KR100365128B1 - A Decorative Flooring Having Hologram Pattern and the Method of Manufacturing thereof - Google Patents

A Decorative Flooring Having Hologram Pattern and the Method of Manufacturing thereof Download PDF

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KR100365128B1
KR100365128B1 KR1020000056185A KR20000056185A KR100365128B1 KR 100365128 B1 KR100365128 B1 KR 100365128B1 KR 1020000056185 A KR1020000056185 A KR 1020000056185A KR 20000056185 A KR20000056185 A KR 20000056185A KR 100365128 B1 KR100365128 B1 KR 100365128B1
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layer
weight
parts
pattern
hologram
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KR1020000056185A
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KR20020024442A (en
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한일수
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주식회사 엘지화학
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form
    • B32B3/26Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
    • B32B3/30Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by a layer formed with recesses or projections, e.g. hollows, grooves, protuberances, ribs
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00Ancillary operations in connection with laminating processes
    • B32B38/06Embossing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00Ancillary operations in connection with laminating processes
    • B32B38/14Printing or colouring
    • B32B38/145Printing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B5/00Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
    • B32B5/22Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed
    • B32B5/24Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being a fibrous or filamentary layer
    • B32B5/245Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being a fibrous or filamentary layer another layer next to it being a foam layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2262/00Composition or structural features of fibres which form a fibrous or filamentary layer or are present as additives
    • B32B2262/10Inorganic fibres
    • B32B2262/101Glass fibres

Abstract

본 발명은 홀로그램 무늬를 가진 바닥장식재 및 그 제조방법에 관한 것으로, 보다 상세하게는 홀로그램 무늬 엠보싱용 필름(40)으로 표면처리층(25) 상부를 엠보싱하여 표면처리층(25) 상부 전체면에 홀로그램 무늬를 부여하거나 또는 홀로그램 무늬가 형성된 열전사 필름(50)을 투명스킨층(24) 상부에 전사하여 투명스킨층(24) 상부 전체면에 홀로그램 무늬층(55)을 적층하여 광폭의 홀로그램 무늬층(55)을 형성시킴으로써, 인쇄층(23)의 인쇄 무늬와 홀로그램 무늬가 어우러지도록 한 바닥장식재 및 그 제조방법에 관한 것이다.The present invention relates to a flooring material having a holographic pattern and a method of manufacturing the same, and more particularly, to the entire surface of the upper surface of the surface treatment layer 25 by embossing the upper surface treatment layer 25 with the holographic pattern embossing film 40. A hologram pattern having a wide hologram pattern by transferring a heat transfer film 50 having a hologram pattern or a hologram pattern formed on the transparent skin layer 24 and laminating the hologram pattern layer 55 on the entire upper surface of the transparent skin layer 24. By forming the layer 55, it relates to a flooring material and a method of manufacturing the printed pattern 23 and the holographic pattern to match.

이러한 본 발명의 홀로그램 무늬를 가진 바닥장식재는 인쇄층(23)의 인쇄무늬와 홀로그램 무늬가 어우러져 보는 각도에 따라 다양한 무늬 및 무지개 색채 효과와 유사한 색상을 창출하고, 입체효과를 극대화시키는 효과가 있다.The flooring material having a hologram pattern of the present invention creates a color similar to various patterns and rainbow color effects and maximizes a three-dimensional effect according to the angle at which the printed pattern and the hologram pattern of the printing layer 23 are combined.

Description

홀로그램 무늬를 가진 바닥장식재 및 그 제조방법{A Decorative Flooring Having Hologram Pattern and the Method of Manufacturing thereof}A decorative flooring having hologram pattern and the method of manufacturing pretty}

본 발명은 홀로그램 무늬를 가진 바닥장식재 및 그 제조방법에 관한 것으로, 보다 상세하게는 홀로그램 무늬 엠보싱용 필름으로 표면처리층 상부를 엠보싱하여 표면처리층 상부 전체면에 홀로그램 무늬를 부여하거나 또는 홀로그램 무늬가 형성된 열전사 필름을 투명스킨층 상부에 전사하여 투명스킨층 상부 전체면에 홀로그램 무늬층을 적층하여 광폭의 홀로그램 무늬층을 형성시킴으로써, 인쇄층의 인쇄 무늬와 홀로그램 무늬가 어우러지도록 한 바닥장식재 및 그 제조방법에 관한 것이다.The present invention relates to a flooring material having a hologram pattern and a method of manufacturing the same, and more particularly, to give a hologram pattern to the entire surface of the upper surface treatment layer by embossing the upper surface treatment layer with a holographic pattern embossing film, or The bottom decorative material which transfers the formed thermal transfer film on the transparent skin layer and forms a wide hologram pattern layer by laminating a hologram pattern layer on the entire upper surface of the transparent skin layer, so that the printed pattern and the hologram pattern of the printed layer are combined. It relates to a manufacturing method.

여기서 홀로그램(Hologram)이란 빛의 간섭(干涉)을 이용한 사진법인 홀로그래피(Holography)에 의한 사진으로 한마디로, 레이저로 촬영하는 3차원 이미지라고 말할 수 있다.Here, the hologram is a photo by holography, which is a photographing method using interference of light. In other words, a hologram is a three-dimensional image taken by a laser.

이러한 홀로그램을 좀더 상세히 설명하면 다음과 같다.The hologram will be described in more detail as follows.

레이저 광원에서 나온 간섭성 빛을 빔스플리터(beam splitter)로 둘로 나누어 그중 한 광선은 피사체(被寫體)를 비추게 하면 피사체 표면에서 난반사된 빛이 홀로그래피 감광재료에 도달하는데 이 광선을 물체광(物體光)이라고 하고, 나머지 다른 한 광선은 렌즈로 확산시켜 직접 홀로그래피 감광재료 전면에 비추게 하는데 이 광선을 참조광(參照光)이라고 한다.The coherent light from the laser light source is divided into two beam splitters, and one of the beams causes the object to shine. When the light is diffusely reflected from the surface of the object, it reaches the holographic photosensitive material. It is called object light, and the other light is diffused through the lens to directly shine onto the holographic photosensitive material. This light is called reference light.

이렇게 되면 홀로그래피 감광재료 상에 물체광과 참조광이 서로 간섭현상을 일으켜 1㎜당 500 - 1500개 정도의 매우 섬세하고 복잡한 간섭무늬를 만드는데, 이 간섭무늬를 기록한 사진을 홀로그램이라 하는 것이다.In this case, the object light and the reference light interfere with each other on the holographic photosensitive material to produce 500 to 1500 very delicate and complicated interference patterns per mm, and the pictures of the interference patterns are called holograms.

이와 같이 하여 만든 홀로그램에 참조광과 같은 광선을 쬐면 간섭무늬가 회절격자(回折格子)의 역할을 해서 참조광이 입사한 방향과 다른 위치에서 빛이 회절되는데, 이 같은 회절광이 모인 것이 마치 처음 물체에서 반사해서 생긴 빛과 같이 되는데, 이렇게 함으로써 홀로그램에서 처음의 물체광이 재생된다.When a beam such as the reference light is applied to the hologram formed as described above, the interference pattern acts as a diffraction grating, and the light is diffracted at a position different from the direction in which the reference light is incident. It is like a reflection of light, which reproduces the first object light in the hologram.

그렇기 때문에 재생된 파면(波面) 안에서 들여다보면 처음 물체가 보이기는 하나 마치 물체가 저 안쪽에 있는 것처럼 보인다. 다시 점을 옮기면 물체가 보이는 위치도 변하여 마치 입체사진을 보는 것처럼 보인다. 또한 원래 물체의 파면이 재생되기 때문에 아주 약간 변형한 물체에서 나오는 파면과도 간섭시킬 수가 있는 것이다.Therefore, if you look inside the regenerated wavefront, you see the first object, but it looks as if the object is in there. If you move the point again, the position of the object changes, as if you were viewing a three-dimensional image. Also, because the wavefront of the original object is regenerated, it can interfere with the wavefront from a slightly deformed object.

종래에 홀로그램을 이용한 바닥장식재의 경우, 공개실용신안 번호 제 98-7040을 보면 "홀로그램이 내장된 칩을 이용한 바닥재" 라는 제목으로 공개된 것을볼수 있는데, 이는 도 3에서 보는 바와 같이, 가운데에 기재함침층(10)을 중심으로 기재함침층(10) 상부에 아래부터 차례대로 인쇄층(23), 접착층(26) 및 투명상부층 (27)으로 이루어지고, 기재함침층(10) 하부에 하부발포층(31)으로 이루어진 구조의 바닥재이다.Conventionally, in the case of a flooring material using a hologram, when looking at the Utility Model No. 98-7040, it can be seen that it was published under the title of "floor material using a chip with a hologram embedded therein," as shown in FIG. Consisting of the printing layer 23, the adhesive layer 26, and the transparent upper layer 27 in order from the bottom to the base impregnation layer 10 on the base impregnation layer 10, and lower foaming under the substrate impregnation layer 10. It is a floor covering having a layer 31.

그 제조방법을 간략히 살펴보면, 기재함침층(10), 인쇄층(23), 접착층(26)의 순서로 적층한 후에, 접착층(26)의 상부에 산포기를 이용하여 칩(28)을 산포시킨 다음, 투명상부층(27)을 코팅한 후, 하부발포층(31)을 적층시킨 것으로, 이때의 칩(28)은 수지, 가소제, 안정제, 발포제, 안료 또는 펄 안료에 홀로그램(28')을 적당한 비율로 혼합하여 반바리믹서나 압출기를 이용하여 용융시킨 다음, 카렌다를 이용하여 성형한 후, 분쇄하거나 컴파운드상에서 가열혼합함으로써 만든 정형 또는 무정형으로 만든 것이다. 이때 사용되는 홀로그램(28')은 소정의 필름 위에 알루미늄을 진공증착시켜서 만든 것으로 양면이 은박이나 금박으로 빛나는 시트를 말한다.The manufacturing method is briefly described. After stacking the substrate impregnated layer 10, the printed layer 23, and the adhesive layer 26 in order, the chip 28 is spread on the adhesive layer 26 using a spreader. Next, the transparent upper layer 27 is coated, and then the lower foaming layer 31 is laminated. At this time, the chip 28 is suitable for the hologram 28 'to a resin, a plasticizer, a stabilizer, a foaming agent, a pigment, or a pearl pigment. They are mixed in proportion, melted using a half-barrier mixer or extruder, and then molded using a calender, then pulverized or heat-mixed on a compound to form a amorphous or amorphous form. The hologram 28 'used here is a sheet made by vacuum evaporation of aluminum on a predetermined film, and refers to a sheet of which both surfaces shine with silver foil or gold foil.

