JPWO2023282208A1 - - Google Patents
Info
- Publication number
- JPWO2023282208A1 JPWO2023282208A1 JP2023533106A JP2023533106A JPWO2023282208A1 JP WO2023282208 A1 JPWO2023282208 A1 JP WO2023282208A1 JP 2023533106 A JP2023533106 A JP 2023533106A JP 2023533106 A JP2023533106 A JP 2023533106A JP WO2023282208 A1 JPWO2023282208 A1 JP WO2023282208A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021111450 | 2021-07-05 | ||
PCT/JP2022/026489 WO2023282208A1 (ja) | 2021-07-05 | 2022-07-01 | パターン露光装置、デバイス製造方法、及び露光装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2023282208A1 true JPWO2023282208A1 (ja) | 2023-01-12 |
Family
ID=84800627
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023533106A Pending JPWO2023282208A1 (ja) | 2021-07-05 | 2022-07-01 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20240248409A1 (ja) |
JP (1) | JPWO2023282208A1 (ja) |
KR (1) | KR20240012549A (ja) |
CN (1) | CN117616338A (ja) |
TW (1) | TW202309676A (ja) |
WO (1) | WO2023282208A1 (ja) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4546019B2 (ja) * | 2002-07-03 | 2010-09-15 | 株式会社日立製作所 | 露光装置 |
TWI278912B (en) * | 2003-06-03 | 2007-04-11 | Nikon Corp | Exposure method and device, and device manufacturing method |
US7274434B2 (en) * | 2004-11-24 | 2007-09-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2008197472A (ja) * | 2007-02-14 | 2008-08-28 | Shinko Electric Ind Co Ltd | 回路基板の製造方法 |
JP7023601B2 (ja) | 2016-11-14 | 2022-02-22 | 株式会社アドテックエンジニアリング | ダイレクトイメージング露光装置及びダイレクトイメージング露光方法 |
-
2022
- 2022-07-01 WO PCT/JP2022/026489 patent/WO2023282208A1/ja active Application Filing
- 2022-07-01 KR KR1020237044548A patent/KR20240012549A/ko unknown
- 2022-07-01 JP JP2023533106A patent/JPWO2023282208A1/ja active Pending
- 2022-07-01 CN CN202280045554.6A patent/CN117616338A/zh active Pending
- 2022-07-04 TW TW111124950A patent/TW202309676A/zh unknown
-
2023
- 2023-12-27 US US18/397,308 patent/US20240248409A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
CN117616338A (zh) | 2024-02-27 |
KR20240012549A (ko) | 2024-01-29 |
TW202309676A (zh) | 2023-03-01 |
WO2023282208A1 (ja) | 2023-01-12 |
US20240248409A1 (en) | 2024-07-25 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20231226 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20240716 |