KR100458317B1 - System for exhausting volatile air in sewage and waste water - Google Patents
System for exhausting volatile air in sewage and waste water Download PDFInfo
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- KR100458317B1 KR100458317B1 KR10-2002-0061768A KR20020061768A KR100458317B1 KR 100458317 B1 KR100458317 B1 KR 100458317B1 KR 20020061768 A KR20020061768 A KR 20020061768A KR 100458317 B1 KR100458317 B1 KR 100458317B1
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- gas
- sewage
- wastewater
- circulating fluid
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- 239000002351 wastewater Substances 0.000 title claims abstract description 57
- 239000010865 sewage Substances 0.000 title claims abstract description 41
- 239000012530 fluid Substances 0.000 claims abstract description 30
- 238000000746 purification Methods 0.000 claims abstract description 21
- 238000007872 degassing Methods 0.000 claims abstract description 16
- 239000000126 substance Substances 0.000 claims abstract description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims abstract description 6
- 230000002265 prevention Effects 0.000 claims abstract description 3
- 238000001816 cooling Methods 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000012545 processing Methods 0.000 abstract description 10
- 238000010926 purge Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 67
- 239000007788 liquid Substances 0.000 description 3
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 239000003039 volatile agent Substances 0.000 description 2
- 238000009835 boiling Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/20—Treatment of water, waste water, or sewage by degassing, i.e. liberation of dissolved gases
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L7/00—Heating or cooling apparatus; Heat insulating devices
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
- F15D—FLUID DYNAMICS, i.e. METHODS OR MEANS FOR INFLUENCING THE FLOW OF GASES OR LIQUIDS
- F15D1/00—Influencing flow of fluids
- F15D1/0015—Whirl chambers, e.g. vortex valves
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Fluid Mechanics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Clinical Laboratory Science (AREA)
- Health & Medical Sciences (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Organic Chemistry (AREA)
- Physical Water Treatments (AREA)
Abstract
본 발명은 하·폐수내에 포함된 휘발성기체의 탈기정화시스템에 관한 것으로, 이는 유입되는 하·폐수(10)내에 포함된 휘발성기체를 기체로 상변화시키는 기체발생수단(23)과 유입된 하·폐수(10)의 역류를 방지하도록 된 역류방지판(25)이 내부에 설치된 처리실(22)과, 기체발생수단(23)에 직접 연결되는 약품조(26) 및, 처리실(22)로부터 배출되는 하·폐수(10)가 저장되는 수위조절조(28)를 포함하여 구성된 기체발생장치(20);와, 처리실(22)로부터 배기되는 기체를 흡입하는 기체흡입실(32)과, 흡입된 기체가 순환펌프(36)의 작동에 의해 순환되는 순환액과 반응하여 저장되도록 된 순환액저장조(34), 기체흡입실(32)과 순환액저장조(34) 사이에 배치되고 순환액을 냉각시키는 냉각기(38) 및, 순환액저장조(34)내에서 발생된 기체를 응축하는 응축기(35)를 포함하여 구성된 와류순환장치(30);로 이루어져 있어서, 하·폐수내에 포함된 오염된 휘발성기체를 효율적으로 탈기정화하여 배기시킬 수 있고 비용을 절감시킬 수 있다.The present invention relates to a degassing and purification system of volatile gas contained in sewage and wastewater, which includes a gas generating means (23) for changing the volatile gas contained in the introduced sewage and wastewater (10) into gas. The backflow prevention plate 25 which prevents backflow of the wastewater 10 is discharged from the processing chamber 22 provided therein, the chemical tank 26 directly connected to the gas generating means 23, and the processing chamber 22. A gas generator 20 including a water level control tank 28 in which the wastewater 10 is stored; a gas suction chamber 32 for sucking gas exhausted from the process chamber 22; Is disposed between the circulating fluid storage tank 34 and the gas suction chamber 32 and the circulating fluid storage tank 34 to be stored in reaction with the circulating fluid circulated by the operation of the circulating pump 36 and cools the circulating fluid. 38 and a condenser 35 for condensing the gas generated in the circulating fluid storage tank 34. Vortex circulator (30) in made of, and, can be efficiently deaerated by purging the contaminated volatile gas contained in the waste water and exhaust gas can reduce the cost.