즉, 종래의 홀로그램을 사용한 바닥장식재의 투명상부층(27)에는 안료 또는 펄 안료와 홀로그램(28')을 함께 투여하여 성형된 칩(28)이 포함되어 있어, 칩(28) 부위에서만 홀로그램(28')에 효과가 나타났기 때문에 나름대로의 고급감은 줄수 있었으나, 인쇄층(23)의 인쇄 무늬와 홀로그램 무늬가 어우러짐으로써 보는 각도에 따라 인쇄 무늬가 바뀌어 나타나게 되는 다양한 입체적 효과는 표현할 수 없었다.That is, the transparent upper layer 27 of the floor decoration material using a conventional hologram includes a chip 28 formed by administering a pigment or pearl pigment and the hologram 28 'together, and the hologram 28 only at the chip 28 portion. Because the effect was shown in '), it could give its own sense of quality, but it could not express various three-dimensional effects in which the printed pattern was changed according to the viewing angle because the printed pattern and the hologram pattern of the printed layer 23 were combined.

이에 본 발명에서는 홀로그램 무늬 엠보싱용 필름으로 표면처리층 상부를 엠보싱하여 표면처리층 상부 전체면에 홀로그램 무늬를 부여하거나, 홀로그램 무늬가 형성된 열전사 필름을 투명스킨층 상부에 전사하여 투명스킨층 상부 전체면에 홀로그램 무늬층을 적층하여 광폭의 홀로그램 무늬층을 형성시킴으로써, 인쇄층의 인쇄무늬와 홀로그램 무늬가 어우러지도록 한 바닥장식재 및 그 제조방법을 제공하고자 한다.Therefore, in the present invention, the holographic pattern embossing film is embossed on the upper surface treatment layer to give a hologram pattern on the entire surface of the surface treatment layer, or the heat transfer film having the hologram pattern formed on the transparent skin layer is transferred to the upper part of the transparent skin layer. By forming a hologram pattern layer by laminating a hologram pattern layer on a surface, it is intended to provide a flooring material and a method of manufacturing the printed pattern of the printed layer and the hologram pattern.

도 1a은 본 발명의 홀로그램 무늬를 가지는 바닥장식재의 단면도.Figure 1a is a cross-sectional view of the flooring material having a holographic pattern of the present invention.

도 1b는 도 1a의 바닥장식재의 제조공정도.Figure 1b is a manufacturing process of the floor decoration of Figure 1a.

도 1c는 도 1a의 바닥장식재에 사용되는 홀로그램 무늬 엠보싱용 필름의 단면도.Figure 1c is a cross-sectional view of the holographic pattern embossing film used for the floor decoration of Figure 1a.

도 2a는 본 발명의 홀로그램 무늬를 가지는 바닥장식재의 다른 단면도.Figure 2a is another cross-sectional view of the flooring material having a holographic pattern of the present invention.

도 2b는 도 2a의 바닥장식재의 제조공정도.Figure 2b is a manufacturing process of the floor decoration of Figure 2a.

도 2c는 도 2a의 바닥장식재에 사용되는 홀로그램 무늬가 형성된 열전사 필름의 단면도.FIG. 2C is a cross-sectional view of a holographic patterned thermal transfer film used for the flooring material of FIG. 2A. FIG.

도 3은 종래의 바닥장식재의 단면도.3 is a cross-sectional view of a conventional floor decoration.

(도면의 주요부분에 대한 부호의 설명)(Explanation of symbols for the main parts of the drawing)

10 : 기재함침층 20 : 표면층10: substrate impregnation layer 20: surface layer

21 : 발포층 22 : 비발포층21: foam layer 22: non-foaming layer

23 : 인쇄층 24 : 투명스킨층23: printed layer 24: transparent skin layer

25 : 표면처리층 25': 홀로그램 엠보스25: surface treatment layer 25 ': hologram embossed

26 : 접착층 27 : 투명상부층26: adhesive layer 27: transparent upper layer

28 : 칩 28': 홀로그램28: chip 28 ': hologram

30 : 이면층 31 : 하부발포층30: back layer 31: lower foam layer

40 : 홀로그램 무늬 엠보싱용 필름40: holographic pattern embossing film

41 : PET 필름 42 : 홀로그램 엠보스41: PET film 42: hologram emboss

50 : 홀로그램 무늬가 형성된 열전사 필름50: holographic patterned thermal transfer film

51 : PET 필름 52 : 이형층51: PET film 52: release layer

53 : 광택층 54 : 투명증착층53: gloss layer 54: transparent deposition layer

55 : 홀로그램 무늬층 56 : 접착층55 Hologram Pattern Layer 56 Adhesive Layer

이하 첨부도면에 의거하여 본 발명을 상세히 설명하면 다음과 같다.Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

먼저, 홀로그램 무늬 엠보싱용 필름을 사용하여 표면처리층의 상부에 홀로그램 무늬를 엠보싱하는 방법을 설명한다.First, the method of embossing a hologram pattern on the surface treatment layer using the hologram pattern embossing film is demonstrated.

도 1a는 본 발명의 홀로그램 무늬를 가진 바닥장식재의 단면도로서, 기재함침층(10), 기재함침층(10) 상부의 표면층(20) 및 기재함침층(10) 하부의 이면층 (30)으로 이루어진다.Figure 1a is a cross-sectional view of the flooring material having a holographic pattern of the present invention, the substrate impregnation layer 10, the surface layer 20 on the substrate impregnation layer 10 and the back layer 30 below the substrate impregnation layer 10 Is done.

이때 표면층(20)은 기재함침층(10) 위에 아래부터 차례대로 발포층(21) 또는 비발포층(22), 인쇄층(23), 투명스킨층(24) 및 홀로그램 엠보스(25')가 형성된 표면처리층(25)으로 이루어지고, 이면층(30)은 하부발포층(31)으로 이루어진다.At this time, the surface layer 20 is the foam layer 21 or the non-foaming layer 22, the printing layer 23, the transparent skin layer 24 and the hologram embossed 25 'in order from below on the substrate impregnation layer 10 It is made of a surface treatment layer 25 is formed, the back layer 30 is made of a lower foam layer (31).

이러한 본 발명의 홀로그램 무늬를 가진 바닥장식재를 제조하는 공정을 다음의 도 1b를 통해 살펴본다.The process of manufacturing a flooring material having a holographic pattern of the present invention looks through the following Figure 1b.

도 1b는 도 1a의 바닥장식재의 제조공정도로서, 기재함침층(10)을 제조하는단계 ; 기재함침층(10)의 상부에 발포층(21) 또는 비발포층(22)을 형성하는 단계 ; 발포층(21) 또는 비발포층(22)의 상부에 인쇄층(23)을 형성하는 단계 ; 인쇄층(23)의 상부에 투명스킨층(24)을 형성하는 단계 ; 기재함침층(10)의 하부에 하부발포층 (31)을 형성하는 단계 ; 투명스킨층(24)의 상부에 표면처리층(25)을 형성하는 단계 ; 표면처리층(25)의 상부에 홀로그램 엠보스(25')를 형성하는 단계로 이루어진 제조공정을 보인다.FIG. 1B is a manufacturing process diagram of the floor decorative material of FIG. 1A, which includes preparing a substrate impregnation layer 10; Forming a foamed layer 21 or a non-foamed layer 22 on top of the substrate impregnation layer 10; Forming a printing layer 23 on top of the foam layer 21 or the non-foaming layer 22; Forming a transparent skin layer 24 on top of the printed layer 23; Forming a lower foaming layer 31 on the lower portion of the substrate impregnation layer 10; Forming a surface treatment layer 25 on top of the transparent skin layer 24; It shows a manufacturing process consisting of forming a hologram embossed 25 'on top of the surface treatment layer 25.

이러한 제조공정을 상세히 살펴보면 다음과 같다.Looking at the manufacturing process in detail as follows.

먼저, 제품의 기재가 되는 기재함침층(10)을 제조한다.First, the substrate impregnation layer 10 which becomes a base material of a product is manufactured.

기재함침층(10)은 유리섬유, 모조지 등의 기재 위에 기재함침층(10)의 조성물을 0.35 - 0.50㎜의 두께로 압착나이프코팅한 후, 150 - 180℃의 오븐에서 30 - 50m/min.의 속도로 1 - 2분간 가열하여 겔(gel)화시켜 형성시킨다.Substrate impregnation layer 10 is a pressure-sensitive coating of the composition of the substrate impregnation layer 10 to a thickness of 0.35-0.50mm on a substrate such as glass fiber, imitation paper, etc., and then 30-50m / min in an oven at 150-180 ℃. It is formed by gelation by heating at a rate of 1-2 minutes.

이러한 기재함침층(10)의 조성은 중합도가 1000 - 2000인 염화비닐수지 100중량부에 가소제인 디옥틸프탈레이트 20 - 50중량부, 부틸벤질프탈레이트 15 - 50중량부, 내열안정제인 바륨-아연계 화합물 1 - 5중량부, 안료인 산화티탄 1 - 20중량부, 충전제인 중탄산칼슘 1 - 170중량부 및 기타첨가제로서 장기 저온 내열 보강을 위한 에폭시수지 1 - 5중량부(두유(豆油)를 사용하므로 경화제가 필요없음)를 혼합하여 졸(sol) 상태로 만든 것이다.The composition of the base impregnated layer 10 is 20-50 parts by weight of dioctylphthalate as a plasticizer, 15-50 parts by weight of butylbenzylphthalate, and barium-zinc as a heat stabilizer. Compound 1-5 parts by weight, pigment titanium oxide-1-20 parts by weight, filler 1-170 parts by weight of calcium bicarbonate, and other additives-1-5 parts by weight of epoxy resin for long-term low-temperature heat reinforcement Therefore, it does not need a curing agent) to make a sol (sol) state by mixing.

