KR100939656B1 - Novel intermediate compounds for efficient synthesis of valsartan - Google Patents

Novel intermediate compounds for efficient synthesis of valsartan Download PDF

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KR100939656B1
KR100939656B1 KR1020090029248A KR20090029248A KR100939656B1 KR 100939656 B1 KR100939656 B1 KR 100939656B1 KR 1020090029248 A KR1020090029248 A KR 1020090029248A KR 20090029248 A KR20090029248 A KR 20090029248A KR 100939656 B1 KR100939656 B1 KR 100939656B1
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biphenyl
valsartan
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조동옥
권윤자
김승기
김보라
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주식회사 메디켐코리아
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    • C07D257/00Heterocyclic compounds containing rings having four nitrogen atoms as the only ring hetero atoms
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Abstract

PURPOSE: A novel intermediate compound for preparing valsartan and method for preparing valsartan using the same are provided to improve safety and shorten reaction time. CONSTITUTION: A method for preparing valsartan of chemical formula 1 comprises: a step of reacting 4-toluene-2'-(tetrazole-5-yl)-benzene of chemical formula 2 and ethylvinylether under the presence of acid to prepare 4-bromomethyl-2'-(1-diethylether-tetrazole-5-yl)-biphenyl; and a step of binding L-valinemethylester hydrochloride of chemical formula 4 with 4-bromomethyl-2'-(1-diethylether-tetrazole-5-yl)-biphenyl of chemical formula 3 to obtain (S)-3-methyl-2-(2'-(1-diethylether-tetrazole-5-yl)-biphenyl-4-yl-methyl)-butylic acid methyl ester of chemical formula 5; a step of performing N-alkylation of a compound of chemical formula 5 with valeryl chloride of chemical formula 6 to obtain (S)-3-methyl-2'-[N-pentanoyl-(1-diethylether-tetrazole-5-yl)-biphenyl-4-yl-methyl]-amino butylic acid methyl ester; and a step of hydrolyzing the compound of chemical formula 7.

Description

발사르탄 제조용 신규 중간체 화합물{Novel intermediate compounds for efficient synthesis of valsartan}Novel intermediate compounds for efficient synthesis of valsartan

본 발명은 발사르탄 제조용 신규 중간체 화합물에 관한 것이다.The present invention relates to novel intermediate compounds for the preparation of valsartan.

발사르탄(Valsartan)은 하기 화학식 1로 표시되는 화학구조를 갖고 있으며, 그 화합물명은 (S)-3-메틸-2-[펜타노일-[2'-(1H-테트라졸-5-일)-바이페닐-4-일-메틸)-아미노]-부티르산]이다.Valsartan has a chemical structure represented by the following Formula 1, and the compound name is (S) -3-methyl-2- [pentanoyl- [2 '-( 1H -tetrazol-5-yl)- Biphenyl-4-yl-methyl) -amino] -butyric acid].

Figure 112009020459058-pat00001
Figure 112009020459058-pat00001

발사르탄(Valsartan)은 안지오텐신 Ⅱ 전환효소 (ACE; Angiotension II converting Enzyme)에 대한 길항 작용을 나타내는 우수한 약효를 가지는 경구용 고 혈압 치료제로 알려져 있고, 현재 디오반(Diovan)이라는 상품명으로 판매되고 있다.Valsartan is known as an oral antihypertensive agent having an excellent antagonistic effect on Angiotension II converting Enzyme (ACE) and is currently sold under the trade name Diovan.

발사르탄의 제조방법은 대한민국 특허등록 제0171409호, 대한민국 공개특허 제2005-57529호, 대한민국 공개특허 제2006-85073호, 대한민국 공개특허 제 2006-149079호, 미국 공개특허 2005-131038호, 미국공개특허 제2006-149079호 등에 개시되어있다.The manufacturing method of valsartan is Republic of Korea Patent Registration No. 0171409, Republic of Korea Patent No. 2005-57529, Republic of Korea Patent No. 2006-85073, Republic of Korea Patent No. 2006-149079, United States Patent Publication 2005-131038, United States Patent Publication No. 2006-149079 and the like.

하기 반응식 1은 발사르탄의 제조방법을 최초로 소개한 대한민국 특허등록 제0171409호의 실시예 1과 16에 개시된 제조방법이다.Reaction Scheme 1 below is a manufacturing method disclosed in Examples 1 and 16 of Korean Patent Registration No. 0171409, which first introduced a manufacturing method of valsartan.

Figure 112009020459058-pat00002
Figure 112009020459058-pat00002

상기 반응식 1에 따른 제조방법은, 4-브로모메틸-2'-시아노-바이페닐(I)을 출발물질로 사용한 6단계의 반응공정을 수행하여 발사르탄을 제조하고 있다. 각 반응공정별로 구체적으로 설명하면 다음과 같다.In the production method according to Scheme 1, valsartan is prepared by performing a six-step reaction process using 4-bromomethyl-2'-cyano-biphenyl (I) as a starting material. The detailed description for each reaction process is as follows.

제 1단계 공정에서는, 4-브로모메틸-2'-시아노-바이페닐(Ⅰ)과 아세트산을 반응시켜 아세톡시메틸 화합물(Ⅱ)을 합성하였다. In the first step, 4-bromomethyl-2'-cyano-biphenyl (I) and acetic acid were reacted to synthesize acetoxymethyl compound (II).

제 2단계 공정에서는, 소듐하이드록사이드를 이용하여 아세톡시메틸 화합물(Ⅱ)을 가수분해 반응시켜 하이드록시메틸 화합물(Ⅲ)을 합성하였다.In the second step, hydroxymethyl compound (III) was synthesized by hydrolyzing acetoxymethyl compound (II) using sodium hydroxide.

제 3단계 공정에서는, DMSO 용매 속에서 옥살릴 클로라이드를 이용한 스원산화반응(swern oxidation)에 의해 하이드록시메틸기를 알데하이드로 변환하여 바이페닐알데하이드 화합물(Ⅳ)을 합성하였다. In the third step, biphenylaldehyde compound (IV) was synthesized by converting a hydroxymethyl group to an aldehyde by a swine oxidation using oxalyl chloride in a DMSO solvent.

제 4단계 공정에서는, 바이페닐알데하이드 화합물(Ⅳ)과 발린메틸에스테르 화합물(Ⅴ)을 수분에 민감한 소듐시아노보로하이드라이드(NaBH3CN)의 환원제를 이용하여 반응시켜 N-(바이페닐메틸)발린 화합물(Ⅵ)을 합성하였다. In the fourth step, the biphenylaldehyde compound (IV) and valinemethyl ester compound (V) are reacted with a reducing agent of sodium cyanoborohydride (NaBH 3 CN), which is sensitive to moisture, to react with N- (biphenylmethyl). Valine compound (VI) was synthesized.

제 5단계 공정에서는, N-(바이페닐메틸)발린 화합물(Ⅵ)을 발레릴 클로라이드 화합물(Ⅶ)으로 N-알킬화 반응시켜 메틸 N-발레일-N-[(2'-시아노바이페닐-4-일)메틸]-L-발린에스테르 화합물(Ⅷ)을 합성하였다. In the fifth step, N- (biphenylmethyl) valine compound (VI) is subjected to N- alkylation with valeryl chloride compound (VII) to give methyl N -valylyl- N -[(2'-cyanobiphenyl-4 -Yl) methyl] -L-valine ester compound (i) was synthesized.

제 6단계 공정에서는, 메틸 N-발레일-N-[(2'-시아노바이페닐-4-일)메틸]-L-발린에스테르 화합물(Ⅷ)을 트리부틸틴 아자이드(Bu3SnN3)와 반응시켜 시아노기를 테트라졸기로 전환시킴으로써 발사르탄(1)을 합성하였다.In the sixth step, methyl N -valyl- N -[(2'-cyanobiphenyl-4-yl) methyl] -L-valine ester compound (VIII) is substituted with tributyltin azide (Bu 3 SnN 3 ). Valsartan (1) was synthesized by reacting with to convert cyano group to tetrazole group.

그러나, 상기 반응식 1에 따른 종래방법에서는 제 3단계 공정으로서 하이드록시메틸 화합물(Ⅲ)의 하이드록시메틸기를 알데하이드로 변환하기 위하여 스원 산화반응(swern oxidation)을 수행하고 있다. 스원 산화반응은 철저한 무수 조건 과 극저온(-78℃) 조건하에서 수행되므로, 산업적으로 이용하기에는 한계가 있다. However, in the conventional method according to Scheme 1, a swine oxidation is performed to convert the hydroxymethyl group of the hydroxymethyl compound (III) to aldehyde as a third step. Since the one-way oxidation reaction is performed under thorough anhydrous conditions and cryogenic (-78 ° C) conditions, there is a limit to industrial use.

또한, 상기 반응식 1에 따른 종래방법에서는 제 4단계 공정으로서 바이페닐알데하이드 화합물(Ⅳ)을 환원성 아미노화 반응(Reductive amination)을 위하여 환원제로서 소듐시아노보로하이드라이드(NaBH3CN)을 사용하고 있다. 소듐시아노보로하이드라이드(NaBH3CN)는 매우 고가의 환원제 시약으로 산업적 대량생산에서는 경제성이 낮은 시약일 뿐만 아니라, 수분에 매우 민감하여 실험실에서도 매우 경험 있는 연구원이 사용하는 환원제로 산업적으로 적용하기에는 어려움이 많다.In addition, in the conventional method according to Scheme 1, sodium cyanoborohydride (NaBH 3 CN) is used as a reducing agent for the reductive amination of biphenylaldehyde compound (IV) as a fourth step. . Sodium cyanoborohydride (NaBH 3 CN) is a very expensive reducing agent reagent, which is not only a low economic reagent in industrial mass production, but also very sensitive to moisture, so it is not suitable for industrial application as a reducing agent used by highly experienced researchers in the laboratory. There are many difficulties.