Description
본 발명은 하·폐수내에 포함된 휘발성기체의 탈기정화시스템에 관한 것으로, 특히 유지관리가 용이하고 설치면적이 작으며 시설투자비를 절감할 수 있는 하·폐수내에 포함된 휘발성기체의 탈기정화시스템에 관한 것이다.The present invention relates to a degassing and purification system for volatile gases contained in sewage and wastewater, and more particularly, to a degassing and purification system for volatile gases contained in sewage and wastewater, which can be easily maintained and installed, and can reduce facility investment costs. It is about.
종래의 하·폐수의 정화 또는 배기시스템은 대규모 설비를 이룸에 따라 대개는 설치면적이 커지고 시공 또는 유지관리에 많은 비용이 소요되는 문제가 있다. 그리고, 하·폐수로 배출되는 액체는 용해 및 혼입된 물질이 여러 종류이고 농도와 비점이 비교적 높으므로 효율면에서 우수한 증발식 처리방법이 많이 이용되고 있으나, 이는 고온을 유지하는 데에 많은 비용이 들고 하·폐수량이 많은 경우에는 적용하기 곤란한 문제가 있다.Conventional sewage / wastewater purification or exhaust systems have large installations, which usually result in large installation areas and high costs for construction or maintenance. In addition, the liquid discharged into the sewage and wastewater has many kinds of dissolved and mixed materials, and relatively high concentration and boiling point, so that an excellent evaporation treatment method is used in terms of efficiency, but it is expensive to maintain a high temperature. There is a problem that is difficult to apply when the amount of sewage and wastewater is large.
이에 본 발명은 상기와 같은 문제점을 해결하기 위하여 창안된 것으로, 소규모 설비로서 정화처리약품에 의한 반응을 이용하여 하·폐수내에 포함된 휘발성기체를 효율적으로 탈기정화하여 배기시킬 수 있고 비용을 절감시킬 수 있는 하·폐수내에 포함된 휘발성기체의 탈기정화시스템을 제공하는 데에 그 목적이 있다.Therefore, the present invention was devised to solve the above problems. As a small-scale facility, it is possible to efficiently degassing and exhausting volatile gas contained in sewage and wastewater by using a reaction by a purification treatment chemical and reducing costs. The purpose is to provide a degassing and purification system for volatile gases contained in sewage and wastewater.
도 1은 본 발명에 따른 하·폐수내에 포함된 휘발성기체의 탈기정화시스템을 개략적으로 도시한 구성도이고,1 is a configuration diagram schematically showing a degassing and purification system of volatile gas contained in sewage and wastewater according to the present invention,
도 2는 본 발명에 따른 하·폐수내에 포함된 휘발성기체의 탈기정화시스템에 의해 정화가 진행되는 과정을 간략하게 도시한 처리흐름도이다.2 is a flow chart briefly illustrating a process of purifying by the degassing and purification system of volatile gas contained in sewage and wastewater according to the present invention.
<도면의 주요부분에 대한 부호의 설명><Description of the symbols for the main parts of the drawings>
10 ----- 하·폐수, 20 ----- 기체발생장치,10 ----- Sewage & Wastewater, 20 ----- Gas Generator,
22 ----- 처리실, 23 ----- 기체발생수단,22 ----- treatment chamber, 23 ----- gas generating means,
25 ----- 역류방지판, 26 ----- 약품조,25 ----- check valve, 26 ----- chemical bath,
27 ----- 정화처리약품, 28 ----- 수위조절조,27 ----- Purification Chemicals, 28 ----- Level Control Tank,
30 ----- 와류순환장치, 32 ----- 기체흡입실,30 ----- vortex circulation system, 32 ----- gas suction chamber,
34 ----- 순환액저장조, 35 ----- 응축기,34 ----- circulating fluid reservoir, 35 ----- condenser,
36 ----- 순환펌프, 38 ----- 냉각기.36 ----- circulating pump, 38 ----- chiller.
