 2 is connected to a process chamber (not shown) of a semiconductor manufacturing apparatus, such as a sputter apparatus and an ion implantation apparatus, via 2 A of upper openings, for example. Inside the vacuum vessel 2, the cylinders (6 and 7), the shield 4, and the cryopanel 10 of the refrigerator 3 are provided.

Here, the vacuum pump 2 is connected with a roughing pump and a pipe for introducing purge gas (both not shown), and a gate valve is connected between the vacuum container 2 and the process chamber. (Not shown) is installed.

The compressor 5 is connected to the refrigerator 3.

The compressor 5 pressurizes refrigerant gas, such as helium gas, and sends it to the refrigerator 3, and recovers the refrigerant gas thermally expanded by the refrigerator 3, and presses it again.

The freezer 3 is a two-stage GM (Gifford-McMahon) type freezer and includes a first stage cylinder 6, a second stage cylinder 7, and a motor (not shown). In the first stage cylinder 6 and the second stage cylinder 7, a first stage displacer 6A and a second stage displacer 7A, which are connected to each other, are respectively incorporated. By reciprocating in the left-right direction, cold weather by adiabatic expansion is produced.

The first stage freezing stage 8A is soldered to the outer circumference of the first stage cylinder 6. The shield 4 is supported by this first stage freezing stage 8A.

The shield 4 is a cup-shaped copper or aluminum member for protecting the cryopanel 10 from the radiant heat of the vacuum vessel 2, and a nickel plating treatment is performed on the outer surface thereof. Black chromium plating is performed on the inner surface. Nickel plating is suitable for reflecting radiant heat from the vacuum vessel on the outside of the shield 4, and inside, it is necessary to absorb heat in order to prevent thermal intrusion into the cryopanel 10. Because there is.

The louver 9 is provided in the upper opening of the shield 4. This louver 9 is a round ring-shaped louver piece made of copper arranged in a concentric circle shape, and a nickel plating treatment is performed on the surface thereof. The louver 9 is provided close to the upper opening 2A of the vacuum container 2 and is supported by a stay 9A that extends over the inside of the shield 4. The shield 4 and the louver 9 are cooled to 30-100K by the 1st stage freezing stage 8A.

The second stage freezing stage 8B is soldered to the outer circumference of the second stage cylinder 7. The cryopanel 10 is supported by this second stage freezing stage 8B and cooled to 4 to 20K.

Here, it is assumed that water molecules, argon, nitrogen, hydrogen, neon, and helium are present in the process chamber. When the shield 4 and the louver 9 are cooled to 30 to 100K and the cryopanel 10 is cooled to 4 to 20K, water molecules mainly solidify in the shield 4 and the louver 9, Argon and nitrogen other than water molecules are mainly solidified in the cryopanel 10. In addition, hydrogen, neon, helium and the like are mainly adsorbed to an active layer (layered activated carbon, hereinafter identical) formed on the surface of the cryopanel 10. As a result, the process chamber is evacuated and maintained at high vacuum.

Here, the gas in the process chamber flows into the vacuum vessel 2 through the upper opening 2A. Here, the inflow direction of the gas is a direction downward from the upper opening 2A of the vacuum vessel, which is common in all the drawings.

2 is a diagram showing the configuration of the cryopanel according to the present embodiment, where (a) is a front view and (b) is a plan view. In FIG. 2A, the louver 9 (see FIG. 1) is provided above the cryopanel 10, and the bottom of the shield 4 (FIG. 1) is located below.

As shown to Fig.2 (a) and (b), the cryopanel 10 includes 10 A of disk-shaped panels, and eight plate-shaped panels 10B. The disk-shaped panel 10A is supported by the second stage freezing stage 8B. Each plate-shaped panel 10B is attached to the outer peripheral part of 10 A of disk-shaped panels at equal angle intervals, and is extended to the upstream and downstream side of 10 A of disk-shaped panels in the inflow direction of gas, and is disk-shaped It is attached so that it may extend to outer side rather than the outer periphery (radial position of) of panel 10A. Here, each plate-shaped panel 10B is spaced apart from each other in the center part in the radial direction of the disk-shaped panel 10A, and the length of the upstream direction of the plate-shaped panel 10B, and the length of a downstream direction are The same is set.

