KR100215636B1 - Process for producing polyhydroxybenzophenon - Google Patents

Process for producing polyhydroxybenzophenon Download PDF

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KR100215636B1
KR100215636B1 KR1019960049868A KR19960049868A KR100215636B1 KR 100215636 B1 KR100215636 B1 KR 100215636B1 KR 1019960049868 A KR1019960049868 A KR 1019960049868A KR 19960049868 A KR19960049868 A KR 19960049868A KR 100215636 B1 KR100215636 B1 KR 100215636B1
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polyhydroxybenzophenone
formula
producing
reacting
compound
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KR19980030463A (en
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김기석
유상현
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구광시
주식회사코오롱
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/82Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/82Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
    • C07C49/825Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups all hydroxy groups bound to the ring

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Abstract

[청구범위에 기재된 발명이 속한 기술분야][TECHNICAL FIELD OF THE INVENTION]

자외선흡수제 등으로 사용되는 고순도의 폴리히드록시벤조페논을 고효율로 제조한다.High-purity polyhydroxybenzophenone used as an ultraviolet absorber or the like is produced with high efficiency.

[발명이 해결하려고 하는 기술적 과제][Technical Problems to be Solved by the Invention]

폴리히드록시벤조페논을 독가스 사용없이 안전하게 고수율로 제조함과 동시에 공정을 단순화시키고 별도의 정제과정이 없이도 고순도의 폴리히드록시벤조페논을 제조한다.The polyhydroxybenzophenone is safely produced at a high yield without using poison gas, and at the same time, the process is simplified and a polyhydroxybenzophenone of high purity is produced without a separate purification process.

[발명의 해결방법의 요지][Summary of the Invention]

폴리히드록시벤젠과 포르말린을 염기촉매하에서 반응시켜 히드록시벤질히드로사이드를 제조하고, 제조된 화합물과 폴리히드록시벤젠을 산촉매 및 용매 존재하에서 반응시켜 비스(히드록시페닐)메탄을 제조한 후, 제조된 화합물을 산화제로 산화시킨다.(Hydroxyphenyl) methane is produced by reacting polyhydroxybenzene with formalin in the presence of a base catalyst to prepare hydroxybenzylhydroxide, reacting the resulting compound with polyhydroxybenzene in the presence of an acid catalyst and a solvent, The resulting compound is oxidized with an oxidizing agent.

[발명의 중요한 용도][Important Application of the Invention]

자외선 흡수제 및 감광수지 원료등으로 사용된다.Ultraviolet absorber and photosensitive resin raw material.

Description

폴리히드록시벤조페논의 제조방법Production method of polyhydroxybenzophenone

본 발명은 하기한 일반식(Ⅰ)로 표시되는 폴리히드록시벤조페논에 관한 것으로서, 더욱 상세하게는 자외선 흡수제 및 감광수지 원료등으로 많이 사용되고 있는 공지의 화합물인 일반식(Ⅰ)식의 폴리히드록시벤조페논을 고수율, 고순도로 간편하게 제조하는 방법에 관한 기술이다.The present invention relates to a polyhydroxybenzophenone represented by the following general formula (I) and more particularly to a polyhydroxybenzophenone represented by the following general formula (I), which is a known compound widely used as an ultraviolet absorbent and a photosensitive resin raw material, This invention relates to a method for easily producing a hydroxybenzophenone with high yield and high purity.

[일반식 (Ⅰ)에서 n은 1~2의 정수이다][In the general formula (I), n is an integer of 1 to 2]

상기 일반식(Ⅰ)의 폴리히드록시벤조페논을 제조하기위한 종래 기술은 다음과 같다.The prior art for preparing the polyhydroxybenzophenone of the formula (I) is as follows.

미국특허 2,854,484 호 및 미국특허 2,921,962 호에는 방향족카복실산과 염화아연, 인산 및 옥시염화인을 사용하여 상기한 일반식(Ⅰ)의 폴리히드록시벤조페논을 제조하는 방법이 기재되어 있으며, 이때 비교적 높은 수율을 얻을 수 있는 것으로 보고 되고있다. 그러나 이와 같은 종래의 방법으로 새산된 폴리히드록시벤조페논은 좋은 색상의 제품을 얻기 어렵고 인을 함유한 폐수가 다량 발생한다는 문제점이 있다.U.S. Patent No. 2,854,484 and U.S. Patent No. 2,921,962 disclose a process for preparing a polyhydroxybenzophenone of the above formula (I) using an aromatic carboxylic acid and zinc chloride, phosphoric acid and phosphorus oxychloride, wherein a relatively high yield Of the population. However, the polyhydroxybenzophenone prepared by such a conventional method is difficult to obtain a product of good color, and there is a problem that a large amount of waste water containing phosphorus is generated.

