KR100799999B1 - A display device and a method for manufacturing it - Google Patents

Abstract

The present invention relates to a display device and a method of manufacturing the same.

A panel on which image information is displayed; And an electromagnetic shielding film formed on the front surface of the panel and including an indium-tin-oxide (ITO) and a conductive material having a nanometer size.

Therefore, according to the present invention, by forming an electromagnetic shielding film including ITO and a conductive material, it is possible to simplify the manufacturing process of the display panel and to reduce the manufacturing cost.

Electromagnetic shielding film, ITO, conductive material

Description

A display device and a method for manufacturing it

1 is a cross-sectional view of an electromagnetic shielding film of a first embodiment of a display device according to the present invention;

2 is a cross-sectional view of an electromagnetic shielding film of a second embodiment of a display device according to the present invention;

3 is a cross-sectional view of the electromagnetic shielding film of the third embodiment of the display device according to the present invention;

4 is a view showing a first embodiment of the manufacturing process of the electromagnetic shielding film of the manufacturing method of the display device according to the present invention;

5 is a view showing a second embodiment of the manufacturing process of the electromagnetic shielding film of the manufacturing method of the display device according to the present invention.

<Explanation of symbols for the main parts of the drawings>

100: substrate 110: PET film

120: adhesive 150: first layer

150 ': ITO powder 160: second layer

160 ': conductive material powder 180: electromagnetic shielding film

With the advent of the multimedia era, display devices that can express more detailed, larger, and more natural colors are required. However, the current CRT (Cathode Ray Tube) has a limit to compose a large screen of 40 inches or more, and the LCD (Liquid Crystal Display), PDP (Plasma Display Panel), and projection TV (Television) are used for high definition video. It is rapidly developing for expansion.

The maximum feature of the display device described above can be manufactured in a thin thickness compared to the CRT, which is self-luminous, and is easy to manufacture a large flat screen (60 to 80 inches), and is clearly distinguished from the conventional CRT in terms of style and design. However, since the above-mentioned PDP and the like generate electromagnetic waves during the driving process, a front filter may be provided on the front surface of the panel on which an image is displayed to block this.

Hereinafter, a front filter of the PDP, which is one of the display devices described above, and a problem thereof will be described.

The PDP has a lower plate having an address electrode, a top plate having a sustain electrode pair, and a discharge cell defined by a partition wall, and phosphors are coated in the discharge cell to display a screen. Specifically, when discharge occurs in the discharge space between the upper plate and the lower plate, ultraviolet rays generated at this time are incident on the phosphor to generate visible light, and the screen is displayed by the visible light.

A front filter is provided on the front side of the PDP. The front filter shields electromagnetic waves (EMI) and near infrared rays (NIR) and prevents color correction and reflection of light incident from the outside. Conventionally, a glass type front filter provided with a plurality of layers on glass is used. The glass type front filter can prevent the front filter from being damaged by an external impact, but is thick, heavy, and expensive to manufacture. There was a downside.

Therefore, a film type front filter has been proposed to solve the above problems. A film type front filter is provided with a near-infrared shielding film, an electromagnetic wave shielding film, a color correction film, an antireflection film, etc. on a base film in turn, and each film is bonded by an adhesive agent.

The configuration of the electromagnetic wave shielding film described above is as follows. A conductive material is provided in a mesh shape on a basefilm, and the conductive material may be supported by a frame. The mesh shape is formed by patterning a conductive material on a polyethylene terephthalate (PET) film by a photolithography or etching process or a sputtering method.

However, the conventional front filter described above has the following problems.

First, in order to form a conductive material into a mesh structure through photolithography and etching processes, a lot of material is lost and the number of processes is complicated.

Second, if the angle formed by the mutually intersecting electrode line having a mesh structure is different, the productivity is poor because it has to change from the design value of the photolithography process.

Third, when the front filter is bonded onto the top glass of the plasma display panel, the lattice gap shifts and the lattice pattern is deformed well, so that the transmittance of visible light deteriorates.

Fourth, if the electromagnetic shielding film is formed by the sputtering method, there is a problem that the process time is long and the resistance is high.

