KR100854080B1 - Apparatus for treating exhaust gas using atmospheric plasma - Google Patents

Abstract

An exhaust gas processing apparatus using atmospheric plasma is provided to prevent a solid deposit from being stuck to the inner wall of an exhaust pipe by analyzing and exhausting the composition of gas exhausted from an exhaust pipe of a bake apparatus. An insulation pipe(100) is connected to an exhaust pipe(40) in a manner that exhaust gas can pass. A high voltage electrode part(200) is installed in the inner or outer portion of the insulation pipe, separated from the end of the insulation pipe. A low voltage electrode part(300) is installed in the inner or outer portion of the insulation pipe, separated from the high voltage electrode part and the end of the insulation pipe. A power part(400) applies a voltage to a gap between the high voltage electrode part and the low voltage electrode part. The high voltage electrode part and the low voltage electrode part can be installed in the inner portion of the insulation pipe.

Description

Exhaust gas treatment system using atmospheric pressure plasma {APPARATUS FOR TREATING EXHAUST GAS USING ATMOSPHERIC PLASMA}

The present invention relates to an exhaust gas treating apparatus using atmospheric pressure plasma, and more particularly, to an exhaust gas treating apparatus using atmospheric pressure plasma for treating components of exhaust gas discharged through an exhaust pipe of a baking apparatus.

In general, as the size of the circuit pattern becomes smaller with increasing integration of semiconductor devices, management of various parameters of the photolithography process is more and more strictly managed.

The photolithography process consists of applying a photoresist film on the wafer, exposing the light of the circuit pattern to the photoresist film, and developing the wafer exposed to the light, and baking the wafer to a constant temperature between each step. will perform the (bake) step.

In order to perform the photolithography process, apparatuses necessary for each step, for example, a coating apparatus, an exposure apparatus, a developing apparatus, and a baking apparatus, are used, and recently, the coating apparatus, the developing apparatus, and the baking apparatus are located in one place. Increasingly, the use of clustered systems, which aim to streamline the process by reducing the travel distance and time, is increasing.

On the other hand, the above-described bake step is a pre bake performed before the photosensitive film is applied to the wafer, a soft bake or pre exposure bake performed after the photosensitive film is applied, and a post-exposure bake performed after the exposure step. (post exposurebake), there is a hard bake (etch) before the etching or ion implantation process.

In this case, the soft bake process is a process for removing the solvent (solvent) of the components of the photosensitive agent after the photosensitive agent is applied, and the photosensitive agent is generally placed on a hot plate maintained at a high temperature of about 100 ~ 140 ℃ The solvent is removed by leaving the coated wafer for a certain time. Through this soft baking process, the volatile solvent contained in the photosensitive agent is exhausted through the exhaust line, and the photosensitive film is stabilized.

At this time, an example of the material used as a solvent is ethoxyethyl acetylene (C ₂ H ₁₂ O ₃ ), in addition to PGMEA (propylene glycol monomethyl ether acetate), EGMEA (ethylene glycol monoethylether acetate), MMP (methyl-3-methoxypropionate). These solvents are volatiles that dissolve other components of the photoresist, such as resin and photo active compounds.

1 is a perspective view showing a schematic structure of a conventional baking apparatus, and FIG. 2 is a perspective view showing an exhaust pipe of the baking apparatus of FIG.

As shown in FIG. 1, a conventional baking apparatus includes a cylindrical hot plate 10 on which a wafer coated with a photosensitive agent is mounted, a heating means (not shown) for heating the hot plate, and an upper side thereof is opened to open the hot plate. A baking chamber 20 provided to surround the outside of the 10, a disc shaped cover portion 30 provided to cover the upper portion of the baking chamber 20, and an exhaust pipe formed to communicate with the cover portion 30 ( 40).

Therefore, the soft bake process is performed for a predetermined time while the photosensitive agent-coated wafer is placed on the heated hot plate 10. In this soft bake process step, a solvent and a photoresist resin (hereinafter referred to as "PR resin"), which are volatile components of the photoresist applied to the upper surface of the wafer, are evaporated to communicate the exhaust pipe 40 in communication with the cover part 30. Passed through.

However, the solvent and the PR resin evaporated from the wafer as the several soft bake processes progress, are gradually fixed to the inner wall of the exhaust pipe 40, as shown in Figure 2, and periodically fixed solid precipitate (A) If not removed, there is a problem that the exhaust pipe 40 is blocked, or proper control is not made when opening and closing the exhaust pipe for temperature control.

In addition, the process yield of the entire baking device is lowered due to the above problems, the yield management for a constant mass production is not easy, and the trouble of having to clean the periodic exhaust pipe 40 occurs, thereby reducing the yield of the entire semiconductor equipment. Cause problems.

In addition, there is a problem that the periodic productivity of the baking apparatus due to the operation of periodically cleaning the exhaust pipe 40, the semiconductor productivity is lowered, and the maintenance cost is continuously generated.