다음, 기재함침층(10)의 상부에 쿠션감을 부여하는 발포층(21)을 형성시키거나, 제품의 경도를 부여하는 비발포층(22)을 형성시킨다.Next, the foam layer 21 imparting a cushioning feeling is formed on the substrate impregnation layer 10, or the non-foaming layer 22 imparting the hardness of the product is formed.

발포층(21)은 발포층(21)의 조성물을 기재함침층(10)의 상부에 0.1 - 0.3㎜의 두께로 나이프코팅한 다음, 150 - 200℃의 오븐에서 30 - 50m/min.의 속도로 1 - 2분간 가열하여 겔화시켜 형성시킨다.The foamed layer 21 is knife coated with a composition of the foamed layer 21 to a thickness of 0.1-0.3 mm on top of the impregnated layer 10, and then a speed of 30-50 m / min. In an oven at 150-200 ℃ It is formed by gelling by heating for 1-2 minutes.

이러한 발포층(21)의 조성은 중합도가 1000 - 2000인 염화비닐수지 100중량부에 1차가소제인 디옥틸프탈레이트 40 - 60중량부, 2차가소제인 파라핀계 화합물 10 - 20중량부, 발포제인 아조디카본아미드 1 - 5중량부, 발포촉진제인 아연화 0.5 - 4중량부, 발포안정제인 바륨-아연계 화합물 0.5 - 3중량부, 안료인 산화티탄 1 - 5중량부, 충전제인 중탄산칼슘 1 - 100중량부 및 기타첨가제로서 점도저하제 0.2 - 1.5중량부를 혼합한 것이다.The foamed layer 21 is composed of 40 to 60 parts by weight of dioctylphthalate as a primary plasticizer, 10 to 20 parts by weight of paraffinic compound as a secondary plasticizer, and 100 parts by weight of a vinyl chloride resin having a polymerization degree of 1000 to 2000. 1-5 parts by weight of azodicarbonamide, 0.5-4 parts by weight of zinc oxide as a foaming accelerator, 0.5-3 parts by weight of barium-zinc compound as a foam stabilizer, 1-5 parts by weight of titanium oxide as a pigment, and calcium bicarbonate as a filler. 100 parts by weight and 0.2 to 1.5 parts by weight of viscosity reducing agent are mixed as other additives.

비발포층(22)은 비발포층(22)의 조성물을 기재함침층(10)의 상부에 0.1 - 0.3㎜의 두께로 나이프코팅한 다음, 150 - 200℃의 오븐에서 25 - 50m/min.의 속도로 1 - 2분간 가열하여 겔화시켜 형성시킨다.The non-foaming layer 22 was knife coated with a thickness of 0.1-0.3 mm on top of the impregnating layer 10, based on the composition of the non-foaming layer 22, and then 25-50 m / min in an oven at 150-200 deg. It is formed by gelling by heating for 1-2 minutes at the rate of.

이러한 비발포층(22)의 조성은 중합도가 1000 - 3000인 염화비닐수지 100중량부에 1차가소제인 디옥틸프탈레이트 20 - 40중량부, 부틸벤질프탈레이트 10 - 20중량부, 2차가소제인 파라핀계 화합물 10 - 20중량부, 충전제인 중탄산칼슘 1 - 100중량부, 안료인 산화티탄 1 - 5중량부, 내열안정제인 바륨-아연계 화합물 1 - 10중량부 및 기타첨가제로서 장기 저온 내열 보강을 위한 에폭시수지 1 - 5중량부(두유(豆油)를 사용하므로 경화제가 필요없음)를 혼합한 것이다.The composition of the non-foaming layer 22 is 20-40 parts by weight of dioctylphthalate as primary plasticizer, 100 parts by weight of vinyl chloride resin having a degree of polymerization of 1000-3000, 10-20 parts by weight of butylbenzylphthalate, and paraffin as secondary plasticizer. 10-20 parts by weight of the compound, 1-100 parts by weight of calcium bicarbonate as a filler, 1-5 parts by weight of titanium oxide as a pigment, 1-10 parts by weight of a barium-zinc-based compound as a heat stabilizer, and other additives. Epoxy resin for 1-5 parts by weight (using a soy milk (豆油) does not need a curing agent) is a mixture.

다음, 발포층(21) 또는 비발포층(22)의 상부에 그라비아 인쇄 또는 전사 인쇄로 소정의 인쇄무늬를 인쇄하여 인쇄층(23)을 형성시켜 건조한 다음, 이 인쇄층(23)의 상부에 투명도 및 내구성을 부여하고, 또한 인쇄층(23)의 무늬를 보호하는 투명스킨층(24)을 형성시킨다.Next, a predetermined printed pattern is printed by gravure printing or transfer printing on the foamed layer 21 or the non-foamed layer 22 to form a printed layer 23 and dried, and then on the top of the printed layer 23. The transparent skin layer 24 which provides transparency and durability, and protects the pattern of the printing layer 23 is formed.

투명스킨층(24)은 투명스킨층(24)의 조성물을 인쇄층(23)의 상부에 0.2 - 0.5㎜의 두께로 나이프코팅한 다음, 160 - 180℃의 오븐에서 10 - 30m/min.의 속도로 1 - 2분간 가열하여 겔화시켜 형성시킨다.The transparent skin layer 24 is knife coated with a composition of the transparent skin layer 24 to a thickness of 0.2-0.5 mm on the upper part of the printing layer 23, and then 10-30 m / min. Formed by gelation by heating for 1-2 minutes at speed.

이러한 투명스킨층(24)의 조성은 중합도가 1700 - 1750인 염화비닐수지 100중량부에 1차가소제인 디옥틸프탈레이트 30 - 60중량부, 2차가소제인 파라핀계 화합물 5 - 15중량부, 내열안정제인 바륨-아연계 화합물 2 - 5중량부 및 기타첨가제로서 장기 저온 내열 보강을 위한 에폭시수지 2 - 5중량부(두유(豆油)를 사용하므로 경화제가 필요없음) 및 점도저하제 0.1 - 3중량부를 혼합한 것이다.The transparent skin layer 24 is composed of 30 to 60 parts by weight of dioctylphthalate as a primary plasticizer, 5 to 15 parts by weight of paraffinic compound as a secondary plasticizer, and 100 parts by weight of vinyl chloride resin having a polymerization degree of 1700 to 1750. 2 to 5 parts by weight of a barium-zinc compound as a stabilizer and 2 to 5 parts by weight of epoxy resin for long-term low temperature heat reinforcement (no need for a curing agent because soy milk is used) and 0.1 to 3 parts by weight of a viscosity reducing agent It is a mixture.

다음, 기재함침층(10)의 하부에 쿠션감을 부여하는 하부발포층(31)을 형성시킨다.Next, a lower foaming layer 31 for imparting a cushioning feeling to the lower portion of the substrate impregnation layer 10 is formed.

하부발포층(31)은 하부발포층(31)의 조성물을 기재함침층(10)의 하부에 0.2 - 1.0㎜의 두께로 나이프코팅한 다음, 190 - 200℃의 오븐에서 5 - 30m/min.의 속도로 30 - 90초간 가열하여 겔화시켜 형성시킨다.The lower foaming layer 31 was knife coated with a thickness of 0.2-1.0 mm on the bottom of the impregnation layer 10 based on the composition of the lower foaming layer 31, and then 5-30 m / min in an oven at 190-200 ° C. Formed by gelation by heating at a rate of 30-90 seconds.

이러한 하부발포층(31)의 조성은 중합도가 1100 - 1200인 염화비닐수지 100중량부에 1차가소제인 디옥틸프탈레이트 20 - 60중량부, 부틸벤질프탈레이트 2 - 10중량부, 2차가소제인 파라핀계 화합물 5 - 15중량부, 유기안료 1 - 10중량부, 발포제인 아조디카본아미드 1 - 7중량부, 발포촉진제인 아연화 1 - 4중량부, 발포안정제인 바륨-아연계 화합물 0.5 - 5중량부, 안료인 산화티탄 0.2 - 5중량부, 충전제인 중탄산칼슘 1 - 150중량부를 혼합한 것이다.The lower foaming layer 31 has a composition of 100 to 100 parts by weight of vinyl chloride resin having a polymerization degree of 1100 to 1200, 20 to 60 parts by weight of dioctylphthalate as a primary plasticizer, 2 to 10 parts by weight of butylbenzylphthalate, and paraffin as a secondary plasticizer. 5-15 parts by weight of a compound, 1-10 parts by weight of an organic pigment, 1-7 parts by weight of azodicarbonamide, which is a blowing agent, 1-4 parts by weight of zincation, a foaming accelerator, and 0.5-5 parts by weight of a barium-zinc compound, which is a foam stabilizer. Parts, 0.2-5 parts by weight of titanium oxide, which is a pigment, and 1-150 parts by weight of calcium bicarbonate, which is a filler, are mixed.

다음, 투명스킨층(24)의 상부에 표면 강도 유지를 위한 표면처리층(25)을 형성시킨다.Next, a surface treatment layer 25 is formed on the transparent skin layer 24 to maintain surface strength.

표면처리층(25)은 표면처리층(25)의 조성물을 투명스킨층(24)의 상부에 10 - 30㎛의 두께로 에어나이프코팅 또는 메쉬롤코팅한 다음 건조시킨다.The surface treatment layer 25 is dried by air knife coating or mesh roll coating the composition of the surface treatment layer 25 to a thickness of 10-30 μm on the transparent skin layer 24.

이러한 표면처리층(25)의 조성은 주성분으로 우레탄아크릴레이트 올리고머 40 - 77중량부, 올리고머의 희석, 점도 조정, 부착 증대를 위한 아크릴레이트계 모노머 20 - 57중량부, 광개시제인 히드록시시클로헥실페닐케톤 1 - 5중량부, 소포제인 실리콘 1중량부, 레벨링제인 실리콘 0.5 - 3중량부, 매팅제(matting agent)인 실리카 0 - 10중량부 및 반응촉진제인 아민화합물 0.1 - 2중량부를 혼합한 것이다.The composition of the surface treatment layer 25 is 40 to 77 parts by weight of urethane acrylate oligomer as a main component, 20 to 57 parts by weight of acrylate monomers for dilution of oligomers, viscosity adjustment and increased adhesion, and hydroxycyclohexylphenyl as a photoinitiator. 1 to 5 parts by weight of ketone, 1 part by weight of silicone as an antifoaming agent, 0.5 to 3 parts by weight of silicone as a leveling agent, 0 to 10 parts by weight of silica as a matting agent and 0.1 to 2 parts by weight of an amine compound as a reaction accelerator. .

