KR100618129B1 - Producing method of surface modified oxide organosol - Google Patents
Producing method of surface modified oxide organosol Download PDFInfo
- Publication number
- KR100618129B1 KR100618129B1 KR1020060003229A KR20060003229A KR100618129B1 KR 100618129 B1 KR100618129 B1 KR 100618129B1 KR 1020060003229 A KR1020060003229 A KR 1020060003229A KR 20060003229 A KR20060003229 A KR 20060003229A KR 100618129 B1 KR100618129 B1 KR 100618129B1
- Authority
- KR
- South Korea
- Prior art keywords
- oxide
- group
- organosol
- sol
- modified
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 34
- 239000002245 particle Substances 0.000 claims abstract description 38
- 239000003960 organic solvent Substances 0.000 claims abstract description 27
- 150000001282 organosilanes Chemical class 0.000 claims abstract description 26
- 238000000108 ultra-filtration Methods 0.000 claims abstract description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 13
- 230000004048 modification Effects 0.000 claims abstract description 6
- 238000012986 modification Methods 0.000 claims abstract description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 65
- 238000004519 manufacturing process Methods 0.000 claims description 17
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 claims description 11
- 230000008569 process Effects 0.000 claims description 11
- 239000003513 alkali Substances 0.000 claims description 9
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 claims description 9
- 239000003957 anion exchange resin Substances 0.000 claims description 7
- 229910000410 antimony oxide Inorganic materials 0.000 claims description 7
- 239000003729 cation exchange resin Substances 0.000 claims description 7
- 125000003277 amino group Chemical group 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 5
- 238000006884 silylation reaction Methods 0.000 claims description 5
- XDQWJFXZTAWJST-UHFFFAOYSA-N 3-triethoxysilylpropyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C=C XDQWJFXZTAWJST-UHFFFAOYSA-N 0.000 claims description 4
- HGEKXQRHZRDGKO-UHFFFAOYSA-N 3-tripropoxysilylpropyl prop-2-enoate Chemical compound CCCO[Si](OCCC)(OCCC)CCCOC(=O)C=C HGEKXQRHZRDGKO-UHFFFAOYSA-N 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- -1 acryl group Chemical group 0.000 claims description 4
- DCFKHNIGBAHNSS-UHFFFAOYSA-N chloro(triethyl)silane Chemical compound CC[Si](Cl)(CC)CC DCFKHNIGBAHNSS-UHFFFAOYSA-N 0.000 claims description 4
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 claims description 4
- BYLOHCRAPOSXLY-UHFFFAOYSA-N dichloro(diethyl)silane Chemical compound CC[Si](Cl)(Cl)CC BYLOHCRAPOSXLY-UHFFFAOYSA-N 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 4
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 125000000468 ketone group Chemical group 0.000 claims description 4
- 150000004756 silanes Chemical class 0.000 claims description 4
- 239000007787 solid Substances 0.000 claims description 4
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 125000003700 epoxy group Chemical group 0.000 claims description 3
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 claims description 3
- 238000006460 hydrolysis reaction Methods 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 claims description 3
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 claims description 2
- KKYDYRWEUFJLER-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6,7,7,10,10,10-heptadecafluorodecyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCC(F)(F)F KKYDYRWEUFJLER-UHFFFAOYSA-N 0.000 claims description 2
- OTFBCAWFNXYWDX-UHFFFAOYSA-N 2-(2,2-diphenylethoxy)ethenylsilane Chemical compound C1(=CC=CC=C1)C(COC=C[SiH3])C1=CC=CC=C1 OTFBCAWFNXYWDX-UHFFFAOYSA-N 0.000 claims description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 2
- JUINTNKGYWNEDR-UHFFFAOYSA-N 3-[dimethyl(propoxy)silyl]propyl prop-2-enoate Chemical compound CCCO[Si](C)(C)CCCOC(=O)C=C JUINTNKGYWNEDR-UHFFFAOYSA-N 0.000 claims description 2
- YQFQCQOGRMUSGZ-UHFFFAOYSA-N 3-[methyl-bis(trimethylsilyloxy)silyl]propyl prop-2-enoate Chemical compound C[Si](C)(C)O[Si](C)(O[Si](C)(C)C)CCCOC(=O)C=C YQFQCQOGRMUSGZ-UHFFFAOYSA-N 0.000 claims description 2
- KSCAZPYHLGGNPZ-UHFFFAOYSA-N 3-chloropropyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCCCl KSCAZPYHLGGNPZ-UHFFFAOYSA-N 0.000 claims description 2
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 claims description 2
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 claims description 2
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 claims description 2
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 claims description 2
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 claims description 2
- STZKYOQJAGNMCZ-UHFFFAOYSA-N CCO[SiH2]CCCOCC1CO1 Chemical compound CCO[SiH2]CCCOCC1CO1 STZKYOQJAGNMCZ-UHFFFAOYSA-N 0.000 claims description 2
- PVLBXNICXUCXTA-UHFFFAOYSA-N [2-hydroxy-3-(3-triethoxysilylpropylamino)propyl] prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCNCC(O)COC(=O)C=C PVLBXNICXUCXTA-UHFFFAOYSA-N 0.000 claims description 2
- LTKACMBVEOKTGC-UHFFFAOYSA-N [2-hydroxy-3-(3-trimethoxysilylpropylamino)propyl] prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCNCC(O)COC(=O)C=C LTKACMBVEOKTGC-UHFFFAOYSA-N 0.000 claims description 2
- RNFUJUQPEUUTEZ-UHFFFAOYSA-N [2-hydroxy-3-(3-tripropoxysilylpropylamino)propyl] prop-2-enoate Chemical compound CCCO[Si](OCCC)(OCCC)CCCNCC(O)COC(=O)C=C RNFUJUQPEUUTEZ-UHFFFAOYSA-N 0.000 claims description 2
- RMKZLFMHXZAGTM-UHFFFAOYSA-N [dimethoxy(propyl)silyl]oxymethyl prop-2-enoate Chemical compound CCC[Si](OC)(OC)OCOC(=O)C=C RMKZLFMHXZAGTM-UHFFFAOYSA-N 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000003118 aryl group Chemical group 0.000 claims description 2
- XKJVJPFYOTXUSM-UHFFFAOYSA-N butoxy-ethyl-dimethoxysilane Chemical compound CCCCO[Si](CC)(OC)OC XKJVJPFYOTXUSM-UHFFFAOYSA-N 0.000 claims description 2
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 2
- MNKYQPOFRKPUAE-UHFFFAOYSA-N chloro(triphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(Cl)C1=CC=CC=C1 MNKYQPOFRKPUAE-UHFFFAOYSA-N 0.000 claims description 2
- 125000004122 cyclic group Chemical group 0.000 claims description 2
- NRAYZPGATNMOSB-UHFFFAOYSA-N dichloro(dihexyl)silane Chemical compound CCCCCC[Si](Cl)(Cl)CCCCCC NRAYZPGATNMOSB-UHFFFAOYSA-N 0.000 claims description 2
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 claims description 2
- GENZKBJGWAAVIE-UHFFFAOYSA-N diethoxy-[3-(oxiran-2-ylmethoxy)propyl]-phenylsilane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)CCCOCC1CO1 GENZKBJGWAAVIE-UHFFFAOYSA-N 0.000 claims description 2
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 claims description 2
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 claims description 2
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 claims description 2
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 claims description 2
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 claims description 2
- 125000004185 ester group Chemical group 0.000 claims description 2
- NNBRCHPBPDRPIT-UHFFFAOYSA-N ethenyl(tripropoxy)silane Chemical compound CCCO[Si](OCCC)(OCCC)C=C NNBRCHPBPDRPIT-UHFFFAOYSA-N 0.000 claims description 2
- MBGQQKKTDDNCSG-UHFFFAOYSA-N ethenyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(C=C)OCC MBGQQKKTDDNCSG-UHFFFAOYSA-N 0.000 claims description 2
- ZLNAFSPCNATQPQ-UHFFFAOYSA-N ethenyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)C=C ZLNAFSPCNATQPQ-UHFFFAOYSA-N 0.000 claims description 2
- 125000001033 ether group Chemical group 0.000 claims description 2
- 230000007062 hydrolysis Effects 0.000 claims description 2
- 229910003437 indium oxide Inorganic materials 0.000 claims description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000005055 methyl trichlorosilane Substances 0.000 claims description 2
- RJMRIDVWCWSWFR-UHFFFAOYSA-N methyl(tripropoxy)silane Chemical compound CCCO[Si](C)(OCCC)OCCC RJMRIDVWCWSWFR-UHFFFAOYSA-N 0.000 claims description 2
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 claims description 2
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical group CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 claims description 2
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 claims description 2
