JPWO2023182092A1 - - Google Patents
Info
- Publication number
- JPWO2023182092A1 JPWO2023182092A1 JP2024510058A JP2024510058A JPWO2023182092A1 JP WO2023182092 A1 JPWO2023182092 A1 JP WO2023182092A1 JP 2024510058 A JP2024510058 A JP 2024510058A JP 2024510058 A JP2024510058 A JP 2024510058A JP WO2023182092 A1 JPWO2023182092 A1 JP WO2023182092A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022046868 | 2022-03-23 | ||
| PCT/JP2023/010038 WO2023182092A1 (ja) | 2022-03-23 | 2023-03-15 | 転写フィルム、積層体、レジストパターンを有する積層体の製造方法、導体パターンを有する積層体の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023182092A1 true JPWO2023182092A1 (https=) | 2023-09-28 |
| JPWO2023182092A5 JPWO2023182092A5 (https=) | 2024-12-02 |
Family
ID=88101473
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024510058A Pending JPWO2023182092A1 (https=) | 2022-03-23 | 2023-03-15 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2023182092A1 (https=) |
| CN (1) | CN121646735A (https=) |
| WO (1) | WO2023182092A1 (https=) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4038838B2 (ja) * | 1997-08-12 | 2008-01-30 | 東レ株式会社 | カラーフィルター用カラーペーストおよびその製造方法並びにカラーフィルター |
| JP2006243564A (ja) * | 2005-03-04 | 2006-09-14 | Fuji Photo Film Co Ltd | 感光性組成物及び感光性フィルム、並びに、永久パターン及びその形成方法 |
| JP2011039404A (ja) * | 2009-08-17 | 2011-02-24 | Asahi Glass Co Ltd | 光学素子隔壁形成用感光性組成物、これを用いたブラックマトリックスおよびその製造方法、並びにカラーフィルタの製造方法 |
| WO2019146769A1 (ja) * | 2018-01-29 | 2019-08-01 | 富士フイルム株式会社 | 平版印刷版原版、及び、平版印刷版の作製方法 |
| WO2021176811A1 (ja) * | 2020-03-02 | 2021-09-10 | 富士フイルム株式会社 | 感光性転写材料、及び回路配線の製造方法 |
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2023
- 2023-03-15 WO PCT/JP2023/010038 patent/WO2023182092A1/ja not_active Ceased
- 2023-03-15 CN CN202380022796.8A patent/CN121646735A/zh active Pending
- 2023-03-15 JP JP2024510058A patent/JPWO2023182092A1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| WO2023182092A1 (ja) | 2023-09-28 |
| CN121646735A (zh) | 2026-03-10 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20240809 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20260204 |