KR100785796B1 - Apparatus for fabricating Bragg grating and method of fabricating Bragg grating using the same apparatus in planar optical waveguide - Google Patents

Abstract

The present invention can improve the problems of the electron beam method and the laser beam interference method, and a Bragg grating forming apparatus and a device thereof in a flat plate type optical waveguide that can form a Bragg grating in a plate type optical waveguide while using a phase mask. Provided is a Bragg grating forming method. The Bragg grating forming apparatus includes a phase mask used to form a Bragg grating; An exposure control device controlling exposure by an ultraviolet beam by adjusting an ultraviolet beam incident and exiting with a phase mask; And an automatic positioning device for automatically adjusting the alignment of the sample having the flat optical waveguide structure on which the Bragg grating is to be formed and the position of the exposure control device.

Gratings, Planar Waveguides, Bragg Gratings, Phase Masks

Description

Apparatus for fabricating Bragg grating and method of fabricating Bragg grating using the same apparatus in planar optical waveguide}

1A to 1C are cross-sectional views schematically illustrating a conventional Bragg grating forming method.

2 is a cross-sectional view of a Bragg grating forming apparatus in a planar optical waveguide according to a first embodiment of the present invention.

3 is a cross-sectional view illustrating an initial alignment method between a phase mask and a sample on which a Bragg grating is to be formed in the Bragg grating forming apparatus of FIG. 2.

4A to 4F are cross-sectional views illustrating a Bragg grating forming method in a flat optical waveguide using the Bragg grating forming apparatus according to the second embodiment.

5 is an enlarged plan view illustrating a portion A of FIG. 4B.

6A to 6E are cross-sectional views illustrating a Bragg grating forming method in a flat optical waveguide using the Bragg grating forming apparatus according to the third embodiment.

7a and 7b are electron micrographs of the Bragg grating produced by the Bragg grating forming method of the present invention.

8 is a spectrum measurement photograph of Bragg grating produced by the Bragg grating forming method of the present invention.

<Description of main parts in the drawing>

100: substrate 110,110a: lower clad layer

120, 120a, 120b: core layer 130, 130a: chrome thin film layer

140: gold thin film layer 142: mask region of the gold thin film layer

144: blank region 150 of gold thin film layer: photoresist

160,160a: upper clad layer 302: first optical blocker

304: phase mask 305: second optical blocker

307: sample holder 308, 402: stage Y direction

309: stage holder 310: controller holder

320,401: Z direction stage 330,404: X direction stage

403: CCD camera 510: Sample

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an optical communication device, and more particularly, to a Bragg grating forming apparatus for forming a Bragg grating on a flat optical waveguide and a Bragg grating forming method using the forming apparatus.

Bragg Grating is a wavelength filter that selects light of a specific wavelength that transmits a desired signal among optical signal channels of various wavelengths, and is the core of a wavelength division multiplexing (WDM) optical communication system. Parts.

The Bragg grating can be fabricated by forming a grating in which the effective refractive index of the waveguide periodically changes in the direction of light propagation on the optical fiber or optical waveguide. When N wavelengths of λ ₁ , λ ₂ , ..., λ _N are incident on the optical waveguide, light of a wavelength satisfying the condition of the following expression (1) is reflected and light of the remaining wavelength is transmitted. Such a condition is called a Bragg condition.

λ _B = 2 n _eff Λ ................ Equation (1)

Λ _B represents the Bragg wavelength reflected by the Bragg grating, n _eff represents the effective refractive index, and Λ represents the period of the grating formed in the optical waveguide.

Conventional wavelength filter manufacturing method has a method to form a Bragg grating through a phase mask on a photosensitive optical fiber.

1A is a cross-sectional view schematically illustrating a method of forming a Bragg grating using a conventional phase mask.

Referring to FIG. 1A, a grating having a certain period (Λ _PM ) is formed in a phase mask 14, and a sample to which an Bragg grating is formed by applying an ultraviolet beam through the phase mask 14 is illustrated. 12, sample) to form a Bragg grating. Here, -1, 0, +1 on the arrow indicates a lattice order due to interference fringes, and -1 and +1 mean primary constructive interference. Thus, the Bragg grating in the sample is formed at half the period of the grating period Λ _PM of the phase mask.

