KR0108395Y1 - Sputtering system for semiconductor device - Google Patents

Sputtering system for semiconductor device

Info

Publication number
KR0108395Y1
KR0108395Y1 KR93025950U KR930025950U KR0108395Y1 KR 0108395 Y1 KR0108395 Y1 KR 0108395Y1 KR 93025950 U KR93025950 U KR 93025950U KR 930025950 U KR930025950 U KR 930025950U KR 0108395 Y1 KR0108395 Y1 KR 0108395Y1
Authority
KR
South Korea
Prior art keywords
semiconductor device
sputtering system
sputtering
semiconductor
Prior art date
Application number
KR93025950U
Other languages
Korean (ko)
Inventor
Kyung-Soo Cho
Original Assignee
Hyundai Electronics Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hyundai Electronics Ind filed Critical Hyundai Electronics Ind
Priority to KR93025950U priority Critical patent/KR0108395Y1/en
Priority to JP6298246A priority patent/JP2669602B2/en
Application granted granted Critical
Publication of KR0108395Y1 publication Critical patent/KR0108395Y1/en

Links

KR93025950U 1993-12-01 1993-12-01 Sputtering system for semiconductor device KR0108395Y1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR93025950U KR0108395Y1 (en) 1993-12-01 1993-12-01 Sputtering system for semiconductor device
JP6298246A JP2669602B2 (en) 1993-12-01 1994-12-01 Sputtering equipment for semiconductor device manufacturing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR93025950U KR0108395Y1 (en) 1993-12-01 1993-12-01 Sputtering system for semiconductor device

Publications (1)

Publication Number Publication Date
KR0108395Y1 true KR0108395Y1 (en) 1997-10-21

Family

ID=19369476

Family Applications (1)

Application Number Title Priority Date Filing Date
KR93025950U KR0108395Y1 (en) 1993-12-01 1993-12-01 Sputtering system for semiconductor device

Country Status (2)

Country Link
JP (1) JP2669602B2 (en)
KR (1) KR0108395Y1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100517550B1 (en) * 2002-12-04 2005-09-29 삼성전자주식회사 Atomic layer deposition apparatus

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58177463A (en) * 1982-04-12 1983-10-18 Hitachi Ltd Method and device for formation of thin film
JPH05311419A (en) * 1992-04-01 1993-11-22 Nec Corp Magnetron type sputtering device
JPH06299346A (en) * 1993-04-13 1994-10-25 Nippon Steel Corp Sputtering device
JP3366391B2 (en) * 1993-08-17 2003-01-14 東京エレクトロン株式会社 Sputtering apparatus and sputtering film forming method

Also Published As

Publication number Publication date
JPH07211640A (en) 1995-08-11
JP2669602B2 (en) 1997-10-29

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Legal Events

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Year of fee payment: 12

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