KR100261541B1 - A method for manufacturing a carbon-layered emitter of a field effect electron emission device and a device therefor - Google Patents

Abstract

PURPOSE: A method and an apparatus for manufacturing a carbon thin film emitter of a field emission display device are provided to use a carbon thin film as a field emission display device by controlling surface roughness of a carbon thin film emitter. CONSTITUTION: A laser(21) is installed at one end of a vacuum chamber(20). A scanner(22) is installed on a path of a laser beam to reciprocate the laser beam. A target holer(24) of a bar shape is installed within the chamber(20) in order to load a target(23). A substrate holder(27) is installed within the chamber(20) in order to move a substrate(26). A grid electrode(28) is installed between the substrate holder(27) and the target holder(24). An alternative power(29) is connected with the grid electrode(28).

Description

Method and apparatus for manufacturing field effect electron emission display device carbon thin film emitter

BACKGROUND OF THE INVENTION Field of the Invention The present invention relates to a field effect emission display device, and more particularly, to an apparatus for manufacturing a carbon film emitter of a field effect electron emission display device having numerous fine needles on the surface of a carbon film emitter. will be.

A field emission display device (hereinafter, abbreviated as FED) is composed of a cathode plate panel and a cathode plate panel. The negative electrode panel is composed of a micro tip (FEA; field emitter array) that emits electrons. Basically, it is a kind of flat panel display that displays a desired pattern or a letter or symbol by emitting electrons emitted from the cathode plate by hitting the phosphor of the anode plate, and has the advantage of realizing a high-resolution, high-brightness color pattern with minimal power consumption. The operation method is similar to the existing CRT, but it is called a next-generation flat CRT.

The FED fabricates a micro-tip structure that emits electrons on a glass substrate by a semiconductor process, applies a phosphor to the positive electrode plate, and makes a high vacuum packaging by forming a spacer for separating the positive electrode plate and the negative electrode plate. When an appropriate amount of voltage is applied to the cathode electrode of the negative electrode plate having FEA, a strong electric field is formed at the micro tip, and electrons are emitted by the quantum mechanical tunnel effect. When the emitted electrons are attracted to the positive electrode plate to which a voltage of several hundred volts is applied and hit the phosphor, light is emitted on the fluorescence.

On the other hand, the FED has a two-pole FED having a cathode electrode and an emitter on the negative plate, and a three-pole FED having a cathode, emitter, and gate electrode on the negative plate.

In the bipolar FED, an emitter of a carbon thin film is usually applied.

Numerous fine needles are formed on the surface of the carbon thin film to serve as an emission site to serve as an emitter.

Meanwhile, an apparatus and method for manufacturing a large-area carbon thin film emitter are disclosed in Korean Patent Application No. 94-40616, previously filed by the present applicant.

1 is a schematic diagram showing a vacuum chamber for forming a conventional large-area carbon thin film emitter. The laser beam 1 is fired on a target 2 made of a carbon material to generate a plum 3 made of a carbon component. And a carbon thin film was formed by being deposited on the substrate 4. The substrate 4 described above is rotated by a substrate holder (not shown) to form a carbon thin film on the entire surface of the substrate 4. According to this method, the area of the carbon thin film layer is determined by the separation distance between the substrate 4 and the target 2, and in general, the larger the area of the carbon thin film layer as the substrate 4 and the target 2 are separated from each other. You can get it. On the other hand, as the substrate 4 and the target 2 move away from each other, the formation rate of the carbon thin film layer decreases rapidly.

FIG. 2 is a schematic diagram showing a vacuum chamber for forming a large-area carbon thin film emitter previously filed, wherein a laser 11 for generating a laser beam is installed at one end of the vacuum chamber 10 in which a vacuum state is maintained. In front of the laser 11, a scanner device 12 for linearly reciprocating the path of the laser beam is installed, and a rod-shaped target 13 made of carbon material on the optical axis of the laser beam is axially oriented. Is rotatably installed at the center, and the substrate 15 is movable in a direction orthogonal to the linear motion direction of the laser beam at one end of the plum 14 atmosphere generated by the laser beam irradiated to the target 13. It is done.