또한, 상기 반응식 1에 따른 종래방법에서는 제 6단계 공정으로서 메틸 N-발레일-N-((2'-시아노바이페닐-4-일)메틸)-L-발린에스테르 화합물(Ⅷ)의 시아노기를 테트라졸기로 전환하기 위하여 트리부틸틴 아자이드(Bu3SnN3)를 사용하고 있다. 트리부틸틴 아자이드(Bu3SnN3)는 매우 고가 화합물이면서 매우 맹독성 화합물로 과량의 화합물을 사용해야하는 산업적으로 매우 부적절하다 할 수 있다. 더욱이 트리부틸틴 아자이드(Bu3SnN3)는 높은 온도 및 압력 등과 반응기의 스크래칭 등에 의하여 폭발의 위험성이 있다고 보고되어있어 산업적으로는 회피되는 화합물이다.In the conventional method according to Scheme 1, a cyano group of methyl N- valeyl- N- ((2'-cyanobiphenyl-4-yl) methyl) -L-valine ester compound Tributyltin azide (Bu 3 SnN 3 ) is used to convert to tetrazole group. Tributyltin azide (Bu 3 SnN 3 ) is a very expensive compound and a very poisonous compound, It can be said that it is very inappropriate industrially to use. Moreover, tributyltin azide (Bu 3 SnN 3 ) is a compound which is reported to be an explosion risk due to high temperature and pressure, scratching of the reactor, etc. and is an industrially avoided compound.

이상에서 살펴본 바와 같이, 상기 반응식 1에 따른 종래 제조방법은 6단계의 복잡한 공정으로 구성되어 있고, 각 공정별로 목적물 회수를 위한 정제공정으로서 크리마토그래피를 수행하여야하는 등의 번거로움이 있어 산업적으로 이용하기에는 적합하지 못하므로 각 공정별로 개선이 필요하다.As described above, the conventional manufacturing method according to Scheme 1 is composed of a complex process of six steps, and industrially because it has to perform a chromatography as a purification process for recovering the target for each process It is not suitable for use and needs to be improved for each process.

하기 반응식 2는 대한민국 특허등록 제0171409호의 실시예 54와 55에 개시된 제조방법으로서, 상기 반응식 1에 따른 종래 제조방법을 개선시킨 진보된 발사르탄의 제조방법을 제시하고 있다.Scheme 2 below is a manufacturing method disclosed in Examples 54 and 55 of the Republic of Korea Patent Registration No. 0171409, and proposes an advanced method of manufacturing valsartan improved the conventional manufacturing method according to the reaction scheme 1.

하기 반응식 2는 상기 반응식 1에 따른 제조방법을 개선한 방법으로서, 공정 마지막 단계에서 테트라졸기를 도입하기 위해 트리부틸틴 아자이드(Bu3SnN3)를 사용함으로써 야기되는 문제점을 개선하기 위하여, 테트라졸기가 결합된 화합물을 출발물질로 사용하는 개선된 제조방법을 제시하고 있다.Scheme 2 below is a method for improving the preparation method according to Scheme 1, in order to improve the problems caused by using tributyltin azide (Bu 3 SnN 3 ) to introduce a tetrazole group at the end of the process, tetra An improved preparation method using a compound having a sol group as a starting material is proposed.

Figure 112009020459058-pat00003
Figure 112009020459058-pat00003

상기 반응식 2의 개선된 발사르탄의 제조방법은 4-브로모메틸-2'-(1-트리페닐메틸-테트라졸-5-일)-바이페닐(I-1)을 출발물질로 사용하여 총 4단계 반응으로 구성되어 있다. 각 반응공정별로 구체적으로 설명하면 다음과 같다.The improved method for preparing valsartan of Scheme 2 was obtained by using 4-bromomethyl-2 '-(1-triphenylmethyl-tetrazol-5-yl) -biphenyl (I-1) as a starting material. It consists of a step reaction. The detailed description for each reaction process is as follows.

제 1단계 공정은, 4-브로모메틸-2'-(1-트리페닐메틸-테트라졸-5-일)-바이페닐(I-1)을 벤질-L-발린에스테르 화합물(Ⅴ-1)과 N-알킬화 반응시켜 2차 아민 화합물(Ⅵ-1)을 합성하였다.In the first step, 4-bromomethyl-2 '-(1-triphenylmethyl-tetrazol-5-yl) -biphenyl (I-1) is benzyl-L-valine ester compound (V-1). And an N- alkylation reaction to synthesize a secondary amine compound (VI-1).

제 2단계 공정은, 2차 아민 화합물(Ⅵ-1)을 발레릴 클로라이드(Ⅶ)와 N-알킬화 반응시켜 3차 아민 화합물(Ⅷ-1)을 합성하였다.In the second step, the tertiary amine compound (VII-1) was synthesized by N- alkylation of the secondary amine compound (VI-1) with valeryl chloride (VII).

제 3단계 공정은, 3차 아민 화합물(Ⅷ-1)의 테트라졸 보호기인 트리페닐메틸기를 탈보호화(deprotection)하여 보호된 카르복시산 화합물(Ⅷ-2)을 합성하였다.In the third step, the protected carboxylic acid compound (X-2) was synthesized by deprotection of the triphenylmethyl group, which is the tetrazol protecting group of the tertiary amine compound (X-1).

제 4단계 공정은, 보호된 카르복시산 화합물(Ⅷ-2)을 수소화 반응시켜 카르복시산 보호그룹인 벤질기를 탈보호화 반응시켜 발사르탄(1)을 합성하였다.In the fourth step, the protected carboxylic acid compound (X-2) was hydrogenated to deprotect the benzyl group, which is a carboxylic acid protecting group, to synthesize valsartan (1).

그러나, 상기 반응식 2에서 테트라졸기의 보호기로서 도입된 트리페닐메틸기는 산업적으로 고가이고 폭발 위험성이 있는 화합물이라는 단점이 있고, 과량의 염산을 사용하여 탈보호 반응을 수행하여야 하므로, 산업적으로 이용하기에는 부적합하다. 또한, 트리페닐메틸기는 탈보호된 후에 통상의 정제방법으로 쉽게 제거되지 않고 카르복시산 화합물(Ⅷ-2)에 계속 잔존하므로 발사르탄의 순도를 저하시키는 요인이 되기도 한다. However, the triphenylmethyl group introduced as a protecting group of the tetrazole group in Scheme 2 has a disadvantage that it is an industrially expensive and potentially explosive compound, and it is not suitable for industrial use because it has to perform a deprotection reaction using an excess of hydrochloric acid. Do. In addition, after the triphenylmethyl group is deprotected, the triphenylmethyl group is not easily removed by a conventional purification method and remains in the carboxylic acid compound (X-2), which may cause a decrease in the purity of valsartan.

또한, 상기 반응식 2에서는 카르복시산기의 보호기로서 도입된 벤질기를 이탈시키기 위해 팔라듐/카본 및 수소 기체를 이용한 수소화 환원반응을 수행한다. 그러나, 상기 수소화 환원반응은 수분과 공기에 매우 민감한 팔라듐을 사용하고 있고, 폭발의 위험성도 있어 산업적으로 매우 꺼리는 공정이다.In addition, in Scheme 2, a hydrogenation / reduction reaction using palladium / carbon and hydrogen gas is performed to leave the benzyl group introduced as a protecting group of the carboxylic acid group. However, the hydrogenation reduction reaction uses palladium which is very sensitive to moisture and air, and there is also a risk of explosion, which is an industrially reluctant process.

이에, 상기 반응식 2에 따른 제조방법은 반응식 1의 제조공정을 단축시키는 효과는 기대할 수 있지만, 테트라졸의 보호기인 트리페닐메틸기와 카르복시산의 보호기인 벤질기는 탈보호 반응이 용이하지 않고, 이탈 후에도 목적물에 잔존하는 등의 이유로 발사르탄 최종 수율 및 순도가 낮은 단점이 있다.Thus, the preparation method according to Scheme 2 can be expected to shorten the manufacturing process of Scheme 1, the triphenylmethyl group and the benzyl group as the protecting group of the carboxylic acid is not easy to deprotection reaction, even after leaving the target There is a disadvantage in that the final yield and purity of valsartan are low, for example, to remain.

이상에서 살펴본 바와 같이, 현재까지 알려진 발사르탄의 제조방법은 공정이 길고 복잡할 뿐만 아니라 산업적으로 이용하기에는 부적절한 보호기의 도입으로 발사르탄의 수율 및 순도를 저하시키는 등의 문제점을 한번에 해결할 수 있는 개선된 제조방법의 개발이 절실히 요구된다.As described above, the production method of valsartan known to date is not only a long and complicated process, but also an improved manufacturing method that can solve problems such as lowering the yield and purity of valsartan by introducing an inadequate protecting group for industrial use. Development is urgently needed.

본 발명은 비교적 간단한 제조공정을 수행하여 고순도 및 고수율로 발사르탄을 제조하는 방법을 제공하는 것을, 본 발명이 해결하고자 하는 과제로 한다.The present invention is to provide a method for producing valsartan with high purity and high yield by performing a relatively simple manufacturing process, it is an object of the present invention to solve.

본 발명은 수용액 조건에서도 목적하는 발사르탄을 고순도 및 고수율로 제조가 가능하므로, 환경친화적인 발사르탄의 개선된 제조방법을 제공하는 것을, 본 발명이 해결하고자 하는 과제로 한다.The present invention can produce the desired valsartan in high purity and high yield even under aqueous solution conditions, and therefore, it is an object of the present invention to provide an improved method for producing environmentally friendly valsartan.

본 발명은 발사르탄의 제조에 이용되는 신규 중간체 화합물을 제공하는 것을, 본 발명이 해결하고자 하는 과제로 한다.The present invention is to provide a novel intermediate compound for use in the production of valsartan.

