KR100513641B1 - Optical filter for plasma display panel and manufacturing method thereof - Google Patents

Abstract

The present invention provides an optical filter for a plasma display panel and a method of manufacturing the same. The optical filter is a glass substrate; A transparent substrate (a) formed on the front surface of the glass substrate, an antireflection film (b) formed on the front surface of the transparent substrate, a near infrared blocking and an optional light absorbing layer (c) formed on the rear surface of the transparent substrate, the near infrared blocking, and An anti-reflective light transmissive film including an adhesive layer (d) formed on the selective light absorbing layer, wherein the adhesive layer is in direct contact with the front surface of the glass substrate; An adhesive interlayer formed on a rear surface of the glass substrate; An electromagnetic shielding layer formed on the adhesive interlayer; And an anti-reflection film formed on the electromagnetic shielding layer. The optical filter for PDP of the present invention forms a layer including a near infrared ray blocking material and a light selective absorbing material on the back side of a transparent substrate on which an anti-reflection film is formed and integrates them, thereby reducing the total thickness of the optical filter associated with a decrease in brightness, thereby reducing the weight of the filter. In addition, it is possible to reduce the thickness and to reduce the weight and thickness of the filter while improving the structure of the structure, and to simplify the lamination structure, the manufacturing process is simplified, the manufacturing cost is reduced, and the manufacturing yield is improved.

Description

Optical filter for plasma display panel and manufacturing method

The present invention relates to an optical filter for a plasma display panel and a method of manufacturing the same, and more particularly, to an optical filter for a plasma display panel and a method for manufacturing the same, wherein a layer having a near infrared ray blocking function and a light selective absorbing function is integrated with an antireflection layer. It is about.

Plasma Display Panel (PDP) is easy to be enlarged compared to other image display devices, and it is evaluated as a thin light emitting display device having the most suitable characteristics as a high quality digital television in the future.

However, PDP has a disadvantage in that the emission amount of electromagnetic waves and near infrared rays is high, the surface reflection of the phosphor is high, and the color purity does not reach the cathode ray tube due to the orange light emitted from the encapsulated gas helium. Therefore, not only to prevent harmful effects of human body and malfunction of precision instruments caused by electromagnetic waves and near-infrared rays, but also to reduce surface reflection and improve color purity, PDP with electromagnetic shielding, near-infrared blocking, surface reflection prevention and color purity improvement Optical filter is adopted.

PDP can be classified into business use and public use according to the electromagnetic shielding performance, and the optical filter for PDP has a different configuration depending on its use.

That is, the optical filter of the commercial PDP alternately stacks a metal such as silver and an oxide of high refractive index on the back surface of the substrate to form an electromagnetic wave and a near infrared blocking layer. Subsequently, it is completed by forming antireflection films on both surfaces of the resultant product.

On the other hand, the optical filter of the consumer PDP inserts a conductive mesh between two transparent substrates, bonds an anti-reflection film to the surface thereof, and bonds a near-infrared blocking film to the back side of the resultant, and then an anti-reflection film on the top thereof. (Japanese Patent Laid-Open No. 11-74683), or a method of laminating a conductive mesh and an antireflection film on the surface of a single transparent substrate in order and laminating a near infrared ray blocking film on the back side thereof has been proposed. 13-134198).

However, among the above-described methods, the optical filter using two transparent substrates has a problem that it is difficult to thin and light due to its thickness and weight. In addition, the method of bonding the near-infrared blocking film to the surface of a single transparent substrate uses only one substrate, which makes it possible to reduce the weight. However, since the near-infrared blocking film must be bonded separately, the bonding process itself is complicated and the yield decreases. The thermoplastic resin used as the substrate of the film has the disadvantage that the thickness of the optical filter is increased and the transmittance of the final filter is decreased.

Accordingly, the technical problem to be achieved by the present invention is to solve the above problems, to provide a PDP optical filter and a method of manufacturing the same, which can simplify the manufacturing process, reduce weight, and improve light transmittance and luminance characteristics.

In the present invention to achieve the above technical problem,

Glass substrates;

Is formed on the front of the glass substrate,

A transparent substrate (a),

An anti-reflection film (b) formed on the entire surface of the transparent substrate,

Near-infrared blocking and selective light absorbing layer (c) formed on the rear surface of the transparent substrate,

An anti-reflective light transmissive film including an adhesive layer (d) formed on the near-infrared blocking and selective light absorbing layer, wherein the adhesive layer is in direct contact with the front surface of the glass substrate;

An adhesive interlayer formed on a rear surface of the glass substrate;

An electromagnetic shielding layer formed on the adhesive interlayer; And

It provides an optical filter for a plasma display panel comprising an anti-reflection film formed on the electromagnetic shielding layer.