The Bragg grating formation method using such a phase mask is generally used a photosensitive optical fiber, the optical sensitive optical fiber is difficult to integrate with other optical elements and has a disadvantage in that mass production is not easy. In addition, the use of photosensitive materials has the disadvantage that the available materials are limited.

On the other hand, there is a method of using a flat waveguide as a wavelength filter manufacturing method, such a flat waveguide device is excellent in productivity, small size, it is advantageous to manufacture a device in which a large number of devices are integrated. As a material for fabricating a conventional flat waveguide device, a glass material such as silica, a polymer, a silicon, lithium naobate (LiNbO ₃ ), and the like are present. Since most of these materials do not have photosensitive properties, the method of using a phase mask using the photosensitive properties of existing optical fibers cannot be applied. In addition, it is possible to have a photosensitivity through a separate post-process, but not only the process is easy, but also it is practically difficult to ensure the stability of the material and the stability of Bragg grating properties in the long-term use.

As a conventional technique for fabricating Bragg grating on a flat waveguide, which is not photosensitive or difficult to apply a photosensitive process as described above, first a photoresist is coated on a substrate and then an electron beam is used. There is a way to engrave the Bragg grid pattern directly. However, since the use of the electron beam, expensive equipment must be used, and the processing time for engraving Bragg grating patterns is very long, which is not suitable for mass production.

Another technique for fabricating Bragg gratings in a planar waveguide is to form a Bragg pattern with a desired grating in the photoresist using the interference characteristics of the laser beam and to use the Bragg grating in the planar waveguides. There is a way to form.

1B and 1C are cross-sectional views schematically illustrating a method of forming Bragg grating using the interference characteristics of a laser beam in a conventional flat optical waveguide.

In the case of Figure 1b, the ultraviolet beam generated by the ultraviolet laser device 28 is separated through a beam splitter 26 (beam splitter, hereinafter referred to as "beam splitter"), and through the two ultraviolet reflector 24, a flat optical waveguide structure Irradiated with constructive interference on the photoresist on the sample 22 having In the case of FIG. 1C, the interference characteristics are the same. However, unlike FIG. 1B, two ultraviolet beams are emitted from the ultraviolet laser 28 so that one ultraviolet beam is directly irradiated onto the sample 22 and the other is an ultraviolet reflector 24. Is irradiated), resulting in a structure in which two ultraviolet beams in the sample 22 interfere with constructive interference. On the other hand, a sample holder 32 for fixing a sample and a rotation stage 34 (hereinafter referred to as a rotation stage) for adjusting an accurate interference characteristic are formed in combination with the ultraviolet reflector 24.

Such an exposure method using the interference characteristics of the ultraviolet laser beam has a shorter time than the method using the electron beam, but it is difficult to produce a uniform Bragg grating on a large area of the substrate.

Therefore, the technical problem to be achieved by the present invention is to improve the problems of the electron beam method and the laser beam interference method, Bragg in a flat plate optical waveguide that can form a Bragg grating on a flat plate optical waveguide while using a phase mask A grid forming apparatus and a Bragg grid forming method using the apparatus are provided.

In order to achieve the above technical problem, the present invention is a phase mask used to form a Bragg grating (Bragg Grating); An exposure control device controlling exposure by an ultraviolet beam by adjusting an ultraviolet beam incident and exited by the phase mask; And an automatic positioning device for automatically adjusting the alignment of a sample having a flat plate type optical waveguide structure on which the Bragg grating is to be formed and the position of the exposure control device. To provide.

In the present invention, the exposure control device is coupled to the first optical blocker and the first optical blocker and the first optical blocker for adjusting the size of the ultraviolet beam to the phase mask is coupled to the phase mask and the And a second optical blocker for limiting the lattice order of the ultraviolet beam passing through the phase mask, wherein the automatic positioning device comprises: a sample holder for holding the sample, left and right and top and bottom of the sample holder; X and Y direction stages for adjusting the position, and Z direction stage for adjusting the front and rear positions of the exposure control device.

In addition, the X and Y direction stages are finely adjusted through a computer program, and the Bragg grating forming apparatus is driven by an ultraviolet beam for the entire Bragg grating pattern forming region of the sample through one program input. An exposure process can be advanced.