- NHBRUUFBSBSTHM-UHFFFAOYSA-N n'-[2-(3-trimethoxysilylpropylamino)ethyl]ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCNCCN NHBRUUFBSBSTHM-UHFFFAOYSA-N 0.000 claims description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 2
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 claims description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 claims description 2
- ADLSSRLDGACTEX-UHFFFAOYSA-N tetraphenyl silicate Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC1=CC=CC=C1 ADLSSRLDGACTEX-UHFFFAOYSA-N 0.000 claims description 2
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 claims description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 2
- 229910001887 tin oxide Inorganic materials 0.000 claims description 2
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- YZVRVDPMGYFCGL-UHFFFAOYSA-N triacetyloxysilyl acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)OC(C)=O YZVRVDPMGYFCGL-UHFFFAOYSA-N 0.000 claims description 2
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 claims description 2
- ZOYFEXPFPVDYIS-UHFFFAOYSA-N trichloro(ethyl)silane Chemical compound CC[Si](Cl)(Cl)Cl ZOYFEXPFPVDYIS-UHFFFAOYSA-N 0.000 claims description 2
- PYJJCSYBSYXGQQ-UHFFFAOYSA-N trichloro(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](Cl)(Cl)Cl PYJJCSYBSYXGQQ-UHFFFAOYSA-N 0.000 claims description 2
- KWDQAHIRKOXFAV-UHFFFAOYSA-N trichloro(pentyl)silane Chemical compound CCCCC[Si](Cl)(Cl)Cl KWDQAHIRKOXFAV-UHFFFAOYSA-N 0.000 claims description 2
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- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 claims description 2
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 claims description 2
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 claims description 2
- 239000005051 trimethylchlorosilane Substances 0.000 claims description 2
- CESKYMDZTHKIPO-UHFFFAOYSA-N tris(2-methoxyethoxy)-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound COCCO[Si](OCCOC)(OCCOC)CCCOCC1CO1 CESKYMDZTHKIPO-UHFFFAOYSA-N 0.000 claims description 2
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Images
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/155—Preparation of hydroorganogels or organogels
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/14—Methods for preparing oxides or hydroxides in general
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
- B01J13/0004—Preparation of sols
- B01J13/0021—Preparation of sols containing a solid organic phase
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Silicon Compounds (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
Abstract
본 발명은 나노크기의 금속산화물 미립자가 용매에 분산되어 있는 산화물 졸 내의 산화물 입자 표면이 반응성 및 비반응성 관능기로 개질되어 있는 표면개질 산화물 오가노졸의 제조방법에 관한 것으로 좀더 상세히는 물을 분산매로 하는 산화물 수성졸 또는 유기용매에 분산되어 있는 산화물 오가노졸을 출발원료로 하여 산화물 입자 표면의 하이드록시기에 오가노실란을 반응시켜 시릴화한 후 한외여과에 의해 미반응 오가노 실란, 실란끼리 축합반응에 의한 분자량이 커진 실란축합물 또는 수분을 제거하여 표면이 개질된 산화물 오가노졸을 제조하는 방법에 관한 것이다.The present invention relates to a method for preparing a surface-modified oxide organosol in which an oxide particle surface in an oxide sol in which nano-sized metal oxide fine particles are dispersed in a solvent is modified with reactive and non-reactive functional groups. Oxide organosol dispersed in an oxide aqueous sol or organic solvent is used as a starting material, and the organosilane reacts with a hydroxyl group on the surface of the oxide particle, and then silylated and unreacted organosilane and silane are condensed by ultrafiltration. The present invention relates to a method of preparing a surface-modified oxide organosol by removing a silane condensate having a high molecular weight or water.
표면개질, 산화물 오가노졸, 한외여과 Surface Modification, Oxide Organosol, Ultrafiltration
Description
도 1은 본 발명의 제조예1 및 제조예2, 제조예3에 의해 제조된 코팅도료의 시간의 경과에 따른 점도변화를 도식화한 그래프이다.1 is a graph illustrating the viscosity change over time of the coating material prepared by Preparation Example 1, Preparation Example 2, Preparation Example 3 of the present invention.
도 2는 본 발명의 제조예4 및 제조예5, 제조예6에 의해 제조된 코팅도료의 시간의 경과에 따른 점도변화를 도식화한 그래프이다.Figure 2 is a graph illustrating the viscosity change over time of the coating material prepared by Preparation Example 4, Preparation Example 5, Preparation Example 6 of the present invention.
본 발명은 금속산화물 미립자 표면을 반응성 또는 비반응성 관능기로 개질되어 있는 표면개질 산화물 졸의 제조방법에 관한 것으로 좀더 상세히는 본 발명은 물을 분산매로 하는 산화물 수성졸 또는 유기용매에 분산되어 있는 산화물 오가노졸로부터 극성이 상이한 각종 유기용매 및 유기물과의 혼용성 및 분산성, 저장안정성이 뛰어난 표면개질 산화물 오가노졸을 제조하는 방법에 관한 것이다.The present invention relates to a method for preparing a surface-modified oxide sol in which the surface of a metal oxide fine particle is modified with a reactive or non-reactive functional group. More particularly, the present invention relates to an oxide organo dispersed in an oxide aqueous sol or an organic solvent using water as a dispersion medium. The present invention relates to a method for producing a surface-modified oxide organosol excellent in compatibility with, dispersibility, and storage stability with various organic solvents and organic substances having different polarities.
각종 산화물 졸은 함유되어 있는 금속산화물의 특성에 따라서 세라믹, 글라스, 플라스틱, 나무 등의 표면처리제 또는 플라스틱보강제, 결합제, 접착제, 도료, 수지가공, 전기 및 전자소재 등의 분야에서 유기/무기 복합재료나 첨가제의 용도로 다양하게 배합되어 사용될 수 있다. 현재 공업적으로 유용하게 사용될 수 있는 산화물 졸은 실리카졸, 타이타니아졸, 안티모니아졸, 지르코니아졸, 알루미나졸 및 세리아졸 등이 있으며, 이외에도 다양한 금속산화물에 대해서 점차 그 응용범위가 확대되고 있는 추세이다. 그러나 이러한 산화물 졸의 입자표면은 주로 하이드록시기이므로 비극성 유기용매 및 각종 유기물과의 혼합분산이 제한되고, 유기물과의 혼합 및 반응이 불가능하기 때문에 유기무기 복합재료 등의 용도로 사용되는 데에 한계가 있다.Various oxide sol is organic / inorganic composite material in the field of surface treatment agent such as ceramic, glass, plastic, wood or plastic reinforcing agent, binder, adhesive, paint, resin processing, electric and electronic material according to the characteristics of metal oxide contained It may be used in various combinations for the purpose of the additives. Oxide sol that can be used industrially useful at present, such as silica sol, titania sol, antimoniazole, zirconia sol, alumina sol and ceria sol, etc. In addition, the application range is gradually expanded for various metal oxides. . However, since the particle surface of the oxide sol is mainly a hydroxyl group, the mixing and dispersion of the non-polar organic solvent and various organic substances are limited, and since the mixing and reaction with the organic substances are impossible, they are limited to being used for organic inorganic composite materials. There is.
이러한 유기물과의 분산성, 혼용성, 반응성을 개량하고 유기공업에 응용하기 위해서는 산화물 졸의 표면을 개질하여 사용하여야 한다.In order to improve the dispersibility, miscibility, and reactivity with these organic substances and to apply them to the organic industry, the surface of the oxide sol should be modified and used.
각종의 산화물 졸 중에서도 실리카졸에 대한 표면개질 기술은 이전부터 다양한 방법으로 제조될 수 있다는 것이 공지되어 있다. 종래, 표면개질 실리카 오가노졸을 제조하는 방법으로는, 일본공개특허 제50-96699호에는 물유리의 중화수용액으로부터 실록시실라놀을 극성유기용매로 유출, 분리하여 얻은 용액에 오가노시릴화제를 첨가하는 방법이 제안되어 있으나, 물유리를 중화하는 공정이 있기 때문에 나트륨염의 혼입을 피할 수 없고, 수분의 잔존량이 비교적 많으며, 실리카가 저분자량이기 때문에 고농도로 안정한 실리카 오가노졸을 얻는 것이 곤란하다. 또 실록시실라놀을 유출분리하는 공정이 있기 때문에 원료인 물유리에 함유되어 있는 실리카 의 이용률이 감소하여 실리카졸 제조수율이 저하되기 때문에 저렴한 비용으로 실리카 오가노졸을 얻는 것이 불가능할 뿐만 아니라, 작업의 재현성도 좋지 않은 결점이 있다.Among various oxide sols, it is known that surface modification techniques for silica sol can be prepared by various methods. Conventionally, as a method for producing a surface-modified silica organosol, Japanese Unexamined Patent Publication No. 50-96699 adds an organosylating agent to a solution obtained by distilling and separating siloxysilanol from a neutralized aqueous solution of water glass with a polar organic solvent. Although a method of neutralizing water glass has been proposed, incorporation of sodium salts is unavoidable because of the process of neutralizing water glass, it is difficult to obtain a highly stable silica organosol due to the relatively high amount of water remaining and the low molecular weight of silica. In addition, since there is a process of distilling and separating the siloxysilanol, the utilization rate of silica contained in the water glass as a raw material is reduced, and the yield of silica sol production is lowered. Therefore, it is not only possible to obtain silica organosol at a low cost, but also the reproducibility of the work. There is also a disadvantage.