The disk-shaped panel 10A and the eight plate-shaped panels 10B are all made of copper and are plated. In addition, active layers (not shown) for adsorbing hydrogen, neon, helium, and the like are adhered to both surfaces of each plate-shaped panel 10B. Here, the disk-shaped panel 10A and the plate-shaped panel 10B may be joined by soldering, screwing, or the like, or may be molded in one piece.

In this way, the cryopanel 10 of the present embodiment is stretched to the upstream side and the downstream side of the disc-shaped panel 10A in the inflow direction of the gas, and the radial position of the outer periphery of the disc-shaped panel 10A. ) Has a plate-shaped panel 10B extending to the outside. For this reason, compared with the cryopanel which has a plate-shaped panel only downstream of a disk-shaped panel like the conventional one, sufficient surface area can be ensured.

Thereby, exhaust speed can be improved. In particular, since the surface area of the plate-shaped panel 10B in which the active layer is formed increases, the adsorption rate of hydrogen, neon, helium, or the like, which does not solidify even when cooled, can be improved.

In addition, since the plate-shaped panel 10B on which the active layer is formed also exists on the upstream side of the disc-shaped panel 10A, the solidification and adsorption efficiency that has been reduced by becoming negative on the downstream side of the disc-shaped panel as in the past can be improved. .

In addition, when the plate-shaped panel 10B has the same length from the disk-shaped panel 10A to the upstream side and the downstream side in the inflow direction of gas, it cools by the 2nd stage freezing stage 8B (refer FIG. 1). In this case, the temperature distribution in the upstream and downstream directions can be suppressed, so that hydrogen, neon, helium and the like that cannot be solidified can be adsorbed evenly.

Moreover, since the plate-shaped panel 10B extends outward from the outer periphery (the radial position of) of the disk-shaped panel 10A, a sufficient flow path can be secured along the gas inflow direction. Thereby, the cryopanel 10 which aimed at the improvement of exhaust speed can be provided.

Moreover, since each plate-shaped panel 10B is spaced apart from each other in the center part in the radial direction of the disk-shaped panel 10A, sufficient flow path can be ensured in the center part of each plate-shaped panel 10B. .

In addition, on the upstream side and the downstream side of 10 A of disk-shaped panels, you may form the active layer from which the adsorption rate differs in plate-shaped panel 10B. Since the ratio of hydrogen, neon, helium, etc. adsorbed to the active layer is higher on the upstream side than on the downstream side, hydrogen can be adsorbed more efficiently by setting the adsorption rate of the active layer on the upstream side than on the downstream side.

Here, since the plate-shaped panel 10B is also cooled to 4-20K, the plate-shaped panel 10B is extended to the upstream side and the downstream side of the disc-shaped panel 10A, and the surface area is enlarged, so that only hydrogen, neon, helium, and the like are expanded. In addition, the coagulation rate of argon or nitrogen is also improved. For this reason, even if the diameter of the disk shaped panel 10A is made small, the coagulation rate of argon and nitrogen can be kept higher than the conventional cryopanel. Thus, when the diameter of 10 A of disk-shaped panels can be miniaturized, the inflow efficiency of the gas from an upstream side to a downstream side can be improved.

1 shows a so-called horizontal cryopump in which the first stage freezing stage 8A and the second stage freezing stage 8B of the refrigerator 3 are inserted from the transverse direction of the vacuum vessel 2. In such a horizontal cryopump, it is necessary to stretch some of the plate-shaped panels 10B only upstream of the plurality of plate-shaped panels 10B to avoid the second stage freezing stage 8B. There is a case. In such a case, what is necessary is just to change suitably the length of the plate-shaped panel 10B in the cryopanel 10 of a present Example. However, the cryopanel 10 of the present embodiment can also be used for a so-called vertical cryopump in which the stage of the refrigerator 3 is inserted from the upward or downward direction of the vacuum vessel.