According to the pre-applied carbon thin film emitter manufacturing apparatus configured as described above, the vacuum chamber 10 in a state in which the target 13 and the substrate 15 made of a carbon material are mounted inside the vacuum chamber 10 in which the vacuum state is maintained. The laser beam is scanned toward the target 13 through the laser 11 mounted on the outside of the target.

The target 13 to which the laser beam has been scanned has a target material (carbon material) having high kinetic energy physically separated from the surface to form a plume 14 composed of ions, molecules, atoms and electrons.

On the other hand, since the laser beam is scanned while linearly reciprocating along the central axis of the rod-like target 13 by the scanner device 12, the plume 14 is formed in the entire length of the target 13.

In addition, since the target 13 rotates about the axial direction, the target material is eroded evenly at the outer circumference of the target 13.

The plume 14 having such high kinetic energy is deposited on the substrate 15 to form the carbon thin film 16. On the other hand, the substrate 15 moves slowly in the direction orthogonal to the linear motion direction of the laser beam so that the plume 14 is sequentially deposited on the surface of the substrate 15, and the carbon thin film 16 having a large thickness is uniform. ).

However, according to such a previously applied method of forming a carbon thin film, as shown in FIG. 3, a large area uniform carbon thin film 16 can be obtained, but there is no means for controlling the emission density. ) Does not meet the conditions for using the emitter of the FED.

The emission density is greatly influenced by the surface roughness of the carbon thin film 16, and the more the fine spikes 17 appear on the surface of the carbon thin film 16, the higher the emission density is.

Typically, in order to use the carbon thin film 16 as an emitter, at least 100,000 emission sites 17 should be formed per cm 3. In a previously applied method, fine projections are formed on the surface of the carbon thin film 16. The lack of fine spikes (17) did not provide adequate emission densities for use as emitters for FED.

Therefore, the present invention is to overcome such a conventional problem, by adding a means for increasing the emission density by controlling the surface roughness of the carbon thin film to the carbon thin film manufacturing apparatus previously filed as a emitter for FED It is an object of the present invention to provide an apparatus for producing a carbon thin film emitter of a field effect electron emission display device that can be put to practical use.

In the manufacturing process for forming the carbon thin film emitter of the field effect electron emission display device, the laser beam is linearly reciprocated to a rod-shaped target mainly composed of carbon in a chamber in which vacuum is maintained. It is focused while moving to form a plume, the substrate moves in a direction orthogonal to the path of the laser beam to form a large-area thin film, and an alternating electric field is applied alternately between the target and the substrate by a grid-shaped electrode. A method of manufacturing a carbon thin film emitter of a field effect electron emission display device in which a high density fine needle is formed on a surface thereof is provided.

The present invention also comprises a chamber in which a vacuum is maintained; A laser installed to scan a laser beam into the chamber; A scanner device installed to linearly reciprocate the path of the laser beam; A target holder installed in the chamber to mount a rod-like target on the path of the laser beam; A substrate holder installed to move the substrate mounted in the chamber in a direction orthogonal to a straight reciprocating path of the laser beam; A grid type electrode installed to alternately form an alternating electric field between the target and the substrate; Provided is a carbon thin film emitter manufacturing apparatus for a field effect electron emission display device including an AC power source installed to apply alternating current to the grid electrode.

The above objects and various advantages of the present invention will become more apparent from the preferred embodiments of the invention described below with reference to the accompanying drawings by those skilled in the art.

1 is a schematic diagram showing a vacuum chamber for forming a conventional large area carbon thin film emitter;

2 is a schematic diagram showing a vacuum chamber for forming a large-area carbon thin film emitter previously filed;

3 is a cross-sectional view showing a surface state of a carbon thin film formed by a method of manufacturing a previously disclosed carbon thin film emitter;

Figure 4 is a schematic diagram showing an apparatus for producing a carbon thin film emitter of the FED element in the present invention.

