KR100879599B1 - Reaction device, heat-insulating container, fuel cell device, and electronic apparatus - Google Patents

Abstract

The present invention provides a reactor body having first and second reactors, a container housing the reactor body, and at least the first reactor disposed on or inside the container. A first region and a second region located opposite the second reaction portion, wherein the first reaction portion is set at a temperature higher than that of the second reaction portion, and the first region is the reaction apparatus than the second region. Reactors having a high reflectance for hot rays radiated from a body portion are disclosed.

Reactor, Insulation Container, Reflective Film, Absorption Film, Opening

Description

Reactor, Insulation Container, Generator, and Electronic Device {REACTION DEVICE, HEAT-INSULATING CONTAINER, FUEL CELL DEVICE, AND ELECTRONIC APPARATUS}

The above and further objects, features and advantages of the present invention will become more apparent from the following detailed description taken in conjunction with the accompanying drawings. From here,

1 is a block diagram of a fuel cell apparatus 1 according to a first embodiment of the present invention.

2 is a cross-sectional view of a reaction device 10 according to the first embodiment of the present invention.

3 is a graph showing the relationship between the reflectance and the area of the heat dissipation promotion unit 40 and the thermal leak.

4 is a schematic diagram showing the relationship between infrared rays incident, reflected, and transmitted to the heat absorption film 32b.

5 is a graph showing a relationship between t and I (t) / (I-R).

6 is a graph showing the relationship between the wavelength of black body radiation and the radiation density.

7 is a graph showing reflectance with respect to the wavelength of Au, Al, Ag, Cu, Rh.

8 is a graph showing the results of measuring absorption coefficients of Ta-Si-O-N based films.

9 is a cross-sectional view showing a modification of the heat insulation container 30.

10 is a cross-sectional view showing a modification of the heat insulation container 30.

11 is a sectional view showing a modification of the heat insulation container 30.

12 is a cross-sectional view showing a modification (comparative example) of the heat insulation container 30.

13 is a sectional view showing a modification of the heat insulation container 30.

Fig. 14 is a schematic diagram showing the shape of the heat dissipation promotion parts 40 to 43;

Fig. 15 is a schematic diagram showing the shape of the heat dissipation promotion parts 40 to 43;

Fig. 16 is a schematic diagram showing the shape of the heat dissipation promotion parts 40 to 43;

Fig. 17 is a schematic diagram showing the shape of the heat dissipation promotion parts 40 to 43;

Fig. 18 is a schematic diagram showing the shape of the heat dissipation promotion parts 40 to 43;

Fig. 19 is a block diagram showing a fuel cell device 101 according to a second embodiment of the present invention.

20 is a perspective view of a reactor 110 according to a second embodiment of the present invention.

FIG. 21 is an XXI-XXI arrow cross-sectional view of FIG. 20; FIG.

22 is an exploded perspective view showing a reactor 110 according to a second embodiment of the present invention.

23 is a plan view of the first substrate 300.

24 is a plan view of the second substrate 400.

25 is a plan view of a third substrate 500.

26 is a plan view of a fourth substrate 600.

27 is a plan view of a fifth substrate 700.

Fig. 28 is a view showing the shape of the opening of the heat reflection film;

29 is a diagram illustrating another example of the shape of the opening of the heat reflection film.

30 is a diagram illustrating another example of the shape of the opening of the heat reflection film.

31 is a diagram showing another example of the shape of the opening portion of the heat reflection film.

32 is a diagram showing another example of the shape of the opening portion of the heat reflection film;

The perspective view which shows the other structural example of the reaction apparatus in 2nd Embodiment.

FIG. 34 is a perspective view of the reaction apparatus of the second embodiment, viewed from the side opposite to FIG. 33. FIG.

35 is a cross-sectional view taken along the line XXXV-XXXV in FIG. 33.

36 is a perspective view showing an example of the form of the fuel cell apparatuses 1, 101 according to the embodiment of the present invention.

37 is a perspective view showing an example of an electronic device 851 that uses the fuel cell devices 1 and 101 as power sources.

※ Explanation of symbols for main parts of drawing

10, 110: reactor 20, 120: main body of the reactor

21, 22: pipe 30: insulation container

35: heat dissipation window 40 to 43: heat dissipation accelerator

300: first substrate 400: second substrate

500: third substrate 600: fourth substrate

The present invention relates to a reactor and a heat insulation container, in particular, a reactor incorporating a reactor that requires different operating temperatures, such as a vaporizer, a reformer, a carbon monoxide remover used in a fuel cell device, to accommodate a reactor requiring a different operating temperature The present invention relates to a heat generating container, a reaction apparatus or a power generating device having a heat insulating container, and an electronic device including the power generating device.

Recently, fuel cells powered by hydrogen as a clean power source with high energy conversion efficiency have been applied to automobiles and portable devices. A fuel cell is a device that directly extracts electrical energy from chemical energy by electrochemically reacting fuel and oxygen in the atmosphere.

Although hydrogen is mentioned as a fuel used for a fuel cell, there exists a problem in handling and storage by being gas at normal temperature. In the case of using liquid fuels such as alcohols and gasoline, a vaporizer for vaporizing liquid fuel, a reformer for reforming the liquid fuel and high temperature steam, and a reformer for extracting hydrogen for power generation and a carbon monoxide remover for removing carbon monoxide, a byproduct of the reforming reaction, etc. Is needed.

In a fuel cell apparatus for reforming such liquid fuel, the operating temperature of the vaporizer and the carbon monoxide remover is, for example, less than about 100 to 180 ° C, whereas the operating temperature of the reformer is, for example, about 300 to 400 ° C or more. Although the heat of the reformer was significantly increased, the temperature of the vaporizer and the carbon monoxide remover increased, making it difficult to secure the temperature difference in the reactor.

Accordingly, a main object of the present invention is to provide a heat insulation container, a reaction device, a fuel cell device using the same, and an electronic device capable of securing a temperature difference between the reaction parts of a reaction device including two or more reaction parts.

 According to a first aspect of the present invention, there is provided a reactor main body having a first and a second reaction unit,

A container accommodating the reactor body,

A first region disposed in the vessel or inside the vessel, at least a first region positioned opposite the first reaction portion and a second region positioned opposite the second reaction portion,

The first reaction section is set at a higher temperature than the second reaction section, and the first section is provided with a reaction apparatus having a higher reflectance with respect to the hot wire radiated from the main body section than the second section.

According to a second aspect of the present invention, there is provided a first and second reaction part at different temperatures, wherein the first reaction part is the reaction apparatus main body part which is a reaction part having a higher temperature than the second reaction part,

A container accommodating the reactor body,

A first heat reflection film provided on an inner surface of the container and having a higher heat ray reflectance than the container;

A reaction apparatus is provided which is provided in a region located inside the first heat reflection film and opposed to the first reaction portion, and includes a second heat reflection film having a higher heat ray reflectance than the container.

According to a third aspect of the present invention, there is provided a reaction apparatus main body which causes a reaction of a reactant,

A heat reflection film provided opposite to an outer surface of the reactor main body and reflecting a heat ray radiated from the reactor main body;

The heat reflection film is provided with a reaction device provided with a heat dissipation facilitator for transmitting or absorbing at least a portion of the heating wire radiated from the reactor main body.

According to a fourth aspect of the present invention, there is provided a container for accommodating a reactor main body having first and second reaction parts at different temperatures;

And first and second regions having different heat ray reflectances provided in the container or inside the container,

The first reaction part is a reaction part having a temperature higher than that of the second reaction part, and the first area has a higher reflectance with respect to the heat rays radiated from the reactor main body part than the second area.

The first region is provided at least opposite to the first reaction portion, and the second region is provided with a heat insulation container provided opposite to the second reaction portion.

According to a fifth aspect of the present invention, there is provided a reactor main body portion having first and second reaction portions,

A container accommodating the reactor body,

A first region disposed in the vessel or inside the vessel, at least a first region positioned opposite the first reaction portion and a second region positioned opposite the second reaction portion, and generated by the reactor main body portion; And a power generation cell for generating power by fuel,

The first reactor is set at a temperature higher than that of the second reactor, and the first zone is provided with a power generator having a higher reflectance with respect to the hot wire radiated from the reactor main body than the second zone.

According to a sixth aspect of the present invention, there is provided a reactor main body portion having first and second reaction portions,

A container accommodating the reactor body,

A first region disposed in the vessel or inside the vessel, at least a first region positioned opposite the first reaction portion and a second region positioned opposite the second reaction portion, and generated by the reactor main body portion; And a power generation cell for generating power by fuel, and a power generation cell for generating power by fuel generated by the reactor body.

The first reaction section is set at a temperature higher than that of the second reaction section, and the first region is provided with an electronic device having a higher reflectance with respect to the hot wire radiated from the main body portion of the reactor than the second region.

EMBODIMENT OF THE INVENTION Below, preferred embodiment of this invention is described with reference to drawings. However, although various technically preferable limitations are attached to embodiment described below for implementing this invention, the scope of the present invention is not limited to the following embodiment and illustration example.

[First embodiment]

1 is a block diagram of a fuel cell device 1 to which the present invention is suitably applied. The fuel cell apparatus 1 includes a notebook personal computer, a mobile phone, a personal digital assistant (PDA), an electronic notebook, a watch, a digital still camera, a digital video camera, a game machine, an amusement apparatus, an electronic calculator and the like. It is installed in other electronic devices, and is used as a power source for operating the electronic device main body.

The fuel cell device 1 includes a fuel container 2, a reaction device 10, and a power generation cell 3. As will be described later, the reactor 10 and the power generation cell 3 are incorporated into the main body of the electronic device, the fuel container 2 is detachably installed with respect to the main body of the electronic device, and the fuel container 2 When mounted to the apparatus main body, fuel and water in the fuel container 2 may be supplied to the reactor 10 by a pump.