일본 공개특허 소57-154140호에 보고된 폴리히드록시벤조페논의 제조방법은 방향족카르복실산과 페놀을 알킬설폰산 존재하에서 반응시켜 제조하는 방법으로 비교적 높은 수율로 폴리히드록시벤조페논을 제조하는 방법이다. 그러나 사용되는 시약인 알킬설폰산이 고가이며 방향족카르복실산 1 당량에 5 당량의 알킬설폰산을 사용해야하며 1당량을 사용했을 경우 20% 정도의 수율을 나타내는 단점이 있다.The process for producing polyhydroxybenzophenone reported in Japanese Patent Application Laid-open No. 57-154140 is a process for producing polyhydroxybenzophenone in a relatively high yield by a process comprising reacting an aromatic carboxylic acid with a phenol in the presence of an alkyl sulfonic acid to be. However, the alkyl sulfonic acid used as a reagent is expensive, and it is necessary to use 5 equivalents of an alkyl sulfonic acid in one equivalent of an aromatic carboxylic acid, and a yield of about 20% is obtained when 1 equivalent is used.

미국특허 2,694,729에 보고된 제조방법은 레소시놀디메틸에테르와 포스렌을 염화알루미늄 존재하에서 염화수소를 용매로 사용하여 탈메틸화반응 시켜 2, 2', 4, 4'-테트라히드록벤조페논을 제조한다. 그러나 이와 같은 방법은 수율이 35~40%로 낮고 독가스인 포스겐을 사용하기 때문에 공업적으로 어려운 방법이다.The production process reported in U.S. Patent No. 2,694,729 is a process for producing 2, 2 ', 4, 4'-tetrahydrobenzophenone by reacting resorcinol dimethyl ether and phosgene in the presence of aluminum chloride using a solvent of hydrogen chloride as a solvent . However, this method is industrially difficult because the yield is as low as 35-40% and phosgene which is poison gas is used.

일본 공개특허 소61-293945호에 보고된 제조방법은 폴리히드록시벤조에스터를 할로겐화 금속촉매를 이용 프라이스 리어랜지먼트(Fries rearrange ment) 반응을 진행시켜 제조한다.The production method reported in Japanese Patent Application Laid-Open No. 61-293945 is a process in which a polyhydroxybenzoester is subjected to a Fries rearrangement reaction using a metal halide catalyst.

이와 같은 방법은 비교적 높은 수율로 폴리히드록시벤조페논을 얻을 수 있으나, 폴리히드록시벤조에스터를 제조해야하므로 공정이 복잡하고 효과적이지 못한 문제점이 있다.Such a method can obtain polyhydroxybenzophenone with a relatively high yield, but the polyhydroxybenzoester must be prepared, which complicates the process and is not effective.

본 발명은 상기와 같은 종래 기술의 문제점을 해결하기 위한 것으로서 공정이 간단하고, 독가스 등의 사용이 없어 안전하며, 수율이 높으며 별도의 정제과정이 필요없이 고순도의 폴리히드록시벤조페논을 제조하는 방법을 제공하고자 한다.Disclosure of Invention Technical Problem [8] Accordingly, the present invention has been made keeping in mind the above problems occurring in the prior art, and it is an object of the present invention to provide a process for producing polyhydroxybenzophenone of high purity without requiring additional purification steps, .

본 발명은 자외선흡수제 및 감광수지 원료등으로 사용되는 일반식(Ⅰ)의 폴리히드록시벤조페논을 단순한 공정으로 안전하게 높은 수율로 제조하는 방법에 관한 것이다.The present invention relates to a method for safely and efficiently producing a polyhydroxybenzophenone represented by the general formula (I) used as an ultraviolet absorber and a photosensitive resin raw material by a simple process.

