KR0125584Y1 - Temperature control device of drug of wet station - Google Patents
Temperature control device of drug of wet stationInfo
- Publication number
- KR0125584Y1 KR0125584Y1 KR2019910023060U KR910023060U KR0125584Y1 KR 0125584 Y1 KR0125584 Y1 KR 0125584Y1 KR 2019910023060 U KR2019910023060 U KR 2019910023060U KR 910023060 U KR910023060 U KR 910023060U KR 0125584 Y1 KR0125584 Y1 KR 0125584Y1
- Authority
- KR
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- Prior art keywords
- bath
- chemical
- cold water
- temperature control
- temperature
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
본 고안은 웨이퍼 가공을 위한 왯스테이션의 불산(HF) 약품 처리조의 약품온도 조절장치에 관한 것으로서, 외측에 보조배스가 형성되어 내부공간에 채워진 처리액이 상기 보조배스 벽을 타고 흘러넘치는 약품배스와, 약품배스 내에 설치되어 상기 처리액의 온도를 감지하는 온도센서와, 보조배스 저부에서 상기 약품배스 중앙저부를 연통시키되, 내부에는 처리액이 순환되는 순환관과, 순환관 내의 처리액의 열을 교환시키기 위한 열교환부와, 열교환부와 연결설치되어 냉수를 유입 및 유출시키기 위한 냉수관과, 냉수관의 개폐를 제어하기 위한 출입밸브와, 온도센서와 전기적으로 연결되어 상기 출입밸브의 개폐를 제어하기 위한 온도콘트롤 유닛으로 구성된 것을 특징으로 한다.The present invention relates to a chemical temperature control device of a hydrofluoric acid (HF) chemical treatment tank of a wafer station for wafer processing, wherein an auxiliary bath is formed on the outside and a processing liquid filled in the inner space flows through the wall of the auxiliary bath. Is installed in the chemical bath, the temperature sensor for sensing the temperature of the treatment liquid, and the auxiliary bath bottom in communication with the central bottom of the chemical bath, the inside of the circulation pipe circulating the treatment liquid, and the heat of the treatment liquid in the circulation tube A heat exchanger for exchange, a cold water pipe installed in connection with the heat exchanger, inlet and outflow of cold water, an inlet valve for controlling the opening and closing of the cold water pipe, and an electrical connection with a temperature sensor to control the opening and closing of the inlet valve Characterized in that composed of a temperature control unit for.
따라서, 본 고안의 장치에서는 약품 배스의 청소가 용이하고 온도조절을 효율을 높일 수 있다.Therefore, in the apparatus of the present invention, the cleaning of the chemical bath is easy and the temperature control efficiency can be increased.
Description
제1도는 종래의 개통도.1 is a conventional opening.
제2도는 본 고안의 개통도.2 is an opening diagram of the present invention.
제3도는 본 고안의 냉각수통 단면도.3 is a cross-sectional view of the coolant tank of the present invention.
* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings
1 : 약품배스(BATH) 2 : 온도센서1: chemical bath (BATH) 2: temperature sensor
3 : 펌프 4 : 필터3: pump 4: filter
5 : 열교환부 6 : 밸브박스5: heat exchanger 6: valve box
7 : 밸브 8 : 온도콘트롤유니트7: Valve 8: Temperature control unit
9 : 웨이퍼 케리어 10 : 순환관9: wafer carrier 10: circulation tube
본 고안은 웨이퍼 가공을 위한 왯 스테이션의 불산(HF) 약품처리조의 약품온도 조절장치에 관한 것으로, 특히 온도조절의 효율을 높이고 약품처리조의 청소를 용이하게 하며 화학적 오염을 줄일 수 있도록한 왯 스테이션의 약품 온도 조절장치에 관한 것이다.The present invention relates to a chemical temperature control device of a hydrofluoric acid (HF) chemical treatment tank of a wafer station for wafer processing, and in particular, to improve the efficiency of temperature control, facilitate cleaning of the chemical treatment tank, and reduce chemical contamination. It relates to a chemical temperature control device.
종래에는 약품배스에서 흘러 넘친 약품은 외측배스에 고이게 되고 외측배스에 고인 약품은 약품 순환 펌프에 의해 필터를 통하여 안쪽배스 아래부분으로 공급되므로서 약품의 이물질을 제거하였다.Conventionally, the chemical overflowed from the chemical bath is accumulated in the outer bath and the chemical accumulated in the outer bath is supplied to the lower part of the inner bath through the filter by the chemical circulation pump to remove foreign substances of the chemical.