일본공개특허 제58-145614호에서는 입경이 5~30nm인 실리카 수성졸을 용매치환하여 수분이 10%이하인 실리카 오가노졸을 제조하고, 오가노 시릴화제를 첨가하여 반응시킨 후 용매를 제거하여, 실리카입자표면에 시릴기가 화학적으로 결합되어 있는, 유기용매에 재분산 가능한 실리카분말을 얻는 것이 기재되어 있으나, 졸을 건조하여 분말화하는 공정 중에 입자간 응집 및 결합이 발생하여 균일한 입도분포를 갖는 실리카졸을 얻는 것이 곤란한 문제가 있다. Japanese Patent Application Laid-Open No. 58-145614 discloses a silica organosol having a particle diameter of 5 to 30 nm by solvent replacement to prepare a silica organosol having a water content of 10% or less, reacting with an organosilylating agent, and then removing the solvent to remove silica. Although it has been described to obtain a silica powder that is redispersible in an organic solvent in which a silyl group is chemically bonded to the particle surface, silica having a uniform particle size distribution is generated due to coagulation and bonding between particles during the process of drying and powdering the sol. There is a problem with getting a sol.
미국특허 제4177315호 명세서에는 알킬트리알콕시실란을 물 또는 산성수용액으로 가수분해한 후 실리카 수성졸과 혼합하여 알킬트리알콕시실란과 실리카를 반응하여 코팅도료의 성분으로 사용하는 방법이 개시되어 있으나, 실리카와 반응하기 전에 실란끼리의 축합반응에 의해 분자량이 큰 실란 축합물이 생성되어 실리카와 실란이 고효율로 반응하는 것이 어려우며, 입자가 큰 실리카가 생성되어 비극성 유기용매에서 분산성이 저하되는 문제가 있다.US Pat. No. 4,417,15 discloses a method of hydrolyzing an alkyltrialkoxysilane with water or an acidic aqueous solution and then mixing with an aqueous silica sol to react the alkyltrialkoxysilane with silica to use it as a component of the coating paint. By the condensation reaction between silanes before the reaction with silane, a large molecular weight silane condensate is produced, and it is difficult for silica and silane to react with high efficiency, and large particles of silica are produced, resulting in a decrease in dispersibility in a nonpolar organic solvent. .
미국특허 제5651921호에서는 pH 적정제를 첨가하여 pH 1~5로 적정한 실리카 수성졸에 저급 알코올을 혼합한 후 공비증류로 수분을 제거하여 알코올분산 실리카졸을 제조하고, 이 알코올분산 실리카졸에 비극성 유기용매를 첨가한 후 용매치환에 의해 비극성 유기용매에 분산된 실리카 오가노졸을 제조하고, 이렇게 제조된 졸의 실리카입자 표면을 오가노 실란으로 시릴화 처리하는 것을 특징으로 하는 표면 개질 실리카 오가노졸의 제조방법 및, 실리카 수성졸을 pH적정제로 pH1~5로 적정한 후 비극성 유기용매와 양이온 계면활성제를 첨가하여 에멀젼을 형성한 후 공비증류에 의해서 수분을 제거하여 비극성 유기용매에 분산된 콜로이달 실리카졸을 제조하고, 실리카입자 표면을 오가노 실란으로 시릴화처리하여 표면개질된 실리카 오가노졸을 제조하는 방법이 개시되어 있으나, 실리카와 결합하지 않고 남아있는 미반응 알콕시실란 및 실란끼리의 축합물을 제거하기가 곤란하여, 코팅도료 등에 사용시에 이러한 미반응 알콕시실란 및 실란축합물이 분산성 및 저장 안정성을 해치고, 최종 경화된 코팅막의 물리적, 열적, 화학적 특성에 악영향을 끼치는 문제가 있다. 또한, 비극성 유기용매 중에서 실리카입자 표면을 시릴화 처리하는 방법으로는 실리카졸의 입자응집이 발생하기 쉬워서 표면개질 처리 후에도 안정하게 분산된 저점도, 고농도의 실리카졸을 얻는 것이 어려워, 적용할 수 있는 용도범위가 제한되는 문제가 있다.U.S. Pat.No.5651921 describes the addition of a pH titrant to lower alcohols in a silica aqueous sol titrated to pH 1-5, followed by removal of water by azeotropic distillation to produce an alcohol dispersed silica sol, which is non-polar to the alcohol dispersed silica sol. After adding an organic solvent, a silica organosol dispersed in a nonpolar organic solvent is prepared by solvent replacement, and the surface of the silica-modified sol of the sol thus prepared is subjected to cylylation with organosilane. After preparing the silica aqueous sol to pH 1-5 with pH titrant, an emulsion is formed by adding a nonpolar organic solvent and a cationic surfactant, and then water is removed by azeotropic distillation to disperse the colloidal silica sol dispersed in the nonpolar organic solvent. And preparing a surface-modified silica organosol by silylating the surface of silica particles with organosilane. Although unreacted alkoxysilanes and silane condensates which remain unbound with silica have been disclosed, it is difficult to remove these unreacted alkoxysilanes and silane condensates when used in coating materials. There is a problem that harms and adversely affects the physical, thermal and chemical properties of the final cured coating. In addition, in the non-polar organic solvent, the surface of the silica particles may be subjected to the cyrillation treatment, which is likely to cause particle aggregation of the silica sol, and thus it is difficult to obtain a low viscosity, high concentration silica sol that is stably dispersed even after the surface modification treatment. There is a problem that the use range is limited.
비극성 유기용매 중에서 시릴화 처리하는 경우에 발생하는 입자응집을 방지하기 위해서, 일본공개특허 제11-43319호에서는 친수성 콜로이달 실리카와 디실록산 화합물 또는 모노알콕시실란 화합물 등의 시릴화제 및 소수성 유기용매와 C1~C3인 알코올과 물이 함유되어 있는 반응혼합물을 이 반응혼합물 내에 존재하는 알칼리가 제거되거나 또는 당량 이상의 산으로 중화된 상태에서 0~100℃의 범위에서 숙성하는 것에 의해 실리카입자 표면이 시릴화처리된 실리카 오가노졸을 형성한 후, 소수성 유기용매로 용매치환을 실시하여 소수성 유기용매에 분산된 표면개질 실리카 오가노졸의 제조방법이 기재되어 있으나, 미반응 오가노실란 및 실란끼리의 축 합물이 잔존함으로 인하여 발생하는 여러 가지 문제점들을 해결하기에는 곤란한 점이 있다.In order to prevent particle agglomeration generated in the case of cylylation treatment in a non-polar organic solvent, Japanese Laid-Open Patent Publication No. 11-43319 discloses a hydrophilic colloidal silica and a silylating agent such as a disiloxane compound or a monoalkoxysilane compound and a hydrophobic organic solvent. The surface of the silica particles is silylated by subjecting the reaction mixture containing C1 to C3 alcohol and water to mature in the range of 0 to 100 DEG C while removing the alkali present in the reaction mixture or neutralizing it with an equivalent acid or more. After forming the treated silica organosol, the method of preparing the surface-modified silica organosol dispersed in the hydrophobic organic solvent by performing solvent replacement with a hydrophobic organic solvent is described, but the condensation of unreacted organosilane and silane It is difficult to solve various problems caused by the remaining.
이러한 종래의 문제점을 해결하기 위해서 본 발명의 목적은 상업적으로 시판되거나 공지의 방법에 의해 제조된 통상의 산화물 수성졸 또는 오가노졸로부터 산화물 입자표면이 오가노실란으로 시릴화 처리된 표면개질 산화물 오가노졸을 제조하여 분산성, 저장안정성, 순도, 회수율 등을 향상시키고, 제조설비 및 에너지면에서 경제적인 표면개질 산화물 오가노졸 제조방법을 제공할 수 있다.In order to solve this conventional problem, an object of the present invention is a surface-modified oxide organosol in which the surface of an oxide particle is silylated with organosilane from a conventional oxide aqueous sol or organosol which is commercially available or prepared by a known method. It can be prepared to improve the dispersibility, storage stability, purity, recovery rate, etc., and can provide a method for producing surface-modified oxide organosol in terms of manufacturing equipment and energy.
또한, 본 발명의 다른 목적은 시릴화 반응 후에 미반응 물질을 제거함으로써 분산성과 저장안정성이 향상된 표면개질 산화물 오가노 졸을 제조하는 방법을 제공하는 적이다.In addition, another object of the present invention is to provide a method for preparing a surface-modified oxide organosol having improved dispersibility and storage stability by removing unreacted material after the cyrilization reaction.
또한 본 발명은 또 다른 목적은 상기 제조된 표면개질 산화물 오가노졸을 극성이 상이한 각종 유기용매 및 유기수지 등에 혼합하여 유기물만으로는 구현하기 어려운 기계적, 물리적, 열적인 특성 및 수지 또는 용매와의 혼용성 및 분산안정성, 저장안정성이 향상된 수지 등을 제공하려는 것이다.Another object of the present invention is to mix the surface-modified oxide organosol prepared above with various organic solvents and organic resins having different polarities, such as mechanical, physical, thermal properties and compatibility with resins or solvents that are difficult to implement only organic materials and It is to provide a resin having improved dispersion stability and storage stability.
