KR0143473B1 - Manufacturing method for zn vapor deposited layer with uniform thickness - Google Patents

Abstract

The present invention relates to a method for coating zinc on a steel plate by vacuum deposition method, using a graphite-type resistive heating evaporation source equipped with a mesh cover as a vaporization source when vacuum depositing a zinc film on a substrate. And to provide a method for producing a zinc vacuum deposition film having a uniform thickness while appropriately controlling the revolving water, an object thereof.

The present invention for achieving the above object is a method for forming a zinc vacuum deposition film on a substrate by using a vacuum deposition apparatus comprising a substrate co-rotating device and a resistance heating evaporation source, a mesh type as the resistance heating evaporation source Using a vaporization source equipped with a lid of the substrate, the deposition thickness of the substrate mounted on the substrate revolving device is 1: 6.5, and the deposition thickness comprising revolving the substrate so that the revolution number is in the range of 15-30 revolutions per minute The method of manufacturing a constant zinc vacuum deposition film is made into the summary.

Description

Method for Manufacturing Zinc Vacuum Deposition Film with Constant Deposition Thickness

1 is a perspective view of a resistive heating evaporation source and cover in accordance with the method of the present invention;

2 is a schematic diagram of a zinc film vacuum deposition apparatus in accordance with the method of the present invention.

3 is a graph showing the distribution of zinc film thickness according to the distance change of the substrate surface according to an embodiment of the method of the present invention

4 is a graph showing the zinc film thickness distribution according to the distance change of the substrate surface by a conventional method.

* Explanation of symbols for main parts of the drawings

1: idle shaft gear 2: servo motor

3: Vacuum sealing 4: Internal gear holder

5: Substrate heating device 6: Pinch

7: idle shaft 8: electric gear

9: Substrate 10: Substrate holder

11: Shutter 12: Thickness measuring device

13: Cover 14: Evaporator

15: Evaporation material (zinc lump) 16: Current supply terminal

17: vacuum 18: evaporator support

A: substrate revolution

The present invention relates to a method of coating zinc on a steel sheet by vacuum deposition, and more particularly, to deposit zinc using a resistance heating source, but using a vaporization source with a cover and corotating the substrate to make the thickness of the film. Relates to a method for producing a constant zinc vacuum layered coating.

Compared to the electroplating or hot-dip plating method, the vacuum deposition method has a wider selection range of materials and plating materials and has a wider control range of plating deposition amount, and thus its use is gradually expanding. However, in order to obtain an excellent coating film, it is important to select an evaporation source suitable for the properties of the evaporation material, and to obtain a uniform coating amount, an appropriate temperature of the substrate and an appropriate transfer device are required.

Currently, as an evaporation source for vacuum deposition, an electron beam evaporation source and a resistance heating evaporation source are mainly used. Of these, the electron beam evaporation source is advantageous for the evaporation of the high melting point material, the high deposition rate and the control is the advantage of the sign, but the price is expensive, there is a problem such as shortening the life of the filament when depositing a high vapor pressure material.

Therefore, when intermittently evaporating a material having a low melting point and a high vapor pressure, such as zinc, a resistance heating evaporation source that mainly evaporates the evaporated material by flowing a current directly through a container-shaped resistor is used.

However, even in this case, if the resistive heating evaporation source suitable for the evaporation material is not used, the film properties are deteriorated. If the fixed substrate holder is used, if the film thickness becomes thick, the thickness distribution of the film layer is uneven, resulting in a uniform film. Rotatable substrate holder is mainly used because of the disadvantage of not being formed.

Substrate rotating apparatuses include only rotation and corotation, and the like, and in order to uniformly coat the evaporation material on the substrate, it is preferable that both the rotation and the rotation are possible. However, the conventional ball and rotating device has a complicated mechanical structure, not only easy movement in the vertical direction, but also has a disadvantage in that the thickness distribution of the film is not uniform because the rotation ratio and the rotation speed of the revolution and rotation are not appropriate.

Accordingly, the present inventors have conducted research and experiments to solve the above disadvantages and vacuum deposit a zinc film having a uniform deposition thickness on a substrate, and propose the present invention based on the results.

According to the present invention, a zinc vacuum deposition film having a uniform thickness is obtained by using a resistive heating evaporation source made of graphite material with a mesh-type cover as an evaporation source when vacuum depositing a zinc film on a substrate and controlling the co-electron ratio and the number of revolutions of the substrate appropriately. To provide a method for producing, the purpose is.

Hereinafter, the present invention will be described.

The present invention provides a method for forming a zinc vacuum deposition film on a substrate by using a vacuum deposition apparatus including a substrate co-rotating device and a resistance heating evaporation source, wherein the resistance heating evaporation source has an evaporation source having a mesh cover. Using a vacuum deposition film having a uniform deposition thickness comprising a revolving substrate having a revolving ratio of 1: 6.5 and a revolving number of revolutions of 15-30 revolutions per minute; It relates to a manufacturing method.

Hereinafter, the present invention will be described in more detail.

In order to achieve the above object, in the present invention, it is preferable to use a resistive heating evaporation source of graphite material having a mesh cover as shown in FIG.

At this time, the volume of the evaporation source was set to 350cc or more to enable zinc plating of 700g / m 2 or more, and the thickness of the wall is more preferably in the range of 1-2mm in consideration of electric power.

The reason for using a mesh cover as an evaporation source is that when the thick film is manufactured by increasing the deposition rate, the oxide on the surface of the evaporation material is splashed and deposited on the substrate at the same time as the evaporation material to prevent defects on the surface of the film. In order to make the distribution of uniform, the material is preferably stainless.

