KR100383869B1 - Polyimide resin - Google Patents
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- KR100383869B1 KR100383869B1 KR10-2000-0084528A KR20000084528A KR100383869B1 KR 100383869 B1 KR100383869 B1 KR 100383869B1 KR 20000084528 A KR20000084528 A KR 20000084528A KR 100383869 B1 KR100383869 B1 KR 100383869B1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
Abstract
본 발명은 신규한 폴리이미드 수지에 관한 것으로, 보다 상세하게는 디옥시테트라히드로퓨란-3-메틸시클로헥산-1,2-디카르복실산이무수물, 하기 화학식 1로 표시되는 디아민 군에서 선택되는 1종 이상의 디아민, 및 화학식 2으로 표시되는 디아민 군에서 선택되는 1종 이상의 디아민을 반응시켜 폴리아믹산을 제조하고 이를 이미드화시켜 제조된 폴리이미드 수지에 관한 것이며, 본 발명에 의해 인쇄성, 광투과성 및 액정배향성이 뛰어난 새로운 형태의 폴리이미드 수지를 제공할 수 있다.The present invention relates to a novel polyimide resin, more specifically, dioxytetrahydrofuran-3-methylcyclohexane-1,2-dicarboxylic dianhydride, 1 selected from the diamine group represented by the following formula (1) It relates to a polyimide resin prepared by reacting at least one diamine and at least one diamine selected from the group of diamines represented by the formula (2) to prepare a polyamic acid and imidize the same, and according to the present invention, printability, light transmittance and A new form of polyimide resin excellent in liquid crystal orientation can be provided.
[화학식 1][Formula 1]
[화학식 2][Formula 2]
상기 식에서 X는 수소원자이거나, R과 R'가 각각 수소원자, 탄소수 1∼18의 지방족 또는 방향족 탄화수소인 -O2CR, -CO2R, -NRR', -CONRR', -NCOR, -OCO2R, -OR, 또는 -R이고, R1은 탄소수 6∼18의 탄화수소이며, n과 m은 각각 1∼16의 정수이다.Wherein X is a hydrogen atom, or R and R 'are each a hydrogen atom, an aliphatic or aromatic hydrocarbon having 1 to 18 carbon atoms, -O 2 CR, -CO 2 R, -NRR', -CONRR ', -NCOR, -OCO It is 2R, -OR, or -R, R <1> is a C6-C18 hydrocarbon, n and m are the integers of 1-16, respectively.
Description
본 발명은 액정배향막으로 사용 가능한 신규 폴리이미드 수지에 관한 것으로서, 더욱 상세하게는 새로운 형태의 기능성 디아민 단량체를 포함하여 제조된, 인쇄성, 광투과성 및 액정배향성이 뛰어난 새로운 형태의 폴리이미드 수지에 관한 것이다.The present invention relates to a novel polyimide resin that can be used as a liquid crystal alignment film, and more particularly, to a new type of polyimide resin having excellent printability, light transmittance and liquid crystal alignment property, prepared by containing a new type of functional diamine monomer. will be.
일반적으로 폴리이미드 수지라 함은 방향족 테트라카르복실산 또는 그 유도체와 방향족 디아민 또는 방향족 디이소시아네이트를 축중합한 후 이미드화하여 제조되는 고내열 수지를 일컫는다. 이런 폴리이미드 수지는 사용된 단량체의 종류에 따라 여러가지의 분자구조를 가질 수 있다. 일반적으로 방향족 테트라카르복실산 성분으로는 PMDA (pyrometllitic dianhydride), BTDA(benzophenon tetracarboxylic dianhydride) 또는 BPDA (biphthalic anhydride)를 사용하고 있고, 방향족 디아민 성분으로서는 ODA (oxydianiline) 또는 p-PDA (p-phenylene diamine) 등을 사용하여 중합시켜 폴리아믹산 수지를 제조하고 이를 경화시켜 폴리이미드 수지를 만들며, 이는 하기 반응식 1로 표시될 수 있다.In general, the polyimide resin refers to a high heat-resistant resin prepared by condensation polymerization of an aromatic tetracarboxylic acid or a derivative thereof with an aromatic diamine or an aromatic diisocyanate followed by imidization. Such polyimide resins may have various molecular structures depending on the type of monomer used. Generally, aromatic tetracarboxylic acid components include pyrometllitic dianhydride (PMDA), benzophenon tetracarboxylic dianhydride (BTDA) or biphthalic anhydride (BPDA), and aromatic diamine components are ODA (oxydianiline) or p-PDA (p-phenylene diamine) ) To polymerize to prepare a polyamic acid resin and to cure it to form a polyimide resin, which may be represented by the following Scheme 1.
상기와 같은 폴리이미드 수지는 불융, 불용의 초고내열성 수지로서, (1) 뛰어난 내열 산화성을 보유하며, (2) 장기 사용온도는 약 260℃, 단기 사용온도는 480℃ 정도로 사용가능 온도가 매우 높은 내열특성을 보유할 뿐만 아니라, (3) 뛰어난 전기화학적, 기계적 특성, (4) 우수한 내방사선성, (5) 저온특성, (6) 고유 난연성 및 (7) 우수한 내약품성을 갖는다. 이러한 장점 때문에 자동차 재료, 항공소재, 우주선 소재 그리고 전자재료 등 광범위한 분야에 사용되고 있고, 최근에는 광섬유나 액정배향막 같은 표시재료 등에도 이용되고 있다.The polyimide resin as described above is an insoluble, insoluble ultra high heat resistant resin, which has (1) excellent heat oxidation resistance, and (2) long service temperature is about 260 ℃, and short service temperature is about 480 ℃. It not only possesses heat resistance, but also has (3) excellent electrochemical and mechanical properties, (4) excellent radiation resistance, (5) low temperature, (6) intrinsic flame retardancy and (7) good chemical resistance. Due to these advantages, it is used in a wide range of fields such as automotive materials, aviation materials, spacecraft materials, and electronic materials, and recently, it is also used in display materials such as optical fibers and liquid crystal alignment films.