The first optical blocker has a flat plate shape and has a beam size adjusting opening for injecting an ultraviolet beam into the phase mask and controlling the size of the ultraviolet beam, and the opening size of the beam size adjusting opening is determined by the phase mask used. It may vary depending on the size of the grating portion.

The second optical blocker is coupled to the first optical blocker in a shape surrounding the phase mask, but an interference order control opening portion for limiting the lattice order of the interference fringes of the ultraviolet beam incident through the phase mask and incident on the sample is provided. The interference control opening may be sized according to the range of the Bragg grating pattern region.

The Bragg grating forming apparatus can control image alignment between a phase mask and a sample through a CCD camera in real time through a monitor, and the CCD camera is used for camera X, Y, and Z. It is fixed to the directional stage and can be freely adjusted in the X, Y, and Z directions.

In order to achieve the above technical problem, the present invention also provides a Bragg grating forming method in a flat plate optical waveguide using the Bragg grating forming apparatus, the lower clad layer and core layer on a substrate Forming; Forming a thin film layer for controlling Bragg grating formation and pattern formation; Forming a lattice on the core layer using the Bragg lattice forming apparatus; And forming an upper clad layer on the core layer having the lattice formed therein.

Furthermore, the present invention provides a Bragg grating forming method in a flat plate optical waveguide using the Bragg grating forming apparatus to achieve the technical problem, the method comprising: forming a lower clad layer on a substrate; Forming a thin film layer for controlling Bragg grating formation and pattern formation; Forming a lattice on the lower clad layer using the Bragg lattice forming apparatus; And forming a core layer and an upper cladding layer in the lower cladding layer on which the lattice is formed.

In the present invention, the forming of the thin film layer may include forming a chromium (Cr) thin film layer;

Forming and patterning a thin film of gold (Au) on the chromium layer; And forming a photo resist layer on the patterned gold thin film layer.

The gold thin film layer is patterned to expose the chromium thin film layer, and the gold thin film layer may function to suppress ultraviolet beam exposure to a region other than a Bragg grating pattern forming region. In addition, the exposed chromium thin film layer may be patterned through a photolithography process using the PR, and the patterned chromium thin film layer may be used as an etching mask for forming a lattice of a core layer or a lower clad layer.

Bragg grating forming apparatus of a plate-type optical waveguide according to the present invention and Bragg grating forming method using the apparatus is uniformly formed in the desired flat waveguide position using the X, Y, and Z direction stages In addition, since Bragg grating patterns are formed using a phase mask, different types of Bragg grating patterns can be easily produced.

Hereinafter, with reference to the accompanying drawings will be described a preferred embodiment of the present invention; In the following description, when a component is described as being on top of another component, it may be directly on top of another component, and a third component may be interposed therebetween. In addition, in the drawings, the thickness or size of each component is exaggerated for convenience and clarity of description, and parts irrelevant to the description are omitted. Like numbers refer to like elements in the figures. On the other hand, the terms used are used only for the purpose of illustrating the present invention and are not used to limit the scope of the invention described in the meaning or claims.

2 is a cross-sectional view of a Bragg grating forming apparatus in a planar optical waveguide according to a first embodiment of the present invention.

Referring to FIG. 2, the Bragg grating forming apparatus exposes a phase mask 304 for forming the Bragg grating and an ultraviolet beam that is incident to the phase mask and is emitted from the phase mask to adjust the ultraviolet beam. An exposure control device for controlling the control, and an automatic positioning device for automatically adjusting the alignment of the sample (510, sample) on which the Bragg grating is to be formed and the position of the exposure control device. Here, the sample 510 on which the Bragg grating is to be formed has a flat optical waveguide structure, and may include a thin film layer of gold (Au) to limit the Bragg grating formation area above the sample 510. Details thereof will be described in more detail with reference to FIGS. 4 to 6.

The grating period Λ _pm of the phase mask 304 used is the grating period Λ to be formed in the sample 510 by the following equation (2) according to Bragg wavelength λ _B according to the above equation (1). Determined by

Λ _pm = Nλ _B / n _eff = 2Λ ............. Equation (2)

The exposure control device includes a phase mask 304 and a first optical blocker 302 and a phase for adjusting the size of the ultraviolet beam incident on the phase mask 304. And a second optical blocker 305 for limiting the lattice order of the interference fringes of the ultraviolet beam passing through the mask 304.