상기 목적을 달성하기 위하여 본 발명자들은 출발원료로 통상의 방법으로 제조된 콜로이달 산화물 수성졸 또는 오가노졸을 이용하여 실릴화 반응시킨 후 미반 응물과 용매 등의 불순물을 한외여과로 제거하여 저장안정성 및 분산 안정성이 향상된 표면개질 산화물 오가노 졸을 제조하였다.In order to achieve the above object, the present inventors perform silylation reaction using colloidal oxide aqueous sol or organosol prepared by a conventional method as a starting material, and remove impurities such as uncoagulant and a solvent by ultrafiltration, and storage stability and A surface modified oxide organo sol having improved dispersion stability was prepared.
본 발명은 i) 평균 입경이 5~300nm이고, 산화물의 고형분 농도가 5~50중량%인 산화물 수성졸 또는 오가노졸을 양이온교환수지와 음이온교환수지로 처리하거나, pH 적정화제를 첨가하여 pH 7 미만으로 산성화하는 공정; The present invention comprises i) treating an aqueous oxide sol or organosol having an average particle diameter of 5 to 300 nm and an oxide solid concentration of 5 to 50% by weight with a cation exchange resin and an anion exchange resin, or by adding a pH titrant to
ⅱ) 하기 화학식 1로 표시되는 오가노실란 또는 이를 가수분해하여 얻은 하이드록시실란을 상기 산성화된 산화물 졸에 첨가하여 산화물 입자의 표면을 시릴화 반응시켜 표면개질하는 공정;Ii) adding a organosilane represented by the following formula (1) or a hydroxysilane obtained by hydrolysis thereof to the acidified oxide sol to surface-modify the surface of the oxide particles by subjecting it to a silylation reaction;
[상기 식에서, c는 0~3인 정수이고,[Wherein c is an integer of 0 to 3,
R1은 알킬기, 케톤기, 아크릴기, 알릴기, 방향족기, 할로겐기, 아민기, 아미노기, 머캅토기, 에테르기, 에스테르기 또는 에폭시기를 단독 혹은 2종 이상 가지는 직쇄, 측쇄 또는 고리형을 가지는 탄소수 1~10의 화합물이며,R 1 has an alkyl group, a ketone group, an acryl group, an allyl group, an aromatic group, a halogen group, an amine group, an amino group, a mercapto group, an ether group, a straight chain, branched chain, or cyclic group having two or more kinds of an ester group or an epoxy group. It is a compound of 1 to 10 carbon atoms,
R2는 수소, 알콕시기, 케톤기, 할로겐기 또는 아민기를 단독 혹은 2종 이상으로 가지는 탄소수 1~6의 화합물이다.] R <2> is a C1-C6 compound which has a hydrogen, an alkoxy group, a ketone group, a halogen group, or an amine group individually or in 2 or more types.]
ⅲ) 상기 표면개질된 산화물 졸에 유기용매를 첨가한 후 한외여과를 실시하 여 과량의 유기용매, 물, 미반응 오가노실란, 실란간의 축합물 또는 알칼리 이온을 제거하는 공정; 을 포함하는 표면개질 산화물 오가노졸의 제조방법에 관한 것이다. Iv) adding an organic solvent to the surface-modified oxide sol and then performing ultrafiltration to remove excess organic solvent, water, unreacted organosilane, condensate between silanes or alkali ions; It relates to a method for producing a surface-modified oxide organosol comprising a.
본 발명에 적합한 산화물 수성졸 또는 오가노졸의 평균 입경은 5~300nm이며, 바람직하게는 10~200nm의 것을 사용하고, 콜로이달 졸 내에서 산화물의 고형분 농도는 5~50중량%이며, 바람직하게는 5~40중량%의 것을 사용한다. 상기 범위의 평균 입경을 벗어나는 산화물 졸을 사용하면 최종제품인 오가노졸의 산화물 입자의 안정성이 감소하며, 산화물 농도가 50중량%를 초과하면 졸의 점도가 상승하여 회수율이 감소하고, 저장안정성도 좋지 못하다.The average particle diameter of the oxide aqueous sol or organosol suitable for the present invention is 5 to 300 nm, preferably 10 to 200 nm, and the solid content concentration of the oxide in the colloidal sol is 5 to 50% by weight, preferably Use 5-40% by weight. Using an oxide sol outside the average particle diameter of the above range reduces the stability of the oxide particles of the final product organosol, If the concentration exceeds 50% by weight, the viscosity of the sol rises, the recovery rate decreases, and storage stability is also poor.
또한, 상기 i) 공정에서 수성졸을 사용하는 경우 산으로 안정화된 산화물 졸은 그대로 사용하며, 알칼리로 안정화되어 있는 알칼리성 산화물 졸은 산성화 후 사용한다. 알칼리성 산화물 졸을 산성화하기 위해서는 이온교환수지또는 적정화제를 이용하여 pH 7 미만으로 적정한다. 오가노졸을 사용하는 경우에도 pH는 산성범위로 처리하여 사용한다.In addition, when the aqueous sol is used in the i) process, the acid sol stabilized with acid is used as it is, and the alkaline oxide sol stabilized with alkali is used after acidification. In order to acidify an alkaline oxide sol, it is titrated to less than
산화물 졸이 pH가 7 이상이면, 산화물 졸의 가수분해반응이 느리고, 가수분해물이 실리카와 결합하는 양보다 실란끼리의 축합반응이 우세하여 분자량이 큰 축합물이 형성되어 실리카입자의 표면개질에 불충분하다. When the oxide sol has a pH of 7 or more, the hydrolysis reaction of the oxide sol is slow, and the condensation reaction between the silanes is superior to the amount of the hydrolyzate bonded to the silica, so that a condensate having a high molecular weight is formed, which is insufficient for surface modification of the silica particles. Do.
이때 사용되는 양이온교환수지는 수소형 강산성 양이온교환수지를, 음이온교환수지는 수산기형 강염기성 음이온교환수지를 사용하며, 상기 이온교환수지는 이온교환 후의 양이온교환수지는 염산 및 황산으로, 음이온교환수지는 가성소다로써 각각 재생하여 사용할 수 있다.The cation exchange resin used here is a hydrogen type strong acid cation exchange resin, and an anion exchange resin uses a hydroxyl type strong base anion exchange resin. The ion exchange resin after ion exchange is hydrochloric acid and sulfuric acid, and anion exchange resin. Caustic soda can be recycled and used respectively.
그리고, 상기 pH 적정화제는 불포화, 포화 또는 무수 카본산을 사용하며, 이들 카본산의 예로써는, 아세트산, 이타콘산, 말레인산, 포름산, 프로피온산, 무수벤조산, 숙신산, 1,3,5-벤젠트리카본산, 1,2,4,5-벤젠테트라카본산 등을 들 수 있으며, 무수카본산의 예로써는, 무수이타콘산, 무수말레인산. 무수트리메리트산, 무수파이로메리트산, 무수프탈산 등을 들 수 있다.The pH titrant is unsaturated, saturated or carboxylic anhydride. Examples of these carboxylic acids include acetic acid, itaconic acid, maleic acid, formic acid, propionic acid, benzoic anhydride, succinic acid, 1,3,5-benzenetricarbon. Acids, 1,2,4,5-benzenetetracarboxylic acid, and the like, and examples of the anhydrous carbonic acid include itaconic anhydride and maleic anhydride. Trimellitic anhydride, pyromellitic anhydride, a phthalic anhydride etc. are mentioned.
또한, 본 발명은 상기 산화물이 하기 화학식 2로 표시되며,In addition, the present invention is the oxide is represented by the formula (2),
[a, b는 0 이상인 정수; M은 금속][a, b are integers greater than or equal to 0; M is metal]
실리콘산화물, 티탄산화물, 안티몬산화물, 지르코늄산화물, 알루미늄산화물, 세륨산화물, 인듐산화물, 주석산화물, 철산화물 그룹 중에서 1종 또는 2종 이상의 복합산화물인 것을 특징으로 한다.Silicon oxide, titanium oxide, antimony oxide, zirconium oxide, aluminum oxide, cerium oxide, indium oxide, tin oxide, iron oxide group is characterized in that one or two or more complex oxides.
