JPWO2023089946A1 - - Google Patents
Info
- Publication number
- JPWO2023089946A1 JPWO2023089946A1 JP2023562160A JP2023562160A JPWO2023089946A1 JP WO2023089946 A1 JPWO2023089946 A1 JP WO2023089946A1 JP 2023562160 A JP2023562160 A JP 2023562160A JP 2023562160 A JP2023562160 A JP 2023562160A JP WO2023089946 A1 JPWO2023089946 A1 JP WO2023089946A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/167—Coating processes; Apparatus therefor from the gas phase, by plasma deposition
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Electrodes Of Semiconductors (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021186131 | 2021-11-16 | ||
PCT/JP2022/035101 WO2023089946A1 (ja) | 2021-11-16 | 2022-09-21 | 半導体基板の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2023089946A1 true JPWO2023089946A1 (ja) | 2023-05-25 |
Family
ID=86396790
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023562160A Pending JPWO2023089946A1 (ja) | 2021-11-16 | 2022-09-21 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPWO2023089946A1 (ja) |
KR (1) | KR20240100340A (ja) |
TW (1) | TW202321819A (ja) |
WO (1) | WO2023089946A1 (ja) |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6136501A (en) | 1998-08-28 | 2000-10-24 | Shipley Company, L.L.C. | Polymers and photoresist compositions comprising same |
EP2345932A4 (en) * | 2008-10-14 | 2012-06-13 | Asahi Kasei Corp | HEAT-RESISTANT RESISTANT MATERIAL, LAMINATED BODY FOR THERMAL LITHOGRAPHY WITH THE MATERIAL AND MOLDING PROCESS WITH THE MATERIAL AND LAMINATE BODY |
WO2011002060A1 (ja) * | 2009-07-03 | 2011-01-06 | Hoya株式会社 | 機能傾斜型無機レジスト、機能傾斜型無機レジスト付き基板、機能傾斜型無機レジスト付き円筒基材、機能傾斜型無機レジストの形成方法及び微細パターン形成方法、並びに無機レジストとその製造方法 |
WO2013111812A1 (ja) * | 2012-01-27 | 2013-08-01 | 旭化成株式会社 | 微細凹凸構造体、ドライエッチング用熱反応型レジスト材料、モールドの製造方法及びモールド |
JP2014241183A (ja) * | 2013-05-13 | 2014-12-25 | 旭化成イーマテリアルズ株式会社 | ドライエッチング用積層体、モールドの製造方法及びモールド |
JP2020042281A (ja) * | 2019-11-08 | 2020-03-19 | 旭化成株式会社 | 熱反応型レジスト材料、及びそれを用いたモールドの製造方法、並びにモールド |
-
2022
- 2022-09-21 KR KR1020247006811A patent/KR20240100340A/ko unknown
- 2022-09-21 WO PCT/JP2022/035101 patent/WO2023089946A1/ja active Application Filing
- 2022-09-21 JP JP2023562160A patent/JPWO2023089946A1/ja active Pending
- 2022-09-27 TW TW111136611A patent/TW202321819A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
WO2023089946A1 (ja) | 2023-05-25 |
TW202321819A (zh) | 2023-06-01 |
KR20240100340A (ko) | 2024-07-01 |