마지막으로, 건조시킨 표면처리층(25)의 상부에 인쇄층(23)의 인쇄무늬와 어우려져 홀로그램 효과가 나타나도록 하는 홀로그램 엠보스(25')를 형성시킨다.Finally, a hologram embossing 25 'is formed on the dried surface treatment layer 25 to match the printed pattern of the printing layer 23 so that the hologram effect appears.

이때 사용하게 되는 홀로그램 무늬 엠보싱용 필름(40)은 롤 타입의 광폭(1900㎜)의 필름으로 1c의 단면도에서 보는 바와 같이, 투명 폴리에틸렌테레프탈레이트(PET) 필름(41) 위에 0.1 - 1.0㎛의 심도를 가지는 홀로그램 엠보스(42)가 형성된 필름이다.The holographic pattern embossing film 40 to be used at this time is a roll-type wide (1900 mm) film, as shown in the cross-sectional view of 1c, a depth of 0.1-1.0 μm on the transparent polyethylene terephthalate (PET) film 41. It is a film in which the hologram emboss 42 having is formed.

이러한 홀로그램 무늬 엠보싱용 필름(40)을 사용하여 표면처리층(25)의 상부에 홀로그램 엠보스(25')를 형성시키는 과정은 다음과 같다.The process of forming the hologram embossed 25 'on the surface treatment layer 25 by using the holographic pattern embossing film 40 is as follows.

도 1c의 홀로그램 무늬 엠보싱용 필름(40)이 표면처리층(25)의 상부에 합지되도록 합지롤을 이용하여 0.5 - 3kg/㎠의 압력으로 엠보싱을 한 다음, UV경화기에서 5 - 10초간 경화시킨 후, 이형롤을 이용하여 홀로그램 무늬 엠보싱용 필름(40)은 필름 와인더로 별도로 권취하고, 완제품은 제품 와인더로 권취함으로써, 홀로그램 엠보스(25')가 형성된 표면처리층(25)을 가지는 바닥장식재를 완성한다.The embossed film at a pressure of 0.5-3 kg / cm 2 using a lamination roll so that the holographic pattern embossing film 40 of FIG. 1C is laminated on the upper surface treatment layer 25, and then cured for 5-10 seconds in a UV curing machine. Then, the holographic pattern embossing film 40 is wound separately with a film winder using a release roll, and the finished product is wound with a product winder, thereby having a surface treatment layer 25 having a hologram embossment 25 'formed thereon. Complete the flooring material.

아울러, 폴리에틸렌테레프탈레이트 필름(41) 대신에 폴리에틸렌 필름을 사용해도 된다.In addition, a polyethylene film may be used instead of the polyethylene terephthalate film 41.

홀로그램 무늬 엠보싱용 홀로그램 필름(40)은 견고한 타입으로서, 표면처리층(25)으로의 엠보싱이 용이해야 하고, 표면처리층(25)으로 전이된 홀로그램 엠보스(42)를 자외선으로 경화시킨 후에는 이형이 용이해야 하는 특성을 가져야 한다.The hologram film 40 for holographic pattern embossing is a rigid type and should be easy to emboss to the surface treatment layer 25, and after curing the hologram emboss 42 transferred to the surface treatment layer 25 with ultraviolet rays. It should have characteristics that should be easy to release.

또한 이형후에도 폴리에틸렌테레프탈레이트 필름 위에 홀로그램 엠보스(42)가 그대로 남아 있어 3 - 5회 정도 다시 사용할 수 있다.In addition, even after release, the hologram emboss 42 remains on the polyethylene terephthalate film and can be used again about 3-5 times.

다음, 홀로그램 무늬가 형성된 열전사 필름을 사용하여 투명스킨층의 상부에 홀로그램 무늬를 전사하는 방법을 설명한다.Next, a method of transferring the hologram pattern on the transparent skin layer using the thermal transfer film on which the hologram pattern is formed will be described.

도 2a는 본 발명의 홀로그램 무늬를 가진 다른 바닥장식재의 단면도로서, 기재함침층(10), 기재함침층(10) 상부의 표면층(20) 및 기재함침층(10) 하부의 이면층(30)으로 이루어진다.2A is a cross-sectional view of another flooring material having a holographic pattern of the present invention, wherein the substrate impregnation layer 10, the surface layer 20 on the substrate impregnation layer 10, and the back layer 30 under the substrate impregnation layer 10 are shown. Is done.

이때 표면층(20)은 기재함침층(10) 위에 아래부터 차례대로 발포층(21) 또는 비발포층(22), 인쇄층(23), 투명스킨층(24), 홀로그램 무늬층(55) 및 표면처리층 (25)으로 이루어지고, 이면층(30)은 하부발포층(31)으로 이루어진다.At this time, the surface layer 20 is the foam layer 21 or the non-foaming layer 22, the printing layer 23, the transparent skin layer 24, the holographic pattern layer 55 in order from above on the substrate impregnation layer 10 and It consists of the surface treatment layer 25, the back layer 30 is made of a lower foam layer (31).

이러한 본 발명의 홀로그램 무늬를 가진 다른 바닥장식재를 제조하는 공정을 다음의 도 2b를 통해 살펴본다.Looking at the process of manufacturing another flooring material having a holographic pattern of the present invention through the following Figure 2b.

도 2b는 도 2a의 바닥장식재의 제조공정도로서, 기재함침층(10)을 제조하는단계 ; 기재함침층(10)의 상부에 발포층(21) 또는 비발포층(22)을 형성하는 단계 ; 발포층(21) 또는 비발포층(22)의 상부에 인쇄층(23)을 형성하는 단계 ; 인쇄층(23)의 상부에 투명스킨층(24)을 형성하는 단계 ; 투명스킨층(24)의 상부에 홀로그램 무늬층(55)을 형성하는 단계 ; 기재함침층(10)의 하부에 하부발포층(31)을 형성하는 단계 ; 홀로그램 무늬층(55)의 상부에 표면처리층(25)을 형성하는 단계로 이루어진 제조공정을 보인다.FIG. 2B is a manufacturing process diagram of the floor decorative material of FIG. 2A, comprising: preparing a substrate impregnation layer 10; Forming a foamed layer 21 or a non-foamed layer 22 on top of the substrate impregnation layer 10; Forming a printing layer 23 on top of the foam layer 21 or the non-foaming layer 22; Forming a transparent skin layer 24 on top of the printed layer 23; Forming a holographic pattern layer 55 on top of the transparent skin layer 24; Forming a lower foaming layer 31 on the lower portion of the substrate impregnation layer 10; It shows a manufacturing process consisting of forming a surface treatment layer 25 on top of the hologram pattern layer 55.

이러한 제조공정을 상세히 살펴보면 다음과 같다.Looking at the manufacturing process in detail as follows.

먼저, 제품의 기재가 되는 기재함침층(10)을 제조한다.First, the substrate impregnation layer 10 which becomes a base material of a product is manufactured.

기재함침층(10)은 유리섬유, 모조지 등의 기재 위에 기재함침층(10)의 조성물을 0.35 - 0.50㎜의 두께로 압착나이프코팅한 후, 150 - 170℃의 오븐에서 30 - 50m/min.의 속도로 1 - 2분간 가열하여 겔(gel)화시켜 형성시킨다.Substrate impregnation layer 10 is a pressure-sensitive coating coating the composition of the substrate impregnation layer 10 to a thickness of 0.35-0.50mm on a substrate such as glass fiber, imitation paper, etc., and then 30-50m / min in an oven at 150-170 ℃. It is formed by gelation by heating at a rate of 1-2 minutes.

이러한 기재함침층(10)의 조성은 중합도가 1700 - 1750인 염화비닐수지 100중량부에 가소제인 디옥틸프탈레이트 20 - 50중량부, 부틸벤질프탈레이트 10 - 20중량부, 내열안정제인 바륨-아연계 화합물 1 - 5중량부, 안료인 산화티탄 1 - 20중량부, 충전제인 중탄산칼슘 1 - 170중량부 및 기타첨가제로서 장기 저온 내열 보강을 위한 에폭시수지 1 - 5중량부(두유(豆油)를 사용하므로 경화제가 필요없음)를 혼합하여 졸(sol) 상태로 만든 것이다.The composition of the substrate impregnation layer 10 is 20-50 parts by weight of dioctylphthalate as a plasticizer, 10-20 parts by weight of butylbenzylphthalate, and barium-zinc as a heat stabilizer in 100 parts by weight of a vinyl chloride resin having a polymerization degree of 1700-1750. Compound 1-5 parts by weight, pigment titanium oxide-1-20 parts by weight, filler 1-170 parts by weight of calcium bicarbonate, and other additives-1-5 parts by weight of epoxy resin for long-term low-temperature heat reinforcement Therefore, it does not need a curing agent) to make a sol (sol) state by mixing.

다음, 기재함침층(10)의 상부에 쿠션감을 부여하는 발포층(21)을 형성시키거나, 제품의 경도를 부여하는 비발포층(22)을 형성시킨다.Next, the foam layer 21 imparting a cushioning feeling is formed on the substrate impregnation layer 10, or the non-foaming layer 22 imparting the hardness of the product is formed.

발포층(21)은 발포층(21)의 조성물을 기재함침층(10)의 상부에 0.1 - 0.3㎜의 두께로 나이프코팅한 다음, 150 - 200℃의 오븐에서 30 - 50m/min.의 속도로 1 - 2분간 가열하여 겔화시켜 형성시킨다.The foamed layer 21 is knife coated with a composition of the foamed layer 21 to a thickness of 0.1-0.3 mm on top of the impregnated layer 10, and then a speed of 30-50 m / min. In an oven at 150-200 ℃ It is formed by gelling by heating for 1-2 minutes.

