JPWO2024090442A1 - - Google Patents

Info

Publication number
JPWO2024090442A1
JPWO2024090442A1 JP2024553086A JP2024553086A JPWO2024090442A1 JP WO2024090442 A1 JPWO2024090442 A1 JP WO2024090442A1 JP 2024553086 A JP2024553086 A JP 2024553086A JP 2024553086 A JP2024553086 A JP 2024553086A JP WO2024090442 A1 JPWO2024090442 A1 JP WO2024090442A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024553086A
Other languages
Japanese (ja)
Other versions
JPWO2024090442A5 (enExample
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2024090442A1 publication Critical patent/JPWO2024090442A1/ja
Publication of JPWO2024090442A5 publication Critical patent/JPWO2024090442A5/ja
Pending legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
    • F16C32/0603—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion
    • F16C32/0614—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion the gas being supplied under pressure, e.g. aerostatic bearings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Magnetic Bearings And Hydrostatic Bearings (AREA)
JP2024553086A 2022-10-26 2023-10-24 Pending JPWO2024090442A1 (enExample)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022171335 2022-10-26
PCT/JP2023/038377 WO2024090442A1 (ja) 2022-10-26 2023-10-24 静圧気体軸受装置

Publications (2)

Publication Number Publication Date
JPWO2024090442A1 true JPWO2024090442A1 (enExample) 2024-05-02
JPWO2024090442A5 JPWO2024090442A5 (enExample) 2025-07-22

Family

ID=90830837

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024553086A Pending JPWO2024090442A1 (enExample) 2022-10-26 2023-10-24

Country Status (3)

Country Link
JP (1) JPWO2024090442A1 (enExample)
KR (1) KR20250075657A (enExample)
WO (1) WO2024090442A1 (enExample)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03244827A (ja) * 1990-02-21 1991-10-31 Nippon Seiko Kk 静圧気体軸受
JP2003232352A (ja) * 2002-02-06 2003-08-22 Nikon Corp エアパッド、このエアパッドを用いたステージ装置及びこのステージ装置を備える露光装置
JP2011149500A (ja) * 2010-01-22 2011-08-04 Sintokogio Ltd 静圧軸受装置および静圧軸受装置を備えたステージ
CN110848258A (zh) * 2019-12-16 2020-02-28 江苏集萃精凯高端装备技术有限公司 一种气体静压气浮垫及气浮导轨

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0510330A (ja) 1991-06-29 1993-01-19 Canon Inc 静圧軸受装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03244827A (ja) * 1990-02-21 1991-10-31 Nippon Seiko Kk 静圧気体軸受
JP2003232352A (ja) * 2002-02-06 2003-08-22 Nikon Corp エアパッド、このエアパッドを用いたステージ装置及びこのステージ装置を備える露光装置
JP2011149500A (ja) * 2010-01-22 2011-08-04 Sintokogio Ltd 静圧軸受装置および静圧軸受装置を備えたステージ
CN110848258A (zh) * 2019-12-16 2020-02-28 江苏集萃精凯高端装备技术有限公司 一种气体静压气浮垫及气浮导轨

Also Published As

Publication number Publication date
WO2024090442A1 (ja) 2024-05-02
KR20250075657A (ko) 2025-05-28

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