The first optical blocker 302 has a flat plate shape, and is formed with a beam-size adjustment opening through which an ultraviolet beam can pass. The beam size adjustment opening may be sized according to the size of the phase mask 304 to be used so that the ultraviolet beam is selectively incident only on the grating portion of the phase mask 304. Since beams incident from other than the grating portion may affect the formation of the interference fringes of the phase mask, the beam size adjusting opening restricts the ultraviolet beam to the grating portion of the phase mask 304, thereby forming another adjacent Bragg grating forming region 501. ) To exclude the effect on

The second optical blocker 305 is coupled to the first optical blocker 302 and is formed in a shape surrounding the phase mask 304. Although the cross section in the drawing is configured in a rectangular shape, it is a matter of course that it is not limited to such a shape. The second optical blocker 305 has an interference order control opening in a direction in which ultraviolet light is emitted. That is, the interference order adjustment opening is formed in front of the second optical blocker 305 so that the Bragg lattice order of the ultraviolet beam passing through the phase mask 304, for example, light of the primary Bragg interference fringe, is exposed to the sample 510. Restrict to be used as a source. That is, since the interference fringe of the beam passing through the phase mask 304 includes Bragg gratings of various orders depending on the distance, the second optical blocker 305 functions to limit the grating order.

The automatic positioning device controls the exposure area of the sample 510 by adjusting the sample holder 307 for fixing the sample 510, the left and right (X) and the up and down (Y) positions of the sample holder 307. X and Y direction stages (330,308, direction stage, hereinafter referred to as "direction stage") to adjust and the front and rear (Z) position of the exposure control device, that is, Z for adjusting the distance between the sample 510 and the exposure control device Direction stage 320. The X and Y direction stages 330 and 308 are fixed to a stage holder 309, and the first optical blocker 302 of the exposure control device is coupled to the Z direction stage 320 through the control device holder 310. .

The sample holder 307 is a device for fixing the sample 510 and its size can be adjusted according to the size of the sample 510 to be manufactured and is fixed to the stages 330 and 308 in the X and Y directions. On the other hand, the X and Y direction stages 330 and 308 can be finely adjusted through a computer program, and the BG lattice pattern forming region distributed throughout the sample 510 through a single program input. It is possible to proceed with the exposure process by the ultraviolet beam.

Since the Bragg grating forming apparatus of the present invention can finely adjust the exposure through the exposure control device and the automatic positioning device, the Bragg grating can be formed in the flat optical waveguide structure using the phase mask, and accordingly Various kinds of Bragg grating patterns can be formed. In addition, by performing the exposure process through an automated function, it is possible to form a uniform Bragg grating pattern over the entire Bragg pattern forming region within a short time.

3 is a cross-sectional view illustrating an initial alignment method between a phase mask and a sample on which a Bragg grating is to be formed in the Bragg grating forming apparatus of FIG. 2.

Referring to FIG. 3, the Bragg grating forming apparatus includes a charge-coupled device (CCD) camera 403, a camera X, a camera, for initial alignment between the sample mask 510 and the phase mask 304 required for fabricating the Bragg grating. Y and Z direction stages 404, 402, 401, and a monitor (not shown).

The CCD camera 403 may include a zoom function to minimize alignment error due to the difference in distance between the phase mask 304 and the sample 510, and the selected image is observed through a monitor (not shown). It is possible. On the other hand, the CCD camera 403 is fixed to the camera X, Y, and Z direction stages 404, 402, 401, and is free to adjust the position in the X, Y, and Z directions.

The Bragg grating forming apparatus of the present invention includes a CCD camera 403 which can be freely adjusted in the X, Y, and Z directions, so that the image alignment between the phase mask and the sample can be controlled in real time through a monitor. A more precise pattern of Bragg gratings can be formed.

4A to 4F are cross-sectional views illustrating a Bragg grating forming method in a flat optical waveguide using the Bragg grating forming apparatus according to the second embodiment.

