KR100400163B1 - Method for manufacturing low reflective color filter substrate - Google Patents
Method for manufacturing low reflective color filter substrate Download PDFInfo
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- KR100400163B1 KR100400163B1 KR1019960047496A KR19960047496A KR100400163B1 KR 100400163 B1 KR100400163 B1 KR 100400163B1 KR 1019960047496 A KR1019960047496 A KR 1019960047496A KR 19960047496 A KR19960047496 A KR 19960047496A KR 100400163 B1 KR100400163 B1 KR 100400163B1
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- black matrix
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
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Abstract
Description
본 발명은 저반사 칼라필터기판의 제조방법에 관한 것으로, 더욱 상세하게는 적, 녹, 청색 패턴들(R),(G),(B)의 가장자리들에 격자형태로 중첩되는 블랙 매트리스의 중첩부분을 적절한 노광조건과 현상조건에서 제거하여 적, 녹, 청색 패턴들(R),(G),(B)의 표면을 평탄화함으로써 칼라필터기판의 신뢰성을 향상시키도록 한 저반사 칼라필터기판의 제조방법에 관한 것이다.The present invention relates to a method of manufacturing a low reflection color filter substrate, and more particularly, to a method of manufacturing a low reflection color filter substrate by superposing a black mattress superimposed in a lattice pattern on edges of red, green, and blue patterns R, G, Reflective color filter substrate to improve the reliability of the color filter substrate by flattening the surfaces of the red, green, and blue patterns R, G, and B by removing the portions of the red, And a manufacturing method thereof.
최근 화상정보의 전달매체로서 표시장치의 소형화 및 고품질화에 대한 관심이 집중됨에 따라 지금까지 사용되어 왔던 CRT(cathode ray tube)의 크고 무거운 단점을 해결할 수 있는 새로운 평판표시장치들이 개발되었다. 이러한 평판표시장치들중의 하나인 액정표시장치는 경박단소의 장점을 갖고 있어 CRT의 크고 무거운 단점을 해소할 수 있었다.Recently, attention has been focused on the miniaturization and high quality of display devices as a transmission medium of image information, and new flat panel display devices that can solve the large and heavy disadvantages of CRT (cathode ray tube) that have been used so far have been developed. One of such flat panel display devices has advantages of light and thin liquid crystal display, which can overcome a large and heavy drawback of the CRT.
액티브형 매트릭스형 액정표시장치는 매트릭스 형태로 배열된 각 화소들에 배선형 특성을 갖춘 액티브 소자들이 부가되어 액정의 전기광학적 효과에 메모리 기능이 구비된 것으로, 통상의 박막트랜지스터 또는 박막다이오드가 매트릭스의 화소선택형 어드레스 배선과 함께 유리 기판상에 수 만개 내지 수 백만개 집적화되어 매트릭스 회로를 구성하고 있다.In the active matrix type liquid crystal display device, active elements having wiring-type characteristics are added to each pixel arranged in a matrix form, and a memory function is provided for the electro-optic effect of the liquid crystal. In a typical thin film transistor or a thin film diode, Several tens of thousands to several millions of pixels are integrated on a glass substrate together with the pixel selection type address wiring to constitute a matrix circuit.
액티브형 매트릭스형 액정표시장치용 저반사 칼라필터를 이룩하기 위해 종래에는 칼라필터용 기판에 CrOx/Cr층으로 이루어진 다층 블랙 매트릭스를 형성하여 왔다. 이는 패널의 저반사를 달성할 수 있었으나 제조공정의 복잡화와 이로 인한 결함 발생율의 증가, 제조 원가의 상승, 제조공정중에 발생되는 오염 물질로 인한 환경 규제를 피하기 어려운 문제점이 있었다.In order to achieve a low reflection color filter for an active matrix liquid crystal display device, a multilayer black matrix made of a CrOx / Cr layer has been conventionally formed on a substrate for a color filter. This can achieve low reflection of the panel, but it has a problem that it is difficult to avoid environmental complaints due to the complication of the manufacturing process, the increase of the defect occurrence rate, the increase of the manufacturing cost, and the pollutants generated during the manufacturing process.
최근에는 이러한 문제점을 해결하기 위한 방안의 하나로서 블랙 매트릭스를 Cr 박막 대신에 유기탄소 감광막으로 형성하는 방안이 활발히 개발되고 있는 중이다. 하지만, 이 방법은 칼라필터기판 위에 적, 녹, 청색의 패턴들을 형성할 때 유기탄소 감광막으로 이루어진 블랙 매트릭스와 적, 녹, 청색의 패턴과의 중첩되는 부분의 단차가 높으므로 액정 주입공정시 칼라필터기판과 TFT기판 사이의 셀 간격을 일정하게 유지할 수 없는 불량을 유발시키는 문제점을 갖고 있었다.Recently, as a method for solving such a problem, a method of forming a black matrix as an organic carbon photoresist film instead of a Cr thin film is being actively developed. However, in this method, when the red, green and blue patterns are formed on the color filter substrate, the step of the overlapped portion of the black matrix made of the organic carbon photosensitive film and the pattern of red, green and blue is high, The cell spacing between the filter substrate and the TFT substrate can not be maintained constant.