또 불산약품의 요구온도인 22∼24℃를 조절하기 위하여 냉동기에서 약 22℃ 정도로 차가워진 냉매(물)가 냉매순환펌프에 의하여 약품 배스 외측에 형성된 쿨링코일을 순환하면서 열 교환하여 약품의 온도를 적정온도에 맞추게된다. 그리고 온도센를 통하여 감지한 약품에 온도로 콘트롤러가 받아들여 냉동기를 제어하게 된다.In addition, the refrigerant (water) cooled to about 22 ° C. in the refrigerator is heat exchanged while circulating the cooling coils formed outside the drug bath by a refrigerant circulation pump in order to control the required temperature of the chemicals 22-24 ° C. It is adjusted to the proper temperature. And the controller accepts the temperature of the chemicals detected by the temperature sensor to control the freezer.
이러한 종래의 기술은 제1도에 도시되어 있는데 외측 배스에서 약품과 열교환시키므로서 요구온도로 조절된 약품이 펌프 및 필터를 거쳐 다시 배스 내부로 들어가므로서 약품의 순환길이가 길어 마찰등의 요인으로 인하여 조절된 적정온도가 변화하여 열 교환의 효율이 저하되었다.This conventional technique is shown in FIG. 1, and the chemicals adjusted to the required temperature by heat exchange with the chemicals in the outer bath enter the bath again through the pump and the filter, and thus the circulation length of the chemical is long, resulting in friction and the like. Due to the change in the adjusted titration temperature, the efficiency of heat exchange was reduced.
또 외측배스 내부에 쿨링코일이 설치되어 있어 배스의 청결을 위한 청소가 불가능할 뿐 아니라 약품이 쿨링코일의 외벽에 부딪히므로서 쿨링코일의 외벽에 붙어있는 파아티클(Particle)에 의해 약품이 오염되는 문제점이 발생되었다.In addition, because the cooling coil is installed inside the outer bath, cleaning for the cleanliness of the bath is impossible, and chemicals are contaminated by the particles attached to the outer wall of the cooling coil as the chemicals hit the outer wall of the cooling coil. A problem has occurred.
상술한 문제점을 해결하고자, 본 고안은 간단한 구조로서 열 교환 효율을 증대시키고, 배스의 청결을 유지할 수 있도록 한 왯 스테이션의 약품 온도조절장치를 제공하려는 것이다.In order to solve the above problems, the present invention is to provide a chemical temperature control device of the shock station to increase the heat exchange efficiency as a simple structure, to maintain the cleanliness of the bath.
상기 목적을 달성하고자, 본 고안의 왯 스테이션의 약품온도 조절장치는 외측에 보조배스가 형성되어 내부공간에 채워진 처리액이 상기 보조배스 벽을 타고 흘러넘치는 약품배스와, 약품배스 내에 설치되어 상기 처리액의 온도를 감지하는 온도센서와, 보조배스 저부에서 상기 약품배스 중앙저부를 연통시키되, 내부에는 처리액이 순환되는 순환관과, 순환관 내의 처리액의 열을 교환시키기 위한 열교환부와, 열교환부와 연결설치되어 냉수를 유입 및 유출시키기 위한 냉수관과, 냉수관의 개폐를 제어하기 위한 출입밸브와, 온도센서과 전기적으로 연결되어 상기 출입밸브의 개폐를 제어하기 위한 온도콘트롤 유닛으로 구성된 것을 특징으로 한다.In order to achieve the above object, the chemical temperature control apparatus of the wet station of the present invention is formed with an auxiliary bath on the outside and the treatment liquid filled in the interior space flows through the auxiliary bath wall, and is installed in the chemical bath and the treatment A temperature sensor for sensing the temperature of the liquid, a lower portion of the auxiliary bath communicating with the central bottom of the chemical bath, a circulation pipe through which the treatment liquid is circulated, a heat exchanger for exchanging heat of the treatment liquid in the circulation tube, and a heat exchanger It is connected to the cold water pipe for the inlet and outflow of the cold water, the entrance valve for controlling the opening and closing of the cold water pipe, and a temperature control unit electrically connected to the temperature sensor is characterized in that it consists of a temperature control unit It is done.
제2도 본 고안의 개통도를 도시한 것이다.2 shows the opening degree of the present invention.
