JPWO2022196524A1 - - Google Patents
Info
- Publication number
- JPWO2022196524A1 JPWO2022196524A1 JP2023507047A JP2023507047A JPWO2022196524A1 JP WO2022196524 A1 JPWO2022196524 A1 JP WO2022196524A1 JP 2023507047 A JP2023507047 A JP 2023507047A JP 2023507047 A JP2023507047 A JP 2023507047A JP WO2022196524 A1 JPWO2022196524 A1 JP WO2022196524A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021042487 | 2021-03-16 | ||
| PCT/JP2022/010636 WO2022196524A1 (ja) | 2021-03-16 | 2022-03-10 | 樹脂組成物、硬化物、積層体、硬化物の製造方法、及び、半導体デバイス |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2022196524A1 true JPWO2022196524A1 (ko) | 2022-09-22 |
Family
ID=83320609
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023507047A Pending JPWO2022196524A1 (ko) | 2021-03-16 | 2022-03-10 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPWO2022196524A1 (ko) |
| KR (1) | KR20230146065A (ko) |
| CN (1) | CN117043273A (ko) |
| TW (1) | TW202248293A (ko) |
| WO (1) | WO2022196524A1 (ko) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5326643A (en) * | 1991-10-07 | 1994-07-05 | International Business Machines Corporation | Adhesive layer in multi-level packaging and organic material as a metal diffusion barrier |
| JPH10260531A (ja) * | 1997-03-17 | 1998-09-29 | Nippon Zeon Co Ltd | ポリイミド系樹脂組成物 |
| JP3877093B2 (ja) * | 1997-07-04 | 2007-02-07 | 日立化成工業株式会社 | 感光性樹脂組成物及びこれを用いたレリーフパターンの製造法 |
| US8604113B2 (en) | 2006-11-15 | 2013-12-10 | Sumitomo Bakelite Co., Ltd. | Photosensitive resin composition, insulating film, protective film, and electronic equipment |
| JP7171890B2 (ja) * | 2019-03-15 | 2022-11-15 | 富士フイルム株式会社 | 硬化性樹脂組成物、硬化膜、積層体、硬化膜の製造方法、半導体デバイス、及び、ポリマー前駆体 |
-
2022
- 2022-03-10 JP JP2023507047A patent/JPWO2022196524A1/ja active Pending
- 2022-03-10 WO PCT/JP2022/010636 patent/WO2022196524A1/ja active Application Filing
- 2022-03-10 CN CN202280021576.9A patent/CN117043273A/zh active Pending
- 2022-03-10 KR KR1020237031393A patent/KR20230146065A/ko unknown
- 2022-03-11 TW TW111108894A patent/TW202248293A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2022196524A1 (ja) | 2022-09-22 |
| KR20230146065A (ko) | 2023-10-18 |
| CN117043273A (zh) | 2023-11-10 |
| TW202248293A (zh) | 2022-12-16 |