KR100524470B1 - Reaction Apparatus - Google Patents

Abstract

The present invention relates to a reaction apparatus having a reaction chamber, the reaction apparatus comprising: an upper chamber block; A lower chamber block; And at least one intermediate chamber interposed between the upper chamber block and the lower chamber block to form the reaction chamber together with the upper chamber block and the lower chamber block. Thereby, the reaction apparatus which can adjust the height of a reaction chamber according to a process characteristic is provided.

Description

Reactor Apparatus {Reaction Apparatus}

The present invention relates to a reactor, and more particularly, to a reactor that can adjust the height of the reaction chamber according to the process characteristics.

In general, the reaction apparatus used in the semiconductor process, the reaction is often performed in a vacuum state, hereinafter will be described by taking an example of the reaction apparatus in which the reaction is performed in a vacuum state.

1 is a schematic view showing a reactor according to the prior art. As shown in the figure, a body 100 having a reaction chamber 190 formed thereon, a gas supply unit 200 provided at an upper portion of the body 100, and an object to be reacted provided at an inner lower portion of the reaction chamber 190. (Not shown) has a support 300 and a gas outlet 500 for discharging the gas after the reaction. Process gas is discharged through a gas outlet 500 communicating with a pump (not shown) provided outside the reactor, and a gas outlet is formed at one lower side of the reaction chamber 190. Meanwhile, the main body 100 and the cover 400 form a sealed space by a sealing member (not shown) so that a vacuum may be formed in the reaction chamber 190.

Referring to the operation of the reactor of the above-described configuration is as follows. When the reaction process starts, the process gas is supplied from the gas supply hole 210 provided in the gas supply unit 200 provided in the upper side of the reaction apparatus to react in the reaction chamber 190. Subsequently, the process gas is discharged through the gas outlet 500 inside the reaction chamber 190. To this end, the gas outlet is provided at one side of the lower portion of the reaction chamber 190.

In the gas flow in the reaction chamber 190, a uniform layer for maintaining a uniform flow is formed from the upper side of the reaction chamber 190 to a predetermined section, but the buffering section in which the uniform flow is broken by the gas discharge pump as it descends downward ("B") is generated. The height at which the buffering section "B" starts is different depending on the type of process gas, the capacity of the gas discharge pump, and the height of the reaction chamber 190. In general, the object to be reacted is located in a section where a uniform flow of the above-described process gas is formed.

Here, the section in which the uniform layer is formed according to the process gas and the discharge pump is different, and the reactor having the reaction chamber 190 having a constant height realizes an optimized height corresponding to the buffering section ("B") that varies depending on the process. There is a problem that is difficult to do.

Accordingly, an object of the present invention is to solve such a conventional problem, and to provide a reactor capable of adjusting the height of the reaction chamber according to process characteristics.

The object is according to the present invention, a reaction apparatus having a reaction chamber, the reaction apparatus comprising: an upper chamber block; A lower chamber block; And at least one intermediate chamber interposed between the upper chamber block and the lower chamber block to form the reaction chamber together with the upper chamber block and the lower chamber block.

Here, the reactor may further include a sealing member interposed between the chamber blocks to prevent the gas from leaking between the chamber blocks. In addition, it is preferable that each of the chamber blocks is coupled by screw fastening so as to pursue simplicity in assembling and disassembling.

Prior to the description, in the various embodiments, components having the same configuration will be representatively described in the first embodiment using the same reference numerals, and in other embodiments, different configurations from the first embodiment will be described. Do.

Hereinafter, exemplary embodiments of the present invention will be described with reference to the accompanying drawings.

Figure 2 is a perspective view showing a coupling state of the reaction apparatus according to the present invention, Figure 3 is an exploded perspective view of the reaction apparatus according to FIG. 4 is a cross-sectional view illustrating a cross section in the IV-IV direction of FIG. 2. As shown in the figure, the reactor includes an upper chamber block 11 and a lower chamber block 12, and an intermediate chamber block 13 interposed between the upper chamber block 11 and the lower chamber block 12 together. A reaction chamber 19 to be formed, a gas supply unit 20 provided above the upper chamber block 11 to form an upper region of the reaction chamber 19, and a reaction chamber 19 provided above the gas supply unit 20. ), A lid 40 to open and close the lid, a support part 30 provided in the reaction chamber 19 to support an object to be processed (not shown), and a gas outlet 50 provided inside the reaction chamber 19 under the reaction chamber 19.

Each chamber block 10 is coupled to each other to form a reaction chamber 19. At least one sealing member 17 is interposed between the chamber blocks 10 to prevent the reaction gas of the reaction chamber 19 from leaking to the outside and to form a vacuum. In addition, the chamber block 10 is screwed together to facilitate fastening and disassembly. On the other hand, by providing an intermediate chamber block 13 of various heights it is possible to adjust the height of the reaction chamber.