The fuel container 2 stores fuel and water, and supplies a mixture of fuel and water to the reactor 10 by a micropump not shown. As the fuel stored in the fuel container 2, a hydrocarbon-based liquid fuel can be applied. Specific examples thereof include alcohols such as methanol and ethanol, ethers such as dimethyl ether and gasoline. In the fuel container 2, fuel and water may be stored separately, or may be stored in a mixed state.

In addition, the following description demonstrates the case where methanol is used as a fuel, You may use another compound.

The reactor 10 includes a reactor main body 20 and a heat insulation container 30 in which the reactor main body 20 is accommodated.

The reactor main body 20 has a first reaction section 11 and a second reaction section 12. The first reaction unit 11 has a reformer 60, a catalytic combustion unit 80, and a high temperature heater (not shown). The second reaction unit 12 has a vaporizer 50, a carbon monoxide remover 70, and a low temperature heater (not shown).

The vaporizer 50 vaporizes fuel and water supplied from the fuel container 2. The reformer 60 reforms the vaporized fuel and water vapor supplied from the vaporizer 50 by a catalytic reforming reaction and generates a mixed gas containing hydrogen. The vaporizer 50 is a heat insulation container in FIG. Although the structure is in (30), the structure outside of the heat insulation container 30 may be sufficient.) When methanol is used as a fuel, it is a main product by the reforming reaction shown to the following chemical reaction formulas (1) and (2). A mixture gas of hydrogen gas, carbon dioxide gas and trace carbon monoxide is produced.

The carbon monoxide remover 70 is supplied with air in addition to the mixed gas supplied from the reformer 60. The carbon monoxide remover 70 selectively oxidizes and removes carbon monoxide in the mixed gas by a carbon monoxide removing reaction shown in chemical reaction formula (3) below with a catalyst. Hereinafter, the mixed gas from which the carbon monoxide has been removed is referred to as reformed gas.

CH ₃ OH + H ₂ O → 3H ₂ + CO ₂ ... (One)

H ₂ + CO ₂ → H ₂ O + CO... (2)

2CO + O ₂ → 2CO ₂ ... (3)

The power generation cell 3 generates electric energy by electrochemical reaction of hydrogen in reformed gas. Although not shown, the power generation cell 3 includes, for example, a fuel electrode carrying catalyst fine particles, an air electrode carrying catalyst fine particles, and a film-like solid polymer electrolyte membrane interposed between the fuel electrode and the air electrode. The reformed gas is supplied from the carbon monoxide remover 70 to the anode side of the power generation cell 3. As shown in the electrochemical reaction formula (4), hydrogen gas in the reformed gas is separated into hydrogen ions and electrons by a catalyst (catalyst fine particles) provided in the anode. Hydrogen ions move to the oxygen electrode side through the electrolyte membrane, and electrons move to the oxygen electrode through an external circuit. On the oxygen electrode side, as shown in the electrochemical reaction formula (5), water is generated by a chemical reaction between hydrogen ions passing through the electrolyte membrane, electrons supplied from the oxygen electrode via an external circuit, and oxygen gas supplied from the outside air. Electrical energy can be taken out from the difference between the electrode potentials of the fuel electrode and the oxygen electrode.

_{^{H 2 → 2H + + 2e -}} ... (4)

^{2H + + 2e - + 1 /} 2O 2 → H 2 O ... (5)

The mixed gas (hereinafter referred to as "off gas") containing hydrogen gas remaining without reacting the electrochemical reaction formula (4) at the anode side is supplied to the catalytic combustor 80.

The catalytic combustor 80 mixes and combusts oxygen in the fuel, water, or off-gas supplied from the fuel container 2 to cause the first reaction part 11 to be 250 ° C. or more (first temperature), for example, about 250 ° C. Heat to -400 degreeC. The high temperature heater heats the first reaction section 11 instead of the catalytic burner 80 at startup, and the low temperature heater heats the second reaction section 12 to about 110 to 190 ° C. (second temperature) at startup.

2 is a cross-sectional view of the reactor 10 according to the first embodiment of the present invention.

The first reaction unit 11 and the second reaction unit 12 are housed in a heat insulation container 30 described later. Between the 1st reaction part 11 and the 2nd reaction part 12, the piping 21 used as a flow path of a reactant or a product is provided (refer FIG. 2). In addition, the second reaction part 12 is provided with a pipe 22 for introducing a reactant from the outside of the heat insulating container 30 or outflowing the product out of the heat insulating container 30 (see FIG. 2).

The first reaction section 11, the second reaction section 12, and the pipes 21 and 22 may be formed by, for example, joining a metal plate such as stainless steel (SUS304) or Kovar alloy, or joining a glass substrate or the like. You may stick and form.

Next, the heat insulation container 30 in which the reactor main body 20 is accommodated is demonstrated. The heat insulation container 30 has a rectangular parallelepiped shape, and the 1st reaction part 11 and the 2nd reaction part 12 are accommodated inside. The first reaction part 11 and the second reaction part 12 are connected by a pipe 21, and the first reaction part 11 and the second reaction part 12 pass through the heat insulation container 30. It is fixed by 22.

The case 31 of the heat insulating container 30 may be formed by joining a metal plate such as stainless steel (SUS304) or a Kovar alloy, a glass substrate, or the like. The inner space of the heat insulation container 30 is maintained at low pressure (0.03 Pa or less) in order to prevent heat conduction and convection by gas molecules.

Moreover, the heat reflection film 32a which reflects infrared rays (heat rays) is formed in the inner wall surface of the case 31 in order to suppress the heat loss by the radiation from the reaction apparatus main body part 20. As shown in FIG. As the heat reflection film 32a, as shown in FIG. 7 mentioned later, the metal with high infrared reflectances, such as gold (Au), aluminum, silver, or copper, can be used, for example. The heat reflection film 32a can be formed by forming a film of these metals by a gas phase method such as sputtering or vacuum deposition. In the case where the heat reflection film 32a is made of gold, a layer such as chromium or titanium may be provided on the base as an adhesion layer.

According to these, the heat loss from the reactor main body 20 to the heat insulation container 30 outside can be suppressed.

Since the amount of heat conducts from the first reaction part 11 to the second reaction part 12 through the pipe 21, if the amount of heat equal to or more than the amount of heat conducting to the heat-insulating container 30 passes through the pipe 22, the temperature is appropriate. There is a risk of rising above the temperature. Therefore, the heat dissipation promotion part 40 is provided in the position corresponding to a 2nd reaction part in the inner wall surface of the heat insulation container 30 of this embodiment.

The heat dissipation promotion unit 40 is an area having a high absorption rate of infrared rays compared with other areas of the inner wall surface of the case 31, and absorbs infrared rays radiated from the second reaction unit 12 and conducts heat to the thermal insulation container 30 as heat. Let's do it. Thereby, the heat (heat leak) which escapes by the radiation from the 2nd reaction part 12 can be increased, and the temperature rise of the 2nd reaction part 12 can be reduced.

As shown in FIG. 2, for example, as shown in FIG. 2, the heat radiation promoting part 40 is provided inside the heat reflection film 32a facing the outer wall surface on which the pipes 21 and 22 of the second reaction part 12 are not provided. The heat absorption film 32b which absorbs infrared rays can be formed.

Hereinafter, the material, the film thickness, etc. which are used as the heat absorption film 32b are examined.

[1] review of reflectance

First, the reflectance of the heat radiation promotion part 40 is examined.

3 shows the relationship between the area of the heat dissipation promotion unit 40 and the thermal leakage (calculated value) when the reflectance of the heat dissipation promotion unit 40 with respect to infrared rays is changed by 10% between 10% and 90%. It is a graph (the graph at 20%-90% time is calculated based on the value at 10% time). Herein, it is assumed that the absorption coefficient of the heat absorption film 32b is sufficiently large, and it penetrates the heat absorption film 32b, reflects from the base or heat reflection film 32a, and passes through the heat absorption film 32b to insulate the heat insulating container ( 30) No infrared rays returning to the inside.

Moreover, the size of the 2nd reaction part 12 was 1.0 cm x 2.5 cm x 0.3 cm, and the distance of the 2nd reaction part 12 and the heat insulation container 30 was 0.5 cm. Moreover, both the heat inflow from the piping 21 and the heat outflow from the piping 22 were 0.90W, and the initial temperature of the 2nd reaction part 12 was 120 degreeC.

The amount of heat that escapes from the heat dissipation accelerator 40 by radiation is changed by the reflectance of the heat dissipation accelerator 40 and is proportional to the area thereof. Thus, by setting the heat dissipation promoting unit 40 in an appropriate reflectance and area in consideration of the amount of heat running off by radiation, the temperature distribution of the reaction apparatus main body 20 can be made desired.

For example, when the reflectance of the heat dissipation accelerator 40 is 10%, when the area of the heat dissipation accelerator 40 is 4.0 cm ² , the thermal leak is about 0.35 W, and the temperature of the second reaction part 12 is It can be seen that is going down to about 40 ℃, about 80 ℃.

This heat dissipation promoting part 40 is formed in a rectangular shape in this embodiment, and the area of the heat dissipation promoting part 40 becomes equal to the area corresponding to the side surface of the 2nd reaction part 12, for example.

[2] examination of absorption coefficient and film thickness

Next, the absorption coefficient and film thickness of the heat absorption film 32b in the case where the heat absorption film 32b is provided on the base of the case 31 or the heat reflection film 32a as the heat dissipation promotion unit 40 are examined. .