The near-infrared blocking and selective light absorbing layer of the antireflective light transmissive film is formed on the rear surface of the transparent substrate on which the reflective film is formed and integrated.

The adhesive interlayer is made of ethylene-vinyl acetate copolymer, polyvinyl butyral or a mixture thereof, and the electromagnetic shielding layer is a conductive mesh made of metal fibers or metal coated organic fibers, or made of metal fibers or metal coated organic fibers. It is preferable that it is a conductive mesh obtained by patterning copper foil.

The near-infrared blocking and selective absorbing layer in the anti-reflective light transmitting film includes a near-infrared blocking material and a light-selective absorbing material, and the near-infrared blocking material includes a mixed complex of nickel complex and diammonium, copper ions and zinc ions. At least one selected from the group consisting of compound dyes, cyanine dyes and anthraquinone dyes, wherein the selective light absorbing material is a metal (M) atom in the octaphenyltetraazapopyrin, tetraazapophyrin ring as a central group, ammonia, water It is preferable to use at least one ligand selected from the group consisting of derivative dyes in which one ligand selected from the group consisting of halogen coordinates with the metal atom.

Another technical problem of the present invention,

(A) forming an anti-reflection film on the entire surface of the transparent substrate;

(B) forming a near infrared ray blocking and selective light absorbing layer on the back side of the transparent substrate;

(C) forming a pressure-sensitive adhesive layer on top of the near-infrared blocking and selective light absorbing layer;

(D) forming a release layer on the adhesive layer to form an antireflective light transmitting film;

(E) sequentially forming an adhesive interlayer, an electromagnetic shielding layer and an antireflection film on the rear surface of the glass substrate;

 (F) removing the release layer of the antireflective light transmitting film formed from the step (D), and laminating the adhesive layer thereof on the entire surface of the glass substrate obtained from the step (E). It is made by a method of manufacturing an optical filter for a plasma display panel.

The optical filter for PDP has an important characteristic of near infrared cut-off to prevent malfunction of the remote control. In particular, as the brightness of the PDP is improved, the generation of near-infrared rays also increases, so a higher level of near-infrared cutoff is required.

In the case of using an acrylic resin plate as a transparent substrate of a front filter for a PDP, although a near-infrared ray blocking performance can be imparted by incorporating a copper-based material into the acrylic resin of the substrate material, the acrylic resin is weak to heat and has a risk of thermal deformation. Therefore, it is not preferable as a transparent substrate of the front optical filter for PDP. For this reason, in this invention, the glass substrate which is excellent in heat resistance is used as a transparent substrate, and the optical filter for PDP which has favorable near-infrared cut off performance is manufactured.

Hereinafter, the present invention will be described in more detail.

In the optical filter for plasma display panel of the present invention, a layer having a near infrared ray blocking function and a color purity improving function by a selective light absorption function is formed on the rear surface of the transparent substrate on which the antireflective film is formed, thereby the antireflective film and the near infrared ray blocking layer are integrated. A light transmissive film is formed, which is disposed on the front surface of the glass substrate. Referring to the attached optical filter of the present invention with reference to the accompanying drawings in more detail as follows.

The antireflective light transmissive film 10 of the present invention has a structure as shown in FIG. 1.

Referring to FIG. 1, the antireflective light transmissive film 10 forms an antireflection film 11 on the front surface of the transparent substrate 12, and blocks the near infrared rays and the selective light absorbing layer 13 on the rear surface of the transparent substrate 12. ), The adhesive layer 14 and the release layer 15 are sequentially stacked.

In the anti-reflective light transmitting film 10, the transparent substrate 12 is a thermoplastic resin consisting of polyethylene terephthalate, polycarbonate, polymethyl methacrylate, triacetate cellulose (TAC), polyether sulfone (PES) The light transmittance of the transparent substrate is preferably 80% or more, more preferably 90% or more. In addition, the thickness of the transparent substrate is preferably 25 to 150 µm in view of the transparency of the antireflective light transmitting film.

A hard coating film made of acrylic resin may be selectively formed on the entire surface of the transparent substrate 12 for scratch resistance.