Inside the chamber block 10 is provided with a through hole opened up and down to form the reaction chamber 19, the upper and lower surfaces a plurality of fastening holes 16 and the sealing member to be coupled to the other chamber block (10) An accommodation groove 17a that can accommodate 17 is provided.

The gas supply unit 20 is provided above the reaction chamber 19, and is interposed between the upper chamber block 11 and the cover 40. Here, the gas supply unit 20 has a through hole formed together with the chamber block 10 to form a region of the reaction chamber 19. The gas supply hole 21 is formed in the inner wall of the through hole to supply gas to the reaction chamber 19. In addition, the gas supply unit 20 has a receiving groove (not shown) that can accommodate a plurality of fastening holes (not shown) and the sealing member 17 to be coupled to the chamber block 10 in the chamber block 10. It is provided on the opposite side, the other side is provided with a coupling device to be coupled to the cover 40 of the reactor.

The lower part of the reaction chamber 19 is provided with the support part 30 which supports the to-be-processed object (not shown) which a reaction generate | occur | produces. The support part 30 forms an electrode in the reaction chamber 19, and maintains the horizontal and fixed position of the object to be processed.

The sealing member 17 is interposed between the chamber blocks 10 to prevent gas leakage from the reaction chamber 19 and to seal the reaction chamber 19 so that a vacuum can be formed. It is preferable that at least one sealing member 17 is interposed.

The gas outlet 50 is formed at one side of the lower chamber block 12 of the reaction chamber 19. That is, the gas outlet 50 is provided downward at one lower side of the lower chamber block 12, and is in communication with a gas discharge pump (not shown) provided outside the reactor.

Referring to the operation of the reactor according to the configuration described above are as follows.

When the reaction process starts, the reaction gas is supplied from the gas supply part 220 into the reaction chamber 19. The supplied reaction gas is moved to the lower portion of the reaction chamber 19 at a uniform speed and distribution so that a reaction occurs at the surface of the workpiece supported by the support part 30 to perform a process.

In addition, the reaction gas is supplied into the reaction chamber 19 while the reaction gas is discharged to the outside through the gas discharge port 50 by the discharge pump communicated with the gas discharge port 50, the gas discharge port 50 is the reaction chamber 19 The buffering section is formed on one side in the reaction chamber 19 without being symmetrical with respect to the support 30 in the bottom of the support chamber 30. A ″) is formed.

The buffering section "A" depends on the type of reaction gas, the capacity of the pump, the height of the reaction chamber 19, and the like, and when the workpiece is present in the buffering section "A", the process yield is lowered and the product is defective. Since this occurs, the height of the support part 30 should be adjusted so that the height of the reaction chamber 19 is located above the buffering section "A". Therefore, by selecting the height of the intermediate chamber block 13 corresponding to the optimal height of the reaction chamber 19 and combining the respective chamber blocks 10 to form the reaction chamber 19, the buffering section (A) The support 30 is located above.

In the above-described embodiment, the intermediate chamber block 13 is described as one, but as shown in FIG. 5, the height of the reaction apparatus may be different by providing a plurality of intermediate chamber blocks 13 and 14. to be.

In addition, in order to adjust the height of the reaction chamber, as shown in FIG. 6, except for the intermediate chamber 13 block, the upper and lower chamber blocks 11 and 12 may be assembled to form the reaction chamber. .

As described above, according to the present invention, a reaction apparatus capable of adjusting the height of a reaction chamber according to process characteristics is provided.

1 is a cross-sectional view schematically showing a cross section of a reactor according to the prior art,

Figure 2 is a perspective view showing a coupled state of the reaction apparatus according to the first embodiment of the present invention,

3 is an exploded perspective view of the reactor according to FIG.

4 is a cross-sectional view showing a cross section in the IV-IV direction of FIG.

5 is a cross-sectional view schematically showing a cross section of a reactor according to a second embodiment of the present invention;

6 is a cross-sectional view schematically showing a cross section of a reactor according to a third embodiment of the present invention;

<Explanation of symbols for the main parts of the drawings>

               10: chamber block 11: upper chamber block

               12: lower chamber block 13, 14: intermediate chamber block

               20: gas supply part 30: support part

               40: cover 50: gas outlet

Claims (3)

In a reactor having a reaction chamber, An upper chamber block forming an upper portion of the reaction chamber and containing a work piece; A lower chamber block forming a lower portion of the reaction chamber and containing a work piece; And an intermediate chamber block interposed between the upper and lower chamber blocks and provided with at least one intermediate chamber block so as to vary the height of the reaction chamber formed by being coupled with the upper and lower chamber blocks. The method of claim 1, The chamber further comprises a sealing member interposed between each of the chamber blocks. The method according to claim 1 or 2, Each chamber block is coupled to each other by screw fastening.