Referring to FIG. 4A, first, a lower clad layer 110 and a core layer 120 are formed on a substrate 100. The substrate 100 may be a transparent substrate or a semiconductor substrate such as silicon. The lower clad layer 110 and the core layer 120 may be formed of a polymer generally used for forming an optical waveguide.

Referring to FIG. 4B, a chromium (Cr) thin film layer 130 and a patterned gold (Au) thin film layer 140 are formed on the core layer 120. The gold thin film layer 140 may be patterned through a process such as photolithography after coating gold on the chrome thin film layer 130. Here, the chromium thin film layer 130 is used as an etching mask for forming a Bragg grating on the lower core layer 120, and the patterned gold thin film layer 140 exposes an ultraviolet beam to a region other than the Bragg grating pattern forming region. It is used to suppress. That is, the blank region 144 of the gold thin film layer 140 is referred to as a “blank region” to form a Bragg grating pattern, and the mask region of the gold thin film layer 140 in which the gold thin film is present ( 142 becomes an area other than the Bragg grating pattern forming area. The gold thin film layer 140 may be changed in size and position according to the Bragg grating pattern region to be formed in the sample.

Referring to FIG. 4C, a photoresist 150 is applied on the gold thin film layer 140 on which the pattern is formed, and then PR is patterned through a photolithography process. Hereinafter, the area B in which the Bragg grating pattern is formed will be mainly described. Here, the exposure process by the ultraviolet beam on the photo-lithography process is precisely performed using the phase mask through the Bragg grating forming apparatus of the first embodiment described above. Therefore, when the Bragg grating is formed by using a phase mask in a flat plate optical waveguide, problems such as precise distance control and necessity of limiting the lattice pattern can be solved. Enable uniform Bragg lattice formation in the

FIG. 4D is an enlarged cross-sectional view of part B of FIG. 4C, and shows the chrome thin film layer 130 patterned through an etching process using the patterned PR layer as a mask. In the patterned chromium thin film layer 130a, the shape of the lattice to be formed in the core layer 120 is displayed as it is.

4E and 4F, the core layer 120 is patterned through an etching process using the patterned chromium thin film layer 130a as an etching mask. Thereafter, the upper clad layer 160 is formed on the patterned core layer 120a. In this case, the period Λ of the Bragg grating to be formed may be determined by Equation (2) as described above.

In the Bragg grating forming method of the present embodiment, by using the Bragg grating forming apparatus described above, an automated and precise exposure process can be performed by using a phase mask on a flat optical waveguide. As a result, a uniform Bragg grating may be formed in the entire region where the Bragg pattern is to be formed.

FIG. 5 is an enlarged plan view of portion A of FIG. 4B, in which the gold thin layer 140 is divided into a blank area 144 and a mask area 142 on the sample 510. In the drawing, the blank area 144, that is, the area where the Bragg grating pattern is to be formed is exaggerated compared to the mask area 142.

6A through 6E are cross-sectional views illustrating a Bragg grating forming method in a flat optical waveguide using the Bragg grating forming apparatus according to the third embodiment.

6A and 6B, forming the lower clad layer 110 on the substrate 100 is the same as in the second embodiment. However, instead of forming a core layer on the lower clad layer 110, the chromium thin film layer 130 and the patterned gold thin film layer 140 are formed, and the PR 150 is formed on the gold thin film layer 140. The material of the substrate 100 and the lower cladding layer 110, and the functions and forming methods of the chromium thin film layer 130 and the gold thin film layer 140 are the same as described in the second embodiment.

The PR 150 is patterned by performing an exposure process by an ultraviolet beam through the Bragg grating forming apparatus of the first embodiment described above. Thus, as described above, an automated and precise exposure process may be performed using the phase mask. Hereinafter, the Bragg grating pattern region C will be mainly described as in the second embodiment.

6C and 6D, the chromium thin film layer 130 is patterned through an etching process using the patterned PR 150 as a mask, and the lower clad layer 110 is formed using the patterned chromium thin film layer 130a as an etching mask. Pattern. In this case, the patterned lower clad layer 110a has an inverted pattern of a lattice shape of the core layer to be formed.

