KR100924763B1 - Chemical supplying apparatus - Google Patents

Abstract

According to the present invention, the second connecting connector and the part of the chemical supply pipe adjacent to the second connecting connector installed in the chemical storage tank and the chemical remaining in the part of the chemical supply pipe adjacent thereto are purged when the chemical storage tank is replaced. By installing heat transfer prevention means for preventing the transfer of heat heated by the heater on the chemical supply pipe at the rear end of the heater in the direction of chemical flow during heating, the chemical properties of the chemical supplied into the process chamber or process tank are not changed. Provide a chemical feeder.

Chemical, Heat Transfer, Tank, Replacement

Description

Chemical Supply Unit {CHEMICAL SUPPLYING APPARATUS}

The present invention relates to a chemical supply device, and more particularly, to a second connection connector installed in the chemical storage tank and a second connection connector for purging the remaining chemical in a portion of the chemical supply pipe adjacent thereto when the chemical storage tank is replaced. And a heat transfer prevention means for preventing a heat transmitted by the heater from being transferred to the chemical supply pipe at the rear end of the heater in the direction of the chemical flow when the part of the chemical supply pipe adjacent thereto is heated by the heater. It relates to a chemical feeder such that the chemical properties of the chemicals supplied into it are not changed.

In general, processes such as etching, etching, diffusion, chemical vapor deposition, and metal deposition for manufacturing a semiconductor device, respectively, form a specific process atmosphere to cause chemicals to be supplied on a wafer or a glass substrate to react or to assist the reaction. Is the alternative.

In the semiconductor device manufacturing process, the chemical acts as a key variable for determining the characteristics of the semiconductor device to be manufactured, and thus requires conditions such as a stable process range, chemical supply amount, supply pressure, and high purity in the course of the process.

On the other hand, there are various types of chemicals as described above depending on the characteristics of the process, and here it is difficult to exist as a gas in the natural state, but the description will be made to supply by mixing the inert gas to the chemical that the flow according to the supply is unnatural. Shall be.

In addition, as an example of the above-mentioned chemicals, phase change from a liquid state such as TiCL4 (titanium tetrachloride) used to form an electrode film such as a capacitor is carried out in a gaseous state. Use helium (He) or nitrogen. In addition, the chemical can be used in the CVD process of the LCD manufacturing process, specifically, when depositing an insulating film between the electrode of the capacitor (Capacitor) on the glass substrate, in addition to TiCL4 (titanium tetrachloride), C3H9SiCL ( Trimethylchlorosilane; TMCS), C8H24N4Ti (tetrakisitanium; TDMAT), C8H20O4SI (ethyl silicate; TEOS), C3H9BO3 (trimethylboric acid; TMB), (CH3) 3PO4 (trimethylphosphate; TMPO) can be used. .

Chemical supply apparatus according to the prior art, as shown in Figure 1, the inert gas supply pipe 10 for supplying an inert gas; A chemical supply pipe 20 for supplying chemicals; The tank part 31 in which the chemical is stored in the inner space is integrally formed on one side of the tank part 31 so as to communicate the inside and the outside of the tank part 31 and to be detachable from the inert gas supply pipe 10. An inert gas which is integrally formed on the other side of the first connecting connecting pipe 32 and the tank part 31 to be connected and detachably connected to the chemical supply pipe 20 and supplied through the inert gas supply pipe 10. A chemical storage tank 30 including a second connection connecting pipe 33 for supplying the chemical stored in the tank part 31 to the chemical supply pipe 20 by the pressure of the gas; When the chemical storage tank 30 is replaced, when the chemical residue remaining in the second connecting connector 33 and a part of the chemical supply pipe 20 adjacent thereto is purged using the residual chemical purge means 40, the interface adhesion between the chemicals is carried out. It consists of a heater 50 for heating the second connection connecting pipe 33 and a portion of the chemical supply pipe 20 adjacent thereto so as to reduce the sex.

Here, the residual chemical purge means 40 is the first connection connecting pipe 32 and the second in order to replace the chemical storage tank 30 stored in a certain amount or more when the residual chemical stored in the tank 31 is less than a certain amount When the connection connecting pipe 33 is separated from the inert gas supply pipe 10 and the chemical supply pipe 20, respectively, the chemical remaining in the second connection connecting pipe 33 and the chemical supply pipe 20 adjacent thereto leaks into the air of the workplace. It serves to spread to a safe place to prevent adverse effects on the human body of the worker.

