KR100626496B1 - Apparatus and method for simulating the optimum pattern on light guide panel and computer readable medium processing the method - Google Patents

Abstract

The present invention relates to a pattern generating apparatus of a light guide plate which is provided in a backlight unit for supplying a light source to a passive display device and generates a uniform surface light source from a predetermined light source, and particularly receives predetermined input variable values for generating the pattern. A variable input unit; A pattern generator which generates a predetermined pattern by using variable values and settings input from the variable input unit; A density and uniformity calculator for calculating density and uniformity from data on the pattern generated by the pattern generator; A screen output unit configured to display a result value calculated from the density and uniformity calculator as a numerical value or a graph; And a storage unit which stores the pattern generated by the pattern generator and the value calculated by the density and uniformity calculator.

Backlight unit, light guide plate, pattern, density, uniformity, simulation

Description

A pattern simulation apparatus and method for generating an optimal pattern of a light guide plate, and a computer-readable recording medium programmed therein.

1 is a view showing the structure of a backlight unit using a conventional light guide plate.

2 is a view showing a light guide plate on which a conventional pattern is formed.

3 is a block diagram showing the structure of a pattern simulation apparatus for generating an optimal pattern of a light guide plate according to the present invention;

4 is a flowchart illustrating a pattern simulation procedure for generating an optimal pattern of a light guide plate according to the present invention.

5A illustrates a variable input window for pattern simulation according to an embodiment of the present invention.

FIG. 5B is a diagram illustrating parameters for pattern simulation input according to an embodiment of the present invention. FIG.

6 is a view showing a mode input window for each type for pattern simulation according to an embodiment of the present invention.

7A to 7D are diagrams illustrating patterns generated by mode selection for each type for pattern simulation according to an embodiment of the present invention.

FIG. 8 is a diagram illustrating setting of a rectangular factor in mode-specific mode selection for pattern simulation according to an embodiment of the present invention. FIG.

9A and 9B illustrate a pattern generated according to a rectangular factor setting according to an embodiment of the present invention.

10 illustrates a pitch control input window for pattern simulation according to an embodiment of the present invention.

11 is a view showing a pitch setting method for pattern simulation according to an embodiment of the present invention.

12A and 12B illustrate a case in which the same vertical pitch value and the horizontal pitch value are different according to an embodiment of the present invention.

13A and 13B illustrate a case in which the horizontal pitch values are the same and the vertical pitch values are different according to an embodiment of the present invention.

14A and 14B illustrate pattern generation by square type selection in accordance with an embodiment of the present invention.

15A-15C illustrate pattern generation by diamond type selection in accordance with an embodiment of the invention.

16 is a view showing a variable input window for pattern simulation according to an embodiment of the present invention.

17 shows a density calculation method in pattern simulation according to an embodiment of the present invention.

18 is a graph showing the density calculated in the pattern simulation according to the embodiment of the present invention.

19A and 19B illustrate patterns generated by pattern transformation in a pattern simulation according to an embodiment of the present invention.

20A and 20B are graphs showing density comparison according to pattern transformation in pattern simulation according to an embodiment of the present invention.

21A and 21B are graphs showing density comparison according to a mixture of circles and rectangles in a pattern simulation according to an embodiment of the present invention.

22A to 22C illustrate patterns generated according to a mixing ratio of circular and rectangular shapes in a pattern simulation according to an embodiment of the present invention.

23 is a view showing a density region which can be controlled by pattern transformation in a pattern simulation according to an embodiment of the present invention.

<Explanation of symbols for the main parts of the drawings>

10 LCD 20 Prism Sheet

30 diffuser 40 light guide plate

50: fluorescent lamp 60: pattern diffusion material

70: reflector 300: variable input unit

310: pattern generation unit 320: density and uniformity calculation unit

330: control unit 340: screen output unit

350: storage unit

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to pattern simulation for generating an optimal pattern of a light guide plate included in a backlight unit used in a liquid crystal display, and more particularly, to an optimal pattern of a light guide plate that outputs predetermined patterns set for generating an optimal pattern of the light guide plate. The present invention relates to a pattern simulation apparatus, a method for generating the same, and a computer-readable recording medium which is recorded by programming the same.

