KR100296983B1 - Liquid Raw Material Vaporizer - Google Patents

Abstract

The liquid raw material vaporization apparatus according to the present invention is connected to a liquid raw material supply pipe (12) for supplying a liquid raw material to vaporize the liquid raw material supplied from the liquid raw material supply pipe (12) and supply it to the semiconductor manufacturing apparatus; An injector (14) provided with an inlet for receiving a liquid raw material from the liquid raw material supply pipe (12) and a discharge port facing the inlet so that the liquid raw material introduced to the liquid raw material through the inlet is discharged by hydraulic pressure; It is inserted into the discharge port in the form of a cylinder having a smaller diameter than the discharge port, the interpolation portion has a pointed end portion so that the liquid raw material is easily discharged in a streamlined flow through the discharge port, the portion located in the discharge port An inner guide pipe 18 formed with a stepped portion so as to be narrower in a gap between the discharge port and itself; An induction path 24 between the inner induction pipe 18 and itself by surrounding the inner induction pipe 18 while having an inner diameter larger than that of the inner induction pipe 18 so that the liquid flowing through the discharge port can flow. An outer induction pipe 28 forming a; It is characterized in that it comprises a heating means installed to surround the outer induction pipe 28 so that the liquid raw material flowing into the induction path 24 through the discharge port of the injector 14 is opened. According to the present invention, the reproducibility and uniformity of the film quality can be improved by increasing the vaporization rate of the liquid raw material during the semiconductor manufacturing process.

Description

Liquid Raw Material Vaporizer

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid raw material vaporization apparatus, and more particularly, to a liquid raw material vaporization apparatus capable of improving the uniformity and reproducibility of film quality in a chemical vapor deposition apparatus using a liquid delivery system (hereinafter referred to as "LDS"). will be.

The quality of the film formed by the chemical vapor deposition process is highly dependent on the structure and performance of the LDS used to supply the reaction gas into the reactor. Therefore, most semiconductor manufacturers and device makers develop specialized LDSs and apply them to manufacturing processes. By the way, the LDS used for the film formation by the conventional chemical vapor deposition apparatus has not only a complicated structure but also a structural problem that the uniformity and reproducibility of a film fall as a process progresses. Efforts have been made to improve the structural problems of the LDS, and the following describes the structural operation of the liquid raw material vaporizer and its problems in the conventional LDS as follows.

The supply pipe for supplying the liquid raw material is connected between the liquid raw material tank and the liquid raw material vaporizer. The liquid raw material is fed to the vaporizer through this feed pipe. In addition, the supply pipe is in communication with the injector. The injector is also in communication with the cylindrical guide tube. At this time, the injector is formed with an injection hole for injection in the portion connected to the induction pipe. The injection of the liquid raw material is made through this injection port. The injected liquid raw material moves along the induction pipe. At this time, the outside of the induction pipe is provided with a heater such as a heating coil and a heating jacket (JACKET), the vaporization of the liquid raw material moving through the induction pipe by this heater. The vaporized raw material is supplied to the reactor, whereby film formation occurs on the wafer in the reactor.

However, the conventional liquid raw material vaporizer has the following problems.

First, since the heater is installed along the induction pipe outside, there is a problem that vaporization is well performed at the inner circumferential surface of the induction pipe, but not well at the center of the induction pipe. For this reason, there is a problem that the liquid raw material not vaporized in the induction furnace is stagnant.

Second, due to the difference in the vaporization rate according to the position of the induction pipe, which is the first problem, the flow rate of the raw material is slow in the middle of the induction pipe while the flow rate of the induction pipe is uneven because the flow of the material is slow in the center of the induction pipe. have.

As a result, even if the liquid raw material is constantly supplied into the vaporizer using the liquid raw material flow controller, the vaporization rate in the induction pipe is uneven and the gaseous raw material supplied to the reactor becomes uneven. For this reason, there is a problem that the uniformity and reproducibility of the formed membrane cannot be adjusted because the raw material flowing into the reactor cannot be controlled reproducibly.

In addition, the conventional liquid raw material vaporizer has a problem in that the installation of the injector was not expected to increase the vaporization efficiency, resulting in the deterioration of the vaporizer itself by heating the liquid raw material at a temperature higher than necessary to increase the vaporization efficiency.