The present invention has been made in view of the above problems, by using a normal pressure plasma to decompose and discharge the components of the exhaust gas discharged through the exhaust pipe of the baking apparatus to prevent the solid deposits fixed on the inner wall of the exhaust pipe, exhaust Provided is an exhaust gas treating apparatus using an atmospheric pressure plasma which can prevent the organic compound contained in the gas from being released into the air as it is so that environmental pollution does not occur.

In order to achieve this technical problem, the exhaust gas treatment apparatus using the atmospheric pressure plasma of the present invention is mounted to the exhaust pipe of the bake (bak) device, the insulated pipe connected to the exhaust pipe so that the exhaust gas passes; A high voltage electrode unit provided at an inner side or an outer side of the heat pipe; A low voltage electrode part spaced apart from the high voltage electrode part and provided on an inner side or an outer side of the insulation tube; And a power supply unit applying a voltage between the high voltage electrode part and the low pressure electrode part.

Preferably, the high voltage electrode part may be provided on the inner side of the insulated tube, and the low pressure electrode part may be provided on the outer side of the insulated tube.

More preferably, the high voltage electrode part may be fixedly installed in the shape of a rod on the inner central axis of the insulated tube, and the low pressure electrode part may be coated or coated on the outer surface of the insulated tube.

More preferably, the insulated tube is formed by connecting a long insulated tube and a short insulated tube to each other, and one end of the high voltage electrode part is connected to the long insulated tube and the short insulated tube. The other end of the high voltage electrode part may be fixed along a central axis of the inner space of the long insulating tube.

More preferably, at one end of the high voltage electrode portion, a cross-shaped coupling portion is formed to be fixed to the connection portion between the long insulated tube and the short insulated tube, and the long insulated tube and the short insulated tube are formed. Connection portions of the coupling grooves corresponding to the cross-shaped coupling portion may be formed respectively.

Preferably, the low voltage electrode unit is any one of a cylindrical shape surrounding the outer surface of the insulated tube or a coil type wound around the outer surface of the insulated tube or a ring type connected to a plurality of rings surrounding the outer surface of the insulated tube at predetermined intervals. It may be formed in the form of.

Preferably, a ceramic coating layer may be formed on the outer surface of the insulator tube to cover the low pressure electrode.

Preferably, the high voltage electrode part may be provided at an outer side of the insulator tube, and the low pressure electrode unit may be provided at an inner side of the insulator tube.

More preferably, the low pressure electrode portion may be fixedly installed in a rod shape on the inner central axis of the insulated tube, and the high voltage electrode portion may be provided coated or coated on the outer surface of the insulated tube.

More preferably, the insulated tube is formed by connecting a long insulated tube and a short insulated tube to each other, and one end of the low voltage electrode part is connected to the long insulated tube and the short insulated tube. It is fixed to the portion, the other end of the low voltage electrode portion may be formed along the central axis of the internal space of the long insulated tube (long).

More preferably, at one end of the low voltage electrode portion, a cross coupling portion is formed to be fixed to a connection portion between the long insulator tube and the short insulator tube, and the long insulator tube and the short insulator tube are formed. Connection portions of the coupling grooves corresponding to the cross-shaped coupling portion may be formed respectively.

Preferably, the high voltage electrode unit is any one of a cylindrical shape surrounding the outer surface of the insulated tube or a coil type wound around the outer surface of the insulated tube or a ring type in which a plurality of rings are wrapped around the outer surface of the insulated tube at predetermined intervals. It may be formed in the form of.

Preferably, a ceramic coating layer covering the high voltage electrode part may be formed on an outer surface of the insulating tube.

Preferably, the high voltage electrode part and the low pressure electrode part may be provided on the inner side of the insulating tube.

More preferably, the high voltage electrode portion and the low voltage electrode portion may be alternately arranged in the inner portion of the insulating tube.

Preferably, the high voltage electrode portion and the low pressure electrode portion may be provided on the outer side of the insulating tube.

More preferably, the high voltage electrode portion and the low voltage electrode portion may be alternately arranged in the outer portion of the insulating tube.

More preferably, the high voltage electrode portion and the low pressure electrode portion may be provided in a spiral in the outer portion of the insulating tube.

Preferably, a ceramic coating layer covering the high voltage electrode part and the low pressure electrode part may be formed on an outer surface of the insulating tube.

Preferably, both sides of the insulated tube, may be provided with a connection cap for connecting to the exhaust pipe.

Preferably, a heat sink for dissipating heat from the insulating tube may be provided at an outer portion of the insulating tube.

According to the present invention as described above, by decomposing and discharging the components of the exhaust gas discharged through the exhaust pipe of the baking apparatus by using the atmospheric pressure plasma it is possible to prevent the solid deposit on the inner wall of the exhaust pipe.

In addition, the organic compound contained in the exhaust gas can be prevented from being released into the atmosphere as it is so that environmental pollution does not occur.