The present invention is to solve the above problems, an object of the present invention is to provide a display panel and a method of manufacturing the display panel is simplified and the process time is short.

Another object of the present invention is to provide a display panel and a method of manufacturing the same in which the manufacturing cost is reduced.

In order to achieve the above object, a panel on which image information is displayed; And an electromagnetic shielding film formed on the front surface of the panel and including an indium-tin-oxide (ITO) and a conductive material having a nanometer size.

The present invention includes the steps of providing a panel on which the image information is displayed; And forming an electromagnetic shielding film including ITO and a nanometer-sized conductive material on the front surface of the panel.

The present invention provides a method for manufacturing a display device, comprising manufacturing a solution including ITO and a conductive material, and coating the solution on a substrate to form an electromagnetic shielding film.

Hereinafter, with reference to the accompanying drawings, preferred embodiments of the present invention that can specifically realize the above object will be described. The same components as in the prior art are given the same names and the same reference numerals for convenience of description, and detailed description thereof will be omitted.

The display device according to the invention can be formed not only on the base film or the glass, but also preferably directly on the front of the display panel. In addition, the electromagnetic shielding film may include an indium-tin-oxide (ITO) and a conductive material, and the above-described ITO and the conductive material may each form a separate layer or may be combined into one layer. In the present invention, the configuration and manufacturing method of the electromagnetic wave shielding film is different from the conventional technology, and the configuration of panel parts such as PDP and LCD is the same as in the prior art.

1 is a cross-sectional view of a first embodiment of a display device according to the present invention, FIG. 2 is a cross-sectional view of a second embodiment of a display device according to the present invention, and FIG. 3 is a cross-sectional view of a third embodiment of a display device according to the present invention. . The display device according to the present invention will be described with reference to FIGS. 1 to 3 as follows.

1 shows an electromagnetic shielding film directly formed on a substrate 100 of a display device. The electromagnetic shielding film includes a first layer 150 and a second layer 160, the first layer 150 includes ITO, and the second layer 160 includes a conductive material. The first layer 150 and the second layer 160 may be changed up and down, but the second layer 160 having a function of preventing reflection of light incident from the outside is formed as shown in FIG. 1. Yes is preferred. In addition, the conductive material should be a material having excellent electrical conductivity due to low electrical resistance, preferably silver (Ag) or copper (Cu). Specifically, the powder of the conductive material of several to hundreds of nanometers in size may be prepared by mixing with the ITO or ITO powder, preferably 5 to 50 nanometers of the ITO powder of 2-100 nanometers in size It is preferably prepared by mixing with the powder of. In addition, the conductive material is preferably in the form of a tube (tube) as shown in the figure. The size mentioned above means a diameter if the powder is spherical, and the length of one side if it is a cube.

The powder of the conductive material constituting the second layer 160 is preferably formed in 20 to 30% of the area of the electromagnetic shielding film. That is, although the conductivity is improved as the area where Ag, etc. are formed increases, the transmittance of light emitted from the inside of the display device decreases, so it is preferable to form the above-described area. The first layer 150 preferably has a thickness of 10 to 100 micrometers, and the second layer 160 preferably has a thickness of 0.1 to 10 micrometers. When the first layer 150 and the second layer 160 are formed by using a paste, the thickness of each layer is thin, and the first layer 150 including ITO and the conductive material are included. The second layer 160 is formed of a plurality of layers, respectively, to sufficiently obtain the electromagnetic shielding effect. However, if the first layer 150 and the second layer 160 are formed by using the liquid phase method, only one layer can be sufficiently obtained for the electromagnetic shielding effect, and the electromagnetic shielding film is formed on the substrate without using an adhesive such as PSA. Can be formed directly. Specific manufacturing process will be described later.