본 발명은 하기의 ⅰ), ⅱ), ⅲ) 및 ⅳ)과정을 포함하여 이루어지는 발사르 탄의 제조방법을 제공함으로써, 본 발명의 과제를 해결한다.The present invention solves the problems of the present invention by providing a method for producing valsartan, which comprises the following processes iii), ii), iii) and iii).

ⅰ) 하기 화학식 2로 표시되는 4-톨루엔-2'-(테트라졸-5-일)-벤젠과 에틸비닐에테르를 산 촉매하에서 반응시킨 후에, 브롬화 반응시켜, 하기 화학식 3으로 표시되는 4-브로모메틸-2'-(1-디에틸에테르-테트라졸-5-일)-바이페닐을 제조하는 과정,Iii) 4-toluene-2 '-(tetrazol-5-yl) -benzene represented by the following formula (2) is reacted with ethyl vinyl ether under an acid catalyst, and then brominated to form 4-bromine represented by the following formula (3). Preparing mother methyl-2 '-(1-diethylether-tetrazol-5-yl) -biphenyl;

Figure 112009020459058-pat00004
Figure 112009020459058-pat00004

ⅱ) 하기 화학식 3으로 표시되는 4-브로모메틸-2'-(1-디에틸에테르-테트라졸-5-일)-바이페닐과 하기 화학식 4로 표시되는 L-발린메틸에스테르 염산염을 반응물의 pH가 7 내지 10이 유지되는 조건에서 결합반응시켜, 하기 화학식 5로 (S)-3-메틸-2-[[2'-(1-디에틸에테르-테트라졸-5-일)-바이페닐-4-일-메틸]-아미노]-부티르산 메틸 에스테르를 제조하는 과정,Ii) 4-bromomethyl-2 '-(1-diethylether-tetrazol-5-yl) -biphenyl represented by the following formula (3) and L-valinemethyl ester hydrochloride represented by the following formula (4) (S) -3-methyl-2-[[2 '-(1-diethylether-tetrazol-5-yl) -biphenyl by formula (5): To prepare 4-yl-methyl] -amino] -butyric acid methyl ester,

Figure 112009020459058-pat00005
Figure 112009020459058-pat00005

ⅲ) 하기 화학식 5로 표시되는 (S)-3-메틸-2-[[2'-(1-디에틸에테르-테트라졸-5-일)-바이페닐-4-일-메틸]-아미노]-부티르산 메틸 에스테르 화합물을 하기 화학 식 6으로 표시되는 발레릴 클로라이드와 반응물의 pH가 7 내지 10이 유지되는 조건에서 N-알킬화 반응시켜, 하기 화학식 7로 표시되는 (S)-3-메틸-2'-[N-펜타노일-(1-디에틸에테르-테트라졸-5-일)-바이페닐-4-일-메틸)-아미노]-부티르산 메틸 에스테르를 제조하는 과정, 및Iii) (S) -3-methyl-2-[[2 '-(1-diethylether-tetrazol-5-yl) -biphenyl-4-yl-methyl] -amino] represented by the following formula (5): The butyric acid methyl ester compound is subjected to N- alkylation reaction with valeryl chloride represented by the following chemical formula (6) under the condition that the pH of the reactant is maintained at 7 to 10, and is represented by the following general formula (S) -3-methyl-2 Preparing '-[ N -pentanoyl- (1-diethylether-tetrazol-5-yl) -biphenyl-4-yl-methyl) -amino] -butyric acid methyl ester, and

Figure 112009020459058-pat00006
Figure 112009020459058-pat00006

ⅳ) 하기 화학식 7로 표시되는 (S)-3-메틸-2'-[N-펜타노일-(1-디에틸에테르-테트라졸-5-일)-바이페닐-4-일-메틸)-아미노]-부티르산 메틸 에스테르를 가수분해한 후에, 산 촉매하에서 탈보호 반응시켜, 하기 화학식 1로 표시되는 발사르탄을 제조하는 과정.Iii) (S) -3-methyl-2 '-[ N -pentanoyl- (1-diethylether-tetrazol-5-yl) -biphenyl-4-yl-methyl)- After hydrolyzing the amino] -butyric acid methyl ester, a deprotection reaction is carried out under an acid catalyst to prepare valsartan represented by the following Chemical Formula 1.

Figure 112009020459058-pat00007
Figure 112009020459058-pat00007

또한, 본 발명은 상기한 일련의 제조과정에서 합성되는 상기 화학식 5, 7, 및 8로 표시되는 중간체 화합물을 신규 화합물로서 제공함으로써, 본 발명의 과제를 해결한다.In addition, the present invention solves the problems of the present invention by providing an intermediate compound represented by the formula (5), 7, and 8 as a novel compound synthesized in the series of manufacturing process described above.

본 발명의 제조방법에서는 4-톨루엔-2'-(테트라졸-5-일)-벤젠을 출발물질로 사용하여 발사르탄을 제조하는 방법으로, 반응식 1에 따른 종래 제조방법이 공정 마지막 단계에서 테트라졸기를 도입하기 위해 맹독성이면서 폭발 위험성이 높은 트리부틸틴 아자이드(Bu3SnN3)의 사용하는 것을 완전히 배제시킨 효과가 있다.In the preparation method of the present invention, valsartan is prepared by using 4-toluene-2 '-(tetrazol-5-yl) -benzene as a starting material, and the conventional preparation method according to Scheme 1 is a tetrazole group at the end of the process. It is effective in completely eliminating the use of tributyltin azide (Bu 3 SnN 3 ), which is highly toxic and highly explosive in order to introduce.

본 발명의 제조방법에서 테트라졸의 보호기 도입을 위해 사용된 에틸비닐에테르 시약은 반응식 2에 따른 종래 제조방법에서 이용된 트리페닐메틸(-CPh3) 보호기에 비교하여 폭발 위험성이 적고 취급이 간편하며, 보호기 도입과정 및 탈보호과정이 촉매량의 산 존재하에서도 정량적으로 수행되고, 특히 탈보호된 후에는 간단한 세척 및 감압증류에 의해서도 반응혼합물로부터 쉽게 제거가 가능한 효과가 있다.Ethyl vinyl ether reagent used for introducing the protecting group of tetrazole in the preparation method of the present invention is less explosion risk and easier to handle compared to the triphenylmethyl (-CPh 3 ) protecting group used in the conventional manufacturing method according to Scheme 2. In addition, the protecting group introduction process and the deprotection process are carried out quantitatively even in the presence of a catalytic amount of acid, and especially after deprotection, there is an effect that can be easily removed from the reaction mixture by simple washing and distillation under reduced pressure.

본 발명의 테트라졸기에 보호기 도입하는 반응 및 탈보호하는 반응은 에틸비닐에테르 시약을 선택 사용함으로써, 산촉매 하에서 1시간 이내(짧게는 20분 이내)에 반응이 정량적으로 완결되는 효과가 있다.The reaction of introducing the protecting group into the tetrazole group and the deprotecting reaction of the present invention have an effect of quantitatively completing the reaction within 1 hour (20 minutes or shorter) under an acid catalyst by using an ethyl vinyl ether reagent.

본 발명의 제조방법은 보호기 등 잔존하는 불순물이 없으므로 고순도 및 고수율로 발사르탄을 수득되는 효과가 있다.Since the production method of the present invention is free of residual impurities such as protecting groups, there is an effect of obtaining valsartan with high purity and high yield.

본 발명의 제조방법은 유기용매 조건은 물론이고, 수용액 조건에서도 원활하게 반응이 수행되므로, 환경친화성이 우수한 효과가 있다.In the production method of the present invention, as well as organic solvent conditions, the reaction is carried out smoothly in aqueous solution conditions, there is an effect excellent in environmental friendliness.

본 발명에 따른 발사르탄의 제조방법은, 하기 화학식 2로 표시되는 4-톨루엔-2'-(테트라졸-5-일)-벤젠을 출발물질로 사용하여 4단계의 제조공정을 수행하는 것으로 구성된다. The method for preparing valsartan according to the present invention comprises using 4-toluene-2 '-(tetrazol-5-yl) -benzene represented by the following Chemical Formula 2 as a starting material to perform a four-step manufacturing process. .

하기에서는 본 발명을 보다 상세히 설명하기 위하여 제조과정을 세분화하여 설명하고 있지만, 이들 과정은 필요에 따라 연속공정 또는 단리공정으로 수행될 수도 있다. 단리공정으로 각 공정을 수행한 후에 목적물을 분리 수득한 후에 다음 공정을 수행하게 되면, 최종 목적물의 순도를 크게 향상시키는 효과를 얻을 수 있다. 그러나, 본 발명이 제안하는 제조방법은 단리공정에 의해 제조된 발사르탄의 순도가 99.3%이고, 연속공정으로 제조된 목적물의 순도가 98.7∼99.0%이므로, 순도면에서 현격한 차이를 나타내지 않아 공업적 유용성을 고려한다면 연속공정을 반응을 수행하는 것이 보다 유리하다. 예컨대, 본 발명이 제안하는 제조방법 중 ⅱ)결합 반응과 ⅲ)N-알킬화 반응은 하나의 반응 용기내에서 연속적 반응(one-pot reaction)으로 수행하는 것이 상업적으로 보다 유리할 수 있다. 그리고, 본 발명이 제안하는 제조방법 중 ⅳ)의 가수분해 반응과 탈보호 반응 역시 하나의 반응 용기내에서 연속적 반응(one-pot reaction)으로 수행하는 것이 상업적으로 보다 유리할 수 있다.In the following, the manufacturing process is described in detail to explain the present invention in more detail, but these processes may be performed in a continuous process or an isolation process as necessary. After carrying out each step in the isolation step and then separately separating and obtaining the target product, the next step may be performed, thereby greatly improving the purity of the final target product. However, the production method proposed by the present invention is 99.3% purity of the valsartan produced by the isolation process and 98.7-99.9% purity of the target product produced by the continuous process. Considering the availability, it is more advantageous to carry out the reaction in a continuous process. For example, in the production method proposed by the present invention, it may be more commercially advantageous to perform the ii) binding reaction and iii) the N- alkylation reaction in a one-pot reaction in one reaction vessel. In addition, the hydrolysis reaction and the deprotection reaction of i) of the production method proposed by the present invention may also be commercially more advantageously carried out in a one-pot reaction in one reaction vessel.