In general, a cathode ray tube (CRT) display method has been used in most AV (audio / video) devices and data communication devices. However, the CRT requires a high voltage for the electron emission and the angle adjustment of the electron beam, and has a problem in that the size and weight of the CRT cannot be reduced.

Accordingly, flat panel display technology for weight reduction, low voltage, and low power consumption has been continuously developed to compensate for the shortcomings of the CRT. Examples of the flat panel display device described above may vary depending on the material used. It can be classified into Liquid Crystal Display (LCD), Plasma Display (PDP), Light Emitting Diode (LED), Electroluminescent (EL), Field Emission Display (FED), Vacuum Flourescent Display (VFD), and Digital Micromirror Device (DMD). have.

The basic principle of the flat panel display device described above is a method of controlling light in a pixel of a display. As a first method of controlling the light, there is a method of generating light in each pixel, which is called an active display. An example of the active display method is an LED.

The second method of controlling light is called passive display, in which the amount of light reflected or transmitted by the display is not generated by itself, but is called a passive display.

On the other hand, the device for generating light must be provided on the back or side of the passive display method such as the LCD. The method of generating light of the LCD may be a reflection type, a transmission type, or a combination of the two. In this case, the light source device used in the transmission type is called a backlight unit (hereinafter, referred to as a 'BLU'), and the BLU is a top-down method and an edge illumination method according to the position of the light source. System).

In a typical liquid crystal display device, the BLU has a very important effect on image quality, and serves to convert light from a point light source such as an LED chip or a line light source such as a cold cathode tube lamp into a surface light source.

In the process of switching to the surface light source as described above, the luminance and uniformity is one of the main items that must be secured. To this end, the BLU is manufactured by using a method such as printing, etching, or stamping a predetermined pattern on a light guide panel, which is one of the components of the BLU.

Hereinafter, a structure of a BLU constituting a general liquid crystal display device will be described with reference to FIG. 1.

1 is a view showing the structure of a BLU using a conventional light guide plate.

Referring to FIG. 1, a general BLU includes a fluorescent lamp 50, a light guide plate 40, a diffusion material 60, a reflection plate 70, a diffusion plate 30, a prism sheet 20, and the like. The surface light source generated through the supplied to the predetermined LCD panel 10 is displayed a specific image.

Looking at the surface light source generation process of the BLU, first, when a voltage is applied to the fluorescent lamp 50, residual electrons present in the fluorescent lamp 50 are moved to the anode, and the moving residual electrons collide with argon (Ar). As a result, argon is excited to cause cations to multiply, and the expanded cations collide with the cathode to emit secondary electrons.

As described above, when the emitted secondary electrons flow through the tube to initiate discharge, the flow of electrons by the discharge collides with, and ionizes, the mercury vapor to emit ultraviolet rays and visible light, and the emitted ultraviolet rays are applied to the phosphor coated on the inner wall of the lamp. It is excited to emit visible light to emit light.

Wherein the light guide plate 40 is a wave guide (Wave-Guide) to inject the light emitted from the above-described fluorescent lamp 50 into the surface light source to the upper, generally PMMA (PolyMethylMethAcrylate) excellent in light transmittance Resin is used.

Factors related to the light incidence efficiency of the light guide plate 40 described above include the light guide plate thickness versus the lamp diameter, the distance between the light guide plate and the lamp, the shape of the lamp reflector, and the like. The light incidence efficiency is increased by deflecting in the thickness direction.

In addition, as described above, a pattern by a predetermined diffusion material 60 is formed on the lower surface of the light guide plate 40 so that the surface light source is evenly emitted to the upper portion of the light guide plate 40. At this time, the light guide plate 40 of the BLU for LCD forms a pattern by a printing method, a V-cut method and a scattering method.

The diffusion material 60 generally consists of SiO ₂ particles, PMMA, solvent, and the like. At this time, the Si0 ₂ particles described above are used for light diffusion and have a porous particle structure. PMMA is also used to attach Si0 ₂ particles to the lower surface of the light guide plate 40.