또한, 본 발명은 상기 오가노실란이 메틸트리메톡시실란, 메틸트리에톡시실란, 메틸트리프로폭시실란, 프로필에틸트리메톡시실란, 에틸트리에톡시실란, 비닐트리메톡시실란, 비닐트리에톡시실란, 비닐트리프로폭시실란, 디메틸디메톡시실란, 디메틸디에톡시실란, 비닐메틸디메톡시실란, 비닐메틸디에톡시실란, 페닐트리메톡 시실란, 디페닐에톡시비닐실란, 테트라메톡시실란, 테트라에톡시실란, 테트라프로폭시실란, 테트라부톡시실란, 테트라페녹시실란, 테트라아세톡시실란, N-(3-아크릴옥시-2-하이드록시프로필)-3-아미노프로필트리에톡시실란, N-(3-아크릴옥시-2-하이드록시프로필)-3-아미노프로필트리메톡시실란, N-(3-아크릴옥시-2-하이드록시프로필)-3-아미노프로필트리프로폭시실란, 3-아크릴옥시프로필디메틸메톡시실란, 3-아크릴옥시프로필디메틸에톡시실란, 3-아크릴옥시프로필디메틸프로폭시실란, 3-아크릴옥시프로필메틸비스(트리메틸실록시)실란, 3-아크릴옥시프로필트리메톡시실란, 3-아크릴옥시프로필트리에톡시실란, 3-아크릴옥시프로필트리프로폭시실란, 3-(메트)아크릴옥시프로필트리메톡시실란, 3-(메트)아크릴옥시프로필트리에톡시실란 또는 3-(메트)아크릴옥시프로필트리프로폭시실란, N-(2-아미노에틸-3-아미노프로필)-트리메톡시실란, N-(2-아미노에틸-3-아미노프로필)-트리에톡시실란, 3-아미노프로필트리메톡시실란, 3-아미노프로필트리에톡시실란, 클로로프로필트리메톡시실란, 클로로프로필트리에톡시실란, 트리메톡시시릴프로필디에틸렌트리아민, 3-머캅토프로필트리메톡시실란, 3-머캅토프로필트리에톡시실란, 3-글리시독시프로필트리메톡시실란, 3-글리시독시프로필트리에톡시실란, 3-글리시독시프로필메틸디메톡시실란, 3-글리시독시프로필메틸디에톡시실란, 베타(3,4-에폭시사이클로헥실)에틸트리메톡시실란, 3-글리시독시프로필트리스(메톡시에톡시)실란, 2-(3,4-에폭시사이클로헥실)에틸트리에톡시실란, 3-글리시독시프로필페닐디에톡시실란, 헵타데카플루오르데실트리메톡시실란, 메틸트리클로로실란, 디메틸디클로로실란, 트리메틸클로로실란, 에틸트리클로로실란, 디에틸디클로로실란, 트리에틸클로로실란, 비닐트리클로로실 란, 스테아릴트리클로로실란, 디헥실디클로로실란, 디페닐디클로로실란, 트리페닐클로로실란, n-아밀트리클로로실란, 헥사메틸디실라잔으로 이루어진 그룹 중 선택되는 1종 또는 2종 이상을 사용하는 것을 특징으로 한다.In addition, the present invention, the organosilane is methyltrimethoxysilane, methyltriethoxysilane, methyltripropoxysilane, propylethyltrimethoxysilane, ethyltriethoxysilane, vinyltrimethoxysilane, vinyltri Methoxysilane, vinyltripropoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, vinylmethyldimethoxysilane, vinylmethyldiethoxysilane, phenyltrimethoxysilane, diphenylethoxyvinylsilane, tetramethoxysilane, tetrae Methoxysilane, tetrapropoxysilane, tetrabutoxysilane, tetraphenoxysilane, tetraacetoxysilane, N- (3-acryloxy-2-hydroxypropyl) -3-aminopropyltriethoxysilane, N- ( 3-acryloxy-2-hydroxypropyl) -3-aminopropyltrimethoxysilane, N- (3-acryloxy-2-hydroxypropyl) -3-aminopropyltripropoxysilane, 3-acryloxypropyl Dimethylmethoxysilane, 3-acryloxypropyl Methylethoxysilane, 3-acryloxypropyldimethylpropoxysilane, 3-acryloxypropylmethylbis (trimethylsiloxy) silane, 3-acryloxypropyltrimethoxysilane, 3-acryloxypropyltriethoxysilane, 3 -Acryloxypropyltripropoxysilane, 3- (meth) acryloxypropyltrimethoxysilane, 3- (meth) acryloxypropyltriethoxysilane or 3- (meth) acryloxypropyltripropoxysilane, N- (2-aminoethyl-3-aminopropyl) -trimethoxysilane, N- (2-aminoethyl-3-aminopropyl) -triethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltri Ethoxysilane, chloropropyltrimethoxysilane, chloropropyltriethoxysilane, trimethoxysilylpropyldiethylenetriamine, 3-mercaptopropyltrimethoxysilane, 3-mercaptopropyltriethoxysilane, 3- Glycidoxypropyltrimethoxysilane, 3-glycidoxypropyl Ethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, beta (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-glycidoxypropyltris ( Methoxyethoxy) silane, 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane, 3-glycidoxypropylphenyldiethoxysilane, heptadecafluorodecyltrimethoxysilane, methyltrichlorosilane, dimethyl Dichlorosilane, trimethylchlorosilane, ethyltrichlorosilane, diethyldichlorosilane, triethylchlorosilane, vinyltrichlorosilane, stearyltrichlorosilane, dihexyldichlorosilane, diphenyldichlorosilane, triphenylchlorosilane, n It is characterized by using 1 type (s) or 2 or more types chosen from the group which consists of amyl trichlorosilane and hexamethyldisilazane.
또한, 본 발명은 상기 시릴화 반응이 산화물 졸에 함유된 산화물 입자의 표면적 100,000㎡당 오가노실란을 0.01~4몰 첨가하고, 0~100℃에서 반응하는 것을 특징으로 한다.In addition, the present invention is characterized in that the cylylation reaction adds 0.01 to 4 moles of organosilane per 100,000
또한, 본 발명은 상기 iii) 공정의 유기용매는 메탄올, 에탄올, 프로판올을 포함하는 알코올류, 디메틸에테르를 포함하는 에테르류, 아세톤, 메틸에틸케톤을 포함하는 케톤류, 에틸아세테이트를 포함하는 에스테르류 또는 2-에톡시에탄올을 포함하는 셀로솔브류인 것을 특징으로 한다.In addition, the present invention is an organic solvent of the step iii) the alcohol containing methanol, ethanol, propanol, ethers containing dimethyl ether, acetone, ketones containing methyl ethyl ketone, esters containing ethyl acetate or It is characterized by the cellosolves containing 2-ethoxy ethanol.
또한, 본 발명은 상기 iii) 공정은 한외여과막의 분획분자량이 300,000이하인 것을 특징으로 한다.In addition, the present invention is characterized in that the fractional molecular weight of the ultrafiltration membrane is less than 300,000 in the step iii).
뿐만 아니라, 본 발명은 상기 iii) 공정의 한외여과막의 재질은 폴리술폰, 폴리아크릴로니트릴, 폴리아미드, 폴리에테르술폰, 아세틸셀룰로오스, 니트로셀룰로오스, 셀룰로오스를 포함하는 유기재료, SiO2/Al2O3를 포함하는 세라믹재료 및 그라파이트/Al2O3을 포함하는 그라파이트 재료로 구성된 그룹 중 선택되는 1종 이상인 것을 특징으로 한다.In addition, the present invention, the material of the ultrafiltration membrane of step iii) is polysulfone, polyacrylonitrile, polyamide, polyethersulfone, acetyl cellulose, nitrocellulose, organic material containing cellulose, SiO 2 / Al 2 O And at least one member selected from the group consisting of a ceramic material containing 3 and a graphite material containing graphite / Al 2 O 3 .
나아가, 본 발명은 상기 iii) 공정은 한외여과 조작시 압력이 2~10kgf/㎠ 범위인 것을 특징으로 한다.Furthermore, the present invention is characterized in that the pressure in the step iii) the ultrafiltration operation is in the range of 2 ~ 10kgf / ㎠.
상기 한외여과막의 형상은 특별히 제한되지는 않으나, 바람직하게는 평막, 관상막, 중공사막, 스파이랄막 등이 이용될 수 있다. 한외여과장치의 운전시에는 여과막에 압력이 걸리도록 조작하는데, 그 압력은 2~10kgf/㎠ 범위이면 적당하고, 조작시에 과다한 압력으로 운전을 실시하면 여과막 표면에 산화물 입자의 침적이 발생할 수 있으므로, 경제적으로 적절하게 실행가능한 투과류가 발생하는 압력 이상으로는 조작하지 않는 것이 바람직하다.The shape of the ultrafiltration membrane is not particularly limited, but preferably, a flat membrane, a tubular membrane, a hollow fiber membrane, a spiral membrane, or the like may be used. When operating the ultrafiltration device, the pressure is applied to the filtration membrane. The pressure is in the range of 2 to 10 kgf /
본 발명의 한외여과 공정은 산화물졸과 오가노실란의 반응물에 유기용매를 혼합한 후 다시 농축하는 공정이며, 이 과정 중에 한외여과막의 미세한 기공을 통하여 수분, 유기용매 및 미반응 실란이 빠져나오며 제거된다. 이때 유기용매는 쉽게 휘발되므로 저온이나, 밀폐상태에서 실시할 수 있다. 또한, 반응물과 유기용매를 먼저 혼합한 후 한외여과 공정을 실시하여도 되고, 적하시스템을 구비하여 유기용매를 연속적으로 첨가하며 한외여과 공정을 실시하여도 된다.The ultrafiltration process of the present invention is a step of concentrating again after mixing an organic solvent with a reaction product of an oxide sol and an organosilane, and during this process, water, organic solvent, and unreacted silane are removed through fine pores of the ultrafiltration membrane. do. At this time, since the organic solvent is easily volatilized, it can be carried out at low temperature or in a sealed state. The reactant and the organic solvent may be mixed first, followed by an ultrafiltration step, or may be equipped with a dropping system to continuously add the organic solvent and then perform the ultrafiltration step.