이러한 발포층(21)의 조성은 중합도가 1100 - 1300인 염화비닐수지 100중량부에 1차가소제인 디옥틸프탈레이트 40 - 50중량부, 2차가소제인 파라핀계 화합물 10 - 15중량부, 발포제인 아조디카본아미드 1 - 5중량부, 발포촉진제인 아연화 0.1 - 4중량부, 발포안정제인 바륨-아연계 화합물 0.2 - 3중량부, 안료인 산화티탄 1 - 3중량부, 충전제인 중탄산칼슘 1 - 90중량부 및 기타첨가제로서 점도저하제 0.2 - 1.5중량부를 혼합한 것이다.The foam layer 21 is composed of 40 to 50 parts by weight of dioctylphthalate as a primary plasticizer, 10 to 15 parts by weight of paraffinic compound as a secondary plasticizer, and 100 parts by weight of a vinyl chloride resin having a polymerization degree of 1100 to 1300. 1 to 5 parts by weight of azodicarbonamide, 0.1 to 4 parts by weight of zinc oxide as a foaming accelerator, 0.2 to 3 parts by weight of barium-zinc compound as a foam stabilizer, 1 to 3 parts by weight of titanium oxide as a pigment, and calcium bicarbonate as a filler. 90 parts by weight and other additives are mixed 0.2 to 1.5 parts by weight of a viscosity reducing agent.

비발포층(22)은 비발포층(22)의 조성물을 기재함침층(10)의 상부에 0.1 - 0.3㎜의 두께로 나이프코팅한 다음, 150 - 200℃의 오븐에서 30 - 50m/min.의 속도로 1 - 2분간 가열하여 겔화시켜 형성시킨다.The non-foaming layer 22 is knife coated with a thickness of 0.1-0.3 mm on top of the impregnating layer 10 to form the composition of the non-foaming layer 22, and then 30-50 m / min in an oven at 150-200 ° C. It is formed by gelling by heating for 1-2 minutes at the rate of.

이러한 비발포층(22)의 조성은 중합도가 1000 - 3000인 염화비닐수지 100중량부에 1차가소제인 디옥틸프탈레이트 20 - 40중량부, 부틸벤질프탈레이트 10 - 20중량부, 2차가소제인 파라핀계 화합물 5 - 15중량부, 충전제인 중탄산칼슘 1 - 90중량부, 안료인 산화티탄 1 - 5중량부, 내열안정제인 바륨-아연계 화합물 1 - 10중량부 및 기타첨가제로서 장기 저온 내열 보강을 위한 에폭시수지 1 - 5중량부(두유(豆油)를 사용하므로 경화제가 필요없음)를 혼합한 것이다.The composition of the non-foaming layer 22 is 20-40 parts by weight of dioctylphthalate as primary plasticizer, 100 parts by weight of vinyl chloride resin having a degree of polymerization of 1000-3000, 10-20 parts by weight of butylbenzylphthalate, and paraffin as secondary plasticizer. 5-15 parts by weight of the compound, 1-90 parts by weight of calcium bicarbonate as a filler, 1-5 parts by weight of titanium oxide as a pigment, 1-10 parts by weight of a barium-zinc compound as a heat stabilizer, and other additives. Epoxy resin for 1-5 parts by weight (using a soy milk (豆油) does not need a curing agent) is a mixture.

다음, 발포층(21) 또는 비발포층(22)의 상부에 그라비아 인쇄 또는 전사 인쇄로 소정의 인쇄무늬를 인쇄하여 인쇄층(23)을 형성시켜 건조한 다음, 이 인쇄층 (23)의 상부에 투명도 및 내구성을 부여하고, 또한 인쇄층(23)의 무늬를 보호하는투명스킨층(24)을 형성시킨다.Next, a predetermined printed pattern is printed on the foamed layer 21 or the non-foamed layer 22 by gravure printing or transfer printing to form a printed layer 23, and then dried on the top of the printed layer 23. A transparent skin layer 24 is formed to impart transparency and durability and to protect the pattern of the print layer 23.

투명스킨층(24)은 투명스킨층(24)의 조성물을 인쇄층(23)의 상부에 0.2 - 0.5㎜의 두께로 나이프코팅한 다음, 180 - 210℃의 오븐에서 10 - 30m/min.의 속도로 1 - 2분간 가열하여 겔화시켜 형성시킨다.The transparent skin layer 24 is knife coated with a composition of the transparent skin layer 24 to a thickness of 0.2-0.5 mm on the upper part of the printing layer 23, and then 10-30 m / min. Formed by gelation by heating for 1-2 minutes at speed.

이러한 투명스킨층(24)의 조성은 중합도가 1700 - 1750인 염화비닐수지 100중량부에 1차가소제인 디옥틸프탈레이트 30 - 60중량부, 2차가소제인 파라핀계 화합물 5 - 15중량부, 내열안정제인 바륨-아연계 화합물 2 - 5중량부 및 기타첨가제로서 장기 저온 내열 보강을 위한 에폭시수지 2 - 5중량부(두유(豆油)를 사용하므로 경화제가 필요없음) 및 점도저하제 0.1 - 3중량부를 혼합한 것이다.The transparent skin layer 24 is composed of 30 to 60 parts by weight of dioctylphthalate as a primary plasticizer, 5 to 15 parts by weight of paraffinic compound as a secondary plasticizer, and 100 parts by weight of vinyl chloride resin having a polymerization degree of 1700 to 1750. 2 to 5 parts by weight of a barium-zinc compound as a stabilizer and 2 to 5 parts by weight of epoxy resin for long-term low temperature heat reinforcement (no need for a curing agent because soy milk is used) and 0.1 to 3 parts by weight of a viscosity reducing agent It is a mixture.

다음, 투명스킨층(24)의 상부에 인쇄층(23)의 인쇄무늬와 어우려져 홀로그램 효과가 나타나도록 하는 홀로그램 무늬층(55)을 형성시킨다.Next, a hologram pattern layer 55 is formed on the transparent skin layer 24 to be combined with the printed pattern of the print layer 23 so that the hologram effect appears.

이때 사용하게 되는 홀로그램 무늬가 형성된 열전사 필름(50)은 롤 타입의 광폭(1900㎜)의 필름으로, 도 2c의 단면도에서 보는 바와 같이, 투명 폴리에틸렌테레프탈레이트(PET) 필름(51) 위에 이형층(52), 광택층(53), 투명증착층(54), 홀로그램 무늬층(55) 및 접착층(56)이 적층되어 있는 필름이다.At this time, the holographic pattern formed thermal transfer film 50 is a roll-type wide (1900 mm) film, as shown in the cross-sectional view of Figure 2c, a release layer on the transparent polyethylene terephthalate (PET) film 51 It is a film in which 52, a gloss layer 53, a transparent deposition layer 54, a hologram pattern layer 55, and an adhesive layer 56 are laminated.

이러한 홀로그램 무늬가 형성된 열전사 필름(50)을 사용하여 투명스킨층(24)의 상부에 홀로그램 무늬층(55)을 형성시키는 과정은 다음과 같다.The process of forming the hologram pattern layer 55 on the transparent skin layer 24 using the hologram pattern formed thermal transfer film 50 is as follows.

도 2c의 홀로그램 무늬가 형성된 열전사 필름(50)의 접착층(56)이 투명스킨층(24)의 상부에 합지되도록 투명스킨층(24)의 표면온도가 120℃가 되도록 한 다음, 130 - 150℃의 온도의 합지롤을 이용하여 4 - 5kg/㎠의 압력으로 열합지를 한후, 이형롤을 이용하여 홀로그램 필름(50)은 필름 와인더로 별도로 권취하고, 완제품은 제품 와인더로 권취함으로써, 투명스킨층(24)의 상부에 홀로그램 무늬층(55)을 형성시킨다.The surface temperature of the transparent skin layer 24 is 120 ° C. so that the adhesive layer 56 of the holographic patterned thermal transfer film 50 of FIG. 2C is laminated on the transparent skin layer 24. By using a lamination roll of a temperature of ℃ ℃ 4 to 5kg / ㎠ a thermal lamination, using a release roll hologram film 50 is wound separately with a film winder, the finished product is wound by a product winder, The hologram pattern layer 55 is formed on the transparent skin layer 24.

이때 이형되는 홀로그램 필름(50)은 폴리에틸렌테레프탈레이트 필름(51)에 이형층(52)만 남아있는 것이다.In this case, the release hologram film 50 has only the release layer 52 remaining on the polyethylene terephthalate film 51.

아울러, 폴리에틸렌테레프탈레이트 필름(51) 대신에 폴리에틸렌 필름을 사용해도 된다.In addition, a polyethylene film may be used instead of the polyethylene terephthalate film 51.

홀로그램 무늬가 형성된 열전사 필름(50)은 투명스킨층(24)으로의 열전사가 용이해야 하고, 열전사후 홀로그램 무늬가 선명해야 하고, 투명성이 확보되어야 하며, 표면처리 코팅시 홀로그램 무늬가 없어지지 않는 특성을 가져야 한다.The heat transfer film 50 having the hologram pattern should be easy to transfer to the transparent skin layer 24, the hologram pattern should be clear after heat transfer, and the transparency should be secured, and the hologram pattern does not disappear during the surface treatment coating. Should have

홀로그램 무늬가 형성된 열전사 필름(50)에 있어서, 광택층(53)을 형성시키지 않는다면, 홀로그램 무늬층(55)의 해상도가 50%이상 떨어져 홀로그램 효과가 저하되는 요인이 되고, 투명증착층(54)을 형성시키지 않는다면, 인쇄층(23)의 인쇄무늬가 잘 보이지 않게 되고, 열전사에 의해 홀로그램 무늬층(55)이 형성되었다 하더라도, 가공중 100℃ 이상의 열을 받거나, 홀로그램 무늬층(55) 위에 표면처리층(25)을 코팅하게 되면 이미 형성된 홀로그램 무늬가 소멸하게 되는 원인이 된다.In the thermal transfer film 50 in which the hologram pattern is formed, if the gloss layer 53 is not formed, the resolution of the hologram pattern layer 55 falls by 50% or more, resulting in a deterioration of the hologram effect, and thus the transparent deposition layer 54. ), The printed pattern of the printed layer 23 becomes difficult to see, and even if the hologram pattern layer 55 is formed by thermal transfer, the substrate undergoes heat of 100 ° C. or more during processing, or the hologram pattern layer 55. Coating the surface treatment layer 25 thereon causes the already formed hologram pattern to disappear.