As the anti-reflection film 11, a low refractive index single layer film smaller than the refractive index of the transparent substrate 12 or a multilayer film in which a high refractive index transparent film and a low refractive index transparent film are alternately laminated is used. Here, the low refractive index transparent film is made of low refractive index materials such as silicon-based organic materials and fluorine-based organic materials having a refractive index of 1.6 or less, such as SiO ₂ , MgF ₂ , Al ₂ O _3, and the like, and the high refractive index transparent film is made of indium tin oxide (ITO), ZnO, Al doped ZnO, TiO ₂ , ZrO and other high refractive index material of 1.6 or more is used, and the high refractive index material is dispersed in a binder such as acrylic resin, polyester and the like. Such an antireflection film is manufactured by vacuum coating the low refractive index material or the high refractive index material or by roll coating and die coating a solution containing the materials by a wet method.

The optical thickness nd of the antireflection film 11 is formed such that the high refractive index film and the low refractive index film are about λ / 4 (where λ is the wavelength).

The near-infrared blocking and selective light absorbing layer 13 contains a near-infrared blocking material and a photo-selective light absorbing material. At this time, the selective light absorbing dye is suitable to use in an amount of 0.01 to 0.5 parts by weight based on 100 parts by weight of total solids, and the near-infrared shielding dye is preferably used in an amount of 0.3 to 5 parts by weight based on 100 parts by weight of total solids. If the content of the selective light absorbing material is less than 0.01 parts by weight, the selective light absorbing function is lowered, and color purity improvement effects cannot be expected. If the content of the light absorbing material is more than 0.5 parts by weight, the color balance of the filter is distorted and the transmittance is lowered.

The near-infrared blocking material constituting the near-infrared blocking and selective light absorbing layer 13 of the present invention does not impair transparency and has good near-infrared blocking performance (for example, the ability to absorb near infrared rays in the 850-1250nm near-infrared wavelength region). As the material having a compound of Formulas 4 to 6 disclosed in Korean Laid-Open Patent Publication No. 2001-39727, for example, a mixed pigment of nickel complex and diammonium (eg, trade name IRG022 (Japanese Chemical Company)) or Compound dyes or organic dyes containing copper and zinc ions are used.

For the selective light absorbing material, Korean Patent Laid-Open Publications 20001-26838 and 2001-39727 are incorporated by reference. The selective light absorbing material disclosed herein is a metal (M) valence center group in an octaphenyltetraazapophyrin or tetraazapophyrin ring, and a ligand selected from the group consisting of ammonia, water, and halogen is coordinated with the metal atom. As the derivatives, the metal is zinc (Zn), palladium (Pd), magnesium (Mg), manganese (Mn), cobalt (Co), copper (Cu), ruthenium (Ru), rhodium (Rh), iron ( Fe), nickel (Ni), vanadium (V), tin (Sn), titanium (Ti) is one or more selected from the group consisting of.

Referring to the method of forming the near infrared ray blocking and selective light absorbing layer 13, the above-described near infrared ray blocking material and the selective light absorbing material are mixed with a plastic resin and an organic solvent, and the antireflection film 11 is formed on the transparent substrate 12. The antireflection film, the near-infrared cut off and the selective light absorbing layer are integrated by coating on the back surface of the film. The coating method may be a conventional coating method, for example, roll coating, die coating, spin coating is used.

It is preferable that the thickness of the near-infrared cut-off and selective light-absorbing layer 13 is 1 to 20 탆, and more preferably 2 to 10 탆 in terms of near-infrared cut-off performance.

As the plastic resin, poly (methyl methacrylate), polyvinyl alcohol, polycarbonate, ethylene vinyl acetate, poly (vinyl butyral), polyethylene terephthalate, etc. are used, and the content thereof is based on 100 parts by weight of an organic solvent. 5 to 40 parts by weight is used. If the content of the plastic resin is less than 5 parts by weight, it is difficult to secure the thickness for implementing the required physical properties, and if it exceeds 40 parts by weight, it is not preferable because the coating properties are lowered.

Toluene, xylene, propyl alcohol, isopropyl alcohol, methyl cell solution, ethyl cell solution, dimethyl formamide, methyl ethyl ketone and the like are used as the organic solvent.