The technical problem of the present invention for solving the above problems is to uniformize the vaporization rate of the liquid raw material by heating at all positions to supply a gaseous raw material into the reactor to improve the uniformity and reproducibility of the membrane It is to provide a raw material vaporization device.

Another technical problem of the present invention is to provide a liquid raw material vaporization apparatus capable of dispersing a liquid raw material in order to increase the vaporization rate of the liquid raw material by heating.

In addition, another technical problem of the present invention is to provide a liquid raw material vaporization apparatus that can prevent deterioration of the vaporization apparatus by appropriately distributing the injection vaporization rate by injection and the thermal vaporization by heating to increase the overall vaporization rate.

1 is a cross-sectional view of a liquid raw material vaporization apparatus according to a first embodiment of the present invention;

2 is a cross-sectional view of a liquid raw material vaporization apparatus employing a modified injector according to a second embodiment of the present invention;

3 is a cross-sectional view showing a part of a modified induction furnace according to a third embodiment of the present invention.

* Explanation of symbols for main parts of the drawings

14: Injector 18, 18 ', 18 ": Internal guide pipe

20, 20 ', 20 ": injection hole 22: flow improvement protrusion

24, 24 ': Induction furnace 28, 28': External induction pipe

30: intermediate injector

The liquid raw material vaporization apparatus according to the present invention for achieving the above technical problem, is connected to the liquid raw material supply pipe 12 for supplying a liquid raw material to vaporize the liquid raw material supplied from the liquid raw material supply pipe 12 to manufacture the semiconductor Feed to the device; An injector (14) having an inlet for receiving a liquid raw material from the liquid raw material supply pipe (12) and a discharge port facing the inlet so that the liquid raw material introduced to the liquid raw material through the inlet is discharged by hydraulic pressure; It is inserted into the discharge port in the form of a cylinder having a smaller diameter than the discharge port, the interpolation portion has a pointed end portion so that the liquid raw material is easily discharged in a streamlined flow through the discharge port, and the discharge hole is located at the discharge hole. An inner guide pipe 18 having a stepped portion formed around the gap so as to be narrower; An induction path 24 between the inner induction pipe 18 and itself by surrounding the inner induction pipe 18 while having an inner diameter larger than that of the inner induction pipe 18 so that the liquid flowing through the discharge port can flow. An outer induction pipe 28 forming a; It is characterized in that it comprises a heating means installed to surround the outer induction pipe 28 so that the liquid raw material flowing into the induction path 24 through the discharge port of the injector 14 is opened.

Here, the inner induction pipe 18 and the outer induction pipe 28 is preferably made of a metal so that the heat conduction by heating is increased, the length of the induction path 24 is increased so that the thermal degradation rate is increased Induction pipe 18 and the outer induction pipe 28 preferably has a bent portion of the form that is matched with each other. And, it is preferable that heating means surrounding the injector 14 is further provided so that the thermalization rate and the injection vaporization rate are increased.

Hereinafter, with reference to the accompanying drawings will be described an embodiment of the present invention.

In the drawing of the liquid raw material vaporization apparatus according to the present invention, the components performing the same function are denoted by the same reference numerals, and repetitive description is omitted.

[First Embodiment]

1 is a cross-sectional view of a liquid raw material vaporization apparatus according to a first embodiment of the present invention. Referring to Fig. 1, a feed pipe 12 is connected with a vaporizer to move the liquid feedstock supplied from the liquid feedstock source to the vaporizer. The supply pipe 12 is connected to the inside of the first connecting body 13 forming the stepped portion, and the first connecting body 13 is connected to the inside of the injector 14 forming the stepping portion. In addition, the injector 14 is connected to the inside of the second connecting member 15 forming the stepped portion. As such, the first connecting body 13, the injector 14, and the second connecting body 15 are sequentially connected to each other by forming stepped portions in order to prevent leakage of the liquid raw material, and to move the liquid raw material. Their central part is in common.

In particular, the diameter of the first space 16 formed in the injector 14 is larger than the diameter of the supply pipe 12 so that the liquid raw material supplied from the liquid raw material supply source can be sufficiently injected into the injector 14.

In addition, the injector 14 is provided with an outlet having a predetermined diameter for interpolating the internal guide pipe 18 at a position in communication with the second connecting body 15. One end of the inner guide pipe 18 is inserted. At this time, the diameter of the inner guide pipe 18 is made smaller than the diameter of the outlet so that the inner guide pipe 18 is inserted into the outlet to perform the function of injection. In this embodiment, in order to increase the spraying effect, a step larger than the diameter of the inner guide pipe 18 is formed and inserted into the outlet.