상기와 같은 목적을 성취하기 위한 본 발명은, 유입되는 하·폐수내에 포함된 휘발성기체를 기체로 상변화시키는 기체발생수단과 유입된 하·폐수의 역류를 방지하도록 된 역류방지판이 내부에 설치된 처리실과, 기체발생수단에 직접 연결되는 약품조 및, 처리실로부터 배출되는 하·폐수가 저장되는 수위조절조를 포함하여 구성된 기체발생장치;와, 처리실로부터 배기되는 기체를 흡입하는 기체흡입실과, 흡입된 기체가 순환펌프의 작동에 의해 순환되는 순환액과 반응하여 저장되도록 된 순환액저장조, 기체흡입실과 순환액저장조 사이에 배치되고 순환액을 냉각시키는 냉각기 및, 순환액저장조내에서 발생된 기체를 응축하는 응축기를 포함하여 구성된 와류순환장치;로 이루어진다.In order to achieve the above object, the present invention provides a processing chamber in which gas generation means for phase-changing volatile gas contained in inflowed sewage and wastewater into gas and a backflow prevention plate are provided to prevent backflow of the introduced sewage and wastewater. And a gas generating device including a chemical tank directly connected to the gas generating means, and a water level control tank storing the waste water discharged from the processing chamber; and a gas suction chamber for sucking the gas discharged from the processing chamber. A circulating fluid reservoir configured to store and react with the circulating fluid circulated by the operation of the circulating pump, a cooler disposed between the gas suction chamber and the circulating fluid reservoir and cooling the circulating fluid, and condensing the gas generated in the circulating fluid storage tank Consists of a vortex circulation device configured to include a condenser.
그리고, 기체발생수단은 충돌판을 구비하며, 이 충돌판과 하·폐수의 공급관에 의해 형성되는 배출구를 통해 하·폐수가 배출되게 되고, 이 기체발생수단을 통과하기 전에 하·폐수를 가열하는 수단이 더 구비되어 있다.The gas generating means includes a collision plate, and the waste water is discharged through an outlet formed by the collision plate and the supply pipe of the waste water, and the waste water is heated before passing through the gas generating means. Means are further provided.
이하 첨부도면을 참조하여 본 발명을 상세히 설명한다.Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.
도 1은 본 발명에 따른 하·폐수내에 포함된 휘발성기체의 탈기정화시스템을 개략적으로 도시한 구성도이고, 도 2는 본 발명에 따른 하·폐수내에 포함된 휘발성기체의 탈기정화시스템에 의해 정화가 진행되는 과정을 간략하게 도시한 처리흐름도이다.1 is a schematic view showing a degassing purification system of volatile gas contained in sewage and wastewater according to the present invention, Figure 2 is purified by a degassing purification system of volatile gas contained in sewage and wastewater according to the present invention Is a flow chart briefly showing the process that proceeds.
도 1을 참조하면, 본 발명에 따른 하·폐수내에 포함된 휘발성기체의 탈기정화시스템은 크게 기체발생장치(20)와 와류순환장치(30)로 이루어진다.Referring to Figure 1, the degassing and purification system of the volatile gas contained in the sewage, wastewater according to the present invention comprises a gas generator 20 and the vortex circulation device (30).
기체발생장치(20)는 기체발생수단(23)과 역류방지판(25)이 내부에 설치된 처리실(22)과, 기체발생수단(23)에 직접 연결되는 약품조(26) 및, 처리실(22)로부터 배출되는 하·폐수(10)가 저장되는 수위조절조(28)를 포함하여 구성된다. 기체발생수단(23)은 유입되는 하·폐수(10)의 일부, 특히 하·폐수(10)내에 포함된 휘발성기체를 기체로 상변화시키는 장치이다. 이 기체발생수단(23)은 바람직하게는 충돌판(도시되지 않음)을 구비할 수 있는 바, 이 충돌판과 하·폐수(10)의 공급관(18)에 의해 형성되는 배출구(도시되지 않음)를 통해 처리실(22)내로 하·폐수(10)가 배출되게 된다. 배출구는 그 두께가 얇고 배출단면적이 작아지게 형성하는 것이 바람직하며, 배출되는 하·폐수(10)의 비표면적이 작고 최대한 얇아지게 하여 기체 및 휘발성물질이 잘 발생될 수 있는 형상이라면 어떤 형태여도 된다. 한편, 도면에는 기체발생수단(23)이 구면형상으로 도시되어 있으며, 이에 의해 공급관(18)을 통해 공급된 하·폐수(10)가 배출구를 통해 얇게 펴지면서 구면을 따라 자연스럽게 흘러내리게 되고, 이 때 하·폐수(10)내에 포함된 휘발성기체는 압력의 변화 및 비표면적의 변화로 인해 쉽게 기체로 상변화된다.The gas generator 20 includes a processing chamber 22 in which a gas generating means 23 and a backflow preventing plate 25 are installed, a chemical tank 26 directly connected to the gas generating means 23, and a processing chamber 22. It is configured to include a water level control tank 28 in which the waste water discharged from the wastewater 10 is stored. The gas generating means 23 is a device for phase-changing volatile gas contained in a part of the sewage / wastewater 10, in particular, the sewage / water 10, into gas. The gas generating means 23 may preferably be provided with a collision plate (not shown), and a discharge port (not shown) formed by the collision plate and the supply pipe 18 of the wastewater 10 may be provided. Wastewater 10 is discharged into the treatment chamber 22 through the wastewater. The discharge port is preferably formed to have a thin thickness and a small discharge cross-section, and may be any shape as long as the specific surface area of the discharged sewage and wastewater 10 is small and as thin as possible so that gases and volatiles can be generated. . On the other hand, the gas generating means 23 is shown in the spherical shape, whereby the sewage and wastewater 10 supplied through the supply pipe 18 is naturally spread along the spherical surface while being spread out thinly through the outlet. At this time, the volatile gas contained in the sewage and wastewater 10 is easily phase-changed into a gas due to a change in pressure and a change in specific surface area.