The residual chemical purge means 40 is, for example, branched from the purge pipe 41 branched to the inert gas supply pipe 10 and the inert gas supply pipe 10 upstream of the purge pipe 41 to the chemical supply pipe 20. The first bypass pipe 42 to be joined, the first diverter valve V1 provided at the branch of the inert gas supply pipe 10 and the purge pipe 41, the first bypass pipe 42 and the chemical On the second connecting valve V2 provided on the confluence of the supply pipe 20, on the third connecting valve 32 provided on the first connecting pipe 32, and on the second connecting connecting pipe 32. A fourth opening / closing valve (V4) provided on the second opening valve (V4) provided on the inert gas supply pipe (10) between the third opening / closing valve (V3) and the first direction switching valve (V1), Sixth open / close valve (V6), fifth open / close valve (V5) and third open / close valve (V3) provided on the chemical supply pipe (20) between the four open / close valve (V4) and the second directional control valve (V2). Branched from the inert gas supply pipe 10 between the sixth The second bypass pipe 43 joined to the chemical supply pipe 20 between the closed valve V6 and the fourth open / close valve V4, and the seventh open valve V7 provided on the second bypass 43. It consists of).

The tank part 31 of the chemical storage tank 30 by using the supply pressure of the inert gas supplied through the inert gas supply pipe 10 according to the opening and closing state of the valves constituting the residual chemical purge means 40 configured as described above And the chemical storage tank 30 can be replaced by purging the residual chemical in the chemical supply pipe 20 to the front end of the second connecting connector 33 and the second directional valve V2 through the purge pipe 41. do. In addition, when the chemical storage tank 30 in which a predetermined amount or more of chemicals are stored in the tank 31 is newly replaced, the inert gas supply pipe 10 is reversed when the valve constituting the residual chemical purge means 40 is opened and closed. The chemical in the tank 31 is supplied through the chemical supply pipe 20 by the pressure of the inert gas supplied through).

On the other hand, the chemical supplied through the chemical supply pipe 20 can be configured to be supplied directly to the process chamber 60, when configuring the system in this way, the residual amount of the chemical in the chemical storage tank 30 is less than the set value When necessary, the chemical storage tank 30 should be replaced with a new one. In this case, there is a problem in that the process chamber must be stopped to replace the chemical storage tank 30.

To this end, a separate auxiliary process tank 50 is provided so that the chemical storage tank 30 can be replaced without stopping operation of the process chamber, and the chemical supply pipe 20 is extended to process the tank 50. It is configured to supply a certain amount of chemicals into. In addition, a chemical final supply pipe 51 is installed in the process tank 50 so that the chemical is supplied to the process chamber, and a separate inert gas is disposed so that the chemical stored in the process tank 50 is discharged through the chemical final supply pipe 51. The supply pipe 52 is installed in the process tank 50.

Therefore, the inert gas is introduced into the process tank 50 in which the chemical is stored, and the chemical is supplied to the process chamber 60 through the chemical final supply pipe 51 by the pressure of the inert gas introduced into the process tank 50. By doing so, the chemical stored in the process tank 50 can be supplied to the process chamber 60 during the replacement of the chemical storage tank 30 so that the operation of the manufacturing equipment is not interrupted.

However, according to the aforementioned chemical supply apparatus according to the related art, when the chemical storage tank 30 is replaced, the chemical residue remaining in the second connection connecting pipe 33 and a part of the chemical supply pipe 20 adjacent thereto is retained. Before purging by using 40, the inner wall surface of the second connecting connector 33 and the chemical supply pipe 20 adjacent thereto and the inner wall surface of the second direction switching valve V2 and the sixth switching valve V6 In order to reduce the interfacial adhesion between the second connecting connecting pipe 33 and a portion of the chemical supply pipe 20 adjacent thereto, the second direction switching valve (V2) and the sixth switching valve (V6) to the heater 50 Heating to a high temperature to perform a cleaning operation to completely purge the chemical bonded to the inner wall surface of the second connection connecting pipe 33 and the chemical supply pipe 20 adjacent thereto, wherein the material of the chemical supply pipe 20 is chemical resistance Because this strong stainless steel (SUS) is used The problem is that the high temperature heat heated by the heater 50 is thermally conducted along the chemical supply pipe 20 to change the chemical properties of the chemical supplied into the process chamber 60 or the process tank 50.

The present invention has been made to solve the above problems, and when the chemical storage tank is replaced, the second connection connection to purge the remaining chemicals in the second connecting connector and the chemical supply pipe adjacent to the chemical storage tank installed thereon Process chamber or process by installing a heat transfer preventing means for preventing the heat heated by the heater from being transferred to the chemical supply pipe at the rear end of the heater when heating the pipe and a portion of the chemical supply pipe adjacent thereto by the heater. It is an object of the present invention to provide a chemical supply device in which the chemical properties of the chemicals supplied into the tank are not changed.