In addition, since it is not necessary to periodically clean the exhaust pipe, there is an advantage that the production of a product using a baking device, such as a semiconductor wafer, LCD, etc. is increased, and the yield of the entire semiconductor equipment or the LCD equipment is improved.

< First embodiment : High voltage electrode part  It is provided in the inner side of the insulated tube, Low voltage electrode part  When provided on the outer side of the insulated pipe>

In the exhaust gas treatment apparatus using the atmospheric pressure plasma of the first embodiment, the insulating tube 100, the high pressure electrode unit 200, the low pressure electrode unit 300, and the power supply unit 400 are basically components, and the connection cap ( 500, and further comprises a heat sink 600.

The insulator tube 100 is a portion in which an inlet and an outlet are formed to pass through the exhaust gas G discharged from the exhaust pipe 40 of the baking apparatus and communicate with the exhaust pipe 40. The high voltage electrode part 200 is fixedly installed on an inner space center axis of the insulating tube 100, and the low pressure electrode part 300 is provided to surround the outer surface of the insulating tube 100. The voltage is applied by the power supply unit 400 between the high voltage electrode part 200 and the low pressure electrode part 300 to generate an atmospheric pressure plasma.

First, the insulating tube 100 will be described.

The insulated pipe 100 is formed in a cylindrical shape so that the exhaust gas G discharged from the exhaust pipe 40 of the baking apparatus passes. The side into which the exhaust gas G flows becomes an inlet, and the exhaust gas G The discharge side becomes the outlet. At this time, the shape of the insulation tube 100 can be formed by selecting arbitrarily, such as square, hexagon, etc. in addition to the circular.

The insulator tube 100 is connected to the exhaust pipe 40 to provide a space where atmospheric pressure plasma can be generated while the exhaust gas G passes, and at the same time, the high pressure electrode unit 200 and the low pressure electrode unit 300 to be described later. It functions to insulate between.

On the other hand, both sides of the insulating tube 100, that is, the inlet and outlet may be provided with a connection cap 500 to facilitate the connection with the exhaust pipe (40).

In addition, the material of the insulation tube 100 may be made of ceramic (ceramic), mica (mica), glass, quartz, etc. to easily insulate between the high voltage electrode portion 200 and the low voltage electrode portion 300, Insulating tube 100 heat-resistant and insulated cylindrical structure may be used.

As shown in FIGS. 4 and 5, the insulator tube 100 is formed by connecting the long insulator tube 110 and the short insulator tube 120 to each other and to be described later. The long insulated tube 110 and the short insulated tube may be fixed such that one end of the 200 may be fixed to a connection portion between the long insulated tube 110 and the short insulated tube 120. Coupling grooves 110h and 120h are formed in connection portions of 120, respectively. The coupling relationship between the long insulator tube 110, the short insulator tube 120, and the high voltage electrode unit 200 will be described in detail with respect to the high voltage electrode unit 200.

On the other hand, as described above, one end of the high voltage electrode portion 200 is not located at the end side of the insulator tube 100, and the long insulated tube 110 and the short insulated tube 120 are connected. By being located in the portion, it is possible to prevent the spark that can occur to the outside through the hole of the insulating tube 100 from one end of the high-voltage electrode portion 200.

The outer surface of the insulator tube 100 may be provided with a heat sink 600 for dissipating heat generated during the atmospheric pressure plasma reaction, the heat sink 600 by the heat sink 600 is too hot It can prevent rising high.

At this time, the heat sink 600 is preferably made of an aluminum material having excellent heat transfer. For example, the heat sink 600 may be formed of “AL 6061”.

In addition, the heat sink 600 does not maintain its own temperature of the insulated tube 100 and the self-temperature of the insulated tube 100 is sensed in case the temperature of the insulated tube 100 rises too high. It is provided with a temperature sensor (not shown), and if the temperature is sensed higher than the set temperature by detecting the self temperature of the insulation tube 100 through this temperature sensor, it can be made to interrupt by generating an alarm.

Next, the high voltage electrode unit 200 will be described.

The high voltage electrode part 200 is fixedly installed on an inner space center axis of the insulating tube 100 and is a part receiving an AC voltage from the power supply part 400 which will be described later.

As shown in FIG. 5, at one end of the high voltage electrode part 200, a cross coupling part 210 is fixed to a connection portion between the long insulating tube 110 and the short insulating tube 120. The other end of the high voltage electrode part 200 extends in the form of a rod along the central axis of the inner space of the long insulating tube 110.

Each end of the cross coupling portion 210 is fitted into the coupling grooves (110h, 120h) formed in the connection portion of the long insulated pipe (110) and the short insulated pipe (120), respectively, the cross coupling A protruding portion 212 is formed in the other end direction from the portion 210 and is fitted to the inner surface of the long insulating tube 110.