보다 구체적으로는 일반식(Ⅱ)의 폴리히드록시벤젠과 포르말린을 염기촉매하에서 반응시켜 일반식(Ⅲ)의 히드록시벤질히드로사이드(Hydroxy benzyl hydroxide)를 제조하고, 일반식(Ⅲ)의 히드록시벤질히드로사이드와 일반식(Ⅱ)의 폴리히드록시벤젠을 산촉매 및 용매 존재하에서 반응시켜서 일반식(Ⅳ)의 비스(히드록시페닐)메탄을 제조한 후, 제조된 일반식(Ⅳ)의 비스(히드록시페닐)메탄을 산화제로 산화시켜서 일반식(Ⅰ)의 폴리히드록시벤조페논을 제조하는 방법에 관한 것이다.More specifically, hydroxybenzyl hydroxide of formula (III) is prepared by reacting polyhydroxybenzene of formula (II) with formalin in the presence of a base catalyst to obtain a hydroxybenzyl hydroxide of formula (III) (Hydroxyphenyl) methane of the general formula (IV) is prepared by reacting benzylhydroxide with the polyhydroxybenzene of the general formula (II) in the presence of an acid catalyst and a solvent, Hydroxyphenyl) methane with an oxidizing agent to produce a polyhydroxybenzophenone represented by the general formula (I).

[상기 일반식(Ⅰ)~(Ⅳ)에서 n은 1~2의 정수이다][In the general formulas (I) to (IV), n is an integer of 1 to 2)

본 발명은 제조공정 단계별로 구분하여 보다 상세하게 설명하고자 한다.The present invention will be described in more detail by dividing it into stages of the manufacturing process.

먼저, 일반식(Ⅱ)의 폴리히드록시벤젠과 포르말린을 염기촉매하에서 반응시켜서 일반식(Ⅲ)의 히드록시벤질히드로사이드를 제조한다. 이때 사용되는 염기로서는 가성소다, 소다회 및 아민으로 구성되는 그룹중에서 선택된 1개 이상의 화합물이 바람직하다. 또한 반응온도는 10~30℃이다.First, the hydroxybenzyl hydroxide of the formula (III) is prepared by reacting the polyhydroxybenzene of the formula (II) with formalin under a base catalyst. The base used herein is preferably at least one compound selected from the group consisting of caustic soda, soda ash and amine. The reaction temperature is 10 to 30 占 폚.

그다음 공정으로는, 상기 공정에서 제조된 일반식(Ⅲ)의 히드록시벤질히드로사이드 화합물을 일반식(Ⅱ)의 화합물과 산촉매하에서 축합반응시켜 일반식(Ⅳ)의 비스(히드록시페닐)메탄 화합물을 제조한다. 이를 반응식으로 표시하면 아래와 같다.In the next step, the hydroxybenzylhydroxide compound of the formula (III) prepared in the above step is condensed with the compound of the formula (II) under an acid catalyst to obtain a bis (hydroxyphenyl) methane compound of the formula (IV) . The reaction formula is as follows.

[상기일반식 (Ⅱ)~(Ⅳ)에서 n은 1~2의 정수이다][In the general formulas (II) to (IV), n is an integer of 1 to 2)

이때 용매로는 톨루엔, 크실렌 및 벤젠 등으로 구성되는 그룹중에서 선택된 1개 이상의 화합물이 바람직하며, 산촉매로는 황산, 초산 및 톨루엔설폰산 등으로 구성되는 그룹중에서 선택된 1개이상의 화합물이 바람직하다.At this time, the solvent is preferably at least one compound selected from the group consisting of toluene, xylene and benzene, and the acid catalyst is preferably at least one compound selected from the group consisting of sulfuric acid, acetic acid and toluenesulfonic acid.

반응온도는 80~150℃에서 제조한다.The reaction temperature is from 80 to 150 ° C.

마지막 공정으로는, 상기 공정에서 제조된 일반식(Ⅳ)의 비스(히드록시페닐)메탄을 산화제로 산화시켜 일반식(Ⅰ)의 폴리히드록시벤조페논을 제조한다. 이를 반응식으로 표시하면 아래와 같다.As the last step, the polyhydroxybenzophenone of the general formula (I) is prepared by oxidizing bis (hydroxyphenyl) methane of the general formula (IV) prepared in the above process with an oxidizing agent. The reaction formula is as follows.