`` Modification 1 ''

3 is a view showing a cryopanel of Modification Example 1 of the present embodiment, (a) is a front view, and (b) is a plan view.

Unlike the cryopanel 10 shown in FIG. 2, the cryopanel 20 has an outer circumference of the disc-shaped panel 20A in the radial direction of the plate-shaped panel 20B. It is set to the same position as the radial position). The diameter of the disk-shaped panel 20A is the same as that of the disk-shaped panel 10A shown in FIG. 2, and the plate-shaped panel 20B is located upstream from the disk-shaped panel 20A in the gas inflow direction. It has the same length on the downstream side.

Such a cryopanel 20 can also improve the exhaust speed, and in particular, since the surface area of the plate-shaped panel 20B on which the active layer is formed increases, hydrogen, neon, and helium that does not solidify even when cooled. Adsorption rate, etc. can be improved.

In addition, since the plate-shaped panel 20B on which the active layer is formed also exists on the upstream side of the disc-shaped panel 20A, the solidification and adsorption efficiency that has been lowered by becoming negative on the downstream side of the disc-shaped panel as in the prior art can be improved. .

`` Modification 2 ''

4 is a diagram showing a cryopanel according to a modification 2 of the present embodiment, in which (a) is a front view and (b) is a plan view.

Unlike the cryopanel 10 shown in FIG. 2, the cryopanel 30 has a radial end portion of the plate-shaped panel 30B having an outer circumference (a radial position of the disc-shaped panel 30A). It is set to the same position as. In addition, each plate-shaped panel 30B is joined by the center of radial direction.

The diameter of the disk-shaped panel 30A is the same as that of the disk-shaped panel 10A shown in FIG. 2, and the plate-shaped panel 30B is upstream from the disk-shaped panel 30A in the gas inflow direction. It is extended only to the side.

Even in such a cryopanel 30, the plate-shaped panel 30B in which the active layer is formed exists on the upstream side of the disc-shaped panel 30A, whereby the sheet becomes negative on the downstream side of the disc-shaped panel as in the prior art. The solidification and adsorption efficiency which was performed can be improved.

Moreover, although each plate-shaped panel 30B is provided only in the upstream side of 30 A of disk-shaped panels, it is joined at the center of a radial direction, and since the area which an active layer is formed by this increases, solidification and adsorption efficiency are improved. It can be improved.

`` Modification 3 ''

5 is a diagram showing a cryopanel according to a modification 3 of the present embodiment, in which (a) is a front view and (b) is a plan view.

Unlike the plate-shaped panel 30B of the cryopanel 30, the plate-shaped panel 40B of the cryopanel 40 is not provided near the center in the radial direction. The cryopanel 40 is produced by joining two which joined the eight plate-shaped panels 40B to one surface of the disk-shaped panel 40A. As a result, the cryopanel 40 having a shape substantially the same as the cryopanel 20 shown in FIG. 3 is obtained.

Such a cryopanel 40 can also improve the exhaust speed, and in particular, since the surface area of the plate-shaped panel 40B in which the active layer is formed increases, hydrogen, neon, and helium that does not solidify even when cooled. Adsorption rate, etc. can be improved.

In addition, since the plate-shaped panel 40B on which the active layer is formed also exists on the upstream side of the disc-shaped panel 40A, the solidification and adsorption efficiency that has been lowered by becoming negative on the downstream side of the disc-shaped panel as in the prior art can be improved. .

In addition, since the cryopanel 30 shown in FIG. 4 has the same shape as the two joined parts, it can be easily produced.

`` Modification 4 ''

FIG. 6: is a figure which shows the cryopanel of the modification 4 of this Example, (a) is a front view, (b) is a top view.

Unlike the cryopanel 10 shown in FIG. 2, the cryopanel 50 has a plate-like panel 50B located upstream and downstream of the disc-shaped panel 50A in the gas inflow direction. As it moves toward the tip side, the width in the radial direction is narrowed. Other than that is the same as the cryopanel 10 shown in FIG.