본 발명에 의한 표면개질 산화물 오가노졸을 제조하기 위해서, 금속산화물 콜로이드 입자를 함유하는 산화물 수성졸 또는 오가노졸을 pH 7 미만으로 산성화시킨 후 오가노실란을 금속산화물 졸 내에 함유되어 있는 산화물입자의 표면적 100,000m2당 0.01~4몰중량, 바람직하게는 0.03~2몰중량을 첨가하여 반응시키면 산화물입자표면이 오가노실란으로 시릴화처리된 표면개질 산화물졸을 얻을 수 있다. 오가노실란이 0.01몰 중량보다 적으면 산화물입자 표면의 시릴화처리가 완전하지 못 하여 적용상의 한계가 있고, 4몰보다 많으면 산화물입자 표면의 시릴화처리는 완전하지만, 반응 후 잔존하는 미반응실란 및 실란의 축합물은 한외여과 공정시에 여과되어 빠져나오므로 경제적이지 못하며, 오가노실란의 축합물은 분자량이 크고 점도를 상승시키는 요인이 되므로 공정시간이 증가하게 되는 문제가 발생한다.In order to prepare the surface modified oxide organosol according to the present invention, the surface area of the oxide particles containing the organosilane in the metal oxide sol after acidifying the oxide aqueous sol or organosol containing the metal oxide colloid particles to less than
금속산화물입자의 표면을 오가노실란으로 시릴화 처리하는 반응온도는 0~100℃의 범위에서 실시하며, 바람직하게는 20~80℃의 범위에서 반응을 유발한다. 0℃ 이하의 온도에서는 산화물졸의 입자표면과 오가노실란의 결합반응이 유발되는 데에 불충분하며, 100℃ 이상의 온도에서는 산화물 입자끼리의 충돌과 결합이 발생하여 입자가 변형되거나, 균일하고 안정적인 졸을 얻는 데에 바람직하지 않다. 또한, 반응온도와 반응시간은 반비례하는 관계가 있으므로 경제적으로 유리한 조건의 온도와 시간으로 표면개질 반응을 실시한다. 이렇게 제조된 산화물 졸에는 표면이 오가노실란으로 시릴화처리된 산화물입자 뿐만 아니라, 미반응 오가노실란 및 실란끼리의 축합물도 존재하고 있다.The reaction temperature in which the surface of the metal oxide particles is silylated with organosilane is carried out in the range of 0 to 100 ° C, preferably causing a reaction in the range of 20 to 80 ° C. At temperatures below 0 ° C, the surface reaction of the particles of the oxide sol and organosilanes is insufficient to induce reactions.At temperatures above 100 ° C, collisions and bonds between the oxide particles occur and the particles are deformed or uniform and stable. It is not desirable to obtain. In addition, since the reaction temperature and the reaction time are inversely related, the surface modification reaction is carried out at an economically favorable temperature and time. In the oxide sol thus prepared, not only the oxide particles whose surface is silylated with organosilane, but also condensates of unreacted organosilane and silane are present.
상기 시릴화 반응에 의해 획득된 산화물 입자표면이 오가노실란으로 시릴화처리된 표면개질 산화물 졸은 교반기, 펌프, 여과멤브레인, 압력계 등으로 구성된 한외여과장치에 의해 미반응 오가노실란 및 실란축합물, 수분 등이 제거되어 오가노졸화된다.The surface-modified oxide sol in which the surface of the oxide particles obtained by the silylation reaction is silylated with organosilane is unreacted organosilane and silane condensate by an ultrafiltration device composed of a stirrer, a pump, a filter membrane, a pressure gauge, and the like. , Moisture and the like are removed to form an organosol.
또한, 알칼리로 안정화되어 있는 수성졸을 출발원료로 사용한 경우에는 안정화제로 함유되어 있는 알칼리 이온들이 한외여과 공정 중에 멤브레인의 기공을 통해 빠져나오게 되어 순도 높은 표면개질 산화물 오가노졸이 제조된다. 한외여과 공 정은 유기용매를 첨가하고 한외여과를 실시하는 공정을 수차례 반복하므로, 희석과 농축의 과정이 반복되기 때문에, 수성졸을 유기용매에 분산된 오가노졸로 치환하는 것도 가능하며, 유기용매에 분산되어 있는 오가노졸을 원래의 용매와는 다른 유기용매로 치환하는 것도 가능하고, 희석과 농축하는 과정을 반복하는 횟수를 더할수록 더욱 순도 높은 졸을 제조하는 것이 가능하다.In addition, when the aqueous sol stabilized with alkali is used as a starting material, alkali ions contained as stabilizers are released through the pores of the membrane during the ultrafiltration process, thereby producing a highly purified surface modified oxide organosol. The ultrafiltration process repeats the process of adding an organic solvent and performing ultrafiltration several times. Since the dilution and concentration process are repeated, it is also possible to replace the aqueous sol with the organosol dispersed in the organic solvent. It is also possible to substitute the organosol dispersed in the organic solvent different from the original solvent, and the higher the number of times the dilution and concentration process is repeated, the more highly sol can be produced.
또한, 농축과정 시에 운전을 지속하여 오가노졸의 농도를 높이는 것도 가능하지만 과다한 농축은 산화물졸의 안정성을 저해하는 요인이 되므로 고형분 함량이 50중량% 이하로 농축하도록 한다. 최종제품인 표면개질 산화물 오가노졸을 회수한 후에는 여과멤브레인의 수명 및 여과운전시 여과 및 투과하는 산화물졸의 효율성을 증대하기 위하여 역세를 실시하여 깨끗이 세척한다. 역세는 용매가 투과되어 나오는 방향의 역방향으로 용매를 투입하여 멤브레인의 공공이나 기벽에 부착되어 있을 수 있는 산화물 입자들을 탈착시키는 작용을 한다.In addition, it is also possible to increase the concentration of the organosol by continuing the operation during the concentration process, but the excessive concentration to the concentration of the solid content to 50% by weight or less because it is a factor that inhibits the stability of the oxide sol. After recovering the surface-modified oxide organosol, the final product, backwashing is performed to increase the life of the filter membrane and the efficiency of the filtration and permeating oxide sol during the filtration operation. Backwashing acts to desorb the oxide particles that may be attached to the pores or wall of the membrane by introducing the solvent in the direction opposite to the direction through which the solvent is permeated.
다음의 실시예와 비교예에 의해서 본 발명을 구체적으로 설명한다. 그러나, 본 발명의 범위가 실시예의 기재에 한정되는 것은 아니다.The present invention will be specifically described by the following examples and comparative examples. However, the scope of the present invention is not limited to the description of the examples.
[실시예 1]Example 1
공지의 방법으로 제조되거나, 시판되고 있는 알칼리성 수성 실리카졸(SiO2함량 30wt.%, Na2O함량 0.4wt.%, pH 9.7, 입자경 15nm, 비표면적 250m2/gr) 1,330gr을 잘 교반하면서 아세트산 120gr을 첨가하여 pH 4.2로 적정한 후, 3-글리시독시프로필트리메톡시실란 354.5gr(1.5몰 중량)을 첨가하고, 이 혼합물을 60℃에서 7시간 반응하여 실리카입자 표면을 시릴화 처리하였다. 이 반응물에 에탄올 1,800ml를 첨가하고 교반하여 완전히 혼합한 후, 한외여과막(분획분자량 100,000)을 이용하여 압력 2kgf/㎠으로 여과하였다. 투과액이 1,800ml가 되었을때 운전을 중지하고, 에탄올 1,800ml를 상기 반응물에 첨가하고 완전히 혼합한 후 다시 여과하는 공정을 6회 더 반복하여 입자표면이 에폭시기로 표면개질된 실리카 오가노졸을 수득하였다. Alkaline aqueous silica sol (SiO 2 content 30wt.%, Na 2 O content 0.4wt.%, PH 9.7, particle size 15nm, specific surface area 250m 2 / gr) prepared by a known method or commercially available, while stirring 1,330gr well After adding 120 gr of acetic acid and titrating to pH 4.2, 354.5 gr (1.5 mole weight) of 3-glycidoxypropyltrimethoxysilane was added, and the mixture was reacted at 60 DEG C for 7 hours to cyrilize the silica particle surface. . 1800 ml of ethanol was added to the reaction mixture, and the mixture was stirred and mixed thoroughly. When the permeate reached 1,800 ml, the operation was stopped, and 1,800 ml of ethanol was added to the reaction mixture, mixed thoroughly, and filtered again six times to obtain silica organosol having the surface of the surface modified with an epoxy group. .
