JPWO2023058365A1 - - Google Patents
Info
- Publication number
- JPWO2023058365A1 JPWO2023058365A1 JP2023552745A JP2023552745A JPWO2023058365A1 JP WO2023058365 A1 JPWO2023058365 A1 JP WO2023058365A1 JP 2023552745 A JP2023552745 A JP 2023552745A JP 2023552745 A JP2023552745 A JP 2023552745A JP WO2023058365 A1 JPWO2023058365 A1 JP WO2023058365A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021163675 | 2021-10-04 | ||
| PCT/JP2022/032809 WO2023058365A1 (ja) | 2021-10-04 | 2022-08-31 | 感放射線性樹脂組成物及びパターン形成方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2023058365A1 true JPWO2023058365A1 (https=) | 2023-04-13 |
Family
ID=85803333
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023552745A Pending JPWO2023058365A1 (https=) | 2021-10-04 | 2022-08-31 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2023058365A1 (https=) |
| TW (1) | TW202315860A (https=) |
| WO (1) | WO2023058365A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7852386B2 (ja) * | 2022-06-01 | 2026-04-28 | 信越化学工業株式会社 | 化学増幅ポジ型レジスト組成物及びレジストパターン形成方法 |
| JP2024115169A (ja) * | 2023-02-14 | 2024-08-26 | 東京応化工業株式会社 | レジスト組成物及びレジストパターン形成方法 |
| JP2025007433A (ja) * | 2023-06-30 | 2025-01-17 | 東京応化工業株式会社 | レジスト組成物及びレジストパターン形成方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018128477A (ja) * | 2015-06-19 | 2018-08-16 | 富士フイルム株式会社 | パターン形成方法、及び、電子デバイスの製造方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7545806B2 (ja) * | 2019-02-26 | 2024-09-05 | 住友化学株式会社 | 樹脂、レジスト組成物及びレジストパターンの製造方法 |
| WO2022065025A1 (ja) * | 2020-09-24 | 2022-03-31 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法 |
-
2022
- 2022-08-31 JP JP2023552745A patent/JPWO2023058365A1/ja active Pending
- 2022-08-31 WO PCT/JP2022/032809 patent/WO2023058365A1/ja not_active Ceased
- 2022-09-05 TW TW111133550A patent/TW202315860A/zh unknown
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018128477A (ja) * | 2015-06-19 | 2018-08-16 | 富士フイルム株式会社 | パターン形成方法、及び、電子デバイスの製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202315860A (zh) | 2023-04-16 |
| WO2023058365A1 (ja) | 2023-04-13 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
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| A621 | Written request for application examination |
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| A521 | Request for written amendment filed |
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