In FIG. 2, the electromagnetic shielding film is formed on a polyethylen terephthalate (PET) film 110. Specifically, the first layer 150 including ITO is bonded on the PET film 110 using an adhesive, and the second layer 160 including a conductive material such as Ag on the first layer 150. The formation order of the 1st layer 150 and the 2nd layer 160 may also be mutually changed, and is the same as that of 1st Embodiment mentioned above. The thickness of each layer and the size of the powder of the ITO and the conductive material are the same as those of the first embodiment described above. Preferably, using the above-described liquid phase method, an electromagnetic wave shielding film is directly applied onto the PET film without using an adhesive. Can be formed.

In FIG. 3, the electromagnetic shielding film 180 is formed on the substrate 100, and the ITO powder 150 ′ and the powder 160 ′ of the conductive material are included in the electromagnetic shielding film 180. That is, in the above-described first and second embodiments, the first layer 150 and the second layer 160 are combined into one layer. Preferably, the conductive material is one of silver or copper, and the size of the ITO powder 150 'and the powder 160' of the conductive material are the same as in the above-described embodiment, and the thickness of the electromagnetic shielding film 180 is It is preferable that it is 10-110 micrometers. In addition, although the ITO powder 150 'and the powder 160' of the conductive material are mixed, the powder 160 'of the conductive material occupies 20-30% of the entire area of the substrate 100 as described above. .

Referring to the operation of the embodiments of the display device according to the present invention described above are as follows.

The conductive powder having high electrical conductivity and ITO may form an electromagnetic shielding film to increase the EMI shielding effect, and may limit the formation area of the conductive powder to maintain the light transmittance above a certain level. In addition, since the electromagnetic shielding film is formed by using a liquid phase method, it may be formed directly on the substrate, and the problem of having to form a plurality of thin layers by adjusting the thickness of each layer may be solved.

4 is a view showing a first embodiment of a method of manufacturing a display device according to the present invention, and FIG. 5 is a view showing a second embodiment of a method of manufacturing a display device according to the present invention. 4 and 5, the embodiments of the method of manufacturing the display device according to the present invention will be described.

First, a first solution including ITO is coated on a substrate to form a first layer (S410), and then a second solution including a conductive material is coated to form a second layer (S420). Then, by firing the coated first solution and the second solution (S430) to complete the electromagnetic shielding film. It is preferable that the conductive material has a small electrical resistance and thus has high electrical conductivity, and more preferably, a metal such as silver or copper. And it is preferable that a 1st layer is 10-100 micrometers in thickness, and it is preferable that a 2nd layer is 0.1-10 micrometers in thickness. The order of forming the first layer and the second layer may be changed, and may be formed on a film or glass such as PET, or may be directly formed on the display device.

Hereinafter, the manufacturing method of the first solution and the second solution described above are as follows.

The first solution is composed of 5 ~ 50 nanometer size of ITO powder, it is preferable to use any one of Ethanol, Isopropyl Cellosolve, Methanol, N, N-Dimethyl Formamide and Water. In addition, the concentration of the ITO powder in the first solution is preferably 5 to 50%. In addition, the second solution includes a powder of a conductive material having a size of 2 to 100 nanometers, and preferably, any one of ethanol and water is used as a solvent. In addition, the concentration of the powder of the conductive material in the second solution is preferably 5-30%.

In addition, the above-mentioned first and second solutions are preferably formed by a coating method on a substrate or the like, and more preferably, one of spin coating, bar coating and spray coating should be coated. Spin coating is suitable for coating low viscosity solutions, and bar coating is suitable for coating high viscosity solutions. In addition, as described above, the powder of the conductive material is preferably formed in 20 to 30% of the area of the electromagnetic shielding film. In the present embodiment, the first and second solutions may be made of a paste, but are preferably made of a liquid and coated. That is, solid content such as ITO or a conductive material is dissolved in a solvent to form a colloid, and therefore, it is possible to simultaneously fire after coating both the first and second layers. When the coating on the film is preferably a firing temperature is 200 ~ 250 ℃, when forming on the glass can be baked at 200 ~ 500 ℃ and after the firing process will be left only solids, powder. That is, since the solid content is prepared and coated in the liquid phase as described above, it is possible to bake at a low temperature and to simplify the process by forming a thicker thickness of each layer than in the prior art. In addition, the concentration of each powder described above can be changed depending on the coating method and transmittance.

