KR0161311B1 - Panel cleaning solution - Google Patents
Panel cleaning solution Download PDFInfo
- Publication number
- KR0161311B1 KR0161311B1 KR1019940024384A KR19940024384A KR0161311B1 KR 0161311 B1 KR0161311 B1 KR 0161311B1 KR 1019940024384 A KR1019940024384 A KR 1019940024384A KR 19940024384 A KR19940024384 A KR 19940024384A KR 0161311 B1 KR0161311 B1 KR 0161311B1
- Authority
- KR
- South Korea
- Prior art keywords
- panel
- present
- cleaning solution
- panel cleaning
- cleaning agent
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title abstract description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical group [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 9
- 239000007800 oxidant agent Substances 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims description 5
- 239000003755 preservative agent Substances 0.000 claims description 4
- 230000002335 preservative effect Effects 0.000 claims description 4
- 230000001590 oxidative effect Effects 0.000 claims 2
- 239000012459 cleaning agent Substances 0.000 abstract description 8
- 238000009125 cardiac resynchronization therapy Methods 0.000 abstract description 3
- 238000005406 washing Methods 0.000 abstract description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 6
- 239000002184 metal Substances 0.000 description 5
- 239000011159 matrix material Substances 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- XAQCJVGGJJFLPP-UHFFFAOYSA-L azane;hydroxy-(hydroxy(dioxo)chromio)oxy-dioxochromium Chemical compound N.N.O[Cr](=O)(=O)O[Cr](O)(=O)=O XAQCJVGGJJFLPP-UHFFFAOYSA-L 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002602 strong irritant Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/0005—Other compounding ingredients characterised by their effect
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Detergent Compositions (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
Abstract
본 발명은 칼라 브라운관의 패널 세척에 사용되는 신규한 세척제의 조성을 개시한다.The present invention discloses a novel cleaning agent for use in panel cleaning of color CRTs.
종래의 패널 세척제는 HF와 NH4OH 등을 사용하여 자극성 냄새가 나고 세척력도 우수하지 못한 문제가 있었다.Conventional panel cleaners have a problem that the use of HF and NH 4 OH, such as irritating odor and excellent washing power.
본 발명에서는 공기중에서 분해되지 않는 NH4HF2와 강염기를 사용함으로서 냄새와 세척력의 문제를 해결하였다.In the present invention, by using NH 4 HF 2 and a strong base that does not decompose in the air solves the problem of odor and washing power.
Description
본 발명은 브라운관 제조에 관한 것으로, 더 상세히는 칼라 브라운관의 불량 패널(panel)을 재생하기 위해 패널을 세척하는 세척제에 관한 것이다.FIELD OF THE INVENTION The present invention relates to CRT manufacture, and more particularly to a cleaning agent for cleaning panels to regenerate defective panels of color CRTs.
칼라브라운관의 패널에는 블랙매트릭스와 각 형광체가 각각 소정패턴으로 형성되고 그 상면에 A1 등의 메탈백(metal back)이 형성되어 형광면을 구성하게 된다.In the panel of the color brown tube, the black matrix and each phosphor are formed in a predetermined pattern, and a metal back such as A1 is formed on the upper surface to form a fluorescent surface.
이러한 각 기능막의 형성시에는 각 단계마다 성막(成膜) 상태를 검사하여 불량이 발견되면 이제까지 형성된 기능막들을 제거해버리고, 다시 블랙매트릭스부터 형성하는 재생과정이 수행된다.In the formation of each functional film, the film formation state is inspected at each step, and if a defect is found, the functional films thus formed are removed, and a regeneration process is performed starting from the black matrix.
예를 들어 메탈백의 형성 후 불량이 발견되면 완성된 형광면 전체를 제거해내고 처음부터 다시 성막하지 않으면 안된다. 그런데 메탈백이 형성되기 전의 기능막들은 불산(HF) 수용액 등의 세척제로 제거가 가능하나 메탈백의 형성후에는 세척제에 의한 제거가 곤란하여 종래에는 패널을 안정화로(stabilizing furnace) 등에 투입하여 소성(燒成)시킴으로써 PVA 등의 분자고리를 단절시키는 방법이 사용되었다. 그러나 이러한 방법은 패널에 열에 의한 잔류응력이 발생될 뿐 아니라 노의 통과에 장시간이 소요되고 탈락된 형광면 입자가 노내부를 오염시키는 문제 등이 있었다.For example, if a defect is found after the formation of a metal back, the entire fluorescent surface must be removed and the film formed again from the beginning. However, functional films before the metal bag is formed can be removed with a cleaning agent such as hydrofluoric acid (HF) solution, but after the formation of the metal bag, it is difficult to remove the film by the cleaning agent. A method of breaking molecular rings such as PVA was used. However, this method not only generates residual stress due to heat in the panel, but also takes a long time to pass through the furnace, and there is a problem that the dropped fluorescent surface particles contaminate the inside of the furnace.