4 is a schematic diagram showing the relationship between the infrared rays incident, reflected, and transmitted on the heat absorption film 32b.

As shown in FIG. 4, the intensity of infrared rays incident on the heat absorption film 32b is represented by I, the intensity of infrared rays reflected on the surface of the heat absorption film 32b is R, and the absorption coefficient of the heat absorption film 32b is shown. If α is the distance (depth) from the surface of the heat absorption film 32b to t, the intensity I (t) of the infrared rays transmitted through the heat absorption film 32b at the position of the distance (depth) t is It is represented by the formula.

I (t) = (I-R) exp （-αt)

Fig. 5 shows the relationship between t and I (t) / (I-R) (= exp (-αt)) when α is set to 10000 / cm, 30000 / cm, 60000 / cm, and 100000 / cm.

In the case of α = 100000 / cm and t = about 230 nm, the intensity of infrared rays passing through the heat absorption film 32b is less than 10%. That is, if? T> about 2.3, the intensity of the infrared ray passing through the heat absorption film 32b is less than 10%, reflected by the base or heat reflection film 32a, and again transmitted through the heat absorption film 32b to insulate it. The infrared rays returned into the container 30 become less than 1%. Therefore, the film whose film thickness T becomes αT > about 2.3 is suitable as the heat absorption film 32b.

On the other hand, in the case of α = 100000 / cm and t = 25 nm, that is, in the case of αt = 0.25, the intensity of the infrared ray passing through the heat absorption film 32b is about 78%, and the under or heat reflective film 32a is used. The infrared rays that reflect and penetrate the heat absorbing film 32b and return to the heat insulating container 30 become about 61%, and thus are not suitable as the heat absorbing film 32b.

[3] review of radiation wavelengths

Next, the wavelength radiated from the reactor main body 20 is examined. 6 is a graph showing the relationship between the wavelength of black body radiation and the radiation density at 300K (27 ° C), 600K (327 ° C) and 900K (627 ° C). It can be seen that the radiation density increases at a wavelength of 2 μm or more (0.6 eV or less) at 600K, and the radiation density increases at a wavelength of 1.24 μm or more (1 eV or less) at 900K. Therefore, the heat radiation promotion part 40 is calculated | required that the reflectance of infrared rays with a wavelength of 1.24 micrometer or more is low.

[4] examination of metals and semimetals

Metal materials and semimetal materials generally have high reflectances, but have absorption coefficients of 10 ⁵ / cm or more at most wavelengths, and the film thickness of 230 nm is a candidate for the heat absorption film 32b. Therefore, the reflectances of metal materials and semimetal materials are examined.

Fig. 7 shows reflectances for the wavelengths of Au, Al, Ag, Cu, and Rh. Among these, the reflectance of Rh is relatively low in the wavelength region of 1.24 µm or more, which can be used as a candidate for the material of the heat absorption film 32b.

In addition, as a metal having low reflectance at a wavelength of 1.24 μm, Fe (75% reflectivity), Co (78% reflectance), Pt (78% reflectance), Cr (63% reflectance), and the like may be used as the material of the heat absorption film 32b. Can be.

In addition, as a semimetal and a material having low reflectance, graphite (layered carbon) is used. The reflectance of the graphite is small at 42% at 1.24 µm and 47% at 2 µm, so that the material of the heat absorption film 32b can be used. In addition, the carbon material called activated carbon has poor crystallinity, and the layered structure is also disturbed, but this may also be a candidate for the material of the heat absorption film 32b.

In addition, in any of the metal films of Au, Al, Ag, and Cu, the reflectance of infrared rays (wavelength 5 to 30 µm) generated in the temperature range of several hundred degrees Celsius, which is the operating temperature of the first reaction section 11, becomes almost 100%. have. For this reason, the metal film of any of Au, Al, Ag, and Cu is also suitable as the heat reflection film 32a.

[5] review of non-metallic materials

Many semiconductors have a reflectance of 10 to 20% or less in the wavelength range of 1.24 μm or more and can be considered as a suitable material for the heat absorption film 32b. In most cases, the absorption coefficient is less than 1 / cm. Extremely small

However, it can be considered that an amorphous semiconductor having a dangling bond has a high absorption coefficient and can be used as a material of the heat absorption film 32b. For example, in amorphous silicon having a large number of dangling bonds, the absorption coefficient is 1000 / cm or more and can be used as the material of the heat absorption film 32b.

In addition, there is a Ta-Si-ON-based film in an amorphous semiconductor material that is more suitable as the heat absorption film 32b. Fig. 8 shows the results of measuring absorption coefficients (cm ⁻¹ ) at 0.5 to 3.5 eV (wavelength of about 2.48 μm to 350 nm) for Ta-Si-ON films having resistivities of 1.0 mΩ · cm and 5.5 mΩ · cm. Indicates. The film having a resistivity of 1.0 m? · Cm has an absorption coefficient of about 100000 / cm or more within this measurement range, and can be used as the material of the heat absorption film 32b.

In addition, the Applicant has an absorption coefficient at a resistivity of 2.5 m? · Cm or less for a Ta-Si-ON based film having a molar ratio of approximately 0.6 < Si / Ta < It was found to be about 100000 / cm or more. Therefore, the said material can also be used as the material of the heat absorption film 32b.

As described above, according to the present embodiment, heat dissipation from the lower temperature reaction part is promoted, and a temperature difference between the reaction parts of the reaction device composed of two or more reaction parts can be ensured.

[Modification 1]

In the above embodiment, the heat dissipation promoting part 40 is provided by providing the heat absorption film 32b on the heat reflection film 32a. As shown in FIG. 9, the heat sink is part of the inner wall surface of the case 31. By not providing the desert 32a, an opening portion through which the bottom of the heat insulation container is exposed may be formed, and the opening portion may be the heat dissipation promoting portion 41. At this time, the reflectance of the opening portion becomes the reflectance of the case 31.

In addition, when the case 31 is a glass substrate, the infrared rays mostly pass through the case 31. For this reason, the reflectance of the opening portion is relatively lower than the reflectance of the portion where the case 31 and the heat reflection film 32a overlap, not the opening portion.

[Modification 2]

10, the heat absorption film 32b is provided in the whole surface of the inner wall surface of the case 31, and the heat reflection film 32a is provided except a part on the heat absorption film 32b. The opening portion through which the heat absorption film 32b is exposed may be the heat dissipation promoting portion 42.

[Modification 3]

Moreover, as shown in FIG. 11, the heat absorption film 32b is provided in a part of the inner wall surface of the case 31, and the heat reflection film 32a is provided in the other part of the inner wall surface of a heat insulation container. The opening portion where the absorbing film 32b is exposed may be the heat dissipation promoting portion 43. In this case, the outer peripheral part of the heat absorption film 32b and the heat reflection film 32a may partially overlap.

[Modification 4]

Moreover, when the reaction temperature of the reactor main body 20 exceeds 600 degreeC, the increase of a radiation density will become remarkable (refer FIG. 6). Therefore, the heat reflection film 32a does not become enough in a single layer, and the structure which makes it double can be considered. That is, as shown in FIG. 12, the space | gap 33 is opened inside the outer side heat reflection film 32a, and the 2nd heat reflection film 34 is provided. The void 33 is formed by a supporting member 36 made of a material such as the case 31, for example. By opening the voids 33, heat conduction from the second heat reflection film 34 to the first heat reflection film 32a can be prevented, and the thermal insulation efficiency can be improved.

In this case, as shown in FIG. 13, the heat dissipation window 35 may be provided at a position corresponding to the second reaction portion 12 of the second heat reflection film 34. Since there is a heat dissipation window 35, radiation by the second reaction part 12 is prevented only by the outer heat reflection film 32a, so that the radiation is prevented by the double heat reflection films 32a and 34. Compared with the reaction part 11, heat dissipation of the second reaction part 12 is promoted.

[Modification 5]

In the above embodiment, the heat dissipation promoting parts 40 to 43 are provided on the inner wall surface of the case 31 facing the outer wall surface on which the pipes 21 and 22 of the second reaction part 12 are not provided. The amount of heat dissipation by radiation from the second reaction part 12 may be adjusted by increasing or decreasing the area of the heat dissipation accelerators 40 to 43.

Here, the shape facing the outer wall surface on which the pipes 21 and 22 of the second reaction part 12 of the heat dissipation promoting part 40 to 43 are not provided may be the same area as that of the second reaction part 12. If possible (FIG. 14), the temperature of the second reaction part 12 becomes uniform, but if the shape and size are different (for example, FIG. 15), the temperature of the second reaction part 12 becomes uneven. Here, the range shown by the solid line in FIG. 14, and the range shown by the dashed-dotted line in FIG. 15, FIG. 16, FIG. 17 and FIG. 18 is the shape which opposes and is congruent with the outer wall surface of the 2nd reaction part 12. As shown in FIG.

In order to reduce the area of the heat dissipation accelerators 40 to 43 and to make the temperature of the second reaction unit 12 uniform, it is preferable to disperse the heat dissipation accelerators 40 to 43 in the corresponding range. Do. For example, the heat dissipation accelerators 40 to 43 may be provided in a stripe shape (Fig. 16) or in a checkered shape (Fig. 17).

In addition, the temperature of the second reaction unit 12 is as high as the side on which the pipe 21 for conducting heat from the first reaction unit 11 is installed, and the pipe 22 for conducting heat to the heat insulation container 30 is provided. It is easy to be lowered by the side to be installed. Thus, for example, as shown in FIG. 18, the distribution of the heat dissipation promotion units 40 to 43 is as large as the side on which the pipe 21 is installed (left side in FIG. 18), and the side on which the pipe 22 is installed (FIG. 18 may be provided so that the distribution of the heat dissipation accelerators 40 to 43 is smaller. By providing the heat dissipation promotion parts 40 to 43 in this manner, the heat dissipation amount is as high as the high temperature side where the pipe 21 is installed, and the heat dissipation amount is reduced as much as the low temperature side where the pipe 22 is installed, so that the temperature gradient can be reduced. have.