이 표면개질 실리카 오가노졸 내의 수분함량을 칼피셔법으로 측정한 결과 0.8중량%였고, 원자흡광법을 이용하여 Na 함량을 측정한 결과 85ppm이었으며, 브룩필드 DV-E 점도계(BROOKFIELD DV-E VISCOMETER)로 20℃에서 측정한 점도는 3.2cPs였다. The water content in the surface-modified silica organosol was 0.8% by weight using the Karl Fischer method, and the Na content was determined by atomic absorption method at 85 ppm. The Brookfield DV-E Viscometer (BROOKFIELD DV-E VISCOMETER) The viscosity measured at 20 ° C. was 3.2 cPs.
[실시예 2]Example 2
시판의 안티몬산화물 오가노졸(Sb2O5함량 30wt.%, 메탄올분산형, pH8, 입자경 10nm, 비표면적 300m2/gr) 1,110gr을 잘 교반하면서 무수말레인산 33gr을 첨가하여 pH 3.5로 적정한 후, 3-메타크릴옥시프로필트리메톡시실란 198.7gr (0.8몰 중량)을 첨가하고, 이 혼합물을 20℃에서 4시간 교반하고, 12시간 숙성처리하여 안티몬산화물 입자표면을 시릴화 처리하였다. 이 반응물에 메탄올 1,300ml를 첨가하고 교반하여 완전히 혼합한 후, 한외여과막(분획분자량 100,000)을 이용하여 압력 2kgf/㎠으로 여과하였다. 투과액이 1,300ml가 되었을때 운전을 중지하고, 메탄올 1,300ml를 상기 반응물에 첨가하고 완전히 혼합한 후 다시 여과하는 공정을 1회 더 반복하여, 입자표면이 메타크릴기로 표면개질된 안티몬산화물 오가노졸을 수득하였다. 브룩필드 DV-E 점도계(BROOKFIELD DV-E VISCOMETER)로 20℃에서 측정한 점도는 4.1cPs였다. A commercially available antimony oxide organosol (Sb 2 O 5 content 30wt.%, Methanol dispersion type,
[비교예 1]Comparative Example 1
시릴화 처리시에 첨가되는 3-글리시독시프로필트리메톡시실란의 양이 0.01몰 중량인 것을 제외하고는, 실시예 1과 같은 방법으로 실리카 오가노졸을 제조하였다. Silica organosol was prepared in the same manner as in Example 1, except that the amount of 3-glycidoxypropyltrimethoxysilane added in the cylylation treatment was 0.01 molar weight.
이 실리카 오가노졸 내의 수분함량을 칼피셔법으로 측정한 결과 0.9중량%였고, 원자흡광법을 이용하여 Na함량을 측정한 결과 87ppm이었으며, 브룩필드 DV-E 점도계(BROOKFIELD DV-E VISCOMETER)로 20℃에서 측정한 점도는 2.6cPs였다.Moisture content in the silica organosol was 0.9% by weight using Karl Fischer's method, Na content was measured by atomic absorption method, and 87ppm. 20 was determined by Brookfield DV-E Viscometer (BROOKFIELD DV-E VISCOMETER). The viscosity measured at ° C was 2.6 cPs.
[비교예 2]Comparative Example 2
공지의 방법으로 제조되거나, 시판되고 있는 알칼리성 수성 실리카졸(SiO2함량 30wt.%, Na2O함량 0.4wt.%, pH 9.7, 입자경 10~20nm) 2,000ml를 수소형 강산성 양이온교환수지가 채워져 있는 이온교환수지칼럼에 통액하고, 다음에 수산기형 강염기성 음이온교환수지가 채워져 있는 이온교환수지칼럼에 통액하였다. 이온교환을 실시하여 획득한 pH 2.6의 실리카졸에 시약급 질산 20.8gr을 첨가하여 pH 1.2로 조정하고, 상온에서 36시간 숙성한 후, 상기 양이온교환수지와 음이온교환수지를 각 각 1회 더 통액하고, 최종적으로 양이온교환수지를 1회 더 통액하였다. 이상과 같이 이온교환을 실시한 수성 실리카졸 1,500ml에 메탄올 1,500ml를 첨가하고 교반하여 완전히 혼합한 후, 한외여과막(분획분자량 100,000)을 이용하여 압력 2kgf/㎠으로 여과탈수를 실시하였다. 투과액이 1,500ml가 되면 운전을 중지하고, 메탄올 1,500ml를 상기 실리카졸에 첨가하고 완전히 혼합한 후 다시 여과탈수를 실시하였다. 이러한 조작을 7회 반복하여 메탄올에 분산된 실리카 오가노졸을 획득하였다. 이 실리카 오가노졸 내의 수분함량을 칼피셔법으로 측정한 결과 0.9중량%였고, 원자흡광법을 이용하여 Na함량을 측정한 결과 75ppm이었으며, 브룩필드 DV-E 점도계(BROOKFIELD DV-E VISCOMETER)로 20℃에서 측정한 점도는 2.4cPs였다.2,000 ml of an alkaline aqueous silica sol (SiO 2 content 30wt.%, Na 2 O content 0.4wt.%, PH 9.7, particle size 10-20nm) prepared by a known method or commercially available is filled with a hydrogen type strong acid cation exchange resin. The solution was passed through an ion exchange resin column, and then into an ion exchange resin column filled with a hydroxyl type strong base anion exchange resin. After adding 20.8 gr of reagent-grade nitric acid to the silica sol obtained by ion exchange, adjusted to pH 1.2, and aged at room temperature for 36 hours, the cation exchange resin and the anion exchange resin were passed through once more. Finally, the cation exchange resin was further passed through once more. 1,500 ml of methanol was added to 1,500 ml of the aqueous silica sol subjected to the ion exchange as described above, and the mixture was stirred and mixed thoroughly, followed by filtration and dehydration at a pressure of 2 kgf /
[비교예 3]Comparative Example 3
한외여과에 의해 미반응 오가노실란 및 실란 축합물을 여과시켜 제거하는 공정을 실시하지 않는 것 이외에는 실시예 2와 같은 방법으로 표면개질 안티몬산화물 오가노졸을 제조하였다. 브룩필드 DV-E 점도계(BROOKFIELD DV-E VISCOMETER)로 20℃에서 측정한 점도는 5.8cPs였다.A surface-modified antimony oxide organosol was prepared in the same manner as in Example 2 except that the unreacted organosilane and silane condensate were not removed by ultrafiltration. The viscosity measured at 20 ° C. with a Brookfield DV-E VISCOMETER was 5.8 cPs.
본 발명의 실시예 1 및 2, 비교예 1 내지 3에 의해 제조된 표면개질 산화물 오가노졸의 효과를 검증하기 위해 다음과 같이 유기물의 첨가제로써 적용하여 보았다.In order to verify the effect of the surface modified oxide organosol prepared by Examples 1 and 2, Comparative Examples 1 to 3 of the present invention was applied as an additive of the organic matter as follows.
[제조예 1][Production Example 1]
에폭시당량 180~190의 페놀노볼락에폭시수지 500gr 및 반응성 희석제로써 2- 에틸헥실비닐에테르 200gr, 중합개시제로 SbF6계 방향족 술폰염 20gr, 희석용매로 톨루엔 700㎖을 혼합하여 감광성 에폭시 코팅도료를 제조한 후, 실시예 1에 의해 제조된 표면개질 실리카 오가노졸 800gr을 첨가하여 유기무기 복합 코팅도료를 제조하였다. 코팅도료의 분산안정성 및 저장안정성을 관찰한 결과를 표 1 및 도 1에 기재하였다.A photosensitive epoxy coating was prepared by mixing 500 g of a phenol novolac epoxy resin with an epoxy equivalent of 180 to 190, 200 g of 2-ethylhexyl vinyl ether as a reactive diluent, 20 gr of SbF6-based aromatic sulfone salt as a polymerization initiator, and 700 ml of toluene as a diluting solvent. Thereafter, 800 g of the surface-modified silica organosol prepared in Example 1 was added to prepare an organic-inorganic composite coating paint. The results of observing the dispersion stability and storage stability of the coating paints are shown in Table 1 and FIG. 1.
[제조예 2][Production Example 2]
첨가하는 실리카 오가노졸을 비교예 1에 의해 제조된 것을 사용하는 것을 제외하고는 제조예 1과 같은 방법으로 코팅도료를 제조하였다. 코팅도료의 분산안정성 및 저장안정성을 관찰한 결과를 표1 및 도1에 기재하였다.A coating material was prepared in the same manner as in Preparation Example 1, except that silica organosol to be added was prepared according to Comparative Example 1. The results of observing the dispersion stability and the storage stability of the coating coating are shown in Table 1 and FIG.