The above-described diffusion material 60 is applied to the lower surface of the light guide plate in the form of a dot, and in order to obtain a uniform surface light source on the light guide plate 40, the area of the dot becomes larger step by step away from the light source. In other words, the area closer to the fluorescent lamp 50 decreases the area ratio occupied by the dots per unit area, and the one farther from the fluorescent lamp 50 increases the area ratio occupied by the dots per unit area.

In this case, the shape of the dot may be implemented in various forms (eg, square, triangle, circle, rhombus, etc.), and if the area ratio of dots per unit area is the same, the same brightness effect may be obtained on the light guide plate regardless of the shape of the dot. have.

On the other hand, the reflector 70 is installed at the rear end of the light guide plate 40 so that the light emitted from the fluorescent lamp 50 is incident to the light guide plate 40. The diffusion plate 30 is installed on the light guide plate 40 to which the dot pattern is applied to obtain uniform luminance according to a viewing angle. As the material of the diffusion plate 30, generally, polyethylene (poly ethylene) is used. Terephthalate) or PC (PolyCarbonate) resin is used, and the upper part of the diffusion plate 50 has a particle coating layer that serves as a diffusion.

The prism sheet 20 is to increase the front luminance of the light transmitted through the diffuser plate 30 and is emitted. Only the light of a specific angle is transmitted. Back to the bottom. As described above, the returning light is reflected again by the reflector 70 attached to the lower part of the light guide plate 40.

As described above, the function of the BLU plays a role of converting a point light source or a line light source into a surface light source, and has a high luminance and should be manufactured so that light is evenly transmitted to the front surface of the liquid crystal display.

2 is a view showing a pattern used in a conventional light guide plate.

Referring to FIG. 2, various patterns may be applied to the pattern generated in the LGP to uniformly generate a line light source such as a fluorescent lamp 50 as a surface light source. Generally, as described above, the closer to the light source 50 in the light guide plate 40 (the left part of FIG. 2), the smaller the basic unit shape, and the farther from the light source 50 (the right part of FIG. 2). Form a large base unit shape. Alternatively, uniformity can be maintained by making the size of the basic unit shape constant and adjusting the density of the basic unit shape. Alternatively, the uniformity of the surface light source may be maintained by changing the size and density of the basic unit shape together.

On the other hand, the pattern used in the light guide plate should be designed in an optimal pattern to increase the brightness and uniformity of the surface light source output from the light guide plate. However, the brightness and uniformity of the light guide plate are affected by various basic factors such as the area of the light guide plate, the position and type of the light source.

Therefore, whenever the above-mentioned basic elements are different, it is necessary to design optimal patterns according to each. At this time, the pattern design is generally performed by hand, it is possible to confirm whether the brightness and uniformity satisfy the desired reference value only by actually manufacturing and testing the light guide plate according to the designed pattern. In order to find out the optimal pattern, there was a problem that the trial and error of the pattern design and the light guide plate was repeated.

In addition, there are some attempts to simulate the pattern by equipment such as a computer, but this is a fragmentary level, it is difficult to generate a variety of patterns, the situation is not considering the environmental variables corresponding to the actual environment.

Accordingly, an object of the present invention is to simulate a pattern for generating an optimal pattern of a light guide plate that outputs optimal patterns by simulating different input parameters for generating an optimal pattern of a light guide plate included in a backlight unit used in a liquid crystal display. An apparatus, a method, and a computer-readable recording medium having recorded thereon a program are provided.

In addition, an object of the present invention is to generate a pattern for the optimal pattern of the light guide plate for outputting the optimal pattern by simulating by changing the pattern for each pattern type in order to generate the optimal pattern of the light guide plate provided in the backlight unit used in the liquid crystal display device, etc. The present invention provides a simulation apparatus, a method, and a computer-readable recording medium in which the program is recorded.