[상기일반식 (Ⅰ)~(Ⅳ)에서 n은 1~2의 정수이다][In the general formulas (I) to (IV), n is an integer of 1 to 2)

이때 산화제로는 크로미늄트리옥사이드와 초산을 사용하며, 반응온도는 0~30℃, 반응시간은 12~36시간으로 하는 것이 바람직하다.At this time, chromium trioxide and acetic acid are used as the oxidizing agent, and the reaction temperature is preferably 0 to 30 ° C and the reaction time is preferably 12 to 36 hours.

이하 본 발명의 바람직한 실시예를 기재한다.Hereinafter, preferred embodiments of the present invention will be described.

그러나 본 실시예는 발명의 이해를 돕기 위한 본 발명의 바람직한 실시예일뿐 본 발명을 제한하는 것은 아니다.However, this embodiment is a preferred embodiment of the present invention for facilitating the understanding of the invention, and does not limit the present invention.

[실시예 1][Example 1]

디(2, 4-디히드록시페닐) 메탄의 제조Preparation of di (2, 4-dihydroxyphenyl) methane

물 500ml에 레소시놀 110g(1mol)을 투입하고, 교반한다. 상기 교반액에 5N-NaOH 수용액 200ml와 37% 포르말린 81g(1mol)을 투입한 후 상온에서 12시간 교반한다. 이들 교반액을 농도가 진한 HCI로 pH를 중화시킨다. 중화된 용액에 톨루엔 1 리터를 투입한 후 교반하고 방치하여 톨루엔층을 분리한다. 분리한 톨루엔 층에 레소시놀 104g(0.95(mol)과 빙초산 1ml를 투입하고 120℃에서 24시간 반응시킨다.110 g (1 mol) of resorcinol is added to 500 ml of water and stirred. 200 ml of 5N-NaOH aqueous solution and 81 g (1 mol) of 37% formalin are added to the above-mentioned solution, and the mixture is stirred at room temperature for 12 hours. These solutions are neutralized with concentrated HCI. 1 liter of toluene is added to the neutralized solution, and the mixture is stirred and left to separate the toluene layer. To the separated toluene layer, 104 g (0.95 mol) of resorcinol and 1 ml of glacial acetic acid are added and reacted at 120 ° C. for 24 hours.

반응중 형성되는 물은 딘스탁 장치로 제거한다.The water formed during the reaction is removed with a Dean Stark apparatus.

반응완결 후 톨루엔을 500ml까지 농축시킨 후 60℃까지 냉각한다. 여기에 헥산을 투입하여 침전화시키고 상온에서 1시간 교반 후 여과하여 디(2, 4-디히드록시페닐) 메탄 198g을 제조하였다. 이때 수율은 85%였다.After completion of the reaction, the toluene is concentrated to 500 ml and then cooled to 60 ° C. Hexane was added thereto and the mixture was then dialyzed. The mixture was stirred at room temperature for 1 hour and filtered to obtain 198 g of di (2, 4-dihydroxyphenyl) methane. The yield was 85%.

[실시예 2][Example 2]

2, 2', 4, 4'-테트라히드록시벤조페논의 제조Preparation of 2, 2 ', 4, 4'-tetrahydroxybenzophenone

80% 초산 150ml 크로미늄트리옥사이드 120g(1.2mol)을 투입, 용해하고 이들 용액의 내부온도가 0℃가 되도록 냉각하여 산화제 용액을 제조한다.80% acetic acid 150 ml Chromium trioxide 120 g (1.2 mol) was added and dissolved, and the internal temperature of these solutions was cooled to 0 캜 to prepare an oxidizing agent solution.

한편 초산 600ml에 디(2, 4-디히드록시페닐) 메탄 116g(0.5mol)을 녹인 용액을 제조한 후 이를 상기 산화제 용액에 적가한다. 적가 후 상온에서 24시간 반응시킨 후 물 500ml를 투입하고 여과하여 2, 2', 4, 4'-테트라히드록시벤조페논 110g을 제조하였다. 이때 수율은 90%이고 제조된 화합물의 융점(mp)는 202~203℃였다.On the other hand, a solution of 116 g (0.5 mol) of di (2,4-dihydroxyphenyl) methane dissolved in 600 ml of acetic acid is prepared and added dropwise to the oxidizing agent solution. After dropwise addition, the mixture was reacted at room temperature for 24 hours, 500 ml of water was added thereto, and the mixture was filtered to obtain 110 g of 2, 2 ', 4,4'-tetrahydroxybenzophenone. The yield was 90% and the melting point (mp) of the prepared compound was 202 to 203 占 폚.