The present invention for achieving the above object, the inert gas supply pipe for supplying an inert gas; A chemical supply pipe for supplying chemicals; A tank unit in which a chemical is stored in an inner space, a first connection connecting tube which is integrally formed at one side of the tank unit and communicates inside and outside of the tank unit and is detachably connected to the inert gas supply pipe, and the tank A second connection connection which is integrally formed at the other side of the part so as to be detachably connected to the chemical supply pipe, and that the chemical stored in the tank part is supplied to the chemical supply pipe by the pressure of the inert gas supplied through the inert gas supply pipe. A chemical storage tank comprising a tube; A chemical consisting of a heater that heats a portion of the second connecting connector and the chemical supply tube adjacent thereto to purge the remaining chemical in the second connecting connector and a portion of the chemical supply tube adjacent thereto when the chemical storage tank is replaced. The supply apparatus, characterized in that the heat transfer preventing means for preventing the heat heated by the heater is transferred on the chemical supply pipe in the rear end of the heater in the flow direction of the chemical.

According to the chemical supply apparatus according to the present invention, the second connecting connector and the adjacent connecting connector to purge the chemical remaining in the part of the chemical supply pipe adjacent to the second connecting connector installed in the chemical storage tank when the chemical storage tank is replaced; The chemical is supplied into the process chamber or the process tank by installing heat transfer preventing means for preventing the transfer of heat heated by the heater on the chemical supply pipe at the rear of the heater in the direction of the chemical flow when heating a part of the chemical supply pipe to the heater. The chemical nature of the will not change.

Hereinafter, a preferred embodiment of the chemical supply apparatus according to the present invention will be described in detail with reference to the accompanying drawings. Here, in order to emphasize the gist of the present invention, a description of a technology overlapping with the prior art will be omitted, and the same member number is assigned to the same structural member as the prior art.

2 is a view showing the configuration of the chemical supply apparatus according to the present invention.

An inert gas supply pipe 10 for supplying an inert gas; A chemical supply pipe 20 for supplying chemicals; The tank part 31 in which the chemical is stored in the inner space and the tank part 31 are integrally formed so as to communicate the inside and the outside of the tank part 31 and to be detachably attached to the inert gas supply pipe 10. An inert gas which is integrally formed on the other side of the first connecting connecting pipe 32 and the tank part 31 to be connected and detachably connected to the chemical supply pipe 20 and supplied through the inert gas supply pipe 10. A chemical storage tank 30 including a second connection connecting pipe 33 for supplying the chemical stored in the tank part 31 to the chemical supply pipe 20 by the pressure of the; Second connection connector to purge the chemical remaining in the second connecting connector 33 and a portion of the chemical supply pipe 20 adjacent to the chemical storage tank 30 by using the residual chemical purging means 40. (33) and a chemical feeding device comprising a heater 50 for heating a portion of the chemical supply pipe 20 adjacent thereto, wherein the heater 50 is disposed on the chemical supply pipe 20 behind the heater 50 in the flow direction of the chemical. Heat transfer preventing means 70 is installed to prevent the heat transmitted by the heat transfer.

Heat transfer preventing means 70 according to the present invention, by separating the chemical supply pipe 20 of the rear end of the heater 50, both ends are detachably coupled to each of the separated end.

The heat transfer preventing means 70 includes a heat transfer prevention tube 72 having a chemical supply passage 71 penetrated therein, and coupling flanges 73 and 74 formed at both ends of the heat transfer prevention tube 72, respectively. A fastening flange 22 corresponding to the coupling flanges 73 and 74 is formed at each end 21 separated from the supply pipe 20, and the coupling flange 73 is formed through a chemical leakage preventing ring (not shown). 74 and the fastening flange 22 are fastened to each other by means of fastening means such as a conventional bolt (not shown).

The heat transfer preventing means 70 according to the present invention preferably uses a material having a low thermal conductivity, for example, Teflon is used.

In addition, the inert gas according to the present invention may use helium, the chemical may use TiCL4 in a liquid state, and other chemicals for manufacturing a semiconductor device may be used without using the chemical as TiCL4.

Referring to the operation of the present invention configured as described above are as follows.