이를 개선하기 위해 적, 녹, 청색의 패턴을 부분적으로 픽셀 도트타입(dot type)으로 전환하는 방안도 제시되었다.In order to solve this problem, a method of converting a pattern of red, green and blue into a pixel dot type has been proposed.
그러나, 이 방법 또한 미스얼라인(misalign)에 대한 적절한 해결 방법을 갖고 있지 않았다. 즉, 도 1에 도시된 바와 같이, 칼라필터기판(1) 위에 적, 녹, 청색 패턴들(R),(G),(B)이 형성할 때 미스얼라인이 발생하면, 유기탄소 감광막으로 이루어진 블랙 매트릭스(3)와 사각형상의 패턴들(R),(G),(B)과의 중첩되는 부분, 즉 패턴들(R),(G),(B)의 양측 가장자리를 따라 중첩 패턴들(5)이 길게 형성된다. 이 중첩패턴들(5)은 수 μm의 폭과 수천 내지 수만 Å의 높이를 갖고 있어 공통전극인 ITO 막을 상기 중첩패턴들(5)과 블랙 매트릭스(3) 위에 도포할 때, ITO막의 핀홀(pin hole)이 발생하는 문제점이 있었다. 또한, 액정 주입공정시 중첩 패턴들(5)이 깨어지고 중첩패턴들(5)의 조각이 액정의 표면에 떠있게 되므로 상기 공통전극의 저항이 높아지고 깨어진 조각으로 인한 액정 구동시 구동 불량이 발생하는 문제점이 있었다.However, this method also did not have a proper solution to the misalignment. That is, as shown in FIG. 1, when misalignment occurs when red, green, and blue patterns R, G, and B are formed on the color filter substrate 1, The overlapping patterns of the black matrix 3 and the rectangular patterns R, G, and B on the both sides of the patterns R, G, (5) is formed long. These overlapping patterns 5 have a width of several micrometers and a height of several thousands to several tens of thousands of angstroms so that when an ITO film as a common electrode is applied on the superimposition patterns 5 and the black matrix 3, holes are generated. In addition, during the liquid crystal injection process, the overlapping patterns 5 are broken and the pieces of the overlapping patterns 5 float on the surface of the liquid crystal, so that the resistance of the common electrode is increased and a driving failure occurs during liquid crystal driving due to broken pieces There was a problem.
따라서, 본 발명의 목적은 R,G,B 패턴의 블랙매트릭스와의 미스얼라인으로 인한 중첩패턴들의 발생을 억제하여 중첩패턴들로 인한 칼라필터기판의 신뢰성 저하를 방지할 수 있도록 한 저반사 칼라필터기판의 제조방법을 제공하는데 있다.SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide a low-reflection collar which can suppress the occurrence of superposition patterns due to misalignment with the black matrix of R, G, and B patterns, And a method for manufacturing the filter substrate.
도 1(A)는 종래 기술에 의한 블랙 매트릭스의 중첩패턴이 형성된 상태를 나타낸 평면도.Fig. 1 (A) is a plan view showing a state in which a superposition pattern of a black matrix according to the related art is formed.
도 1(B)는 도 1(A)의 A-A선을 따라 절단한 단면도.Fig. 1 (B) is a cross-sectional view taken along the line A-A in Fig. 1 (A). Fig.
도 2(A) 내지 도 2(C)는 본 발명에 의한 저반사 칼라필터기판의 제조방법을 나타낸 평면 공정도.2 (A) to 2 (C) are plan views showing a method of manufacturing a low reflection color filter substrate according to the present invention.
<도면의 주요 부분에 대한 부호의 설명>Description of the Related Art
1 : 칼라필터기판 3 : 블랙 매트릭스 5 : 중첩부분 11: 칼라필터기판 13: 블랙 매트릭스 15: 중첩부분1: color filter substrate 3: black matrix 5: overlapping portion 11: color filter substrate 13: black matrix 15: overlapping portion
이와 같은 목적을 달성하기 위한 본 발명은 정얼라인시 블랙 매트릭스 패턴의 가장자리가 R,G,B 패턴들의 가장자리를 따라 격자 형태로 위치시키고, 또한 노광조건과 현상조건에 따른 언더컷 현상을 이용하여 중첩부분들을 제거하여 R,G,B 패턴들의 표면을 평탄화시킴으로써 칼라필터기판의 신뢰성을 향상시키는 것을 특징으로 한다.In order to achieve the above object, according to the present invention, the edges of a black matrix pattern are aligned in a lattice pattern along the edges of R, G, and B patterns, and underlining is performed using exposure conditions and under- Portions are removed to improve the reliability of the color filter substrate by planarizing the surfaces of the R, G, and B patterns.
