KR100227852B1 - Vacuum exhaust device for preventing polymer absorption - Google Patents

Vacuum exhaust device for preventing polymer absorption Download PDF

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Publication number
KR100227852B1
KR100227852B1 KR1019960067323A KR19960067323A KR100227852B1 KR 100227852 B1 KR100227852 B1 KR 100227852B1 KR 1019960067323 A KR1019960067323 A KR 1019960067323A KR 19960067323 A KR19960067323 A KR 19960067323A KR 100227852 B1 KR100227852 B1 KR 100227852B1
Authority
KR
South Korea
Prior art keywords
exhaust device
vacuum exhaust
preventing polymer
polymer absorption
absorption
Prior art date
Application number
KR1019960067323A
Other languages
English (en)
Other versions
KR19980048686A (ko
Inventor
Chang-Sik Kim
Jin-Ho Park
Jae-Young Oh
Jong-Myung Kim
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Priority to KR1019960067323A priority Critical patent/KR100227852B1/ko
Publication of KR19980048686A publication Critical patent/KR19980048686A/ko
Application granted granted Critical
Publication of KR100227852B1 publication Critical patent/KR100227852B1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32834—Exhausting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
KR1019960067323A 1996-12-18 1996-12-18 Vacuum exhaust device for preventing polymer absorption KR100227852B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019960067323A KR100227852B1 (en) 1996-12-18 1996-12-18 Vacuum exhaust device for preventing polymer absorption

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019960067323A KR100227852B1 (en) 1996-12-18 1996-12-18 Vacuum exhaust device for preventing polymer absorption

Publications (2)

Publication Number Publication Date
KR19980048686A KR19980048686A (ko) 1998-09-15
KR100227852B1 true KR100227852B1 (en) 1999-11-01

Family

ID=19488789

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960067323A KR100227852B1 (en) 1996-12-18 1996-12-18 Vacuum exhaust device for preventing polymer absorption

Country Status (1)

Country Link
KR (1) KR100227852B1 (ko)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011019157A2 (ko) * 2009-08-10 2011-02-17 Lee Seung Yong 질소가스 분사장치
US8556594B2 (en) 2010-03-18 2013-10-15 Samsung Electronics Co., Ltd. Vacuum ejector and vacuum apparatus having the same
US9233334B2 (en) 2013-02-28 2016-01-12 Samsung Electronics Co., Ltd. Byproducts treating device and a facility for manufacturing semiconductor devices having the byproducts treating device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100806041B1 (ko) * 2006-08-29 2008-02-26 동부일렉트로닉스 주식회사 반도체 소자 제조 장치 및 이를 이용한 반도체 소자 제조방법

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011019157A2 (ko) * 2009-08-10 2011-02-17 Lee Seung Yong 질소가스 분사장치
WO2011019157A3 (ko) * 2009-08-10 2011-06-03 Lee Seung Yong 질소가스 분사장치
US8556594B2 (en) 2010-03-18 2013-10-15 Samsung Electronics Co., Ltd. Vacuum ejector and vacuum apparatus having the same
US9233334B2 (en) 2013-02-28 2016-01-12 Samsung Electronics Co., Ltd. Byproducts treating device and a facility for manufacturing semiconductor devices having the byproducts treating device

Also Published As

Publication number Publication date
KR19980048686A (ko) 1998-09-15

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Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
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FPAY Annual fee payment

Payment date: 20070801

Year of fee payment: 9

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