As a result, an O-ring shaped injection port 20 is formed between the outlet and the internal guide pipe 18. In order to maximize the effect of the injection, it is preferable to adjust the thickness of the nozzle of the o-ring shape sufficiently thin.

In addition, when the liquid raw material is filled in the first space 16 through the supply pipe 12, the internal induction inserted into the injector 14 so that the flow of the liquid raw material can be streamlined and concentrated in the injection hole 20. At one end of the tube 18, a conical flow improvement protrusion 22 integral with the internal guide tube 18 is located in the first space 16. On the other hand, when using the rectangular inner guide tube without using the cylindrical inner guide pipe 18, since the square ring-shaped injection hole is generated, it is preferable that the flow improvement protrusion also has the shape of a square pyramid. In addition, the inner induction pipe 18 and the flow improvement protrusion 22 may be manufactured separately and then combined.

Conical second space so that the liquid material injected through the O-ring-shaped injection port 20 can be introduced in full and concentrated in the induction furnace 24 and can be uniformly moved along the induction furnace 24. 26) is provided.

An outer induction pipe 28 connected to the inside of the second connecting member 15 having a stepped portion surrounds the inner induction pipe 18. Induction furnace 24 is formed between the inner induction pipe 18 and the outer induction pipe 28 surrounding it. Accordingly, the induction furnace 24 forms an o-ring space. The thickness of the o-ring induction furnace 24 can be arbitrarily adjusted by adjusting the diameters of the inner induction pipe 18 and the outer induction pipe 28, and the thinner the vaporization rate is increased. However, if it is too thin, the flow rate is slowed down, so the feed rate of the raw material to be supplied to the reactor is too slow, it is preferable to maintain a constant interval. In addition, it is preferable that the inner induction pipe 18 and the outer induction pipe 28 use a metal having excellent thermal conductivity. For example, it is preferable to use stainless steel (product name: SUS).

In order to vaporize the liquid raw material that proceeds along the induction path 24 formed between the inner induction pipe 18 and the outer induction pipe 28, a heater (not shown) such as a heating coil and a heating jacket (JACKET) is provided. Surrounding the outside of the tube (28). A heater (not shown) may also be installed around the injector 14 for preliminary heating of the liquid raw material.

On the other hand, in the present invention, before feeding the vaporized raw material to the reactor, while maintaining a constant flow rate and at the same time equipped with an intermediate injector 30 in the induction furnace 24 section for perfect vaporization. The outer induction pipe 28 is connected to the inside of the intermediate injector 30 forming a step. Further, the intermediate injector 30 has a through hole having a constant diameter therein. In order to effect the intermediate injection, the tip of the inner guide pipe 18 is made into a conical shape, and the conical tip is inserted into a hole having a predetermined diameter. As a result, an O-ring injection port 20 'is made. The intermediate injector 30 may be arbitrarily provided in plural in order to increase the vaporization efficiency due to the atomization.

In order to supply the raw material vaporized by the intermediate injector 30 and the heater (not shown) to the reactor and to discharge it from the vaporizer, a discharge pipe 32 is located between the vaporizer and the reactor.

Second Embodiment

2 is a cross-sectional view of the liquid raw material vaporization apparatus to which the modified injector 14 according to the second embodiment of the present invention is applied. Referring to FIG. 2, as in the first embodiment, the injector 14 has an outlet having a constant diameter for interpolating the internal guide pipe 18 ′ at a position in communication with the second connecting body 15. A stepped portion having a diameter of the outlet and at the same time larger than the diameter of the inner induction pipe 18 'is coupled to the outlet. At this time, in order to perform the function of the injection, the stepped portion is formed with a plurality of injection holes 20 "symmetrically.

The number and size of the injection holes 20 "are arbitrarily adjusted so as to maximize the effect of the atomization. The overall passage area of the injection hole 20" is smaller than that of the o-ring-shaped injection hole of the first embodiment, so that the atomization becomes Happens better. However, this is also made in consideration of the flow rate of the liquid raw material.

In addition, the same effect can be achieved by manufacturing a donut-shaped thin disc formed with the injection hole 20 '' and combining it with the O-ring-shaped injection hole 20 generated in the first embodiment.