이러한 본 발명에 따른 발사르탄의 제조방법을 각 과정별로 세분화하여 설명하면 하기와 같다.The method for preparing valsartan according to the present invention will be described in detail for each process as follows.

ⅰ)과정은, 상기 화학식 2로 표시되는 4-톨루엔-2'-(테트라졸-5-일)-벤젠을 출발물질로 사용하고, 에틸비닐에테르 시약을 이용한 테트라졸 보호기 도입반응과 브롬화 반응을 수행하여, 상기 화학식 3으로 표시되는 4-브로모메틸-2'-(1-디에틸에테르-테트라졸-5-일)-바이페닐을 제조하는 과정이다.Iii), 4-toluene-2 '-(tetrazol-5-yl) -benzene represented by Chemical Formula 2 is used as a starting material, and a tetrazol protecting group introduction reaction and a bromination reaction using an ethyl vinyl ether reagent are carried out. By performing the above process, 4-bromomethyl-2 '-(1-diethylether-tetrazol-5-yl) -biphenyl represented by Chemical Formula 3 is prepared.

본 발명이 테트라졸 보호기 도입을 위해 사용하는 에틸비닐에테르 시약은 비교적 안정한 화합물로 취급이 간편할 뿐만 아니라, 촉매량의 산 존재하에서 짧은 시간내에 보호 및 탈보호가 가능하여 공업적으로 이용하기에 전혀 문제가 없으며, 탈보호 반응 후에는 이탈된 보호기가 세척 및 감압 증류과정 중에 쉽게 반응혼합물로부터 제거가 가능하므로 최종적으로 제조되는 발사르탄의 순도 및 수율 저하의 원인으로 작용하지 않는 우수성이 있다. 따라서, 본 발명은 상기 화학식 2로 표시되는 화합물의 테트라졸 보호화제로서 에틸비닐에테르 시약을 선택 사용하여 제조공정의 단순화를 도모하고 및 공정의 편리성을 높인데도 그 특징이 있다.The ethyl vinyl ether reagent used for introducing the tetrazole protecting group is not only a relatively stable compound, but is also easy to handle and can be protected and deprotected in a short time in the presence of a catalytic amount of acid. After the deprotection reaction, the deprotected protecting group can be easily removed from the reaction mixture during the washing and distillation under reduced pressure, and thus there is an excellent effect that it does not act as a cause of lowering the purity and yield of the finally produced valsartan. Accordingly, the present invention is characterized by simplifying the manufacturing process and increasing the convenience of the process by using an ethyl vinyl ether reagent as the tetrazol protecting agent of the compound represented by the formula (2).

상기 화학식 2로 표시되는 화합물에 테트라졸의 보호기 도입을 위해, 상기 화학식 2로 표시되는 화합물은 통상의 유기용매에 용해하고 -30℃ 내지 10℃로 냉각한 후에, 산 촉매와 1 내지 2 당량의 에틸비닐에테르를 가하고, 상기 온도범위를 유지하면서 교반하면, 보호화 반응은 1시간 이내(보다 짧게는 20분 이내) 정량적으로 완결된다. 상기 보호화 반응에서 사용되는 산 촉매는 아세트산, 트리플루오로아세트산, 메탄설폰산, 캄포설폰산(CSA), p-톨루엔설폰산, 황산, 염산 등 중에서 선택 사용할 수 있으며, 특히 바람직하기로는 트리플루오로아세트산을 사용할 수 있다. 산 촉매는 극히 소량만 사용하더라도 반응은 충분히 완결되므로, 0.001 내지 0.1 당량 범위내에서 적절히 사용하도록 한다. 반응용매로는 테트라하이 드로퓨란(THF), 디메틸포름아미드(DMF), 디메틸설폭사이드(DMSO), 디에틸에테르, 에틸아세테이트, 벤젠, 디클로로메탄, 테트라클로로메탄, 아세톤, 아세토니트릴, 메탄올, 에탄올, 이소프로필알콜 중에서 선택된 단독 용매 또는 혼합용매를 사용할 수 있다.In order to introduce a protecting group of tetrazole to the compound represented by Chemical Formula 2, the compound represented by Chemical Formula 2 was dissolved in a conventional organic solvent and cooled to -30 ° C to 10 ° C, and then used in an amount of 1 to 2 equivalents with an acid catalyst. When ethyl vinyl ether is added and stirred while maintaining the temperature range, the protection reaction is completed quantitatively within 1 hour (shorter than 20 minutes). The acid catalyst used in the protection reaction may be selected from acetic acid, trifluoroacetic acid, methanesulfonic acid, camphorsulfonic acid (CSA), p -toluenesulfonic acid, sulfuric acid, hydrochloric acid, and the like, and particularly preferably trifluoric acid. Roacetic acid can be used. Since the reaction is sufficiently completed even when only a small amount of the acid catalyst is used, it should be suitably used within the range of 0.001 to 0.1 equivalents. Reaction solvents include tetrahydrofuran (THF), dimethylformamide (DMF), dimethyl sulfoxide (DMSO), diethyl ether, ethyl acetate, benzene, dichloromethane, tetrachloromethane, acetone, acetonitrile, methanol, ethanol , A single solvent or a mixed solvent selected from isopropyl alcohol can be used.

이어서, 브롬화 반응을 수행하여 상기 화학식 3으로 표시되는 4-브로모메틸-2'-(1-디에틸에테르-테트라졸-5-일)-바이페닐을 제조한다. 상기한 보호화 반응은 정량적으로 수행되므로 별도의 정제과정 없이 바로 브롬화 반응을 수행할 수 있으며, 필요하다면 간단한 세척 및 감압 농축과정을 통해 에틸비닐에테르로 보호된 화합물을 분리한 후에 브롬화 반응을 수행해도 좋다. 브롬화 반응은 통상의 브롬화제 예를 들면, 브로민(Br2), N-브로모숙신이미드 등을 사용할 수 있겠으나, 본 발명에서는 공정의 편의성을 도모하고자 아조이소부티로니트릴(AIBN) 촉매하에서 N-브로모숙신이미드의 브롬화제를 사용하여 실온 내지 용매의 환류온도(구체적으로는 20℃ 내지 150℃ 온도) 조건에서 브롬화 반응을 수행하였다. 이때 사용되는 반응용매는 테트라하이드로퓨란(THF), 디메틸포름아미드(DMF), 디메틸설폭사이드(DMSO), 디에틸에테르, 에틸아세테이트, 벤젠, 디클로로메탄, 테트라클로로메탄, 아세톤, 아세토니트릴, 메탄올, 에탄올, 이소프로필알콜 중에서 선택된 단독 용매 또는 혼합용매를 사용할 수 있다. Subsequently, the bromination reaction is performed to prepare 4-bromomethyl-2 '-(1-diethylether-tetrazol-5-yl) -biphenyl represented by Chemical Formula 3. Since the protection reaction is carried out quantitatively, the bromination reaction can be performed immediately without further purification. If necessary, the bromination reaction may be performed after separating the compound protected by ethyl vinyl ether through simple washing and concentration under reduced pressure. good. The bromination reaction may use a conventional brominating agent, for example, bromine (Br 2 ), N -bromosuccinimide, and the like, but in the present invention, an azoisobutyronitrile (AIBN) catalyst is used to facilitate the process. The bromination reaction was carried out under conditions of room temperature to reflux (specifically, 20 ° C. to 150 ° C.) of the solvent using a brominating agent of N -bromosuccinimide. The reaction solvent used here is tetrahydrofuran (THF), dimethylformamide (DMF), dimethyl sulfoxide (DMSO), diethyl ether, ethyl acetate, benzene, dichloromethane, tetrachloromethane, acetone, acetonitrile, methanol, A single solvent or a mixed solvent selected from ethanol and isopropyl alcohol can be used.

ⅱ)과정은, 상기 화학식 3으로 표시되는 4-브로모메틸-2'-(1-디에틸에테르-테트라졸-5-일)-바이페닐과 상기 화학식 4로 표시되는 L-발린메틸에스테르 염산염 을 결합반응시켜, 상기 화학식 5로 (S)-3-메틸-2-[[2'-(1-디에틸에테르-테트라졸-5-일)-바이페닐-4-일-메틸]-아미노]-부티르산 메틸 에스테르를 제조하는 과정이다.Ii) The process is 4-bromomethyl-2 '-(1-diethylether-tetrazol-5-yl) -biphenyl represented by the formula (3) and L-valinemethyl ester hydrochloride represented by the formula (4). To (S) -3-methyl-2-[[2 '-(1-diethylether-tetrazol-5-yl) -biphenyl-4-yl-methyl] -amino in the formula (5). ] -Butyric acid methyl ester.

