KR100860953B1 - Method for manufacturing roll stamp for imprinting - Google Patents
Method for manufacturing roll stamp for imprinting Download PDFInfo
- Publication number
- KR100860953B1 KR100860953B1 KR1020070067083A KR20070067083A KR100860953B1 KR 100860953 B1 KR100860953 B1 KR 100860953B1 KR 1020070067083 A KR1020070067083 A KR 1020070067083A KR 20070067083 A KR20070067083 A KR 20070067083A KR 100860953 B1 KR100860953 B1 KR 100860953B1
- Authority
- KR
- South Korea
- Prior art keywords
- roll
- stamp
- laser
- imprint
- polymer
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0015—Production of aperture devices, microporous systems or stamps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Abstract
Disclosed is a roll stamp manufacturing method for imprint. Method for manufacturing a roll stamp for imprint according to the present invention comprises the steps of coating a polymer that can be cured by laser exposure on the outer periphery of the roll 120; Curing the polymer by interfering and diffracting a laser irradiated from a laser irradiation apparatus (100) to laser exposure the polymer in a predetermined form; Dissolving and removing the surface not exposed by the laser with an organic solvent; And inserting the roll into the helical type cylindrical plasma chamber 130 using the residual hardened exposure surface as an etch stop layer to directly dry or wet etch the roll to obtain a roll stamp having a pattern directly formed on the surface of the roll. It includes. According to this, since the pattern is formed on the outer circumference of the roll 120 by direct etching by plasma, it is not necessary to wind the conventional flexible stamp or the metal flat plate on the roll 120, so that the pattern can be formed accurately, so that the roll When imprinting is performed using a stamp, imprint quality defects can be prevented and the imprint quality can be increased.
Description
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a roll stamp for imprint, wherein the polymer applied to the outer periphery of the roll is cured into a predetermined shape by exposure by laser irradiation, and the non-exposed polymer is removed. Thereafter, the present invention relates to a roll stamp manufacturing method for imprint, which can produce a roll stamp having a pattern formed on an outer circumference by directly etching a polymer in a non-contact manner by using a residual hardened exposure surface as an etch stopper film.
For example, in the semiconductor device manufacturing process, an imprint technique is applied as a technique for forming a fine pattern. Such imprint techniques can be broadly divided into using a thermosetting method and an ultraviolet curing method.
In the imprint method using the thermosetting method, as shown in FIG. 1, a resin is coated on one surface of a substrate formed of silicon, glass, film, or the like, and a patterned surface of a previously manufactured flat stamp is applied to the substrate. By heating and pressing the coated resin portion, the resin of the substrate is cured by heat to form a pattern on the substrate in a shape opposite to the patterned surface formed on the flat stamp.
In addition, the imprint method using the latter ultraviolet curing method also uses the flat stamp as described above.
Such flat stamps have the advantage of being relatively easy to manufacture, but when the flat stamp is brought into contact with a resin-coated substrate for imprint, if the substrate has a large area, it takes a long time to align the large area. This results in a decrease in productivity. This will have a negative effect on reducing production costs in the increasingly competitive industrial field.
Further, since the flat stamp is in surface contact with the substrate, when the flat stamp is released, there is a possibility that the pattern stamped on the substrate or the flat stamp may be damaged.
On the other hand, in order to imprint the substrate in a line contact manner, a roll stamp in the form of a conventional roll has been proposed, and a manufacturing method thereof is shown in FIG. 2.
Looking at the conventional method of manufacturing a roll stamp, as shown in Figure 2 (a), a flat stamp patterned on one side by a method such as electron beam lithography (E-beam lithography) on a flexible coating coated with a polymer on one side When pressed, a pattern opposite to the patterned side of the flat stamp is imprinted on the polymer coated on the flexible stamp. As shown in Fig. 2 (b), the flexible stamp is wound around the outer periphery of the roll so that the polymer portion having the pattern formed thereon is exposed to the outside, and as shown in Fig. 2 (c), the pattern is formed on the outer periphery. This formed roll stamp can be obtained. That is, the flexible stamp is duplicated by a flat plate stamp, and the duplicated flexible stamp is wound on a roll to produce a roll stamp.
In addition, although not shown here, another method is also proposed, in which a pattern is formed on a metal plate by exposure, and then the metal plate is wound on a roll after etching.
However, the conventional roll stamp manufacturing methods have the following problems.
