JPWO2022224778A1 - - Google Patents

Info

Publication number
JPWO2022224778A1
JPWO2022224778A1 JP2023516404A JP2023516404A JPWO2022224778A1 JP WO2022224778 A1 JPWO2022224778 A1 JP WO2022224778A1 JP 2023516404 A JP2023516404 A JP 2023516404A JP 2023516404 A JP2023516404 A JP 2023516404A JP WO2022224778 A1 JPWO2022224778 A1 JP WO2022224778A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023516404A
Other languages
Japanese (ja)
Other versions
JPWO2022224778A5 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022224778A1 publication Critical patent/JPWO2022224778A1/ja
Publication of JPWO2022224778A5 publication Critical patent/JPWO2022224778A5/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/46—Reaction with unsaturated dicarboxylic acids or anhydrides thereof, e.g. maleinisation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L39/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen; Compositions of derivatives of such polymers
JP2023516404A 2021-04-23 2022-03-30 Pending JPWO2022224778A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021073565 2021-04-23
PCT/JP2022/016157 WO2022224778A1 (en) 2021-04-23 2022-03-30 Temperature-responsive polymer and water-based temperature-responsive composition

Publications (2)

Publication Number Publication Date
JPWO2022224778A1 true JPWO2022224778A1 (en) 2022-10-27
JPWO2022224778A5 JPWO2022224778A5 (en) 2024-03-28

Family

ID=83722215

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023516404A Pending JPWO2022224778A1 (en) 2021-04-23 2022-03-30

Country Status (2)

Country Link
JP (1) JPWO2022224778A1 (en)
WO (1) WO2022224778A1 (en)

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2698369B1 (en) * 1992-11-23 1995-01-06 Elf Atochem Powder curable fluoropolymer, its manufacturing process, its application in powder coatings.
FR2735781B1 (en) * 1995-06-23 1997-10-31 Atochem Elf Sa SELF-CROSSLINKING COMPOSITION BASED ON FLUORINATED COPOLYMERS AND ACRYLIC COPOLYMERS, PREPARATION METHOD THEREOF AND USE THEREOF FOR COATING SUBSTRATES
JPH09157235A (en) * 1995-12-13 1997-06-17 Mitsui Toatsu Chem Inc New n-allyl-substituted phthalic acid half amide compound
JPH09202755A (en) * 1996-01-26 1997-08-05 Mitsui Toatsu Chem Inc N-allyl-substituted methylendomethylenetetrahydrophthalic acid half amide compound
JPH09202756A (en) * 1996-01-26 1997-08-05 Mitsui Toatsu Chem Inc N-allyl-substituted methyltetrahydrophthalic acid half amide compound
JP2003262957A (en) * 2002-03-07 2003-09-19 Fuji Photo Film Co Ltd Photosensitive color composition, color filter and method for manufacturing the same
JP2003270784A (en) * 2002-03-14 2003-09-25 Fuji Photo Film Co Ltd Colored photosensitive composition, color filter and method for producing the same
JP4119772B2 (en) * 2002-09-25 2008-07-16 富士フイルム株式会社 Image recording material
JP4383185B2 (en) * 2004-01-23 2009-12-16 富士フイルム株式会社 Positive resist composition and pattern forming method using the same
WO2012029481A1 (en) * 2010-08-31 2012-03-08 富士フイルム株式会社 Photosensitive composition, photosensitive film, photosensitive laminate, permanent pattern casting method, and print substrate
JP2021175792A (en) * 2020-04-28 2021-11-04 信越化学工業株式会社 Iodized aromatic carboxylic acid type pendant-containing polymer, resist material and patterning process

Also Published As

Publication number Publication date
WO2022224778A1 (en) 2022-10-27

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Legal Events

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A529 Written submission of copy of amendment under article 34 pct

Free format text: JAPANESE INTERMEDIATE CODE: A5211

Effective date: 20230706

A521 Request for written amendment filed

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Effective date: 20230725