That is, each end of the cross coupling portion 210 is fitted into the coupling grooves 110h and 120h, and at the same time, the protrusion 212 is fitted to the inner surface of the long insulated pipe 110, so that the high voltage electrode portion ( The rod-shaped portion extending to the other end of the 200 is installed so that the straightness is improved to coincide with the central axis of the long insulated pipe 110.

And at any one of each end of the cross coupling portion 210 is formed a connection groove 210h for inserting and connecting the power cable.

On the other hand, one end portion of the high voltage electrode portion 200 is not located at the end side of the insulated tube 100, but is located at the connection portion between the long insulated tube 110 and the short insulated tube 120. To prevent sparks that may occur from one end of the high voltage electrode portion 200 to the outside of the insulating tube 100, as shown in Figure 3, the other end of the high voltage electrode portion 200 of the insulating tube 100 It is formed to extend to a position away from the end side by a predetermined distance to prevent sparks that may occur to the outside through the hole of the insulating tube 100 from the other end of the high-voltage electrode portion 200.

At this time, the outer surface including the connection portion of the long insulated pipe 110 and the short insulated pipe 120 except for the end formed with the connecting groove 210h, as shown in Figure 3, brazing By forming the ceramic coating layer 700 by brazing and ceramic coating, the spark is prevented from occurring in the gap between the connecting portion between the long insulating tube 110 and the short insulating tube 120. The low voltage electrode 300 is protected and insulated from contact with the outside.

The material of the high voltage electrode part 200 may be made of tungsten having good electrical conductivity and high melting point. In addition, silver, copper, gold, aluminum, and chromium may be arbitrarily selected.

Next, the low voltage electrode unit 300 will be described.

The low voltage electrode unit 300 is a portion provided to surround the outer surface of the insulation tube 100, and may be configured by coating or applying a material having good electrical conductivity to the outer surface of the insulation tube 100.

The low voltage electrode unit 300 is a cylindrical or entirely coiled around the outer surface of the insulated tube 100 or coil type wound around the outer surface of the insulated tube 100, as shown in Figure 5, a plurality of rings The low voltage electrode part 300 may be formed in a structure in which three rings are connected to each other in four parts.

Meanwhile, a part of the low voltage electrode part 300 is formed with a connection part 302 for connecting a cable.

In the above, the shape of the low voltage electrode part 300 is formed in any one of a cylindrical shape, a coil shape, and a ring shape, but the shape of the low pressure electrode part 300 is provided on the outer surface of the insulating tube 100 without departing from the basic concept. It can be arbitrarily modified and applied.

As described above, the ceramic coating layer (700 of FIG. 3) covering the low voltage electrode part 300 is formed on the outer surface of the insulating tube 100 to form the long insulating tube 110 and the end. The spark is prevented from occurring in the gap between the connection part of the insulator tube 120, and the low pressure electrode part 300 is protected and insulated from contact with the outside.

Next, the power supply unit 400 will be described.

The power supply unit 400 is a portion for applying an alternating voltage to the high voltage electrode unit 200. In detail, the power supply unit 400 generates a specific type of alternating voltage such as a sine wave, a square wave, a stair wave, or the like, such as a sine wave or a cosine wave. It is applied to the unit 200.

The power supply unit 400 may stop supplying the AC voltage applied to the high voltage electrode unit 200 when the temperature detected by the temperature sensor detecting the self temperature of the insulation tube 100 is higher than the set temperature. You can also do that.

Hereinafter, the exhaust gas processing principle of the exhaust gas processing apparatus using the atmospheric pressure plasma of the first embodiment configured as described above will be described.

As shown in FIG. 3, the solvent and the PR resin, which are volatile components of the photosensitive agent applied to the upper surface of the wafer during the baking process for a predetermined time in a state where the photosensitive agent-coated wafer is placed on the heated hot plate 10, Evaporated and discharged through the exhaust pipe 40 in communication with the cover 30, this exhaust gas (G) is passed through the insulating tube (100).

The exhaust gas G passing through the insulator tube 100 is decomposed by chemical and physical reactions by atmospheric pressure plasma generated between the high voltage electrode part 200 and the low pressure electrode part 300, thereby decomposing CO ₂ , CO, O ₃ , H ₂ O and the like changes to exhaust.

For example, a solvent (2-Heptanone (C ₇ H ₁₄ O), 1-methoxy-2-propyl acetate (C ₂ H), which is a volatile component of a photosensitive agent applied to an upper surface of a wafer during a baking process, may be used. ₁₂ O ₃ )) and PR resin (the main component is carbon (Chemical Formula: C)) is discharged through the exhaust pipe 40 to pass through the insulated tube 100, the solvent (C) while passing through the insulated tube 100 ₇ H ₁₄ O, C ₂ H ₁₂ O ₃ ) and PR resin (the main component is carbon (C)) are broken the chain bond by the atmospheric pressure plasma.