Second Embodiment

Next, a second embodiment of the present invention will be described.

19 is a block diagram showing a schematic configuration of a fuel cell device 101 to which the reaction device of the embodiment according to the present invention is applied. As shown in this figure, the fuel cell device 101 includes a fuel container 102, a vaporizer 150, a reactor 110, and a power generation cell 103.

Although the vaporizer | carburetor 150 is abbreviate | omitted, for example, two board | substrates are joined, for example, the zigzag-shaped micro flow path is formed in at least one joining surface, ie, inner surface of these board | substrates, The film has a structure in which a thin film heater made of a heat generating material called a heat generating resistor and a heat generating semiconductor is formed on the outer surface of each substrate. The fuel and water supplied from the fuel container 102 to the micro flow path in the vaporizer 150 are heated and vaporized by the thin film heater.

The reactor 110 generates hydrogen from vaporized fuel and water vapor supplied from the vaporizer 150, and includes a reactor 160 including a reformer 160, a carbon monoxide remover 170, and a catalytic combustor 180. ) And a heat insulation container (130). Reformer 160, carbon monoxide remover 170, catalytic burner 180, and thermal insulation container 130 are described in terms of the reformer 60, carbon monoxide remover 70, catalytic burner 80, and thermal insulation container of the first embodiment. Since it is the same as (30), description is devoted.

Although the details of the reaction apparatus 110 described above will be described later, the reaction apparatus 110 is a reformer 160, a carbon monoxide remover 170, a catalytic burner 180 and an adiabatic container 130 are integrated, and a catalytic burner 180 The heat of combustion generated in the heat transfer) is supplied to the reformer 160 so that the reformer 160 is set to a predetermined temperature (first temperature), and at the same time, the connecting portion 121 to communicate the reformer 160 with the carbon monoxide remover 170 is described below. The carbon monoxide remover 170 is set to a predetermined temperature (second temperature) lower than the temperature of the reformer 160 by heat conduction through the chemical reaction of Chemical Formulas (1) to (3). In addition, between the fuel container 102 and the catalytic combustor 180, another vaporizer not shown is interposed, and a part of the fuel is further provided by the vaporizer and supplied to the catalytic combustor 180. You may use it.

The operation of the power generation cell 103 is the same as that of the power generation cell 3 of the first embodiment, and therefore, the description is omitted.

The fuel cell device 101 described above is similar to the fuel cell device 1 of the first embodiment, such as a notebook personal computer, a mobile phone, a personal digital assistant (PDA), an electronic notebook, a watch, a digital still camera, and a digital video camera. And a game device, an organic device, an electronic calculator, and other electronic devices, and are used as a power source for operating the main body of the electronic device. In addition, the reaction apparatus 110, the vaporizer 150, and the power generation cell 103 of the fuel cell device 101 are incorporated in the electronic device main body, and the fuel container 102 is detachably installed with respect to the electronic device main body. When the container 102 is attached to the main body of the electronic device, the fuel and water in the fuel container 102 may be supplied to the reactor main body 110 by a pump.

Next, the structure of the reaction apparatus 110 is demonstrated further in detail. FIG. 20 is a perspective view showing the reactor 110 in the present embodiment, FIG. 21 is a cross-sectional view taken along the line XXI-XXI in FIG. 20, and FIG. 22 is a reactor 110 in the present embodiment. It is an exploded perspective view showing. 23 to 27 are plan views of the first to fifth substrates 700 forming the reactor 110.

In the following description, the upper surface of FIG. 20 is used as the surface, and the lower surface is described as the rear surface. In addition, in FIG. 22 and FIGS. 23-27 mentioned later, the groove part (euro) 406, 408, the groove part (euro) 506, 508, the groove part (euro) 606, etc. are simplified.

20 to 22, the reactor 110 is formed by stacking a plurality of substrates 300, 400, 500, 600, and 700, and is formed in a flat plate shape, and the reactor main body 120 is disposed therein. ).

As shown in FIG. 21, the reactor main body 120 includes a reforming reaction chamber 161 of the reformer 160, a carbon monoxide removal passage 171 of the carbon monoxide remover 170, and a catalytic combustion device 180. Of the combustion reaction chamber 181, a connecting portion 121 for connecting the reformer 160 and the carbon monoxide remover 170, and a supporting portion 122.

The reforming reaction chamber 161 is a chamber (euro) for carrying out the above reforming reaction, and contains a reforming catalyst 165 for generating hydrogen from hydrocarbons such as methanol and water, on the inner wall surface. The reforming catalyst 165 is, for example, a copper / zinc oxide catalyst, in which copper / zinc oxide is supported on alumina as a carrier.

In addition, the carbon monoxide removal passage 171 is a chamber for performing the carbon monoxide removal reaction, and oxidizes carbon monoxide slightly generated as other by-products such as hydrogen by the reforming catalyst 165 to generate carbon dioxide. The carbon monoxide removal catalyst 175 is supported on the inner wall surface. The carbon monoxide removal catalyst 175 is, for example, a platinum / alumina catalyst, in which platinum, platinum, and ruthenium are supported on alumina.

The combustion reaction chamber 181 is a chamber (euro) for carrying out the combustion reaction described above, and contains, for example, a platinum-based combustion catalyst 185 on the inner wall surface for efficiently causing the combustion reaction. This combustion reaction chamber 181 is a heating unit in the present invention, and supplies heat to the reforming reaction chamber 161 and the like.

The reaction apparatus main body 120 is disposed inside the heat insulation container 130 by the support part 122. The heat insulation container 130 surrounds the reactor main body 120, and a heat ray (infrared ray) radiated from the reactor main body 120 passes through at least a portion thereof. The reactor main body 120 is accommodated in the sealed chamber 139 inside the heat insulation container 130. The sealed chamber 139 has a vacuum pressure of 10 Pa or less, preferably 1 Pa or less.

On the inner surface of the case 131 of the heat insulation container 130, a heat reflection film 132a for reflecting the heating wire radiated from the reactor main body 120 side to the reactor main body 120 side to prevent heat radiation, has a reactor main body. It is provided to face the outer surface of the part 120. The heat reflection film 132a is formed by forming a metal film such as gold, aluminum, silver, or copper by a gas phase method such as sputtering or vacuum deposition.

In the present embodiment, as shown in FIGS. 21 and 22, the heat reflection film 132a includes an opening 141 in part. A part of the internal heat of the reactor main body 120 is radiated to the outside by the opening 141, so that the temperature of the reactor main body 120 is adjusted to a desired state. In this embodiment, this opening part 141 is provided in the front and back both sides of the area | region of a part of the reactor main body part 120, ie, the area | region corresponding to the carbon monoxide remover 170, and with respect to the temperature of the reformer 160 side. The temperature on the side of the carbon monoxide remover 170 can be lowered to provide an appropriate temperature difference. In addition, the opening part 141 is not limited to being provided in the front and back both sides of the area | region corresponding to the carbon monoxide remover 170, and may be provided in either one of the front side or the back side. In addition, although the opening part 141 is formed in hole shape as shown in FIG. 22 in the above, it is not limited to such a shape, For example, the shape in which the heat reflection film 132a was divided | segmented in the middle may be sufficient. In other words, it is sufficient to provide an area in which the heat reflection film 132a is not provided so that the temperature of the reactor main body 120 is in a desired state.

As shown in FIG. 21 and FIG. 22, the support part 122 has the carbon monoxide removal flow path 171 rather than the one end part of the heat insulation container 130 and the reactor main body part 120, More specifically, the reforming reaction chamber 161. It connects the end part adjacent to and supports the said reaction apparatus main body part 120, and the heat insulation container 130 is integrated with the reaction apparatus main body part 120. As shown in FIG.

The support part 122 supplies reactants used for the reforming reaction, the carbon monoxide removal reaction and the combustion reaction in the reactor main body 120 to the reactor main body 120 from the outside, and the reactions thereof. The supply-discharge part 123 (refer FIG. 20 and FIGS. 24-26 mentioned later) which discharge | releases the product produced | generated by the outside is provided.

As shown in FIG. 20, this supply and discharge part 123 is a fuel supply port 123a, the fuel oxygen supply port 123b, the oxygen auxiliary supply port 123c, and the reaction outlet opening which are opened to the outer surface of the heat insulation container 130. 123d), reaction supply port 123e and fuel discharge port 123f.

The fuel supply port 123a introduces off gas containing hydrogen used for combustion in the catalytic combustor 180, methanol as fuel used for combustion, and the like. The fuel oxygen supply port 123b introduces oxygen to be used for combustion in the catalytic combustor 180. Further, a pump device (not shown) for pumping fuel or the like is connected to the fuel supply port 123a and the fuel oxygen supply port 123b, respectively.

The oxygen auxiliary supply port 123c introduces oxygen for selectively oxidizing carbon monoxide in the carbon monoxide remover 170.

The reaction outlet 123d discharges a mixture mainly containing hydrogen, which is produced by the reforming reaction and the carbon monoxide removal reaction, and communicates with the fuel electrode of the power generation cell 103. The reaction supply port 123e introduces hydrocarbon and water, such as methanol, which is reformed into hydrogen in the reformer 160 to the inside, and communicates with the vaporizer 150.

The fuel outlet 123f discharges oxygen dioxide and water produced by the combustion in the catalytic combustor 180.