이러한 특성 때문에 폴리이미드 수지는 고강성, 내열 구조재, 반도체용 버퍼 코트, 액정배향막 같은 전자재료 부문의 많은 용도에 적용되고 있다. 액정배향막은 TFT-LCD구동의 핵심재료로서 화상구현시 배광(backlight)의 광학 셔터(optical shutter) 역할을 하는 액정을 일정하게 배향을 시켜주는 역할을 한다. 액정배향막으로 적용되기 위해서는 고강도, 열안정성, 높은 인쇄성, 고 투과도, 저온경화성, 액정배향성 같은 특성이 요구되나 일반적인 폴리이미드 수지는 투과성, 저온경화성과 액정배향성이 약하기 때문에 이에 대한 보완이 필요하다. 투과성과 저온경화의 경우 지방족 단량체의 도입으로 사용가능한 범위까지 조절하여 왔으며, 액정배향막으로 사용가능할 정도의 액정배향성을 얻기 위해 긴 알킬기를 가진 기능성단량체를 사용하여 왔으나 그 수가 1,3-디아미노페닐기를 가지는 화합물에 한정되어 있어서 다양한 응용이 불가능 했다.Due to these characteristics, polyimide resins have been applied to many applications in the electronic materials sector such as high rigidity, heat resistant structural materials, buffer buffers for semiconductors, and liquid crystal alignment films. The liquid crystal alignment film is a key material of the TFT-LCD driving, and serves to align the liquid crystal which serves as an optical shutter of the backlight during image realization. In order to be applied to the liquid crystal alignment layer, properties such as high strength, thermal stability, high printability, high transmittance, low temperature curing property, and liquid crystal alignment property are required, but general polyimide resins need to be compensated for because of poor permeability, low temperature curing property, and liquid crystal alignment property. In the case of permeability and low temperature curing, it has been controlled to the range that can be used by introduction of aliphatic monomers, and functional monomers having long alkyl groups have been used to obtain liquid crystal alignment enough to be used as liquid crystal alignment films, but the number of 1,3-diaminophenyl groups It was limited to a compound having a variety of applications was impossible.
본 발명은 상기와 같은 종래 기술의 문제점을 해결한 것으로, 폴리이미드 수지의 특성을 향상시킬 수 있는 신규한 기능성 디아민 단량체를 사용하여 인쇄성, 광투과성 및 액정배향성이 우수한 폴리이미드 수지를 제공하는 것이다.The present invention solves the problems of the prior art as described above, to provide a polyimide resin excellent in printability, light transmittance and liquid crystal orientation using a novel functional diamine monomer that can improve the properties of the polyimide resin. .
즉 본 발명은 디옥시테트라히드로퓨란-3-메틸시클로헥산-1,2-디카르복실산이무수물, 하기 화학식 1로 표시되는 디아민 군에서 선택되는 1종 이상의 디아민, 및 화학식 2으로 표시되는 디아민 군에서 선택되는 1종 이상의 디아민을 반응시켜 폴리아믹산을 제조하고 이를 이미드화시켜 제조된 폴리이미드 수지에 관한 것이다.That is, the present invention is dioxytetrahydrofuran-3-methylcyclohexane-1,2-dicarboxylic dianhydride, at least one diamine selected from the diamine group represented by the following formula (1), and the diamine group represented by the formula (2) It relates to a polyimide resin prepared by reacting at least one diamine selected from to prepare a polyamic acid and imidize it.
상기 식에서 X는 수소원자이거나, R과 R'가 각각 수소원자, 탄소수 1∼18의 지방족 또는 방향족 탄화수소인 -O2CR, -CO2R, -NRR', -CONRR', -NCOR, -OCO2R, -OR, 또는 -R이고, R1은 탄소수 6∼18의 탄화수소이며, n과 m은 각각 1∼16의 정수이다.Wherein X is a hydrogen atom, or R and R 'are each a hydrogen atom, an aliphatic or aromatic hydrocarbon having 1 to 18 carbon atoms, -O 2 CR, -CO 2 R, -NRR', -CONRR ', -NCOR, -OCO It is 2R, -OR, or -R, R <1> is a C6-C18 hydrocarbon, n and m are the integers of 1-16, respectively.
본 발명의 폴리이미드 수지는 그 구조식 내에서 하기 화학식 3로 표시되는 디옥시테트라히드로퓨란-3-메틸시클로헥산-1,2-디카르복실산이무수물과 상기 화학식 2으로 표시되는 디아민 군에서 선택된 1종 이상의 디아민을 반드시 포함하는 것을 특징으로 한다.The polyimide resin of the present invention is selected from the dioxytetrahydrofuran-3-methylcyclohexane-1,2-dicarboxylic dianhydride represented by the following formula (3) and the diamine group represented by the formula (2) in the structural formula It is characterized by including necessarily diamine or more of species.
본 발명의 폴리이미드 수지는 디옥시테트라히드로퓨란-3-메틸시클로헥산-1,2-디카르복실산이무수물 및 상기 화학식 1로 표시되는 디아민 군에서 선택되는 1종 이상의 디아민과 화학식 2으로 표시되는 디아민 군에서 선택되는 1종 이상의 디아민의 혼합물을 용매 중에 첨가하여 전체 반응용액 중에 테트라카르복실산 이무수물과 디아민 단량체의 함량이 2∼40중량%가 되도록 한 다음, 0∼40℃에서 10∼48시간 동안 반응시켜 폴리 아믹산을 수득하고 이를 이미드화시켜 얻어진다.The polyimide resin of the present invention is represented by formula (2) and at least one diamine selected from dioxytetrahydrofuran-3-methylcyclohexane-1,2-dicarboxylic dianhydride and the diamine group represented by the formula (1). A mixture of one or more diamines selected from the diamine group is added in a solvent so that the content of tetracarboxylic dianhydride and diamine monomer in the total reaction solution is 2-40 wt%, and then 10-48 at 0-40 캜. By reaction for a time, a polyamic acid is obtained which is obtained by imidization.