5 is a cross-sectional view showing the surface state of the carbon thin film formed by the method for producing a carbon thin film emitter according to the present invention;

Figure 6 is a cross-sectional view showing the surface state of the carbon thin film formed by the carbon thin film emitter manufacturing method according to the present invention.

<Explanation of Signs of Major Parts of Drawings>

20; Vacuum chamber 21; laser

22; Scanner unit 23; target

24; Target holder 25; Plum

26; Substrate 27; Board Holder

28; Grid electrodes 29; AC power

30; Carbon thin film 32; Metal wire

33; Earth electrode

Hereinafter, a method and apparatus for manufacturing a carbon thin film emitter of a field effect electron emission display device according to the present invention will be described in detail with the accompanying drawings.

4 is a schematic diagram showing an apparatus for manufacturing a carbon thin film emitter of an FED device according to the present invention.

As shown, a laser device 20 for generating a laser beam is installed at one end of the vacuum chamber 20 in which the vacuum state is maintained, and a scanner device for linearly reciprocating the path of the laser beam on the path of the laser beam. 21 is installed.

The target holder 23 is installed in the chamber 20 to mount a rod-shaped target 22 containing carbon as a main component on the path of the laser beam.

In addition, a substrate holder 27 is installed in the chamber 20 to move the substrate 26 in a direction orthogonal to the straight reciprocating path of the laser beam.

In particular, the grid-shaped electrode 28 is installed between the target holder 23 and the substrate holder 27, the alternating current field is alternately formed between the target 22 and the substrate 26. An AC power supply 29 is connected to the type electrode 28.

The target holder 23 is provided with conventional driving means (not shown in the drawing) so that the rod-shaped target 22 can be rotated about an axis.

The alternating current field applied to the grid electrode 28 is preferably a pulse type, and is preferably applied at about 10 volts to about 1000 volts per cm 2.

The grid-shaped electrode 28 is made of thin and thin metal wires 32 meshed with each other so that the plume 25 may be deposited on the substrate 26 by passing through the grid-shaped electrode 28. An AC power source 29 is connected to 32.

Meanwhile, according to another embodiment, as shown in FIG. 5, a grid electrode 28 is disposed between the substrate 26 and the target 22, and the ground electrode 33 is disposed in the bottom direction of the substrate 26. This can be formed to improve the size of the alternating current field when the alternating current is applied.

Meanwhile, a method of manufacturing a carbon thin film emitter of the field effect electron emission display device according to the present invention will be described.

According to the present invention, a rod-shaped target 22 and a substrate 26 mainly composed of carbon are mounted in the target holder 23 and the substrate holder 27, respectively, in the chamber 20 in which the vacuum is maintained, and the laser 20 is mounted. Through the laser beam is focused on one end of the target 22 to form a plume (25). The path of the laser beam is linearly reciprocated in the longitudinal direction of the target 22 by the scanner device 21.

The target 22 to which the laser beam is scanned is physically separated from the surface of the target 22 material (carbon material) having a high kinetic energy to form a plume 25 composed of ions, molecules, atoms, and electrons.

On the other hand, since the laser beam is scanned by the scanner device 21 along the central axis of the rod-shaped target 22 while being linearly reciprocated, the plume 25 is formed over the entire length of the target 22.

In addition, since the target 22 is rotated about the axial direction by the target holder 23 to prevent the laser beam from being concentrated only on a part of the surface, the material of the target 22 is evenly distributed around the outer surface of the target 22. Consumed.

The plume 25 having such high kinetic energy is deposited on the substrate 26 to form the carbon thin film 30.

On the other hand, the substrate 26 is slowly moved in the direction orthogonal to the linear motion direction of the laser beam by the substrate holder 27 so that the plume 25 is sequentially deposited on the surface of the substrate 26, and the thickness is uniform. A large area carbon thin film 30 is formed.

In particular, in the grid type electrode 28 formed between the target 22 and the substrate 26, a pulse type AC power source 29 is applied to alternately form a pulse type AC field of about 10 volts to about 1000 volts per cm 2.