As described above, the reactor 110 includes the first substrate 300, the second substrate 400, the third substrate 500, the fourth substrate 600, and the fifth substrate 700. It is formed by laminating and joining in order. That is, the back surface of the first substrate 300 and the surface of the second substrate 400 are bonded to each other, the back surface of the second substrate 400 and the surface of the third substrate 500 are bonded to the third substrate 500. The rear surface of the substrate 4 and the surface of the fourth substrate 600 are bonded to each other, and the rear surface of the fourth substrate 600 and the surface of the fifth substrate 700 are bonded to each other.

In addition, in this embodiment, the 1st board | substrate 300-the 5th board | substrate 700 are glass substrates, More specifically, it is a glass substrate containing Na or Li which becomes movable ions, and each board | substrate is, for example, It is joined together by an anodic bonding. As such a glass substrate, it is preferable to use a Pyrex (trademark) board | substrate, for example.

These first to fifth substrates 700 have a substantially rectangular shape in plan view, have substantially the same dimensions along their outer edges, and at least some of the side surfaces thereof are coincident with each other.

Next, each board | substrate 300, 400, 500, 600, 700 is demonstrated.

[First substrate]

As shown in FIG. 23, the rectangular recessed part 301 is formed in the back surface side of the 1st board | substrate 300, ie, the surface facing the surface of the 2nd board | substrate 400. As shown in FIG. The heat reflection film 132a described above is provided on the inner surface of the recess 301, and the opening 141 is provided in the heat reflection film 132a.

The first substrate 300 forms an upper portion of the case 131 of the heat insulation container 130.

[Second substrate]

As shown in FIG. 24, the 2nd board | substrate 400 has the triangular notch part 440 at the edge part of one end part (edge part of a left side in a figure). The second substrate 400 is provided with a hole 401 penetrating the front and back. The hole 401 is formed in a substantially C shape along the circumferential edge of the second substrate 400. That is, the hole 401 is provided along the circumferential edge of the second substrate 400 except for the region serving as the support portion 122 of the second substrate 400. The inner part surrounded by the hole 401 is the main body part 410 which becomes the reactor main body part 120, and the part separated from the outer side of the main body part 410 by the hole 401 is referred to as the case 131. It is a frame portion 420.

The heat reflection film 132a described above is provided on the inner circumferential surface of the hole 401.

The rectangular hole 402 is formed in the center part of the main-body part 410. As shown in FIG. A radiation prevention film (not shown) having a heat insulating effect may be provided on the inner circumferential surface of the hole 402. This copy protection film is made of metal such as aluminum, for example.

In addition, as shown in FIG. 21, the surface of the second substrate 400, that is, the area of the surface facing the recess 301 of the first substrate 300, for example, in a region corresponding to the carbon monoxide remover 170. The getter material 403 may be provided. The getter material 403 is activated by heating to adsorb the surrounding gas or fine particles, and adsorbs the gas present in the sealed chamber 139 of the reactor 110 to increase the vacuum degree of the sealed chamber 139. Or keep it. As a material of such a getter material 403, the alloy which has zirconium, barium, titanium, or vanadium as a main component is mentioned, for example. In addition, an electric heater such as a heat transfer material for heating and activating the getter material 403 may be installed in the getter material 403, and the electric wire of the electric heater may be taken out of the heat insulation container 130. In addition, the getter material 403 is preferably installed at a position where the temperature of the getter material 403 does not exceed its activation temperature during the operation of the reactor 110.

In addition, Grooves 406, grooves 407a and 407b, grooves 408, and grooves 409a to 409f are formed on the back surface of the second substrate 400, that is, the bonding surface to the third substrate 500. The groove part 406 is provided in the zigzag shape in the area | region on the opposite side to the support part 122 with respect to the hole 402 among the main body parts 410, for example. The reforming catalyst 165 (see FIG. 21) is supported on the inner wall surface of the groove portion 406.

The groove part 407a is provided in the area | region of the support part 122 side rather than the hole 402 among the main-body part 410 from the edge part of the groove part 406. The groove portion 407b is provided from the end of the groove portion 406 to the groove portion 408.

The groove part 408 is provided in the zigzag shape, for example in the area | region (the other end side on the opposite side to the said one end side) with respect to the hole 402 among the main-body parts 410 with respect to the hole 402. The carbon monoxide removal catalyst 175 (see FIG. 21) described above is supported on the inner wall surface of the groove 408.

The groove portions 409a to 409f are provided side by side on the same side as the support portion 122 of the second substrate 400 (the other end portion on the opposite side of the one end portion), and one end thereof is formed on the other side of the second substrate 400. While opening to the side of the end side, the other end is in a closed state.

[Third substrate]

As shown in FIG. 25, the third substrate 500 includes notches 540 and 541 and notches 509a to 509f. The notches 540 and 541 are provided in a triangular shape at two corners of one end (the left end in the drawing) of the third substrate 500.

The notches 509a to 509f are arranged at the end of the support part 122 side of the third substrate 500 in a state corresponding to the grooves 409a to 409f of the second substrate 400, and the second substrate 400 is provided. ) And the third substrate 500 overlap with the groove portions 409a to 409f. Among them, notch portions 509a, 509b, and 509f have one end opened to the side of the other end side of third substrate 500 while the other end is closed. The notches 509c and 509d open one end to the side of the other end side of the third substrate 500 while the other end communicates with the groove 508 described later. In addition, the notch part 509e opens one end part to the side surface of the said other end part side of the 3rd board | substrate 500, and the other end part communicates with the groove part 507a mentioned later.

In addition, the third substrate 500 is provided with a hole 501 penetrating the front and back.

The hole 501 is formed in a substantially C shape along the circumferential edge of the third substrate 500. That is, the hole 501 is provided along the circumferential edge of the third substrate 500 except for the region serving as the support portion 122 of the third substrate 500. The inner part surrounded by the hole 501 is the main body part 510 which becomes the reactor main body part 120, and the part spaced apart from the outer side of the main body part 510 by the hole 501 is referred to as the case 131. It is a frame portion 520.

The heat reflection film 132a described above is provided on the inner circumferential surface of the hole 501.

A rectangular hole 502 is formed in the center portion of the main body 510. These holes 501 and 502 correspond to the holes 401 and 402 of the second substrate 400, respectively, and when the second substrate 400 and the third substrate 500 overlap, the holes 401 and 502 402). A radiation prevention film (not shown) having a heat insulating effect may be provided on the inner circumferential surface of the hole 502. This copy protection film is made of metal such as aluminum, for example.

Moreover, as shown in FIG. 21, the thin film heaters 505a and 505b as a heating part in this invention are zigzag on the back surface of the 3rd board | substrate 500, ie, the joining surface with the 4th board | substrate 600, for example. It is installed in the shape. These thin film heaters 505a and 505b are heat generating resistors, such as heat generating resistors and heat generating semiconductors, which generate heat when a voltage is applied. The thin film heaters 505a and 505b respectively supply heat to the reforming reaction chamber 161 and the carbon monoxide removal passage 171 at the start-up. It is supposed to be the temperature. The thin film heaters 505a and 505b are connected with electric wires 505c and 505d which are energized between the inside and the outside of the reactor 110, respectively. Further, the thin film heaters 505a and 505b may be provided only on the rear surface of the third substrate 500 as shown in FIG. 21, or may be provided on the front and back surfaces. When installing also on the surface, the structure covered with a suitable protective film is preferable. Moreover, since it is preferable that the wires 505c and 505d are thin, in this embodiment, the wire diameter was 0.2 mm using the Kovar wire as the wires 505c and 505d. However, as the wires 505c and 505d, an iron nickel alloy wire or a Dumet wire in which the core material of the iron nickel alloy is coated in the same layer may be used.

Moreover, the groove part 506, the groove part 507a, 507b, and the groove part 508 are formed in the surface of the 3rd board | substrate 500, ie, the joining surface with the 2nd board | substrate 400, as shown in FIG. . The groove part 506 is provided in the zigzag shape in the area | region on the opposite side to the support part 122 with respect to the hole 502 of the main body part 510, for example. The reforming catalyst 165 (see FIG. 21) described above is supported on the inner wall surface of the groove portion 506. The groove portion 506 corresponds to the groove portion 406 of the second substrate 400, and faces the groove portion 406 when the second substrate 400 and the third substrate 500 overlap. .

The groove part 507a is provided from the edge part of the groove part 506 to the notch part 509e. The groove 507b is provided from the end of the groove 506 to the groove 508. These groove portions 507a and 507b correspond to the groove portions 407a and 407b of the second substrate 400, and the groove portions 407a and 407b when the second substrate 400 and the third substrate 500 overlap. It is intended to face.

The groove part 508 is provided in the zigzag shape in the area | region of the main body part 510 with respect to the hole 502 on the same side as the support part 122, for example. On the inner wall surface of the groove portion 508, the carbon monoxide removal catalyst 175 (see Fig. 21) is supported. The groove portion 508 corresponds to the groove portion 408 of the second substrate 400, and faces the groove portion 408 when the second substrate 400 and the third substrate 500 overlap.

Fourth Substrate

As shown in FIG. 26, the 4th board | substrate 600 has triangular notch parts 640 and 641 in each corner part of one end part (edge part of a left side in a figure). The fourth substrate 600 is provided with a hole 601 penetrating through the front and back.

The hole 601 is formed in substantially C shape along the circumferential edge of the fourth substrate 600. That is, the hole 601 is provided along the circumferential edge of the fourth substrate 600 except for the region serving as the support portion 122 of the fourth substrate 600.