Referring to FIG. 6E, a core layer 120b and an upper clad layer 160a are formed on the patterned lower clad layer 110a. Since the patterned lower clad layer 110a has a lattice form, the core layer 120b has a lattice form naturally without a separate lattice forming process. The grating formation direction is opposite to the second embodiment, that is, in the second embodiment, the Bragg grating is formed in the direction of the upper cladding layer 160, and in this embodiment, the Bragg grating is formed in the direction of the lower cladding layer 110a. However, the Bragg gratings of the two embodiments have the same function if only the material and the grating period Λ are the same.

7a and 7b are electron micrographs of the Bragg grating produced by the Bragg grating forming method of the present invention.

7A and 7B, the grating period of the Bragg grating manufactured by the Bragg grating forming method of the present invention is about 0.56 μm, and the height or depth of the formed grating is about 0.3 μm.

8 is a spectral measurement photograph of the Bragg grating manufactured by the Bragg grating forming method of the present invention. As shown, the center frequency wavelength of the wavelength selected and reflected by the Bragg grating is about 1568.7 nm, and the 3 dB bandwidth is about 0.7 nm. Therefore, it can be seen that the Bragg grating manufactured according to the present invention shows excellent wavelength selection characteristics.

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So far, the present invention has been described with reference to the embodiments shown in the drawings, which are merely exemplary, and those skilled in the art will understand that various modifications and equivalent other embodiments are possible therefrom. will be. Therefore, the true technical protection scope of the present invention will be defined by the technical spirit of the appended claims.

As described in detail above, the Bragg grating forming apparatus and Bragg grating forming method according to the present invention employ a phase mask at a desired position of a flat optical waveguide by using an automated exposure control device and an automatic positioning device. Bragg grating can be formed uniformly.

In addition, since the Bragg grating is formed using the phase mask, various kinds of Bragg patterns can be easily formed.

Furthermore, the Bragg grating forming apparatus can be automated to form Bragg gratings of the entire sample at once through a single program input, so that the Bragg gratings can be formed in a flat optical waveguide in a short time. This enables mass production of flat waveguides in which Bragg gratings are formed.

Claims (22)