상기 결합반응은 pH 7 내지 10 및 -10℃ 내지 20℃ 온도 조건에서 수행한다. 반응물의 pH 조절을 위해서는 무기계열의 알칼리금속 수산화물(예를 들면, NaOH, KOH 등)의 수용액, 또는 유기계열의 트리에틸아민 등을 사용할 수 있다. 그리고, 반응용매로는 물, 테트라하이드로퓨란(THF), 디메틸포름아미드(DMF), 디메틸설폭사이드(DMSO), 디에틸에테르, 에틸아세테이트, 벤젠, 디클로로메탄, 테트라클로로메탄, 아세톤, 아세토니트릴, 메탄올, 에탄올, 이소프로필알콜, 부탄올 중에서 선택된 단독 용매 또는 혼합용매를 사용할 수 있다. 상업적 측면에서 보다 바람직하기로는, 상기 결합반응계를 구성하는 용매는 물 단독용매, 또는 물, C1-C4 알콜 및 에틸아세테이트가 혼합된 수용액을 사용하면서, pH 조절을 위해 알칼리금속 수산화물의 무기물을 사용하는 것이다. 혼합 수용액의 반응계를 구성하는 경우, 물은 전체 용매 중에 1 내지 60 부피% 범위로 포함될 수 있다.The coupling reaction is carried out at pH 7 to 10 and -10 ℃ to 20 ℃ temperature conditions. In order to adjust the pH of the reactants, an aqueous solution of an alkali-based alkali metal hydroxide (eg, NaOH, KOH, etc.), or an organic-based triethylamine may be used. As the reaction solvent, water, tetrahydrofuran (THF), dimethylformamide (DMF), dimethyl sulfoxide (DMSO), diethyl ether, ethyl acetate, benzene, dichloromethane, tetrachloromethane, acetone, acetonitrile, A single solvent or a mixed solvent selected from methanol, ethanol, isopropyl alcohol and butanol can be used. More preferably from a commercial point of view, the solvent constituting the coupling reaction system is a water alone solvent or an aqueous solution of water, C 1 -C 4 alcohol and ethyl acetate mixed with the inorganic material of the alkali metal hydroxide for pH control To use. When constituting the reaction system of the mixed aqueous solution, water may be included in the range of 1 to 60% by volume in the total solvent.

ⅲ)과정은, 상기 화학식 5로 표시되는 (S)-3-메틸-2-[[2'-(1-디에틸에테르-테트라졸-5-일)-바이페닐-4-일-메틸]-아미노]-부티르산 메틸 에스테르 화합물을 하기 화학식 6으로 표시되는 발레릴 클로라이드와 N-알킬화 반응시켜, 하기 화학식 7로 표시되는 (S)-3-메틸-2'-[N-펜타노일-(1-디에틸에테르-테트라졸-5-일)-바이페닐-4-일-메틸)-아미노]-부티르산 메틸 에스테르를 제조하는 과정이다,V), (S) -3-methyl-2-[[2 '-(1-diethylether-tetrazol-5-yl) -biphenyl-4-yl-methyl] represented by the formula (5); -Amino] -butyric acid methyl ester compound was subjected to N- alkylation reaction with valeryl chloride represented by the following formula (6) to give (S) -3-methyl-2 '-[ N -pentanoyl- (1) represented by the following formula (7). -Diethylether-tetrazol-5-yl) -biphenyl-4-yl-methyl) -amino] -butyric acid methyl ester

상기 N-알킬화 반응은 pH 7 내지 10 및 -10℃ 내지 20℃ 온도 조건에서 수행 한다. 반응물의 pH 조절을 위해서는 무기계열의 알칼리금속 수산화물(예를 들면, NaOH, KOH 등)의 수용액, 또는 유기계열의 트리에틸아민 등을 사용할 수 있다. 그리고, 반응용매로는 물, 테트라하이드로퓨란(THF), 디메틸포름아미드(DMF), 디메틸설폭사이드(DMSO), 디에틸에테르, 에틸아세테이트, 벤젠, 디클로로메탄, 테트라클로로메탄, 아세톤, 아세토니트릴, 메탄올, 에탄올, 이소프로필알콜, 부탄올 중에서 선택된 단독 용매 또는 혼합용매를 사용할 수 있다. 상업적 측면에서 보다 바람직하기로는, 상기 N-알킬화 반응계를 구성하는 용매는 물 단독용매, 또는 물, C1-C4 알콜 및 에틸아세테이트가 혼합된 수용액을 사용하면서, pH 조절을 위해 알칼리금속 수산화물의 무기물을 사용하는 것이다. 혼합 수용액의 반응계를 구성하는 경우, 물은 전체 용매 중에 1 내지 60 부피% 범위로 포함될 수 있다.The N- alkylation reaction is carried out at pH 7 to 10 and -10 ℃ to 20 ℃ temperature conditions. In order to adjust the pH of the reactants, an aqueous solution of an alkali-based alkali metal hydroxide (eg, NaOH, KOH, etc.), or an organic-based triethylamine may be used. As the reaction solvent, water, tetrahydrofuran (THF), dimethylformamide (DMF), dimethyl sulfoxide (DMSO), diethyl ether, ethyl acetate, benzene, dichloromethane, tetrachloromethane, acetone, acetonitrile, A single solvent or a mixed solvent selected from methanol, ethanol, isopropyl alcohol and butanol can be used. More preferably from a commercial point of view, the solvent constituting the N- alkylation reaction system is an alkali metal hydroxide for pH control, using water alone or an aqueous solution of water, C 1 -C 4 alcohol and ethyl acetate. It is to use minerals. When constituting the reaction system of the mixed aqueous solution, water may be included in the range of 1 to 60% by volume in the total solvent.

상기한 ⅱ)결합반응과 ⅲ)N-알킬화 반응 중에는 브롬화수소(HBr)와 염화수소(HCl)가 각각 부산물로 발생하므로, 이들 할로겐산의 발생으로 반응물의 pH가 낮아질 수도 있다. 따라서, ⅱ)결합반응과 ⅲ)N-알킬화 반응을 수행하는 중에는 반응물의 pH를 계속적으로 보정하는 것이 필요하며, pH 보정은 제조수율 및 순도를 향상시키는 요인이 될 수도 있다.Hydrogen bromide (HBr) and hydrogen chloride (HCl) are generated as by-products during the above-mentioned ii) bonding reaction and iii) N- alkylation reaction, and the pH of the reactants may be lowered by the generation of these halogen acids. Therefore, during the ii) binding reaction and iii) the N- alkylation reaction, it is necessary to continuously correct the pH of the reactants, and the pH correction may be a factor for improving the production yield and purity.

ⅳ)과정은, 상기 화학식 7로 표시되는 (S)-3-메틸-2'-[N-펜타노일-(1-디에틸에테르-테트라졸-5-일)-바이페닐-4-일-메틸)-아미노]-부티르산 메틸 에스테르를 가수분해 및 탈보호 반응시켜, 본 발명이 목적하는 상기 화학식 1로 표시되는 발사르탄을 제조하는 과정이다.V), (S) -3-methyl-2 '-[ N -pentanoyl- (1-diethylether-tetrazol-5-yl) -biphenyl-4-yl- represented by the formula (7) Hydrolysis and deprotection reaction of methyl) -amino] -butyric acid methyl ester to prepare valsartan represented by the formula (1).

상기 가수분해 반응은 메탄올 용매 속에서 수산화나트륨 수용액을 이용하여 수행한다. 가수분해 반응온도는 -10℃ 내지 20℃ 범위가 좋고, 수산화나트륨은 5 내지 30% 농도의 수용액으로 제조하여 사용하며, 반응물의 pH는 9 내지 12의 강알칼리 조건을 유지하는 것이 좋다. 상기 가수분해 반응은 1 내지 3시간 이내에 정량적으로 완결된다.The hydrolysis reaction is carried out using an aqueous sodium hydroxide solution in a methanol solvent. Hydrolysis reaction temperature is good in the range of -10 ℃ to 20 ℃, sodium hydroxide is prepared by using an aqueous solution of 5 to 30% concentration, the pH of the reactants is preferably maintained at a strong alkali condition of 9 to 12. The hydrolysis reaction is completed quantitatively within 1 to 3 hours.

상기 탈보호 반응은 산 촉매를 사용하여 반응물의 pH를 1 내지 4 범위, 바람직하기로는 pH 2 내지 3의 범위로 유지하면서 0℃ 내지 실온(구체적으로는 10℃ 내지 30℃ 정도)에서 교반하면, 30분 이내로 반응은 정량적으로 완결된다. 상기 탈보호 반응에서 사용되는 산 촉매는 아세트산, 트리플루오로아세트산, 메탄설폰산, 캄포설폰산(CSA), p-톨루엔설폰산, 황산, 염산 등 중에서 선택 사용할 수 있으며, 특히 바람직하기로는 염산 수용액을 사용할 수 있다. 산 촉매는 극히 소량만 사용하더라도 반응은 충분히 진행되므로, 0.001 내지 0.1 당량 범위내에서 적절히 사용하도록 한다. 상기 탈보호 반응은 별도의 유기용매를 첨가하지 않고, 수용액 조건에서도 완벽하게 종결될 수 있다.The deprotection reaction is carried out using an acid catalyst while stirring at 0 ° C to room temperature (specifically, about 10 ° C to 30 ° C) while maintaining the pH of the reactants in the range of 1 to 4, preferably in the range of pH 2 to 3, Within 30 minutes the reaction is complete quantitatively. The acid catalyst used in the deprotection reaction may be selected from acetic acid, trifluoroacetic acid, methanesulfonic acid, camphorsulfonic acid (CSA), p -toluenesulfonic acid, sulfuric acid, hydrochloric acid, and the like. Can be used. Even if only a small amount of the acid catalyst is used, the reaction proceeds sufficiently, so that the acid catalyst may be properly used within the range of 0.001 to 0.1 equivalents. The deprotection reaction may be completely terminated even in an aqueous solution without adding a separate organic solvent.

상기 탈보호 반응에서 이탈된 디에틸에테르는 목적물 분리를 위한 세척 및 감압 증류과정에서 쉽게 제거되므로, 종래 제조방법에서 문제시 되었던 탈보호기에 의한 발사르탄의 순도 저하의 문제가 전혀 우려되지 않는다. 실제로 하기의 실시예에서도 구체적으로 확인되어 있듯이, 본 발명의 제조방법에 의하면 발사르탄은 99.3% 이상의 고순도의 제품으로 수득되고 있다.Since the diethyl ether departed from the deprotection reaction is easily removed during washing and distillation under reduced pressure for the purpose of separating the target, there is no concern about the deterioration of purity of valsartan by the deprotection group, which has been a problem in the conventional manufacturing method. In fact, as specifically confirmed in the following examples, according to the production method of the present invention, valsartan is obtained as a high purity product of 99.3% or more.