In such a cryopanel 50, the exhaust speed can be improved (particularly, the adsorption rate of hydrogen, neon, helium, etc.) can be improved, and it is far from the support portion supported by the disc-shaped panel 50A. By narrowing the width of the plate-shaped panel 50B, the temperature distribution of the plate-shaped panel 50B from the upstream side to the downstream side can be further improved.

`` Modification 5 ''

FIG. 7: is a figure which shows the cryopanel of the modification 5 of this Example, (a) is a front view, (b) is a top view.

Unlike the cryopanel 20 shown in FIG. 3, the cryopanel 60 is a plate-like panel 60B in the gas inflow direction upstream and downstream of the disc-shaped panel 60A. As it moves toward the tip side, the width in the radial direction is narrowed. Other than that is the same as the cryopanel 20 shown in FIG.

In such a cryopanel 60, the exhaust speed can be improved (particularly, the adsorption rate of hydrogen, neon, helium, etc.) can be improved, and the plate-shaped panel is moved away from the disk-shaped panel 60A. By narrowing the width in the radial direction of 60B, it is possible to further improve the temperature distribution of the plate-shaped panel 60B from the upstream side to the downstream side.

`` Modification 6 ''

Fig. 8 is a diagram showing a cryopanel of Modification Example 6 of the present embodiment, wherein (a) is a front view and (b) is a plan view.

Unlike the cryopanel 20 shown in FIG. 3, the cryopanel 70 has a hole 70C penetrating in the thickness direction. Other than that is the same as the cryopanel 20 shown in FIG.

In the cryopanel 70 as described above, similar to the cryopanel 20 shown in FIG. 3, the exhaust speed can be improved (particularly, the adsorption rate of hydrogen, neon, helium, etc.) can be improved. By the hole portion 70C formed in the shape panel 70A, a sufficient flow path can be ensured than the cryopanel 20 shown in FIG. 3 along the gas inflow direction.

Moreover, by this hole part 70C, the solidification and adsorption efficiency which declined by making it a sound paper on the downstream side of a disk-shaped panel like conventionally can be improved.

9 is a front view showing a modification of the plate-shaped panel included in the cryopanel of the present embodiment. The cryopanel according to the present embodiment can arbitrarily combine any of the inverted trapezoidal shape shown in FIG. 9 (a), the rectangular shape shown in the same drawing (b), or the trapezoidal shape shown in the drawing (c). have. For example, while the inverted trapezoidal panel 80B shown in FIG. 9 (a) is provided upstream of the disk-shaped panel, the rectangular plate-shaped panel 80B shown in FIG. You may provide in the downstream of a shaped panel.

`` Modification 7 ''

Hereinafter, as a modified example 7 of the present embodiment, a cryopump using the cryopanel 20 of the modified example 1 will be described. The cryopump of this modified example 7 is a cryopump using the cryopanel 20 of the modified example 1 on the surface (downstream surface in the gas inflow direction) of the back surface of the louver 9. Black treatment was performed.

10 and 11 are a plan view and a perspective view of a cryopump according to a modification example 7 of the present embodiment. As shown in these figures, the shield 4 is provided concentrically at regular intervals from the inner surface 2a of the vacuum container 2, and the louver 9 is the inner surface 4a of the shield 4; It is mounted on the stay 9A screwed to (). There are two stays 9A, and they are provided so as to be orthogonal to each other in a plan view. Although the louver 9 is provided also in the lower side (downstream side) of the stay 9A in FIG. 1, in this modified example 7, the louver 9 is provided only in the upper side (upstream side) of the stay 9A. It is.

The louver 9 is subjected to nickel plating on the surface on the surface side (upstream side in the gas inflow direction), and on the surface on the back surface by fluororesin-based black spray mainly composed of graphite, which is ultrafine particles. Painting process is performed. Here, similarly to the stay 9A, the surface on the surface side (upstream side in the gas inflow direction) is subjected to nickel plating, and the surface on the back side (downstream side in the gas inflow direction). ) Is preferably black.