Accordingly, the solvent (C ₇ H ₁₄ O, C ₂ H ₁₂ O ₃ ) is decomposed into C, -COOH, OH, COO-, H ₂ , O ₃ , H, etc. in the insulating tube 100, and the insulating tube ( 100) It is combined with O * and O ₂ present in the interior to vaporize or burn in the form of CO, CO ₂ , O ₃ , H ₂ O.

◎ C ₇ H ₁₄ O, C ₂ H ₁₂ O ₃ , C (in exhaust pipe)

¡Æ C, -COOH, OH, COO-, H ₂ , O ₃ , H (in insulated tubes)

→ CO, CO ₂ , O ₃ , H ₂ O (emission)

Experimental Example

As shown in FIG. 3, the exhaust wall sequentially passes through the insulating tube 100, the organic material measuring device 1, and the pump 2 from the space enclosed by the cover part 30 and the baking chamber 20 of the baking apparatus. It was discharged to (3).

In this case, after the 0.1CC photoresist is administered to the enclosed space, the hot plate 10 is heated to generate the exhaust gas G, and the suction flow rate of the pump 2 is 15 ml / min to 500 ml / min. The exhaust gas G thus produced was discharged to the exhaust wall 3.

The amount of volatile organic sulfide (TVOC) was 371.4 ppm and the amount of representative components was measured as follows without generating atmospheric pressure plasma in the inner space of the insulator tube 100.

2-Heptanone (C ₇ H ₁₄ O): 214.4 ppm

1-methoxy-2-propyl acetate (C ₂ H ₁₂ O ₃ ): 24.2ppm

In the state where atmospheric pressure plasma was generated in the inner space of the insulator tube 100, the amount of volatile organic sulfide (TVOC) was 9.7 ppm, and the amount of representative components was measured as follows.

2-Heptanone (C ₇ H ₁₄ O): 1.5 ppm

1-methoxy-2-propyl acetate (C ₂ H ₁₂ O ₃ ): 2.3ppm

Therefore, when the state in which the atmospheric pressure plasma was not generated in the inner space of the insulated tube 100 and the state in which the atmospheric pressure plasma was generated in the inner space of the insulated tube 100 were compared, the organic matter reduction rate was about 97.388%.

Photoresist Dosage Pump suction flow rate Plasma generation OFF Plasma Generation ON Organic matter reduction rate 0.1CC 15ml / min ~ 500ml / min 371.4 ppm 9.7 ppm 96%

< Second embodiment : High voltage electrode part  It is provided in the outer part of the insulated tube, Low voltage electrode part  When provided inside the insulator tube>

In the exhaust gas treatment apparatus using the atmospheric pressure plasma of the second embodiment, as shown in FIG. 6, the insulator tube 100, the high pressure electrode unit 200, the low pressure electrode unit 300, and the power supply unit 400 are basic components. And, it is configured to further include a connection cap 500, the heat sink 600.

The insulator tube 100 is a portion in which an inlet and an outlet are formed to pass through the exhaust gas G discharged from the exhaust pipe 40 of the baking apparatus and communicate with the exhaust pipe 40. The high voltage electrode part 200 is provided to surround the outer surface of the insulator tube 100, and the low pressure electrode part 300 is fixedly installed on an inner space center axis of the insulated tube 100. The voltage is applied by the power supply unit 400 between the high voltage electrode part 200 and the low pressure electrode part 300 to generate an atmospheric pressure plasma.

On the other hand, the exhaust gas treatment apparatus using the atmospheric pressure plasma of the second embodiment compared with the exhaust gas treatment apparatus using the atmospheric pressure plasma of the first embodiment, except for the configuration of the high-pressure electrode unit 200, low pressure electrode unit 300 Since is the same, only the high voltage electrode 200 and the low voltage electrode 300 will be described.

In the exhaust gas treating apparatus using the atmospheric pressure plasma of the second embodiment, the same reference numerals are used for the components having the same names as the components of the exhaust gas treating apparatus using the atmospheric pressure plasma of the first embodiment.

First, the high voltage electrode unit 200 will be described.

The high voltage electrode part 200 is provided to surround the outer surface of the insulating tube 100, and may be configured by coating or applying a material having good electrical conductivity to the outer surface of the insulating tube 100.

The high voltage electrode part 200 may be any one of a cylindrical shape surrounding the outer surface of the insulated tube 100 or a coil type wound around the outer surface of the insulated tube 100 or a ring type in which a plurality of rings are connected to each other. 6, the high voltage electrode part 200 is formed in a structure in which three rings are connected to each other in four parts.

Meanwhile, a part of the high voltage electrode part 200 is formed with a connection part 202 for connecting a cable.

Although the shape of the high voltage electrode part 200 is formed in any one of a cylindrical shape, a coil shape, and a ring shape, the shape of the high voltage electrode part 200 does not deviate from the basic concept of being provided on the outer surface of the insulation tube 100. One can arbitrarily modify and apply.