The apparatus of the present invention for achieving the above object; A pattern generating apparatus of a light guide plate which is provided in a backlight unit for supplying a light source to a passive display device to generate a uniform surface light source from a predetermined light source, comprising: a variable input unit configured to receive predetermined input variable values for generating the pattern; A pattern generator which generates a predetermined pattern by using variable values and settings input from the variable input unit; A density and uniformity calculator for calculating density and uniformity from data on the pattern generated by the pattern generator; A screen output unit configured to display a result value calculated from the density and uniformity calculator as a numerical value or a graph; And a storage unit which stores the pattern generated by the pattern generator and the value calculated by the density and uniformity calculator.

The method of the present invention for achieving the above object; A method of generating a pattern of a light guide plate provided in a backlight unit for supplying a light source to a passive display device, the method comprising: inputting predetermined input variable values for generating the pattern; Generating a predetermined pattern based on the input variable value and setting; Calculating density and uniformity from the data for the generated pattern; And displaying the calculated result as a numerical value or a graph.

The pattern simulation method for generating an optimal pattern of the light guide plate may be stored in a recording medium readable by a server computer. Such recording media includes all types of recording media on which programs and data are stored so that they can be read by a computer system. Examples include Read Only Memory (ROM), Random Access Memory (RAM), Compact Disk (CD), Digital Video Disk (DVD) -ROM, Magnetic Tape, Floppy Disk, Optical Data Storage, etc. It also includes implementations in the form of (eg, transmission over the Internet). In addition, these recording media can be distributed over network coupled computer systems so that the computer readable code is stored and executed in a distributed fashion.

Hereinafter, a detailed description of a preferred embodiment of the present invention will be described with reference to the accompanying drawings. In the following description, detailed descriptions of well-known functions or configurations will be omitted when it is determined that the detailed descriptions of the known functions or configurations may unnecessarily obscure the subject matter of the present invention.

The present invention relates to a backlight unit for providing a surface light source in a passive display device such as an LCD display, and more particularly to a light guide plate for converting a point light source or a line light source into a surface light source in the backlight unit. As described above, in converting the point light source or the line light source into the surface light source in the light guide plate, important considerations are securing high luminance and maintaining uniformity to maintain uniform brightness as a whole.

Meanwhile, in order to maintain brightness and uniformity in the light guide plate, a predetermined pattern is formed on the light guide plate by various methods (printing, cutting, corrosion, etc.), and the brightness and uniformity are determined according to the shape of the pattern. Will be different.

Accordingly, in the present invention to be described later, the optimum pattern is determined by generating and simulating various patterns as the standard of the light guide plate, the kind position of the light source, etc. are changed by setting various input parameter values to be considered in forming the pattern. Done.

3 is a block diagram illustrating a structure of a pattern simulation apparatus for generating an optimal pattern of a light guide plate according to the present invention.

Referring to FIG. 3, the pattern simulation apparatus according to the present invention includes a variable input unit 300, a pattern generator 310, a density and uniformity calculator 320, a controller 330, a screen output unit 340, and storage. The part 350 is comprised.

When the standard for the light guide plate of the display device to be manufactured is determined, an input variable value according to the standard is determined. The input variable value may be, for example, the size, thickness, position of the light source, or the like. In addition, the size or arrangement type of the basic unit shape constituting the pattern is set.

The input variable values for generating the pattern are input through the variable input unit 300, and the input variable values are transmitted to the pattern generator 310.

The pattern generator 310 generates a predetermined pattern based on the input variable values and settings. The data for the generated pattern is transmitted to the density and uniformity calculator 320, and the density and uniformity calculator 320 calculates the density and uniformity from the data for the received pattern.

The calculated density and uniformity may be expressed as a numerical value or a graph of the calculated result. Therefore, the calculated result is displayed through the screen output unit 340. In addition, the values or pattern images calculated in the above processes are stored in the storage 350.

On the other hand, after determining whether the pattern of the desired reference is generated from the result calculated and displayed by the density and uniformity calculator 320, the input to determine the shape or location of the pattern in order to generate a better performance pattern Adjust the variable values.

The changed input variable values are input to the variable input unit 300 in the same manner as described above, and the pattern generator 310 generates a pattern.