[제조예 3][Manufacture example 3]
첨가하는 실리카 오가노졸을 비교예 2에 의해 제조된 것을 사용하는 것을 제외하고는 제조예 1과 같은 방법으로 코팅도료를 제조하였다. 코팅도료의 분산안정성 및 저장안정성을 관찰한 결과를 표1 및 도1에 기재하였다.A coating paint was prepared in the same manner as in Preparation Example 1, except that the silica organosol to be added was prepared according to Comparative Example 2. The results of observing the dispersion stability and the storage stability of the coating coating are shown in Table 1 and FIG.
[제조예 4][Production Example 4]
시판의 우레탄아크릴레이트올리고머(미원상사(주), MIRAMER PU-610) 500gr 및 아클릴레이트 모노머로써 디펜타에리스리톨헥사아크릴레이트 300gr, 1,6-헥산디올디아크릴레이트 200gr, 광중합개시제로써 1-하이드록시-시클로헥실-페닐케톤 40gr, 희석용매로써 메틸에틸케톤 1,000gr을 혼합하여 UV경화형 코팅도료를 제조한 후, 실시예 2에 의해 제조된 표면개질 안티몬산화물 오가노졸 1,500gr을 첨가하여 유기무기복합 코팅도료를 제조하였다. 이 코팅도료를 두께 8mm의 PMMA아크릴판에 #08 메이어바를 이용하여 바코팅으로 도포한 후, 열풍건조기에 의해 70℃에서 30초 건조후, 공기중에서 고압수은램프로 800mJ/cm2 노광하여 두께 7㎛의 코팅막을 얻었다. 코팅도료 및 코팅도막의 물성평가를 실시한 결과를 표 2 및 도 2에 기재하였다.Commercial urethane acrylate oligomer (Miwon Co., Ltd., MIRAMER PU-610) 500 gr and dipentaerythritol hexaacrylate 300 gr as an acrylate monomer, 1,6-hexanediol diacrylate 200 gr, 1-hydroxy as a photoinitiator Roxy-cyclohexyl-phenyl ketone 40gr, methyl ethyl ketone 1,000gr as a dilution solvent was mixed to prepare a UV-curable coating paint, and then the surface-modified antimony oxide organosol 1,500gr prepared in Example 2 was added to the organic inorganic compound Coating paints were prepared. The coating was applied to a PMMA acrylic plate with a thickness of 8 mm by bar coating using a # 08 Mayer bar, dried at 70 ° C. for 30 seconds using a hot air dryer, and then exposed to a high pressure mercury lamp in the air at 800 mJ / cm 2 for thickness 7 A coating film of μm was obtained. Table 2 and FIG. 2 show the results of evaluating the properties of the coating and coating films.
[제조예 5]Production Example 5
첨가하는 안티몬산화물 오가노졸을 비교예 3에 의해 제조된 것을 사용하는 것을 제외하고는 제조예 4와 같은 방법으로 코팅도료 및 코팅도막을 얻었다. 코팅도료 및 코팅도막의 물성평가를 실시한 결과를 표 2 및 도 2에 기재하였다.A coating paint and a coating film were obtained in the same manner as in Preparation Example 4, except that the antimony oxide organosol to be added was prepared according to Comparative Example 3. Table 2 and FIG. 2 show the results of evaluating the properties of the coating and coating films.
[제조예 6][Manufacture example 6]
첨가하는 안티몬산화물 오가노졸을 표면개질되지 않은 상태의 것을 사용하는 것을 제외하고는 제조예 4와 같은 방법으로 코팅도료 및 코팅도막을 얻었다. 코팅도료 및 코팅도막의 물성평가를 실시한 결과를 표 2 및 도 2에 기재하였다.A coating paint and a coating film were obtained in the same manner as in Preparation Example 4, except that the antimony oxide organosol to be added was used without a surface modified state. Table 2 and FIG. 2 show the results of evaluating the properties of the coating and coating films.
1. 분산안정성 : 유기물 코팅도료에 산화물 오가노졸을 첨가 후 외관의 변화를 육안으로 관찰하여 투명하게 분산되는지, 뿌옇게 변화하는지를 평가하였다.1. Dispersion stability: After adding oxide organosol to organic coating, the change of appearance was visually observed to evaluate whether it was transparent or cloudy.
O : 층분리나 변색이 발생하지 않고 투명하게 분산되어 상용성이 우수한 것O: Excellent compatibility with transparent dispersion without layer separation or discoloration
△ : 투명하게 분산되지만, 점도의 상승이 있는 것(Triangle | delta): Although it disperse | distributes transparently, what has a raise of a viscosity
X : 도료가 뿌옇게 변하여 상용성이 좋지 않은 것X: The paint becomes cloudy and the compatibility is not good
2. 저장안정성 : 최종 유기무기 코팅도료의 시간의 경과에 따른 점도변화를 브룩필드 DV-E 점도계(BROOKFIELD DV-E VISCOMETER)로 20℃에서 측정하였다. 7일간의 점도변화를 측정후 저장안정성을 판단하였다.2. Storage stability: Viscosity change over time of the final organic inorganic coating paint was measured at 20 ℃ with a Brookfield DV-E viscometer (BROOKFIELD DV-E VISCOMETER). The storage stability was determined after measuring the viscosity change of 7 days.
O : 점도변화가 초기값의 10%내에 해당하는 것O: viscosity change falls within 10% of initial value
△ : 점도변화가 초기값의 20%내에 해당하는 것△: viscosity change falls within 20% of initial value
X : 점도변화가 초기값의 10%이상 증가한 것X: Viscosity change increased more than 10% of initial value
3. 코팅도막의 물성 평가3. Evaluation of physical properties of coating film
3-1. 내마모성 : PMMA판에 코팅된 코팅도막의 테이버 마모도를 ASTM D1044에 따라 수행하였다. 실온에서 CS-10F휠로 50gr 무게하에서 500회 돌려 마모된 시편을 Haze gard plus(BYK gardner Co.)로 관찰하여 Haze를 측정하였다.3-1. Abrasion resistance: Taber wear of the coating film coated on the PMMA plate was performed according to ASTM D1044. Haze was measured by observing worn specimens with Haze gard plus (BYK gardner Co.) at room temperature for 500 turns with a CS-10F wheel at 50 gr weight.
3-2. 내화학성(알칼리성 및 산성) : 내알칼리성은, 상온의 5% NaOH 수용액에 코팅된 PMMA판을 12시간 침적한 후 코팅도막의 변화를 육안으로 관찰하였다. 내산성은, 상온의 10% 황산수용액에 코팅된 PMMA판을 12시간 침적한 후 코팅도막의 변화를 육안으로 관찰하였다.3-2. Chemical resistance (alkali and acidic): The alkali resistance was observed by visually changing the coating film after immersing a PMMA plate coated in a 5% NaOH aqueous solution at room temperature for 12 hours. Acid resistance was observed after visually immersing the PMMA plate coated with 10% sulfuric acid aqueous solution at room temperature for 12 hours.
O : 코팅도막의 외관상 변화가 없는 것O: No change in appearance of coating film
△ : 코팅도막에 미세한 점들이 발생하는 것(Triangle | delta): Fine points generate | occur | produce in a coating film
X : 코팅도막이 벗겨지는 현상이 발생하는 것X: The phenomenon that the coating film peels off occurs.
3-3. 내후성 : 코팅도막을 촉진내후성테스터(QUV, Q-PANEL사)를 이용하여 50℃에서 100시간동안 코팅도막에 15MJ의 UV에너지를 조사한 후 코팅도막의 외관을 육안으로 관찰하였다.3-3. Weatherability: The coating film was accelerated by using a weathering tester (QUV, Q-PANEL) at 50 ° C. for 100 hours at 15MJ UV energy irradiation, and then the appearance of the coating film was visually observed.
O : 코팅도막의 외관상 변화가 없는 것O: No change in appearance of coating film
△ : 코팅도막에 미세한 점들이 발생하는 것(Triangle | delta): Fine points generate | occur | produce in a coating film
X : 코팅도막에 크랙이 발생하는 것X: Cracking in Coating Coating Film
이상에서 설명한 바와 같이 본 발명에 의해 제조된 표면개질 산화물 오가노졸은 입자표면이 반응성 또는 비반응성 관능기로 표면개질 처리가 되어있으며, 또한 다양한 분야에 적용하는 데에 제한을 가져왔던 미반응 물질이나 자체축합물의 잔존을 제거함으로 인해서, 극성이 상이한 각종 유기용매 및 유기수지 등과의 혼용성 및 분산안정성, 저장안정성이 뛰어나고, 유기물만으로는 구현하기 어려운 기계적, 물리적, 열적인 특성 부분에서 탁월한 개선효과를 얻을 수 있는 장점이 있어서, 다양한 산업분야에 광범위하게 적용할 수 있다.As described above, the surface-modified oxide organosol prepared by the present invention has an unreacted substance or surface which has a surface modified with reactive or non-reactive functional groups, and which has limited application to various fields. By removing the remaining condensate, it is excellent in compatibility with various organic solvents and organic resins with different polarity, dispersion stability, storage stability, and mechanical, physical and thermal characteristics which are difficult to realize only with organic materials. There is an advantage, it can be applied to a wide range of industries.
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