That is, when winding a flexible stamp or a metal flat plate on a roll, a pattern is inevitably deformed, so that when imprinting is performed using a roll stamp manufactured by a conventional method, the substrate 1 (see Fig. 1) There is a problem in that the pattern is not accurately etched, which causes an imprint quality problem. In addition, a lot of materials such as flat stamps, flexible stamps, metal flat plates, there is a problem that the roll stamp manufacturing cost increases.
The present invention has been made in consideration of the above-described conventional problems, and manufactures a roll stamp for imprint which can form a roll stamp by directly forming a pattern on the outer periphery of the roll by exposure by laser irradiation and non-contact etching by plasma. It is an object to provide a method.
In order to achieve the above object, the imprint resin double-sided dispensing method according to the present invention comprises the steps of coating a polymer that can be cured by laser exposure on the outer periphery of the roll; Curing the polymer by interfering and diffracting a laser irradiated from a laser irradiation device to laser exposure the polymer in a predetermined form; Dissolving and removing the surface not exposed by the laser with an organic solvent; And putting the roll into a helical type cylindrical plasma chamber using the residual hardened exposure surface as an etch stop layer, and directly dry etching or wet etching the roll to obtain a roll stamp having a pattern directly formed on the surface of the roll. It is done by
According to the present invention, the residual cured exposure surface serving as the etch stop layer is removed using an oxygen plasma.
According to the imprinting resin double-sided dispensing method according to the present invention configured as described above, by forming a pattern by direct etching with plasma on the outer periphery of the roll, there is no need to wind a conventional flexible stamp or metal plate on the roll, Since the pattern can be formed accurately, the imprint quality defect can be prevented and the imprint quality can be increased when the imprint is performed using the roll stamp.
In addition, since materials such as flat stamps, flexible stamps, and metal flat plates, which are conventionally used for manufacturing roll stamps, are excluded, an effect of reducing the manufacturing cost of roll stamps can also be obtained.
The features and advantages of the present invention will become more apparent from the following detailed description based on the accompanying drawings. Prior to this, the terms or words used in the present specification and claims are defined in the technical spirit of the present invention on the basis of the principle that the inventor can appropriately define the concept of the term in order to explain his invention in the best way. It must be interpreted to mean meanings and concepts.
3 is a process diagram for performing the imprint resin double-sided dispensing method according to the present invention, Figure 4 is a flow chart illustrating the imprinting resin double-sided dispensing method according to the present invention.
As shown in FIG. 3, in the method of manufacturing a roll stamp for imprint according to the present invention, a laser irradiation apparatus 100 is applied to manufacture a roll stamp having a pattern formed by direct etching on the surface of the
The laser irradiated from the laser irradiation device 100 is irradiated and diffracted by the interference diffraction mirror 101 and irradiated onto the polymer coated on the outer circumference of the
In addition, in the present invention, the pattern is directly etched by the plasma on the outer periphery of the
Next, a roll stamp manufacturing method for an imprint according to the present invention performed using the above apparatus will be described with reference to FIGS. 3 and 4.
First, the outer circumference of the
Next, while rotating the
In this case, the portion of the polymer not exposed to the laser remains uncured, and the non-exposed portion is dissolved in an organic solvent and removed.
Therefore, the outer circumferential surface of the non-polymer coated
Next, the
That is, the outer circumferential surface of the non-polymer coated
In addition, the residual cured exposed surface that functions as an etch stop layer may be removed using an oxygen plasma.
Thus, a pattern without elements such as polymers or flexible stamps can finally obtain a roll stamp etched directly on the outer periphery of the
According to the method for manufacturing a roll stamp for imprint according to the present invention configured as described above, by forming a pattern by direct etching with plasma on the outer periphery of the
1 is a view for explaining an imprint method by a flat stamp.
2 is a process chart for explaining a conventional roll stamp manufacturing method.
3 is a process chart for explaining the roll stamp manufacturing method for imprint according to the present invention.
4 is a flowchart illustrating a method of manufacturing a roll stamp for imprint according to the present invention.