In the near-infrared blocking and selective light absorbing layer 13 of the present invention, azo dyes, cyanine dyes, diphenylmethane dyes, triphenylmethane dyes, phthalocyanine dyes, and xanthene dyes are used to control the transmittance of each wavelength region or to realize whiteness. And additives such as radical reaction inhibitors for preventing fading of dyes or pigments such as diphenylene dyes, indigo and porphyrins and improving light resistance. The content of such additives is 0.05 to 3 parts by weight based on 100 parts by weight of solids constituting the near infrared ray blocking and selective light absorbing layer 13. If the content of the additive is less than 0.05 parts by weight, the effect of the addition is insignificant, and if it exceeds 3 parts by weight, the near-infrared cut off and the physical properties of the selective light-absorbing layer 13 is not preferable.

The adhesive layer 14 formed on the near-infrared blocking and selective light absorbing layer 13 is made of a polymer adhesive having excellent transparency (visible light transmittance of 80% or more), environmental resistance, heat resistance, wettability, cohesiveness, and adhesiveness. A resin adhesive, a polyester resin adhesive, a rubber adhesive, etc. are used, Especially, it is more preferable to use an acrylic resin adhesive from a transparency viewpoint.

It is preferable that the thickness of the adhesion layer 14 of this invention is 10-50 micrometers, In some cases, a ultraviolet-ray, an absorber, an infrared absorber, anti-aging agent, a paint processing aid, dye for adjusting the color tone of the filter itself, a pigment, etc. Various additives, such as a coloring agent, a filler, such as carbon black, hydrophobic silica, calcium carbonate, etc. may also be included.

In forming the adhesive layer 14, a conventional coating method can be used. For example, comma coating, roll coating, die coating, or the like can be used, and among them, comma coating is more advantageous in terms of ease of after coating.

On the other hand, a release layer 15 is formed on the adhesive layer 14 to protect the layer and to facilitate handling.

The release layer 15 is a film in which a silicone-based release agent is thinly coated on a substrate such as polyethylene terephthalate or polyethylene film, and the release layer 15 is laminated by simultaneously applying a pressure-sensitive adhesive and drying it. The release layer 15 is peeled off when the integrated antireflective light transmissive film 10 is bonded to the entire surface of the glass substrate 12.

On the other hand, in the PDP optical filter 20 of the present invention, the antireflective light transmissive film 25 is formed on the entire surface of the glass substrate 21 (the direction in which incident light is irradiated). Herein, the antireflective light transmissive film 25 has the adhesive layer 14 directly on the front surface of the glass substrate 21 with the release layer 15 removed from the antireflective light transmissive film 10 of FIG. 1. In contact with An adhesive interlayer 22, an electromagnetic shielding layer 23, and an anti-reflection film 24 are sequentially formed on the rear surface of the glass substrate 21.

The optical filter having the above-described structure is manufactured according to the following procedure.

An antireflection film 11 is formed on the entire surface of the transparent substrate 12. Subsequently, the near infrared ray blocking and selective light absorbing layer 13 are formed on the rear surface of the transparent substrate 12, and the adhesive layer 14 and the release layer 15 are sequentially formed on the near infrared ray blocking and selective light absorbing layer 13. To make an antireflective light transmissive film 10.

Separately, the adhesive interlayer 22, the electromagnetic shielding layer 23, and the anti-reflection film 24 are sequentially formed on the rear surface of the glass substrate 21. At this time, the resultant is laminated, and then a thermal bonding process is required. At this time, the heat treatment temperature is in the range of 100 to 200 ° C. and about 120 ° C., and the heat treatment time varies depending on the temperature. If heat treatment is performed at 120 ° C., it is about 30 minutes.

Subsequently, the optical filter 20 of the present invention is removed by removing the release layer 15 from the antireflective light transmissive film 10 and laminating the adhesive layer 14 so as to contact the entire surface of the glass substrate 21. Is completed.

The adhesive interlayer 22 serves to bond the electromagnetic wave shielding layer 23 and the glass 21. The adhesive interlayer 22 is an adhesive resin such as ethylene-vinylacetate (EVA) copolymer, polyvinyl butyral, and ultraviolet rays. And additives such as absorbers, infrared absorbers, anti-aging agents, paint processing aids, dyes for adjusting the color tone of the filter itself, colorants such as pigments, fillers such as carbon black, hydrophobic silica, calcium carbonate and the like. And it is preferable that the thickness of this adhesive intermediate film 22 is 25-500 micrometers.

