KR0129535B1 - Etching apparatus of series treatment - Google Patents

Etching apparatus of series treatment

Info

Publication number
KR0129535B1
KR0129535B1 KR94028734A KR19940028734A KR0129535B1 KR 0129535 B1 KR0129535 B1 KR 0129535B1 KR 94028734 A KR94028734 A KR 94028734A KR 19940028734 A KR19940028734 A KR 19940028734A KR 0129535 B1 KR0129535 B1 KR 0129535B1
Authority
KR
South Korea
Prior art keywords
etching apparatus
series treatment
series
treatment
etching
Prior art date
Application number
KR94028734A
Other languages
Korean (ko)
Inventor
Sadayuki Okuraira
Hideo Gomatsu
Osamu Matsumoto
Domoyuchi Ganazawa
Tsuoyosi Nito
Original Assignee
Kokusai Denki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP1301618A external-priority patent/JP2926798B2/en
Application filed by Kokusai Denki Co Ltd filed Critical Kokusai Denki Co Ltd
Application granted granted Critical
Publication of KR0129535B1 publication Critical patent/KR0129535B1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32807—Construction (includes replacing parts of the apparatus)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/427—Stripping or agents therefor using plasma means only

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
KR94028734A 1989-11-20 1994-11-03 Etching apparatus of series treatment KR0129535B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1301618A JP2926798B2 (en) 1989-11-20 1989-11-20 Continuous processing etching method and apparatus
KR1019900018721A KR930011905B1 (en) 1989-11-20 1990-11-19 Continuous etching method and apparatus therefor

Publications (1)

Publication Number Publication Date
KR0129535B1 true KR0129535B1 (en) 1998-04-06

Family

ID=26562779

Family Applications (1)

Application Number Title Priority Date Filing Date
KR94028734A KR0129535B1 (en) 1989-11-20 1994-11-03 Etching apparatus of series treatment

Country Status (1)

Country Link
KR (1) KR0129535B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20160056421A1 (en) * 2013-06-18 2016-02-25 Lg Chem, Ltd. Cell packing material and method of manufacturing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20160056421A1 (en) * 2013-06-18 2016-02-25 Lg Chem, Ltd. Cell packing material and method of manufacturing the same

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