이때 상기 디옥시테트라히드로퓨란-3-메틸시클로헥산-1,2-디카르복실산이무수물 이외에 하기 화학식 4로 표시되는 군에서 선택된 1종 이상의 테트라카르복실산 이무수물이 추가로 포함될 수 있다.In this case, in addition to the dioxytetrahydrofuran-3-methylcyclohexane-1,2-dicarboxylic dianhydride, one or more tetracarboxylic dianhydride selected from the group represented by the following Formula 4 may be further included.
폴리아믹산 중합시 사용되는 유기용매는 본 발명의 특유한 디아민 성분을 용해시킬 수 있고 반응을 방해하지 않는 한 특별히 제한되지 않으며, N-메틸-2-피롤리돈(NMP), N,N-디메틸 포름아마이드(DMF), N,N-디메틸 아세트 아마이드 (DMAc), 디메틸 설폭사이드(DMSO) 등을 이용할 수 있고 이외에도 THF, 클로로포름 등을 용매로 사용할 수 있다. 사용가능한 용매 가운데 상기 NMP, DMAc, DMF는 폴리아믹산의 중합시 중합반응의 촉매작용을 하고 이후의 이미드화 과정에서 이미드화를 촉진하므로 바람직하다.The organic solvent used in the polyamic acid polymerization is not particularly limited as long as it can dissolve the unique diamine component of the present invention and does not interfere with the reaction. N-methyl-2-pyrrolidone (NMP), N, N-dimethyl form Amide (DMF), N, N-dimethyl acetamide (DMAc), dimethyl sulfoxide (DMSO), and the like can be used. In addition, THF, chloroform and the like can be used as a solvent. Among the solvents that can be used, NMP, DMAc, and DMF are preferable because they catalyze the polymerization reaction during the polymerization of the polyamic acid and promote imidization in the subsequent imidization process.
상기 폴리아믹산의 이미드화는 구체적으로 가열판이나 오븐을 사용하여 100∼120℃에서 건조시키고, 질소분위기 하의 오븐에서 서서히 승온하여 250∼350℃의 온도범위에서 30분∼2시간 정도 가열하는 방법에 의해 이루어질 수 있다.Specifically, the imidization of the polyamic acid is performed by heating at 100 to 120 ° C. using a heating plate or an oven, gradually increasing the temperature in an oven under a nitrogen atmosphere, and heating the temperature to a temperature range of 250 to 350 ° C. for about 30 minutes to 2 hours. Can be done.
상기와 같은 방법으로 제조된 본 발명의 폴리이미드 수지는 하기 화학식 5와 같은 구조를 지닌다.Polyimide resin of the present invention prepared by the above method has a structure as shown in the following formula (5).
상기 식에서은 디옥시테트라히드로퓨란-3-메틸시클로헥산-1,2-디카르복실산이무수물 및/또는 상기 화학식 4에서 표시되는 구조 중 선택되는 하나 이상의 구조일 수 있고,는 상기 화학식 1 및 2으로 표시되는 구조에서선택되는 하나 이상의 구조일 수 있다.In the above formula May be one or more structures selected from dioxytetrahydrofuran-3-methylcyclohexane-1,2-dicarboxylic dianhydride and / or a structure represented by Formula 4, May be one or more structures selected from the structures represented by Formulas 1 and 2.
본 발명에 따른 폴리이미드 수지는 2,000~150,000g/mole 정도의 중량평균분자량(Mw)을 가지며 0.2~1.5dL/g 범위의 고유점도를 유지하고 있고, 230~350℃의 유리전이 온도를 가진다. 또한, 본 발명의 폴리이미드 수지는 DMAc, DMF, NMP와 같은 극성 용매를 비롯하여 m-크레졸과 같은 유기용매에 대해 상온에서 쉽게 용해되는 특징을 가진다. 뿐만 아니라 테트라하이드로퓨란 (이하, THF라 표기함), 클로로포름과 같은 저비점 용액, 그리고 γ-부티로락톤과 같은 저흡습성 용매에 대해서도 상온에서 10중량% 이상의 높은 용해도를 나타낸다. 또한 이들의 혼합용매에 대해서도 높은 용해도를 나타낸다.Polyimide resin according to the present invention has a weight average molecular weight (Mw) of about 2,000 ~ 150,000g / mole and maintains the intrinsic viscosity in the range of 0.2 ~ 1.5dL / g, and has a glass transition temperature of 230 ~ 350 ℃. In addition, the polyimide resin of the present invention is easily dissolved at room temperature with respect to organic solvents such as m-cresol, including polar solvents such as DMAc, DMF, and NMP. In addition, it exhibits high solubility of 10% by weight or more at room temperature for tetrahydrofuran (hereinafter referred to as THF), low boiling point solution such as chloroform, and low hygroscopic solvent such as γ-butyrolactone. Moreover, high solubility is shown also about these mixed solvents.
이와 같은 본 발명을 하기 실시예를 통하여 보다 상세하게 설명하나, 하기의 실시예는 설명의 목적을 위한 것으로 본 발명을 제한하고자 하는 것은 아니다.Although the present invention will be described in more detail with reference to the following examples, the following examples are for the purpose of explanation and are not intended to limit the present invention.