약품조(26)내에는 기체발생수단(23)을 통과하면서 발생되는 기체에 따라 환원제나 산화제 또는 특별히 조제된 정화처리약품(27)이 저장되고, 외부공기를 이용하여 기포를 일으킴으로써 반응기체를 발생시킨다. 기체발생수단(23)을 거쳐 기체로 상변화가 일어난 일부 하·폐수(10)는 기체발생수단(23)에 직접 연결되어 있는 약품조(26)에서 배기되는 기체와 반응하여 방출되고, 액체상태의 하·폐수(10)는 처리실(22)내에 남게 된다. 역류방지판(25)은 중력에 의해 처리실(22)의 아래로 떨어지게 되는 하·폐수(10)의 역류를 방지하도록 되어 있으며, 하나 이상의구획벽(29a,29b)에 의해 단이 형성되어 있는 수위조절조(28)는 처리실(22)의 하부와 연통되어 있다.In the chemical tank 26, a reducing agent, an oxidizing agent, or a specially prepared purification chemicals 27 are stored according to the gas generated while passing through the gas generating means 23, and bubbles are generated by using external air to generate a reactor. Generate. Part of the sewage / wastewater 10 in which the phase change into the gas via the gas generating means 23 is released by reaction with the gas exhausted from the chemical tank 26 directly connected to the gas generating means 23, and is in a liquid state. Wastewater 10 is left in the treatment chamber 22. The non-return plate 25 is configured to prevent the reverse flow of the wastewater 10, which falls below the treatment chamber 22 by gravity, and the water level in which the stage is formed by one or more compartment walls 29a and 29b. The adjusting tank 28 communicates with the lower part of the processing chamber 22.
와류순환장치(30)는 기체흡입실(32)과, 순환액저장조(34), 냉각기(38) 및, 응축기(35)를 포함하여 구성되며, 순환액저장조(34)내에서 발생되는 와류현상을 이용하여 기체를 흡수, 분해, 안정화시키는 장치이다. 기체흡입실(32)은 기체발생장치(20), 더 상세하게는 처리실(22)로부터 배기되는 휘발성기체를 흡입하게 되고, 순환액저장조(34)내로 흡입된 기체는 순환펌프(36)의 작동에 의해 순환되는 순환액과 반응하여 저장된다. 냉각기(38)는 기체흡입실(32)과 순환액저장조(34) 사이에 배치되어 순환액을 냉각시키며, 응축기(35)는 순환액저장조(34)내에서 발생된 기체를 응축시키게 된다.The vortex circulation device 30 includes a gas suction chamber 32, a circulating fluid storage tank 34, a cooler 38, and a condenser 35, and the vortex phenomenon generated in the circulating fluid storage tank 34. It is a device that absorbs, decomposes and stabilizes gas by using. The gas suction chamber 32 sucks the volatile gas exhausted from the gas generator 20, more specifically, the process chamber 22, and the gas sucked into the circulating fluid storage tank 34 operates the circulating pump 36. It is stored in reaction with the circulating fluid circulated by. The cooler 38 is disposed between the gas suction chamber 32 and the circulating fluid storage tank 34 to cool the circulating fluid, and the condenser 35 condenses the gas generated in the circulating fluid storage tank 34.