다음, 기재함침층(10)의 하부에 쿠션감을 부여하는 하부발포층(31)을 형성시킨다.Next, a lower foaming layer 31 for imparting a cushioning feeling to the lower portion of the substrate impregnation layer 10 is formed.

하부발포층(31)은 하부발포층(31)의 조성물을 기재함침층(10)의 하부에 0.2- 1.0㎜의 두께로 나이프코팅한 다음, 190 - 200℃의 오븐에서 5 - 30m/min.의 속도로 30 - 90초간 가열하여 겔화시켜 형성시킨다.The lower foaming layer 31 is knife coated with a thickness of 0.2-1.0 mm on the bottom of the impregnating layer 10 to describe the composition of the lower foaming layer 31, and then 5-30 m / min in an oven at 190-200 ° C. Formed by gelation by heating at a rate of 30-90 seconds.

이러한 하부발포층(31)의 조성은 중합도가 1100 - 1200인 염화비닐수지 100중량부에 1차가소제인 디옥틸프탈레이트 20 - 60중량부, 부틸벤질프탈레이트 2 - 10중량부, 2차가소제인 파라핀계 화합물 5 - 15중량부, 유기안료 1 - 10중량부, 발포제인 아조디카본아미드 1 - 7중량부, 발포촉진제인 아연화 1 - 4중량부, 발포안정제인 바륨-아연계 화합물 0.1 - 5중량부, 안료인 산화티탄 0.1 - 5중량부, 충전제인 중탄산칼슘 1 - 150중량부를 혼합한 것이다.The lower foaming layer 31 has a composition of 100 to 100 parts by weight of vinyl chloride resin having a polymerization degree of 1100 to 1200, 20 to 60 parts by weight of dioctylphthalate as a primary plasticizer, 2 to 10 parts by weight of butylbenzylphthalate, and paraffin as a secondary plasticizer. 5-15 parts by weight of organic compound, 1-10 parts by weight of organic pigment, 1-7 parts by weight of azodicarbonamide, which is a blowing agent, 1-4 parts by weight of zincation, which is a foaming accelerator, and 0.1-5 parts by weight of barium-zinc compound, which is a foam stabilizer. To 0.1 parts by weight of titanium oxide, which is a pigment, and 1 to 150 parts by weight of calcium bicarbonate, which is a filler.

마지막으로, 홀로그램 무늬층(55)의 상부에 표면 강도 유지를 위한 표면처리층(25)을 형성시켜 바닥장식재를 완성한다.Finally, a surface treatment layer 25 is formed on the hologram pattern layer 55 to maintain surface strength to complete the flooring material.

표면처리층(25)은 표면처리층(25)의 조성물을 홀로그램 무늬층(26)의 상부에 10 - 30㎛의 두께로 에어나이프코팅 또는 메쉬롤코팅한 다음, 출력이 200 - 300watt/in이고 중압수은램프 4 - 8개를 사용하여 5 - 30m/min.의 라인 스피드로 경화시킨다.The surface treatment layer 25 is air knife coated or mesh roll coated with the composition of the surface treatment layer 25 to a thickness of 10-30 μm on the hologram pattern layer 26, and then the output is 200-300 watt / in. 4 to 8 medium pressure mercury lamps are used to cure at line speeds of 5 to 30 m / min.

이러한 표면처리층(25)의 조성은 주성분으로 우레탄아크릴레이트 올리고머 40 - 77중량부, 올리고머의 희석, 점도 조정, 부착 증대를 위한 아크릴레이트계 모노머 20 - 57중량부, 광개시제인 히드록시사이클로헥실페닐케톤 1 - 5중량부, 소포제인 실리콘 1중량부, 레벨링제인 실리콘 0.5 - 3중량부, 매팅제(matting agent)인 실리카 0 - 10중량부, 반응촉진제인 아민화합물 0.1 - 2중량부를 혼합한 것이다.The composition of the surface treatment layer 25 is 40 to 77 parts by weight of urethane acrylate oligomer as a main component, 20 to 57 parts by weight of acrylate monomer for dilution of oligomer, viscosity adjustment and adhesion increase, and hydroxycyclohexylphenyl as a photoinitiator. 1 to 5 parts by weight of ketone, 1 part by weight of silicone as an antifoaming agent, 0.5 to 3 parts by weight of silicone as a leveling agent, 0 to 10 parts by weight of silica as a matting agent, and 0.1 to 2 parts by weight of an amine compound as a reaction accelerator. .

이하 실시예에서는 본 발명을 구체적으로 예시하기 위하여 상기에서 제시한두가지 제조공정에 의한 바닥장식재를 제조하는 것을 설명한다.In the following Examples to illustrate the manufacturing of the flooring material by the two manufacturing processes presented above to illustrate the present invention in detail.

실시예 1Example 1

유리섬유, 모조지 등의 기재 위에 중합도가 1000 - 2000인 염화비닐수지 100중량부에 가소제인 디옥틸프탈레이트 35중량부, 부틸벤질프탈레이트 17중량부, 내열안정제인 바륨-아연계 화합물 2.5중량부, 안료인 산화티탄 5중량부, 충전제인 중탄산칼슘 170중량부 및 기타첨가제로서 에폭시수지 3중량부를 혼합한 조성물을 0.4㎜의 두께로 압착나이프코팅한 후, 165℃의 오븐에서 35m/min.의 속도로 1분간 가열하여 겔(gel)화시켜 기재함침층(10)을 제조하였다.35 parts by weight of dioctylphthalate as a plasticizer, 17 parts by weight of butylbenzylphthalate, 2.5 parts by weight of barium-zinc-based compound as a heat stabilizer, and 100 parts by weight of a vinyl chloride resin having a polymerization degree of 1000 to 2000 on a substrate such as glass fiber or imitation paper. 5 parts by weight of titanium phosphate, 170 parts by weight of calcium bicarbonate as a filler, and 3 parts by weight of epoxy resin as a additive were pressed and kneaded to a thickness of 0.4 mm, followed by 35 m / min. The substrate impregnated layer 10 was prepared by heating for 1 minute to gel.

다음, 기재함침층(10)의 상부에 중합도가 1000 - 2000인 염화비닐수지 100중량부에 1차가소제인 디옥틸프탈레이트 53중량부, 2차가소제인 파라핀계 화합물 13중량부, 발포제인 아조디카본아미드 1.4중량부, 발포촉진제인 아연화 0.7중량부, 발포안정제인 바륨-아연계 화합물 0.6중량부, 안료인 산화티탄 2.8중량부, 충전제인 중탄산칼슘 50중량부 및 기타첨가제로서 점도저하제 0.2중량부를 혼합한 조성물을 0.18㎜의 두께로 나이프코팅한 다음, 165℃의 오븐에서 35m/min.의 속도로 1분간 가열하여 겔화시켜 발포층(21)을 형성시켰다.Next, 53 parts by weight of dioctylphthalate as the primary plasticizer, 13 parts by weight of paraffinic compound as the secondary plasticizer and 100 parts by weight of vinyl chloride resin having a polymerization degree of 1000 to 2000 on the base impregnation layer 10, and azodica as the foaming agent. 1.4 parts by weight of the present amide, 0.7 parts by weight of zincation as a foaming accelerator, 0.6 parts by weight of a barium-zinc compound as a foam stabilizer, 2.8 parts by weight of titanium oxide as a pigment, 50 parts by weight of calcium bicarbonate as a filler, and 0.2 parts by weight of a viscosity reducing agent as an additive. The mixed composition was knife coated to a thickness of 0.18 mm, and then gelled by heating for 1 minute at a rate of 35 m / min. In an oven at 165 ° C. to form a foamed layer 21.

다음, 발포층(21)의 상부에 그라비아 인쇄로 소정의 인쇄무늬를 인쇄하여 인쇄층(23)을 형성시켰다.Next, a predetermined printed pattern was printed on the foam layer 21 by gravure printing to form a printed layer 23.

다음, 인쇄층(23)의 상부에 중합도가 1700 - 1750인 염화비닐수지 100중량부에 1차가소제인 디옥틸프탈레이트 34중량부, 2차가소제인 파라핀계 화합물 9중량부, 내열안정제인 바륨-아연계 화합물 2.5중량부 및 기타첨가제로서 에폭시수지 3중량부 및 점도저하제 0.1중량부를 혼합한 조성물을 0.20㎜의 두께로 나이프코팅한 다음, 170℃의 오븐에서 20m/min.의 속도로 1.5분간 가열하여 겔화시켜 투명스킨층(24)을 형성시켰다.Next, 34 parts by weight of dioctylphthalate as a primary plasticizer, 9 parts by weight of a paraffinic compound as a secondary plasticizer, and 100% by weight of a vinyl chloride resin having a polymerization degree of 1700-1750 on the upper portion of the printing layer 23, and barium- as a heat stabilizer. 2.5 parts by weight of a zinc compound and 3 parts by weight of an epoxy resin and 0.1 part by weight of a viscosity-lowering agent were mixed with a knife coating to a thickness of 0.20 mm, and then heated in a oven at 170 ° C. at a speed of 20 m / min. For 1.5 minutes. By gelation to form a transparent skin layer (24).

다음, 기재함침층(10)의 하부에 중합도가 1100 - 1200인 염화비닐수지 100중량부에 1차가소제인 디옥틸프탈레이트 49중량부, 부틸벤질프탈레이트 3중량부, 2차가소제인 파라핀계 화합물 9중량부, 유기안료 2중량부, 발포제인 아조디카본아미드 2.4중량부, 발포촉진제인 아연화 1.2중량부, 발포안정제인 바륨-아연계 화합물 0.9중량부, 안료인 산화티탄 0.2중량부, 충전제인 중탄산칼슘 60중량부를 혼합한 조성물을 0.45㎜의 두께로 나이프코팅한 다음, 200℃의 오븐에서 20m/min.의 속도로 90초간 가열하여 겔화시켜 하부발포층(31)을 형성시켰다.Next, in the lower part of the base impregnation layer 10, 49 parts by weight of dioctylphthalate as a primary plasticizer, 3 parts by weight of butylbenzylphthalate, and 100 parts by weight of vinyl chloride resin having a polymerization degree of 1100 to 1200, paraffinic compound 9 as a secondary plasticizer. Parts by weight, 2 parts by weight of organic pigment, 2.4 parts by weight of azodicarbonamide as a foaming agent, 1.2 parts by weight of zincation as a foaming accelerator, 0.9 parts by weight of barium-zinc compound as a foam stabilizer, 0.2 parts by weight of titanium oxide as a pigment, and a bicarbonate as a filler. The composition mixed with 60 parts by weight of calcium was knife-coated to a thickness of 0.45 mm, and then gelled by heating in an oven at 200 ° C. at a rate of 20 m / min. For 90 seconds to form a lower foaming layer 31.