제조예 1: 4-니트로프탈릭 언하이드라이드와 도데카노익 애시드 1,1'-디(아미노메틸)메틸 에스테르를 사용한 디아민 화합물의 제조 Preparation Example 1 : Preparation of diamine compound using 4-nitrophthalic anhydride and dodecanoic acid 1,1'-di (aminomethyl) methyl ester
교반기, 질소주입 장치가 부착된 500ml의 반응기에 질소가스를 서서히 통과시키면서 도데카노익 애시드 1,1'-디(아미노메틸)메틸 에스테르 27.2g(0.1mole)을 반응용매인 디메틸아세트아미드 150ml에 용해시킨 후, 질소가스를 통과시키면서 고체상의 니트로프탈릭 언하이드라이드 42.5g(0.22mole)를 30분에 걸쳐 첨가하였다.반응이 종료된 후 반응혼합물을 과량의 증류수에 침전시키고, 여과된 고체를 중탄산나트륨 수용액과 묽은 염산 수용액으로 수차례 세척한 후 60℃의 온도에서 감압건조하여 디니트로 화합물을 제조하였다. 이때 반응 수율은 97%이었다.Dissolve 27.2 g (0.1 mole) of dodecanoic acid 1,1'-di (aminomethyl) methyl ester in 150 ml of dimethylacetamide as a reaction solvent while slowly passing nitrogen gas through a 500 ml reactor equipped with a stirrer and a nitrogen injection device. 42.5 g (0.22 mole) of solid nitrophthalic anhydride was added over 30 minutes while passing through nitrogen gas. After the reaction was completed, the reaction mixture was precipitated in excess distilled water, and the filtered solid was bicarbonate. After washing several times with an aqueous sodium solution and diluted aqueous hydrochloric acid solution, the dinitro compound was prepared by drying under reduced pressure at a temperature of 60 ℃. At this time, the reaction yield was 97%.
다시 에탄올 200ml에 상기에서 제조된 디니트로화합물(10g)을 녹인 후 Pd/C (5%) 1.5g과 함께 수소반응기에 넣은 다음 40℃에서 3시간 동안 환원반응을 실시하였다. 반응종료 후 반응혼합물을 셀라이트를 이용하여 여과한후 반응 용매를 감압증류하였다. 에틸아세테이트/헥산(1:1) 공용매에서 재결정한 후 83.4% 수율로 분자량이 598인 하기 화학식 6의 디아민 화합물을 얻었다.The dinitro compound (10 g) prepared above was dissolved in 200 ml of ethanol, and then placed in a hydrogen reactor with 1.5 g of Pd / C (5%), followed by a reduction reaction at 40 ° C. for 3 hours. After completion of the reaction, the reaction mixture was filtered using Celite, and the reaction solvent was distilled under reduced pressure. After recrystallization in an ethyl acetate / hexane (1: 1) co-solvent to give a diamine compound of formula 6 having a molecular weight of 598 in 83.4% yield.
상기 식에서 X는 -O(CH2)11CH3이다.Wherein X is -O (CH 2 ) 11 CH 3 .
제조예 2: 이미드 고리를 가진 4-니트로프탈릭 언하이드라이드와 도데카노익 애시드(1,1'-디(아미노메틸)메틸 에스테르를 사용한 디아민 화합물의 제조 Preparation Example 2 : Preparation of diamine compound using 4-nitrophthalic anhydride having an imide ring and dodecanoic acid (1,1'-di (aminomethyl) methyl ester
교반기, 질소주입 장치가 부착된 500ml의 반응기에 질소가스를 서서히 통과시키면서 도데카노익 애시드2-(1,3-디아미노프로필) 에스테르 27.2g(0.1mole)을 반응용매인 디메틸아세트아미드 150ml에 용해시킨 후, 질소가스를 통과시키면서 고체상의 4-니트로프탈릭 언하이드라이드 38.6g(0.2mole)를 30분에 걸쳐 첨가하였다.추가로 2시간동안 반응을 시킨 후 아세틱언하이드라이드 0.3mole을 넣고 다시 3분 후 피리딘 0.5mole을 넣은 다음 반응온도를 100℃로 올려 3시간동안 반응시켰다. 반응이 종료된 후 반응혼합물을 과량의 증류수에 침전시키고, 여과된 고체를 중탄산나트륨 수용액과 묽은 염산 수용액으로 수차례 세척한후 60℃의 온도에서 감압건조하여 디니트로 화합물을 제조하였다. 이때 반응 수율은 78% 이었다.27.2 g (0.1 mole) of dodecanoic acid 2- (1,3-diaminopropyl) ester was dissolved in 150 ml of dimethylacetamide as a reaction solvent while slowly passing nitrogen gas through a 500 ml reactor equipped with a stirrer and a nitrogen injection device. After passing through nitrogen gas, 38.6 g (0.2 mole) of solid 4-nitrophthalic anhydride was added over 30 minutes. After reacting for another 2 hours, 0.3 mole of acetic anhydride was added thereto. After 3 minutes, pyridine 0.5mole was added and the reaction temperature was raised to 100 ° C. for 3 hours. After the reaction was completed, the reaction mixture was precipitated in excess distilled water, and the filtered solid was washed several times with an aqueous sodium bicarbonate solution and a diluted hydrochloric acid solution, and then dried under reduced pressure at a temperature of 60 ° C. to prepare a dinitro compound. At this time, the reaction yield was 78%.
다시 에탄올 200ml에 상기에서 제조된 디니트로화합물(10g)을 녹인 후 Pd/C (5%) 1.5g과 함께 수소반응기에 넣은 다음 40℃에서 3시간 동안 환원반응을 실시하였다. 반응종료 후 반응혼합물을 셀라이트를 이용하여 여과한 후 반응 용매를 감압증류하였다. 에틸아세테이트/헥산(1:1) 공용매에서 재결정한 후 58.5% 수율로 분자량이 562인 화학식 7의 디아민 화합물을 얻었다.The dinitro compound (10 g) prepared above was dissolved in 200 ml of ethanol, and then placed in a hydrogen reactor with 1.5 g of Pd / C (5%), followed by a reduction reaction at 40 ° C. for 3 hours. After completion of the reaction, the reaction mixture was filtered using Celite, and the reaction solvent was distilled under reduced pressure. After recrystallization in ethyl acetate / hexane (1: 1) cosolvent to obtain a diamine compound of formula 7 having a molecular weight of 562 in 58.5% yield.
상기 식에서 X는 -O(CH2)11CH3이다.Wherein X is -O (CH 2 ) 11 CH 3 .