본 고안의 왯 스테이션(WET STATION)의 약품 온도조절장치는 제2도를 참조하면, 외측에 보조배스(1')가 형성되어 내부공간에 채워진 약품이 보조배스 벽을 타고 흘러넘치는 약품배스(1)와, 약품배스 내에 설치되어 약품의 온도를 감지하는 온도센서(2)와, 보조배스 저부에서 상기 약품배스 중앙저부를 연통시키되, 내부에는 약품이 순환되는 순환관(10)과, 순환관(10)에 연설되어 약품을 펌핑하기 위한 펌프(3)와, 약품을 필터링하기 위한 필터(4)와, 순환관 내의 약품의 열을 교환시키기 위한 열교환부(5)와, 열교환부와 연결설치되어 냉수를 유입 및 유출시키기 위한 냉수관(11)과, 냉수관의 개폐를 제어하기 위한 출입밸브(7)와, 출입밸브가 보관된 밸브박스(6)와, 온도센서과 전기적으로 연결되어 상기 출입밸브(7)의 개폐를 제어하기 위한 온도콘트롤 유닛(8)으로 구성된다.Chemical temperature control device of the wet station of the present invention (WET STATION) Referring to Figure 2, the auxiliary bath (1 ') is formed on the outside of the chemical bath filled with the drug filled in the inner space flows through the wall of the auxiliary bath (1) And a temperature sensor (2) installed in the chemical bath for sensing the temperature of the medicine, and communicating the central bottom of the chemical bath at the bottom of the auxiliary bath, the circulation pipe 10 through which the medicine is circulated, and the circulation pipe ( 10) is connected to the pump (3) for pumping the drug, the filter (4) for filtering the drug, the heat exchanger (5) for exchanging heat of the chemical in the circulation pipe, and the heat exchanger The cold water pipe 11 for introducing and discharging the cold water, the inlet valve 7 for controlling the opening and closing of the cold water pipe, the valve box 6 in which the inlet valve is stored, and the temperature sensor are electrically connected to the inlet valve. With temperature control unit 8 for controlling the opening and closing of It is sex.
제2도와 제3도를 참조하면서 본 고안을 상세히 설명하면 다음과 같다.Hereinafter, the present invention will be described in detail with reference to FIGS. 2 and 3.
약품배스(1)에서 흘러넘치는 약품은 보조배스(1') 벽을 타고 흘러넘치고, 흘러들어간 약품은 펌프(3)의 작동으로 순환관(10)을 통해 순환한다.The chemical overflowing from the chemical bath 1 flows through the wall of the auxiliary bath 1 ', and the chemical flows through the circulation pipe 10 by the operation of the pump 3.
이 때, 순환관(10)에 형성된 필터(4)를 통해 약품 내의 불순물이 걸러진다.At this time, impurities in the chemical are filtered through the filter 4 formed in the circulation pipe 10.
또한, 펌프(3)와 필터(4)을 거친 약품은 열교환부(5)를 거치게 되는데 이 때 약품배스(1) 내에 온도센서(2)와 접속된 온도 콘트롤 유니트(8)의 작동으로 열교환부(5)내로 냉수가 공급되어 약품이 요구온도인 22∼24℃로 조절된다.In addition, the chemicals passed through the pump 3 and the filter 4 pass through the heat exchanger 5. At this time, the heat exchange unit is operated by the operation of the temperature control unit 8 connected to the temperature sensor 2 in the chemical bath 1. Cold water is supplied into (5), and the chemical is adjusted to 22-24 degreeC which is a required temperature.
온도가 조절된 약품은 다시 약품배스(1) 저부로 순환관(3)을 통해 계속적으로 공급된다.The temperature controlled medicine is continuously supplied through the circulation pipe 3 to the bottom of the chemical bath 1 again.
열 교환부(5)와 냉수관(11)이 연통되면 냉수조절밸브(17)가 냉수관(11)에 형성되고, 또 조절밸브(7)가 온도 콘트롤 유니트(8)와 접속되어 냉수의 출입을 제어한다.When the heat exchange part 5 and the cold water pipe 11 communicate with each other, a cold water control valve 17 is formed in the cold water pipe 11, and the control valve 7 is connected to the temperature control unit 8 to allow the cold water to enter and exit. To control.
따라서 본 고안은 배스(1) 내로 공급되는 약품이 공급직전에 열교환하므로서, 약품배스(1)내의 온도조절 효율이 증대되고 배스(1)내 청소가 용이하여 항상 청결을 유지하므로서 약품의 오염을 방지한다.Therefore, the present invention prevents the contamination of the chemicals by increasing the temperature control efficiency in the chemical bath (1) by increasing the temperature control efficiency in the chemical bath (1) and easy cleaning in the bath (1) as the chemicals supplied into the bath (1) immediately before the supply do.
Claims (2)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2019910023060U KR0125584Y1 (en) | 1991-12-20 | 1991-12-20 | Temperature control device of drug of wet station |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2019910023060U KR0125584Y1 (en) | 1991-12-20 | 1991-12-20 | Temperature control device of drug of wet station |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR930016161U KR930016161U (en) | 1993-07-28 |
| KR0125584Y1 true KR0125584Y1 (en) | 1998-11-02 |
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ID=19324861
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR2019910023060U KR0125584Y1 (en) | 1991-12-20 | 1991-12-20 | Temperature control device of drug of wet station |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR0125584Y1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR19990009195A (en) * | 1997-07-08 | 1999-02-05 | 윤종용 | Wet cleaning device for semiconductor device manufacturing |
-
1991
- 1991-12-20 KR KR2019910023060U patent/KR0125584Y1/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR930016161U (en) | 1993-07-28 |
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