Hereinafter, a procedure of generating an optimal pattern through the apparatus of FIG. 3 will be described with reference to FIG. 4.

4 is a flowchart illustrating a pattern simulation procedure for generating an optimal pattern of a light guide plate according to the present invention.

Referring to FIG. 4, in order to generate an optimal pattern according to the present invention, first, basic variables including specifications of the light guide plate are input (step S401). At this time, the characteristic values for the basic unit shape forming the pattern together with the basic variable are input together.

Here, the basic parameters include an outermost horizontal size and a vertical size of a light guide LG, a thickness of the light guide plate, a horizontal area size and a vertical area size of a light area LA where a pattern is generated, a light source and the Distance between the wide area LA.

In addition, the property value for the basic unit shape may be the minimum and maximum size of the pattern, the depth of the pattern, the minimum spacing between the patterns during the random pattern.

Thereafter, a mode selection (step S402) for an array type for arranging the basic unit shapes forming the pattern may be performed. The array type may be a uniform type, a semi-uniform type, a random type, a diamond type, or the like. Meanwhile, predetermined patterns may be generated and displayed according to the input of a characteristic value for the basic variable and the basic unit shape and an arrangement type mode selection.

Meanwhile, pitch adjustment is performed to maintain high brightness and uniformity of the light guide plate. That is, by adjusting the vertical and horizontal pitch for the generated pattern (step S403), the brightness and uniformity are adjusted.

The pattern generated by the above procedure may be displayed in a predetermined form. In this case, when the density and uniformity of the generated pattern is calculated, the calculation result may be displayed in the form of a numerical value or a graph (step S404).

When the result is confirmed and the pattern or mode is to be converted again (step S405), another pattern is selected through variable input or selection means, or the pattern conversion is performed by adjusting the variable input value.

On the other hand, the pattern finally selected by the above-described method is displayed, and stored in a predetermined storage medium (step S407).

5A illustrates a variable input window for pattern simulation according to an embodiment of the present invention.

Referring to FIG. 5A, the apparatus and method for pattern simulation according to an embodiment of the present invention may be implemented by a program written in a code language in a predetermined computer system, and may be implemented through a predetermined window window in the program. It can also be implemented to perform the input procedure. Alternatively, the present invention may be implemented by creating the input variable in a specific file form, and then opening and reading the created file in the program.

Variables for generating the pattern input through the window window may be the size of the light guide plate, the size of a light area LA where light reaches, and the like, as described above. The size of the light guide plate may be a value such as the outermost X axis length of the light guide plate, the outermost Y axis length of the light guide plate, the thickness of the light guide plate, and the like. In addition, the size of the wide area may be the X-axis area of the pattern, the Y-axis area of the pattern, and the distance between the LED and the wide area LA.

In addition, as the characteristic value for the pattern (that is, the characteristic value for the basic unit shape), the minimum size and the maximum size of the pattern, the depth of the pattern, and the minimum spacing between the patterns during the random pattern may be input.

In addition, a mode selection for an array type for arranging the basic unit shapes forming the pattern may be implemented.

5B is a diagram illustrating a parameter for inputting a pattern simulation according to an embodiment of the present invention.

Referring to FIG. 5B, the variables input in FIG. 5A represent values that are actually represented. That is, it can be seen that the size of the pattern region (that is, the size of the wide area) is set slightly smaller than the outermost size of the light guide plate. In addition, it can be seen that the light source is set at a predetermined position around the light guide plate (the lower center of the center in FIG. 5B). On the other hand, the setting such as the position or number of the light source can be implemented to set through an input window provided separately.

6 is a diagram illustrating a mode input window for each type for pattern simulation according to an exemplary embodiment of the present invention.

Referring to FIG. 6, as shown in the lower end of FIG. 5A, a mode selection for an array type for arranging basic unit shapes forming the pattern may be implemented.

As described above, the array type may be a uniform type, a semi-uniform type, a random type, a diamond type, or the like. Meanwhile, predetermined patterns may be generated and displayed according to the input of a characteristic value for the basic variable and the basic unit shape and an arrangement type mode selection.