When the chemical storage tank 30 is replaced, the second connecting connector 33 before purging the remaining chemical in the portion of the second connecting connector 33 and the adjacent chemical supply pipe 20 by using the residual chemical purging means 40. (33) and the second connecting connector so that the interfacial adhesion between the inner wall of the chemical supply pipe 20 and the inner wall of the second direction switching valve V2 and the sixth open / close valve V6 and the chemical is reduced. (33) and a portion of the chemical supply pipe 20 adjacent thereto are heated to a high temperature with the heater 50 to completely remove the chemical bonded to the inner wall surface of the second connecting connector 33 and the chemical supply pipe 20 adjacent thereto. A purge operation is performed.

At this time, since the material of the chemical supply pipe 20 uses stainless steel (SUS) having strong chemical resistance, even if the high temperature heat heated by the heater 50 is partially heat-conducted along the chemical supply pipe 20 in the chemical flow direction, By the heat transfer preventing means 70 according to the invention it is possible to prevent the heat transfer to the process chamber 60 or the process tank 50 side.

That is, since the chemical supply pipe 20 of the present invention is separated and spaced apart and the heat transfer prevention means 70 is installed therebetween, heat generated in the heater 50 is not transmitted.

In other words, since the material of the heat transfer prevention tube 72 constituting the heat transfer prevention means 70 uses a very low thermal conductivity such as Teflon, the heat generated from the heater 50 is transferred to the process chamber 60 or the process tank ( It is possible to effectively block the heat transfer to the 50) side.

Therefore, the chemical properties of the chemicals supplied into the process chamber 60 or the process tank 50 are not changed.

On the other hand, the present invention in the chemical supply pipe 20 corresponding to the lower side of the heat transfer preventing means 72 in the downward direction in preparation for the emergency state in which the chemical leakage from the coupling portion of the heat transfer preventing means 72 and the chemical supply pipe 20 A chemical receiver 80 may be installed to temporarily store the chemicals flowing down into the chemical receiver, and a chemical outflow sensor (not shown) that detects whether the chemical is leaked by detecting whether the chemical receiver 80 is accommodated in the chemical receiver 80. Can be installed.

1 is a view showing the configuration of a chemical supply apparatus according to the prior art.

2 is a view showing a configuration of a chemical supply apparatus according to the present invention.

3 is a cross-sectional view showing a connection relationship between the heat transfer preventing means and the chemical supply pipe according to the present invention.

<Description of the symbols for the main parts of the drawings>

10: inert gas supply pipe

20: chemical supply pipe

30: chemical storage tank

31 tank part

32: first connecting connector

33: second connecting connector

50: heater

70: heat transfer prevention means

71: chemical supply passage

72: heat transfer prevention tube

73,74: mating flange

Claims (5)

An inert gas supply pipe 10 for supplying an inert gas; A chemical supply pipe 20 for supplying chemicals; The tank unit 31 in which the chemical is stored in the inner space is integrally formed on one side of the tank unit 31 so as to communicate the inside and outside of the tank unit 31, and detachable from the inert gas supply pipe 10. The first connection connecting pipe 32 which is connected to the possible connection, and formed integrally on the other side of the tank portion 31 is detachably connected to the chemical supply pipe 20 and the inert gas supply pipe 10 A chemical storage tank (30) including a second connection connector (33) for supplying the chemical stored in the tank (31) to the chemical supply pipe (20) by the pressure of an inert gas supplied through the chemical supply pipe (20); When the chemical storage tank 30 is replaced, the second connection connector 33 and adjacent to the second connection connector 33 and a portion of the chemical supply pipe 20 adjacent thereto are purged. In the chemical supply device consisting of a heater 50 for heating a portion of the chemical supply pipe 20, Chemical transfer means characterized in that the heat transfer prevention means 70 is installed on the chemical supply pipe 20 in the rear end of the heater 50 in the flow direction of the chemical to prevent the heat heated by the heater 50 is transferred. Feeder. The method of claim 1, The heat transfer preventing means 70, Separating the chemical supply pipe 20 of the rear end of the heater 50, the chemical supply device, characterized in that both ends detachably coupled to the separated end (21). The method of claim 2, The heat transfer preventing means 70 is formed of a heat transfer preventing tube 72 through which the chemical supply passage 71 is penetrated therein, and coupling flanges 73 and 74 formed at both ends of the heat transfer preventing tube 72, respectively. A fastening flange 22 corresponding to the fastening flanges 73 and 74 is formed at each end 21 of the chemical supply pipe 20 so that the fastening flanges 73 and 74 and the fastening flange 22 are formed. Chemical supply apparatus characterized in that the fastening means to be fastened to each other. The method of claim 3, wherein The heat transfer preventing means 70 is a chemical supply device, characterized in that made of a low thermal conductivity material. The method of claim 4, wherein Chemical supply apparatus, characterized in that the material of the heat transfer preventing means 70 is Teflon.

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