As described above, the ceramic coating layer (not shown) covering the high voltage electrode part 200 is formed on the outer surface of the insulating tube 100 to form the long insulating tube 110 and the short insulating tube ( The spark is prevented from occurring in the gap between the connection portions of the 120 and protects the high voltage electrode part 200 and insulates it from contact with the outside.

Next, the low voltage electrode unit 300 will be described.

The low voltage electrode part 300 is a part that is fixedly installed on the inner space center axis of the insulating tube 100 and receives an AC voltage from the power supply part 400 which will be described later.

As shown in FIG. 6, at one end of the low voltage electrode unit 300, a cross coupling part 310 is fixed to a connection portion between the long insulator tube 110 and the short insulator tube 120. The other end of the low voltage electrode part 300 extends in a rod shape along the central axis of the internal space of the long insulating tube 110.

Each end of the cross coupling portion 310 is fitted into the coupling grooves (110h, 120h) formed in the connection portion of the long insulated pipe (110) and the short insulated pipe (120), respectively, the cross coupling A protruding portion 312 is formed in the other end direction from the portion 310 and fitted to the inner side surface of the long insulating tube 110.

That is, each end of the cross coupling portion 310 is fitted into the coupling grooves 110h and 120h, and at the same time, the protrusion 312 is fitted to the inner side surface of the long insulated pipe 110 so that the low voltage electrode portion ( The rod-shaped portion extending to the other end of 300 is installed so that the straightness is improved to coincide with the central axis of the long insulated pipe 110.

And one of each end of the cross coupling portion 310 is formed with a connection groove 310h for inserting and connecting the power cable.

On the other hand, one end of the low voltage electrode portion 300 is not located at the end side of the insulated tube 100, but is located at the connection portion between the long insulated tube 110 and the short insulated tube 120. Prevents sparks that may occur from one end of the low pressure electrode 300 to the outside of the insulating tube 100, and the other end of the low pressure electrode 300 to a position away from the end of the insulating tube 100 by a predetermined distance It is formed to extend to prevent sparks that may occur to the outside through the hole of the insulating tube 100 from the other end of the low-voltage electrode 300.

At this time, the outer surface including the connection portion of the long insulated pipe 110 and the short insulated pipe 120 except for the end where the connection groove 310h is formed is subjected to brazing treatment and ceramic coating treatment. By forming a ceramic coating layer (not shown), a spark is prevented from occurring in a gap between a connection portion between the long insulating tube 110 and the short insulating tube 120, and the low voltage electrode part 300 is protected. And insulate it from contact with the outside.

The material of the low pressure electrode part 300 may be made of tungsten having good electrical conductivity and high melting point. In addition, silver, copper, gold, aluminum, and chromium may be arbitrarily selected.

< Third embodiment : High voltage electrode part  And Low voltage electrode part  When provided inside the insulator tube>

Exhaust gas treatment apparatus using the atmospheric pressure plasma of the third embodiment, as shown in Figure 7, the basic configuration of the insulating tube 100, high voltage electrode portion 200, low voltage electrode portion 300, power source 400 The element further comprises a connection cap 500 and a heat sink 600.

The insulator tube 100 is a portion in which an inlet and an outlet are formed to pass through the exhaust gas G discharged from the exhaust pipe 40 of the baking apparatus and communicate with the exhaust pipe 40. The high voltage electrode part 200 and the low pressure electrode part 300 may be provided to be spaced apart from each other inside the insulating tube, and a separate insulating layer may be provided therebetween. A voltage is applied by the power supply unit 400 between the high voltage electrode part 200 and the low pressure electrode part 300 to generate an atmospheric pressure plasma.

On the other hand, the exhaust gas treatment apparatus using the atmospheric pressure plasma of the third embodiment is compared with the exhaust gas treatment apparatus using the atmospheric pressure plasma of the first embodiment, except for the configuration of the high-pressure electrode unit 200 and the low-pressure electrode unit 300 Since is the same, only the high voltage electrode 200 and the low voltage electrode 300 will be described.

In the exhaust gas treating apparatus using the atmospheric pressure plasma of the third embodiment, the same reference numerals are used for the components having the same names as the components of the exhaust gas treating apparatus using the atmospheric pressure plasma of the first embodiment.

As shown in FIG. 7, the high voltage electrode part 200 and the low pressure electrode part 300 of the third embodiment are provided on the inner side of the insulation tube 100, and at this time, the high voltage electrode part 200 and the low pressure electrode part ( 300 may be of a structure that is coupled to the cross coupling portion (250).

That is, insertion holes 250h1 and 250h2 are formed at one side of the cross coupling part 250, and the high voltage electrode part 200 and the low voltage electrode part 300 are inserted into the insertion holes 250h1 and 250h2 while being spaced apart from each other. To keep the gap.

On the other hand, the arrangement of the high voltage electrode unit 200 and the low voltage electrode unit 300, as shown in Figure 8 and 9, of course, can be applied in various ways.

In addition, the cross-shaped coupling part 250 may be made of ceramic, mica, glass, quartz, or the like so as to easily insulate between the high voltage electrode part 200 and the low voltage electrode part 300. .