7A to 7D illustrate patterns generated by mode selection for each type for pattern simulation according to an embodiment of the present invention. That is, a pattern corresponding to each array may be generated according to the selection of the arrangement type of FIG. 6.

For example, when the shaping type is selected in FIG. 6, a pattern as shown in FIG. 7A is generated. The regular type of arrangement is the most faithful alignment method for a given pitch data.

In addition, if the semi-formal type is selected in FIG. 6, a pattern as shown in FIG. 7B is generated. The semi-structured type array is an array obtained by randomly processing the first column (Vertical 1th) in the standard type. The semi-formal type can be used as a process to remove the central stripe from random to symmetrical.

In addition, when the random type is selected in FIG. 6, a pattern as shown in FIG. 7C is generated. The random type array may be generated by a random number processing function for the vertical direction and the horizontal direction.

Finally, when the diamond type is selected in FIG. 6, a pattern as shown in FIG. 7D is generated. The diamond type arrangement is only possible if the horizontal pitch is the same. If the horizontal pitch is different, there may be a problem that the patterns overlap.

8 is a diagram illustrating setting of a rectangular factor in mode selection for each type for pattern simulation according to an embodiment of the present invention.

Referring to FIG. 8, the basic unit shape forming the pattern may be set to a rectangular shape rather than square or circular. That is, the ratio of the vertical axis to the horizontal axis may be defined as a rectangular factor (Ret-Ft), and the rectangular pattern may be set by setting the rectangular factor.

9A and 9B illustrate a pattern generated according to a rectangular factor setting according to an embodiment of the present invention.

9A illustrates an example in which the rectangular factor is set to 0.3, and FIG. 9B illustrates an example in which the rectangular factor is set to 1.0. In this case, as shown in FIG. 9A, when the rectangular factor is 0.3, it may be applied to the light incident part, and when the rectangular factor is 1.0 as shown in FIG. 9B, it may be applied to the semi-light incident part. Meanwhile, when the rectangular factor is 1.0, it can be seen that the basic unit shape is square.

10 is a diagram illustrating a pitch control input window for pattern simulation according to an embodiment of the present invention.

Referring to FIG. 10, after setting an initial input variable value as shown in FIG. 5, the pitch control value may be input by a window window provided separately. That is, the vertical axis (Y axis) is divided into a predetermined number in consideration of the size of the light guide plate and the number and size of basic unit shapes. 10 shows an example of dividing the wide area LA into 12 equal parts. At this time, the position of the basic unit shape is determined for each of the divided lines, and the interval between each basic unit shape is determined by the set horizontal and vertical pitch values.

11 is a view showing a pitch setting method for pattern simulation according to an embodiment of the present invention.

Referring to FIG. 11, the pitch value is controlled through the pitch control through the input window as shown in FIG. 10, thereby determining the position and spacing of each basic unit shape. For example, the vertical and horizontal pitches are set large toward the light incident portion of the wide area (i.e., the direction of Y coordinate is 0.0mm), and toward the semi-light incident portion of the wide area (i.e., the direction of Y coordinate is 36.65mm). Set the vertical and horizontal pitch small. By doing so, the more basic unit shapes are arranged the further away from the light source.

As described above, patterns of various shapes are formed by adjusting the pitch in the horizontal or vertical direction. Hereinafter, examples of patterns that may be generated by pitch value adjustment will be described with reference to FIGS. 12A to 15C.

12A and 12B are diagrams illustrating a case in which the same vertical pitch value and the horizontal pitch value are different according to an embodiment of the present invention. As shown in FIG. 12A, when the vertical pitch value is fixed to the same value and the horizontal pitch value is changed, a pattern having a shape as shown in FIG. 12B may be generated. 13A and 13B are diagrams illustrating a case in which the horizontal pitch values are the same and the vertical pitch values are different according to the exemplary embodiment of the present invention. As shown in FIG. 13A, when the horizontal pitch value is fixed to the same value and the vertical pitch value is changed, a pattern having a shape as shown in FIG. 13B may be generated.