<Explanation of symbols for the main parts of the drawings>
100: laser irradiation device 120: roll
130: plasma chamber
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070067083A KR100860953B1 (en) | 2007-07-04 | 2007-07-04 | Method for manufacturing roll stamp for imprinting |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070067083A KR100860953B1 (en) | 2007-07-04 | 2007-07-04 | Method for manufacturing roll stamp for imprinting |
Publications (1)
Publication Number | Publication Date |
---|---|
KR100860953B1 true KR100860953B1 (en) | 2008-09-30 |
Family
ID=40023907
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020070067083A KR100860953B1 (en) | 2007-07-04 | 2007-07-04 | Method for manufacturing roll stamp for imprinting |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100860953B1 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101340289B1 (en) * | 2011-11-14 | 2013-12-10 | (주)미래씨엔피 | UV-roll manufacturing process patterns |
KR101688457B1 (en) | 2015-10-08 | 2016-12-22 | 한국기계연구원 | Laser direct writing apparatus using micro lens |
KR20170030208A (en) | 2015-09-09 | 2017-03-17 | 한국기계연구원 | Apparatus for manufacturing roll stamp and method for manufacturing roll stamp using the same |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR200353907Y1 (en) * | 2004-03-19 | 2004-06-22 | 주식회사 프로텍 | Resin dispensing apparatus for semiconductor device |
KR20070050569A (en) * | 2005-11-11 | 2007-05-16 | 삼성전자주식회사 | Apparatus for sensing position of coating liquid nozzle tip in semiconductor fabricating equipment |
-
2007
- 2007-07-04 KR KR1020070067083A patent/KR100860953B1/en not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR200353907Y1 (en) * | 2004-03-19 | 2004-06-22 | 주식회사 프로텍 | Resin dispensing apparatus for semiconductor device |
KR20070050569A (en) * | 2005-11-11 | 2007-05-16 | 삼성전자주식회사 | Apparatus for sensing position of coating liquid nozzle tip in semiconductor fabricating equipment |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101340289B1 (en) * | 2011-11-14 | 2013-12-10 | (주)미래씨엔피 | UV-roll manufacturing process patterns |
KR20170030208A (en) | 2015-09-09 | 2017-03-17 | 한국기계연구원 | Apparatus for manufacturing roll stamp and method for manufacturing roll stamp using the same |
KR101688457B1 (en) | 2015-10-08 | 2016-12-22 | 한국기계연구원 | Laser direct writing apparatus using micro lens |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100674157B1 (en) | Nanoimprint lithograph for fabricating nanoadhesive | |
JP5299139B2 (en) | Manufacturing method of mold for nanoimprint | |
KR101541814B1 (en) | Nano-imprint lithography process | |
JP2008296579A (en) | Mask mold, its manufacturing method and molding method of large-area micro-pattern using manufactured mask mold | |
CN101183214A (en) | Method and system for tone inverting of residual layer tolerant imprint lithography | |
JP2010074163A (en) | Method of manufacturing mold for nano imprint, and pattern forming method using mold for nano imprint | |
KR100860953B1 (en) | Method for manufacturing roll stamp for imprinting | |
KR100974182B1 (en) | Method for imprinting dual side using roll stamps | |
KR100582781B1 (en) | Stamper-manufacturing method for imprint lithography | |
KR100842931B1 (en) | Fabricating method of roll stamp using imprint lithography | |
TWI693141B (en) | Copy mold for nano-imprint, manufacturing method thereof, and copy mold manufacturing apparatus for nano-imprint | |
EP1708022A1 (en) | Nanoimprint lithograph for fabricating nanopattern in a resist layer | |
WO2015043321A1 (en) | Nanoimprint lithography device and method | |
KR20140110397A (en) | Patterning method using reversal imprint process | |
CN116300304A (en) | Mask plate suitable for UV-NIL technology, and preparation method and application thereof | |
KR20110140059A (en) | Stamp for nano-imprint and manufacturing method thereof | |
KR20160012810A (en) | Method of transferring reverse pattern using imprint process | |
TW201733772A (en) | Method for manufacturing circuit board and stamp | |
JP2010282995A (en) | Imprint pattern forming method | |
CN110651357A (en) | Plasma etching method using imprinted micropatterns | |
KR101617952B1 (en) | A method of forming structures with tapered opening using soft lithographic approach | |
JP2005353926A (en) | Cleaning method and manufacturing method of substrate | |
EP3440510B1 (en) | Method of making a patterned flexographic printing plate | |
CN114488687A (en) | Transfer roller manufacturing method and transfer film manufacturing method | |
KR101480000B1 (en) | Mold, manufacturing method of the same and method for forming patterns using the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20130315 Year of fee payment: 5 |
|
FPAY | Annual fee payment |
Payment date: 20130925 Year of fee payment: 6 |
|
FPAY | Annual fee payment |
Payment date: 20140925 Year of fee payment: 7 |
|
FPAY | Annual fee payment |
Payment date: 20150925 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20160620 Year of fee payment: 9 |
|
LAPS | Lapse due to unpaid annual fee |