다음, 투명스킨층(24)의 상부에 우레탄아크릴레이트 올리고머 60중량부, 아크릴레이트계 모노머 40중량부, 광개시제인 히드록시사이클로헥실페닐케톤 2중량부, 소포제인 실리콘 1중량부, 레벨링제인 실리콘 1중량부, 매팅제인 실리카 5중량부 및 반응촉진제인 아민화합물 0.5중량부를 혼합한 조성물을 20㎛의 두께로 에어나이프코팅한 다음 건조시켜 표면처리층(25)을 형성시키고, 투명 폴리에틸렌테레프탈레이트(PET) 필름(41) 위에 1㎛의 심도를 가지는 홀로그램 엠보스(42)가 형성된 홀로그램 무늬 엠싱보용 필름(40)이 표면처리층(25)의 상부에 합지되도록 합지롤을 이용하여 3kg/㎠의 압력으로 엠보싱을 한 다음, UV경화기에서 10초간 경화시킨 후, 이형롤을 이용하여 홀로그램 필름(40)은 필름 와인더로 별도로 권취하고, 완제품은제품 와인더로 권취하여 홀로그램 엠보스(25')가 형성된 표면처리층(25)을 가지는 도 1a의 본 발명의 바닥장식재를 완성하였다.Next, 60 parts by weight of urethane acrylate oligomer, 40 parts by weight of acrylate monomer, 2 parts by weight of hydroxycyclohexylphenyl ketone as a photoinitiator, 1 part by weight of silicone as a defoaming agent, and a leveling agent as silicone 1 on the upper part of the transparent skin layer 24. A weight part, a mixture of 5 parts by weight of silica as a mating agent and 0.5 parts by weight of an amine compound as a reaction promoter, is air-kneaded to a thickness of 20 μm, and then dried to form a surface treatment layer 25, and a transparent polyethylene terephthalate (PET). 3kg / ㎠ pressure using a roll of lamination so that the holographic pattern embossing film 40 having the hologram emboss 42 having a depth of 1 μm on the film 41 is laminated on the top of the surface treatment layer 25. After embossing with, and curing in a UV curing machine for 10 seconds, using a release roll, the hologram film 40 is wound separately with a film winder, the finished product is wound with a product winder alone The floor covering of the present invention of FIG. 1A having the surface treatment layer 25 having the gram embossed 25 'was completed.

실시예 2Example 2

유리섬유, 모조지 등의 기재 위에 중합도가 1700 - 1750인 염화비닐수지 100중량부에 가소제인 디옥틸프탈레이트 45중량부, 부틸벤질프탈레이트 15중량부, 내열안정제인 바륨-아연계 화합물 3.0중량부, 안료인 산화티탄 5중량부, 충전제인 중탄산칼슘 150중량부 및 기타첨가제로서 에폭시수지 3중량부를 혼합한 조성물을 0.38㎜의 두께로 압착나이프코팅한 후, 170℃의 오븐에서 40m/min.의 속도로 1분간 가열하여 겔(gel)화시켜 기재함침층(10)을 제조하였다.45 parts by weight of dioctylphthalate as a plasticizer, 15 parts by weight of butylbenzylphthalate, 3.0 parts by weight of a barium-zinc-based compound as a heat stabilizer, and 100 parts by weight of a vinyl chloride resin having a polymerization degree of 1700 to 1750 on a substrate such as glass fiber or imitation paper. 5 parts by weight of titanium phosphate, 150 parts by weight of calcium bicarbonate as a filler, and 3 parts by weight of epoxy resin as a additive were pressed and kneaded to a thickness of 0.38 mm, followed by 40 m / min. The substrate impregnated layer 10 was prepared by heating for 1 minute to gel.

다음, 기재함침층(10)의 상부에 중합도가 1100 - 1300인 염화비닐수지 100중량부에 1차가소제인 디옥틸프탈레이트 50중량부, 2차가소제인 파라핀계 화합물 11중량부, 발포제인 아조디카본아미드 1.5중량부, 발포촉진제인 아연화 0.72중량부, 발포안정제인 바륨-아연계 화합물 0.5중량부, 안료인 산화티탄 2.5중량부, 충전제인 중탄산칼슘 60중량부 및 기타첨가제로서 점도저하제 0.2중량부를 혼합한 조성물을 0.18㎜의 두께로 나이프코팅한 다음, 165℃의 오븐에서 30m/min.의 속도로 1분간 가열하여 겔화시켜 발포층(21)을 형성시켰다.Next, 50 parts by weight of dioctylphthalate as the primary plasticizer, 11 parts by weight of paraffinic compound as the secondary plasticizer and 100 parts by weight of vinyl chloride resin having a polymerization degree of 1100 to 1300 on the substrate impregnation layer 10, and azodica as the foaming agent. 1.5 parts by weight of the main amide, 0.72 parts by weight of zincation as a foaming accelerator, 0.5 parts by weight of barium-zinc compound as a foam stabilizer, 2.5 parts by weight of titanium oxide as a pigment, 60 parts by weight of calcium bicarbonate as a filler, and 0.2 parts by weight of a viscosity reducing agent as an additive. The mixed composition was knife coated to a thickness of 0.18 mm, and then gelled by heating for 1 minute at a rate of 30 m / min. In an oven at 165 ° C. to form a foamed layer 21.

다음, 발포층(21)의 상부에 그라비아 인쇄로 소정의 인쇄무늬를 인쇄하여 인쇄층(23)을 형성시켰다.Next, a predetermined printed pattern was printed on the foam layer 21 by gravure printing to form a printed layer 23.

다음, 인쇄층(23)의 상부에 중합도가 1700 - 1750인 염화비닐수지 100중량부에 1차가소제인 디옥틸프탈레이트 36중량부, 2차가소제인 파라핀계 화합물 7중량부, 내열안정제인 바륨-아연계 화합물 2.5중량부 및 기타첨가제로서 에폭시수지 3.0중량부 및 점도저하제 0.15중량부를 혼합한 조성물을 0.22㎜의 두께로 나이프코팅한 다음, 180℃의 오븐에서 18m/min.의 속도로 1.5분간 가열하여 겔화시켜 투명스킨층 (24)을 형성시켰다.Next, 36 parts by weight of dioctylphthalate as a primary plasticizer, 7 parts by weight of paraffinic compound as a secondary plasticizer, and barium- as a heat stabilizer were placed on 100 parts by weight of a vinyl chloride resin having a polymerization degree of 1700-1750 on the upper portion of the printing layer 23. 2.5 parts by weight of a zinc compound and 3.0 parts by weight of epoxy resin and 0.15 parts by weight of a viscosity-lowering agent were mixed with a knife coating to a thickness of 0.22 mm, and then heated in an oven at 180 ° C. at a speed of 18 m / min. For 1.5 minutes. Gelation to form a transparent skin layer (24).

다음, 투명 폴리에틸렌테레프탈레이트 필름(51)위에 이형층(52), 광택층 (53), 투명증착층(54), 홀로그램 무늬층(55) 및 접착층(56)이 적층되어 있는 홀로그램 무늬가 형성된 열전사 필름(50)의 접착층(56)이 투명스킨층(24)의 상부에 합지되도록 투명스킨층(24)의 표면온도가 120℃가 되도록 한 다음, 140℃의 합지롤을 이용하여 5kg/㎠의 압력으로 열합지를 한 후, 이형롤을 이용하여 홀로그램 무늬가 형성된 열전사 필름(50)은 필름 와인더로 별도로 권취하고, 완제품은 제품 와인더로 권취하여 투명스킨층(24)의 상부에 홀로그램 무늬층(55)을 형성시켰다.Next, the thermoelectric layer on which the release layer 52, the gloss layer 53, the transparent deposition layer 54, the hologram pattern layer 55, and the adhesive layer 56 are laminated on the transparent polyethylene terephthalate film 51 is formed. The surface temperature of the transparent skin layer 24 is 120 ° C. so that the adhesive layer 56 of the yarn film 50 is laminated on the transparent skin layer 24, and then 5 kg / cm 2 using a paper roll of 140 ° C. After the thermal lamination under pressure, the thermal transfer film 50 having a holographic pattern formed using a release roll is wound separately with a film winder, and the finished product is wound with a product winder to the upper portion of the transparent skin layer 24. The hologram pattern layer 55 was formed.

다음, 기재함침층(10)의 하부에 중합도가 1100 - 1200인 염화비닐수지 100중량부에 1차가소제인 디옥틸프탈레이트 51중량부, 부틸벤질프탈레이트 2중량부, 2차가소제인 파라핀계 화합물 7중량부, 유기안료 3중량부, 발포제인 아조디카본아미드 2.8중량부, 발포촉진제인 아연화 1.4중량부, 발포안정제인 바륨-아연계 화합물 0.7중량부, 안료인 산화티탄 0.3중량부, 충전제인 중탄산칼슘 50중량부를 혼합한 조성물을 0.5㎜의 두께로 나이프코팅한 다음, 200℃의 오븐에서 18m/min.의 속도로 90초간 가열하여 겔화시켜 하부발포층(31)을 형성시켰다.Next, 51 parts by weight of dioctylphthalate as the primary plasticizer, 2 parts by weight of butylbenzylphthalate, and a paraffinic compound 7 at 100 parts by weight of a vinyl chloride resin having a polymerization degree of 1100 to 1200 in the lower portion of the base impregnation layer 10. Parts by weight, 3 parts by weight of organic pigment, 2.8 parts by weight of azodicarbonamide as a foaming agent, 1.4 parts by weight of zincation as a foaming accelerator, 0.7 parts by weight of barium-zinc compound as a foam stabilizer, 0.3 parts by weight of titanium oxide as a pigment, and a bicarbonate as a filler. The composition in which 50 parts by weight of calcium was mixed was knife-coated to a thickness of 0.5 mm, and then gelled by heating in an oven at 200 ° C. at a rate of 18 m / min. For 90 seconds to form a lower foaming layer 31.