한편, 본 발명의 제조방법을 수행하는 과정 중에 중간체 화합물로 합성되는 상기 화학식 5로 표시되는 (S)-3-메틸-2-[[2'-(1-디에틸에테르-테트라졸-5-일)-바이페닐-4-일-메틸]-아미노]-부티르산 메틸 에스테르, 상기 화학식 7로 표시되는 (S)-3-메틸-2'-[N-펜타노일-(1-디에틸에테르-테트라졸-5-일)-바이페닐-4-일-메틸)-아미노]-부티르산 메틸 에스테르, 그리고 상기 화학식 8로 표시되는 (S)-3-메틸-2'-[N-펜타노일-(1-디에틸에테르-테트라졸-5-일)-바이페닐-4-일-메틸)-아미노]-부티르산은 각각 신규 화합물이다.Meanwhile, (S) -3-methyl-2-[[2 '-(1-diethylether-tetrazol-5-) represented by Chemical Formula 5 synthesized as an intermediate compound in the course of carrying out the preparation method of the present invention. Yl) -biphenyl-4-yl-methyl] -amino] -butyric acid methyl ester, (S) -3-methyl-2 '-[ N -pentanoyl- (1-diethylether-) Tetrazol-5-yl) -biphenyl-4-yl-methyl) -amino] -butyric acid methyl ester, and (S) -3-methyl-2 '-[ N -pentanoyl- ( 1-diethylether-tetrazol-5-yl) -biphenyl-4-yl-methyl) -amino] -butyric acid are each novel compounds.

따라서, 본 발명은 발사르탄 합성용 중간체 화합물로서 상기 화학식 5, 7, 및 8로 표시되는 신규 화합물을 권리범위로서 포함한다.Accordingly, the present invention includes the novel compounds represented by the formulas (5), (7) and (8) as the intermediate compounds for valsartan synthesis.

이상에서 설명한 바와 같은 본 발명의 제조방법은 그 제조과정이 비교적 간단하고, 반응조건이 온화하면서도 제조수율 및 순도가 높아서 고혈압 치료제로 유효한 의약품인 발사르탄의 공업적 생산방법으로 적용하기에 매우 적합하다.As described above, the manufacturing method of the present invention is relatively simple, and the reaction conditions are gentle, and the production yield and purity are high, and thus, the manufacturing method is very suitable for industrial production of valsartan, which is an effective drug for treating high blood pressure.

이러한 본 발명은 다음의 실시예에 의거하여 더욱 상세히 설명하겠는바, 본 발명이 다음의 실시예에 의해 한정되는 것은 결코 아니다.The present invention will be described in more detail based on the following examples, but the present invention is not limited by the following examples.

[실시예]EXAMPLE

실시예 1. 4-톨루엔-2'-(1-디에틸에테르-테트라졸-5-일)-벤젠Example 1. 4-toluene-2 '-(1-diethylether-tetrazol-5-yl) -benzene

Figure 112009020459058-pat00008
Figure 112009020459058-pat00008

질소로 충진된 반응용기에 4-톨루엔-2'-(테트라졸-5-일)벤젠 화합물 50 g (0.21 mol)을 디클로로메탄 400 mL에 녹인 후 0℃로 냉각하였다. 반응물에 트리플로로아세트산 촉매량을 가한 후에 에틸렌비닐에테르 26.3 mL (0.275 mol)을 20분간 가하였다. 반응액을 0℃를 유지하면서 1시간 동안 교반한 후 정제수 150 mL, 포화소금물 100 mL로 반응액을 세척하였다. 생성물의 용액을 황산마그네슘으로 잔류하는 수분을 제거하고 감압 농축하여 무색 오일상의 상기 표제 화합물을 60.01 g (92.8%) 수득하였다.50 g (0.21 mol) of 4-toluene-2 '-(tetrazol-5-yl) benzene compound was added to a reaction vessel filled with nitrogen. It was dissolved in 400 mL of dichloromethane and cooled to 0 ° C. Trichloroacetic acid on the reaction After adding the catalyst amount, 26.3 mL (0.275 mol) of ethylene vinyl ether was added for 20 minutes. After the reaction solution was stirred at 0 ° C. for 1 hour, the reaction solution was washed with 150 mL of purified water and 100 mL of saturated brine. The solution of the product was removed with water remaining magnesium sulfate and concentrated under reduced pressure to give 60.01 g (92.8%) of the title compound as a colorless oil.

1H NMR(CDCl3) δ 7.6∼7.4 (m, 2H), 7.4∼7.3 (m, 2H), 7.3∼7.1 (m, 4H), 5.3 (t, 1H), 2.46 (s, 3H), 1.82 (d, 2H), 1.1∼1.8 (m, 6H) 1 H NMR (CDCl 3 ) δ 7.6 to 7.4 (m, 2H), 7.4 to 7.3 (m, 2H), 7.3 to 7.1 (m, 4H), 5.3 (t, 1H), 2.46 (s, 3H), 1.82 (d, 2H), 1.1 to 1.8 (m, 6H)

실시예 2. 4-브로모메틸-2'-(1-디에틸에테르-테트라졸-5-일)-바이페닐Example 2. 4-Bromomethyl-2 '-(1-diethylether-tetrazol-5-yl) -biphenyl

Figure 112009020459058-pat00009
Figure 112009020459058-pat00009

4-톨루엔-2'-(1-디에틸에테르-테트라졸-5-일)-벤젠 55 g(0.178 mol)을 질소로 충진된 반응용기에 넣은 후 테트라클로로메탄 440 mL을 가하여 녹였다. 아조이소부티로니트릴(AIBN)을 촉매량 가하고 N-브로모숙신이미드(NBS)를 38.1 g(0.214 mol) 가한 후 1 내지 2시간 서서히 온도를 가하여 가열 환류하였다. 반응이 완료되면 냉각하여 생성된 고체를 여과하여 제거하고 정제수 200 mL로 2회 반복하여 세척하고, 포화소금물로 세척한 후 황산마그네슘으로 잔류 수분을 제거하고 감압 농축하여 오일상의 상기 표제 화합물을 70.7 g (85.4%) 수득하였다.55 g (0.178 mol) of 4-toluene-2 '-(1-diethylether-tetrazol-5-yl) -benzene was placed in a reaction vessel filled with nitrogen, and then dissolved by adding 440 mL of tetrachloromethane. Azoisobutyronitrile (AIBN) was added in a catalytic amount, and 38.1 g (0.214 mol) of N -bromosuccinimide (NBS) was added thereto, followed by gradually heating to reflux for 1 to 2 hours. After the reaction was completed, the solid produced by cooling was removed by filtration, washed twice with 200 mL of purified water, washed with saturated brine, and then residual moisture was removed with magnesium sulfate and concentrated under reduced pressure to obtain 70.7 g of the title compound as an oil. (85.4%) was obtained.

1H NMR(CDCl3) δ 7.6∼7.4 (m, 2H), 7.4∼7.3 (m, 2H), 7.3∼7.1 (m, 4H), 5.3 (t, 1H), 4.50 (s, 2H), 1.82 (d, 2H), 1.1∼1.8 (m, 6H) 1 H NMR (CDCl 3 ) δ 7.6 to 7.4 (m, 2H), 7.4 to 7.3 (m, 2H), 7.3 to 7.1 (m, 4H), 5.3 (t, 1H), 4.50 (s, 2H), 1.82 (d, 2H), 1.1 to 1.8 (m, 6H)

실시예 3. (S)-3-메틸-2-[[2'-(1-디에틸에테르테트라졸-5-일)-바이페닐-4-일-메틸]-아미노]-부티르산 메틸 에스테르Example 3. (S) -3-Methyl-2-[[2 '-(1-diethylethertetrazol-5-yl) -biphenyl-4-yl-methyl] -amino] -butyric acid methyl ester

Figure 112009020459058-pat00010
Figure 112009020459058-pat00010

메탄올 80 mL와 정제수 60 mL를 혼합한 혼합용매에, 실온에서 L-발린메틸에스테르 염산염 20.0 g (0.119 mol)을 가한 후 2 내지 5℃로 냉각하였다. 반응물을 20% 농도의 NaOH 수용액으로 pH 8.5 내지 9.0으로 조정하였다. 별도의 용기에서 4-브로모메틸-2'-(1-디에틸에테르-테트라졸-5-일)-바이페닐 50.8 g(0.131 mol)을 에틸아세테이트 250 mL에 녹인 용액을, 상기 반응액에 30분 동안 2 내지 5℃의 온도를 유지하면서 가하였다. 이때, 5% 농도의 NaOH 수용액을 사용하여 반응물의 pH를 8.5 내지 9.0로 유지하였다. 반응물을 30분간 더 온도를 유지하면서 교반한 후 에틸아세테이트 200 mL를 가한 후 층 분리하여 물 층을 제거하였 다. 에틸아세테이트 층을 정제수, 포화 소금물로 순차적으로 세척한 후 황산마그네슘으로 잔류수분을 제거하고 감압 농축하여 무색 오일상의 상기 표제 화합물을 51.3 g(수율 98.4%, 순도 98.8% 이상 HPLC Area %) 수득하였다.To a mixed solvent of 80 mL of methanol and 60 mL of purified water, 20.0 g (0.119 mol) of L-valinemethylester hydrochloride was added at room temperature, followed by cooling to 2 to 5 ° C. The reaction was adjusted to pH 8.5-9.0 with 20% aqueous NaOH solution. In a separate vessel, a solution of 50.8 g (0.131 mol) of 4-bromomethyl-2 '-(1-diethylether-tetrazol-5-yl) -biphenyl in 250 mL of ethyl acetate was added to the reaction solution. The addition was continued while maintaining a temperature of 2 to 5 ° C. for 30 minutes. At this time, the pH of the reaction was maintained at 8.5 to 9.0 using a 5% NaOH aqueous solution. The reaction was stirred for 30 minutes while maintaining the temperature, and then 200 mL of ethyl acetate was added, and the layers were separated to remove the water layer. The ethyl acetate layer was washed sequentially with purified water and saturated brine, and then residual moisture was removed with magnesium sulfate and concentrated under reduced pressure to give 51.3 g (yield 98.4%, purity 98.8% or more HPLC Area%) of the title compound as a colorless oil.