The inner part surrounded by the hole 601 is the main body part 610 which becomes the reactor main body part 120, and the part spaced apart from the outer side of the main body part 610 by the hole 601 is referred to as the case 131. The frame portion 620 is.

The heat reflection film 132a described above is provided on the inner circumferential surface of the hole 601.

A rectangular hole 602 is formed in the central portion of the main body 610.

These holes 601, 602 correspond to the holes 501, 502 of the third substrate 500, respectively, and when the third substrate 500 and the fourth substrate 600 overlap, the holes 501, 602. 502). A radiation prevention film (not shown) having a heat insulating effect may be provided on the inner circumferential surface of the hole 602. This copy protection film is made of metal such as aluminum, for example.

The groove 606, the grooves 607a and 607b, the grooves 609a to 609f, and the energizing grooves 605a and 605b are formed on the surface of the fourth substrate 600, that is, the bonding surface with the third substrate 500. (See FIG. 21) is formed.

The groove part 606 is provided in the zigzag shape in the area | region on the opposite side to the support part 122 with respect to the hole 602 among the main body parts 610, for example. The reforming catalyst 165 (see FIG. 21) is supported on the inner wall surface of the groove portion 606.

The groove portions 607a and 607b are provided from the end of the groove portion 606 to the area of the support portion 122 side of the main body portion 610 rather than the hole 602.

The grooves 609a to 609f are provided side by side at the end portion of the support portion 122 side of the fourth substrate 600 in a state corresponding to the notches 509a to 509f of the third substrate 500, and the third substrate. When the 500 and the fourth substrate 600 overlap, the notches 509a to 509f face each other. Among these, the grooves 609a and 609b open at one end to the side of the other end side of the fourth substrate 600, while the other ends are joined to each other and communicate with the groove 607b. The grooves 609c to 609e have one end open to the side of the other end side of the fourth substrate 600 while the other end is closed. In addition, one end of the groove 609f is opened to the side of the other end side of the fourth substrate 600, and the other end is in communication with the groove 607a.

As shown in FIG. 21, the energizing grooves 605a and 605b are provided at positions corresponding to the electric wires 505c and 505d on the surface of the fourth substrate 600 that faces the third substrate 500. The electric wires 505c and 505d connected to the thin film heaters 505a and 505b are provided.

[Fifth substrate]

27, the 5th board | substrate 700 is formed with the 1st board | substrate 300 substantially up and down, and each corner part of one end part (the edge part of a left side in a figure), and the edge part of another end part is shown. It has triangular notch parts 740-742 in the back. The rectangular recessed part 701 is formed in the surface side of this 5th board | substrate 700, ie, the surface facing the back surface of the 4th board | substrate 600. As shown in FIG. The inner surface of the recess 701 is provided with a heat reflection film 132a similar to that provided on the inner surface of the recess 301 of the first substrate 300, and the opening 141 is provided in the heat reflection film 132a. have.

The fifth substrate 700 forms a lower portion of the case 131 of the heat insulation container 130.

The reactor 110 is formed by stacking and bonding the first substrate 300, the second substrate 400, the third substrate 500, the fourth substrate 600, and the fifth substrate 700. . Accordingly, the sealed chamber 139 is formed by the recess 301, the holes 401, 402, 501, 502, 601, 602, and the recess 701, and the heat insulation container is formed outside the sealed chamber 139. 130 is formed. Also, for convenience, the space formed by the recess 301, the holes 401, 501, 601 and the recess 701 may be a space formed by the heat insulation space 139a and the holes 402, 502, 602. It is set as the heat insulation space 139b (refer FIG. 21).

In addition, the reforming reaction chamber 161 is formed by the groove portions 406 and 506, and the flow passage 162 is formed by the groove portions 407a and 507a, and the communication passage 163 is formed by the groove portions 408 and the groove portions by the groove portions 407b and 507b. A carbon monoxide removal passage 171 is formed by 508.

In addition, the groove 606 and the grooves 607a and 607b are covered by the third substrate 500 to form the combustion reaction chamber 181 and the flow paths 182 and 183.

Further, the grooves 409a to 409f, the notches 509a to 509f, and the grooves 609a to 609f allow the fuel supply port 123a, the fuel oxygen supply port 123b, and the oxygen assist supply of the supply / discharge section 123 to be used. A sphere 123c, a reaction discharge port 123d, a reaction supply port 123e, and a fuel discharge port 123f are formed.

In addition, the reaction supply port 123e and the reforming reaction chamber 161 communicate with each other by the flow path 162, and the reforming reaction chamber 161 and the carbon monoxide removal flow path 171 communicate with the communication flow path 163 to remove carbon monoxide. The flow path 171, the oxygen auxiliary supply port 123c, and the reaction discharge port 123d communicate with each other, and the fuel supply port 123a, the fuel oxygen supply port 123b, and the combustion reaction chamber 181 are connected by the flow path 183. In communication with each other, the combustion reaction chamber 181 and the fuel discharge port 123f communicate with each other by the flow passage 182.

[Operation of Fuel Cell Device]

Subsequently, the operation of the fuel cell device 101 will be described.

First, fuel (for example, hydrocarbon-based liquid fuel such as methanol) and water are supplied from the fuel container 102 to the vaporizer 150 and vaporized in the vaporizer 150.

Next, when the mixture of fuel and water vapor vaporized in the vaporizer 150 flows into the reforming reaction chamber 161 through the reaction supply port 123e and the flow path 162 of the supply and distribution unit 123, the reforming catalyst 165 Hydrogen etc. are produced | generated by this.

At this time, heat generated in the thin film heater 505a, heat of reaction (burning heat) generated in the combustion reaction chamber 181, and the like are added to the reforming reaction chamber 161. In addition, the hot wire radiated in the direction from the inside of the reactor main body 120 to the outside is reflected in the heat reflection film 132a of the first substrate 300 and the fifth substrate 700. As a result, the reforming reaction chamber 161 is brought to a relatively high temperature, and the reforming catalyst 165 is heated to 200 to 400 ° C and about 300 ° C in this embodiment.

In addition, although the reforming reaction in the reforming reaction chamber 161 is performed by the steam reforming method in this embodiment, it may be performed by a partial oxidation reforming method.

Next, the generated hydrogen passes through the communication passage 163, enters the carbon monoxide removal passage 171, and mixes with the air introduced from the oxygen auxiliary supply port 123c of the supply / discharge unit 123. Then, the carbon monoxide in the mixer is oxidized and removed by the carbon monoxide removal catalyst 175.

In addition, the reformer 160, the catalytic combustion unit 180, and the carbon monoxide remover 170 are physically connected through the flow path portion of the connection part 121. However, a heat insulation chamber 139b is installed between the reformer 160, the catalytic burner 180, and the carbon monoxide remover 170. For this reason, the cross-sectional area of the connection part 121 between them is reduced, and the propagation of the heat from the reformer 160 and the catalytic combustor 180 to the carbon monoxide remover 170 is suppressed.

On the other hand, since the heat inside the reactor main body 120 escapes through the opening 141 of the heat reflection film 132a provided in the first substrate 300 and the fifth substrate 700, the carbon monoxide remover ( 170) is lowered. As a result, a suitable temperature difference is provided between the reformer 160 and the carbon monoxide remover 170.

Accordingly, the carbon monoxide remover 170 is set at a relatively low temperature with respect to the reformer 160, and the carbon monoxide removal catalyst 175 is set to 120 to 200 ° C and about 120 ° C in the present embodiment.

Next, air is supplied to the oxygen electrode of the power generation cell 103, and a mixture such as hydrogen in the carbon monoxide removal passage 171 is discharged from the reaction outlet 123d of the supply / discharge unit 123 to supply the fuel electrode of the power generation cell 103. When supplied to, electric energy is generated in the power generation cell 103.

Next, in the fuel cell of the power generation cell 103, a mixer (off gas) containing unreacted hydrogen is supplied to the combustion reaction chamber 181 through the fuel supply port 123a and the flow path 183 of the supply and distribution unit 123. At the same time, air flows from the outside into the combustion reaction chamber 181 through the fuel oxygen supply port 123b and the flow path 183 of the supply and distribution unit 123. Hydrogen is burned in the combustion reaction chamber 181 to generate combustion heat, and products such as water and carbon dioxide are discharged to the outside from the fuel outlet 123f of the supply / discharge unit 123 through the flow path 182.

According to the reactor 110 of the fuel cell device 101, the reformer 160 and the carbon monoxide remover 170 communicate between the second substrate 400 and the third substrate 500. Since it is installed through, the reformer 160 and the carbon monoxide remover 170 is installed independently, unlike the conventional case connected to the connection pipe, it is possible to miniaturize the whole device.

In addition, the carbon monoxide can escape to the outside through the opening 141 in the region corresponding to the carbon monoxide remover 170 while the heat inside the reactor main body 120 is stopped inside by the heat reflection film 132a. The temperature of the remover 170 may be lowered to form an appropriate temperature distribution in the reactor body 120. Therefore, even in the case where the reactor main body 120 is downsized and the reformer 160 and the carbon monoxide remover 170 are disposed relatively close to each other, the reformer 160 and the carbon monoxide remover 170 are each set to an optimum temperature. It can set and the reaction in each can be performed favorably.

In addition, since the reformer 160 and the carbon monoxide remover 170 are provided in the reactor main body 120 in a manner of stacking the first to fifth substrates 700 to 700, the reformer 160 and carbon monoxide are provided. Unlike the conventional case in which the eliminator 170 is separately manufactured and connected by a connecting pipe or the like, the reactor body 120 is manufactured at a time. In addition, since the reactor main body 120 and the heat insulation container 130 are integrally formed, the reactor main body 120 and the heat insulation container 130 are manufactured separately, and the reactor inside the heat insulation container 130. Unlike the case in which the main body 120 is disposed, the reactor 110 is manufactured at a time. Thereby, the manufacturing process of the reaction apparatus 110 can be reduced.