제조예 3: 4-니트로벤조익 애시드와 도데카노익 애시드 1,1'-디(아미노메틸)메틸 에스테르를 이용한 디아민 화합물의 제조 Preparation Example 3 Preparation of Diamine Compound Using 4-nitrobenzoic Acid and Dodecanoic Acid 1,1′-di (aminomethyl) methyl Ester
교반기, 질소주입 장치가 부착된 500ml의 반응기에 질소가스를 서서히 통과시키면서 도데카노익 애시드 2-(1,3-디아미노프로필)에스테르 27.2g(0.1mole)과 트리에틸아민25g(0.25mole)을 반응용매인 디메틸아세트아미드 150ml에 용해시킨 후, 질소가스를 통과시키면서 50ml의 디메틸아세트아미드에 용해시킨 40.6g의 니트로벤조익 클로라이드(0.22mole)를 30분에 걸쳐 첨가하였다. 반응이 종료된 후 반응혼합물을 과량의 증류수에 침전시키고, 여과된 고체를 중탄산나트륨 수용액과 묽은 염산 수용액으로 수차례 세척한후 60℃의 온도에서 감압건조하여 디니트로 화합물을 제조하였다. 이때 반응 수율은 85%였다.27.2 g (0.1 mole) of dodecanoic acid 2- (1,3-diaminopropyl) ester and 25 g (0.25 mole) of triethylamine were added while slowly passing nitrogen gas through a 500 ml reactor equipped with a stirrer and a nitrogen injection device. After dissolving in 150 ml of dimethylacetamide as a reaction solvent, 40.6 g of nitrobenzoic chloride (0.22 mole) dissolved in 50 ml of dimethylacetamide while passing through nitrogen gas was added over 30 minutes. After the reaction was completed, the reaction mixture was precipitated in excess distilled water, and the filtered solid was washed several times with an aqueous sodium bicarbonate solution and a diluted hydrochloric acid solution, and then dried under reduced pressure at a temperature of 60 ° C. to prepare a dinitro compound. The reaction yield was 85%.
다시 에탄올 200ml에 상기에서 제조된 디니트로화합물(10g)을 녹인 후 Pd/C (5%) 1.5g과 함께 수소반응기에 넣은 다음 40℃에서 3시간 동안 환원반응을 실시하였다. 반응종료 후 반응혼합물을 셀라이트를 이용하여 여과한 후 반응 용매를 감압증류하였다. 에틸아세테이트/헥산(1:1) 공용매에서 재결정한 후 78.2% 수율로 분자량이 508인 화학식 8의 디아민 화합물을 얻었다.The dinitro compound (10 g) prepared above was dissolved in 200 ml of ethanol, and then placed in a hydrogen reactor with 1.5 g of Pd / C (5%), followed by a reduction reaction at 40 ° C. for 3 hours. After completion of the reaction, the reaction mixture was filtered using Celite, and the reaction solvent was distilled under reduced pressure. After recrystallization in an ethyl acetate / hexane (1: 1) cosolvent to obtain a diamine compound of formula 8 having a molecular weight of 508 in 78.2% yield.
상기 식에서 X는 -O(CH2)11CH3이다.Wherein X is -O (CH 2 ) 11 CH 3 .
제조예 4: 4-니트로벤조익 애시드와 도데카노익 애시드 1,1'-디(히드록시메틸)메틸 에스테르를 사용한 디아민 화합물의 제조 Preparation Example 4 Preparation of Diamine Compound Using 4-nitrobenzoic Acid and Dodecanoic Acid 1,1′-di (hydroxymethyl) methyl Ester
교반기, 질소주입 장치가 부착된 500ml의 반응기에 질소가스를 서서히 통과시키면서 1,6-헥산디올 11.8g(0.1mole)과 트리에틸아민25g(0.25mole)을 반응용매인 디메틸아세트아미드 150ml에 용해시킨 후, 질소가스를 통과시키면서 50ml의 디메틸아세트아미드에 용해시킨 40.6g의 니트로벤조익 클로라이드(0.22mole)를 30분에 걸쳐 첨가하였다. 반응이 종료된 후 반응혼합물을 과량의 증류수에 침전시키고, 여과된 고체를 중탄산나트륨 수용액과 묽은 염산 수용액으로 수차례 세척한후 60℃의 온도에서 감압건조하여 디니트로 화합물을 제조하였다. 이때 반응 수율은 83% 이었다.11.8 g (0.1 mole) of 1,6-hexanediol and 25 g (0.25 mole) of triethylamine were dissolved in 150 ml of dimethylacetamide as a reaction solvent while slowly passing nitrogen gas through a 500 ml reactor equipped with a stirrer and a nitrogen injection device. Thereafter, 40.6 g of nitrobenzoic chloride (0.22 mole) dissolved in 50 ml of dimethylacetamide was added over 30 minutes while passing through nitrogen gas. After the reaction was completed, the reaction mixture was precipitated in excess distilled water, and the filtered solid was washed several times with an aqueous sodium bicarbonate solution and a diluted hydrochloric acid solution, and then dried under reduced pressure at a temperature of 60 ° C. to prepare a dinitro compound. At this time, the reaction yield was 83%.
다시 에탄올 200ml에 상기에서 제조된 디니트로화합물(10g)을 녹인 후 Pd/C (5%) 1.5g과 함께 수소반응기에 넣은 다음 40℃에서 3시간 동안 환원반응을 실시하였다. 반응종료 후 반응혼합물을 셀라이트를 이용하여 여과한 후 반응 용매를 감압증류하였다. 에틸아세테이트/헥산(1:1) 공용매에서 재결정한 후 77.2% 수율로 분자량이 506인 화학식 9의 디아민 화합물을 얻었다.The dinitro compound (10 g) prepared above was dissolved in 200 ml of ethanol, and then placed in a hydrogen reactor with 1.5 g of Pd / C (5%), followed by a reduction reaction at 40 ° C. for 3 hours. After completion of the reaction, the reaction mixture was filtered using Celite, and the reaction solvent was distilled under reduced pressure. After recrystallization in ethyl acetate / hexane (1: 1) cosolvent to obtain a diamine compound of formula 9 having a molecular weight of 506 in 77.2% yield.
상기 식에서 X는 -O(CH2)11CH3이다.Wherein X is -O (CH 2 ) 11 CH 3 .