Here, as mentioned above, the nickel plating process is given to the outer surface of the shield 4, and the black chromium plating process is given to the inner surface.

12 is a characteristic diagram showing the cooling performance of the cryopump according to the seventh modification example of the present embodiment, the horizontal axis represents radiant heat (W), and the vertical axis represents temperature (K) of the cryopanel 20. In this characteristic diagram, the cryopump in which black painting is given to the back side of the louver 9 and the cryopump in which black painting is not applied to the back side of the louver 9 are shown in comparison. However, in obtaining this characteristic, the heater was installed above the louver 9, and the output of this heater was measured as energy of radiant heat.

As shown in FIG. 12, when the radiant heat is 0 (W), the temperature of the cryopanel 20 in the cryopump which is not coated with black on the rear surface side of the louver 9 is about 12 (K). However, it rises with the increase of the energy of radiant heat, and it exceeds 14 (K) when radiant heat is about 13 (W), and it rises to about 15 (K) when radiant heat reaches 30 (W).

On the other hand, the temperature of the cryopanel 20 in the cryopump in which black painting is applied to the rear surface side of the louver 9 is about 11.5 (K) when the radiant heat is 0 (W). When it is 8 (W), it becomes 12 (K), and even if radiant heat rises to 30 (W), it only rises to about 13 (K), and is provided with the louver 9 which is not coated black. The temperature rise is suppressed more than the cryopump.

The reason why the cooling characteristics of the cryopanel 20 is improved is considered as follows. Since the louver 9 needs to protect the cryopanel 20 from the radiant heat in the vacuum vessel 2 and guide the gas to the cryopanel 20, the louver 9 is shown in FIG. As shown, although the cryopanel 20 is covered, as shown in FIG. 11 at an angle, the cryopanel 20 is not completely covered. For this reason, the transfer of radiant heat to the cryopanel 20 cannot be completely blocked.

By applying black coating on the rear surface of the louver 9, the radiant heat passing through the louver 9 is absorbed by the black coating portion on the rear side of the louver 9, and thus, is transmitted to the cryopanel 20. The radiant heat is reduced. It is thought that the cooling characteristic of the cryopanel 20 was improved by this.

Thus, according to the cryopump of the modification 7, the temperature of the cryopanel 20 can be suppressed to 14 (K) or less, so that the adsorption rate of hydrogen, neon, helium, etc., which does not solidify even when cooled, is improved. You can. In particular, in the region where radiation is weak (about 8 (W) or less), since the cryopanel 20 can be cooled to 12 (K) or less, extremely good adsorption performance can be obtained.

As described above, according to the cryopump of the modification 7 of the present embodiment, the cryopanel 20 having the plate-like panel 20B extending upstream and downstream of the disc-shaped panel 20A in the gas inflow direction. By using), as compared with the cryopanel having the plate-shaped panel only on the downstream side of the disc-shaped panel as in the related art, while ensuring sufficient surface area, in addition, by performing black treatment on the surface of the rear surface side of the louver 9 In addition, the exhaust speed can be further improved. Thereby, the cooling temperature of the cryopanel 20 can be further reduced, and the cryopump which further improved the adsorption amount can be provided.

However, in the above, as a black process performed on the louver 9 (and the stay 9A), the form which performs coating process by the black spray of the fluorine resin system which has graphite as a main component as an ultrafine particle was demonstrated, but other than a fluororesin system. Paint may be applied or black chromium plating may be performed.

In addition, as shown in FIG. 1, when the louver 9 is also provided in the lower side (downstream side) of the stay 9A, the upper side (upstream side) of the louver 9 provided below the stay 9A. Nickel plating may be applied to the surface, and black chromium plating may be performed on the lower (downstream) surface.

In addition, although the form which performs black chrome-plating process on the inner surface of the shield 4 was demonstrated above, you may apply black painting similarly to the back surface of the louver 9. As shown in FIG.

