KR100244709B1 - Cleaning method of via hole - Google Patents

Cleaning method of via hole Download PDF

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Publication number
KR100244709B1
KR100244709B1 KR1019960067196A KR19960067196A KR100244709B1 KR 100244709 B1 KR100244709 B1 KR 100244709B1 KR 1019960067196 A KR1019960067196 A KR 1019960067196A KR 19960067196 A KR19960067196 A KR 19960067196A KR 100244709 B1 KR100244709 B1 KR 100244709B1
Authority
KR
South Korea
Prior art keywords
via hole
cleaning method
cleaning
hole
Prior art date
Application number
KR1019960067196A
Other languages
Korean (ko)
Other versions
KR19980048593A (en
Inventor
Kyung Jin Kim
Original Assignee
Hyundai Electronics Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hyundai Electronics Ind filed Critical Hyundai Electronics Ind
Priority to KR1019960067196A priority Critical patent/KR100244709B1/en
Publication of KR19980048593A publication Critical patent/KR19980048593A/en
Application granted granted Critical
Publication of KR100244709B1 publication Critical patent/KR100244709B1/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture
    • H01L21/0206—Cleaning during device manufacture during, before or after processing of insulating layers
    • H01L21/02063—Cleaning during device manufacture during, before or after processing of insulating layers the processing being the formation of vias or contact holes
KR1019960067196A 1996-12-18 1996-12-18 Cleaning method of via hole KR100244709B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019960067196A KR100244709B1 (en) 1996-12-18 1996-12-18 Cleaning method of via hole

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019960067196A KR100244709B1 (en) 1996-12-18 1996-12-18 Cleaning method of via hole

Publications (2)

Publication Number Publication Date
KR19980048593A KR19980048593A (en) 1998-09-15
KR100244709B1 true KR100244709B1 (en) 2000-02-15

Family

ID=19488703

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960067196A KR100244709B1 (en) 1996-12-18 1996-12-18 Cleaning method of via hole

Country Status (1)

Country Link
KR (1) KR100244709B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100425999B1 (en) * 2001-12-27 2004-04-06 동부전자 주식회사 via hole rinsing method of semiconductor device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3180779B2 (en) * 1998-10-05 2001-06-25 日本電気株式会社 Method for manufacturing semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100425999B1 (en) * 2001-12-27 2004-04-06 동부전자 주식회사 via hole rinsing method of semiconductor device

Also Published As

Publication number Publication date
KR19980048593A (en) 1998-09-15

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