The carbon separated from the target 22 and various charged particles by the alternating electric field thus formed are deposited on the substrate 26 through the grid electrode 28 under the influence of the direction of motion and the speed of movement. The surface state of (30) is changed. That is, in the pulsed AC field, the charged particles play a role of accelerating growth of fine protrusions once on the surface of the carbon thin film 30 formed on the substrate 26 to improve the formation density of sharp fine needles. .

6 is a cross-sectional view showing the surface state of the carbon thin film formed by the method for producing a carbon thin film emitter according to the present invention.

As mentioned above, when the voltage is applied to the field emitter, electrons are easily emitted from the carbon thin film 30 having more fine protrusions 31, so that the electrons of the electrons at a lower voltage than the carbon thin film manufactured by the conventional method. Not only does this occur, it can emit electrons evenly in many places. That is, the emission density is greatly influenced by the surface roughness of the carbon thin film 30, and the more fine spikes 31 on the surface of the carbon thin film 30, the higher the emission density is. appear.

Accordingly, at least 100,000 emission sites 31 per cm 3 can be formed by an alternating current field applied in accordance with the present invention, which can be used as an emitter for FED.

The foregoing is merely illustrative of a preferred embodiment of the present invention and those skilled in the art to which the present invention pertains may make modifications and changes to the present invention without changing the subject matter of the present invention.

Therefore, according to the present invention, by adding a means for controlling the surface roughness of the carbon thin film emitter to increase the emission density, it is possible to obtain the effect that the carbon thin film can be used as an emitter for FED.

Claims (7)

In a manufacturing process for forming a carbon thin film emitter of a field effect electron emission display device, a laser beam is focused on a rod-shaped target mainly composed of carbon inside a chamber where vacuum is maintained while linearly reciprocating to form a plume, and a substrate An electric field in which a large area thin film is formed while moving in a direction orthogonal to the path of the laser beam, and an alternating electric field is alternately applied between the target and the substrate by a grid electrode to form a high-density fine needle on the surface of the thin film. A method for producing a carbon thin film emitter of an electron emission display device. The method of claim 1, A method of manufacturing a carbon thin film emitter of a field effect electron emission display device, characterized in that the alternating current applied to the electrode plate is pulsed. The method of claim 1, The alternating electric field is applied to about 10 volts to 1000 volts per cm 2 carbon nanometer emitter manufacturing method of the field effect electron emission display device. A chamber in which a vacuum is maintained; A laser installed to scan a laser beam into the chamber; A scanner device installed to linearly reciprocate the path of the laser beam; A target holder installed in the chamber to mount a rod-like target on the path of the laser beam; A substrate holder installed to move the substrate mounted in the chamber in a direction orthogonal to a straight reciprocating path of the laser beam; Electrode plates provided at both ends of the target holder and the substrate holder such that an alternating electric field is alternately formed between the target and the substrate; An apparatus for manufacturing a carbon thin film emitter of a field effect electron emission display device comprising an AC power source installed to apply an alternating current to the electrode plate. A chamber in which a vacuum is maintained; A laser installed to scan a laser beam into the chamber; A scanner device installed to linearly reciprocate the path of the laser beam; A target holder installed in the chamber to mount a rod-like target on the path of the laser beam; A substrate holder installed to move the substrate mounted in the chamber in a direction orthogonal to a straight reciprocating path of the laser beam; Grid electrodes provided at both ends of the target holder and the substrate holder such that an alternating electric field is alternately formed between the target and the substrate; A ground electrode disposed on the bottom surface of the substrate; An apparatus for manufacturing a carbon thin film emitter of a field effect electron emission display device comprising an alternating current power source installed to apply alternating current to the grid electrode. The method according to claim 5 or 6, And a distance between the grid electrode and the substrate is about 3 mm to about 30 mm apart. The method according to claim 5 or 6, The grid electrode is a thin-film thin metal wire is woven into each other in a mesh type device for manufacturing a carbon thin film emitter of the field effect electron emission display device.

Images