도 2를 참조하면서 하·폐수의 정화단계를 더 상세하게 설명하자면, 먼저 유입관(12)을 통해 하·폐수저장조(14)에 저장되는 하·폐수(10)는 가정이나 공장 등지에서 배출된 것으로서, 이송펌프(16)의 이송작용에 의해 공급관(18)을 따라 기체발생장치(20)로 공급된다. 그 다음, 처리실(22)내로 유입된 하·폐수(10)는 기체발생수단(23)의 배출구를 통과하면서 두께는 얇아지고 비표면적은 작아지게 되어 일부 휘발성물질이 기체로 배기된다. 이렇게 배기되는 기체는 약품조(26)에 담긴 정화처리약품(27)에 의해 발생된 기체와 반응하여 와류순환장치(30)로 유입되는데, 진공펌프(도시되지 않음)를 이용하여 증기흡입실(32)로의 배기를 활발하게 하는 한편 처리실(22)내를 저진공상태로 유지시킬 수 있다. 그리고, 약품조(26)에는 공기조절밸브(26a)를 설치하여 외부공기의 유입을 조절할 수 있다.Referring to Figure 2 in more detail to explain the purification step of wastewater, sewage, wastewater 10 stored in the wastewater storage tank 14 through the inlet pipe 12 is discharged from the home or factory, etc. As such, it is supplied to the gas generator 20 along the supply pipe 18 by the transfer action of the transfer pump 16. Then, the sewage and wastewater 10 introduced into the processing chamber 22 passes through the outlet of the gas generating means 23, and the thickness becomes thinner and the specific surface area becomes small, so that some volatiles are exhausted into the gas. The gas discharged in this way reacts with the gas generated by the purification treatment chemicals 27 contained in the chemical tank 26 and flows into the vortex circulation device 30, using a vacuum pump (not shown). The exhaust to 32 can be actively activated while keeping the inside of the processing chamber 22 in a low vacuum state. In addition, the chemical tank 26 may be provided with an air control valve 26a to adjust the inflow of external air.
와류순환장치(30)내로 유입된 기체는 순환펌프(36)의 작용에 의해 순환액저장조(34)내에 저장된 순환액과 함께 기체흡입실(32) → 순환액저장조(34) → 냉각기(38) → 기체흡입실(32)…의 순서로 반복순환단계를 거치게 된다. 여기서, 순환액은 흡입되는 기체의 형태에 따라 산화제나 환원제 또는 적당히 조제된 약품으로 형성될 수 있다. 한편, 기체의 발생을 활발하게 하기 위해서 기체발생수단(23)을 통과하기 전에 예컨대 열교환기나 히터와 같이 하·폐수(10)를 가열하는 수단을 설치하여 처리실(22)내로 유입되는 하·폐수(10)를 예열하는 것이 바람직하다. 상기와 같이 반복순환이 진행되는 동안에는, 순환액저장조(34)에 저장된 순환액의 표면에서 연무형태의 습한 기체와 깨끗하고 건조한 기체가 발생한다. 이 중에서 연무형태의 습한 기체는 응축기(35)내에서 응축된 후 다시 순환액저장조(34)로 흘러 계속 반복순환되고(도 2의 B참조), 깨끗하고 건조한 상태의 정화기체만 순환액저장조(34) 밖으로 배기됨으로써(도 2의 A참조), 하·폐수(10)내에 포함된 오염된 공기를 깨끗하게 정화시킬 수 있게 된다.The gas introduced into the vortex circulation device 30 flows together with the circulating fluid stored in the circulating fluid storage tank 34 by the action of the circulating pump 36. The gas suction chamber 32 → the circulating fluid storage tank 34 → the cooler 38. → gas suction chamber 32. The repetition cycle steps in the order of. Here, the circulating fluid may be formed of an oxidizing agent, a reducing agent, or an appropriately formulated medicine according to the type of gas to be inhaled. On the other hand, in order to actively generate gas, before passing through the gas generating means 23, a means for heating the sewage / wastewater 10, such as a heat exchanger or a heater, is provided, and the sewage / wastewater flowing into the treatment chamber 22 ( It is preferable to preheat 10). During the repetitive circulation as described above, the mist-like wet gas and clean dry gas are generated on the surface of the circulating fluid stored in the circulating fluid storage tank 34. Among these, the mist type wet gas is condensed in the condenser 35, and then flows again to the circulating fluid storage tank 34 and is continuously circulated (see B of FIG. 2), and only the clean gas in the clean and dry state is circulated. 34) By exhausting outside (refer to A of FIG. 2), it becomes possible to clean the polluted air contained in the sewage and wastewater 10 cleanly.