14A and 14B illustrate pattern generation by square type selection according to an embodiment of the present invention. When the vertical and horizontal pitch values are fixed in the same manner as in FIG. 14A, a square array pattern is formed as in FIG. 14B.

15A to 15C are views illustrating pattern generation by diamond type selection according to an embodiment of the present invention. That is, when the diamond array is selected, and the horizontal pitch value is fixed and the vertical pitch value is changed as shown in FIG. 15A, the pattern of the shape as shown in FIG. 14B is formed on the light incident part, and the half light incident part is A pattern of the form as shown in FIG. In this case, in the case of the diamond pattern, the horizontal pitch size should be set identically, otherwise the pattern may cross. In general, the light incident part should have a low density of the pattern, and the light incident part should have a high density of the pattern. Therefore, as shown in FIG. 15A, the vertical pitch of the light incident part is large and the vertical pitch of the half light incident part is small.

16 illustrates a variable input window for pattern simulation according to an embodiment of the present invention.

Referring to FIG. 16, the variable input window and the pitch adjustment window are provided as described above, and the density of the light guide plate is calculated according to the values input through the respective input windows.

In this case, the density value may be calculated as a ratio between the pattern area and the pitch area, and the density of the light incident part and the half light incident part according to the value set in FIG. 1> and <Equation 2>.

Meanwhile, the pattern based on the input value set by FIG. 16 is generated as shown in FIG. 17, and the density value thereof is calculated for each position and output as a graph as shown in FIG. 18.

18 is a graph showing the density calculated in the pattern simulation according to the embodiment of the present invention. Referring to FIG. 18, it can be seen that the maximum density difference between the density calculated by the above equations and the density calculated on the program is about 3%. This is because the pitch data was linearly input, but was calculated in a nonlinear manner using a spline in the process of finding an intermediate value. Therefore, when the number of pitch data is increased and data is linearly input, the nonlinear region is reduced, and the error of maximum density is reduced.

Meanwhile, when the basic unit shape is converted from a circle to a rectangle as shown in FIGS. 16 to 18, the calculated density values are changed.

That is, when the rectangle is converted to the basic unit shape, the pattern arrangement in the light incidence part and the half light incidence part is generated as shown in FIGS. 19A and 19B.

At this time, the density in the quadrangle as shown in Figure 19a and 19b is the same as Figure 20a. Therefore, it can be seen that the difference from the density in the circle shown in FIG. 20B remains. In addition, when the rectangular factor (Ret-Ft) in the rectangle is changed, it can be seen that the density also changes. The densities according to the changes of the basic unit shapes described above are calculated as shown in Table 1 below.

Circle Ret-Ft Ractangle Ret-Ft Rectangle Light receiver 9.8 0.5 6.3 1.0 12.5 Importer 60.7 1.0 77.0 1.0 77.0

On the other hand, when the basic unit shape is circular, the density can be adjusted by partially mixing the basic unit shape by changing the basic unit shape into a rectangle.

21A and 21B are graphs showing density comparison according to a mixture of circles and rectangles in a pattern simulation according to an embodiment of the present invention.

As shown in FIG. 21A, when the mixing ratio of the circular and the rectangle is changed from the light incidence part to the light incidence part, the density change occurs in the form as shown in FIG. 21B.

As shown in FIG. 21A, the actual pattern generated when the mixing ratio of the basic unit shapes is different is as shown in FIGS. 22A to 22C.

22A to 22C are views illustrating patterns generated according to a mixing ratio of circular and rectangular shapes in a pattern simulation according to an embodiment of the present invention.

That is, in the light incident part, only circular basic unit shapes are arranged at wide intervals as shown in FIG. 22A, and in the intermediate position, rectangular basic unit shapes as shown in FIG. 22B are mixed in a similar ratio. In the semi-light incident part, only the basic unit shape of the rectangle is densely arranged as shown in FIG. 22C.

Therefore, the ratio of the rectangles is increased from the light incidence part to the light incidence part, and the density change can be brought about by narrowing the interval between the basic unit shapes.

Accordingly, when the pattern is formed by adjusting the ratio of the basic unit shapes of circular and square, the density can be freely adjusted within a predetermined range as shown in FIG.