이에 따라 메탈백 형성 후의 형광면을 제거할 수 있는 세척제가 사용되게 되었는데, 그 조성은 HF, H2O2, NH4OH, 그리고 순수(純水) 등이다. 이러한 조성에 있어서 HF는 유리를 용해시키는 성분으로 블랙매트릭스와 패널의 결합을 끊어주게 되며, H2O2와 NH4OH는 형광체중의 감광물질, 예를들어 ADC(Ammonium Di Chromate)의 -OH 결합을 끊어 수용성으로 만들어 주는 성분이다. 여기서 NH4OH는 H2O2의 H를 분리시킴으로써 H2O2가 산의 특성을 가지도록 하는 산화제의 역할을 하게 된다.Accordingly, a cleaning agent capable of removing the fluorescent surface after metal bag formation is used, and its composition is HF, H 2 O 2 , NH 4 OH, and pure water. In this composition, HF is a component that dissolves glass and breaks the bond between the black matrix and the panel. H 2 O 2 and NH 4 OH are photosensitive substances in the phosphor, for example, -OH of ADC (Ammonium Di Chromate). It breaks the bond and makes it water-soluble. Wherein NH 4 OH is that the role of the oxidizing agent so that the H 2 O 2 by separating the H of the H 2 O 2 have a characteristic of an acid.
그런데 이와 같은 종래의 세척제는 형광면의 분해능력이 그다지 뛰어나지 못하여 다량의 세척제가 사용되어야 할 뿐 아니라, HF와 NH4OH에서 강한 자극성 냄새가 발생되어 작업환경이 매우 열악한 문제가 있었다.However, such a conventional cleaning agent is not very excellent in the decomposition ability of the fluorescent surface, and a large amount of the cleaning agent should be used, as well as a strong irritant odor generated in HF and NH 4 OH, there was a very poor working environment.
이와 같은 종래의 문제점을 감안하여 본 발명의 목적은 세척력이 뛰어나며 자극성 냄새가 없는 패널세척제를 제공하는 것이다.In view of such a conventional problem, an object of the present invention is to provide a panel cleaner having excellent washing power and no irritating odor.
상술한 목적을 달성하기 위해 본 발명에 의한 패널 세척제는 유리부식제와 H2O2및 그 염기성 산화제를 포함하는 패널 세척제에 있어서, 유리부식제로 HF 대신 NH4HF2(불산 암모늄)이 사용되는 것을 특징으로 한다.In order to achieve the above object, the panel cleaner according to the present invention uses a glass preservative and H 2 O 2 and a basic oxidizing agent. In the panel cleaner, NH 4 HF 2 (ammonium fluoride) is used instead of HF as a glass preservative. It features.
이와같은 조성에 있어서 NH4HF2는 HF와는 달리 공기중에서는 안정된 상태이므로 자극성 냄새를 발생하지 않으며, 수용액내에서는 분해되어 패널과 블랙매트릭스의 결합상태를 분리시키게 된다.In this composition, unlike HF, NH 4 HF 2 is stable in the air and thus does not generate an irritating odor. In addition, NH 4 HF 2 is decomposed in an aqueous solution to separate the bonding state between the panel and the black matrix.
한편 H2O2에 대한 산화제의 역할은 다음과 같다. 먼저 종래의 NH4OH의 작용을 살펴보면Meanwhile, the role of the oxidizing agent for H 2 O 2 is as follows. First, look at the action of the conventional NH 4 OH
NH4OH → NH4++ OH- NH 4 OH → NH4 + + OH -
H2OH + OH-→ HOOH-+ H2O H 2 OH + OH - → HOOH - + H 2 O
가 되어 HOOH-가 PVA + ADC의 -OH 결합을 끊음으로써 수용성으로 변화시키는 것이다.HOOH - is changed to water solubility by breaking the -OH bond of PVA + ADC.
그런데 본 발명에서는 NH4OH 대신 NaOH 등의 강염기가 사용되므로 OH-의 형성, 즉 HOOH-의 형성이 더욱 활발해져, ADC의 분해 효과가 더욱 뛰어나게 된다. 또한 NaOH 등은 NH4OH와 같이 자극성의 냄새가 없어, 결국 본 발명에 의한 세척제는 작업환경의 냄새오염을 유발하지 않게 된다.However, in the present invention, since a strong base such as NaOH is used instead of NH 4 OH, the formation of OH − , that is, the formation of HOOH − becomes more active, and the decomposition effect of ADC is more excellent. In addition, NaOH and the like does not have an irritating smell like NH 4 OH, after all, the cleaning agent according to the present invention does not cause odor pollution of the working environment.
이와 같이 본 발명에 의하여 냄새가 없고 세척력이 우수한 패널 세척제가 제공될 수 있다.As such, the panel cleaner may be provided by the present invention having no odor and excellent cleaning power.
Claims (3)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019940024384A KR0161311B1 (en) | 1994-09-28 | 1994-09-28 | Panel cleaning solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019940024384A KR0161311B1 (en) | 1994-09-28 | 1994-09-28 | Panel cleaning solution |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR960012125A KR960012125A (en) | 1996-04-20 |
| KR0161311B1 true KR0161311B1 (en) | 1998-12-01 |
Family
ID=19393654
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019940024384A KR0161311B1 (en) | 1994-09-28 | 1994-09-28 | Panel cleaning solution |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR0161311B1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100433059B1 (en) * | 2001-08-10 | 2004-05-31 | 조헌영 | Manufacturing method of the washing agent for stone made cultural heritage |
-
1994
- 1994-09-28 KR KR1019940024384A patent/KR0161311B1/en not_active IP Right Cessation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100433059B1 (en) * | 2001-08-10 | 2004-05-31 | 조헌영 | Manufacturing method of the washing agent for stone made cultural heritage |
Also Published As
| Publication number | Publication date |
|---|---|
| KR960012125A (en) | 1996-04-20 |
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| LAPS | Lapse due to unpaid annual fee |