다음, 홀로그램 무늬층(55)의 상부에 우레탄아크릴레이트 올리고머 70중량부, 아크릴레이트계 모노머 30중량부, 광개시제인 히드록시사이클로헥실페닐케톤 2.5중량부, 소포제인 실리콘 1중량부, 레벨링제인 실리콘 1.3중량부, 매팅제인 실리카 1.5중량부 및 반응촉진제인 아민화합물 0.5중량부를 혼합한 조성물을 20㎛의 두께로 에어나이프코팅한 다음, 출력이 200watt/in이고 중압수은램프 4개를 사용하여 20m/min.의 라인 스피드로 경화시켜 표면처리층(25)을 형성시켜 도 2a의 본 발명의 바닥장식재를 완성하였다.Next, 70 parts by weight of a urethane acrylate oligomer, 30 parts by weight of an acrylate monomer, 2.5 parts by weight of hydroxycyclohexylphenyl ketone as a photoinitiator, 1 part by weight of silicone as an antifoaming agent, and a silicone as a leveling agent on the hologram pattern layer 55. A mixture of parts by weight, 1.5 parts by weight of silica as a mating agent and 0.5 parts by weight of an amine compound as a reaction accelerator is air-knife-coated to a thickness of 20 μm, and then the output is 200 watt / in and 20 m / min using 4 medium pressure mercury lamps. The surface treatment layer 25 was formed by curing at a line speed of .to complete the flooring material of the present invention of FIG. 2A.

이러한 본 발명의 홀로그램 무늬를 가진 바닥장식재는 홀로그램 무늬 엠보싱용 필름(40)으로 표면처리층(25) 상부를 엠보싱하여 표면처리층(25) 상부 전체면에 홀로그램 무늬를 부여하거나 또는 홀로그램 무늬가 형성된 열전사 필름(50)을 투명스킨층(24) 상부에 전사하여 투명스킨층(24) 상부 전체면에 홀로그램 무늬층(55)을 적층하여 광폭의 홀로그램 무늬층(55)을 형성시킴으로써, 인쇄층(23)의 인쇄 무늬와 홀로그램 무늬가 어우러져 보는 각도에 따라 다양한 무늬 및 무지개 색채 효과와 유사한 색상을 창출하고, 입체효과를 극대화시키는 효과가 있다.The flooring material having a holographic pattern of the present invention is embossed on the surface treatment layer 25 with a holographic pattern embossing film 40 to give a hologram pattern on the entire surface of the upper surface of the surface treatment layer 25 or form a hologram pattern. The thermal transfer film 50 is transferred to the upper portion of the transparent skin layer 24, and the holographic pattern layer 55 is laminated on the entire upper surface of the transparent skin layer 24 to form a wide holographic pattern layer 55. According to the viewing angle of the printed pattern and the holographic pattern of (23), various patterns and colors similar to the rainbow color effect are generated, and the effect of maximizing the three-dimensional effect is obtained.

Claims (4)

기재함침층(10) ; 기재함침층(10) 상부에 아래부터 차례로 발포층(21) 또는 비발포층(22), 인쇄층(23), 투명스킨층(24) 및 표면처리층(25)으로 이루어지는 표면층(20) ; 하부발포층(31)으로 이루어지는 이면층(30)으로 구성된 바닥장식재에 있어서, 표면처리층(25) 상부 전체면에 홀로그램 엠보스(25')가 형성된 것을 특징으로 하는 홀로그램 무늬를 가진 바닥장식재.Base material impregnation layer 10; A surface layer 20 consisting of a foam layer 21 or a non-foaming layer 22, a printing layer 23, a transparent skin layer 24, and a surface treatment layer 25 in order from above the substrate impregnation layer 10; In the flooring material consisting of a backing layer (30) consisting of a lower foaming layer (31), a flooring material having a hologram pattern, characterized in that the holographic embossing (25 ') is formed on the entire upper surface of the surface treatment layer (25). 기재함침층(10) ; 기재함침층(10) 상부에 아래부터 차례로 발포층(21) 또는 비발포층(22), 인쇄층(23), 투명스킨층(24) 및 표면처리층(25)으로 이루어지는 표면층(20) ; 하부발포층(31)으로 이루어지는 이면층(30)으로 구성된 바닥장식재에 있어서, 투명스킨층(24)의 상부 전체면에 홀로그램 무늬층(55)이 형성된 것을 특징으로 하는 홀로그램 무늬를 가진 바닥장식재.Base material impregnation layer 10; A surface layer 20 consisting of a foam layer 21 or a non-foaming layer 22, a printing layer 23, a transparent skin layer 24, and a surface treatment layer 25 in order from above the substrate impregnation layer 10; In the flooring material consisting of a backing layer (30) consisting of a lower foaming layer (31), the flooring material having a hologram pattern, characterized in that the holographic pattern layer 55 is formed on the entire upper surface of the transparent skin layer (24). 기재함침층(10)을 제조하고, 기재함침층(10)의 상부에 발포층(21) 또는 비발포층(22)을 형성시킨 다음, 발포층(21) 또는 비발포층(22)의 상부에 전사 인쇄 또는 그라비아 인쇄로 소정의 인쇄무늬를 인쇄하여 인쇄층(23)을 형성시키고, 인쇄층 (23)의 상부에 투명스킨층(24)을 형성시킨 다음, 기재함침층(10)의 하부에 하부발포층(31)을 형성시키고 나서 투명스킨층(24)의 상부에 표면처리층(25)을 형성시켜 바닥장식재를 제조하는 방법에 있어서, 홀로그램 무늬 엠보싱용 필름(40)으로 표면처리층(25) 상부를 엠보싱하여 표면처리층(25) 상부 전체면에 홀로그램 엠보스(25')를 형성시키는 것을 특징으로 하는 홀로그램 무늬를 가진 바닥장식재를 제조하는 방법.The substrate impregnation layer 10 is prepared, and a foamed layer 21 or a non-foamed layer 22 is formed on the substrate impregnated layer 10, and then an upper portion of the foamed layer 21 or the non-foamed layer 22 is formed. The print layer 23 is formed by printing a predetermined printed pattern by transfer printing or gravure printing, and the transparent skin layer 24 is formed on the upper portion of the printed layer 23, and then the lower portion of the substrate impregnation layer 10 is formed. In the method of forming the flooring material by forming the lower foam layer 31 on the upper surface of the transparent skin layer 24, the surface treatment layer using a holographic pattern embossing film 40 (25) A method of manufacturing a flooring material having a hologram pattern, wherein the upper surface is embossed to form a hologram embossed 25 'on the entire upper surface of the surface treatment layer 25. 기재함침층(10)을 제조하고, 기재함침층(10)의 상부에 발포층(21) 또는 비발포층(22)을 형성시킨 다음, 발포층(21) 또는 비발포층(22)의 상부에 전사 인쇄 또는 그라비아 인쇄로 소정의 인쇄무늬를 인쇄하여 인쇄층(23)을 형성시키고, 인쇄층 (23)의 상부에 투명스킨층(24)을 형성시킨 다음, 기재함침층(10)의 하부에 하부발포층(31)을 형성시키고 나서 투명스킨층(24)의 상부에 표면처리층(25)을 형성시켜 바닥장식재를 제조하는 방법에 있어서, 홀로그램 무늬가 형성된 열전사 필름(50)을 투명스킨층(24)의 상부에 전사하여 투명스킨층(24)의 상부 전체면에 홀로그램 무늬층(55)을 형성시키는 것을 특징으로 하는 홀로그램 무늬를 가진 바닥장식재를 제조하는 방법.The substrate impregnation layer 10 is prepared, and a foamed layer 21 or a non-foamed layer 22 is formed on the substrate impregnated layer 10, and then an upper portion of the foamed layer 21 or the non-foamed layer 22 is formed. The print layer 23 is formed by printing a predetermined printed pattern by transfer printing or gravure printing, and the transparent skin layer 24 is formed on the upper portion of the printed layer 23, and then the lower portion of the substrate impregnation layer 10 is formed. In the method of manufacturing the flooring material by forming the lower foaming layer 31 on the surface treatment layer 25 on the transparent skin layer 24, the holographic patterned thermal transfer film 50 is transparent A method of manufacturing a flooring material having a hologram pattern, characterized in that the holographic pattern layer 55 is formed on the entire upper surface of the transparent skin layer 24 by transferring to the upper part of the skin layer 24.
KR1020000056185A 2000-09-25 2000-09-25 A Decorative Flooring Having Hologram Pattern and the Method of Manufacturing thereof KR100365128B1 (en)

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KR100982359B1 (en) 2003-08-19 2010-09-14 주식회사 케이씨씨 Floor harmonized with natural or aritificial fibers and foamed layer

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KR20020076915A (en) * 2001-03-31 2002-10-11 난야 플라스틱스 코오퍼레이션 A process of producing a 3d stereo flash bright color plastic sheet

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KR19980035731A (en) * 1996-11-14 1998-08-05 성재갑 Method of manufacturing a decorative material having a three-dimensional pattern effect
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KR20010010163A (en) * 1999-07-16 2001-02-05 추두련 Material for floor construction including the hologram film and method for preparing same

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KR980007043U (en) * 1996-07-31 1998-04-30 김충세 Double-layered flooring with a combination of rotary screen and gravure printing or transfer printing
KR19980035731A (en) * 1996-11-14 1998-08-05 성재갑 Method of manufacturing a decorative material having a three-dimensional pattern effect
KR19980038660U (en) * 1996-12-19 1998-09-15 김충세 Flooring material having three-dimensional three-dimensional effect by hologram
KR20010010163A (en) * 1999-07-16 2001-02-05 추두련 Material for floor construction including the hologram film and method for preparing same

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Publication number Priority date Publication date Assignee Title
KR100982359B1 (en) 2003-08-19 2010-09-14 주식회사 케이씨씨 Floor harmonized with natural or aritificial fibers and foamed layer

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