On the other hand, in the embodiment of the present invention has been described with respect to specific embodiments, various modifications are possible without departing from the scope of the invention. Therefore, the scope of the present invention should not be limited to the described embodiments, but should be defined not only by the appended claims, but also by those equivalent to the claims.

According to the present invention, the pattern of the light guide plate, the location of the type of the light source, and the like are varied by setting various input parameter values to be considered in forming a pattern of the light guide plate for supplying a uniform surface light source in the backlight unit. By generating and simulating them, it is possible to effectively determine the optimal pattern without the unnecessary process of manufacturing the light guide plate several times.

Claims (13)

In the pattern generating apparatus of the light guide plate which is provided in the backlight unit which supplies a light source to a passive display apparatus, and produces | generates a uniform surface light source from a predetermined light source, A variable input unit configured to receive predetermined input variable values for generating the pattern; A pattern generator which generates a predetermined pattern by using variable values and settings input from the variable input unit; A density and uniformity calculator for calculating density and uniformity from data on the pattern generated by the pattern generator; And And a screen output unit configured to display the density and uniformity calculated values calculated by the density and uniformity calculator as numerical values or graphs, and the like. The method of claim 1, The input variable value input through the variable input unit is A pattern simulation apparatus for generating an optimal pattern of a light guide plate, characterized in that at least one selected from among basic variables, characteristic values for basic unit shapes, and an array type for forming a pattern. The method of claim 2, The basic variable is at least one selected from among the outermost horizontal size, the vertical size of the light guide plate, the thickness of the light guide plate, the horizontal area size of the wide area where the pattern is generated, the vertical area size, and the distance between the light source and the wide area. Pattern simulation device for pattern generation. The method of claim 2, The characteristic value for the basic unit shape is, A pattern simulation apparatus for generating an optimal pattern of a light guide plate, characterized in that any one or more selected from the minimum and maximum size of the pattern, the depth of the pattern, the minimum spacing between the patterns at random patterns. The method of claim 2, The array type is A pattern simulation apparatus for generating an optimal pattern of a light guide plate, characterized in that any one or more selected from the standard type, semi-type type, random type and diamond type. The method of claim 1, The device, A storage unit for storing the pattern generated by the pattern generator and a value calculated by the density and uniformity calculator; And And a pitch adjusting unit for adjusting pitch between the basic unit shapes to generate higher luminance and uniformity than the stored values from the density and uniformity values stored in the storage unit. Pattern simulation device. In the pattern generation method of the light guide plate provided in the backlight unit for supplying a light source to the passive display device to generate a uniform surface light source from a predetermined light source, Inputting predetermined input variable values for generating the pattern; Generating a predetermined pattern based on the input variable value and setting; Calculating density and uniformity from the data for the generated pattern; And And displaying the calculated density and uniformity values as numerical values or graphs. The method of claim 7, wherein The input variable value input through the variable input unit is A pattern simulation method for generating an optimal pattern of a light guide plate, characterized in that at least one selected from among a basic variable, a characteristic value for a basic unit shape, and an array type for forming a pattern. The method of claim 8, The basic variable is at least one selected from among the outermost horizontal size, the vertical size of the light guide plate, the thickness of the light guide plate, the horizontal area size of the wide area where the pattern is generated, the vertical area size, and the distance between the light source and the wide area. Pattern simulation method for pattern generation. The method of claim 8, The characteristic value for the basic unit shape is, A pattern simulation method for generating an optimal pattern of a light guide plate, characterized in that any one or more selected from the minimum and maximum size of the pattern, the depth of the pattern, the minimum spacing between the patterns in the random pattern. The method of claim 8, The array type is A pattern simulation method for generating an optimal pattern of a light guide plate, characterized in that at least one selected from a regular type, a semi-formal type, a random type and a diamond type. The method of claim 7, wherein The method, And performing pitch adjustment between the basic unit shapes to maintain high brightness and uniformity of the light guide plate. A computer-readable recording medium containing a program capable of performing the method according to any one of claims 7 to 12.

Images