In addition, for example, when the pipe communicating with the reactor main body 120 is inserted into the heat insulation container 130, there is a possibility that gas may leak from the gap between the heat insulation container 130 and the tube. According to the 110, since the supply and distribution unit 123 is formed integrally with the heat insulation container 130, it becomes possible to maintain the sealed space of the heat insulation container 130 in a high sealed state, and to increase the sealed state of the sealed space high The effort to do is simplified.

In addition, although the reactor main body 120 is vacuum-insulated through the sealed space of the sealed chamber 139 by the heat insulation container 130, the support part 122 provided with the supply / discharge part 123 is the reactor main body 120 Since it is connected to the one end of the side of the carbon monoxide remover 170, heat inside the reformer 160 and the carbon monoxide remover 170 propagates to the heat insulation container 130 from the one end. However, a position where heat propagates from the reformer 160 and the carbon monoxide remover 170 of the reactor main body 120 to the heat insulation container 130 is gathered in one place, and the carbon monoxide removal passage 171 as described above. Since the temperature of the reformer 160 is relatively low, the temperature difference of the heat insulation container 130 is relatively small compared with the case where the reformer 160 side is connected to the heat insulation container 130. For this reason, the heat amount which propagates to the heat insulation container 130 through the support part 122 can be made comparatively small. Moreover, in the support part 122, since the temperature difference between the carbon monoxide remover 170 of the one end side of the support part 122, and the heat insulation container 130 of the other end side becomes comparatively small, the thermal stress applied to the support part 122 is reduced. It can be made relatively small, and it can suppress that the support part 122 is damaged by thermal stress.

In addition, since the heat insulation chamber 139b is provided between the reformer 160 and the carbon monoxide remover 170, the cross-sectional area of the flow path portion connecting the two is reduced, thereby reducing the carbon monoxide from the reformer 160 and the catalytic burner 180. The amount of heat propagated to the eliminator 170 is suppressed, and heat escapes to the outside through the opening 141 of the heat reflection film 132a of the first substrate 300 and the fifth substrate 700. ), A suitable temperature difference can be provided between the carbon monoxide remover 170 and the reactor body main body 120, and the carbon monoxide remover 170 can be reduced even when the reformer 160 and the carbon monoxide remover 170 are relatively close to each other. ) Can be set to a relatively low temperature.

Since the first and fifth substrates 700 are made of glass and are all made of the same material, the first and second substrates 300 to 5 are all made of the same material. In this case, thermal stress caused by the difference in thermal expansion amount can be reduced, and breakage due to thermal stress of the reaction apparatus 110 can be suppressed.

In addition, since the getter material 403 is located in the area corresponding to the carbon monoxide remover 170 on the inner surface of the sealed chamber 139, the getter material 403 is located in the area corresponding to the reformer 160 or the catalytic combustion device 180. Alternatively, the activation of the getter 403 during the operation of the reactor 110 can be prevented.

In the above embodiment, only one opening 141 of the heat reflection film 132a is provided in a rectangular shape, but the shape and number of the openings 141 are not limited thereto. 28-32 is a figure which shows the example of the shape of the opening part of a heat reflection film. Here, FIG. 28 shows the above-mentioned rectangular case for comparison, and the ratio of the area of the opening 141 to the projected area of the carbon monoxide remover 170 (hereinafter referred to as opening ratio [%]) is 100%. The case is shown. The openings 141 may be formed, for example, in the shapes and numbers shown in FIGS. 29 to 32. As shown in FIG. 3, since the amount of heat that escapes from the opening 141 by radiation is proportional to the area of the opening 141, the opening ratio of the opening 141 is set according to the set temperature of the carbon monoxide remover 170. do. When the opening ratio is about 50%, as shown in the openings 141b and 141e in FIGS. 29 and 32, a plurality of openings 141 may be provided in a rectangular shape. In addition, as shown in the opening 141c in FIG. 30, the reforming reaction chamber becomes higher than the carbon monoxide remover 170 from the viewpoint of uniformizing the temperature of the carbon monoxide remover 170 as compared with the opening 141 shown in FIG. 28. The opening 141 may be provided in a triangular shape so that the opening area becomes larger as it approaches the 161 side. As shown in the opening 141d in FIG. 31, the temperature change in the connection portion between the reforming reaction chamber 161 and the carbon monoxide remover 170 is moderated compared to the opening 141 shown in FIG. 28. In order to prevent stress from occurring due to a sudden temperature distribution, the opening 141 may be provided in a trapezoidal shape so that the width of the opening side of the connection portion between the reforming reaction chamber 161 and the carbon monoxide remover 170 becomes smaller. .

In addition, the reforming reaction chamber 161 and the carbon monoxide removal passage 171 are described as being provided in the reactor main body 120 one by one, but between the first substrate 300 and the fifth substrate 700. The reforming reaction chamber 161 and the carbon monoxide removal passage 171 are manufactured by stacking a plurality of the second substrates 400 to the fourth substrate 600 in this order and stacking the reactor main body 120. You may install more than one.

Moreover, although all the 1st board | substrate 300-the 5th board | substrate 700 were demonstrated as glass, you may make it a ceramic. However, it is preferable that the 1st board | substrate 300-the 5th board | substrate 700 are formed with the same material from a viewpoint of preventing a thermal stress at the time of temperature change according to the difference of a thermal expansion coefficient.

In the reactor 110, the support 122 supporting the reactor main body 120 is provided only on the side of the carbon monoxide remover 170, and the supply and discharge unit 123 is provided on the support 122. However, the present invention is not limited to this.

33 is a perspective view showing another example of the configuration of a reactor according to the present embodiment. FIG. 34 is a perspective view seen from the opposite side to FIG. 33, and FIG. 35 is a cross-sectional view taken along the line XXXV-XXXV in FIG. 33. 33-35, the support part 122 is provided not only in the carbon monoxide remover 170 side of the reactor main body part 120 but also in another part, and the supply part 123 is provided in each support part 122. As shown to FIG. It is all right to become. That is, in the reaction apparatus 110A shown in FIGS. 33-35, for example, support parts 122A and 122A are provided in the carbon monoxide remover 170 side and the reformer 160 side of the heat insulation container 130, respectively. The supply-discharge part 123A is dividedly provided in support part 122A, 122A. In addition, this reactor 110A can be formed by stacking a plurality of substrates 300A to 700A in the same manner as in the above-described embodiment. In this case, the heat reflection film 132a is similarly provided on the inner surface side of the substrates 300A and 700A corresponding to the first substrate 300 and the fifth substrate 700, and the opening 141 is provided in the heat reflection film 132a. It is.

In addition, although the inside of the sealed chamber 139 was demonstrated as a vacuum pressure, you may fill with rare gas, such as argon and helium.

Hereinafter, the reaction apparatus concerning this embodiment is demonstrated further more concretely by giving an Example and a comparative example.

As an example of the reaction apparatus 110 which concerns on this embodiment, what provided the heat reflection film 132a in the 1st board | substrate 300 and the 5th board | substrate 700 by gold, aluminum, silver, or copper was formed. The area of the opening 141 of the heat reflection film 132a was about 2.835 cm ² (= 2.7 cm × 1.05 cm), and the area of the carbon monoxide remover 170 was 3.645 cm ² (= about 2.7 cm × 1.35 cm). That is, the opening ratio of the opening 141 was 78%. The temperature of the reformer 160 in this reactor main body part 120 was 299 degreeC, and the temperature of the carbon monoxide remover 170 was 81 degreeC.

Here, when the reaction apparatus similar to the said Example was formed except having provided the opening part 141 as a comparative example of this invention, the temperature of the reformer 160 in the reaction apparatus of this comparative example is 303 degreeC, carbon monoxide. The temperature of the eliminator 170 was 132 ° C.

As described above, in the reactor main body 120 of the embodiment, the temperature difference between the reformer and the carbon monoxide remover can be further increased as compared with the reactor of the comparative example. Therefore, even if the connection part 121 is shortened, the temperature difference between the reformer and the carbon monoxide remover can be maintained, and the size of the reactor main body part 120 can be further reduced.

[Schematic Configuration of Fuel Cell Device]

Next, the schematic structure of the fuel cell apparatus 1, 101 is demonstrated. 36 is a perspective view illustrating an example of the fuel cell apparatuses 1, 101. As shown in FIG. 36, the above-described reaction apparatuses 10 and 110 can be used in conjunction with the fuel cell apparatuses 1 and 101. The fuel cell apparatuses 1, 101 have, for example, a flow rate control having a fuel container 2, 102 detachable from the frame 104, a flow path, a pump, a flow sensor, a valve, and the like, on the frame 104. Humidifier and power generation cell to humidify unit 105, vaporizers 50 and 150 (not shown), reactors 10 and 110, power generation cells 3 and 103 and power generation cells 3 and 103 not shown. Power generation module 106 having a recovery unit for recovering the by-products generated in (3, 103) and the air pump 107 for supplying air (oxygen) to the reactor (10, 110) and power generation module 106 And a power supply unit 108 having an external interface for electrically connecting with an external device driven by the output of the secondary battery, the DC-DC converter, or the fuel cell apparatuses 1, 101, or the like. A mixture of water and liquid fuel in the fuel containers 2 and 102 is supplied to the reactors 10 and 110 through the vaporizers 50 and 150 by the flow rate control unit 105. The hydrogen gas is generated and supplied to the power generation cells 3 and 103 of the power generation module 106, and the generated electricity is stored in the secondary battery of the power supply unit 108.