The electromagnetic shielding layer 23 formed on the adhesive interlayer 22 serves to shield electromagnetic waves, and as a specific example thereof, is a conductive mesh made of metal fibers and / or metal coated organic fibers or metal fibers and / or metals. The electrically conductive mesh obtained by patterning the copper foil which consists of a coating organic fiber is mentioned. When such a conductive mesh is used, the scattering prevention effect at the time of a damage can be obtained, and safety is high.

As the metal of the metal fiber and the metal-coated organic fiber, copper, stainless, aluminum, nickel, titanium, tungsten, tin, iron, silver, chromium, carbon or an alloy thereof is used, among which copper, nickel, stainless, aluminum, and the like. This is preferable. As the organic material of the metal-coated organic fiber, polyester, nylon, vinylidene chloride, aramid, vinylon, cellulose and the like are used.

The electromagnetic shielding layer 23, that is, the thickness of the conductive mesh is preferably 10 to 100㎛, the opening ratio thereof is 50 to 95%, the line width is 5 to 50㎛, the line pitch is preferably 100 to 500㎛. .

The anti-reflection film 24 formed on the electromagnetic shielding layer 23 is made of the same material and forming method as in the case of the anti-reflection film 11 constituting the anti-reflective light transmitting film 10.

Hereinafter, the present invention will be described with reference to the following examples, but the present invention is not limited only to the following examples.

Synthesis Example 1

1000 ml of methyl ethyl ketone (MEK) was added to the reactor, and while heating it, 300 g of poly (methyl methacrylate) was added thereto to completely dissolve it.

Subsequently, 100 mg of octaphenyl tetraaza porphyrin and 150 mg of IRG022 (Japanese chemical company) were added and dissolved in the reactor.

Thereafter, a solution of 120 mg of Acridine Orange (Aldrich Chemical Co., Ltd.) in 50 ml of isopropyl alcohol was slowly added to the reaction mixture to prepare a near-infrared shield and a selective light absorbing coating.

Example 1

The near-infrared blocking and selective absorbing coating agent prepared according to Synthesis Example 1 was rolled in a microgravure manner on the back surface of the antireflection film formed by stacking a hard coating layer, a zirconium oxide-based high refractive index film, and a fluorosiloxane-based low refractive index film sequentially. After coating, it was dried at 100 ° C. to form a near infrared barrier and selective light absorbing layer with a thickness of about 10 μm.

After applying the acrylic pressure-sensitive adhesive on the near-infrared light and the selective light-absorbing layer according to the comma coating method, it was dried to form an adhesive layer. Subsequently, the antireflective light transmitting film was completed by laminating a release film prepared by applying a silicone release agent on the PET substrate on the adhesive layer.

EVA layer and conductive mesh (line width: 10 µm, line pitch: 300 µm, opening ratio: about 93%), zirconium oxide-based high refractive index film, fluoro on the back of glass substrate (size 600 × 1000 mm2, thickness 3 mm) The antireflection film formed by sequentially stacking the siloxane low refractive index films was sequentially stacked, and was heat-bonded at about 120 ° C. for 30 minutes using a vacuum press.

The PDP optical filter was completed by laminating an antireflective light transmitting film formed according to the above process using a laminator (speed: about 1.0 m / min) on the other side of the glass.

Comparative Example 1

The near-infrared blocking and selective light absorbers prepared according to Synthesis Example 1 were applied and dried on the entire surface of the polyethylene terephthalate (PET) film (thickness: 125 μm) to form a near-infrared and selective light absorbing layer.

Subsequently, a first film was formed by laminating an adhesive layer and a release film on the back of the film.

Thereafter, according to the same method as in Example 1, the film on which the EVA layer, the conductive mesh, and the anti-reflection film were sequentially formed was laminated on the back of the 3 mm glass, and the first film was laminated on the front of the glass substrate.

Then, finally, the film with the anti-reflection film formed on the entire surface of the glass substrate was adhered at a speed of about 1.0 m / min to complete the filter PDP optical filter.

After mounting the optical filters prepared according to Example 1 and Comparative Example 1 on the PDP, the luminance and transmittance of the white light before and after mounting the optical filter on the PDP were measured using a colorimeter (Minolta, Japan, trade name: CS1000). .

The measurement results are shown in Table 1 below.

division Luminance (cd / ㎡) White light transmittance (%) Luminance before filter installation 104 100 Example 1 62.4 60 Comparative Example 1 57.2 55

As can be seen from Table 1, the brightness of the optical filter manufactured according to Example 1 was improved compared to the case of Comparative Example 1, the transmittance was also improved.