제조예 5: 4,4'-디아미노벤젠과 5-도데콕시이소프탈릭 애시드를 사용한 디아민 화합물의 제조 Preparation Example 5 Preparation of Diamine Compound Using 4,4'-Diaminobenzene and 5-dodecoxyisophthalic Acid
교반기, 질소주입 장치가 부착된 500ml의 반응기에 질소가스를 서서히 통과시키면서 5-도데콕시이소프탈릭 애시드 35g(0.1mole)을 반응용매인 N-메틸피롤리디논 150ml에 용해시킨 후, 질소가스를 통과시키면서 고체상의 4,4'-디아미노벤젠 10.8 g(0.2mole)를 5분에 걸쳐 첨가한 후 30g의 자일렌을 추가하여 180℃로 승온시키고 4시간동안 반응시켜 생성하는 물을 완전히 제거하였다. 이 반응혼합물에서 용매를 제거한 후 헥산-에틸아세테이트 용매에서 재결정한 후 60℃의 온도에서 감압건조하여 디니트로 화합물을 제조하였다. 이때 반응 수율은 48% 이었다.While slowly passing nitrogen gas through a 500 ml reactor equipped with a stirrer and a nitrogen injection device, 35 g (0.1 mole) of 5-dodecoxyisophthalic acid was dissolved in 150 ml of N-methylpyrrolidinone as a reaction solvent, followed by nitrogen gas. While passing through, 10.8 g (0.2 mole) of solid 4,4'-diaminobenzene was added over 5 minutes, and then 30 g of xylene was added to raise the temperature to 180 ° C and react for 4 hours to completely remove the produced water. . After removing the solvent from the reaction mixture and recrystallized in hexane-ethyl acetate solvent to dry under reduced pressure at a temperature of 60 ℃ to prepare a dinitro compound. At this time, the reaction yield was 48%.
다시 에탄올 200ml에 상기에서 제조된 디니트로화합물 (10g)를 녹인후 Pd/C (5%) 1.5g과 함께 수소반응기에 넣은 다음 40℃에서 3시간 동안 환원반응시켰다. 반응종료 후 반응혼합물을 셀라이트를 이용하여 여과한 후 반응 용매를 감압증류하였다. 에틸아세테이트/헥산(1:1) 공용매에서 재결정한 후 48% 수율로 분자량이 430인 화학식 10의 디아민 화합물을 얻었다.The dinitro compound (10 g) prepared above was dissolved in 200 ml of ethanol, and then placed in a hydrogen reactor with 1.5 g of Pd / C (5%), followed by reduction for 3 hours at 40 ° C. After completion of the reaction, the reaction mixture was filtered using Celite, and the reaction solvent was distilled under reduced pressure. After recrystallization in ethyl acetate / hexane (1: 1) co-solvent to obtain a diamine compound of formula 10 having a molecular weight of 430 in 48% yield.
상기 식에서 X는 -O(CH2)11CH3이다.Wherein X is -O (CH 2 ) 11 CH 3 .
제조예 6Preparation Example 6
교반기, 온도조절장치, 질소주입장치, 적하깔대기 및 냉각기를 부착한 500mL의 반응기에 질소가스를 서서히 통과시키면서 p-PDA (9.72g, 0.09mole)과 상기 제조예 1의 변성디아민(5.98g, 0.01mole)을 반응용매 NMP(169.5 ml)에 용해시킨 후 질소가스를 통과시키면서 고체상의 디옥시테트라히드로퓨란-3-메틸시클로헥산-1,2-디카르복실산이무수물(이하 DOCDA라 함) 26.4g(0.1mole)를 서서히 첨가하였다. 이때 고형분 농도는 20중량%로 고정하였으며 25℃에서 10시간 동안 반응을 진행하였다. 반응이 종료된 후 원하는 조성으로 용매를 첨가하여 새로운 폴리아믹산 수지(이하 PA-1라 표기함)을 합성하였다. 이때 중합반응의 수율은 정량적이었다.P-PDA (9.72 g, 0.09 mole) and modified diamine of Preparation Example 1 (5.98 g, 0.01) while slowly passing nitrogen gas through a 500 mL reactor equipped with a stirrer, a temperature controller, a nitrogen injection device, a dropping funnel and a cooler. 26.4 g of dioxytetrahydrofuran-3-methylcyclohexane-1,2-dicarboxylic dianhydride (hereinafter referred to as DOCDA) in solid form while dissolving mole) in a reaction solvent NMP (169.5 ml) and passing nitrogen gas. (0.1 mole) was added slowly. At this time, the solid content concentration was fixed at 20% by weight and the reaction was performed at 25 ° C for 10 hours. After the reaction was completed, a new polyamic acid resin (hereinafter referred to as PA-1) was synthesized by adding a solvent in a desired composition. The yield of polymerization was quantitative.
제조예 7Preparation Example 7
p-PDA (9.72g, 0.09mole), 제조예 2에 의한 변성디아민 (5.62g, 0.01mole) 및 DOCDA (26.4g, 0.1mole)를 NMP(168.1 ml)에 용해시킨 후, 상기 제조예 6과 동일한 방법으로 새로운 폴리아믹산 수지(이하 PA-2이라 표기함)를 합성하였다.p-PDA (9.72 g, 0.09 mole), modified diamine (5.62 g, 0.01 mole) and DOCDA (26.4 g, 0.1 mole) according to Preparation Example 2 were dissolved in NMP (168.1 ml), and In the same manner, a new polyamic acid resin (hereinafter referred to as PA-2) was synthesized.
제조예 8Preparation Example 8
p-PDA (9.72g, 0.09mole), 제조예 3에 의한 변성디아민(5.08g, 0.01mole) 및 DOCDA (26.4g, 0.1mole)를 NMP(164.8 ml)에 용해시킨 후, 상기 제조예 6과 동일한 방법으로 새로운 폴리아믹산 수지(이하 PA-3이라 표기함)를 합성하였다.p-PDA (9.72 g, 0.09 mole), modified diamine (5.08 g, 0.01 mole) according to Preparation Example 3 and DOCDA (26.4 g, 0.1 mole) were dissolved in NMP (164.8 ml), and then Preparation Example 6 and In the same manner, a new polyamic acid resin (hereinafter referred to as PA-3) was synthesized.
