KR0129136B1 - Log record management scheme for distributed applications - Google Patents

Log record management scheme for distributed applications

Info

Publication number
KR0129136B1
KR0129136B1 KR94030595A KR19940030595A KR0129136B1 KR 0129136 B1 KR0129136 B1 KR 0129136B1 KR 94030595 A KR94030595 A KR 94030595A KR 19940030595 A KR19940030595 A KR 19940030595A KR 0129136 B1 KR0129136 B1 KR 0129136B1
Authority
KR
South Korea
Prior art keywords
log
log record
record
request message
disk
Prior art date
Application number
KR94030595A
Other languages
Korean (ko)
Other versions
KR960019575A (en
Inventor
Kwang-Soo Kim
Original Assignee
Korea Electronics Telecomm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Korea Electronics Telecomm filed Critical Korea Electronics Telecomm
Priority to KR94030595A priority Critical patent/KR0129136B1/en
Publication of KR960019575A publication Critical patent/KR960019575A/en
Application granted granted Critical
Publication of KR0129136B1 publication Critical patent/KR0129136B1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
    • H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
    • H01L21/02236—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/02255—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by thermal treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Formation Of Insulating Films (AREA)
  • Debugging And Monitoring (AREA)

Abstract

A log record management method effectively manages log data recorded on a disk in order to prevent a system crush or malfunction of an application program, minimizes a cost for a log disk management, and effectively recovers the log records in case of a system breakdown. The method includes the steps of: receiving a log buffer in order to read log record, and registering a service request message to a standby queue; receiving a buffer for a record about a log record, and registering a service request message to a standby queue; registering a service request message to a standby queue in order to achieve a reforming or deletion of a log record; detecting a request message registered in the standby queue, processing a desired service, and informing it; determining whether there is a specific log record in a present log disk, and recognizing a related information if it is determined that there is a specific log record in the present log disk; and normally operating a log management system although a system breakdown occurs or a system interruption occurs.
KR94030595A 1994-11-21 1994-11-21 Log record management scheme for distributed applications KR0129136B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR94030595A KR0129136B1 (en) 1994-11-21 1994-11-21 Log record management scheme for distributed applications

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR94030595A KR0129136B1 (en) 1994-11-21 1994-11-21 Log record management scheme for distributed applications

Publications (2)

Publication Number Publication Date
KR960019575A KR960019575A (en) 1996-06-17
KR0129136B1 true KR0129136B1 (en) 1998-04-15

Family

ID=19398485

Family Applications (1)

Application Number Title Priority Date Filing Date
KR94030595A KR0129136B1 (en) 1994-11-21 1994-11-21 Log record management scheme for distributed applications

Country Status (1)

Country Link
KR (1) KR0129136B1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100714235B1 (en) * 2004-01-19 2007-05-02 주식회사 이너버스 Method for loading and analysing a log file, and apparatus for the performing the same
CN107025163A (en) * 2017-03-31 2017-08-08 北京商办通互联网科技有限公司 A kind of passive type production, the demand realization method and system of consumer computers daily record

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100714235B1 (en) * 2004-01-19 2007-05-02 주식회사 이너버스 Method for loading and analysing a log file, and apparatus for the performing the same
CN107025163A (en) * 2017-03-31 2017-08-08 北京商办通互联网科技有限公司 A kind of passive type production, the demand realization method and system of consumer computers daily record

Also Published As

Publication number Publication date
KR960019575A (en) 1996-06-17

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Legal Events

Date Code Title Description
WITN Withdrawal due to no request for examination