The materials of the high voltage electrode part 200 and the low pressure electrode part 300 may be made of tungsten having good electrical conductivity and high melting point. In addition, silver, copper, gold, aluminum, and chromium may be arbitrarily selected. Of course.

< Fourth embodiment : High voltage electrode part  And Low voltage electrode part  When provided on the outer side of the insulated pipe>

In the exhaust gas treatment apparatus using the atmospheric pressure plasma of the fourth embodiment, the insulator tube 100, the high pressure electrode unit 200, the low pressure electrode unit 300, and the power supply unit 400 are basically components. 500, and further comprises a heat sink 600.

The insulator tube 100 is a portion in which an inlet and an outlet are formed to pass through the exhaust gas G discharged from the exhaust pipe 40 of the baking apparatus and communicate with the exhaust pipe 40. The high voltage electrode part 200 and the low voltage electrode part 300 are provided to be spaced apart from each other on the outside of the insulated tube, and the high pressure electrode part 200 and the low pressure electrode part 300 provided on the outside of the insulated tube. It is preferable that an insulating layer covering the is provided. A voltage is applied by the power supply unit 400 between the high voltage electrode part 200 and the low pressure electrode part 300 to generate an atmospheric pressure plasma.

On the other hand, the exhaust gas treatment apparatus using the atmospheric pressure plasma of the fourth embodiment is compared with the exhaust gas treatment apparatus using the atmospheric pressure plasma of the first embodiment, except for the configuration of the high-pressure electrode unit 200, low pressure electrode unit 300 Since is the same, only the high voltage electrode 200 and the low voltage electrode 300 will be described.

In the exhaust gas treatment apparatus using the atmospheric pressure plasma of the fourth embodiment, the same reference numerals are used for the components having the same names as the components of the exhaust gas treatment apparatus using the atmospheric pressure plasma of the first embodiment.

As shown in FIG. 10, the high voltage electrode part 200 and the low pressure electrode part 300 of the third embodiment are provided on the outer side of the insulation tube 100. In this case, the high voltage electrode part 200 and the low pressure electrode part ( 300 may be formed spirally surrounding the outer surface of the insulating tube (100).

In addition, connection parts 202 and 302 for connecting cables are formed in the high voltage electrode part 200 and the low voltage electrode part 300, respectively.

The materials of the high voltage electrode part 200 and the low pressure electrode part 300 may be made of tungsten having good electrical conductivity and high melting point. In addition, silver, copper, gold, aluminum, and chromium may be arbitrarily selected. Of course.

Although the embodiments of the present invention have been described in detail above, the scope of the present invention is not limited thereto, and various modifications and improvements of those skilled in the art using the basic concepts of the present invention defined in the following claims are also provided. It belongs to the scope of rights.

1 is a perspective view showing a schematic structure of a conventional baking apparatus.

2 is a perspective view showing an exhaust pipe of the baking apparatus of FIG.

3 is a schematic view showing an exhaust gas treatment system of a baking apparatus provided with an exhaust gas treatment apparatus using an atmospheric pressure plasma according to a first embodiment of the present invention.

4 is a perspective view showing the configuration of an exhaust gas treating apparatus using atmospheric pressure plasma according to the first embodiment of the present invention.

5 is an exploded perspective view showing the configuration of an exhaust gas treating apparatus using atmospheric pressure plasma according to the first embodiment of the present invention.

6 is an exploded perspective view showing the configuration of an exhaust gas treating apparatus using atmospheric pressure plasma according to a second embodiment of the present invention.

7 is an exploded perspective view showing the configuration of an exhaust gas treating apparatus using atmospheric pressure plasma according to a third embodiment of the present invention.

8 and 9 are cross-sectional views showing another example of the internal structure of the insulating tube of the exhaust gas treating apparatus using the atmospheric pressure plasma according to the third embodiment of the present invention.

10 is an exploded perspective view showing the configuration of an exhaust gas treating apparatus using atmospheric pressure plasma according to a fourth embodiment of the present invention.

<Explanation of symbols for the main parts of the drawings>

10: hot plate 20: bake chamber

30: cover part 40: exhaust pipe

100: insulated tube 110: long insulated tube

110h, 120h: Coupling groove 120: Single insulated pipe

200: high voltage electrode portion 210: cross coupling portion

300: low voltage electrode 400: power supply

500: connection cap 600: heat sink

Claims (21)