한편, 약품조(26)의 처리약품(27)에 의해 발생된 기체와 반응하지 못한 액체상태의 하·폐수(10)는 처리실(22)의 하부와 연통되어 있는 수위조절조(28)에서 소정의 적정한 수위를 유지하면서 별도로 설치된 여과장치(도시되지 않음)로 배출되고, 이 여과장치에 의해 하·폐수(10)내에 함유된 불순물이나 색도, 탁도 등을 제거함으로써 하·폐수의 완전한 정화작업을 종료시킬 수 있다.On the other hand, the sewage and wastewater 10 in the liquid state that cannot react with the gas generated by the treatment chemicals 27 of the chemical tank 26 is predetermined in the water level control tank 28 in communication with the lower portion of the treatment chamber 22. The filter is discharged to a separate filter device (not shown) while maintaining the proper water level, and the filter device removes impurities, color, turbidity, etc. contained in the sewage and wastewater 10, thereby completely purifying sewage and wastewater. Can be terminated.
한편, 이상에서 설명한 본 발명은 상기 실시예에만 한정되는 것은 아니고, 첨부되는 청구범위에 의해 개시되는 본 발명의 범위내에서 다양한 응용예 및 변경예를 통해 실시할 수 있다.On the other hand, the present invention described above is not limited to the above embodiments, it can be carried out through various applications and modifications within the scope of the invention disclosed by the appended claims.
이상과 같이 구성된 본 발명에 따른 하·폐수내에 포함된 휘발성기체의 탈기정화시스템은, 소규모 설비로서 정화처리약품에 의한 반응을 이용하여 하·폐수내에 포함된 오염된 휘발성기체를 효율적으로 탈기정화하여 배기시킬 수 있으며, 이에 따라 시설비용이나 유지비용을 절감시킬 수 있다.The degassing and purification system of volatile gas contained in sewage and wastewater according to the present invention configured as described above is a small-scale facility to efficiently degassing and contaminated volatile gas contained in sewage and wastewater by using a reaction with a purification treatment chemical. Exhaust can be reduced, thereby reducing the cost of facilities and maintenance.
Claims (3)
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0437586U (en) * | 1990-07-30 | 1992-03-30 | ||
| KR940001419A (en) * | 1992-06-30 | 1994-01-11 | 김광호 | Semiconductor memory device and manufacturing method thereof |
| JPH10128307A (en) * | 1996-10-28 | 1998-05-19 | Japan Organo Co Ltd | Membrane degassing apparatus |
| KR19990043938A (en) * | 1997-11-29 | 1999-06-15 | 최홍복 | 5. Degassing method and apparatus of wastewater |
| KR20000053272A (en) * | 1996-11-15 | 2000-08-25 | 토르 제퍼슨 | Method and apparatus for separating volatile components from a liquid |
| KR20010057690A (en) * | 1999-12-23 | 2001-07-05 | 고학봉 | Apparatus for improving water quality of degassing system and method for improving water quality of water treatment by using it |
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2002
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Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0437586U (en) * | 1990-07-30 | 1992-03-30 | ||
| KR940001419A (en) * | 1992-06-30 | 1994-01-11 | 김광호 | Semiconductor memory device and manufacturing method thereof |
| JPH10128307A (en) * | 1996-10-28 | 1998-05-19 | Japan Organo Co Ltd | Membrane degassing apparatus |
| KR20000053272A (en) * | 1996-11-15 | 2000-08-25 | 토르 제퍼슨 | Method and apparatus for separating volatile components from a liquid |
| KR19990043938A (en) * | 1997-11-29 | 1999-06-15 | 최홍복 | 5. Degassing method and apparatus of wastewater |
| KR20010057690A (en) * | 1999-12-23 | 2001-07-05 | 고학봉 | Apparatus for improving water quality of degassing system and method for improving water quality of water treatment by using it |
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