Third Embodiment

3 is a cross-sectional view showing a part of the modified induction furnace 24 'according to the third embodiment of the present invention. Referring to Fig. 3, the difference between the first and second embodiments and the present embodiment is that the induction furnace 24 'is non-linear. The non-linear induction furnace 24 ′ is arranged in such a way as to maximize the efficiency of thermalization by the heater. For example, it may be rotated in a solenoid form or to form a bend as shown in FIG. Accordingly, it is preferable to modify the shape of the heater that heats the induction furnace 24 '. In the case of the solenoid type, it is preferable to arrange in a coil form along the induction path 24 'and to bend the heater even in the case of bending.

The operation of the liquid raw material vaporization apparatus of the present invention configured as described above will be described with reference to FIG.

The liquid raw material supplied from the liquid raw material tank at a constant speed is transferred to the vaporization apparatus through the supply pipe 12. The liquid raw material moved through the supply pipe 12 is filled in the first space 16 of the injector 14. At this time, the liquid raw material flows in a streamline form by the flow improvement protrusion part 22 and is concentrated in the o-ring-shaped injection port 20. The raw material injected first through the injection hole 20 is again filled in the conical second space 26. Since the second space is conical, the raw material is concentrated in the narrow o-ring induction furnace 24. The raw material guided into the o-ring-shaped narrow induction furnace is heated by a heater (not shown), thereby vaporizing the liquid raw material. At this time, the liquid raw material is moved in the thin induction path 24 of the O-ring formed between the surface of the inner induction pipe 18 and the inner circumferential surface of the outer induction pipe 28, so that all vaporization by the heater is carried out. It is done in a constant place. Accordingly, the moving speed of the flowing raw material is constant. On the other hand, the secondary injection is made by the intermediate injector 30 in case the raw material that has not been vaporized in the induction furnace 24 remains in the induction furnace 24. In addition, since the injector 14 and the intermediate injector 30 are provided with a heater and heated, all the vaporization is performed in the induction furnace 24 by promoting vaporization by heating. Since all the vaporization takes place, the flow of the raw material in the induction furnace 24 is kept constant, and the raw material vaporized into the reactor is supplied in this state. The uniform quality and reproducibility are obtained by supplying the constant raw material.

As described above, according to the present invention, the uniformity and reproducibility of the membrane can be improved by uniformly supplying raw materials into the reactor by injection and heating.

In addition, according to the present invention, by utilizing both the injection vaporization by injection and the thermalization by heating, the overall vaporization rate can be increased to prevent deterioration of the vaporization apparatus.

Claims (9)

(Once corrected) A liquid raw material vaporization apparatus connected to a liquid raw material supply pipe 12 for supplying a liquid raw material, for vaporizing a liquid raw material supplied from the liquid raw material supply pipe 12 and supplying the same to a semiconductor manufacturing apparatus. An injector 14 having an inlet for receiving a liquid raw material from the liquid raw material supply pipe 12 and a discharge hole facing the inlet so that the liquid raw material introduced to the liquid source through the inlet is discharged by hydraulic pressure; It is inserted into the discharge port in the form of a cylinder, the interpolation portion has a pointed end portion so that the liquid raw material is easily discharged in a streamlined flow through the discharge port, the portion located in the discharge port between the discharge port and itself The inner induction pipe 18 having a stepped portion formed around the gap so as to be narrower, To have an inner diameter larger than that of the inner induction pipe 18 so that the liquid flowing therein may surround the inner induction pipe 18 to form an induction path 24 between the inner induction pipe 18 and itself. External induction pipe (28), And a heating means installed to surround the outer induction pipe 28 so that the liquid raw material flowing into the induction path 24 through the discharge port of the injector 14 is opened. . (delete) (delete) (delete) (delete) (delete) (1 time correction) The liquid raw material vaporization apparatus according to claim 1, wherein the inner induction pipe (18) and the outer induction pipe (28) are made of metal so as to increase thermal conductivity by heating. (1 time correction) The bent portion of claim 1, wherein the inner induction pipe 18 and the outer induction pipe 28 coincide with each other so that the length of the induction path 24 is increased to increase the thermal degradation rate. Liquid raw material vaporization apparatus characterized by having. (Single correction) The liquid raw material vaporization apparatus according to claim 1, further comprising heating means surrounding the injector (14) so that the thermalization rate and the injection vaporization rate are increased.