In the exhaust gas treatment apparatus using atmospheric pressure plasma mounted to the exhaust pipe of the bake device, An insulated tube connected to the exhaust pipe so that the exhaust gas passes; A high voltage electrode unit spaced apart from an end side of the heat pipe and disposed on an inner side or an outer side; A low voltage electrode part spaced apart from the high voltage electrode part and spaced apart from an end side of the insulating tube and provided on an inner side or an outer side; And And a power supply unit configured to apply a voltage between the high pressure electrode unit and the low pressure electrode unit. The method of claim 1, The high pressure electrode unit is provided on the inner side of the insulated tube, the low pressure electrode unit is an exhaust gas processing apparatus using an atmospheric pressure plasma, characterized in that provided on the outer side. The method of claim 2, The high pressure electrode unit is fixed in a rod shape on the inner central axis of the insulated tube, the low pressure electrode unit is an exhaust gas processing apparatus using an atmospheric pressure plasma, characterized in that the coating or coating is provided on the outer surface of the insulated tube. The method of claim 3, The insulated tube is composed of a long insulated tube and a short insulated tube connected to each other, and one end of the high voltage electrode part is fixed to a connection portion of the long insulated tube and the short insulated tube. And the other end of the high voltage electrode part is extended along an inner space center axis of the long insulating tube. The method of claim 4, wherein At one end of the high voltage electrode portion, a cross-shaped coupling portion is formed to be fixed to the connection portion between the long insulated tube and the short insulated tube, and the connecting portion between the long insulated tube and the short insulated tube is formed. Exhaust gas treatment apparatus using atmospheric pressure plasma, characterized in that the coupling groove corresponding to the cross-shaped coupling portion is formed, respectively. The method according to any one of claims 1 to 5, The low voltage electrode unit may be any one of a cylindrical shape surrounding the outer surface of the insulated tube, a coil type winding the outer surface of the insulated tube, or a ring type in which a plurality of rings are wrapped around the outer surface of the insulated tube at predetermined intervals. Exhaust gas treatment apparatus using atmospheric pressure plasma, characterized in that formed. The method according to any one of claims 3 to 5, An exhaust gas treating apparatus using atmospheric pressure plasma, wherein a ceramic coating layer covering the low pressure electrode part is formed on an outer surface of the insulating tube. The method of claim 1, The high pressure electrode unit is provided on the outer side of the insulated tube, the low pressure electrode unit is an exhaust gas processing apparatus using an atmospheric pressure plasma, characterized in that provided on the inner side. The method of claim 8, The low pressure electrode unit is fixed in a rod shape on the inner central axis of the insulated tube, the high pressure electrode unit is an exhaust gas processing apparatus using an atmospheric pressure plasma, characterized in that the coating or coating is provided on the outer surface of the insulated tube. The method of claim 9, The insulator tube is composed of a long insulated tube and a short insulated tube connected to each other, and one end of the low voltage electrode part is fixed to a connection portion of the long insulated tube and the short insulated tube. And the other end of the low pressure electrode portion is formed along an inner space center axis of the long insulating tube. The method of claim 10, At one end of the low voltage electrode portion, a cross-shaped coupling portion is formed to be fixed to the connection portion between the long insulated tube and the short insulated tube. Exhaust gas treatment apparatus using atmospheric pressure plasma, characterized in that the coupling groove corresponding to the cross-shaped coupling portion is formed, respectively. The method according to any one of claims 8 to 11, The high voltage electrode unit may be any one of a cylindrical shape surrounding the outer surface of the insulated tube, a coil type winding the outer surface of the insulated tube, or a ring type in which a plurality of rings are wrapped around the outer surface of the insulated tube at predetermined intervals. Exhaust gas treatment apparatus using atmospheric pressure plasma, characterized in that formed. The method according to any one of claims 9 to 11, An exhaust gas treating apparatus using atmospheric pressure plasma, wherein a ceramic coating layer is formed on an outer surface of the insulating tube to cover the high voltage electrode part. The method of claim 1, The high pressure electrode unit and the low pressure electrode unit exhaust gas processing apparatus using an atmospheric pressure plasma, characterized in that provided on the inner side of the insulating tube. The method of claim 14, The high pressure electrode unit and the low pressure electrode unit exhaust gas processing apparatus using an atmospheric pressure plasma, characterized in that alternately arranged in the inner portion of the insulating tube. The method of claim 1, The high pressure electrode part and the low pressure electrode part are provided on the outer side of the insulator tube, and an outer surface of the insulator tube has a ceramic coating layer covering the high pressure electrode unit and the low pressure electrode unit, characterized in that the exhaust gas treatment apparatus using atmospheric pressure plasma. . The method of claim 16, And the high voltage electrode portion and the low pressure electrode portion are alternately arranged in an outer portion of the insulated tube. The method of claim 16, The high pressure electrode unit and the low pressure electrode unit exhaust gas processing apparatus using an atmospheric pressure plasma, characterized in that provided in a spiral in the outer portion of the insulating tube. delete The method of claim 1, Both sides of the insulated tube, exhaust gas processing apparatus using an atmospheric pressure plasma, characterized in that the connection cap for connecting with the exhaust pipe is provided. The method of claim 1, An exhaust gas treating apparatus using atmospheric pressure plasma, wherein a heat sink for dissipating heat from the insulating tube is provided at an outer side of the insulating tube.

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