JPWO2022185793A1 - - Google Patents
Info
- Publication number
- JPWO2022185793A1 JPWO2022185793A1 JP2023503634A JP2023503634A JPWO2022185793A1 JP WO2022185793 A1 JPWO2022185793 A1 JP WO2022185793A1 JP 2023503634 A JP2023503634 A JP 2023503634A JP 2023503634 A JP2023503634 A JP 2023503634A JP WO2022185793 A1 JPWO2022185793 A1 JP WO2022185793A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
- B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021033188 | 2021-03-03 | ||
| PCT/JP2022/002799 WO2022185793A1 (ja) | 2021-03-03 | 2022-01-26 | 研磨用組成物およびこれを用いた研磨方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2022185793A1 true JPWO2022185793A1 (ja) | 2022-09-09 |
Family
ID=83155332
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023503634A Pending JPWO2022185793A1 (ja) | 2021-03-03 | 2022-01-26 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20240002697A1 (ja) |
| JP (1) | JPWO2022185793A1 (ja) |
| KR (1) | KR20230152020A (ja) |
| CN (1) | CN116940648A (ja) |
| TW (1) | TW202332533A (ja) |
| WO (1) | WO2022185793A1 (ja) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023181810A1 (ja) * | 2022-03-23 | 2023-09-28 | 株式会社フジミインコーポレーテッド | 研磨用組成物およびこれを用いた研磨方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010064218A (ja) * | 2008-09-12 | 2010-03-25 | Jgc Catalysts & Chemicals Ltd | 研磨用砥石 |
| JP6156207B2 (ja) * | 2013-04-02 | 2017-07-05 | 信越化学工業株式会社 | 合成石英ガラス基板の製造方法 |
| JP6400897B2 (ja) * | 2013-11-06 | 2018-10-03 | ニッタ・ハース株式会社 | 研磨組成物 |
| TWI761649B (zh) * | 2017-12-27 | 2022-04-21 | 日商日揮觸媒化成股份有限公司 | 多孔二氧化矽粒子及其製造方法 |
| KR102672869B1 (ko) * | 2018-03-30 | 2024-06-05 | 닛키 쇼쿠바이카세이 가부시키가이샤 | 실리카 입자 분산액, 연마 조성물 및 실리카 입자 분산액의 제조 방법 |
-
2022
- 2022-01-26 CN CN202280017862.8A patent/CN116940648A/zh active Pending
- 2022-01-26 WO PCT/JP2022/002799 patent/WO2022185793A1/ja active Application Filing
- 2022-01-26 KR KR1020237029482A patent/KR20230152020A/ko unknown
- 2022-01-26 US US18/278,467 patent/US20240002697A1/en active Pending
- 2022-01-26 JP JP2023503634A patent/JPWO2022185793A1/ja active Pending
- 2022-02-11 TW TW111105010A patent/TW202332533A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| US20240002697A1 (en) | 2024-01-04 |
| TW202332533A (zh) | 2023-08-16 |
| CN116940648A (zh) | 2023-10-24 |
| WO2022185793A1 (ja) | 2022-09-09 |
| KR20230152020A (ko) | 2023-11-02 |