Hereinafter, a second embodiment of a method of manufacturing a display device according to the present invention will be described.

The present embodiment is characterized in that the ITO powder and the conductive material are manufactured in one solution to form an electromagnetic shielding film. First, to prepare a solution comprising a powder of ITO powder and a conductive material (S510), preferably the solution should be liquid. The size and concentration of each powder is as described above, the solvent is preferably any one of Ethanol, Isopropyl Cellosolve, Methanol, N, N-Dimethyl Formamide and Water. Then, by coating the solution (S520) and firing (S530) to produce an electromagnetic shielding film having a thickness of 10 to 110 micrometers, the coating method and the firing temperature are as described above. The distribution area of the powder of the conductive material and the like are also described above.

Referring to the operation of the manufacturing method of the display device according to the present invention described above are as follows.

A solution in which the conductive material and ITO are dissolved in the form of a powder can be prepared in the liquid phase and lowered in the firing temperature to be coated directly on the substrate as well as the film or glass. In addition, since the electromagnetic wave shielding film is manufactured by only one coating, the process may be completed within a short time, and the ITO and the conductive powder exhibit the electromagnetic shielding effect and limit the fractional area of the conductive powder to maintain light transmittance.

In addition, it is apparent that the above-described electromagnetic shielding film may be used not only for plasma display panels but also for other display devices such as LCDs and portable terminals.

The present invention is not limited to the above-described embodiments, and such modifications are included in the scope of the present invention even if modifications are possible by those skilled in the art to which the present invention pertains.

Referring to the effects of the display device and the manufacturing method according to the present invention described above are as follows.

First, since the exposure and etching processes are not required, the manufacturing process of the electromagnetic shielding film can be simplified, the process time can be shortened, and the manufacturing cost can be reduced.

Second, when the above-mentioned electromagnetic shielding film is directly bonded to the display panel, it is possible to prevent image distortion due to a difference in refractive index between the substrate and the film or glass, which may occur in the film or glass type front filter.

Claims (22)

delete delete delete delete delete delete delete Providing a panel on which image information is displayed; And A first solution including ITO is coated on the front substrate of the panel to apply a first layer, and a second solution is coated by coating a second solution containing a nano-sized conductive material on the first layer to apply an electromagnetic shielding film. Method of manufacturing a display device comprising the step of forming a. delete delete The method of claim 8, The first solution and the second solution is prepared in the liquid phase, The forming of the electromagnetic shielding film may further include firing the coated first solution and the second solution. The method of claim 8, wherein the conductive material, At least one of silver or copper. The method of claim 8, wherein the first solution, Method of manufacturing a display device comprising the ITO powder of 5 to 50 nanometers in size. The method of claim 8, wherein the first solution, A method of manufacturing a display device, characterized in that the ITO is dissolved in any one of ethanol, isopropyl cellosolve, methanol, N, N-dimethyl formamide, and water. The method of claim 8, In the first solution, the concentration of the ITO is 5 ~ 50% manufacturing method of the display device. The method of claim 8, wherein the second solution, Method of manufacturing a display device comprising a powder of a conductive material of 2 to 100 nanometers in size. The method of claim 8, wherein the first and second solutions, Method of manufacturing a display device characterized in that the coating by any one method of spin coating, bar coating and spray coating. The method of claim 8, wherein the second solution, A method of manufacturing a display device, characterized in that the conductive material is dissolved in one of ethanol and water. The method of claim 8, In the second solution, the concentration of the conductive material is a method of manufacturing a display device, characterized in that 5 to 30%. The method of claim 8, wherein the forming of the electron shielding film, Manufacturing a solution including the ITO and the conductive material, and coating the solution on the substrate to form an electromagnetic shielding film. The method of claim 20, The solution is prepared in liquid phase, The forming of the electromagnetic shielding film may further include firing the coated solution. The method of claim 20, wherein the solution is A method of manufacturing a display device, comprising dissolving the ITO and a conductive material in one of ethanol, isopropyl cellosolve, methanol, N, N-dimethyl formamide, and water.

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