1H NMR(CDCl3) δ 7.7∼7.5 (m, 2H), 7.4∼7.3 (m, 2H), 7.3∼7.1 (m, 4H), 5.25 (t, 1H), 3.83 (s, 2H), 3.71 (s, 3H), 3.46 (m, 2H), 2.66 (m, 1H), 1.0∼1.8 (m, 12H) 1 H NMR (CDCl 3 ) δ 7.7 to 7.5 (m, 2H), 7.4 to 7.3 (m, 2H), 7.3 to 7.1 (m, 4H), 5.25 (t, 1H), 3.83 (s, 2H), 3.71 (s, 3H), 3.46 (m, 2H), 2.66 (m, 1H), 1.0-1.8 (m, 12H)

실시예 4. (S)-3-메틸-2-[[2'-(1-디에틸에테르-테트라졸-5-일)-바이페닐-4-일-메틸]-아미노]-부티르산 메틸 에스테르Example 4. (S) -3-Methyl-2-[[2 '-(1-diethylether-tetrazol-5-yl) -biphenyl-4-yl-methyl] -amino] -butyric acid methyl ester

Figure 112009020459058-pat00011
Figure 112009020459058-pat00011

질소하에 실온에서 L-발린메틸에스테르 염산염 20.0 g (0.119 mol)을 DMF 80 mL을 가하여 녹인 후 2 내지 5℃로 냉각하였다. 반응물에 트리에틸아민 36.4 mL (0.239 mol)를 서서히 가한 후 30분 동안 2 내지 5℃의 온도를 유지하면서 교반하였다. 별도의 용기에서 4-브로모메틸-2'-(1-디에틸에테르-테트라졸-5-일)-바이페닐 50.8 g(0.131 mol)을 DMF 250 mL에 녹인 용액을, 상기 반응액에 30분 동안 2 내지 5℃의 온도를 유지하면서 가한 후 반응액을 2 내지 3시간 더 교반하였다. 반응이 종료되면 반응물에 정제수 500 mL를 가한 후 에틸아세테이트 700 mL로 추출하고 수층을 다시 재추출한 후 유기층을 합한 후 정제수 500 mL로 세척하였다. 연속해서 포화소금물로 세척하고 황산마그네슘으로 잔류수분을 제거한 후 감압 농축하여 무색 오일의 표제 화합물을 43.6 g (수율 83.5%, 순도 98.8% 이상 HPLC Area %) 수득하였다. 20.0 g (0.119 mol) of L-valinemethylester hydrochloride was dissolved by adding 80 mL of DMF at room temperature under nitrogen, and then cooled to 2 to 5 ° C. 36.4 mL (0.239 mol) of triethylamine was slowly added to the reaction, followed by stirring while maintaining a temperature of 2 to 5 ° C for 30 minutes. In a separate vessel, a solution of 50.8 g (0.131 mol) of 4-bromomethyl-2 '-(1-diethylether-tetrazol-5-yl) -biphenyl in 250 mL of DMF was added to the reaction solution. After the addition was performed while maintaining the temperature of 2 to 5 ° C., the reaction solution was further stirred for 2 to 3 hours. After the reaction was completed, 500 mL of purified water was added to the reaction mixture, followed by extraction with 700 mL of ethyl acetate. The aqueous layer was reextracted, and the organic layers were combined and washed with 500 mL of purified water. After successively washing with saturated brine, removing residual moisture with magnesium sulfate and concentrating under reduced pressure to give 43.6 g (yield 83.5%, purity 98.8% or more HPLC Area%) of the title compound as a colorless oil.

1H NMR(CDCl3) δ 7.7∼7.5 (m, 2H), 7.4∼7.3 (m, 2H), 7.3∼7.1 (m, 4H), 5.25 (t, 1H), 3.83 (s, 2H), 3.71 (s, 3H), 3.46 (m, 2H), 2.66 (m, 1H), 1.0∼1.8 (m, 12H) 1 H NMR (CDCl 3 ) δ 7.7 to 7.5 (m, 2H), 7.4 to 7.3 (m, 2H), 7.3 to 7.1 (m, 4H), 5.25 (t, 1H), 3.83 (s, 2H), 3.71 (s, 3H), 3.46 (m, 2H), 2.66 (m, 1H), 1.0-1.8 (m, 12H)

실시예 5. (S)-3-메틸-2-[[N-펜타노일-2'-(1-디에틸에테르-테트라졸-5-일)-바이페닐-4-일-메틸]-아미노]-부티르산 메틸 에스테르Example 5. (S) -3-Methyl-2-[[ N -pentanoyl-2 '-(1-diethylether-tetrazol-5-yl) -biphenyl-4-yl-methyl] -amino ] -Butyric acid methyl ester

Figure 112009020459058-pat00012
Figure 112009020459058-pat00012

메탄올 80 mL와 정제수 60 mL를 혼합한 혼합용매에, (S)-3-메틸-2-[[2'-(1-디에틸에테르테트라졸-5-일)-바이페닐-4-일-메틸]-아미노]-부티르산 메틸 에스테르 40 g (0.091 mol)을 녹인 후 0℃로 냉각하였다. 20% 농도의 NaOH 수용액을 사용하여 반응물의 pH를 8.5 내지 9.0으로 조정하였다. 별도의 용기에서 에틸아 세테이트 80 mL에 발레릴 클로라이드 13.0 mL (0.109 mol)를 녹인 용액을, 0℃의 온도를 유지하면서 20분간 가하였다. 반응 중 계속해서 반응물의 pH는 8.5 내지 9.0로 유지하여 주었다. 발레릴 클로라이드 용액이 첨가가 완료되면 30분간 더 교반한 후 에틸아세테이트 200 mL 더 가한 후 층분리하여 수층을 제거하였다. 유기층은 포화소금물로 세척하고 황산마그네슘으로 잔류 수분을 제거한 후 감압 농축하여 고순도 (99.2%, HPLC area %)의 무색의 목적물을 정량적으로 수득하였다.To a mixed solvent of 80 mL of methanol and 60 mL of purified water, (S) -3-methyl-2-[[2 '-(1-diethylethertetrazol-5-yl) -biphenyl-4-yl- 40 g (0.091 mol) of methyl] -amino] -butyric acid methyl ester was dissolved and then cooled to 0 ° C. The pH of the reaction was adjusted to 8.5-9.0 using 20% NaOH aqueous solution. In a separate vessel, a solution of 13.0 mL (0.109 mol) of valeryl chloride dissolved in 80 mL of ethyl acetate was added for 20 minutes while maintaining a temperature of 0 ° C. During the reaction, the pH of the reactants was continuously maintained at 8.5 to 9.0. After the valeryl chloride solution was added, the solution was further stirred for 30 minutes, followed by adding 200 mL of ethyl acetate, and then separating the aqueous layer by layer separation. The organic layer was washed with saturated brine, removed residual water with magnesium sulfate, and concentrated under reduced pressure to quantitatively obtain a colorless target of high purity (99.2%, HPLC area%).

1H NMR(CDCl3) δ 7.86 (m, 1H), 7.6∼7.4 (m, 4H), 7.3∼7.0 (m, 4H), 5.9 (m, 1H), 4.9 (m, 1H), 4.6 (s, 2H), 4.3 (m, 1H), 4.0∼4.1 (m, 1H), 3.45 (s, 3H), 3.2∼3.4 (m, 3H), 2.19 (t, 2H), 0.7∼1.8(m, 17H) 1 H NMR (CDCl 3 ) δ 7.86 (m, 1H), 7.6 to 7.4 (m, 4H), 7.3 to 7.0 (m, 4H), 5.9 (m, 1H), 4.9 (m, 1H), 4.6 (s , 2H), 4.3 (m, 1H), 4.0 to 4.1 (m, 1H), 3.45 (s, 3H), 3.2 to 3.4 (m, 3H), 2.19 (t, 2H), 0.7 to 1.8 (m, 17H )

실시예 6. (S)-3-메틸-2-[[N-펜타노일-2'-(1-디에틸에테르-테트라졸-5-일)-바이페닐-4-일-메틸]-아미노]-부티르산 메틸 에스테르Example 6. (S) -3-Methyl-2-[[ N -pentanoyl-2 '-(1-diethylether-tetrazol-5-yl) -biphenyl-4-yl-methyl] -amino ] -Butyric acid methyl ester

