JPWO2024194986A1 - - Google Patents

Info

Publication number
JPWO2024194986A1
JPWO2024194986A1 JP2025507959A JP2025507959A JPWO2024194986A1 JP WO2024194986 A1 JPWO2024194986 A1 JP WO2024194986A1 JP 2025507959 A JP2025507959 A JP 2025507959A JP 2025507959 A JP2025507959 A JP 2025507959A JP WO2024194986 A1 JPWO2024194986 A1 JP WO2024194986A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2025507959A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2024194986A1 publication Critical patent/JPWO2024194986A1/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP2025507959A 2023-03-20 2023-03-20 Pending JPWO2024194986A1 (enrdf_load_html_response)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2023/010894 WO2024194986A1 (ja) 2023-03-20 2023-03-20 治具、工具回転装置、pvd処理装置および被覆工具の製造方法

Publications (1)

Publication Number Publication Date
JPWO2024194986A1 true JPWO2024194986A1 (enrdf_load_html_response) 2024-09-26

Family

ID=92841347

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2025507959A Pending JPWO2024194986A1 (enrdf_load_html_response) 2023-03-20 2023-03-20

Country Status (2)

Country Link
JP (1) JPWO2024194986A1 (enrdf_load_html_response)
WO (1) WO2024194986A1 (enrdf_load_html_response)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS361018Y1 (enrdf_load_html_response) * 1959-06-19 1961-01-21
JPS5344260Y2 (enrdf_load_html_response) * 1975-01-24 1978-10-24
JPS5613010Y2 (enrdf_load_html_response) * 1977-08-03 1981-03-26
US20020062791A1 (en) * 2000-10-11 2002-05-30 Andrey Ginovker Table
JP2009121614A (ja) * 2007-11-15 2009-06-04 Shigeki Nakamura 自在継手
JP2012067359A (ja) * 2010-09-24 2012-04-05 Nissin Electric Co Ltd 膜形成対象物品支持装置及び膜形成装置
KR101642188B1 (ko) * 2014-08-19 2016-07-22 재단법인 하이브리드 인터페이스기반 미래소재 연구단 구조물의 균일 증착을 위하여 비틀림각을 연출하는 지그시스템

Also Published As

Publication number Publication date
WO2024194986A1 (ja) 2024-09-26

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Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20250724