제조예 9Preparation Example 9
p-PDA (9.72g, 0.09mole), 제조예 4에 의한 변성디아민(3.56g, 0.01mole) 및DOCDA (26.4g, 0.1mole)를 NMP(158.7 ml)에 용해시킨 후, 상기 제조예 6과 동일한 방법으로 폴리아믹산수지(이하 PA-4이라 표기함)를 합성하였다.p-PDA (9.72 g, 0.09 mole), modified diamine (3.56 g, 0.01 mole) and DOCDA (26.4 g, 0.1 mole) according to Preparation Example 4 were dissolved in NMP (158.7 ml), and In the same manner, a polyamic acid resin (hereinafter referred to as PA-4) was synthesized.
제조예 10Preparation Example 10
p-PDA (9.72g, 0.09mole), 제조예 5에 의한 변성디아민(4.3g 0.01mole) 및 DOCDA (26.4g, 0.1mole)를 NMP(158.7 ml)에 용해시킨 후, 상기 제조예 6과 동일한 방법으로 폴리아믹산수지(이하 PA-5이라 표기함)를 합성하였다.p-PDA (9.72g, 0.09mole), modified diamine (4.3g 0.01mole) according to Preparation Example 5 and DOCDA (26.4g, 0.1mole) was dissolved in NMP (158.7 ml), the same as in Preparation Example 6 Polyamic acid resin (hereinafter referred to as PA-5) was synthesized by the method.
비교제조예 1Comparative Production Example 1
교반기, 온도조절장치, 질소주입장치, 적하깔대기 및 냉각기를 부착한 50mL의 반응기에 질소가스를 서서히 통과시키면서 p-PDA (9.72g, 0.09mole)과 변성 디아민 DA-L-4M(2.07g, 0.01mole)를 반응용매 메타크레졸에 용해시킨 후 질소가스를 통과시키면서 고체상의 DOCDA(26.4g , 0.1mole)를 서서히 첨가하였다. 이때 고형분 농도(solid content)는 15중량%로 고정하였으며 반응 온도를 70℃까지 승온한후 2시간 반응을 진행하였다. 계속하여 환류온도까지 승온한후 6~12시간동안 교반시켰다. 이때 이미드화 촉매로서 이소퀴놀린 (1~5중량페센트)을 사용하였다. 반응이 종료된 후, 반응 혼합물은 와링 블랜더(waring blender)를 이용하여 과량의 메탄올에 침전시키고, 여과된 중합체를 물과 메탄올로 수차례 세척한후, 120℃의 온도에서 감압건조하여 폴리이미드 수지 (이하 PI-1이라 표기함)를 합성하였다. 이때 중합반응의 수율은 정량적이었다. 메타크레졸을 용매로 하여 0.5g/dL의 농도로 30℃에서 측정한 고유점도는 1.31dL/g 이었다.P-PDA (9.72 g, 0.09 mole) and modified diamine DA-L-4M (2.07 g, 0.01) while slowly passing nitrogen gas through a 50 mL reactor equipped with a stirrer, temperature controller, nitrogen injector, dropping funnel and cooler. After dissolving mole) in the reaction solvent methacresol, a solid DOCDA (26.4 g, 0.1 mole) was slowly added while passing through nitrogen gas. At this time, the solid content concentration (solid content) was fixed to 15% by weight and the reaction temperature was raised to 70 ℃ and then the reaction was carried out for 2 hours. The temperature was then raised to reflux and stirred for 6-12 hours. At this time, isoquinoline (1-5 weight percent) was used as the imidization catalyst. After the reaction was completed, the reaction mixture was precipitated in excess methanol using a waring blender, the filtered polymer was washed several times with water and methanol, and then dried under reduced pressure at a temperature of 120 ° C to form a polyimide resin. (Hereinafter referred to as PI-1) were synthesized. The yield of polymerization was quantitative. The intrinsic viscosity measured at 30 ° C at a concentration of 0.5 g / dL using methacresol as a solvent was 1.31 dL / g.
비교제조예 2Comparative Production Example 2
교반기, 온도조절장치, 질소주입장치, 적하깔대기 및 냉각기를 부착한 500mL의 반응기에 질소가스를 서서히 통과시키면서 P-PDA (9.72g, 0.09mole)과 변성 디아민 DAP-12(2.72g, 0.01mole)을 반응용매 NMP(157.8 ml)에 용해시킨 후 질소가스를 통과시키면서 고체상의 DOCDA (26.4g , 0.1mole)를 서서히 첨가하였다. 이때 고형분 농도 (solid content)는 20중량%로 고정하였으며 반응 온도는 25℃에서 10시간 동안 반응을 진행하였다. 반응이 종료된 후 원하는 조성으로 용매를 첨가하여 신규 폴리아믹산 수지(이하 PA-6이라 표기함)를 합성하였다. 이때 중합반응의 수율은 정량적이었다.P-PDA (9.72g, 0.09mole) and modified diamine DAP-12 (2.72g, 0.01mole) while slowly passing nitrogen gas through 500mL reactor equipped with stirrer, temperature controller, nitrogen injector, dropping funnel and cooler Was dissolved in reaction solvent NMP (157.8 ml) and slowly added DOCDA (26.4 g, 0.1 mole) as a solid while passing through nitrogen gas. At this time, the solid content (solid content) was fixed at 20% by weight and the reaction temperature was carried out for 10 hours at 25 ℃. After the reaction was completed, a new polyamic acid resin (hereinafter referred to as PA-6) was synthesized by adding a solvent with a desired composition. The yield of polymerization was quantitative.
실시예 1: 폴리이미드 수지의 특성 Example 1 Properties of Polyimide Resin
상기 제조예 6 내지 10 및 비교예 1, 2에서 제조된 폴리아믹산, 폴리이미드 수지의 고유점도, 유리전이온도 등의 특성을 측정하여 이를 표 1에 나타내었다.Characteristics of the polyamic acid and polyimide resin prepared in Preparation Examples 6 to 10 and Comparative Examples 1 and 2 were measured, and the properties such as glass transition temperature are shown in Table 1 below.