이하, 본 발명에 의한 저반사 칼라필터기판의 제조방법을 첨부된 도면을 참조하여 상세히 설명하기로 한다.Hereinafter, a method of manufacturing a low reflection color filter substrate according to the present invention will be described in detail with reference to the accompanying drawings.
도 2(A) 내지 도 2(C)는 본 발명에 의한 저반사 칼라필터기판의 제조방법을 나타낸 평면공정도이다.2 (A) to 2 (C) are plan views illustrating a method for manufacturing a low reflection color filter substrate according to the present invention.
도 2(A)에 도시된 바와 같이, 사진식각 공정을 이용하여 칼라필터기판(11) 위에 사각형상의 적, 녹, 청색 패턴들(R),(G),(B)을 형성한다.As shown in FIG. 2 (A), square red, green, and blue patterns R, G, and B are formed on the color filter substrate 11 using a photolithography process.
도 2(B)에 도시된 바와 같이, 적, 녹, 청색 패턴들(R),(G),(B)을 포함한 칼라필터기판(11)의 전면에 유기탄소 감광막을 도포한 후 적, 녹, 청색 패턴들(R),(G),(B)을 제외한 영역에 유기탄소 감광막의 블랙 매트릭스(13)의 패턴을 형성한다. 이때, 블랙 매트릭스(13)의 패턴은 패턴들(R),(G),(B)의 각 변을 따라 격자형태를 가지며 중첩하게 된다.An organic carbon photosensitive film is coated on the entire surface of the color filter substrate 11 including the red, green and blue patterns R, G and B as shown in FIG. 2 (B) The pattern of the black matrix 13 of the organic carbon photoresist is formed in the regions except for the blue patterns R, G, At this time, the pattern of the black matrix 13 has a lattice shape along the sides of the patterns R, G, and B and overlaps them.
따라서, 얼라인 또는 미스얼라인의 경우에 관계없이 패턴들(R),(G),(B)과 블랙 매트릭스(13)와의 중첩부분(15)이 항상 존재하게 되고, 또한 블랙 매트릭스(13)와 패턴들(R),(G),(B) 사이에 칼라필터기판(11)의 일부 영역이 노출되어 있다.Therefore, the overlapped portions 15 between the patterns R, G, and B and the black matrix 13 are always present irrespective of the case of the alignment or the misalignment, And a part of the color filter substrate 11 is exposed between the patterns R, G,
도 2(C)에 도시된 바와 같이, 노광조건과 현상조건에 따른 패턴의 언더컷(under cut) 현상 발생을 이용하여 중첩부분(15)을 적절한 현상조건에서 용이하게 제거할 수 있다. 따라서, 패턴들(R),(G),(B)은 중첩부분들(15)이 모두 제거된 평탄한 표면을 갖게 되어 평탄화된 패턴들영역(R),(G),(B)을 포함한 블랙 매트릭스(13)의 표면상에 공통전극인 ITO막을 양호한 상태로 형성할 수 있다.The overlapped portion 15 can be easily removed under appropriate developing conditions by utilizing the occurrence of the undercut phenomenon of the pattern according to the exposure condition and the developing condition, as shown in Fig. 2 (C). Thus, the patterns R, G, and B have a flat surface from which all of the overlapping portions 15 have been removed, so that the patterns R, G, and B including the planarized regions R, G, An ITO film, which is a common electrode, can be formed in a good state on the surface of the matrix 13.
이상에서 살펴본 바와 같이, 본 발명은 칼라필터기판 위에 적, 녹, 청색 패턴들(R),(G),(B)을 먼저 형성하고 패턴들(R),(G),(B)의 각 변을 따라 격자 형태로 중첩되는 유기탄소 감광막의 블랙 매트릭스를 형성한 후 패턴들(R),(G),(B)과 블랙 매트릭스와의 중첩부분을 노광조건과 현상조건을 적절히 조정하여 언더컷시켜 제거한다. 따라서, 본 발명은 평탄한 패턴들(R),(G),(B)을 용이하게 형성하여 칼라필터의 신뢰성을 향상시킬 수 있다.(R), (G), and (B) are first formed on the color filter substrate, and the patterns R, G, The black matrix of the organic carbon photoresist layer overlapped in the form of a lattice along the sides is formed, and the overlapping portions of the patterns R, G, and B with the black matrix are undercut by suitably adjusting exposure conditions and development conditions Remove. Therefore, the present invention can easily form the flat patterns R, G, and B to improve the reliability of the color filter.
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