[Electronics]

37 is a perspective view showing an example of an electronic device 851 that uses the fuel cell devices 1 and 101 as power sources. As shown in FIG. 37, this electronic device 851 is a portable electronic device, for example, a notebook type personal computer. The electronic device 851 includes a lower case 854 in which a keyboard 852 is installed, and an upper case in which an LCD display 856 is installed, incorporating operation processing circuits composed of CPU, RAM, ROM, and other electronic components. 858. The lower case 854 and the upper case 858 are joined by a hinge, and the upper case 858 overlaps the lower case 854 so that the keyboard 852 can be folded in a state in which the liquid crystal display 856 is opposed to the keyboard 852. Consists of. If the mounting portion 860 for mounting the fuel cell apparatuses 1, 101 is formed from the right side of the lower case 854 to the bottom surface, and the fuel cell apparatuses 1, 101 are mounted in the mounting portion 860, the fuel cell is mounted. The electronic device 851 is operated by the electricity of the devices 1 and 101.

Specifications and claims of Japanese Patent Application No. 2005-378549 and Japanese Patent Application No. 2005-378505, filed December 28, 2005, and Japanese Patent Application No. 2006-338222, filed December 15, 2006. All disclosures, including the scope, figures, and summaries, are incorporated herein by reference.

Although various typical embodiments have been shown and described, the present invention is not limited to those embodiments. Accordingly, the scope of the present invention is limited only by the following claims.

According to the present invention, heat dissipation from a lower temperature reaction part is promoted, and a temperature difference between reaction parts of a reaction device composed of two or more reaction parts can be ensured.

Claims (34)

A reactor main body having a first and a second reaction part, A container accommodating the reactor body, At least a first region positioned opposite to the first reaction portion and a second region positioned opposite to the second reaction portion, provided inside the vessel or the vessel, And the first reaction section is set at a temperature higher than that of the second reaction section, and the first region has a higher reflectance with respect to the hot wire radiated from the reactor main body section than the second region. The method of claim 1, The inner surface of the container is provided with a heat reflection film, The first region is an area where the heat reflection film is located, And the second region is a region located opposite to the opening provided in the heat reflection film. The method of claim 1, The inner surface of the container and the heat reflection film, A heat absorption film having a lower heat reflectance than the heat reflection film and absorbing at least a portion of the heat radiation radiated from the main body of the reactor, The first region is a region where the heat reflection film is exposed, And the second region is a region of a portion where the heat reflection film and the heat absorption film overlap each other. The method of claim 3, wherein The heat reflection film is installed on the entire inner surface of the container, And the heat absorption film is provided inside the heat reflection film. Claim 5 was abandoned upon payment of a set-up fee. The method of claim 3, wherein Reaction device, characterized in that the product of the absorption coefficient and the film thickness of the heat absorption film is 2.3 to 10. Claim 6 was abandoned when the registration fee was paid. The method of claim 3, wherein The heat absorption membrane is a reactor, characterized in that made of any one of C, Fe, Co, Pt, Cr. Claim 7 was abandoned upon payment of a set-up fee. The method of claim 3, wherein The heat absorption film is made of Ta-Si-ON based amorphous semiconductor, and the molar ratio of Ta-Si-ON based amorphous semiconductor is 0.6 <Si / Ta <1.0 and 0.15 <N / O <4.1. Reactor. delete Claim 9 was abandoned upon payment of a set-up fee. The method of claim 1, On the inner surface of the container, A heat absorption film for absorbing at least a portion of the heating wire radiated from the reactor body, A heat reflection film having a higher heat ray reflectance than the heat absorption film, The first region is a region of the overlapping portion of the heat absorption film and the heat reflection film, And the second region is a region of a portion where the heat absorption film is exposed. Claim 10 was abandoned upon payment of a setup registration fee. The method of claim 9, Reaction device, characterized in that the product of the absorption coefficient and the film thickness of the heat absorption film is 2.3 to 10. Claim 11 was abandoned upon payment of a setup registration fee. The method of claim 9, The heat absorption membrane is a reactor, characterized in that made of any one of C, Fe, Co, Pt, Cr. The method of claim 9, The heat absorption film is made of a Ta-Si-ON based amorphous semiconductor, and the molar ratio of the Ta-Si-ON based amorphous semiconductor is 0.6 <Si / Ta <1.0 and 0.15 <N / O <4.1. Reactor. delete The method of claim 1, The reactor body part comprises a reformer for generating hydrogen from a mixture of carbon compound and water containing hydrogen. A reaction apparatus main body portion having a first and second reaction portions at different temperatures, wherein the first reaction portion is a reaction portion at a higher temperature than the second reaction portion, A container accommodating the reactor body, A first heat reflection film provided on an inner surface of the container and having a higher heat ray reflectance than the container; And a second heat reflection film which is provided inside the first heat reflection film and is located in a region facing the first reaction portion, and has a higher heat ray reflectance than the container. A reaction apparatus body part causing a reaction of the reactants, A heat reflection film provided opposite to an outer surface of the reactor main body and reflecting a heat ray radiated from the reactor main body; And a heat dissipation facilitator for transmitting or absorbing at least a portion of the heating wire radiated from the reactor main body. Claim 17 was abandoned upon payment of a registration fee. The method of claim 16, The heat reflection film is formed of a film made of any one of gold, aluminum, silver and copper. Claim 18 was abandoned upon payment of a set-up fee. The method of claim 16, The reactor main body portion has a first reaction portion set at a first temperature and causing a reaction of a first reactant, a second reaction portion set at a second temperature lower than the first temperature and causing a reaction of a second reactant, And the heat dissipation promoting part is provided in a region facing the second reaction part. Claim 19 was abandoned upon payment of a registration fee. The method of claim 18, The first reaction unit has a reformer supplied with a vaporized hydrocarbon-based liquid fuel as a reactant and generating a gas containing hydrogen from the reactant as a reaction product, The second reaction unit is a reaction apparatus, characterized in that the reaction product is supplied as a reactant and has a carbon monoxide remover to remove the carbon monoxide contained in the reaction product. Claim 20 was abandoned upon payment of a registration fee. The method of claim 18, The first reaction part and the second reaction part are disposed apart from each other, The reactor main body portion further comprises a connecting portion in communication with the first reaction portion and the second reaction portion. The method of claim 20, Reactor comprising a heat insulation chamber between the first reaction portion and the second reaction portion. The method of claim 20, The reactor main body part includes a heating part for supplying heat to the first reaction part to set the first reaction part to the first temperature and at the same time setting the second reaction part to the second temperature through the connecting part. Reactor characterized in that. Claim 23 was abandoned upon payment of a set-up fee. The method of claim 16, And the heat dissipation promoting unit is an opening provided in the heat reflection film. Claim 24 was abandoned when the setup registration fee was paid. The method of claim 16, A container accommodating the reaction apparatus main body therein and having a lower heat ray reflectance than the heat reflection film; The heat reflection film is installed on the inner wall surface of the vessel. Claim 25 was abandoned upon payment of a registration fee. The method of claim 24, The vessel is a reactor, characterized in that the glass. Claim 26 was abandoned upon payment of a registration fee. The method of claim 24, The reactor according to claim 1, wherein the vessel is at a vacuum pressure. Claim 27 was abandoned upon payment of a registration fee. The method of claim 24, Claim 28 was abandoned upon payment of a registration fee. The method of claim 27, The support part supplies the reactants used for the reaction in the reactor body part from the outside of the vessel to the reactor body part, and simultaneously discharges the product generated by the reaction in the reactor body part to the outside of the container. Reactor comprising a plurality of flow paths for. Claim 29 was abandoned upon payment of a set-up fee. The method of claim 27, The reactor body part, A first reaction part set at a first temperature and causing a reaction of the first reactant, A second reaction portion set at a second temperature lower than the first temperature and causing a reaction of the second reactant, The heat dissipation promotion unit is installed in an area facing the second reaction unit, And the support portion is provided at one end portion on the side of the second reaction portion of the reactor main body portion. The method of claim 24, The reactor body and the vessel, A pair of upper and lower substrates forming the container; And a plurality of substrates including an intermediate substrate having a body portion forming the reactor portion and a frame portion spaced apart from the outside of the body portion to form the vessel. The method of claim 30, Reactors characterized in that the plurality of intermediate substrates forming the reactor body portion. A container accommodating the reactor body portion having the first and second reaction portions at different temperatures; And first and second regions having different heat ray reflectances provided in the container or inside the container, The first reaction part is a reaction part having a higher temperature than the second reaction part, and the first area has a higher reflectance with respect to the hot wire radiated from the reaction apparatus main body part than the second area. And the first region is provided to face at least the first reaction portion, and the second region is provided to face the second reaction portion. A reactor main body having a first and a second reaction part, A container accommodating the reactor body, A first region located at least inside the vessel or the vessel, the first region positioned opposite the first reaction portion and the second region positioned opposite the second reaction portion, And a power generation cell for generating power by fuel generated by the reactor body, And the first reaction section is set at a temperature higher than that of the second reaction section, and the first region has a higher reflectance with respect to the hot wire radiated from the reactor main body section than the second region. A reactor main body having a first and a second reaction part, A container accommodating the reactor body, A first region located at least inside the vessel or the vessel, the first region positioned opposite the first reaction portion and the second region positioned opposite the second reaction portion, A power generation cell for generating power by fuel generated by the reactor body; And an electronic device body operated by electricity generated by the power generation cell, And the first reaction section is set at a temperature higher than that of the second reaction section, and the first region has a higher reflectance with respect to the hot wire radiated from the reactor main body section than the second region.

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