In addition, in the overall weight of the optical filter, the optical filter of Example 1 reduced the weight of the filter by about 5% compared to the case of Comparative Example 1, which was manufactured by separately preparing a near-infrared blocking film and an antireflection film and sticking them on the glass in order. The total thickness of the optical filter was also decreased. As described above, in the case of Example 1, compared to the case of Comparative Example 1, the structure of the optical filter was simplified to improve the manufacturing yield, and the manufacturing cost was also reduced.

The optical filter for PDP of the present invention forms a layer including a near infrared ray blocking material and a light selective absorbing material on the back side of a transparent substrate on which an anti-reflection film is formed and integrates them, thereby reducing the total thickness of the optical filter associated with a decrease in brightness, thereby reducing the weight of the filter. In addition, it is possible to reduce the thickness and to reduce the weight and thickness of the filter while improving the structure of the structure, and to simplify the lamination structure, the manufacturing process is simplified, the manufacturing cost is reduced, and the manufacturing yield is improved.

1 is a cross-sectional view showing a laminated structure of the antireflective light transmitting film of the present invention,

FIG. 2 is a cross-sectional view illustrating a laminated structure of an optical filter for plasma display panel formed using the antireflective light transmitting film of FIG. 1.

<Brief description of the major symbols in the drawings>

11, 24 ... Anti-reflective film 12 ... Transparent substrate

13 ... NIR blocking and selective light absorbing layer

14 ... Adhesive layer 15 ... Release layer

22 ... Adhesive interlayer 23 ... Electromagnetic shielding layer

Claims (8)

Glass substrates; A transparent substrate (a) formed on the front surface of the glass substrate, an antireflection film (b) formed on the front surface of the transparent substrate, a near infrared blocking and an optional light absorbing layer (c) formed on the rear surface of the transparent substrate, the near infrared blocking, and An anti-reflective light transmissive film including an adhesive layer (d) formed on the selective light absorbing layer, wherein the adhesive layer is in direct contact with the front surface of the glass substrate; An adhesive interlayer formed on a rear surface of the glass substrate; An electromagnetic shielding layer formed on the adhesive interlayer; And It includes an anti-reflection film formed on the electromagnetic shielding layer, The near-infrared blocking and selective light absorbing layer in the anti-reflective light transmitting film includes a near-infrared blocking material and a light selective absorbing material, The near-infrared blocking material is at least one selected from the group consisting of a mixed complex of nickel complex and diammonium, a compound dye containing copper ions and zinc ions, a cyanine dye and an anthraquinone dye. . The optical filter for plasma display panel according to claim 1, wherein in the anti-reflective light transmitting film, a near-infrared light blocking layer and a selective light absorbing layer are formed on the rear surface of the transparent substrate on which the reflective film is formed and are integrated. The plasma display panel of claim 1, wherein the electromagnetic shielding layer is a conductive mesh made of a metal fiber or a metal coated organic fiber, or a conductive mesh obtained by patterning a copper foil made of a metal fiber or a metal coated organic fiber. Optical filter. The optical filter for plasma display panel according to claim 1, wherein the adhesive interlayer is made of ethylene-vinyl acetate copolymer, polyvinyl butyral or a mixture thereof. delete delete According to claim 1, wherein the selective light-absorbing material is a metal (M) atom in the octaphenyl tetraaza porphyrin, tetraaza porphyrin ring as a central group, one ligand selected from the group consisting of ammonia, water, halogen is the metal atom And at least one selected from the group consisting of coordinating derivative pigments. (A) forming an anti-reflection film on the entire surface of the transparent substrate; (B) forming a near infrared ray blocking and selective light absorbing layer on the back side of the transparent substrate; (C) forming a pressure-sensitive adhesive layer on top of the near-infrared blocking and selective light absorbing layer; (D) forming a release layer on the adhesive layer to form an antireflective light transmitting film; (E) sequentially forming an adhesive interlayer, an electromagnetic shielding layer and an antireflection film on the rear surface of the glass substrate;  (F) removing the release layer of the antireflective light transmissive film formed from step (D), and laminating the adhesive layer on the entire surface of the glass substrate obtained from step (E). The manufacturing method of the optical filter for plasma display panels in any one of Claims 1-4.