Figure 112009020459058-pat00013
Figure 112009020459058-pat00013

메탄올 80 mL와 정제수 10 mL를 혼합한 혼합용매에, 실온에서 L-발린메틸에스테르 염산염 20.0 g (0.119 mol)을 가한 후 2 내지 5℃로 냉각하였다. 20% 농도의 NaOH 수용액을 사용하여 반응물의 pH를 8.5 내지 9.0으로 조정하였다. 별도의 용기에서 4-브로모메틸-2'-(1-디에틸에테르-테트라졸-5-일)-바이페닐 50.8 g (0.131 mol)을 에틸아세테이트 250 mL에 녹인 용액을, 상기 반응물에 30분 동안 2 내지 5℃의 온도를 유지하면서 가하였다. 5% 농도의 NaOH 수용액을 사용하여 반응물의 pH를 8.5 내지 9.0로 유지하도록 주의 있게 보정한 후, 2 내지 5℃의 온도에서 30분 동안간 더 교반하였다. 별도의 용기에서 에틸아세테이트 80 mL에 발레릴 클로라이드 6.5 mL (0.054 mol)를 녹이고, 5% 농도의 NaOH 수용액을 사용하여 반응물의 pH를 8.5 내지 9.0으로 조정한 후에, 상기 반응물에 20분 동안 2 내지 5℃의 온도를 유지하면서 가하였다. 반응 중 계속해서 반응물의 pH는 8.5 내지 9.0로 유지하여 주었다. 발레릴 클로라이드 용액이 첨가가 완료되면 30분간 더 교반한 후 에틸아세테이트 200 mL 더 가한 후 층분리하여 수층을 제거하였다. 유기층은 포화소금물로 세척하고 황산마그네슘으로 잔류 수분을 제거한 후 감압 농축하여 고순도 (99.7%, HPLC area %)의 무색의 표제 화합물을 55.8 g (89.8%) 수득하였다.To a mixed solvent of 80 mL of methanol and 10 mL of purified water, 20.0 g (0.119 mol) of L-valinemethyl ester hydrochloride was added at room temperature, followed by cooling to 2 to 5 ° C. The pH of the reaction was adjusted to 8.5-9.0 using 20% NaOH aqueous solution. In a separate vessel, a solution of 50.8 g (0.131 mol) of 4-bromomethyl-2 '-(1-diethylether-tetrazol-5-yl) -biphenyl in 250 mL of ethyl acetate was added to the reaction product. It was added while maintaining a temperature of 2-5 ° C. for minutes. The pH of the reaction was carefully calibrated to maintain 8.5-9.0 using 5% NaOH aqueous solution, followed by further stirring at a temperature of 2-5 ° C. for 30 minutes. Dissolve 6.5 mL (0.054 mol) of valeryl chloride in 80 mL of ethyl acetate in a separate vessel, adjust the pH of the reaction to 8.5-9.0 with 5% aqueous NaOH solution, and then add to the reaction for 2 to 20 minutes. It added while maintaining the temperature of 5 degreeC. During the reaction, the pH of the reactants was continuously maintained at 8.5 to 9.0. After the valeryl chloride solution was added, the solution was further stirred for 30 minutes, followed by adding 200 mL of ethyl acetate, and then separating the aqueous layer by layer separation. The organic layer was washed with saturated brine, removed residual water with magnesium sulfate, and concentrated under reduced pressure to give 55.8 g (89.8%) of a colorless title compound having high purity (99.7%, HPLC area%).

1H NMR(CDCl3) δ 7.86 (m, 1H), 7.6∼7.4 (m, 4H), 7.3∼7.0 (m, 4H), 5.9 (m, 1H), 4.9 (m, 1H), 4.6 (s, 2H), 4.3 (m, 1H), 4.0∼4.1 (m, 1H), 3.45 (s, 3H), 3.2∼3.4 (m, 3H), 2.19 (t, 2H), 0.7∼1.8 (m, 17H) 1 H NMR (CDCl 3 ) δ 7.86 (m, 1H), 7.6 to 7.4 (m, 4H), 7.3 to 7.0 (m, 4H), 5.9 (m, 1H), 4.9 (m, 1H), 4.6 (s, 2H), 4.3 (m, 1H), 4.0 to 4.1 (m, 1H), 3.45 (s, 3H), 3.2 to 3.4 (m, 3H), 2.19 (t, 2H), 0.7 to 1.8 (m, 17H)

실시예 7. 발사르탄Example 7 Valsartan

Figure 112009020459058-pat00014
Figure 112009020459058-pat00014

(S)-3-메틸-2'-[N-펜타노일-(1-디에틸에테르-테트라졸-5-일)-바이페닐-4-일-메틸)-아미노]-부티르산 메틸 에스테르 45 g (0.086 mol)을 MeOH 270 mL에 녹인 후 0℃로 냉각하였다. 반응물에 20% 농도의 NaOH 수용액으로 pH 11로 조정한 후 온도를 유지하면서 1.5 내지 2시간동안 교반하면서 가수분해하였다. 가수분해 반응의 완결 싯점은 HPLC 모니터링으로 출발물질이 존재가 확인되지 않은 때로 결정하였다. 출발물질의 존재가 확인되지 않으면, 2M-HCl 수용액을 사용하여 반응물의 pH를 2 내지 3으로 조정하고, 10분 동안 더 교반하여 탈보호하였다. 탈보호 반응의 완결 싯점 역시 HPLC 모니터링으로 가수분해물의 존재가 확인되지 않은 때로 결정하였다. 가수분해물의 존재가 확인되지 않으면, 반응물을 감압 농축하였다. 그리고, 에틸아세테이트에 녹인 후 정제수, 포화소금물로 순차적으로 세척한 후 황산마그네슘으로 잔류수분을 제거하고 감압 농축하여 고순도(99.3%, HPLC area %)의 백색 고체의 표제 화합물을 정량적으로 수득하였다.45 g of (S) -3-methyl-2 '-[ N -pentanoyl- (1-diethylether-tetrazol-5-yl) -biphenyl-4-yl-methyl) -amino] -butyric acid methyl ester (0.086 mol) was dissolved in 270 mL of MeOH and cooled to 0 ° C. The reaction was adjusted to pH 11 with a 20% aqueous NaOH solution and then hydrolyzed with stirring for 1.5 to 2 hours while maintaining the temperature. The completion point of the hydrolysis reaction was determined when HPLC monitoring did not confirm the presence of starting material. If the presence of starting material was not found, the pH of the reaction was adjusted to 2-3 using an aqueous 2M-HCl solution and further stirred for 10 minutes to deprotect. The completion point of the deprotection reaction was also determined when HPLC monitoring did not confirm the presence of the hydrolyzate. If no presence of the hydrolyzate was found, the reaction was concentrated under reduced pressure. Then, the resultant was dissolved in ethyl acetate, washed sequentially with purified water and saturated brine, and then residual moisture was removed with magnesium sulfate and concentrated under reduced pressure to quantitatively obtain the title compound as a white solid having a high purity (99.3%, HPLC area%).

1H NMR(acetone-d 6) δ 7.78 (d, 1H), 7.6∼7.5 (m, 3H), 7.5∼6.9 (m, 4H), 4.4∼4.8 (m, 3H), 2.7∼2.5 (m, 1H), 2.5∼2.2 (m, 2H), 1.7∼1.5 (m, 2H), 1.5∼ 1.2 (m, 2H), 1.0∼0.7 (m, 9H) 1 H NMR (acetone- d 6 ) δ 7.78 (d, 1H), 7.6 to 7.5 (m, 3H), 7.5 to 6.9 (m, 4H), 4.4 to 4.8 (m, 3H), 2.7 to 2.5 (m, 1H), 2.5-2.2 (m, 2H), 1.7-1.5 (m, 2H), 1.5-1.2 (m, 2H), 1.0-0.7 (m, 9H)

본 발명은 발사르탄(valsartan) 제조에 있어, 4-톨루엔-2'-(테트라졸-5-일)-벤젠을 출발물질로 사용하고, 상기한 출발물질의 테트라졸 보호기로서 에틸비닐에테르 시약을 선택 사용하고, L-발린메틸에스테르 염산염과의 결합반응 및 발레릴 클로라이드와의 N-알킬화 반응이 유기용매 조건은 물론이고 수용액 조건에서도 원활하게 수행되도록 한데 그 특징이 있다.The present invention uses 4-toluene-2 '-(tetrazol-5-yl) -benzene as a starting material in the preparation of valsartan, and selects ethyl vinyl ether reagent as the tetrazole protecting group of the starting material. It is characterized in that the coupling reaction with L-valinemethyl ester hydrochloride and the N- alkylation reaction with valeryl chloride are performed smoothly in an aqueous solution condition as well as an organic solvent condition.

이로써, 본 발명은 종래 발사르탄의 일반적 제조방법이 맹독성이면서 취급주의가 요구되는 시약을 사용하고, 반응종료 후에도 불순물로 잔존하여 목적물의 순도 저하 원인이 되어, 산업적으로 적용하는데 한계가 있었던 문제를 한꺼번에 해소시킬 수 있었다.As a result, the present invention uses a reagent which requires the precautions for handling the conventional valsartan, which is highly toxic, and remains as an impurity even after the completion of the reaction, causing the purity of the target to be deteriorated, thereby eliminating the problem of limitations in industrial application. I could make it.

따라서, 본 발명은 고혈압 치료제로서 알려진 발사르탄(Valsartan)의 대량생산을 위한 방법으로서 유용하다.Therefore, the present invention is useful as a method for mass production of Valsartan, known as a therapeutic agent for hypertension.

Claims (11)

삭제delete 삭제delete 삭제delete 삭제delete 삭제delete 삭제delete 삭제delete 삭제delete 하기 화학식 5로 (S)-3-메틸-2-[[2'-(1-디에틸에테르-테트라졸-5-일)-바이페닐-4-일-메틸]-아미노]-부티르산 메틸 에스테르.To (S) -3-methyl-2-[[2 '-(1-diethylether-tetrazol-5-yl) -biphenyl-4-yl-methyl] -amino] -butyric acid methyl ester .
Figure 112009020459058-pat00019
Figure 112009020459058-pat00019
하기 화학식 7로 표시되는 (S)-3-메틸-2-[[N-펜타노일-2'-(1-디에틸에테르-테트라졸-5-일)-바이페닐-4-일-메틸]-아미노]-부티르산 메틸 에스테르.(S) -3-methyl-2-[[ N -pentanoyl-2 '-(1-diethylether-tetrazol-5-yl) -biphenyl-4-yl-methyl] represented by the following formula (7): -Amino] -butyric acid methyl ester.
Figure 112009020459058-pat00020
Figure 112009020459058-pat00020
하기 화학식 8로 표시되는 (S)-3-메틸-2-[[N-펜타노일-2'-(1-디에틸에테르-테트라졸-5-일)-바이페닐-4-일-메틸]-아미노]-부티르산.(S) -3-methyl-2-[[ N -pentanoyl-2 '-(1-diethylether-tetrazol-5-yl) -biphenyl-4-yl-methyl] represented by the following formula (8): -Amino] -butyric acid.
Figure 112009020459058-pat00021
Figure 112009020459058-pat00021
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