In the present invention, a substrate revolving device as shown in FIG. 2 is used as the substrate rotating device, wherein the revolving ratio of the substrate 9 is 1: 6.5 and the revolving water satisfies the rotational speed range of 15-30 per minute. It is preferable that the reason is as follows.

The co-rotation ratio was 1: 6.5 because the trajectory of the vaporized zinc vapor particles on the substrate 9 was evenly swept over the substrate 9 during the entire deposition time, and the effect of interference between gears was considered. to be.

In addition, the limit of idle revolutions in the range of 15-30 revolutions per minute is less than 15 revolutions per minute, and if the rotation speed is slow, the deposition thickness may be uneven and the thickness variation may increase. This is because when the evaporation gas is fast, the evaporation gases are difficult to adhere to the surface of the substrate 9, and the deposition rate may be lowered.

On the other hand, in the present invention, as shown in FIG. 2, the substrate 9 is installed to be inclined at a predetermined angle in the direction of the evaporation source 14 so that the growth of the coating layer is made in the vertical direction as much as possible and the maximum deposition rate can be achieved. .

Hereinafter, a method for producing a zinc vacuum deposition film on the substrate 9 according to the present invention will be described with reference to FIG.

In the present invention, in order to manufacture the zinc coating using the evaporation source 14 and the substrate co-rotating device A, the evaporation source 14 and the cover 13 are sufficiently cleaned and dried in the air, and then the vacuum chamber 17 The substrate 9 is attached to the substrate holder 10 after being degreased and washed by a conventional method.

In the evaporation source 14, a rectangular metal zinc chunk 15 of evaporation material was put and a lid 13 was put thereon, the shutter 11 was closed and a flow pump (not shown) and a booster pump (not shown). After evacuating the vacuum in the vacuum chamber 17 to 10 ^-2 Torr using a vacuum pump, the vacuum degree in the vacuum chamber 17 using a diffusion pump (not shown) or a turbo pump (not shown) is used. Exhaust until it is below 10 ^-4 Torr.

When the adhesion between the substrate 9 and the film is important, heating is started by rotating the substrate 9 after cleaning the substrate by glow discharge or high vacuum sputtering.

When the temperature of the substrate 9 reaches 150-180 ° C., a current is applied to the evaporation source 14 to sufficiently degas at about 80% of the power at the time of evaporation. During the degassing process, impurities remaining on the surface of the evaporation source 14 and the evaporation material 15 are removed. After the degassing process is set to the power of the desired temperature and evaporation rate, the shutter 11 is opened and deposited on the substrate 9.

In the production of the zinc vacuum deposition coating carried out as described above, in the present invention, two or more substrates 9 may be provided in the substrate holder 10 to manufacture two or more zinc coatings having the same thickness.

Hereinafter, the present invention will be described in more detail with reference to Examples.

Example 1

Zinc was vacuum-deposited using the resistive heating evaporation source of the present invention and the substrate co-rotating device. Cold rolled steel plate with a thickness of 0.9mmt was used as the material, the evaporation rate was 2g / ㎡ / min, the temperature of the substrate was maintained at 150 ℃, and the ratio of revolution and rotation was about 1: 6.5 with the gear ratio between internal and external teeth being 196: 30. The rotation period of the sample was set to 20 rev / min, and the rotation period of the sample was set to 130 rev / min. The substrate was inclined at an angle of 20 ° toward the evaporation source. As a result of measuring the thickness of the film by the method of measuring the weight difference, it was confirmed that the film was uniformly deposited within +/- 0.2% / cm as shown in FIG.

Example 2

Zinc was vacuum deposited in the same manner as in Example 1, and two substrates were fixed to the substrate holder. As a result of comparing the thickness difference between the two substrates by the weight difference measurement method after deposition, it was confirmed that the deposition was uniform in the +/- 1% error range.

Comparative Example 1

Zinc was deposited in the same manner as in Example 1, but the retardation period of the sample was 5 rev / min and the rotation period was 32.5 rev / min. It can be seen that the thickness deviation of the film is not uniform.

Comparative Example 2

Although zinc was deposited in the same manner as in Example 1, when the revolving period of the sample was 40 rev / min and the revolving period was 260 rev / min, the deposition rate was significantly reduced, so that a film having a desired thickness could not be obtained. .

Comparative Example 3

The resistive heating evaporator was vacuum deposited using a conventional evaporation source. No cover was used, the substrate was fixed and deposited, and the thickness of each part of the substrate was measured by a weight difference method, and the results are shown in FIG. 4. As can be seen in Figure 3, it can be seen that the thickness deviation is up to 35%.

As described above, the present invention uses a graphite evaporation source equipped with a mesh cover as a resistive heating evaporation source, and the deposition thickness is uniform within 2% by appropriately controlling the co-rotation ratio and rotation speed of the specimen co-rotation device. The film was obtained, and there is an effect of obtaining a plurality of deposited steel sheets of the same thickness.

Claims (1)

In the method for forming a zinc vacuum deposition film on a substrate by using a vacuum deposition apparatus comprising a substrate co-rotating device and a resistance heating evaporation source, using the evaporation source having a mesh cover as the resistance heating evaporation source, A vacuum deposition film having a uniform deposition thickness, comprising: revolving the substrate so that the revolving ratio of the substrate mounted on the substrate revolving device is 1: 6.5 and the revolving water is in the range of rotation speed of 15-30 per minute. Manufacturing method