본 발명의 방법으로 폴리히드록시벤조페논을 제조하면 별도의 정제공정이 생략되는 등 제조공정이 간단하고, 독가스를 사용할 필요가 없어 제조공정의 안정성이 향상됨과 동시에 높은 수율로 고순도의 폴리히드록시벤조페논을 제조할 수 있다.When the polyhydroxybenzophenone is prepared by the method of the present invention, the purification process is omitted, and the production process is simple. There is no need to use the poison gas, so that the stability of the production process is improved and at the same time, the polyhydroxybenzophenone Phenone can be produced.

Claims (7)

일반식(Ⅱ)의 폴리히드록시벤젠과 포르말린을 염기촉매하에서 반응시켜 일반식(Ⅲ)의 히드록시벤질히드로사이드를 제조하고, 일반식(Ⅲ)의 히드록시벤질히드로사이드와 일반식(Ⅱ)의 폴리히드록시벤젠을 산촉매 및 용매 존재하에서 반응시켜서 일반식(Ⅳ)의 비스(히드록시페닐)메탄을 제조한 후, 제조된 일반식(Ⅳ)의 비스(히드록시페닐)메탄을 산화제로 산화시킴을 특징으로 하는 일반식(Ⅰ)의 폴리히드록시벤조페논을 제조하는 방법.The hydroxybenzylhydroxide of the formula (III) is prepared by reacting the polyhydroxybenzene of the formula (II) with the formalin in the presence of a base catalyst to obtain the hydroxybenzylhydroxide of the formula (III) (Hydroxyphenyl) methane of the general formula (IV) is prepared by reacting the bis (hydroxyphenyl) methane of the general formula (IV) with an oxidizing agent by reacting the polyhydroxybenzene of the general formula Wherein the polyhydroxybenzophenone of formula (I) is characterized by the following formula (I). [상기일반식 (Ⅰ)~(Ⅳ)에서 n은 1~2의 정수이다][In the general formulas (I) to (IV), n is an integer of 1 to 2) 1 항에 있어서, 염기촉매가 가성소다, 소다회 및 아민으로 구성되는 그룹중에서 선택된 1개 이상의 화합물임을 특징으로 하는 폴리히드록시벤조페논의 제조방법.The process for producing polyhydroxybenzophenone according to claim 1, wherein the base catalyst is at least one compound selected from the group consisting of caustic soda, soda ash and amine. 1 항에 있어서, 일반식(Ⅱ)의 화합물과 포르말린의 반응온도가 10~30℃임을 특징으로 하는 폴리히드록시벤조페논의 제조방법.The process for producing polyhydroxybenzophenone according to claim 1, wherein the reaction temperature of the compound of formula (II) and formalin is 10 to 30 占 폚. 1 항에 있어서, 산촉매가 황산, 초산 및 톨루엔설폰산으로 구성되는 그룹중에서 선택된 1개 이상의 화합물임을 특징으로 하는 폴리히드록시벤조페논의 제조방법.The process according to claim 1, wherein the acid catalyst is at least one compound selected from the group consisting of sulfuric acid, acetic acid, and toluenesulfonic acid. 1 항에 있어서, 일반식(Ⅱ)의 화합물과 일반식(Ⅲ)의 화합물의 반응온도가 80~150℃임을 특징으로 하는 폴리히드록시벤조페논의 제조방법.The process for producing polyhydroxybenzophenone according to claim 1, wherein the reaction temperature of the compound of formula (II) and the compound of formula (III) is 80 to 150 ° C. 1 항에 있어서, 산화제로 크로미늄트리옥사이드와 초산을 사용함을 특징으로하는 폴리히드록시벤조페논의 제조방법.The method for producing polyhydroxybenzophenone according to claim 1, wherein chromium trioxide and acetic acid are used as an oxidizing agent. 1 항에 있어서, 일반식(Ⅳ)의 화합물을 산화시키는 반응온도가 0~30℃이고, 반응시간이 12~36시간 임을 특징으로 하는 폴리히드록시벤조페논의 제조방법.The process for producing polyhydroxybenzophenone according to claim 1, wherein the reaction temperature for oxidizing the compound of formula (IV) is from 0 to 30 ° C and the reaction time is from 12 to 36 hours.
KR1019960049868A 1996-10-30 1996-10-30 Process for producing polyhydroxybenzophenon KR100215636B1 (en)

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