In the above, the cryopanel and the cryopump using the same according to the exemplary embodiment of the present invention have been described, but the present invention is not limited to the specifically disclosed embodiment, and various modifications without departing from the scope of the claims You can change it.

Fig. 1 is a diagram showing the structure of a cryopump in which the cryopanel of this embodiment is used.

2 is a diagram showing the configuration of the cryopanel according to the present embodiment, where (a) is a front view and (b) is a plan view.

3 is a view showing a cryopanel of Modification Example 1 of the present embodiment, (a) is a front view, and (b) is a plan view.

4 is a diagram showing a cryopanel according to a modification 2 of the present embodiment, in which (a) is a front view and (b) is a plan view.

5 is a diagram showing a cryopanel according to a modification 3 of the present embodiment, in which (a) is a front view and (b) is a plan view.

FIG. 6: is a figure which shows the cryopanel of the modification 4 of this Example, (a) is a front view, (b) is a top view.

FIG. 7: is a figure which shows the cryopanel of the modification 5 of this Example, (a) is a front view, (b) is a top view.

Fig. 8 is a diagram showing a cryopanel of Modification Example 6 of the present embodiment, wherein (a) is a front view and (b) is a plan view.

9 is a front view showing a modification of the plate-shaped panel included in the cryopanel of the present embodiment.

10 is a plan view showing a cryopump according to a modification example 7 of the present embodiment.

11 is a perspective view showing a cryopump according to a modification example 7 of the present embodiment.

12 is a characteristic diagram showing the cooling performance of the cryopump according to the seventh modification example of the present embodiment.

* Description of the sign *

1: cryopump

2: vacuum container

2a: inside

3: freezer

4 shield

4a: inside

5: compressor

6: first stage cylinder

6A: first stage displacer

7: second stage cylinder

7A: 2nd stage displayer

8A: 1st stage freezing stage

8B: 2nd stage freezing stage

9 louver

9A: Stay

10, 20, 30, 40, 50, 60, 70: cryopanel

Disc shaped panel: 10A, 20A, 30A, 40A, 50A, 60A, 70A

10B, 20B, 30B, 40B, 50B, 60B, 70B, 80B: plate-shaped panel

70C: hole

Claims (9)

A cryopump having a vacuum container having a gas inlet and a stage provided in the vacuum container, and having a freezer for cooling the stage, for solidifying or adsorbing molecules introduced into the vacuum container from the gas inlet. As a cryopanel to use for A first panel supported and cooled by the stage, the one side of which is disposed toward an opening surface of the gas inlet; And a second panel supported by the first panel, extended in an upstream direction of the first panel in a gas inflow direction, and having an adsorbent layer disposed on at least one surface thereof. The method according to claim 1, The said 1st panel is a disk-shaped panel, The said 2nd panel is a surface arrange | positioned radially at equal angle intervals in the circumferential direction of the said disk-shaped 1st panel. The cryopanel which is a panel of a plurality of plate-shaped thing to have. The method according to claim 2, The outer edge of the second panel is a cryopanel located outside the outer edge of the first panel in the radial direction of the disc-shaped first panel. The method according to claim 2 or 3, The second panel is spaced apart from each other at a central portion in the radial direction of the disk-shaped first panel. The method according to any one of claims 1 to 3, The second panel is stretched also in the downstream direction of the first panel in the gas inflow direction. The method according to any one of claims 1 to 3, The second panel is a cryopanel narrower as it moves away from the support portion supported by the first panel. The method according to any one of claims 1 to 3, The first panel has a hole portion penetrating the first panel in the thickness direction. The method according to any one of claims 1 to 3, A cryopanel used for cryopumps for ion implantation devices. The cryopanel according to any one of claims 1 to 3, A shield having an opening and receiving the cryopanel therein and connected to the refrigerator so that the opening is directed to the gas inlet of the vacuum vessel, the shield protecting the cryopanel from the radiant heat of the vacuum vessel; A louver mounted to the opening of the shield, A cryopump is subjected to black treatment on the surface on the downstream side of the louver in the gas inflow direction.

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