A phase mask used to form a Bragg grating; An exposure control device controlling exposure by an ultraviolet beam by adjusting an ultraviolet beam incident and exited by the phase mask; And Bragg grating forming apparatus for a flat plate optical waveguide comprising a; automatic positioning device for automatically adjusting the position of the exposure control device and the alignment of the sample having a flat plate optical waveguide structure to be formed. According to claim 1, The exposure controller is coupled to the first optical blocker and the first optical blocker for adjusting the size of the ultraviolet beam to the phase mask and coupled to the phase mask and passed through the phase mask. A second optical blocker for limiting the interference fringe lattice order of the ultraviolet beam, The automatic positioning device includes a sample holder for holding the sample, an X and Y direction stage for adjusting the left and right and up and down positions of the sample holder, and a front and rear position of the exposure control device. Bragg grating forming apparatus for a flat plate optical waveguide comprising a Z direction stage. The method of claim 2, The automatic positioning device includes a stage holder to which the X and Y direction stages are fixed, and a control device holder to fix the exposure control device to the Z direction stage. Its lattice forming device. The method of claim 2, The sample holder is Bragg grating forming apparatus on a flat optical waveguide, characterized in that the size is adjusted according to the size of the sample. The method of claim 2, The X and Y direction stage is finely adjusted through a computer program (program), The Bragg grating forming apparatus is a Bragg grating forming apparatus for a flat plate type optical waveguide, characterized in that the exposure process by the ultraviolet beam to the entire Bragg grating pattern forming region of the sample through a single program input. The method of claim 2, The first optical blocker has a flat plate shape but has a beam size adjusting opening for injecting an ultraviolet beam into the phase mask and controlling the size of the ultraviolet beam, And the opening size of the beam size control opening is changed according to the size of the grating portion of the phase mask to be used. The method of claim 2, The second optical blocker is coupled to the first optical blocker in a shape surrounding the phase mask, but an interference order control opening portion for limiting the lattice order of the interference fringes of the ultraviolet beam incident through the phase mask and incident on the sample is provided. Bragg grating forming apparatus for a flat plate optical waveguide, characterized in that formed. The method of claim 7, wherein The Bragg grating forming apparatus of the planar optical waveguide, characterized in that the interference order control opening is adjusted in accordance with the range of the Bragg grating pattern area. The method according to any one of claims 1 to 8, The Bragg grating forming apparatus can control image alignment between a phase mask and a sample through a charge-coupled device (CCD) camera in real time through a monitor. Bragg grating forming device on waveguide. The method of claim 9, The CCD camera is fixed to the camera in the X, Y, and Z direction stage, the position of the Bragg grating on the flat-type optical waveguide, characterized in that the position adjustment in the X, Y, and Z direction. According to claim 1, Bragg lattice forming apparatus in a flat plate type optical waveguide, characterized in that the sample to be formed by the Bragg grating forming the grid grating (Au) thin film. The method of claim 11, wherein Ultraviolet beam exposure to areas other than the Bragg grating pattern forming region is suppressed by the gold thin film layer. A method of forming a Bragg grating in a flat optical waveguide using the Bragg grating forming apparatus of claim 1, Forming a lower clad layer and a core layer on the substrate; Forming a thin film layer for controlling Bragg grating formation and pattern formation; Forming a lattice on the core layer using the Bragg lattice forming apparatus; And And forming an upper clad layer on the core layer having the lattice formed therein. A method of forming a Bragg grating in a flat optical waveguide using the Bragg grating forming apparatus of claim 1, Forming a lower clad layer on the substrate; Forming a thin film layer for controlling Bragg grating formation and pattern formation; Forming a lattice on the lower clad layer using the Bragg lattice forming apparatus; And And forming a core layer and an upper clad layer on the lower clad layer on which the lattice is formed. The method according to claim 13 or 14, The substrate is a method for forming a Bragg grating on a flat optical waveguide, characterized in that using a transparent substrate or a semiconductor substrate. The method according to claim 13 or 14, The thin film thin film layer forming step Forming a chromium (Cr) thin film layer; Forming and patterning a thin film of gold (Au) on the chromium layer; And Forming a photoresist (PR) layer on the patterned gold thin film layer. The method of claim 16, The gold thin film layer is patterned to expose the chrome thin film layer, And the gold thin film layer has a function of suppressing ultraviolet light beam exposure to a region other than the Bragg grating pattern forming region. The method of claim 17, The exposed chromium thin film layer is patterned through a photolithography process using the PR, And the patterned chromium thin film layer is used as an etching mask for forming a lattice of a core layer or a lower clad layer. The method according to claim 13 or 14, The exposure control apparatus includes a first optical blocker for combining the phase mask and adjusting the size of the ultraviolet beam to the phase mask, and an interference fringe lattice order of the ultraviolet beam coupled to the first optical blocker and passing through the phase mask. It includes a second optical blocker for limiting, The automatic positioning device includes a sample holder for fixing the sample, an X and Y direction stage for adjusting the left and right and up and down positions of the sample holder, a Z direction stage for adjusting the front and rear positions of the exposure control device, and the X and Y And a stage holder to which the directional stage is fixed, and a holder for fixing the exposure control device to the Z-direction stage. The method of claim 19, The X and Y direction stages are finely adjusted via a computer program, The Bragg grating forming apparatus is capable of performing an exposure process by an ultraviolet beam to the entire Bragg grating pattern forming region of the sample through one program input. The method of claim 19, The first optical blocker has a flat plate shape but has a beam size adjusting opening for injecting an ultraviolet beam into the phase mask and controlling the size of the ultraviolet beam, The opening size of the beam size adjustment opening can be changed depending on the size of the grating portion of the phase mask used, The second optical blocker is coupled to the first optical blocker in a shape surrounding the phase mask, but an interference order control opening portion for limiting the lattice order of the interference fringes of the ultraviolet beam incident through the phase mask and incident on the sample is provided. Formed, The interference order control opening portion Bragg grating forming method on the flat optical waveguide, characterized in that the size is adjusted according to the range of the Bragg grating pattern region. The method of claim 19, The Bragg grating forming apparatus can control the image alignment between the phase mask and the sample through a monitor in real time through a monitor, The CCD camera is fixed to the camera in the X, Y, and Z direction stage, the position of the Bragg grating on the flat optical waveguide, characterized in that the position adjustment is free.

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