[물성측정방법][Measurement of physical properties]
* 고유점도: NMP를 용매로 하여 0.5g/dL의 농도로 폴리아믹산 수지 또는 폴리이미드 수지를 용해시키고 30℃에서 측정하였다.Intrinsic viscosity: The polyamic acid resin or the polyimide resin was dissolved at a concentration of 0.5 g / dL using NMP as a solvent, and measured at 30 ° C.
* 유리전이온도: 시차주사열량계(differential scanning calorimeter)를 이용해서 측정하였다.* Glass transition temperature: Measured using a differential scanning calorimeter (differential scanning calorimeter).
* 경화율: 2 마이크로미터의 두께로 폴리이미드 수지를 도포한 뒤 핫플레이트상에서 180℃/10분 동안 경화시킨 다음 IR(Infrared Spectroscopy : 적외선 분광계)을 이용해서 경화율을 측정하였다.* Curing rate: The polyimide resin was applied to a thickness of 2 micrometers, and then cured for 180 ° C./10 minutes on a hot plate, and then the curing rate was measured using IR (Infrared Spectroscopy).
실시예 2: Example 2 :
상기 제조예 6 내지 10 및 비교제조예 1, 2의 폴리아믹산을 투명 전극이 있는 유리기판에 스핀코팅방법에 의해 도포하고, 180℃로 1시간 소성하여 두께 약 700Å의 도막을 형성시켰다. 형성된 도막면을 러빙 머신으로 러빙하고, 러빙 후 박리여부를 현미경으로 관찰한 후, 2장의 기판을 5㎛의 갭으로 접합하고, 액정 (마크社의 ZLI-5081)을 주입하여 TN 액정 셀을 제작하였다. 이를 사용하여 배향특성을 관찰하고, 그 결과를 표 2에 나타내었다.The polyamic acids of Preparation Examples 6 to 10 and Comparative Preparation Examples 1 and 2 were applied to a glass substrate with a transparent electrode by spin coating, and then baked at 180 ° C. for 1 hour to form a coating film having a thickness of about 700 mm 3. After rubbing the formed coating surface with a rubbing machine, and observing whether or not peeling after rubbing under a microscope, the two substrates were bonded by a gap of 5㎛, the liquid crystal (Mark ZLI-5081) is injected to prepare a TN liquid crystal cell It was. The orientation characteristic was observed using this, and the result is shown in Table 2.
실시예 3: 인쇄특성의 측정 Example 3 Measurement of Printing Properties
제조예 6 내지 10 및 비교제조예 1 및 2의 폴리아믹산수지를 일반 유기용매로 희석하여 5 중량%가 되도록 만든 후 롤 코터(Roll Coater)를 이용해 인쇄하고 핫 플래에트 상에서 가열한 후 코팅막의 상태를 관찰하였다. 표 3에 나타낸 바와 같이 본 발명의 폴리이미드 수지들은 기존의 수지에 비해 막 균일도가 우수하며 핀홀의 발생이 현저히 감소하였다.The polyamic acid resins of Preparation Examples 6 to 10 and Comparative Preparation Examples 1 and 2 were diluted to 5% by weight with a general organic solvent, printed using a roll coater, heated on a hot plate, and then coated. Was observed. As shown in Table 3, the polyimide resins of the present invention have excellent film uniformity and significantly reduce the occurrence of pinholes, compared to conventional resins.
본 발명에 의한 폴리이미드 수지를 사용하여 액정 배향막을 제조하는 경우, 인쇄성, 광투과성 및 액정배향성이 우수한 액정 배향막을 제공할 수 있다.When manufacturing a liquid crystal aligning film using the polyimide resin by this invention, the liquid crystal aligning film excellent in printability, light transmittance, and liquid crystal orientation can be provided.
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JPH04227635A (en) * | 1991-04-04 | 1992-08-17 | Mitsui Toatsu Chem Inc | Production of aromatic polyamide-polyimide copolymer |
JPH1039312A (en) * | 1996-07-24 | 1998-02-13 | Hitachi Chem Co Ltd | Liquid crystal orienting film, liquid crystal holding substrate with the same, liquid crystal display device and material for liquid crystal orienting film |
KR100205963B1 (en) * | 1997-05-29 | 1999-07-01 | 이서봉 | Novel soluble polyimide resin for liquid crystal orientation film |
KR100228722B1 (en) * | 1997-09-12 | 1999-11-01 | 김충섭 | Novel soluble polyimide resin having alkoxy substituent and its preparation process |
KR20010011184A (en) * | 1999-07-26 | 2001-02-15 | 유현식 | Polyamic acid random copolymer and Polyimide random copolymer |
KR20010017541A (en) * | 1999-08-12 | 2001-03-05 | 유현식 | Polyimide resin and preparation method thereof |
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JPH04227635A (en) * | 1991-04-04 | 1992-08-17 | Mitsui Toatsu Chem Inc | Production of aromatic polyamide-polyimide copolymer |
JPH1039312A (en) * | 1996-07-24 | 1998-02-13 | Hitachi Chem Co Ltd | Liquid crystal orienting film, liquid crystal holding substrate with the same, liquid crystal display device and material for liquid crystal orienting film |
KR100205963B1 (en) * | 1997-05-29 | 1999-07-01 | 이서봉 | Novel soluble polyimide resin for liquid crystal orientation film |
KR100228722B1 (en) * | 1997-09-12 | 1999-11-01 | 김충섭 | Novel soluble polyimide resin having alkoxy substituent and its preparation process |
KR20010011184A (en) * | 1999-07-26 | 2001-02-15 | 유현식 | Polyamic acid random copolymer and Polyimide random copolymer |
KR20010017541A (en) * | 1999-08-12 | 2001-03-05 | 유현식 | Polyimide resin and preparation method thereof |
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